一种高性能Si3N4陶瓷基板及其制备方法

By using Gd3Si2C2 powder and β-Si3N4 seed crystals as non-oxide sintering aids in Si3N4 ceramic substrates, the sintering process and grain structure were optimized, overcoming the shortcomings of Si3N4 ceramic substrates in terms of high thermal conductivity and mechanical properties, and realizing the preparation of high-performance Si3N4 ceramic substrates.

CN118388243BActive Publication Date: 2026-07-17GUANGDONG UNIV OF TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
GUANGDONG UNIV OF TECH
Filing Date
2024-04-22
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing Si3N4 ceramic substrates are insufficient in balancing high thermal conductivity and mechanical properties, making it difficult to meet the requirements of high-voltage, high-current, high-power-density, and small-size power electronic devices.

Method used

Gd3Si2C2 powder and β-Si3N4 seed crystals were used as non-oxide sintering aids to generate Gd3Si2C2 powder through in-situ reaction. Combined with ball milling, dry pressing and cold isostatic pressing, high-performance Si3N4 ceramic substrates were prepared, and the N/O ratio and grain structure during the sintering process were optimized.

Benefits of technology

It significantly improves the thermal conductivity and mechanical properties of Si3N4 ceramics, with thermal conductivity reaching over 110 W·m-1·K-1 and strength reaching over 950 MPa, exhibiting outstanding advantages such as high thermal conductivity, high strength, and high toughness.

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Abstract

本发明公开了一种高性能Si3N4陶瓷基板及其制备方法,涉及氮化硅陶瓷技术领域。本发明提供的制备方法在Si3N4陶瓷的原料中添加非氧化物Gd3Si2C2粉体和β‑Si3N4晶种,一方面,从原料上减少氧含量的引入,同时Gd3Si2C2能够与Si3N4粉体表面的SiO2氧化膜等氧杂质反应,提高烧结过程中液相的N / O比,阻碍O原子固溶进Si3N4晶格,降低晶格氧,进一步地,Gd3Si2C2能有效的细化Si3N4晶粒,增加晶粒的长径比,从而提高Si3N4陶瓷的弯曲强度和断裂韧性;加入的β‑Si3N4晶种,能够为β‑Si3N4晶粒的结晶提供晶核,促进晶粒长大,将晶界相逐渐排挤进入多晶交界处,从而调节晶界相来提高Si3N4陶瓷的热导率。最终制得的Si3N4陶瓷具有高热导、高强度、高韧性等突出优点。
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