A multi-flexible magnetic shear thickening polishing method
By adjusting the magnetic pole arrangement and using an elastic matrix and fiber layer to form flexible contoured particle clusters, the problem of uncontrollable polishing force in magnetic field-assisted polishing technology has been solved, achieving efficient and high-precision polishing results that are adaptable to the surface treatment of complex structures and different materials.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANDONG UNIV OF TECH
- Filing Date
- 2024-07-09
- Publication Date
- 2026-06-12
Smart Images

Figure CN118456129B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of magnetic field-assisted composite polishing technology, specifically relating to a multi-layer flexible magnetic shearing thickening polishing method. Background Technology
[0002] With the development of high-end technology fields such as aerospace, biomedicine, and precision manufacturing, and the rapid development of high-end equipment manufacturing, the manufacturing precision of components is becoming increasingly demanding. In particular, the requirements for surface precision, functional structure, and surface quality of components are becoming increasingly stringent, becoming important indicators of technological progress and product performance improvement within the industry. These high-tech industries and high-end equipment manufacturing require components with extremely high surface flatness, extremely low surface roughness, and excellent surface quality to ensure their stability and reliability during use. In the aerospace field, high-precision surface treatment can significantly improve the performance of key components such as aero-engines and turbine blades, thereby improving the efficiency and safety of aircraft. In the biomedical field, medical devices such as artificial joints and implants require extremely high surface finish and biocompatibility to ensure their functionality and patient safety. In optical instruments, high-quality wafers and prisms require flawless surfaces to ensure high-quality imaging performance and light transmission efficiency. In the field of precision machinery, high-precision mechanical parts such as gears and bearings require very high surface precision and finish to reduce friction and wear and extend service life. However, existing magnetic field-assisted polishing technology still has many problems in application, especially in the control of polishing force, which is significantly insufficient.
[0003] In traditional polishing methods, abrasives are directly pressed into the workpiece surface, resulting in uncontrollable pressure. Chinese invention patent CN 200610132495.9 discloses a magnetorheological effect grinding and polishing method. However, when the abrasive pressure on the workpiece surface is too high, it easily produces indentations and scratches, affecting surface quality. This uncontrollable pressure not only reduces polishing efficiency but can also cause irreversible damage to precision parts, limiting the application of this technology in ultra-precision machining. Therefore, developing a novel polishing method capable of flexible control of polishing force is of great significance for improving ultra-precision machining efficiency and surface quality. This new method should be able to precisely adjust the pressure of the abrasive on the workpiece surface during polishing, thereby avoiding indentations and scratches, improving the uniformity of material removal and polishing effect. Simultaneously, the method should also possess good adaptability and controllability to meet the surface polishing needs of different materials and complex structures, thus satisfying the stringent requirements of modern high-tech industries and high-end equipment manufacturing for component surface treatment. Summary of the Invention
[0004] This invention addresses the problems of insufficient flexibility in polishing tools, large polishing forces, and uncontrollable relative positions of abrasive and workpiece surfaces in current magnetic field-assisted polishing processes. It proposes a multi-layered flexible magnetic shearing thickening polishing method. By adjusting the magnetic pole arrangement, the magnetic field distribution within the polishing area is modified. Magnetic particles, constrained by the magnetic field, form "flexible contour-following particle clusters," altering the holding force on the abrasive. An elastic matrix is applied to achieve flexible control of the abrasive's force on the workpiece surface (polishing force), thus enabling flexible polishing of specific areas of the workpiece. A double elastic layer further enhances the precision of flexible control, achieving multi-layered flexible polishing of different materials and complex surface structures.
[0005] This invention discloses a multi-flexible magnetic shear thickening polishing method. The polishing tool comprises an elastic matrix, a fiber layer, and magnetic poles with different polarity configurations. The elastic matrix includes elastic layer A, elastic layer B, or a combination of both; elastic layer A is selected from butadiene rubber, butyl rubber, or nitrile rubber; elastic layer B is selected from polyurethane elastomer, polyamide elastomer, or polyester elastomer; the fiber layer is selected from aromatic polyamide fiber, polybenzimidazole fiber, or polybutylene terephthalate fiber; the different polarity configurations of the magnetic poles are selected from SNSN, SNNS, or NNSS, and can be placed on the upper end of the elastic matrix or the lower end of the workpiece; the fiber layer is immersed in a magnetic shear thickening polishing medium, which is composed of dispersed... The mixture is prepared by constant-temperature ultrasonic mechanical stirring of media, dispersed phase, abrasive, magnetic particles, and additives; the dispersion media is selected from polyethylene glycol, deionized water, vinyl ethanol, or polypropylene glycol; the dispersed phase is selected from silica, hydroxypropyl distarch phosphate, calcium carbonate, or polystyrene; the abrasive is selected from diamond, cubic boron nitride, boron carbide, or tungsten oxide; the magnetic particles are selected from carbonyl iron powder, iron(III) oxide, magnetic glass particles, or iron-nickel alloy particles; the additives are selected from alkyl phosphates, carboxylated organic amine salts, polyvinylpyrrolidone, and tetrabutyl titanate.
[0006] The polishing method provided by the present invention, a multi-flexible magnetic shear thickening polishing method, is as follows:
[0007] (1) An elastic substrate, including elastic layer A and elastic layer B, is fixed on the surface of the polishing tool;
[0008] (2) A fiber layer is fixed on the outer layer of the elastic matrix;
[0009] (3) Preparation of magnetic shear-thickening polishing medium;
[0010] (4) Immerse the fiber layer in a magnetic shear-thickening polishing medium for a period of time;
[0011] (5) Polishing specific workpiece surfaces using polishing tools;
[0012] (6) Based on the physical and chemical properties of the workpiece, the composition of the magnetic shear thickening polishing medium, the elastic matrix, and the fiber layer can be replaced, and an elastic matrix and fiber layer that are compatible with the workpiece material can be selected.
[0013] The beneficial effects of this invention are as follows: 1. The multi-layer flexible magnetic shear thickening polishing method of this invention has an elastic substrate fixed to the outside of the polishing tool. When subjected to compression, the substrate undergoes elastic deformation. This elastic deformation, through the fiber layer, causes the "reinforced flexible contouring particle clusters" to tightly adhere to the workpiece surface, achieving efficient and high-precision polishing in specific areas. 2. The multi-layer flexible magnetic shear thickening polishing method of this invention has a fiber layer fixed to the outside of the elastic substrate. This fiber layer is soft and wear-resistant, which reduces the contact resistance between the abrasive and the micro-protrusions on the workpiece surface, improving polishing efficiency and quality, and reducing or even avoiding irreparable damage to the workpiece surface. Attached Figure Description
[0014] Figure 1 Schematic diagram of the polishing principle with the magnetic poles on the inside.
[0015] Figure 2 Schematic diagram of polishing principle with magnetic poles on the outside.
[0016] Figure 3 A schematic diagram of stage one of the polishing process.
[0017] Figure 4 This is a schematic diagram of stage two of the polishing process.
[0018] Figure 5 This is a schematic diagram of stage three of the polishing process.
[0019] Figure 6 This is a schematic diagram of Example 1.
[0020] Figure 7 This is a schematic diagram of Example 2.
[0021] In the figure, 1-magnetic pole, 2-elastic layer A, 3-elastic layer B, 4-fiber layer, 5-magnetic lines of force, 6-workpiece, 7-dispersion medium, 8-dispersed phase, 9-abrasive, 10-magnetic particles, 11-additive, 12-reinforced flexible contouring particle cluster. Detailed Implementation
[0022] Specific implementation method one: Combining Figure 1 , Figure 2 This document details the principle of a multi-layer flexible magnetic shearing thickening and finishing process, characterized by the following features:
[0023] (1) The multi-flexible magnetic shear thickening finishing process uses magnetic pole 1 as the excitation device, magnetic shear thickening medium as the polishing medium, and elastic layer A 2 and elastic layer B 3 as the elastic matrix. Porous fiber is used as fiber layer 4;
[0024] (2) The magnetic pole 1 can be placed at the lower end of the workpiece or inside the tool. The magnetic pole arrangement of the magnetic pole 1 is an NSNS magnetic pole arrangement, forming magnetic lines of force 5 between the polishing areas;
[0025] (3) The magnetic shear-thickening polishing medium comprises a dispersion medium 7, a dispersed phase 8, an abrasive 9, magnetic particles 10, and an additive 11. The dispersion medium 7 is selected from polyethylene glycol, deionized water, vinyl ethanol, or polypropylene glycol; the dispersed phase 8 is selected from silica, hydroxypropyl distarch phosphate, calcium carbonate, or polystyrene; the abrasive 9 is selected from diamond, cubic boron nitride, boron carbide, or tungsten oxide; the magnetic particles 10 are selected from carbonyl iron powder, iron(II,III) oxide, magnetic glass particles, or iron-nickel alloy particles. The additive 11 is selected from alkyl phosphates, carboxylated organic amine salts, polyvinylpyrrolidone, or tetrabutyl titanate.
[0026] (4) The elastic layer A2 is selected from cis-butadiene rubber, butyl rubber or nitrile rubber; the elastic layer B3 is selected from polyurethane elastomer, polyamide elastomer or polyester elastomer; the fiber layer 4 is selected from aromatic polyamide fiber, polybenzimidazole fiber or polybutylene terephthalate fiber.
[0027] Specific Implementation Method Two: Combining Figures 1-5 A detailed description of the multi-flexible magnetic shearing thickening and polishing method of the present invention;
[0028] (1) The fiber layer 4 is immersed in the polishing medium. At this time, the components in the polishing medium are in a dispersed state.
[0029] (2) The elastic layer A2 is fixed on the outer surface of the polishing tool, and the elastic layer B3 is fixed on the elastic layer B3 to form an elastic matrix.
[0030] (3) Fix the impregnated fiber layer 4 onto the elastic matrix, and place the workpiece 6 at the bottom of the fiber layer 4;
[0031] (4) Magnetic particles 10 form different types of "flexible contour particle clusters" under the constraint of the magnetic field, which changes the control over the abrasive.
[0032] (5) When the multi-flexible magnetic shear thickening polishing tool comes into contact with, collides with, squeezes and moves relative to the microscopic surface of the workpiece 6, the "flexible contouring particle cluster" quickly makes flexible contact with the surface of the workpiece 6, and the relative movement stimulates the shear thickening effect of the magnetic shear thickening polishing medium, and the "flexible contouring particle cluster" transforms into "reinforced flexible contouring particle cluster 12". At the same time, the elastic layer A2 and the elastic layer B3 undergo elastic deformation due to the reaction force of collision and squeezing. The elastic deformation acts on the "reinforced flexible contouring particle cluster 12" through the fiber layer 4. The "reinforced flexible contouring particle cluster 12" closely adheres to the surface of the workpiece 6, and the abrasive 9 penetrates into the polishing area under pressure, realizing local contact between the abrasive 9 and the surface of the workpiece 6 and flexible control of pressure.
[0033] Under elastic pressure, the abrasive 9 in the "enhanced flexible contour particle cluster 12" continuously removes the micro-protrusions on the surface of the workpiece 6 until the required polishing is achieved.
[0034] Example 1
[0035] (1) The dispersion medium 7 is polyethylene glycol, the dispersion phase 8 is fumed silica, the abrasive 9 is cubic boron nitride, the magnetic particles 10 are carbonyl iron powder, and the additive 11 is alkyl phosphate. The polyethylene glycol, fumed silica, cubic boron nitride, carbonyl iron powder and alkyl phosphate are prepared into a magnetic shear thickening polishing medium by constant temperature ultrasonic stirring.
[0036] (2) The magnetic pole 1 is an N 52 tile type permanent magnet. The magnetic pole 1 is installed inside the polishing tool A 13 and the magnetic poles are arranged in the NSNS order.
[0037] (3) Elastic layer B3 is made of nitrile rubber and is fixed to the outside of polishing tool A13;
[0038] (4) The fiber layer 4 is made of aromatic polyamide fiber. The fiber layer 4 is immersed in the prepared magnetic shear thickening polishing medium for a period of time.
[0039] (5) The impregnated fiber layer 4 is fixed onto the elastic layer A2. Under the constraint of the magnetic field, the magnetic particles 10 form different types of "flexible contour particle clusters", which changes the control over the abrasive 9;
[0040] (6) Fix the workpiece 6 and move the polishing tool A 13 to make the fiber layer 4 contact the surface of the workpiece 6, so as to realize the collision and extrusion of the micro-protrusion peaks on the surface of the workpiece 6 by the polishing tool A 13.
[0041] (7) Polishing tool A 13 rotates, and the "flexible contour particle cluster" moves relative to the surface of workpiece 6, which stimulates the shear thickening effect of the magnetic shear thickening polishing medium. Under the shear thickening effect, the "flexible contour particle cluster" is transformed into "enhanced flexible contour particle cluster 12". The "enhanced flexible contour particle cluster 12" directly acts on the micro-protrusions on the surface of workpiece 6.
[0042] (8) The elastic layer B3 undergoes elastic deformation under compression. The elastic deformation acts on the "reinforced flexible contour particle cluster 12" through the fiber layer 4, so that the "reinforced flexible contour particle cluster 12" is tightly attached to the surface of the workpiece 6.
[0043] (9) Under elastic pressure, the abrasive 9 in the “reinforced flexible contour particle cluster 12” continuously removes the micro-protrusions on the surface of the workpiece 6 until the required polishing is achieved.
[0044] Example 2
[0045] (1) The dispersion medium 7 is deionized water, the dispersion phase 8 is hydroxypropyl distarch phosphate, the abrasive 9 is diamond, the magnetic particles 10 are carbonyl iron powder, and the additive 11 is polyvinylpyrrolidone. The diamond, carbonyl iron powder, polyethylene glycol, silicon dioxide and polyvinylpyrrolidone are mixed and prepared into a magnetic shear thickening polishing medium by constant temperature ultrasonic stirring.
[0046] (2) The magnetic pole 1 is an N 52 cylindrical permanent magnet. The magnetic pole 1 is installed inside the polishing tool B 14 and is arranged in an NSNS arrangement.
[0047] (3) Elastic layer A2 is made of polyurethane elastomer, and elastic layer B3 is made of butyl rubber. Elastic layer A2 is fixed to the bottom of polishing tool B14. Elastic layer B3 is fixed on elastic layer 2.
[0048] (4) The fiber layer 4 is made of polybenzimidazole fiber, and the fiber layer 4 is immersed in the prepared polishing medium.
[0049] (5) The impregnated fiber layer 4 is fixed onto the elastic layer B 3. The magnetic particles 10 form different types of "flexible contour particle clusters" under the constraint of the magnetic field, which changes the control force on the abrasive 9.
[0050] (6) Fix the workpiece 6 and move the polishing tool B 14 to make the fiber layer 4 come into contact with the surface of the workpiece 6.
[0051] (7) Polishing tool B 14 rotates, and the "flexible contour particle cluster" moves relative to the workpiece surface, thereby causing the magnetic shear thickening polishing medium to have a shear thickening effect, and the "flexible contour particle cluster" is transformed into "enhanced flexible contour particle cluster 12".
[0052] (8) The elastic matrix undergoes elastic deformation under compression, and the elastic deformation acts on the "reinforced flexible contour particle cluster 12" through the fiber layer 4.
[0053] Under elastic pressure, the abrasive 9 in the "enhanced flexible contour particle cluster 12" continuously removes the micro-protrusions on the surface of the workpiece 6 until the required polishing is achieved.
[0054] The specific embodiments described above are merely illustrative or explanatory of the principles of the present invention and do not constitute a limitation on the scope of protection of the present invention. Therefore, any modifications, alterations, equivalent substitutions, equivalent structures, and equivalent process changes made to the present invention without departing from the principles and scope of protection described herein should be covered within the scope of protection of the present invention.
Claims
1. A multi-functional flexible magnetic shearing thickening and polishing method, characterized in that: The method is implemented through the following steps: (1) The multi-flexible magnetic shear thickening polishing tool is composed of an elastic matrix, a fiber layer (4) and magnetic poles (1) with different polarity configurations. The elastic matrix includes an elastic layer A (2), an elastic layer B (3) or a combination of an elastic layer A (2) and an elastic layer B (3). The elastic layer A (2) includes a polyurethane elastomer, a polyamide elastomer or a polyester elastomer. The elastic layer B (3) includes cis-butadiene rubber, butyl rubber or nitrile rubber. The fiber layer includes aromatic polyamide fiber, polybenzimidazole fiber or polybutylene terephthalate fiber. The magnetic poles (1) with different polarity configurations are selected from SNSN, SNNS or NNSS and can be placed on the upper end of the elastic matrix or the lower end of the workpiece. (2) The magnetic shear thickening polishing medium is impregnated in the fiber layer (4). The magnetic shear thickening polishing medium is composed of a dispersion medium (7), a dispersion phase (8), abrasive (9), magnetic particles (10) and additives (11). It is prepared by constant temperature ultrasonic mechanical stirring. The dispersion medium (7) is selected from polyethylene glycol, deionized water, vinyl ethanol or polypropylene glycol; the dispersion phase (8) is selected from silicon dioxide, hydroxypropyl distarch phosphate, calcium carbonate or polystyrene; the abrasive (9) is selected from diamond, cubic boron nitride, boron carbide or tungsten oxide; the magnetic particles (10) are selected from carbonyl iron powder, iron(II,III) oxide, magnetic glass particles or iron-nickel alloy particles; the additives (11) are selected from alkyl phosphate, carboxylic organic amine salt, polyvinylpyrrolidone, titanate butyl ester. (3) Adjust the distribution and polarity of the magnetic poles (1) of the multi-flexible magnetic shearing thickening polishing tool, change the distribution of magnetic field lines (5) and magnetic pole circuit in the polishing area, adjust the constraint effect of the magnetic field on the magnetic particles (10), form different types of "flexible contour particle clusters", and change the control force on the abrasive (9). (4) When the polishing system drives the multiple flexible magnetic shear thickening polishing tool to contact, collide, squeeze and move relative to the surface of the workpiece (6), the "flexible contour particle cluster" quickly makes flexible contact with the surface of the workpiece, and the relative movement stimulates the shear thickening effect of the magnetic shear thickening polishing medium. The "flexible contour particle cluster" is transformed into "enhanced flexible contour particle cluster (12)". At the same time, the elastic matrix undergoes elastic deformation due to the reaction force of collision and squeezing. The elastic deformation acts on the "enhanced flexible contour particle cluster (12)" through the fiber layer (4), so that the "enhanced flexible contour particle cluster (12)" fits tightly to the surface of the workpiece and enhances the control of the abrasive (9). (5) Under elastic pressure, the abrasive (9) in the "enhanced flexible contour particle cluster (12)" continuously removes the micro-protrusions on the surface of the workpiece (6) until the required polishing is achieved.
2. The multi-flexible magnetic shear thickening and polishing method according to claim 1, characterized in that: The elastic modulus of the elastic layer A (2) is higher than that of the elastic layer B (3). Under the action of collision and compression, the elastic layer A (2) has a rapid elastic response capability, and the elastic layer B (3) has flexibility and plasticity. The fiber layer (4) has the characteristics of softness and wear resistance, which reduces the contact resistance between the abrasive (9) and the micro-protrusions on the surface of the workpiece (6), and improves polishing efficiency and accuracy.