一种抗反射无机纳米涂层的制备方法和应用

By forming covalent bonds in inorganic nano-coatings through low-temperature plasma treatment technology, the problem of poor mechanical stability of sol-gel coatings is solved, resulting in an anti-reflective coating with high mechanical properties and high light transmittance, suitable for temperature-sensitive substrates such as solar photovoltaic panels.

CN118515997BActive Publication Date: 2026-07-17GUANGDONG UNIV OF TECH +1

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
GUANGDONG UNIV OF TECH
Filing Date
2024-05-24
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Antireflective coatings prepared by existing sol-gel methods have poor mechanical stability at room temperature, while high-temperature curing methods can damage temperature-sensitive substrates, such as solar photovoltaic panels.

Method used

Low-temperature plasma treatment technology is used to cure inorganic nano-coatings at low temperatures, forming Si-O-Si or Ti-O-Ti covalent bonds, which improves the mechanical durability and hardness of the coating and shortens the curing time.

Benefits of technology

A high-mechanical-performance anti-reflective coating was prepared at low temperatures. It features simple process, short operation time, wide applicability, energy saving and environmental protection, and low cost. It is suitable for various glass products and films, and improves light transmittance and anti-reflective ability.

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Abstract

本发明公开了一种抗反射无机纳米涂层的制备方法和应用,所述无机纳米涂层的制备方法,采用低温等离子体使溶胶凝胶法制备得到的无机纳米颗粒交联固化,得到无机纳米涂层。本发明通过低温等离子处理技术在低温下固化无机纳米涂层,解决溶胶凝胶法在常温下制备抗反射涂层机械稳定性差的缺点。涂层中的硅羟基或钛羟基在低温等离子的干涉下进一步缩合形成了比范德华力更加稳定的Si‑O‑Si或Si‑O‑Ti或Ti‑O‑Ti共价键,大幅提高了抗反射涂层的硬度和机械耐久性,极大缩短了涂层的固化时间,同时解决了现有溶胶凝胶室温固化抗反射涂层机械性能差的难题。不仅如此,本发明制备的无机纳米抗反射涂层具有高孔隙率、低折射率和优异的抗反射性能。
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