一种高纯多晶硅块清洗方法及其装置
By using a gradient acid replacement method and measuring the etching thickness of silicon blocks with regular surface shapes, the problem of uneven etching and waste caused by the decrease in the concentration of mixed acid solution was solved, achieving efficient and uniform cleaning of polycrystalline silicon blocks, thus improving product quality and production efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- JIANGSU XINHUA SEMICON TECH CO LTD
- Filing Date
- 2024-05-31
- Publication Date
- 2026-07-17
AI Technical Summary
In existing technologies, the effective concentration of the mixed acid solution decreases during the cleaning process of high-purity polycrystalline silicon blocks, resulting in uneven etching, discoloration, and significant waste of the mixed acid solution, which affects product quality and production efficiency.
A gradient acid replacement method from high to low is adopted. Several sets of initial cleaning solutions with progressively decreasing mass ratios of hydrofluoric acid and nitric acid are prepared and recycled. The timing of acid replacement is determined by detecting the etching thickness of silicon blocks with regular surface shapes to ensure that the acid concentration meets the etching requirements.
This method achieves uniform etching of the silicon block surface, avoids acid waste, improves product quality and production efficiency, and reduces the negative impact of equipment costs and testing errors.
Smart Images
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