A urea prilling tail gas cleaning device

Abstract

The application discloses a urea granulation tail gas cleaning treatment device and relates to the technical field of urea production equipment. The device comprises a fixing base, an outer water bath wire mesh and an inner water bath wire mesh are welded at the bottom of the fixing base, a base is connected to the bottom of the outer water bath wire mesh and the inner water bath wire mesh, an annular groove is formed at the top of the fixing base, an annular top plate is arranged at the top of the annular groove, a mounting frame is connected to the annular top plate, a plurality of plasma mist eliminators are arranged on the mounting frame, an absorption cylinder is arranged at the bottom of the fixing base, a liquid collecting bin is arranged in the absorption cylinder, a plurality of air inlet bends are connected to the bottom of the liquid collecting bin, exhaust discs are connected to the other ends of the air inlet bends, an exhaust cavity is arranged in the exhaust disc, a plurality of exhaust holes are arranged in a matrix at the top of the exhaust cavity, ammonia water is stored in the absorption cylinder and the liquid collecting bin to further absorb the urea granulation tail gas, ammonia water absorption is increased after water washing, tail gas dust and ammonia are fully purified, the purification effect is optimized, and the purification efficiency is improved.

Description

Technical Field

[0001] This invention relates to the field of urea production equipment technology, specifically to a urea granulation tail gas purification treatment device. Background Technology

[0002] The exhaust gas emitted from the urea granulation tower contains a certain amount of urea dust and ammonia. Direct discharge into the atmosphere not only causes air pollution and harms the ecological environment, but also wastes resources. Furthermore, the exhaust gas emitted from the urea granulation tower, mixed with water vapor, forms a "white" trail, causing visual pollution.

[0003] Traditional urea granulation tower tail gas treatment methods include wet scrubbing and dry baghouse dust collection. Wet scrubbing typically uses sprayed water to wash the tail gas; however, insufficient gas-liquid contact allows dissolved ammonia to be easily "lifted" out and return to the tail gas, resulting in unsatisfactory purification of urea dust and ammonia in the treated tail gas, failing to consistently meet standards, and exhibiting a noticeable "white" tailing effect. Dry baghouse dust collection, while offering high resistance as the tail gas passes through the filter bags and achieving dust compliance without the "white" tailing effect, cannot purify the ammonia in the tail gas.

[0004] In view of this, Chinese patent (CN220834752U) discloses a novel deep purification device for urea granulation tower exhaust gas. After the exhaust gas is discharged from the urea granulation tower through the louvers, it will pass through a primary water film formed by a primary water bath wire mesh and a secondary water film formed by a secondary water bath wire mesh, as well as several plasma demisters. The primary and secondary water films wash the urea dust and ammonia in the exhaust gas. After the dual-stage washing, the dust and ammonia in the exhaust gas meet the standards, and the "white" trailing effect is eliminated.

[0005] However, the above solution still has the problem that when the ammonia concentration in the exhaust gas is high, the contact time between ammonia and water film is limited by only primary and secondary water film washing, and the instantaneous solubility of water film is limited, so ammonia in the exhaust gas cannot be fully absorbed, resulting in an unsatisfactory purification effect. Summary of the Invention

[0006] The purpose of this invention is to provide a urea granulation tail gas purification treatment device. By setting up an absorption cylinder and a collection chamber to hold ammonia water, the device further absorbs and treats the urea granulation tail gas, thereby solving the problem that when the ammonia concentration in the tail gas is high, the contact time between ammonia gas and water film is limited, and the instantaneous solubility of the water film is limited, so that ammonia in the tail gas cannot be fully absorbed, resulting in an unsatisfactory purification effect.

[0007] The objective of this invention can be achieved through the following technical solutions:

[0008] A urea granulation tail gas purification treatment device includes a fixed base. An outer water bath wire mesh and an inner water bath wire mesh are welded to the bottom of the fixed base. The bottom of the outer water bath wire mesh and the inner water bath wire mesh are connected to a base. The outer water bath wire mesh and the inner water bath wire mesh are both cylindrical, and the inner water bath wire mesh is located inside the outer water bath wire mesh. An annular groove is opened on the top of the fixed base. An annular top plate is provided on the top of the annular groove. An installation frame is connected to the annular top plate. Multiple plasma demisters are provided on the installation frame.

[0009] A gate ring is provided in the middle of the annular groove, which divides the annular groove into an outer annular groove and an inner annular groove. Control cylinders are symmetrically arranged on both sides of the top of the annular top plate. The top of the telescopic rod of the control cylinder is connected to a connecting plate, and the other end of the connecting plate is connected to the top of the gate ring.

[0010] Multiple first nozzles are arranged around the bottom of the outer ring groove and around the outer water bath wire mesh, and multiple second nozzles are arranged around the bottom of the inner ring groove and around the inner water bath wire mesh. The first and second nozzles can spray clean water to form a water film on the surface of the outer and inner water bath wire mesh.

[0011] As a further embodiment of the present invention: an absorption cylinder is provided at the bottom of the fixed base, a liquid collection chamber is provided inside the absorption cylinder, the liquid collection chamber passes through the fixed base and communicates with the outside, multiple air inlet bends are connected to the bottom of the liquid collection chamber, and an exhaust plate is connected to the other end of the multiple air inlet bends. An exhaust chamber is provided inside the exhaust plate, and multiple exhaust holes are distributed in a matrix at the top of the exhaust chamber.

[0012] As a further aspect of the present invention: multiple air inlet bends are distributed in a rotating manner around the vertical center line of the liquid collection tank, and the rotation angles are equal.

[0013] As a further aspect of the present invention: a first waste liquid tank and a second waste liquid tank are provided on the top of the base, wherein both the first waste liquid tank and the second waste liquid tank are annular, and the first waste liquid tank is located on the outer side and outside the outer water bath wire mesh, and the second waste liquid tank is located between the inner water bath wire mesh and the outer water bath wire mesh. An outer cylinder is provided in the middle of the base, and an installation cavity is provided inside the outer cylinder. A positioning boss is provided in the middle of the bottom of the installation cavity, and an installation circular groove is provided in the middle of the bottom of the absorption cylinder. The positioning boss and the installation circular groove are sealed and adapted.

[0014] As a further aspect of the present invention: the top surface of the outer end of the first waste liquid tank is higher than the top surface of the second waste liquid tank.

[0015] As a further aspect of the present invention: the outer cylinder and the absorption cylinder cooperate to form an air passage, and the air passage is connected to the air inlet bend.

[0016] As a further aspect of the present invention: an inlet pipe and a drain pipe are installed in the positioning boss, and the inlet pipe and the drain pipe face opposite directions. One end of the first waste liquid tank is connected to a drain pipe, and the bottom of the second waste liquid tank is connected to a drain pipe.

[0017] As a further aspect of the present invention: an overflow trough is provided on the top of the base, and the height of the top of the overflow trough is lower than the height of the top surface of the second waste liquid trough.

[0018] As a further aspect of the present invention: a cooling assembly is provided inside the fixed base, the cooling assembly includes a cooling ring, and mounting rings are symmetrically arranged on the upper and lower sides of the cooling ring. The cooling ring is rotatably mounted on the fixed base through the mounting rings. A cooling wire mesh is provided in the middle of the cooling ring, and multiple rotatingly distributed arc plates are provided on the outer side of the cooling ring.

[0019] As a further aspect of the present invention: an assembly groove is provided inside the fixed base, and inner connecting pipes are installed on both sides of the fixed base near the assembly groove. Outer connecting pipes are installed on both sides of the fixed base away from the assembly groove. An air inlet hose is connected between the inner connecting pipe and the outer connecting pipe on one side, and an air outlet hose is connected between the inner connecting pipe and the outer connecting pipe on the other side. Both the air inlet hose and the air outlet hose pass through the gate ring.

[0020] The beneficial effects of this invention are:

[0021] 1. This invention further absorbs and treats the tail gas from urea granulation by setting up an absorption cylinder and a collection chamber to hold ammonia water. After water washing, the ammonia water absorption is increased, which fully purifies the tail gas dust and ammonia, optimizes the purification effect, and improves the purification efficiency.

[0022] 2. This invention controls the water inlet of the outer and inner ring grooves by controlling the cylinder to drive the gate ring to rise and fall. Furthermore, a water inlet pipe is connected to the annular top plate. One end of the water inlet pipe passes through the annular top plate and connects to the outer ring groove, while the other end connects to an external water source. By controlling the position of the gate ring, it is possible to adjust whether a water film is formed on the surface of the inner water bath wire mesh to perform multi-stage water washing and adapt to the tail gas purification treatment with different ammonia concentrations.

[0023] 3. The present invention forms an air passage through the cooperation between the outer cylinder and the absorption cylinder, so that the exhaust gas washed by the outer water bath wire mesh and the inner water bath wire mesh can enter the collection chamber for further treatment. The ammonia water level in the collection chamber is lower than the bottom of the inlet bend, so as to avoid ammonia water backflow into the air passage and affect the exhaust gas entry.

[0024] 4. This invention introduces cold air into the external connecting pipe on one side of the air inlet hose via a cooler. The cold air is then sprayed out into the assembly slot through the internal connecting pipe on the same side. The sprayed cold air blows the arc plate, causing the cooling ring to rotate. At the same time, the cold air and the cooling ring exchange heat, carrying away heat. The cooling ring drives the cooling mesh to rotate. On the one hand, the rotating cooling mesh further increases the contact area with water vapor, forming a physical barrier. On the other hand, the cooling mesh exchanges heat with water vapor, causing water vapor to liquefy and accumulate on the cooling mesh and drip down. The heat of the cooling mesh is carried away by the cold air that drives the cooling mesh to rotate from the outside, reducing the "white" trailing phenomenon. Combined with a plasma demister, the "white" trailing phenomenon is completely solved. Attached Figure Description

[0025] The invention will now be further described with reference to the accompanying drawings.

[0026] Figure 1 This is a schematic diagram of the overall internal structure of the present invention;

[0027] Figure 2 This is a top view of the cooling assembly of the present invention;

[0028] Figure 3 This is a schematic diagram of the connection structure between the liquid collection tank and the air inlet bend of the present invention;

[0029] Figure 4 This is a schematic diagram of the connection structure between the gate ring and the air inlet hose and the air outlet hose of the present invention;

[0030] Figure 5 yes Figure 3 Enlarged structural diagram of region A in the middle;

[0031] Figure 6 This is a schematic diagram of the internal structure of the base of the present invention.

[0032] In the diagram: 1. Fixed base; 2. Outer water bath wire mesh; 3. Inner water bath wire mesh; 4. Base; 5. Annular top plate; 6. Cooling assembly; 7. Control cylinder; 8. Gate ring; 9. Connecting plate; 10. Water inlet pipe; 11. Outer annular groove; 12. Inner annular groove; 13. Sealing groove; 14. Absorption cylinder; 15. Liquid collection tank; 16. Air inlet bend; 17. Mounting groove; 18. Exhaust plate; 19. Inner connecting pipe; 20. Outer connecting pipe; 21. First nozzle; 22. Second nozzle; 23. First waste liquid tank; 24. Second waste liquid tank; 25. Positioning boss; 26. Drain pipe one; 27. Drain pipe two; 28. Overflow tank; 29. ​​Outer cylinder; 30. Inlet pipe; 31. Drain pipe three; 32. Air passage; 33. Assembly slot; 61. Cooling ring; 62. Cooling wire mesh; 63. Mounting ring; 64. Arc plate; 81. Inlet air hose; 82. Outlet air hose. Detailed Implementation

[0033] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0034] The present invention is as follows Figures 1-6As shown, a urea granulation tail gas purification treatment device is designed. By setting up an absorption cylinder 14 and a liquid collection chamber 15 to hold ammonia water, the urea granulation tail gas is further absorbed and treated. After water washing, the ammonia water absorption is increased to fully purify the tail gas dust and ammonia, optimize the purification effect, and improve the purification efficiency.

[0035] Example 1

[0036] like Figure 1 As shown, the exhaust gas purification treatment device includes a fixed base 1 installed on the top of the urea granulation tower. An outer water bath wire mesh 2 and an inner water bath wire mesh 3 are welded to the bottom of the fixed base 1. Both the outer water bath wire mesh 2 and the inner water bath wire mesh 3 are cylindrical, and the inner water bath wire mesh 3 is located inside the outer water bath wire mesh 2. A base 4 is connected to the bottom of the outer water bath wire mesh 2 and the inner water bath wire mesh 3. The base 4 is also welded to the outer water bath wire mesh 2 and the inner water bath wire mesh 3. Furthermore, an annular top plate 5 is provided on the top of the fixed base 1. An installation frame is connected to the annular top plate 5. Multiple plasma demisters are provided on the installation frame to effectively condense droplets in the exhaust gas, thereby solving the "white" trailing phenomenon.

[0037] Further, such as Figure 1 and Figure 3 As shown, the top of the aforementioned fixing base 1 has an annular groove, and a gate ring 8 is provided in the middle of the annular groove. The gate ring 8 divides the annular groove into an outer annular groove 11 and an inner annular groove 12. A sealing groove 13 is provided on the bottom surface of the middle of the annular groove. The bottom of the gate ring 8 is sealed and adapted to the sealing groove 13. An annular top plate 5 is provided at the top of the annular groove to seal the annular groove. The gate ring 8 is provided through the annular top plate 5. Furthermore, multiple first nozzles 21 are provided at equal intervals around the outer water bath mesh 2 at the bottom of the outer annular groove 11, and multiple second nozzles 22 are provided at equal intervals around the inner water bath mesh 3 at the bottom of the inner annular groove 12. The first nozzles 21 and the second nozzles 22 can spray clean water onto the outer water bath mesh 2 and the inner water bath mesh 3. A water film forms on the surface of the wire mesh 3 to purify dust and ammonia in the exhaust gas. Furthermore, control cylinders 7 are symmetrically arranged on both sides of the top of the annular top plate 5. Connecting plates 9 are connected to the top of the telescopic rods of the control cylinders 7. The other end of the multiple connecting plates 9 is connected to the top of the gate ring 8. The control cylinders 7 drive the gate ring 8 to rise and fall, thereby controlling the water inlet of the outer ring groove 11 and the inner ring groove 12. Furthermore, a water inlet pipe 10 is connected to the annular top plate 5. One end of the water inlet pipe 10 passes through the annular top plate 5 and connects to the outer ring groove 11, while the other end is connected to an external water source. By controlling the position of the gate ring 8, the formation of a water film on the surface of the inner water bath wire mesh 3 is adjusted to perform multi-stage water washing, adapting to exhaust gas purification treatment with different ammonia concentrations.

[0038] Furthermore, the bottom of the fixed base 1 is provided with an absorption cylinder 14, and the absorption cylinder 14 is provided with a liquid collection chamber 15. The liquid collection chamber 15 passes through the fixed base 1 and communicates with the outside. The plasma demister is located directly above the liquid collection chamber 15. Multiple air inlet bends 16 are connected to the bottom of the liquid collection chamber 15. The multiple air inlet bends 16 are rotated around the vertical center line of the liquid collection chamber 15 and the rotation angles are equal. The other end of the multiple air inlet bends 16 is connected to an exhaust plate 18. An exhaust chamber is provided inside the exhaust plate 18. The multiple air inlet bends 16 are all connected to the exhaust chamber. Multiple exhaust holes are distributed in a matrix at the top of the exhaust chamber. The exhaust gas enters the exhaust chamber through the multiple air inlet bends 16 and then exits from the exhaust holes. The liquid collection chamber 15 contains ammonia water of appropriate concentration to absorb the ammonia in the exhaust gas and fully purify the ammonia in the exhaust gas. The bottom center of the absorption cylinder 14 is provided with an installation groove 17 that is adapted to the positioning boss 25 in the base 4 for installation.

[0039] Further, such as Figure 6 As shown, the top of the base 4 is provided with a first waste liquid tank 23 and a second waste liquid tank 24. Both the first waste liquid tank 23 and the second waste liquid tank 24 are annular, with the first waste liquid tank 23 located on the outer side and outside the outer water bath mesh 2. The second waste liquid tank 24 is located between the inner water bath mesh 3 and the outer water bath mesh 2, and the top surface of the outer end of the first waste liquid tank 23 is higher than the top surface of the second waste liquid tank 24. Waste liquid generated during multi-stage water film washing overflows from the corresponding first waste liquid tank 23 or second waste liquid tank 24.

[0040] Furthermore, an outer cylinder 29 is provided in the middle of the base 4. The outer axial surface of the outer cylinder 29 is inclined upward to further promote the upward movement of the washed exhaust gas into the air passage 32. An installation cavity is provided inside the outer cylinder 29. The inner diameter of the installation cavity is larger than the outer diameter of the absorption cylinder 14. A positioning boss 25 is provided in the middle of the bottom of the installation cavity. The positioning boss 25 is sealed and adapted to the installation groove 17. An inlet pipe 30 and a drain pipe 31 are installed in the positioning boss 25. The inlet pipe 30 and the drain pipe 31 face opposite directions. Electromagnetic devices are provided in both the inlet pipe 30 and the drain pipe 31. A valve controls the inflow and outflow of the absorbent liquid (ammonia water of appropriate concentration, set according to the ammonia content in the exhaust gas). One end of the first waste liquid tank 23 is connected to a drain pipe 26, and the other end of the drain pipe 26 is connected to a urea recovery tank. The bottom of the second waste liquid tank 24 is connected to a drain pipe 27, which is connected to an ammonia water preparation tank. The ammonia water preparation tank is used to prepare the absorbent liquid in the collection chamber 15, and the ammonia water preparation tank is connected to the inlet pipe 30 to input ammonia water of appropriate concentration into the collection chamber 15. Furthermore, both the drain pipe 26 and the drain pipe 27 are equipped with solenoid valves for control of opening and closing.

[0041] More details such as Figure 1As shown, the bottom end of the external water bath wire mesh 2 is welded to the boss located between the first waste liquid tank 23 and the second waste liquid tank 24. The boss has an overflow trough 28 at its outer end. The top of the overflow trough 28 is lower than the top surface of the second waste liquid tank 24. Clean water is retained in the overflow trough 28 to form a stable water film, thus avoiding the phenomenon of flow interruption or splashing.

[0042] Furthermore, the top surface of the outer cylinder 29 is lower than the top surface of the inner water bath wire mesh 3. The outer cylinder 29 and the absorption cylinder 14 cooperate to form an air passage 32, so that the exhaust gas washed by the outer water bath wire mesh 2 and the inner water bath wire mesh 3 can enter the collection chamber 15 for further treatment. The ammonia water level in the collection chamber 15 is lower than the bottom of the bend of the air inlet bend 16 to prevent ammonia water from flowing back into the air passage 32 and affecting the exhaust gas entry.

[0043] When in use, the device is installed at the top of the urea granulation tower. Drainage pipes 26 and 27 are connected through the urea granulation tower to the external urea recovery tank and ammonia preparation tank, respectively. Water is supplied through the inlet pipe 10 into the outer annular tank 11, where multiple annularly distributed first nozzles 21 spray onto the outer water bath mesh 2, forming a primary water film. The exhaust gas exiting the urea granulation tower passes through the primary water film, thus washing away the urea dust and ammonia in the exhaust gas. The washed exhaust gas then passes through the inner water bath mesh 3, is guided by the outer cylinder 29, and enters the inlet bend pipe through the gas duct 32. 16. The exhaust gas is discharged from the exhaust plate 18 and is absorbed and treated by the absorbent liquid inside the collection tank 15 to ensure that the ammonia in the exhaust gas meets the standard. At the same time, the urea dust is treated by the primary water film washing to meet the standard. The exhaust gas after being washed by the primary water film and absorbed by the absorbent liquid will carry a large amount of water vapor due to heat exchange, forming a "white" trail. At this time, the plasma demister can effectively condense the droplets in the exhaust gas, thereby solving the "white" trail phenomenon. The waste liquid after washing will flow into the first waste liquid tank 23 and be discharged into the urea recovery tank through the drain pipe 26. When the urea reaches a certain concentration, it will be recycled.

[0044] When the ammonia concentration in the exhaust gas is high, the device is installed at the top of the urea granulation tower. Drainage pipes 26 and 27 are connected through the urea granulation tower to the external urea recovery tank and ammonia preparation tank, respectively. The control cylinder 7 is activated, causing the gate ring 8 to rise and connect the outer annular groove 11 and the inner annular groove 12. Then, a water source is connected, and clean water is introduced into the outer annular groove 11 and the inner annular groove 12 through the water inlet pipe 10. Multiple first nozzles 21 and second nozzles 22, distributed in a ring, spray onto the outer water bath mesh 2 and the inner water bath mesh 3, forming a primary water film and a secondary water film. The exhaust gas is discharged from the urea granulation tower body, passing through the primary and secondary water films, thus washing away the urea dust and ammonia in the exhaust gas. The washed exhaust gas is guided through the outer cylinder 29 and enters the inlet bend pipe through the air passage 32. 16. The exhaust gas is discharged from the exhaust plate 18 and treated by the absorbent liquid inside the collection tank 15 to ensure that the ammonia in the exhaust gas meets the standard. At the same time, the urea dust is treated by two-stage washing to meet the standard. Due to heat exchange, the exhaust gas after two-stage washing and absorption by the absorbent liquid will carry a large amount of water vapor, forming a "white" trail. At this time, the plasma demister can effectively condense the droplets in the exhaust gas, thereby solving the "white" trail phenomenon. The waste liquid after the first-stage water film washing will flow into the first waste liquid tank 23 and be discharged into the urea recovery tank through the drain pipe 26. When the urea reaches a certain concentration, it will be recycled. The waste liquid after the second-stage water film washing will flow into the second waste liquid tank 24 and be discharged into the ammonia water preparation tank through the drain pipe 27. The absorbent liquid of appropriate concentration is prepared and transported to the collection tank 15 for replacement.

[0045] In the above scheme, the primary or secondary washing can be controlled by the position of the gate ring 8, which facilitates the full treatment of tail gas with different ammonia concentrations. Furthermore, the waste liquid after the secondary water film treatment contains a certain concentration of ammonia and can be further recycled, thus saving resources.

[0046] Example 2

[0047] To address the issue of "white" trailing caused by the exhaust gas carrying more water vapor after washing and absorption treatment when ammonia concentration is high, this embodiment, based on embodiment 1, includes a cooling component 6 inside the fixed base 1. The cooling component 6 cools and blocks water vapor, effectively resolving the "white" trailing phenomenon in conjunction with the plasma demister.

[0048] like Figures 1-5As shown, the aforementioned cooling assembly 6 includes a cooling ring 61 rotatably mounted in an assembly groove 33 inside the fixed base 1. Mounting rings 63 are symmetrically arranged on the upper and lower sides of the cooling ring 61. The cooling ring 61 is rotatably mounted in the assembly groove 33 via the mounting rings 63. A cooling mesh 62 is provided in the center of the cooling ring 61, corresponding to the position of the liquid collection chamber 15. Multiple rotatingly distributed arc plates 64 are provided on the outer side of the cooling ring 61, with the arc plates 64 distributed around the center of the cooling ring 61. Furthermore, internal connecting pipes 19 are installed on both sides of the fixed base 1 near the assembly groove 33, and external connecting pipes 20 are installed on both sides of the fixed base 1 away from the assembly groove 33. An air inlet hose 81 connects the internal connecting pipe 19 and the external connecting pipe 20 on one side, and an air outlet hose 82 connects the internal connecting pipe 19 and the external connecting pipe 20 on the other side. Both the air inlet hose 81 and the air outlet hose 82 pass through a gate ring 8 (e.g., Figure 4 As shown), further as Figure 2 As shown, the air inlet hose 81 is connected to an external air conditioner. Cold air is introduced into the external connecting pipe 20 on one side of the air inlet hose 81 through the air conditioner. The cold air is sprayed out into the assembly slot 33 through the internal connecting pipe 19 on the same side. The sprayed cold air blows the arc plate 64, causing the cooling ring 61 to rotate. At the same time, the cold air and the cooling ring 61 exchange heat, carrying away heat. The cooling ring 61 drives the cooling wire mesh 62 to rotate. On the one hand, the rotating cooling wire mesh 62 further increases the contact area with water vapor, forming a physical barrier. On the other hand, the cooling wire mesh 62 exchanges heat with water vapor, causing water vapor to liquefy and accumulate on the cooling wire mesh 62 and drip down. The heat of the cooling wire mesh 62 is carried away by the cold air that drives the cooling wire mesh 62 to rotate from the outside, reducing the "white" trailing phenomenon. Combined with the plasma demister, the "white" trailing phenomenon is completely solved.

[0049] In the description of this invention, it should be understood that the terms "upper," "lower," "left," and "right," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or a specific orientational structure and operation. Therefore, they should not be construed as limitations on the invention. Furthermore, "first" and "second" are only for descriptive purposes and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "multiple" means two or more.

[0050] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0051] The foregoing has provided a detailed description of one embodiment of the present invention, but this description is merely a preferred embodiment and should not be construed as limiting the scope of the invention. All equivalent variations and modifications made within the scope of the claims of this invention should still fall within the patent coverage of this invention.

Claims

1. A device for purifying urea granulation tail gas, characterized in that, Includes a fixed base (1), with an outer water bath wire mesh (2) and an inner water bath wire mesh (3) welded to the bottom of the fixed base (1). The bottom of the outer water bath wire mesh (2) and the inner water bath wire mesh (3) are connected to a base (4). The outer water bath wire mesh (2) and the inner water bath wire mesh (3) are both cylindrical, and the inner water bath wire mesh (3) is located inside the outer water bath wire mesh (2). The top of the fixed base (1) is provided with an annular groove, and an annular top plate (5) is provided on the top of the annular groove. An installation frame is connected to the annular top plate (5), and multiple plasma demisters are provided on the installation frame. A gate ring (8) is provided in the middle of the annular groove. The gate ring (8) divides the annular groove into an outer annular groove (11) and an inner annular groove (12). Control cylinders (7) are symmetrically arranged on both sides of the top of the annular top plate (5). The top of the telescopic rod of the control cylinder (7) is connected to a connecting plate (9). The other end of the connecting plate (9) is connected to the top of the gate ring (8). The bottom of the outer ring groove (11) is provided with multiple first nozzles (21) surrounding the outer water bath wire mesh (2), and the bottom of the inner ring groove (12) is provided with multiple second nozzles (22) surrounding the inner water bath wire mesh (3). The first nozzles (21) and the second nozzles (22) can spray clean water to form a water film on the surface of the outer water bath wire mesh (2) and the inner water bath wire mesh (3). The fixed base (1) is equipped with a cooling assembly (6), which includes a cooling ring (61). The cooling ring (61) is symmetrically provided with mounting rings (63) on its upper and lower sides. The cooling ring (61) is rotatably mounted on the fixed base (1) through the mounting rings (63). A cooling wire mesh (62) is provided in the middle of the cooling ring (61), and multiple rotating arc plates (64) are provided on the outer side of the cooling ring (61). The fixed base (1) has an assembly groove (33) inside. The fixed base (1) has an inner connecting pipe (19) installed on both sides near the assembly groove (33) and an outer connecting pipe (20) installed on both sides away from the assembly groove (33) outside. An air inlet hose (81) is connected between the inner connecting pipe (19) and the outer connecting pipe (20) on one side, and an air outlet hose (82) is connected between the inner connecting pipe (19) and the outer connecting pipe (20) on the other side. Both the air inlet hose (81) and the air outlet hose (82) pass through the gate ring (8). The cooling ring (61) is rotatably installed in the assembly slot (33) via the mounting ring (63), and the air inlet hose (81) is connected to the external air conditioner.

2. The urea granulation tail gas purification treatment device according to claim 1, characterized in that, The bottom of the fixed base (1) is provided with an absorption cylinder (14), and the inside of the absorption cylinder (14) is provided with a liquid collection chamber (15). The liquid collection chamber (15) passes through the fixed base (1) and communicates with the outside. The bottom of the liquid collection chamber (15) is connected to multiple air inlet bends (16). The other end of the multiple air inlet bends (16) is connected to an exhaust plate (18). The exhaust plate (18) is provided with an exhaust chamber. The top of the exhaust chamber has multiple exhaust holes distributed in a matrix.

3. The urea granulation tail gas purification treatment device according to claim 2, characterized in that, Multiple air intake bends (16) are distributed in a rotating manner around the vertical center line of the liquid collection tank (15), and the rotation angles are equal.

4. The urea granulation tail gas purification treatment device according to claim 2, characterized in that, The base (4) has a first waste liquid tank (23) and a second waste liquid tank (24) on its top. The first waste liquid tank (23) and the second waste liquid tank (24) are both annular. The first waste liquid tank (23) is located on the outside and on the outside of the outer water bath wire mesh (2). The second waste liquid tank (24) is located between the inner water bath wire mesh (3) and the outer water bath wire mesh (2). The base (4) has an outer cylinder (29) in the middle. The outer cylinder (29) has an installation cavity inside. The bottom of the installation cavity has a positioning boss (25) in the middle. The bottom of the absorption cylinder (14) has an installation groove (17) in the middle. The positioning boss (25) and the installation groove (17) are sealed and matched.

5. The urea granulation tail gas purification treatment device according to claim 4, characterized in that, The top surface of the outer end of the first waste liquid tank (23) is higher than the top surface of the second waste liquid tank (24).

6. The urea granulation tail gas purification treatment device according to claim 4, characterized in that, The outer cylinder (29) and the absorption cylinder (14) cooperate to form an air passage (32), which is connected to the air inlet bend (16).

7. The urea granulation tail gas purification device according to claim 4, characterized in that, The positioning boss (25) is equipped with an inlet pipe (30) and a drain pipe (31), and the inlet pipe (30) and the drain pipe (31) face opposite directions. One end of the first waste liquid tank (23) is connected to a drain pipe (26), and the bottom of the second waste liquid tank (24) is connected to a drain pipe (27).

8. The urea granulation tail gas purification treatment device according to claim 4, characterized in that, The top of the base (4) is provided with an overflow trough (28), and the height of the top of the overflow trough (28) is lower than the height of the top surface of the second waste liquid trough (24).

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