Sputtering target cleaning apparatus and method
By designing an automated sputtering target cleaning device that combines multiple cleaning methods such as soaking, grinding, and wiping, the problem of needing to manually grind and clean the target in existing technologies has been solved, achieving efficient and safe sputtering target cleaning and reducing labor costs.
CN118698969BActive Publication Date: 2026-07-14OPTICAL MICRO SEMICON MATERIALS (NINGBO) CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- OPTICAL MICRO SEMICON MATERIALS (NINGBO) CO LTD
- Filing Date
- 2024-06-13
- Publication Date
- 2026-07-14
Smart Images
Figure CN118698969B_ABST
Abstract
The application relates to the technical field of material processing, and discloses a sputtering target cleaning device and a method thereof, which comprises a soaking pool, a support wall is fixedly connected above the soaking pool, a power assembly is installed above the support wall, the power assembly comprises a pneumatic telescopic rod fixedly installed above the support wall, one end of the pneumatic telescopic rod is fixedly connected with a sliding pipe, the sliding pipe is slidably connected with the upper side of the support wall, a control rod is slidably connected in the sliding pipe, one end of the control rod is fixedly connected with a sliding column, the lower end of the control rod is fixedly connected with a placing pipe used for placing a sputtering target, one end of the placing pipe is provided with a clamping assembly used for clamping the sputtering target, and a polishing and cleaning assembly is installed in the placing pipe. The device has the beneficial effect that the surface of the sputtering target is automatically polished before the sputtering target is cleaned.
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