Photomask transportation track and automated transportation system

Abstract

The application discloses a photomask transmission track and an automatic transmission system, the photomask transmission track comprises a plurality of H-shaped track units; each track unit comprises a plurality of longitudinal tracks extending along the second direction and arranged in parallel with each other, and a transverse track extending along the first direction and connecting adjacent longitudinal tracks. The longitudinal tracks in the track unit can be matched with a photolithography equipment with a second type of bearing module, so as to be arranged above the photolithography equipment with the second type of bearing module; the transverse track in the track unit can be matched with a photolithography equipment with a first type of bearing module, so as to be arranged above the photolithography equipment with the first type of bearing module. Therefore, the photomask transmission track can improve the compatibility between the photomask transmission track and different types of photolithography equipment, so as to meet the design requirements of various types of photolithography equipment, and improve the adjustable flexibility of a semiconductor manufacturing factory.

Description

Technical Field

[0001] The embodiments of the present invention relate to the field of automated production, and in particular to a photomask transmission track and an automated transmission system. Background Technology

[0002] In the semiconductor manufacturing process, lithography is a core and critical step that runs through the entire manufacturing process. However, lithography machines are expensive among semiconductor equipment, and how to improve the efficiency of lithography machines has always been an important issue in the semiconductor industry.

[0003] A lithography machine mainly consists of two parts: a developing machine and an exposure machine. The developing machine is connected to an AMHS (Automatic Material Handling System) track to transfer wafers. The photomask, a key material in semiconductor manufacturing, is transferred between exposure machines via an Automatic Reticle Handling System (ARHS) track. Furthermore, within a semiconductor manufacturing plant, the lithography area requires various models of lithography machines due to process requirements. Simultaneously, to meet the performance requirements and production efficiency of the lithography process, various models of developing machines are also needed, resulting in multiple models of both exposure and developing machines, as well as different combinations of the two.

[0004] However, the design compatibility of automated photomask handling systems needs improvement. Summary of the Invention

[0005] The problem solved by the embodiments of the present invention is to provide a photomask transport track and an automated transport system, thereby improving the compatibility between the photomask transport track and different types of photolithography equipment.

[0006] To address the aforementioned problems, this invention provides a photomask transport track, which is suspended above a photolithography device for transporting photomasks between multiple photolithography devices. The multiple photolithography devices are arranged along a first direction, which is perpendicular to a second direction. Each photolithography device includes a developing machine and an exposure machine placed sequentially along the second direction. Adjacent support modules are mounted on the exposure machine to support the photomask. The adjacent support modules arranged along the first direction serve as a first type of support module, and the adjacent support modules arranged along the second direction serve as a second type of support module. The photomask transport track includes multiple H-shaped track units. Each track unit includes: multiple longitudinal tracks extending along the second direction and arranged parallel to each other; and transverse tracks extending along the first direction and connecting adjacent longitudinal tracks.

[0007] Optionally, the photomask transmission track passes above the centerline of the carrier module.

[0008] Optionally, the deviation between the centerline of the photomask transmission track and the centerline of the carrier module is within a preset deviation range.

[0009] Optionally, the distance between the track turning point and the load-bearing module along the first or second direction is at least a critical distance.

[0010] Optionally, the critical distance is 300 mm.

[0011] Optionally, among the multiple photolithography equipment types, the maximum value of the total length of the photolithography equipment along the second direction is taken as the first value, and the minimum value of the length of the developing machine along the second direction is taken as the second value; the length of the longitudinal track is at least the difference between the first value and the second value.

[0012] Optionally, among multiple lithography equipment types, the maximum value of the total length of the lithography equipment along the second direction is used as the first value; the transverse track is used to pass above the first type of carrier module; the track unit further includes: a first edge track, extending along the first direction and disposed on the edge of the exposure machine away from the developing machine in the lithography equipment having the first value, the first edge track connecting the end of the first side of the adjacent longitudinal track; the first edge tracks of multiple track units are connected to each other.

[0013] Optionally, among the multiple lithography equipment types, the minimum length of the developing machine along the second direction is used as the second value; the track unit further includes: a second edge track, extending along the first direction and disposed on the edge of the exposure machine near the developing machine in the lithography equipment having the second value, the second edge track connecting the end of the second side of the adjacent longitudinal track; the second edge tracks of the multiple track units are connected to each other.

[0014] Optionally, the second edge track is positioned above the developing machine in a lithography apparatus having a second value.

[0015] Accordingly, this embodiment of the invention also provides an automated transmission system, including: a photomask transmission track provided in this embodiment of the invention for transmitting photomasks; and a transport vehicle slidably disposed on the photomask transmission track for transporting the photomasks.

[0016] Optionally, the developing machine is also provided with a transport connection point for carrying work-in-process; the automated transport system further includes: a work-in-process transport track, which is set above the transport connection point of the developing machine of multiple photolithography devices and extends along a second direction for transporting work-in-process.

[0017] Compared with the prior art, the technical solution of the embodiments of the present invention has the following advantages: The photomask transport track provided in this embodiment of the invention includes multiple H-shaped track units. Each track unit includes: multiple longitudinal tracks extending along a second direction and arranged parallel to each other; and transverse tracks extending along the first direction and connecting adjacent longitudinal tracks. The longitudinal tracks in the track units can be adapted to lithography equipment with a second type of carrier module for placement above such equipment. The transverse tracks in the track units can also be adapted to lithography equipment with a first type of carrier module for placement above such equipment. Therefore, the photomask transport track of this embodiment of the invention improves the compatibility between the photomask transport track and different types of lithography equipment, thereby meeting the design needs of various lithography equipment types and enhancing the adjustability and flexibility of semiconductor manufacturing plants.

[0018] The automated transport system provided in this embodiment of the invention includes a photomask transport track for transporting photomasks. The photomask transport track of this embodiment of the invention has high compatibility with different types of lithography equipment, thereby improving the compatibility between the automated transport system of this embodiment of the invention and different types of lithography equipment. Thus, in the early stages of factory construction, it can flexibly accommodate different lithography equipment, providing favorable automated transport support for the flexible expansion of factory capacity. Attached Figure Description

[0019] Figure 1 It is a side view of the factory building and lithography equipment; Figure 2 This is a top view of the lithography equipment and the photomask transport track; Figure 3 This is a schematic diagram of the structure of an embodiment of the photomask transmission track of the present invention. Detailed Implementation

[0020] As can be seen from the background technology, the design compatibility and transmission efficiency of automated photomask handling systems still need to be improved.

[0021] Specifically, in the construction of semiconductor manufacturing plants, the types and quantities of equipment needed are predicted based on market demand and expected development. The overall layout of the plant equipment is designed based on the equipment list, and then an automated material handling system and an automated photomask handling system are designed based on the equipment layout.

[0022] The automated photomask handling system's track design is based on the equipment layout, connecting the track to the top of the photomask load port of the exposure machine. However, due to the limitations of track design accuracy, the actual position of the equipment must deviate from the planned position by less than a certain threshold. Therefore, the equipment layout is constrained by the track design, and the equipment layout cannot be adjusted according to actual needs, resulting in a waste of cleanroom space and tracks. Redundancy in track design is also unavoidable.

[0023] Reference Figures 1 to 2 , Figure 1 This is a side view of the factory building. Figure 2 A top view of the lithography equipment and photomask transport track.

[0024] In a semiconductor manufacturing plant, the building is a cleanroom with a three-story structure. The main equipment of the photolithography equipment (including a developer 15 and an exposure machine 16) is placed on the third-floor raised floor 12, and the auxiliary equipment is placed on the second floor 11. The auxiliary equipment is connected to the main equipment on the third-floor raised floor 12 through a waffle plate layer 14 between the second floor 11 and the third-floor raised floor 12. The waffle plate layer 14 is a building layer with evenly distributed holes. The photomask transport track 18 is located on the ceiling 13 of the third-floor raised floor 12. The transport vehicle travels on the photomask transport track 18 to place the photomask onto the main equipment on the third-floor raised floor 12.

[0025] Research revealed two spatial factors limiting the positional accuracy between the photomask transport track 18 and the main unit and auxiliary equipment of the lithography apparatus: first, the error between the photomask transport track and the photomask carrier module 17 needs to be limited to a preset threshold range; second, the auxiliary equipment needs to be vertically connected to the exposure machine 16 via the waffle plate layer 14. These two factors result in almost no adjustability in the position of the main unit and auxiliary equipment of the lithography apparatus, and further necessitate compatibility with different models of equipment in the same location.

[0026] Reference Figure 2 Currently, there are various models of exposure machines 16 and developing machines 15 required by the factory, and the lengths of these machines are inconsistent. In the usual design, the positions of the equipment are determined first, and then the photomask transport track 18 is installed. Therefore, in the early stages of factory production, it is impossible to improve transport efficiency using the photomask transport track 18. Moreover, the photomask transport track 18 is designed only for equipment layouts at specific locations and for specific equipment models, leaving no room or time for adjustment.

[0027] Therefore, the design of a photomask transport track 18 that is compatible with lithography equipment has become an important research topic.

[0028] To address the aforementioned technical problem, this invention provides a photomask transport track, which is suspended above a photolithography device for transporting photomasks between multiple photolithography devices. The multiple photolithography devices are arranged along a first direction, which is perpendicular to a second direction. Each photolithography device includes a developing machine and an exposure machine placed sequentially along the second direction. Adjacent support modules are mounted on the exposure machine to support the photomask. The adjacent support modules arranged along the first direction serve as a first type of support module, and the adjacent support modules arranged along the second direction serve as a second type of support module. The photomask transport track includes multiple H-shaped track units. Each track unit includes: multiple longitudinal tracks extending along the second direction and arranged parallel to each other; and transverse tracks extending along the first direction and connecting adjacent longitudinal tracks.

[0029] The photomask transport track provided in this embodiment of the invention includes multiple H-shaped track units. Each track unit includes: multiple longitudinal tracks extending along a second direction and arranged parallel to each other; and transverse tracks extending along the first direction and connecting adjacent longitudinal tracks. The longitudinal tracks in the track units can be adapted to lithography equipment with a second type of carrier module for placement above such equipment. The transverse tracks in the track units can also be adapted to lithography equipment with a first type of carrier module for placement above such equipment. Therefore, the photomask transport track of this embodiment of the invention improves the compatibility between the photomask transport track and different types of lithography equipment, thereby meeting the design needs of various lithography equipment types and enhancing the adjustability and flexibility of semiconductor manufacturing plants.

[0030] To make the above-mentioned objects, features and advantages of the embodiments of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0031] refer to Figure 3 The diagram shows a structural schematic of an embodiment of the photomask transmission track of the present invention.

[0032] In this embodiment, the photomask transport track is used to transport photomasks between multiple lithography devices.

[0033] like Figure 3 As shown, the plurality of photolithography devices 100 are arranged along a first direction (e.g., Figure 3 The first direction and the second direction (as shown in the X direction) are arranged in a specific configuration. Figure 3(as shown in the Y direction) perpendicular to each other; each of the photolithography devices 100 includes a developing machine 10 and an exposure machine 20 arranged sequentially along the second direction, and the exposure machine 20 is provided with adjacent carrier modules 130, the carrier modules 130 being used to carry the photomask; adjacent carrier modules 130 arranged along the first direction are used as first type carrier modules 131, and adjacent carrier modules 130 arranged along the second direction are used as second type carrier modules 132.

[0034] The photolithography equipment 100 is used to perform photolithography processes to transfer the pattern on the photomask to the photoresist, and then transfer the pattern of the photoresist to the wafer.

[0035] The exposure machine 20 is used to perform the exposure process, which uses light to project the pattern on the photomask onto the photoresist after passing through an optical system, thereby achieving the transfer of the pattern.

[0036] The developing machine 10 is used to perform a developing process after the exposure process, that is, to remove or retain the part of the photoresist that has undergone a chemical reaction with light after exposure, thereby forming a pattern in the photoresist.

[0037] The carrier module 130 is used to carry the photomask so as to serve as a connection point with the transport vehicle connector. That is, the transport vehicle removes the photomask from the carrier module 130, or places the photomask on the carrier module 130.

[0038] In this embodiment, in each photolithography device 100, the arrangement direction of adjacent carrier modules 130 on the exposure machine 20 includes a first direction and a second direction. The adjacent carrier modules 130 arranged along the first direction are used as first-type carrier modules 131, and the adjacent carrier modules 130 arranged along the second direction are used as second-type carrier modules 132.

[0039] In this embodiment, the photomask transport track is suspended above the photolithography equipment 100. Specifically, the photomask transport track is suspended from the ceiling, and a transport vehicle (e.g., an overhead crane) travels on the photomask transport track to transport the photomask.

[0040] For ease of illustration and explanation, Figure 3 Four types of lithography equipment 100 are illustrated: first lithography equipment 100a, second lithography equipment 100b, third lithography equipment 100c, and fourth lithography equipment 100d.

[0041] The first lithography device 100a has a first type of carrier module 131, while the second lithography device 100b, the third lithography device 100c, and the fourth lithography device 100d have a second type of carrier module 132. Furthermore, in this embodiment, the first lithography device 100a, the second lithography device 100b, the third lithography device 100c, and the fourth lithography device 100d have different models and lengths.

[0042] It should be noted that, in this embodiment, the lithography equipment 100 is used to facilitate the explanation and description of the photomask transport track, and the lithography equipment 100 is not part of the photomask transport track.

[0043] like Figure 3 As shown, in this embodiment, the photomask transmission track (not shown) includes multiple H-shaped track units 200; each H-shaped track unit 200 includes: multiple longitudinal tracks 220, which extend along the second direction and are arranged parallel to each other; and a transverse track 210, which extends along the first direction and connects adjacent longitudinal tracks 220.

[0044] The carrier module 130 is used to carry the photomask. During the transportation of the photomask, the transmission track is used in conjunction with the transport vehicle. The transport vehicle is slidably set on the photomask transmission track. The transport vehicle takes the photomask from the carrier module or places the photomask on the carrier module.

[0045] Therefore, the photomask transmission track needs to pass above the carrier module so that the transport vehicle can interact with the carrier module.

[0046] It should be noted that in the semiconductor field, the carrier modules 130 on the exposure machine 20 are usually arranged in pairs, and adjacent carrier modules 130 can be arranged along a first direction or along a second direction.

[0047] In other embodiments, the number and arrangement of the carrier modules can also be of other types.

[0048] In this embodiment, the photolithography equipment 100 consists of two parts: a developing machine 10 and an exposure machine 20. The size of the developing machine 10 is usually of different types, and the size of the exposure machine 20 is usually of different types, which makes the size of the photolithography equipment 100 different.

[0049] In this embodiment, the photomask transport track includes multiple H-shaped track units 200; each track unit 200 includes: multiple longitudinal tracks 220 extending along the second direction and arranged parallel to each other; and a transverse track 210 extending along the first direction and connecting adjacent longitudinal tracks 220. The longitudinal tracks 220 in the track unit 200 can be adapted to a lithography device 100 having a second type of carrier module 132, so as to be positioned above the lithography device 100 having the second type of carrier module 132. The transverse tracks 210 in the track unit 200 can be adapted to a lithography device 100 having a first type of carrier module 131, so as to be positioned above the lithography device 100 having the first type of carrier module 131. Therefore, the photomask transport track of this embodiment can improve the compatibility between the photomask transport track and different types of lithography devices 100, thereby meeting the design needs of various lithography device types and improving the adjustability and flexibility of the semiconductor manufacturing plant.

[0050] In this embodiment, the distance between the track turning point and the carrier module 130 along the first or second direction is at least a critical distance. By setting a critical distance between the track turning point and the carrier module 130 along the first or second direction, the turning point is avoided from being located near the connection point between the equipment and the transport vehicle, thereby ensuring the normal operation of the transport vehicle at the curved track.

[0051] As an example, the critical distance should not be too small or too large. If the critical distance is too small, the transport vehicle may become misaligned when traveling on the track at curves or when stopping to place the photomask; if the critical distance is too large, it may waste space in the semiconductor cleanroom. As an example, the critical distance is 300 mm.

[0052] In this embodiment, the photomask transmission track passes above the center line of the carrier module 130, thereby improving the accuracy of the transport vehicle in picking up and placing photomasks on the carrier module 130.

[0053] In a specific embodiment, the deviation between the center line of the photomask transmission track and the center line of the carrier module 130 is within a preset deviation range.

[0054] In this embodiment, among the multiple types of photolithography equipment 100, the maximum value of the total length of the photolithography equipment 100 along the second direction is taken as the first value, and the minimum value of the length of the developing machine 10 along the second direction is taken as the second value; the length of the longitudinal track 220 is at least the difference between the first value and the second value.

[0055] The length of the longitudinal track 220 is at least the difference between the first value and the second value, so that the longitudinal track 220 can extend at least above the exposure machine 20, thereby facilitating the transportation and placement of photomasks in cooperation with the exposure machine 20.

[0056] In this embodiment, among the multiple types of lithography equipment 100, the maximum value of the total length of the lithography equipment 100 along the longitudinal direction is used as the first value; the transverse track 210 is used to pass above the first type of carrier module 131; the track unit 200 further includes: a first edge track 230, extending along a first direction and disposed on the edge of the exposure machine 20 of the lithography equipment 100 having the first value on the side away from the developing machine 10, the first edge track 230 connecting the end of the first side of the adjacent longitudinal track 220; the first edge tracks 230 of the multiple track units 200 are connected to each other.

[0057] The first edge track 230 is used to realize the transfer of photomask between adjacent photolithography equipment 100.

[0058] In this embodiment, the first edge track 230 is disposed on the edge of the exposure machine 20 of the lithography equipment 100 that is away from the developing machine 10, thereby ensuring that the longitudinal track 220 can cross over the exposure machines 20 of all lithography equipment 100 along the second direction, and thus be compatible with lithography equipment 100 with different models and equipment lengths.

[0059] Among the multiple types of photolithography equipment 100, the minimum length of the developing machine 10 along the second direction is taken as the second value; the track unit 200 further includes: a second edge track 240 extending along the first direction and disposed on the edge of the exposure machine 20 in the photolithography equipment 100 having the second value, which is close to the developing machine 10; the second edge track 240 connects to the end of the second side of the adjacent longitudinal track 220; the second edge tracks 240 of the multiple track units 200 are connected to each other.

[0060] The second edge track 240 is used to realize the transfer of photomask between adjacent photolithography equipment 100.

[0061] In this embodiment, the second edge track 240 is disposed on the edge of the exposure machine 20 of the photolithography equipment 100 with the second value, which is close to the developing machine 10. This ensures that the length of the longitudinal track 220 can cross the exposure machine 20 of all photolithography equipment 100 along the second direction, thereby ensuring that the photomask can be compatible with photolithography equipment 100 with different models and equipment lengths.

[0062] As an example, the second edge track 240 is positioned above the developing machine 10 in the photolithography equipment 100 with the second value, thereby preventing the second edge track 240 from being too close to the photomask of the exposure machine 20, thus ensuring the normal transport of the transport vehicle and the normal handling of the photomask.

[0063] Accordingly, the present invention also provides an automated transmission system.

[0064] In this embodiment, the automated transmission system includes: a photomask transmission track as described in the previous embodiment, used for transmitting photomasks; and a transport vehicle (not shown), slidably disposed on the photomask transmission track, used for transporting photomasks.

[0065] The automated transport system provided in this embodiment includes the photomask transport track of the aforementioned embodiment, which is used to transport photomasks. The photomask transport track has high compatibility with different types of lithography equipment, thereby improving the compatibility between the automated transport system of this embodiment and different types of lithography equipment. Thus, in the early stage of factory construction, it can flexibly accommodate different lithography equipment, providing favorable automated transport support for the flexible expansion of factory capacity.

[0066] Among them, the transport vehicle can be a crane or other transport vehicle.

[0067] In this embodiment, the developing machine 10 is also provided with a transport connection point 30 for carrying work-in-process; the automated transport system also includes a work-in-process transport track (not shown), which is provided above the transport connection point 30 of the developing machine 10 of the multiple lithography devices 100 and extends along the second direction for transporting work-in-process.

[0068] In this embodiment, a transport vehicle is also slidably mounted on the work-in-process transport track for transporting the work-in-process.

[0069] Specifically, transport connection point 30 is used to carry the work-in-process after development, so that the transport vehicle can pick up and put down the work-in-process, and the work-in-process is transferred through the work-in-process transport track accordingly.

[0070] In this embodiment, "work in process" refers to wafers that are currently undergoing manufacturing processes.

[0071] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A photomask transmission track, characterized in that, The photomask transport track is suspended above the photolithography equipment and is used to transport photomasks between multiple photolithography equipment. The multiple photolithography equipment are arranged along a first direction, which is perpendicular to a second direction. Each photolithography equipment includes a developing machine and an exposure machine placed sequentially along the second direction. The exposure machine is provided with adjacent support modules, which are used to support the photomask. The adjacent support modules arranged along the first direction are used as first-type support modules, and the adjacent support modules arranged along the second direction are used as second-type support modules. The photomask transmission track includes multiple H-shaped track units; each H-shaped track unit includes: multiple longitudinal tracks extending along the second direction and arranged parallel to each other; and transverse tracks extending along the first direction and connecting adjacent longitudinal tracks. Among the various types of photolithography equipment, the maximum value of the total length of the photolithography equipment along the second direction is taken as the first value, and the minimum value of the length of the developing machine along the second direction is taken as the second value; the length of the longitudinal track is at least the difference between the first value and the second value.

2. The photomask transmission track as described in claim 1, characterized in that, The photomask transmission track passes above the center line of the carrier module.

3. The photomask transmission track as described in claim 1 or 2, characterized in that, The deviation between the centerline of the photomask transmission track and the centerline of the carrier module is within a preset deviation range.

4. The photomask transmission track as described in claim 1, characterized in that, The distance between the track turning point and the load-bearing module along the first or second direction is at least a critical distance.

5. The photomask transmission track as described in claim 4, characterized in that, The critical distance is 300mm.

6. The photomask transmission track as described in claim 1, characterized in that, Among multiple types of lithography equipment, the maximum value of the total length of the lithography equipment along the second direction is taken as the first value; the transverse track is used to pass above the first type of carrier module; the track unit further includes: a first edge track, extending along the first direction and disposed on the edge of the exposure machine away from the developing machine in the lithography equipment having the first value, the first edge track connecting the end of the first side of the adjacent longitudinal track; the first edge tracks of multiple track units are connected to each other.

7. The photomask transmission track as described in claim 1, characterized in that, Among multiple types of photolithography equipment, the minimum length of the developing machine along the second direction is taken as the second value; the H-shaped track unit further includes: a second edge track, extending along the first direction and disposed on the edge of the exposure machine near the developing machine in the photolithography equipment having the second value, the second edge track connecting the end of the second side of the adjacent longitudinal track; the second edge tracks of multiple H-shaped track units are connected to each other.

8. The photomask transmission track as described in claim 7, characterized in that, The second edge track is positioned above the developing machine in a lithography apparatus with a second value.

9. An automated transmission system, characterized in that, include: The photomask transport track as described in any one of claims 1-8 is used for transporting photomasks; A transport vehicle is slidably mounted on the photomask transport track for transporting the photomask.

10. The automated transmission system as described in claim 9, characterized in that, The developing machine is also equipped with a transport connection point for carrying work-in-process; the automated transport system further includes a work-in-process transport track, which is set above the transport connection point of the developing machine of multiple lithography devices and extends along a second direction for transporting work-in-process.

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