Metal oxo-cluster compounds with thiol ligands and new use thereof in the preparation of photoresist compositions

Abstract

A metal oxo cluster compound having a thiol ligand and a new use thereof in preparing a photoresist composition, the photoresist composition being a negative photoresist composition, the composition comprising at least one metal oxo cluster compound of the general formula [M x O y (OR) m (L) n ] in which M represents a metal element, O represents an oxygen element, R can be selected from a hydrogen atom, a hydrocarbon group and an acyl group, L is an organic ligand having a thiol group, 1≤x≤50, 1≤y≤50, 0≤m≤50, 1≤n≤50, and a photoresist solvent. The metal oxo cluster compound has a low molecular weight, a single molecular size, a high sensitivity to a light exposure light source, and a thiol ligand that can be crosslinked by disulfide bond formation during the exposure process to achieve a high sensitivity and high resolution negative photoresist effect. The application also discloses a preparation method of the metal oxo cluster compound having a thiol ligand, a photoresist composition and a specific use method thereof for photoetching.

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