Polishing head mounting positioning device and polishing head mounting method

Abstract

This invention provides a polishing head mounting and positioning device and a polishing head mounting method, belonging to the field of chemical mechanical polishing technology. The polishing head mounting and positioning device includes a base, an adjusting seat, and a positioning component. The top of the base has a mounting cavity for accommodating an elastic membrane. The bottom of the adjusting seat has a positioning cavity adapted to the base, and the base is inserted into the positioning cavity. The positioning component is located in the positioning cavity and coaxially connected to the adjusting seat. The positioning component has a positioning part inserted into the central hole of the upper clamping ring, the positioning part being coaxially arranged with the adjusting seat, and the positioning component having a positioning groove for accommodating the lower clamping ring, the positioning groove being coaxially arranged with the positioning component. The polishing head mounting and positioning device and polishing head mounting method provided by this invention aim to solve the problem in the prior art where the elastic membrane cannot be guaranteed to be coaxially installed with components such as the retaining ring and clamping ring, resulting in uneven force on the wafer after it is adsorbed and fixed by the elastic membrane, leading to poor wafer polishing effect and low material removal rate.

Description

Technical Field

[0001] This invention belongs to the field of chemical mechanical polishing technology, and more specifically, relates to a polishing head mounting and positioning device and a polishing head mounting method. Background Technology

[0002] In chip manufacturing processes, chemical mechanical polishing (CMP) is an important planarization technology used in wafer polishing. However, with the increase in wafer diameter and the gradual shrinking of key chip feature sizes, the requirements for high planarity, uniformity, and consistency of the wafer surface are becoming increasingly stringent. Currently, wafer polishing technology typically involves pressure filling an elastic membrane within the polishing head. This elastic membrane is similar in size to the wafer, and the pressure filling causes the chambers of the elastic membrane to expand, thereby generating downward pressure on the wafer.

[0003] Existing polishing heads often employ a single-film, multi-chamber structure. This structure consists of an elastic film comprising a base plate and multiple annular baffles of varying diameters mounted on the base plate. These annular baffles form multiple adjustable-pressure chambers. During the polishing process, the elastic film directly contacts the wafer through the base plate, and the multiple chambers act on different annular regions of the wafer through the base plate to perform pressure polishing.

[0004] The elastic membrane is typically placed inside a retaining ring and secured by a clamping ring, cover plate, and carrier plate. Because these components are all ring-shaped and the elastic membrane is a flexible component, it is highly susceptible to misalignment during installation. If the elastic membrane cannot be coaxially mounted with the retaining ring, clamping ring, and other components, eccentricity will occur after the elastic membrane is fixed. When the elastic membrane expands, uneven pressure occurs on it, resulting in uneven stress on the wafer during grinding, thus affecting the material removal rate and grinding effect. Summary of the Invention

[0005] The purpose of this invention is to provide a polishing head mounting and positioning device and a polishing head mounting method, which aims to solve the problem in the prior art that the elastic membrane cannot be guaranteed to be coaxially mounted with components such as the retaining ring and clamping ring, resulting in uneven force on the wafer after it is adsorbed and fixed by the elastic membrane, causing poor wafer polishing effect and low material removal rate.

[0006] To achieve the above objectives, the technical solution adopted by the present invention is as follows: In a first aspect, a polishing head mounting and positioning device is provided, comprising: The base has a mounting cavity at the top for accommodating the elastic membrane. The adjusting base has a positioning cavity at its bottom that fits the base, and the base is inserted into the positioning cavity; and A positioning element is disposed in the positioning cavity and coaxially connected to the adjusting seat. The positioning element has a positioning part inserted into the center hole of the upper clamping ring. The positioning part is coaxially arranged with the adjusting seat, and the positioning element has a positioning groove for accommodating the lower clamping ring. The positioning groove is coaxially arranged with the positioning element.

[0007] In conjunction with the first aspect, in one possible implementation, the adjusting seat includes a positioning ring, an adjusting ring, and a mounting ring arranged sequentially from the inside out, and further includes a connecting member connecting the positioning ring, the adjusting ring, and the mounting ring. The positioning ring, the adjusting ring, and the mounting ring are arranged coaxially, wherein the mounting ring is inserted into the base. The positioning member includes a first limiting ring connected to the positioning ring and a second limiting ring connected to the adjusting ring. The first limiting ring forms the positioning part, and the outer peripheral surface of the second limiting ring and the bottom surface of the adjusting ring enclose the positioning groove.

[0008] In conjunction with the first aspect, in one possible implementation, the positioning element includes: A fixing plate is disposed in the positioning cavity and coaxially connected to the adjusting seat; A pressure plate, coaxially connected to the fixed plate, the outer circumferential surface of the pressure plate and the bottom surface of the fixed plate forming the positioning groove, the pressure plate being used to press the upper clamping ring; and A positioning plate is coaxially connected to the pressure plate, and the positioning plate forms the positioning part.

[0009] In conjunction with the first aspect, in one possible implementation, after the positioning groove is inserted into the lower clamping ring, the positioning part abuts against the elastic membrane in the vertical direction.

[0010] In conjunction with the first aspect, in one possible implementation, the bottom of the base is provided with an exhaust hole, which is connected to the mounting cavity.

[0011] In conjunction with the first aspect, in one possible implementation, the center of the adjusting seat is provided with a weight-reducing hole, which is connected to the positioning cavity.

[0012] In conjunction with the first aspect, in one possible implementation, the outer sleeve of the adjustment seat is provided with a pick-and-place ring.

[0013] The beneficial effects of the polishing head mounting and positioning device provided by this invention are as follows: Compared with the prior art, the polishing head mounting and positioning device of this invention accommodates the elastic membrane through the mounting cavity opened in the base, and limits the elastic membrane radially. After the lower clamping ring is inserted into the cavity of the elastic membrane, the base is inserted into the positioning cavity, and the lower clamping ring is inserted into the positioning groove, thereby adjusting the position of the lower clamping ring radially to make the lower clamping ring coaxial with the elastic membrane. After the position adjustment of the lower clamping ring is completed, the adjusting seat and positioning component are first removed, the upper clamping ring is inserted into the cavity of the elastic membrane, and then the base is inserted into the positioning cavity of the adjusting seat. At this time, the positioning part is inserted into the central hole of the lower clamping ring, and the radial position of the lower clamping ring is adjusted to make the lower clamping ring coaxial with the elastic membrane. This invention achieves coaxial arrangement of the elastic membrane, upper clamping ring, and lower clamping ring by adjusting the positions of the upper and lower clamping rings. Since both the upper and lower clamping rings are rigid components, it facilitates subsequent connection with other parts of the polishing head and avoids the problem of uneven force on the wafer after the wafer is fixed due to the eccentric setting of the elastic membrane, which affects the polishing effect and material removal rate.

[0014] Secondly, embodiments of the present invention further provide a polishing head mounting method, including: S100. Place the elastic membrane into the mounting cavity of the base; S200, Insert the lower clamping ring into the elastic membrane located in the mounting cavity, the lower clamping ring being inserted into the cavity of the elastic membrane; S300. Insert the base into the positioning cavity of the adjusting seat. The positioning cavity has a positioning element. The lower clamping ring is inserted into the positioning groove of the positioning element. The positioning groove limits the lower clamping ring in the radial direction, so as to realize the coaxial arrangement of the elastic membrane and the lower clamping ring. S400: Separate the adjusting seat from the base, and ensure that the positions of the base, the elastic membrane and the lower clamping ring remain relatively stationary; S500, Insert the upper clamping ring into the cavity of the elastic membrane; S600, the adjusting seat is inserted into the base, the base is inserted into the positioning cavity, the positioning part of the positioning member is inserted into the center hole of the upper clamping ring, and the positioning part adjusts the position of the upper clamping ring radially to achieve the coaxial setting of the elastic membrane and the upper clamping ring.

[0015] In conjunction with the second aspect, in one possible implementation, the polishing head mounting method further includes: S700: After the elastic membrane and the upper clamping ring are coaxially arranged, the upper clamping ring is fixed, the adjusting seat and the base are removed, and the mounting module formed by the elastic membrane, the upper clamping ring and the lower clamping ring is connected to other parts of the polishing head.

[0016] In conjunction with the second aspect, in one possible implementation, S700 specifically includes: S710. First, disassemble the adjusting seat, and then fix the cover plate to the upper clamping ring; S720. After the cover plate is connected to the upper clamping ring, the base is then separated from the mounting module. S730. Place the mounting module and the cover plate connected to the mounting module into the retaining ring, wherein the retaining ring surrounds the elastic membrane. S740. Install a support plate above the retaining ring.

[0017] The beneficial effects of the polishing head installation method provided by this invention are as follows: Compared with the prior art, the polishing head installation method of this invention can first position the elastic membrane and the upper clamping ring by plugging and positioning before connecting the elastic membrane, the upper clamping ring, and the lower clamping ring to other components of the polishing head, achieving coaxial setting of the elastic membrane and the upper clamping ring. Then, the lower clamping ring is installed, and the coaxial setting of the lower clamping ring and the elastic membrane is adjusted. After determining the positions of the elastic membrane, the upper clamping ring, and the lower clamping ring, the above components are fixed, which facilitates subsequent connection with other components of the polishing head. Since neither the upper nor the lower clamping ring is a rigid component, it is not easy to deform after fixing. Therefore, it not only ensures the relative positional relationship with the elastic membrane, but also avoids the problem of the elastic membrane becoming eccentric during subsequent installation. The coaxial setting of the elastic membrane with other components avoids the situation where the wafer is misaligned after fixing due to the eccentric setting of the elastic membrane, resulting in uneven force on the wafer and affecting the polishing effect and material removal rate. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a cross-sectional view of the base and elastic membrane used in Embodiment 1 of the present invention; Figure 2 A cross-sectional view of the lower clamping ring of the polishing head mounting and positioning device provided in Embodiment 1 of the present invention; Figure 3 A cross-sectional view of the positioning clamping ring of the polishing head mounting and positioning device provided in Embodiment 1 of the present invention; Figure 4 This is a cross-sectional view of the adjusting seat and positioning component used in Embodiment 2 of the present invention; Figure 5 This is a cross-sectional view of the adjusting seat and positioning component used in Embodiment 3 of the present invention; Figure 6 This is a schematic diagram of the base structure used in Embodiment 1 of the present invention; Figure 7 This is a schematic diagram of the structure of the adjustment seat and positioning component used in Embodiment 4 of the present invention.

[0020] In the diagram: 1. Base; 101. Exhaust port; 102. Mounting cavity; 2. Elastic membrane; 3. Adjusting seat; 301. Positioning cavity; 302. Weight reduction hole; 303. Positioning ring; 304. Adjusting ring; 305. Mounting ring; 306. Connecting piece; 4. Lower clamping ring; 5. Positioning piece; 501. Positioning part; 502. Positioning groove; 503. Fixing plate; 504. Pressure plate; 505. Positioning plate; 506. First limit ring; 6. Pick-up and drop ring; 7. Upper clamping ring. Detailed Implementation

[0021] To make the technical problems to be solved, the technical solutions, and the beneficial effects of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and are not intended to limit the present invention.

[0022] In the claims, description, and accompanying drawings of this invention, unless otherwise expressly defined, the terms "first," "second," or "third," etc., are used to distinguish different objects and not to describe a specific order. Unless otherwise stated, other directional terms, such as "vertical," "clockwise," and "counterclockwise," indicate orientation or positional relationships based on the orientation and positional relationships shown in the accompanying drawings, and are only for the convenience of describing the invention and simplifying the description, not to indicate or imply that the referred device or element must have a specific orientation or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the specific scope of protection of this invention. In the claims, description, and accompanying drawings of this invention, unless otherwise expressly defined, the terms "fixed connection" or "fixed link" should be interpreted broadly, that is, any connection method in which there is no displacement relationship or relative rotation relationship between the two, that is, including non-removable fixed connections, detachable fixed connections, integral connections, and fixed connections through other devices or elements. In the claims, description, and accompanying drawings of this invention, the terms "comprising," "having," and their variations are intended to mean "including but not limited to."

[0023] Please refer to the following: Figures 1 to 7The present invention will now describe the polishing head mounting and positioning device and the polishing head mounting method provided. The polishing head mounting and positioning device includes a base 1, an adjusting seat 3, and a positioning member 5. The top of the base 1 has a mounting cavity 102 for accommodating the elastic membrane 2. The bottom of the adjusting seat 3 has a positioning cavity 301 adapted to the base 1, and the base 1 is inserted into the positioning cavity 301. The positioning member 5 is disposed in the positioning cavity 301 and coaxially connected to the adjusting seat 3. The positioning member 5 has a positioning part 501 inserted into the center hole of the upper clamping ring 7. The positioning part 501 is coaxially arranged with the adjusting seat 3, and the positioning member 5 has a positioning groove 502 for accommodating the lower clamping ring 4. The positioning groove 502 is coaxially arranged with the positioning member 5.

[0024] The polishing head mounting and positioning device provided by this invention, compared with the prior art, uses a mounting cavity 102 opened in the base 1 to accommodate the elastic membrane 2, thus limiting the elastic membrane 2 radially. After the lower clamping ring 4 is inserted into the cavity of the elastic membrane 2, the base 1 is inserted into the positioning cavity 301, and the lower clamping ring 4 is inserted into the positioning groove 502, thereby adjusting the position of the lower clamping ring 4 radially to make the lower clamping ring 4 coaxial with the elastic membrane 2. After the position adjustment of the lower clamping ring 4 is completed, the adjusting seat 3 and the positioning member 5 are first removed, the upper clamping ring 7 is inserted into the cavity of the elastic membrane 2, and then the base 1 is inserted into the positioning cavity 301 of the adjusting seat 3. At this time, the positioning part 501 is inserted into the central hole of the lower clamping ring 4, and the radial position of the lower clamping ring 4 is adjusted to make the lower clamping ring 4 coaxial with the elastic membrane 2. This invention achieves coaxial arrangement of the elastic membrane 2, the upper clamping ring 7, and the lower clamping ring 4 by adjusting the positions of the upper clamping ring 7 and the lower clamping ring 4. Since both the upper clamping ring 7 and the lower clamping ring 4 are rigid components, it is convenient to connect them with other parts of the polishing head. This avoids the problem of uneven force on the wafer after the wafer is fixed due to the eccentric setting of the elastic membrane 2, which affects the polishing effect and material removal rate.

[0025] It should be noted that, since the elastic membrane 2 is a flexible component, it is highly susceptible to deformation. After the lower clamping ring 4 is inserted into the cavity of the elastic membrane 2, the elastic deformation of the elastic membrane 2 may cause the two components to be misaligned. Therefore, after the lower clamping ring 4 is inserted into the cavity of the elastic membrane 2, the adjusting seat 3 is placed over the base 1, and the positioning groove 502 is inserted into the lower clamping ring 4. The position of the lower clamping ring 4 is adjusted through rigid engagement to achieve coaxial distribution between the lower clamping ring 4 and the elastic membrane 2. Similarly, coaxial distribution between the upper clamping ring 7 and the elastic membrane 2 is achieved.

[0026] Specifically, the sidewall of the mounting cavity 102 is adapted to the outer peripheral surface of the elastic membrane 2. After the elastic membrane 2 is placed in the mounting cavity 102, the outer peripheral surface of the elastic membrane 2 is attached to the sidewall of the mounting cavity 102, which limits the elastic membrane 2 in the radial direction, so as to achieve the coaxial arrangement of the elastic membrane 2 and the mounting cavity 102.

[0027] Specifically, the positioning groove 502 is an annular groove.

[0028] Optionally, the adjusting seat 3 and the positioning component 5 can be fixedly connected by welding, plugging, screwing or snapping, or they can be an integral component.

[0029] Optionally, after the lower clamping ring 4 is inserted into the positioning groove 502, the bottom of the positioning member 5 abuts against the lower clamping ring 4 in the vertical direction, ensuring that the lower clamping ring 4 is in full contact with the base 1, and preventing the lower clamping ring 4 from tilting in the vertical direction, causing the position to shift and making it unable to be coaxial with the elastic membrane 2.

[0030] Optionally, after the positioning part 501 is inserted into the center hole of the upper clamping ring 7, the bottom of the positioning part 5 abuts against the upper clamping ring 7 in the vertical direction, ensuring that the upper clamping ring 7 is in full contact with the base 1, and preventing the upper clamping ring 7 from tilting in the vertical direction, causing positional shift and making it unable to be coaxial with the elastic membrane 2.

[0031] In some embodiments, please refer to Figure 7 The adjusting seat 3 includes a positioning ring 303, an adjusting ring 304, and a mounting ring 305 arranged sequentially from the inside out. It also includes a connecting member 306 that connects the positioning ring 303, the adjusting ring 304, and the mounting ring 305. The positioning ring 303, the adjusting ring 304, and the mounting ring 305 are arranged coaxially. The mounting ring 305 is inserted into the base 1. The positioning member 5 includes a first limiting ring 506 connected to the positioning ring 303 and a second limiting ring connected to the adjusting ring 304. The first limiting ring 506 forms a positioning part 501, and the outer peripheral surface of the second limiting ring and the bottom surface of the adjusting ring 304 enclose a positioning groove 502. Because the positioning ring 303, adjusting ring 304, and mounting ring 305 are distributed sequentially at intervals, the weight of the adjusting seat 3 can be reduced, making it easier to disassemble and assemble the adjusting seat 3, and also saving materials. The first limiting ring 506 is connected to the positioning ring 303 and is inserted into the center hole of the upper clamping ring 7, thereby adjusting the upper clamping ring 7 to be coaxial with the positioning ring 303 (since the base 1 is inserted into the positioning cavity 301, the base 1 and the elastic membrane 2 are both coaxial with the positioning ring 303), thus achieving the coaxiality of the upper clamping ring 7 and the elastic membrane 2. Similarly, the second limiting ring is connected to the adjusting ring 304. After the base 1 is inserted into the positioning cavity 301, the outer circumferential surface of the second limiting ring abuts against the lower clamping ring 4 radially, adjusting the lower clamping ring 4 to be coaxial with the second limiting ring, thereby achieving the coaxiality of the lower clamping ring 4 and the elastic membrane 2 (the second limiting ring and the base 1 are coaxial, and the elastic membrane 2 and the base 1 are coaxial).

[0032] Optionally, the positioning ring 303, adjusting ring 304, mounting ring 305 and connector 306 can be integrated into one component, or they can be fixedly connected by welding or bonding.

[0033] In some embodiments, please refer to Figure 5The positioning component 5 includes a fixing plate 503, a pressure plate 504, and a positioning plate 505. The fixing plate 503 is located in the positioning cavity 301 and is coaxially connected to the adjusting seat 3. The pressure plate 504 is coaxially connected to the fixing plate 503. The outer peripheral surface of the pressure plate 504 and the bottom surface of the fixing plate 503 form a positioning groove 502. The pressure plate 504 is used to press the upper clamping ring 7. The positioning plate 505 is coaxially connected to the pressure plate 504 and forms a positioning part 501.

[0034] The positioning component 5 consists of a fixed plate 503, a pressure plate 504, and a positioning plate 505 stacked sequentially. The clearance space formed between the outer peripheral surface of the fixed plate 503 and the side wall of the adjusting seat 3 can accommodate the base 1, enabling the base 1 to abut against the adjusting seat 3 and ensuring the stability of the adjusting seat 3 and the base 1 in the vertical direction, thus ensuring accurate positioning of the lower clamping ring 4. A step is formed between the fixed plate 503 and the pressure plate 504, and the fixed plate 503 abuts against the lower clamping ring 4 in the vertical direction, ensuring that the lower clamping ring 4 does not tilt in the vertical direction. The outer peripheral surface of the pressure plate 504 abuts against the inner peripheral surface of the lower clamping ring 4, ensuring that the lower clamping ring 4 and the pressure plate 504 are coaxial. A step is formed between the positioning plate 505 and the pressure plate 504, and the bottom surface of the pressure plate 504 abuts against the upper clamping ring 7 in the vertical direction, preventing the upper clamping ring 7 from shifting in the vertical direction. The positioning plate 505 is inserted into the inner hole of the upper clamping ring 7, achieving coaxiality between the positioning plate 505 and the upper clamping ring 7. The solution in this embodiment can not only position the upper clamping ring 7 and the lower clamping ring 4 radially, but also position the upper clamping ring 7 and the lower clamping ring 4 vertically, ensuring that the upper clamping ring 7 and the lower clamping ring 4 are coaxial with the elastic membrane 2.

[0035] In some embodiments, please refer to Figure 2 After the positioning groove 502 is inserted into the lower clamping ring 4, the positioning part 501 abuts against the elastic membrane 2 in the vertical direction.

[0036] The positioning part 501 and the base 1 work together to squeeze the elastic membrane 2 in the vertical direction, so as to prevent the elastic membrane 2 from deforming or displacing during the adjustment of the clamping ring 4, and to ensure the stability of the position and shape of the elastic membrane 2. In some embodiments, please refer to Figure 6 The bottom of the base 1 is provided with an exhaust hole 101, which is connected to the mounting cavity 102.

[0037] The vent 101 is connected to the mounting cavity 102. After the elastic membrane 2 is placed in the mounting cavity 102, it ensures that the pressure on the upper and lower surfaces of the elastic membrane 2 is consistent, thus avoiding the formation of a sealed space between the elastic membrane 2 and the base 1. This would prevent the elastic membrane 2 from being adsorbed onto the base 1 under air pressure, which would be detrimental to the separation of the base 1 and the elastic membrane 2.

[0038] Optionally, the diameter of the vent hole 101 is smaller than the distance between two adjacent chambers of the elastic membrane 2, which can ensure that the base 1 provides effective support for the elastic membrane 2.

[0039] Optionally, multiple vent holes 101 are provided, and the multiple vent holes 101 are distributed in a ring on the base 1 to form a venting module. Various types of venting modules are distributed at intervals from the inside out. This embodiment can ensure that the elastic membrane 2 is subjected to uniform force and consistent pressure at all locations.

[0040] In some embodiments, please refer to Figure 3 The center of the adjusting seat 3 is provided with a weight reduction hole 302, which is connected to the positioning cavity 301.

[0041] The weight reduction hole 302 can reduce the weight of the adjusting seat 3, making it easier to disassemble and assemble the adjusting seat 3 and the base 1, and also saving materials. In addition, since the weight reduction hole 302 is located in the center of the adjusting seat 3, it will not affect the connection between the adjusting seat 3 and the positioning member 5. In some embodiments, please refer to Figure 3 The outer sleeve of the adjusting seat 3 is equipped with a pick-up and put-down ring 6. The pick-and-place ring 6 facilitates operation by staff and prevents the adjusting seat 3 from slipping and falling off when picking it up or placing it. At the same time, the pick-and-place ring 6 also increases the strength of the adjusting seat 3.

[0042] Based on the same inventive concept, this invention also provides a polishing head mounting method. Please refer to [link / reference]. Figures 1 to 5 Polishing head installation methods include: S100. Place the elastic membrane 2 into the mounting cavity 102 of the base 1; S200, Insert the lower clamping ring 4 into the elastic membrane 2 located in the mounting cavity 102, and insert the lower clamping ring 4 into the cavity of the elastic membrane 2; S300. Insert the base 1 into the positioning cavity 301 of the adjusting seat 3. The positioning cavity 301 has a positioning element 5. The lower clamping ring 4 is inserted into the positioning groove 502 located in the positioning element 5. The positioning groove 502 limits the lower clamping ring 4 in the radial direction, so as to realize the coaxial setting of the elastic membrane 2 and the lower clamping ring 4. S400. Separate the adjusting seat 3 from the base 1, and ensure that the positions of the base 1, the elastic membrane 2 and the lower clamping ring 4 remain relatively stationary. S500, Insert the upper clamping ring 7 into the cavity of the elastic membrane 2; S600, the adjusting seat 3 is inserted into the base 1, the base 1 is inserted into the positioning cavity 301, the positioning part 501 of the positioning member 5 is inserted into the center hole of the upper clamping ring 7, the positioning part 501 adjusts the position of the upper clamping ring 7 radially, so as to realize the coaxial setting of the elastic membrane 2 and the upper clamping ring 7.

[0043] The polishing head installation method provided by this invention allows for the pre-positioning of the elastic membrane 2 and the upper clamping ring 7 via an insertion-and-positioning method before connecting the elastic membrane 2, the upper clamping ring 7, and the lower clamping ring 4 to other components of the polishing head. This ensures the coaxial alignment of the elastic membrane 2 and the upper clamping ring 7. Then, the lower clamping ring 4 is installed, and its coaxial alignment with the elastic membrane 2 is adjusted. After determining the positions of the elastic membrane 2, the upper clamping ring 7, and the lower clamping ring 4, these components are fixed, facilitating subsequent connection with other components of the polishing head. Since neither the upper clamping ring 7 nor the lower clamping ring 4 is a rigid component, they are less prone to deformation after fixing. This not only ensures the relative positional relationship with the elastic membrane 2 but also avoids the problem of eccentricity of the elastic membrane during subsequent installation. The coaxial alignment of the elastic membrane 2 with other components prevents positional deviations after wafer fixing due to eccentricity of the elastic membrane 2, which could lead to uneven wafer stress and affect the polishing effect and material removal rate.

[0044] In some embodiments, the polishing head mounting method further includes: S700 After the elastic membrane 2 and the upper clamping ring 7 are coaxially arranged, fix the upper clamping ring 7, remove the adjusting seat 3 and the base 1, and connect the mounting module formed by the elastic membrane 2, the upper clamping ring 7 and the lower clamping ring 4 to other parts of the polishing head. After positioning the elastic membrane 2, upper clamping ring 7, and lower clamping ring 4, fix the upper clamping ring 7. Since the upper clamping ring and lower clamping ring 4 are inserted together, the lower clamping ring 4 can also be fixed. Then remove the adjusting seat 3 and the base 1. Since both the upper clamping ring 7 and the lower clamping ring 4 are rigid components, they are easy to connect to other parts of the polishing head.

[0045] In some embodiments, S700 specifically includes: S710. First, remove the adjusting seat 3, and then fix the cover plate to the upper clamping ring 7. After connecting the S720 cover plate to the upper clamping ring 7, separate the base 1 from the mounting module. S730. Place the mounting module and the cover plate connected to the mounting module into the retaining ring, with the retaining ring surrounding the elastic membrane 2. S740, Install a bearing plate above the retaining ring.

[0046] In this embodiment, the mounting module formed by the elastic membrane 2, the upper clamping ring 7, and the lower clamping ring 4 can be connected to other parts of the polishing head to ensure the integrity of the mounting module during installation and avoid deformation or displacement of the elastic membrane 2 during installation, which would affect its coaxiality after installation.

[0047] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A polishing head mounting positioning device, characterized by, include: The base has a mounting cavity at the top for accommodating the elastic membrane. The adjusting base has a positioning cavity at its bottom that fits the base, and the base is inserted into the positioning cavity; and A positioning element is disposed in the positioning cavity and coaxially connected to the adjusting seat. The positioning element has a positioning part inserted into the center hole of the upper clamping ring. The positioning part is coaxially arranged with the adjusting seat, and the positioning element has a positioning groove for accommodating the lower clamping ring. The positioning groove is coaxially arranged with the positioning element.

2. The polishing head mounting positioning device of claim 1, wherein The adjusting seat includes a positioning ring, an adjusting ring, and a mounting ring arranged sequentially from the inside out. It also includes a connector connecting the positioning ring, the adjusting ring, and the mounting ring. The positioning ring, the adjusting ring, and the mounting ring are arranged coaxially. The mounting ring is inserted into the base. The positioning connector includes a first limiting ring connected to the positioning ring and a second limiting ring connected to the adjusting ring. The first limiting ring forms the positioning part, and the outer peripheral surface of the second limiting ring and the bottom surface of the adjusting ring enclose the positioning groove.

3. The polishing head mounting positioning device of claim 1, wherein The positioning element includes: A fixing plate is disposed in the positioning cavity and coaxially connected to the adjusting seat; A pressure plate, coaxially connected to the fixed plate, the outer circumferential surface of the pressure plate and the bottom surface of the fixed plate forming the positioning groove, the pressure plate being used to press the upper clamping ring; and A positioning plate is coaxially connected to the pressure plate, and the positioning plate forms the positioning part.

4. The polishing head mounting positioning device of claim 1, wherein After the positioning groove is inserted into the lower clamping ring, the positioning part abuts against the elastic membrane in the vertical direction.

5. The polishing head mounting positioning device of claim 1, wherein The base has an exhaust hole at its bottom, which is connected to the mounting cavity.

6. The polishing head mounting positioning device of claim 1, wherein The center of the adjustment seat has a weight reduction hole, which is connected to the positioning cavity.

7. The polishing head mounting and positioning device as described in claim 1, characterized in that, The outer sleeve of the adjustment seat is equipped with a pick-and-place ring.

8. A polishing head installation method, characterized in that, include: S100. Place the elastic membrane into the mounting cavity of the base; S200, Insert the lower clamping ring into the elastic membrane located in the mounting cavity, the lower clamping ring being inserted into the cavity of the elastic membrane; S300. Insert the base into the positioning cavity of the adjusting seat. The positioning cavity has a positioning element. The lower clamping ring is inserted into the positioning groove of the positioning element. The positioning groove limits the lower clamping ring in the radial direction, so as to realize the coaxial arrangement of the elastic membrane and the lower clamping ring. S400: Separate the adjusting seat from the base, and ensure that the positions of the base, the elastic membrane and the lower clamping ring remain relatively stationary; S500, Insert the upper clamping ring into the cavity of the elastic membrane; S600, the adjusting seat is inserted into the base, the base is inserted into the positioning cavity, the positioning part of the positioning member is inserted into the center hole of the upper clamping ring, and the positioning part adjusts the position of the upper clamping ring radially to achieve the coaxial setting of the elastic membrane and the upper clamping ring.

9. The polishing head mounting method as described in claim 8, characterized in that, The polishing head mounting method further includes: S700: After the elastic membrane and the upper clamping ring are coaxially arranged, the upper clamping ring is fixed, the adjusting seat and the base are removed, and the mounting module formed by the elastic membrane, the upper clamping ring and the lower clamping ring is connected to other parts of the polishing head.

10. The polishing head mounting method as described in claim 9, characterized in that, The S700 specifically includes: S710. First, disassemble the adjusting seat, and then fix the cover plate to the upper clamping ring; S720. After the cover plate is connected to the upper clamping ring, the base is then separated from the mounting module. S730. Place the mounting module and the cover plate connected to the mounting module into the retaining ring, wherein the retaining ring surrounds the elastic membrane. S740. Install a support plate above the retaining ring.

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