Diffraction-type surface-emitting semiconductor lasers

CN118970623BActive Publication Date: 2025-09-02SUZHOU LABORATORY
View PDF 2 Cites -1 Cited by

Patent Information

Application Number
CN202411435526.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-10-15
Publication Date
2025-09-02
Estimated Expiration
2044-10-15

Smart Images

  • Figure CN118970623B_ABST
    Figure CN118970623B_ABST
Patent Text Reader

Abstract

The present application provides a diffraction-type surface-emitting semiconductor laser. The diffraction-type surface-emitting semiconductor laser includes an upper electrode, an upper cladding layer, an upper waveguide layer, an active layer, a lower waveguide layer, and a lower cladding layer. When carriers are injected into the active layer, the active layer emits light. An optical modulation structure with a radius of R is provided on at least one side of the active layer, and a microcavity with a radius of r is formed in the central region of the optical modulation structure. The optical modulation structure includes a first annular grating structure or a first annular photonic crystal structure. Moreover, the value range of r / R is 4% to 44%. The above-mentioned diffraction-type surface-emitting semiconductor laser can increase the threshold gain difference between the fundamental mode and the higher-order mode by controlling the size of the microcavity and the optical modulation structure to meet the above-mentioned relationship, thereby facilitating the preferential lasing of a single-mode laser with a small divergence angle and a small laser beam quality factor.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Single-mode surface emitting laser and manufacturing method thereof

    CN115275780A

  • Annular photonic crystal microcavity light amplification surface emitting laser

    CN117039615A