Size adjustable quartz holder
Patent Information
- Application Number
- CN202411083836.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-08
- Publication Date
- 2026-10-09
- Estimated Expiration
- 2044-08-08
AI Technical Summary
[0003]然而,传统的水热沉积过程中,沉积面积往往受限于反应釜底部的尺寸,这一限制因素直接影响了沉积反应的有效面积,进而降低了整体的反应效率
本发明结构简单,使用方便,适用于不同宽度的基底材料板,且可以同时插接多片基底材料板,进一步增加了有效反应的面积以及支架使用的灵活性和适应性。当基底材料板插入到斜槽中时,基底材料就具有水平向下的倾斜度,在基底材料重力的作用下,确保了基底材料能够被稳定的置于支架上,且在反应时基底材料不容易掉落,有效的保证了水热反应试验的顺利进行。
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Figure CN118976551B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of hydrothermal reaction technology, specifically an adjustable-size quartz holder. Background Technology
[0002] In recent years, hydrothermal reaction technology, as a key chemical synthesis strategy, has gained widespread attention and rapid progress in the scientific community. This method has achieved remarkable success in multiple fields, including materials science research, environmentally friendly and sustainable green synthesis processes, and the development of functional materials. Hydrothermal reactions can not only prepare compounds that are difficult to synthesize under traditional conditions, but also demonstrate unique value and broad application potential in laboratory research and industrial applications of chemical synthesis and materials preparation. In particular, hydrothermal deposition reactions, as a derivative field of hydrothermal synthesis technology, have also achieved significant technological breakthroughs in recent years. Hydrothermal deposition technology has made a series of important advances in the synthesis of nanomaterials, energy catalysis, biomedicine, and the development of composite materials, and is expected to play an even more crucial role in future research and industrial applications.
[0003] However, in traditional hydrothermal deposition processes, the deposition area is often limited by the size of the bottom of the reactor. This limiting factor directly affects the effective area of the deposition reaction, thereby reducing the overall reaction efficiency. Summary of the Invention
[0004] The present invention aims to overcome the shortcomings of the prior art by providing a quartz holder with adjustable size.
[0005] This application provides the following technical solution: An adjustable quartz holder is characterized in that it includes a vertical plate, a set of vertically distributed quartz rods are evenly distributed on one side surface of the vertical plate, a movable vertical plate is inserted through the set of quartz rods, the movable vertical plate is distributed correspondingly to the vertical plate, multiple pairs of correspondingly distributed inclined grooves are provided on the opposite surfaces of the movable vertical plate and the vertical plate, and detachable limiting locking parts are provided on the quartz rods on both sides of the movable vertical plate to cooperate with the movable vertical plate.
[0006] Based on the above technical solutions, the following further technical solutions are also possible: The projection positions of the multiple pairs of corresponding inclined grooves in the horizontal direction coincide with each other, and the two adjacent pairs of inclined grooves are distributed in parallel, one above the other.
[0007] The limiting locking component includes an upper clamp, one end of which is hinged to a lower clamp via a pin; the other end of the upper clamp is fixed to the lower clamp via bolts and nuts, and one end of the lower clamp is provided with a U-shaped groove to facilitate the opening and closing of the clamp.
[0008] The inclination angle of the multiple pairs of corresponding distributed inclined grooves is 3-5°.
[0009] The high-end unopened end of the inclined groove is located on the thickness end face of the movable vertical plate and the vertical plate on the same side.
[0010] The upright plate, quartz rod, movable upright plate, and limiting locking component are all made of quartz material, and the upright plate and quartz rod are an integral structure.
[0011] Advantages of the invention: This invention features a simple structure and ease of use, and is applicable to substrate material plates of varying widths. Multiple substrate material plates can be inserted simultaneously, further increasing the effective reaction area and enhancing the flexibility and adaptability of the support structure. When the substrate material plate is inserted into the inclined groove, it exhibits a downward tilt, ensuring its stable placement on the support under its own weight. Furthermore, the substrate material is less likely to fall off during the reaction, effectively guaranteeing the smooth progress of the hydrothermal reaction experiment. Attached Figure Description
[0012] Figure 1 This is a three-dimensional structural schematic diagram of the present invention; Figure 2 yes Figure 1 A schematic diagram of the middle limit locking component. Detailed Implementation
[0013] like Figure 1 and 2 As shown, an adjustable quartz holder includes a rectangular upright plate 1 made of quartz, and a vertically distributed quartz rod 2 is respectively set at the four corners of the inner surface of the upright plate 1. The upright plate 1 and the quartz rod 2 are an integral structure.
[0014] A movable vertical plate 3 made of quartz is inserted through four quartz rods 2. The movable vertical plate 3 is distributed correspondingly to the vertical plate 1 and has the same size.
[0015] Multiple pairs of corresponding inclined grooves 4 are provided on the opposite surfaces (inner surfaces) of the movable upright plate 3 and the upright plate 1. Two adjacent pairs of inclined grooves 4 are distributed in parallel, one above the other. The inclination angle of the inclined grooves 4 is 4°. The high end of all the inclined grooves 4 that are not open is located on the same side of the thickness end face of the movable upright plate 3 and the upright plate 1, so that the multiple pairs of corresponding inclined grooves 4 are inclined downward towards the other side end face of the movable upright plate 3 and the upright plate 1.
[0016] On both sides of the movable upright plate 3, quartz rods 2 are provided with detachable limiting and locking components 5 that correspond to and cooperate with the movable upright plate 3. The limiting and locking component 5 includes an upper clamp 51, one end of which is hinged to a lower clamp 52 via a pin 53; the other end of the upper clamp 51 is fixed to the lower clamp 52 via bolts 54 and nuts 55. Furthermore, the end of the lower clamp 52 fixed by bolts 54 and nuts 55 is provided with a U-shaped groove 56 to facilitate the opening and closing of the clamp.
[0017] The inner diameter of the locking member 5 after closing and locking is the same as the diameter of the quartz rod 2, thereby limiting the movement of both sides of the movable upright plate.
[0018] The upright plate 1, quartz rod 2, movable upright plate 3 and limiting locking component 5 are all made of quartz material, and the upright plate 1 and quartz rod 2 are integral.
[0019] structure.
[0020] Work process: Adjust the spacing between the movable uprights according to the size of the substrate material plate for the hydrothermal reaction. After the spacing is adjusted, tighten the bolts on the limiting locking device to lock the position of the movable upright on the quartz rod. Then, insert the substrate material plate into the corresponding inclined slot. Finally, in the prior art, the support is vertically placed in the reactor by a transfer device or manually, and then the hydrothermal reaction can be started.
[0021] Through the above steps, the quartz support of the present invention increases the effective reaction area while also adapting to substrate materials of different sizes, providing a simple and quick adjustment solution to meet the precise placement requirements of the substrate material during hydrothermal reactions. Furthermore, the use of quartz material ensures the chemical stability and high-temperature resistance of the support throughout the hydrothermal reaction process.
Claims
1. A size-adjustable quartz holder, characterized in that, It includes a vertical plate (1), on one side surface of the vertical plate (1) a set of vertically distributed quartz rods (2) are evenly distributed, a movable vertical plate (3) is inserted through the set of quartz rods (2), the movable vertical plate (3) is distributed correspondingly to the vertical plate (1), multiple pairs of correspondingly distributed inclined grooves (4) are provided on the opposite surfaces of the movable vertical plate (3) and the vertical plate (1), and detachable limiting locking parts (5) that cooperate with the movable vertical plate (3) are provided on the quartz rods (2) on both sides of the movable vertical plate (3); the projection positions of the multiple pairs of correspondingly distributed inclined grooves (4) in the horizontal direction coincide with each other, and the two adjacent pairs of inclined grooves (4) are distributed in parallel at the top and bottom; the vertical plate (1), quartz rods (2), movable vertical plate (3) and limiting locking parts (5) are all made of quartz material, and the vertical plate (1) and quartz rods (2) are an integral structure, and the quartz support is used in hydrothermal reaction.
2. The size-adjustable quartz holder according to claim 1, characterized in that: The limiting locking component (5) includes an upper clamp (51), one end of which is hinged to a lower clamp (52) via a pin (53); the other end of the upper clamp (51) is fixed to the lower clamp (52) via a bolt (54) and a nut (55), and one end of the lower clamp (52) is provided with a U-shaped groove (56) to facilitate the opening and closing of the clamp.
3. The size-adjustable quartz holder according to claim 1, characterized in that: The inclination angle of the inclined groove (4) is 3-5°.
4. The size-adjustable quartz holder according to claim 1, characterized in that: The high end of the inclined groove (4) is located on the same side of the thickness end face of the movable vertical plate (3) and the vertical plate (1).
Citation Information
Patent Citations
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