一种自清洁的研磨液中央供应系统
By setting up three mixing tanks in the central supply system for grinding slurry and performing slurry supply, pipe washing, and moisturizing processes at different times, the problem of crystal accumulation in the existing system was solved, automated cleaning was achieved, and production efficiency and product quality were improved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SJ SEMICONDUCTOR (JIANGYIN) CORP
- Filing Date
- 2024-09-20
- Publication Date
- 2026-07-17
AI Technical Summary
The existing central supply system for polishing slurry lacks a regular chemical self-cleaning function, which leads to crystal accumulation in the pipeline, affecting the polishing rate and wafer surface quality. In addition, manual cleaning is inconsistent, reducing production efficiency and machine utilization.
Design a self-cleaning grinding fluid central supply system. Through three mixing tanks, liquid supply, pipe washing and moisturizing, moisturizing and liquid preparation processes are carried out at different time periods to achieve automatic cleaning without stopping the machine. Hydrogen peroxide, deionized water and potassium hydroxide are used to remove crystals.
This technology enables cleaning operations to be completed without shutting down the machine, improving machine utilization and production efficiency, ensuring the purity and stability of the polishing slurry, and enhancing the smoothness of the wafer surface and product yield.
Smart Images
Figure CN118990338B_ABST