Sub-liquid adding system for reducing crystallinity of etching inlet and fluctuation of etching mother liquid
By setting up a flushing and collection module at the etching conveyor port, the etching sub-liquid is transported to the new liquid washing cylinder and replenished back to the etching mother liquor cylinder, solving the crystallinity and mother liquor fluctuation problems of the etching inlet, reducing the scratches of the board and environmental pollution, ensuring that Stability of etching mother liquor.
Patent Information
- Application Number
- CN202411100363.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-12
- Publication Date
- 2024-12-20
AI Technical Summary
In the prior art, due to the high concentration of the etching mother liquor at the etching entrance, drug crystals are easily generated after cooling, resulting in large fluctuations in the etching rate. The automatic addition of etching sub-liquid causes changes in the specific gravity, temperature and concentration of the etching mother liquor to be unfavorable to stability, which in turn affects the etching. Quality, and the new liquid wash can not be updated in time, polluting the environment.
Design a sub-liquid addition system including an etching sub-liquid cylinder, an etching mother liquor cylinder, an etching conveying port, a new liquid washing cylinder, a compensation etching cylinder, a crystallization removal device and a liquid extraction device, by providing a flushing module and liquid collection at the etching conveying port Module, avoiding the etching sub-liquid directly into the etching mother liquor cylinder for flushing and collecting, and then the rinsed liquid is transported to the new liquid washing cylinder. The potion in the new liquid washing cylinder is replenished back to the etching mother liquor cylinder through the liquid extraction device to ensure etching. Stability of mother liquor.
Effectively reduce the crystallinity of the etching inlet, reduce the friction of the potion crystal on the board, reduce the scraping and open circuit scraping of the board, ensure the stability of the specific gravity, temperature and concentration of the etching mother liquor, and the difference in impedance and line width between the control board , and reduce the amount of high-concentration etching mother liquor to reduce environmental pollution.
Smart Images
Figure CN119172943A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of PCB production and manufacturing, and in particular to a sub-liquid adding system for reducing the crystallinity of an etching inlet and the fluctuation of an etching mother liquid. Background Art
[0002] In the production process of PCB (Printed Circuit Board), etching technology plays a vital role in PCB manufacturing. It is the process of removing unnecessary copper from the circuit board. Specifically, etching is to remove the protective film of the area to be etched after exposure and development. During etching, it contacts the chemical solution to achieve the effect of dissolution and corrosion, forming a concave-convex or hollow-out molding effect. This process is a process of controlling corrosion. Under normal circumstances, corrosion will damage the metal, but through effective processing technology, corrosion can be controlled to obtain the desired circuit pattern.
[0003] In the PCB etching process, the purpose of etching is to accurately define the circuit pattern by controlling the etching solution concentration, temperature, etching speed, nozzle pressure and other parameters to achieve the line width / line spacing / pad size required by the customer's drawing. This process is an indispensable step in PCB production, which directly affects the performance and reliability of the circuit board, so the etching solution plays a vital role.
[0004] In the prior art, etching liquid includes etching mother liquid and etching sub-liquid, and their respective functions are as follows:
[0005] Etching mother liquid is usually the main body of etching liquid and has the following main functions:
[0006] 1. Main etchant: The main chemical component contained in the etching mother solution is the main body responsible for the etching effect. It can corrode unprotected (not covered with photoresist or other protective layers) copper or other metal materials, thereby forming the desired circuit pattern on the substrate.
[0007] 2. Stability: The etching solution usually has stable chemical properties to ensure continuous etching ability during the etching process.
[0008] 3. Controllability: By precisely adjusting the composition and concentration of the etching solution, precise etching control can be achieved, thereby ensuring the accuracy and consistency of the circuit pattern.
[0009] Etching liquid is an auxiliary liquid added to the etching mother liquid as needed during the etching process, and has the following functions:
[0010] 1. Adjust the etching speed: By adding an appropriate amount of etching liquid to the etching mother liquid, the etching speed can be adjusted to meet different etching requirements.
[0011] 2. Replenish consumable components: As etching proceeds, some chemical components in the etching solution will gradually be consumed, resulting in a decrease in etching ability. At this time, these consumable components can be replenished by adding etching sub-liquid to maintain the etching ability of the etching solution.
[0012] 3. Optimize etching quality: Some etching liquids also contain some special ingredients, which can help improve the quality of etching, such as reducing over-etching and improving etching accuracy.
[0013] In the PCB production process, the etching mother liquid and the sub-liquid work together in the etching process to ensure the accurate formation of the circuit pattern. The etching mother liquid is the main etchant and is responsible for the main etching effect; while the etching sub-liquid is used to adjust the etching speed, replenish consumable components and optimize the etching quality. The two complement each other and together constitute a complete etching system.
[0014] In the prior art, due to the high concentration of the etching mother solution at the etching inlet, drug crystals are easily generated at the etching inlet after cooling.
[0015] At present, the automatic addition method of etching sub-liquid is to add the etching sub-liquid directly from the etching sub-liquid tank into the etching mother liquid cylinder through a dosing pump. The specific gravity, temperature and concentration of the etching sub-liquid are quite different from those of the etching mother liquid. Directly adding the etching sub-liquid into the etching mother liquid cylinder will cause the specific gravity, temperature and concentration of the etching mother liquid to fluctuate greatly, which is not conducive to the stability of the etching mother liquid, and further causes large changes in the etching rate.
[0016] The existing new liquid washing solution can only get a part of the sub-liquid addition shunt and cannot be updated in time. The higher the concentration, the more the carry-out amount will be, which pollutes the environment.
[0017] It is not difficult to see that there are still many problems in the prior art, and the existing sub-liquid adding system needs to be improved to overcome the defects of the prior art. Summary of the invention
[0018] Therefore, in order to solve the above problems in the prior art, the present invention proposes a sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid.
[0019] The present invention solves the above problems by the following technical means:
[0020] A sub-liquid adding system for reducing the crystallinity of an etching inlet and the fluctuation of an etching mother liquid, comprising:
[0021] The etching sub-liquid cylinder, the etching mother liquid cylinder, the etching delivery port, the new liquid washing cylinder, the compensation etching cylinder, the crystal removal device and the liquid pumping device each include an input port and an output port; the input port of the etching mother liquid cylinder includes a first input port of the etching mother liquid cylinder and a second input port of the etching mother liquid cylinder, and the input port of the new liquid washing cylinder includes a first input port of the new liquid washing cylinder and a second input port of the new liquid washing cylinder;
[0022] The etching delivery port is connected to the first input port of the etching mother liquid tank, the output port of the etching mother liquid tank is connected to the input port of the compensation etching tank, and the output port of the compensation etching tank is connected to the first input port of the new liquid washing tank;
[0023] The input port of the crystal removal device is connected to the output port of the etching sub-liquid cylinder, and the output port of the crystal removal device is connected to the second input port of the new liquid washing cylinder;
[0024] The input port of the pumping device is arranged in the new liquid washing tank, and the output port of the pumping device is connected to the second input port of the etching mother liquid tank.
[0025] Furthermore, the crystal removal device includes: a flushing module and a liquid collection module, the input end of the flushing module is connected to the output port of the etching sub-liquid cylinder; the liquid collection module is used to collect the liquid generated after the flushing module implements flushing, and its output port is connected to the second input port of the new liquid washing cylinder.
[0026] Furthermore, the flushing module is an automatic spraying structure, and the automatic spraying structure is suspended above the etching delivery port.
[0027] Furthermore, the automatic spraying structure includes: a first dosing pump and a nozzle, the input end of the nozzle is connected to the output end of the first dosing pump, and the output end of the nozzle is suspended above the etching delivery port; the input end of the first dosing pump is connected to the output port of the etching sub-liquid cylinder.
[0028] Furthermore, the liquid collecting module is a liquid receiving tray, and the liquid receiving tray is arranged below the etching delivery port, and the output end of the liquid receiving tray is connected to the second input port of the new liquid washing tank.
[0029] Furthermore, the flushing module is a manual spraying structure, and the manual spraying structure is suspended above the etching delivery port.
[0030] Furthermore, the liquid pumping device is an automatic liquid pumping device, the input port of the liquid pumping device is arranged in the new liquid washing tank, and the output port of the automatic liquid pumping device is connected to the second input port of the etching mother liquid tank.
[0031] Furthermore, the automatic liquid pumping device includes: a liquid level sensor and a second dosing pump, the liquid level sensor is located in the new liquid washing tank and is electrically connected to the second dosing pump; the input end of the second dosing pump is located in the new liquid washing tank, and the output end of the second dosing pump is connected to the second input port of the etching mother liquid tank.
[0032] Furthermore, the liquid pumping device is a manual liquid pumping device, the input port of the liquid pumping device is arranged in the new liquid washing tank, and the output port of the manual liquid pumping device is connected to the second input port of the etching mother liquid tank.
[0033] The present invention arranges a flushing module and a liquid collection module in the etching delivery port, and connects the liquid collection module to the second input port of the new liquid washing tank. This avoids adding the etching sub-liquid directly into the etching mother liquid tank, and delivers the etching sub-liquid to the etching delivery port through the flushing module, flushes the etching delivery port, and the flushed etching sub-liquid flows into the liquid collection module, and the liquid collection module then delivers the flushed etching sub-liquid to the new liquid washing tank, and the new liquid washing tank then uses the automatic liquid pumping device to pump the liquid in the new liquid washing tank back into the etching mother liquid tank; flushing the etching delivery port by the flushing module can improve the problem of liquid crystallization at the etching delivery port and reduce the impact of liquid crystallization on the tin surface Friction can reduce the scratching of the plate and reduce the scrapping caused by open circuit; the etching sub-liquid with chemical crystals after flushing the etching delivery port is transported to the new liquid washing tank, and compared with the original etching sub-liquid, the corresponding specific gravity, temperature and concentration of the chemical in the new liquid washing tank are increased at this moment, and the chemical in the new liquid washing tank is transported to the etching mother liquid tank again, so as to ensure the stability of the specific gravity, temperature and concentration of the etching mother liquid, and effectively control the impedance and line width differences between the plates; at the same time, the carry-out amount of high-concentration etching mother liquid is reduced, and environmental pollution is reduced. BRIEF DESCRIPTION OF THE DRAWINGS
[0034] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0035] Figure 1 It is a structural schematic diagram of a sub-liquid adding system for reducing the crystallinity of an etching inlet and the fluctuation of an etching mother liquid according to the present invention. DETAILED DESCRIPTION
[0036] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the technical solution of the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be pointed out that the described implementation examples are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0037] Example 1
[0038] The present invention is described in more detail below:
[0039] like Figure 1 As shown, a sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid comprises:
[0040] The etching sub-liquid cylinder, the etching mother liquid cylinder, the etching delivery port, the new liquid washing cylinder, the compensation etching cylinder, the crystal removal device and the liquid pumping device each include an input port and an output port; the input port of the etching mother liquid cylinder includes a first input port of the etching mother liquid cylinder and a second input port of the etching mother liquid cylinder, and the input port of the new liquid washing cylinder includes a first input port of the new liquid washing cylinder and a second input port of the new liquid washing cylinder.
[0041] The etching delivery port is connected to the first input port of the etching mother liquid cylinder, that is, it is used to transport the plate into the etching mother liquid cylinder for etching; the output port of the etching mother liquid cylinder is connected to the input port of the compensation etching cylinder, that is, it is used to perform further compensation etching on the etched plate; the output port of the compensation etching cylinder is connected to the first input port of the new liquid washing cylinder, that is, it is used to clean the plate after the compensation etching.
[0042] The input port of the crystal removal device is connected to the output port of the etching sub-liquid cylinder, and the output port of the crystal removal device is connected to the second input port of the new liquid washing cylinder; it should be noted that during the etching process of the plate, at the etching delivery port, due to the high concentration of the etching mother liquid, it is easy to produce liquid crystals at the etching delivery port after cooling. The liquid crystals include but are not limited to copper crystals. The liquid crystals are easy to rub against the tin surface of the plate, thereby causing scratches on the plate, and then causing the plate to be scrapped due to open circuit.
[0043] Preferably, the crystal removal device comprises: a rinsing module and a liquid collection module, the input end of the rinsing module is connected to the output port of the etching sub-liquid cylinder; the liquid collection module is used to collect the liquid generated after the rinsing module implements rinsing, and its output port is connected to the second input port of the new liquid washing cylinder.
[0044] Therefore, the present embodiment provides a flushing module to directly flush the etching delivery port where the liquid medicine crystals are likely to form, thereby preventing the liquid medicine crystals from staying at the etching delivery port, thereby reducing scratches on the plate and reducing the open circuit scrapping of the plate.
[0045] This embodiment also provides a liquid collection module. Preferably, the liquid collection module is used to collect the liquid generated after the flushing module implements flushing, and its output port is connected to the second input port of the new liquid washing tank. The liquid collection module is used to collect the liquid generated after the flushing module implements flushing, and the etching sub-liquid with the crystals of the chemical solution after flushing the etching delivery port is delivered to the new liquid washing tank. Compared with the original etching sub-liquid, the specific gravity, temperature and concentration of the chemical solution in the new liquid washing tank are increased.
[0046] Preferably, the present embodiment is provided with a pumping device, the input port of the pumping device is provided in the new liquid washing tank, and the output port of the pumping device is connected to the second input port of the etching mother liquid tank. The present embodiment is provided with a pumping device, and when the liquid in the new liquid washing tank reaches a certain amount, the liquid in excess is transported to the etching mother liquid tank through the pumping device to replenish the consumed etching mother liquid.
[0047] It should be noted that, because the concentrations of the etching mother liquid and the etching sub-liquid are different, the concentration of the etching mother liquid is much higher than that of the etching sub-liquid. If the etching sub-liquid is directly transported into the etching mother liquid cylinder, it will inevitably affect the concentration of the etching mother liquid in the etching mother liquid cylinder, resulting in a relatively large fluctuation in the concentration of the etching mother liquid. However, through the combined action of the flushing module, the liquid collection module and the liquid pumping device of this embodiment, the etching sub-liquid that has been flushed through the etching delivery port, that is, the mixed solution of the etching sub-liquid containing the drug crystals, has increased a lot in concentration compared to the original etching sub-liquid, and is closer to the concentration of the etching mother liquid. Finally, it is transported to the etching mother liquid cylinder through the liquid pumping device, which has less impact on the concentration of the etching mother liquid in the etching mother liquid cylinder, avoiding large-scale fluctuations in the concentration of the etching mother liquid, ensuring the stability of the specific gravity, temperature and concentration of the etching mother liquid, and effectively controlling the impedance and line width differences between the boards.
[0048] Preferably, the flushing module is an automatic spraying structure, and the automatic spraying structure is suspended above the etching delivery port. Preferably, the automatic spraying structure comprises: a first dosing pump and a nozzle, the input end of the nozzle is connected to the output end of the first dosing pump, and the output end of the nozzle is suspended above the etching delivery port; the input end of the first dosing pump is connected to the output port of the etching sub-liquid cylinder.
[0049] It should be noted that the automatic spraying structure here includes but is not limited to a structure composed of a first dosing pump and a nozzle, which can solve the purpose of flushing the etching delivery port and belongs to the scope of protection of the present invention. Preferably, a sensor and a trigger can be set at the nozzle, and as long as the presence of liquid crystals at the etching delivery port is sensed, the first dosing pump is automatically triggered to pump the etching sub-liquid liquid in the etching sub-liquid cylinder to the nozzle, and then flush the liquid crystals at the etching delivery port, so as to achieve the purpose of flushing the liquid crystals at the etching delivery port.
[0050] Preferably, the liquid collection module is a liquid receiving tray, and the liquid receiving tray is arranged below the etching delivery port. It should be noted that the liquid collection module herein includes but is not limited to a liquid receiving tray, which can solve the purpose of collecting and receiving the mixed liquid of the drug crystals and the etching sub-liquid formed after being rinsed by the rinsing module, and all belong to the scope of protection of the present invention.
[0051] Preferably, the pumping device is an automatic pumping device, the input port of the pumping device is arranged in the new liquid washing tank, and the output port of the automatic pumping device is connected to the second input port of the etching mother liquid tank. Preferably, the automatic pumping device comprises: a liquid level sensor and a second dosing pump, the liquid level sensor is located in the new liquid washing tank and is electrically connected to the second dosing pump; the input end of the second dosing pump is located in the new liquid washing tank, and the output end of the second dosing pump is connected to the second input port of the etching mother liquid tank.
[0052] It should be noted that the automatic liquid pumping device described herein includes but is not limited to a combination of a liquid level sensor and a second dosing pump, which can achieve the purpose of automatically transferring the liquid medicine in the new liquid washing tank to the etching mother liquid tank, and all belong to the scope of protection of the present invention. When the liquid level sensor, i.e., the liquid medicine level in the new liquid washing tank, reaches a certain height, the dosing pump will be automatically started, and a certain amount of the liquid medicine in the new liquid washing tank will be pumped into the etching mother liquid tank. The principle of the joint operation between the liquid level sensor and the dosing pump is common knowledge and will not be repeated here.
[0053] Example 2
[0054] The present invention is described in more detail below:
[0055] It should be noted that the only technical feature that distinguishes Example 2 from the technical solution recorded in Example 1 is that: in this example, the automatic flushing structure described in Example 1 is replaced with a manual flushing structure, and the technical effect brought about by the manual flushing structure is consistent with the technical effect brought about by the automatic flushing structure recorded in Example 1; the other technical features and the technical effects brought about by all technical features are the same or equivalent to the technical solution recorded in Example 1.
[0056] Therefore, this embodiment omits the description of other technical features and the technical effects brought by other technical features. This embodiment only describes the manual flushing structure. Preferably, the manual flushing structure includes but is not limited to: manually tracking to confirm whether there is liquid crystallization at the etching delivery port. If so, manually taking the sub-liquid liquid in the etching sub-liquid tank to flush the etching delivery port; so as to achieve the purpose of flushing the etching delivery port.
[0057] Example 3
[0058] The present invention is described in more detail below:
[0059] It should be noted that the only technical feature that distinguishes Example 3 from the technical solution recorded in Example 1 is that: in this example, the automatic liquid pumping device described in Example 1 is replaced by a manual liquid pumping device, and the technical effect brought about by the manual liquid pumping device is consistent with the technical effect brought about by the automatic liquid pumping device recorded in Example 1; the other technical features and the technical effects brought about by all technical features are the same or equivalent to the technical solution recorded in Example 1.
[0060] Therefore, this embodiment omits the description of other technical features and the technical effects brought by other technical features. This embodiment only describes the manual liquid pumping device. Preferably, the manual liquid pumping device includes but is not limited to: manually tracking to confirm whether the amount in the new liquid washing tank exceeds the initially set threshold amount. If it exceeds, manually taking the medicine in the new liquid washing tank and adding it to the etching mother liquid tank; so as to achieve the effect of adding the medicine in the new liquid washing tank into the etching mother liquid tank.
[0061] Example 4
[0062] The present invention is described in more detail below:
[0063] It should be noted that the only technical feature that distinguishes Example 4 from the technical solution recorded in Example 2 is that: in this example, the automatic liquid pumping device described in Example 2 is replaced by a manual liquid pumping device, and the technical effect brought about by the manual liquid pumping device is consistent with the technical effect brought about by the automatic liquid pumping device recorded in Example 2; the other technical features and the technical effects brought about by all technical features are the same or equivalent to the technical solution recorded in Example 2.
[0064] Therefore, this embodiment omits the description of other technical features and the technical effects brought by other technical features. This embodiment only describes the manual liquid pumping device. Preferably, the manual liquid pumping device includes but is not limited to: manually tracking to confirm whether the amount in the new liquid washing tank exceeds the initially set threshold amount. If it exceeds, manually taking the medicine in the new liquid washing tank and adding it to the etching mother liquid tank; so as to achieve the effect of adding the medicine in the new liquid washing tank into the etching mother liquid tank.
[0065] The present invention arranges a flushing module and a liquid collection module in the etching delivery port, and connects the liquid collection module to the second input port of the new liquid washing tank. This avoids adding the etching sub-liquid directly into the etching mother liquid tank, and delivers the etching sub-liquid to the etching delivery port through the flushing module, flushes the etching delivery port, and the flushed etching sub-liquid flows into the liquid collection module, and the liquid collection module then delivers the flushed etching sub-liquid to the new liquid washing tank, and the new liquid washing tank then uses the automatic liquid pumping device to pump the liquid in the new liquid washing tank back into the etching mother liquid tank; flushing the etching delivery port by the flushing module can improve the problem of liquid crystallization at the etching delivery port and reduce the impact of liquid crystallization on the tin surface Friction can reduce the scratching of the plate and reduce the scrapping caused by open circuit; the etching sub-liquid with chemical crystals after flushing the etching delivery port is transported to the new liquid washing tank, and compared with the original etching sub-liquid, the corresponding specific gravity, temperature and concentration of the chemical in the new liquid washing tank are increased at this moment, and the chemical in the new liquid washing tank is transported to the etching mother liquid tank again, so as to ensure the stability of the specific gravity, temperature and concentration of the etching mother liquid, and effectively control the impedance and line width differences between the plates; at the same time, the carry-out amount of high-concentration etching mother liquid is reduced, and environmental pollution is reduced.
[0066] References to "one embodiment", "another embodiment", "embodiment", "preferred embodiment", etc. in this specification refer to specific features, structures or characteristics described in conjunction with the example included in at least one embodiment generally described in this application. The appearance of the same expression in multiple places in the specification does not necessarily refer to the same embodiment. Further, when a specific feature, structure or characteristic is described in conjunction with any embodiment, it is claimed that the realization of such feature, structure or characteristic in conjunction with other embodiments also falls within the present invention. Although the present invention is described herein with reference to a number of illustrative examples of the present invention, it should be understood that those skilled in the art can design many other modifications and implementations that fall within the scope and spirit of the principles disclosed in this application. More specifically, within the scope of the present application disclosure, drawings and claims, in addition to the deformation and improvement that can be made to the components and / or layout of the subject combination layout, other uses will also be obvious to those skilled in the art.
Claims
1. A sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid, characterized in that: include: The etching sub-liquid cylinder, the etching mother liquid cylinder, the etching delivery port, the new liquid washing cylinder, the compensation etching cylinder, the crystal removal device and the liquid pumping device each include an input port and an output port; the input port of the etching mother liquid cylinder includes a first input port of the etching mother liquid cylinder and a second input port of the etching mother liquid cylinder, and the input port of the new liquid washing cylinder includes a first input port of the new liquid washing cylinder and a second input port of the new liquid washing cylinder; The etching delivery port is connected to the first input port of the etching mother liquid tank, the output port of the etching mother liquid tank is connected to the input port of the compensation etching tank, and the output port of the compensation etching tank is connected to the first input port of the new liquid washing tank; The input port of the crystal removal device is connected to the output port of the etching sub-liquid cylinder, and the output port of the crystal removal device is connected to the second input port of the new liquid washing cylinder; The input port of the liquid pumping device is arranged in the new liquid washing tank, and the output port of the automatic liquid pumping device is connected to the second input port of the etching mother liquid tank.
2. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 1, characterized in that: The crystal removal device includes: a flushing module and a liquid collection module, the input end of the flushing module is connected to the output port of the etching sub-liquid cylinder; the liquid collection module is used to collect the liquid generated after the flushing module implements flushing, and its output port is connected to the second input port of the new liquid washing cylinder.
3. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 2, characterized in that: The flushing module is an automatic spraying structure, and the automatic spraying structure is suspended above the etching delivery port.
4. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 3, characterized in that: The automatic spraying structure comprises: a first dosing pump and a nozzle, the input end of the nozzle is connected to the output end of the first dosing pump, and the output end of the nozzle is suspended above the etching delivery port; the input end of the first dosing pump is connected to the output port of the etching sub-liquid cylinder.
5. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 2, characterized in that: The liquid collecting module is a liquid receiving tray, which is arranged below the etching delivery port, and the output end of the liquid receiving tray is connected to the second input port of the new liquid washing tank.
6. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 2, characterized in that: The flushing module is a manual spraying structure.
7. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 1, characterized in that: The liquid pumping device is an automatic liquid pumping device, the input port of the liquid pumping device is arranged in the new liquid washing tank, and the output port of the automatic liquid pumping device is connected to the second input port of the etching mother liquid tank.
8. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 7, characterized in that: The automatic liquid pumping device includes: a liquid level sensor and a second dosing pump, wherein the liquid level sensor is located in the new liquid washing tank and is electrically connected to the second dosing pump; the input end of the second dosing pump is located in the new liquid washing tank, and the output end of the second dosing pump is connected to the second input port of the etching mother liquid tank.
9. The sub-liquid adding system for reducing the crystallinity of the etching inlet and the fluctuation of the etching mother liquid according to claim 1, characterized in that: The liquid pumping device is a manual liquid pumping device.