Device and method for drying and / or cleaning a tank-shaped hollow body, in particular a transport container for semiconductor wafers or for EUV lithography masks

Abstract

The invention relates to a device (10) for drying and / or cleaning a tank-like hollow body (12), in particular a transport container for semiconductor wafers or EUV lithography masks, wherein the hollow body (12) has a hollow body wall (14) forming an inner hollow body surface (16), the inner hollow body surface (16) delimiting an inner hollow body space (17), and a hollow body opening (18) enclosed by the hollow body wall (14), through which the inner hollow body space (17) can be accessed, the device (10) comprising a first holding device (30) by means of which the device (10) can interact in a holding manner with the hollow body wall (14), a pumping device (60) for applying a vacuum in the inner hollow body space (17) and / or a conveying device (66) for conveying a flushing fluid through the inner hollow body space (17), and a displacement member (48) which can access the inner hollow body space (17) through the hollow body opening (18). The invention also relates to a corresponding method for drying and / or cleaning a tank-like hollow body (12).

Description

Technical Field

[0001] The present invention relates to apparatus and methods for drying and / or cleaning can-shaped hollow bodies, particularly transport containers for semiconductor wafers or for EUV lithography masks. Background Technology

[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor components takes place in factories, where so-called semiconductor wafers undergo numerous processing steps. A large portion of these processing steps are carried out in cleanrooms, which require significant effort to maintain a contaminant-free environment, particularly free of particles. This complex process is necessary because particles in contact with the semiconductor material of the wafer can significantly affect the material properties of the wafer, leading to defects and unusability of the entire production batch, ultimately requiring scrapping.

[0003] As the integration density of semiconductor circuits and the size of cleanrooms increase, the effort to maintain cleanliness grows exponentially, making cleanliness increasingly important. Semiconductor wafers are not transported from one processing station to the next in an "open" state. Instead, special transport containers (so-called FOUPs, front-opening wafer transfer cassettes) are used. These are understood as box-shaped transport containers into which a large number of semiconductor wafers are inserted. FOUPs are typically closed with a removable lid. Without the lid, a FOUP has a basic can-like shape with a rectangular base. When the FOUP is closed with its lid, the inserted semiconductor wafers can be transported from one cleanroom to another, unaffected by the environment. When the FOUP arrives at the processing station, it is opened, the semiconductor wafers are removed, and processed accordingly. After processing, the semiconductor wafers are returned to the FOUP and then transported to the next processing station.

[0004] Due to the high production losses caused by semiconductor wafer contamination, it is necessary to clean the FOUP with cleaning fluid from time to time. The FOUP is particularly susceptible to contamination by semiconductor wafer wear debris during introduction and removal.

[0005] The same applies to shipping containers for EUV (Extreme Ultraviolet) lithography masks. EUV lithography masks are used to manufacture very small integrated circuits. Like semiconductors, EUV lithography masks also need to be transported, presenting a similar situation. This explanation also applies to shipping containers for EUV lithography masks when discussing FOUPs below.

[0006] Devices for cleaning FOUPs are known, for example, from US 5238703A, US2002 / 0046760 A1, US2003 / 0102015 A1, WO 2005 / 00188A2 and EP 1 899 084 B1.

[0007] This cleaning device can be used to clean both the inner and outer surfaces of a FOUP. The outer surface of the FOUP is typically more heavily contaminated than the inner surface. Therefore, during the cleaning process, the cleaning fluid accumulates particles originating from both the outer and inner surfaces. These particles can thus be transferred from the outer surface to the inner surface. However, satisfactory cleaning results can only be achieved when the number of particles is reduced to a certain level. Due to the particles originating from the outer surface, the cleaning procedure must be performed for a correspondingly longer time to remove a sufficient number of particles.

[0008] Once the cleaning process is complete, a vacuum can be applied to the outer and / or inner surfaces. A sufficiently large vacuum is applied to remove any residue of the cleaning fluid remaining on the surfaces of the hollow body and lid due to the cleaning action of the hollow body within the cleaning device. Moisture also diffuses into the micropores on the surfaces of the hollow body and lid due to capillary action. This moisture can also be removed by vacuum, allowing drying at a microscopic level. However, applying a sufficiently large vacuum is a relatively energy-intensive and demanding process, thus making the cleaning process more expensive and time-consuming. Summary of the Invention

[0009] One embodiment of the present invention aims to provide an apparatus for drying and / or cleaning transport containers, particularly those for semiconductor wafers or EUV lithography masks, which provides a simple and inexpensive remedy for the aforementioned drawbacks, achieving inexpensive and time-saving drying compared to known prior art processes. Furthermore, a fundamental objective of one embodiment of the present invention is to provide a method for operating such an apparatus.

[0010] This objective is achieved by the features specified in claims 1 and 10. Advantageous embodiments are the subject of the dependent claims.

[0011] One embodiment of the present invention relates to an apparatus for drying and / or cleaning a can-shaped hollow body, particularly a transport container for semiconductor wafers or EUV lithography masks, wherein the hollow body comprises:

[0012] - A hollow body wall forming an internal hollow body surface, said internal hollow body surface including an internal hollow body space; and

[0013] - It has a hollow opening surrounded by a hollow body wall, through which the internal hollow body space can be accessed;

[0014] The device includes:

[0015] - A first retaining device, which can interact with the hollow body in a retaining manner through the first retaining device;

[0016] o Evacuation device, used to apply a vacuum in the internal hollow space; and / or

[0017] o. A conveying device for conveying flushing fluid through an internal hollow space; and

[0018] - Displacement components, which can be introduced into or be introduced into the internal hollow space through the hollow body opening.

[0019] The first retaining device is used to position the hollow body within the device during the application of vacuum and / or during the transport of flushing fluid through the internal hollow body space. In its simplest case, the first retaining device may be a support surface.

[0020] A displacement member can be understood as a member occupying a certain volume that cannot or is largely unable to flow with a certain fluid. The displacement member does not necessarily have to be a solid and can guide the flow of different fluids separately from the specific fluid.

[0021] The displacement member is arranged to protrude into the internal hollow space. With the help of the displacement member, the volume required to generate a vacuum is reduced. As a result, the time to reach the desired vacuum is shortened, thereby accelerating the entire drying process, especially the drying process on the surface of the internal hollow body. Simultaneously, the energy required to apply the desired pressure is reduced.

[0022] The delivery of the flushing fluid can be carried out alternately or cumulatively with the application of vacuum using the same apparatus. For example, nitrogen can be used as the flushing fluid. However, so-called AMC (airborne molecular contamination) is eliminated by vaporizing the surfaces of the internal hollow body with the aid of the flushing fluid. Such AMCs are particularly fluorine, metals, and free radicals. The use of a displacement member reduces the volume of flushing fluid required. Furthermore, the displacement member can induce the flushing fluid to flow through the internal hollow body space, thereby ensuring that the flushing fluid can also reach hard-to-reach surfaces that may form dead zones. Therefore, the aforementioned vaporization process can be carried out effectively and thoroughly.

[0023] It must be reiterated that this device can be used for both vacuum drying and cleaning using rinsing fluid. For this purpose, the device simply needs to be connected to the appropriate unit, such as a vacuum unit or a rinsing fluid reservoir. In this respect, the vacuum unit can also simultaneously take over the function of the delivery unit, and vice versa, thus eliminating the need for separate units. After the drying process is completed using the appropriate automatic valve connection, the cleaning process can continue without any real-time loss.

[0024] According to another embodiment, the displacement member may have a channel orifice that opens into the internal hollow space when the displacement member is introduced, and flushing fluid can be delivered into the internal hollow space through the channel orifice and / or a vacuum can be applied within the internal hollow space through the channel orifice. In this embodiment, the valve body also serves to supply flushing fluid into the internal hollow space. As a result, a targeted flow of flushing fluid can be generated within the internal hollow space in a simple manner, thereby improving cleaning effectiveness.

[0025] In a further developed embodiment, the device may have a device wall, and the displacement member may be releasably connected to the device wall or may be integral with the device wall.

[0026] With the displacement member releasably connected to the device wall, in the event of any damage, it can be replaced with another displacement member without much effort. Displacement members of different shapes can also be connected to the device wall. Therefore, a given device can be quickly converted into hollow bodies of different shapes, thus increasing the flexibility of the device.

[0027] When the displacement member and the device wall are formed in one component, mass production of the device can be simplified because one component can be saved. Furthermore, the connection step is omitted.

[0028] In a further developed embodiment, the device wall may have a first wall portion and a second wall portion, the first wall portion being releasably connected to each other and surrounding the internal device space in the connected state, wherein a first retaining device includes a retaining surface, and the first wall portion forms a retaining surface that at least partially defines the internal device space. The retaining surface is used to support the hollow body. Since the retaining surface at least partially defines the internal device space, it faces the internal device space. Therefore, when the hollow body is placed on the retaining surface, the hollow body is arranged in the internal device space. When the first wall portion and the second wall portion are connected to each other, the internal device space is an enclosed space. Since the first wall portion and the second wall portion are releasable to each other, the hollow body can be introduced into and removed from the internal device space without problems. The device wall here protects the hollow body from external influences, especially during drying and cleaning processes. It is also possible, if this seems reasonable, that the retaining surface is formed by the second wall portion.

[0029] In another embodiment, the hollow body wall may form the outer hollow body surface, and the device may have at least one fluid conduction device through which flushing fluid can be conducted from the inner hollow body space to the outer hollow body space, and / or through which a vacuum can be applied in the inner hollow body region and / or the internal device space.

[0030] As described above, semiconductor wafers are arranged within a predominantly enclosed internal hollow space. Therefore, due to the close proximity of the spaces, contamination of the semiconductor wafers is primarily caused by contaminants originating from the surface of the internal hollow space. Thus, cleaning the internal hollow space surface is more important than cleaning the external hollow space surface. However, the external hollow space surface is typically more contaminated than the internal hollow space surface. Since particles can migrate to the internal hollow space and from there to the semiconductor wafer with open hollow spaces, cleaning the external hollow space also helps reduce the number of defective semiconductor wafers. In this embodiment, the external hollow space surface can also be dried by applying a vacuum and / or cleaned with a suitable rinsing fluid. Both of these measures contribute to reducing contamination on the external hollow space surface.

[0031] As mentioned above, the inner hollow body surface is generally less contaminated than the outer hollow body surface. In this embodiment, the flushing fluid is first conducted from the fluid conduction device to the inner hollow body surface, and then to the outer hollow body surface. Therefore, the flushing fluid flows first over the less contaminated surfaces and then to the more contaminated surfaces. This prevents highly particulate-laden flushing fluid from flowing over relatively lightly contaminated surfaces, which are less effectively cleaned or even become contaminated.

[0032] A further developed embodiment is characterized in that the hollow body has a lid, the opening of the hollow body can be closed by the lid, and the device has a second retaining device, through which the lid can be releasably secured to the device wall. As described above, the FOUP can be closed with a removable lid. In this embodiment, the lid can also be dried and cleaned within the device, eliminating the need for a separate process specifically for the lid.

[0033] According to another embodiment, the lid may have an inner lid surface and an outer lid surface, and the device may include a gripping and moving device by which the lid can be connected to a second retaining device such that the outer lid surface faces the external hollow body surface.

[0034] Simultaneous cleaning of the hollow body and the lid requires their separation before the introduction of the device. The introduction of the device is performed separately. In clamping and moving devices known in the prior art for this process, the inner lid surface of the lid, separated from the hollow body, faces the outer hollow body surface. For example, due to the reasons mentioned above, efforts are made to minimize the volume of the internal device space, so the distance between the outer hollow body surface and the inner lid surface is usually not particularly large. Therefore, due to contamination of the outer hollow body space, a heavy load of flushing fluid also flows over the inner lid surface, making it difficult to clean effectively, and potentially even causing contamination. The flushing fluid must be supplied for a correspondingly long time. Since the lid is arranged in the internal device space in this embodiment, with the outer lid surface facing the outer hollow body surface, this situation is avoided, and the cleaning process is accelerated. It can be assumed here that the flushing fluid volume increases as the distance from the surface to be cleaned decreases.

[0035] In another embodiment, it is suitable to arrange at least one rectifier in the interior space, through which the flow of flushing fluid can be guided in the interior space. The rectifier may include multiple baffles and / or partitions. The flow of flushing fluid can be guided so that higher loads of flushing fluid do not flow on the inner cover surface or flow only to a very small extent. This avoids the situation described above, where higher loads of flushing fluid flow over the relatively clean inner cover surface, potentially contaminating it rather than cleaning it.

[0036] A further developed embodiment is characterized in that the hollow body wall forms an edge surface surrounding the hollow body opening, and the first retaining device includes a locking device by which the hollow body is sealably connected to the edge surface and releasably connected to the retaining surface. During drying and cleaning, the hollow body is clearly secured and positioned by using the locking device, thereby ensuring the desired flow rate. The edge surface separates the inner hollow body surface from the outer hollow body surface. Because the edge surface of the hollow body is sealed on the retaining surface, uncontrolled flow of flushing fluid from the inner hollow body space to the outer hollow body space, or vice versa, is prevented. Furthermore, a vacuum can only be permanently applied within the inner hollow body space.

[0037] Another embodiment features a displacement member surrounding a hollow space accessible through a channel opening, and a heating device arranged within this hollow space to heat the hollow body for drying. The heating device is used to heat the hollow body after cleaning to support the drying process. Because the displacement member is introduced into the internal hollow space, the distance between the heating device and the hollow body wall is small, thus enabling effective heating. Since the hollow space is open, atmospheric pressure exists within it. Therefore, there is no need for special measures to protect the heating device from vacuum. Furthermore, the heating device is easily accessible through the channel opening, allowing for assembly and maintenance without the need for special measures.

[0038] Further developments could specify that the heating device includes multiple infrared diodes, and the displacement member is composed of or includes materials that transmit infrared radiation. The advantage of infrared diodes is that the infrared radiation they produce is within a strictly limited frequency range, which can be optimized for the cleaning fluid used. Some infrared diodes can generate infrared radiation to heat the cleaning fluid; others can generate infrared radiation to heat the hollow body wall. Residues of the cleaning fluid remaining on the inner or outer hollow body surface are very effectively heated and thus eliminated through interaction with the vacuum.

[0039] One embodiment of the present invention relates to a method for cleaning a can-shaped hollow body using an apparatus according to any one of the preceding claims, particularly for a transport container for semiconductor wafers or EUV lithography masks, the method comprising the following steps:

[0040] - The interaction between the hollow body walls is maintained by the first retaining device;

[0041] - Introducing displacement components into the internal hollow space; and

[0042] - Apply a vacuum in the internal hollow space using a evacuation device; and / or

[0043] - The flushing fluid is transported through the internal hollow main body space via a conveying device.

[0044] The technical effects and advantages achievable by the method proposed according to the present invention correspond to those discussed for this device. In summary, it must be noted that, with the aid of the displacement member, the volume of vacuum generated is reduced. As a result, the time to reach the desired vacuum is shortened, thereby accelerating the entire drying process, particularly the drying process of the internal hollow body surface. Simultaneously, the energy required to apply the desired pressure is reduced. For the same reason, the volume of rinsing fluid required to clean the internal hollow body surface is also kept small. Here, it seems prudent to perform cleaning after the drying process.

[0045] In another embodiment, the hollow body may be specified to have a lid having an inner lid surface and an outer lid surface, through which the opening of the hollow body can be closed. The device here has a device wall, a second retaining device, and a gripping and moving device, through which the lid is releasably secured to the device wall, wherein the method includes the following steps:

[0046] - The cover can be releasably secured by a clamping and moving device using a second retaining device, such that the outer cover surface faces the outer hollow body surface.

[0047] When the inner cover surface faces the outer hollow body surface, high-load flushing fluid will also flow over the inner cover surface due to contamination of the outer hollow body space, making it almost impossible to clean the inner cover surface effectively or even causing it to become contaminated. In this embodiment, the cover is arranged within the internal device space, with the outer cover surface facing the outer hollow body surface, thus avoiding this situation. Attached Figure Description

[0048] Exemplary embodiments of the present invention will now be explained in more detail with reference to the accompanying drawings. As shown below:

[0049] Figure 1A-1F Different steps of operating the device according to the first embodiment of the present invention;

[0050] Figure 2 A second embodiment of the device according to the present invention;

[0051] Figure 3 A third embodiment of the device according to the present invention;

[0052] Figure 4 The fourth embodiment of the device according to the present invention;

[0053] Figure 5A Cross-sectional view of a fifth embodiment of the device according to the present invention;

[0054] Figure 5B : Figure 5A Plan view of the displacement member shown;

[0055] Figure 6A A perspective view of a fifth embodiment of the device according to the invention; and

[0056] Figure 6B : A cross-sectional schematic diagram of a sixth embodiment of the device according to the present invention. Detailed Implementation

[0057] Figure 1E and 1FThe image shows a first embodiment of an apparatus 101 according to the invention for drying and / or cleaning a cup-shaped hollow body 12, particularly for a transport container for semiconductor wafers or EUV lithography masks. The cup-shaped hollow body 12, also known as a FOUP, is... Figure 1E and 1F As shown in the figures, the following description will refer to these figures. The hollow body 12 includes a hollow body wall 14 that forms an inner hollow body surface 16, which defines an inner hollow body space 17. The hollow body 12 also has a hollow body opening 18 surrounded by the hollow body wall 14, through which access to the inner hollow body space 17 is possible, for example, to fill the hollow body 13 with a semiconductor wafer. The hollow body wall 14 forms an edge surface 20 surrounding the hollow body opening 18.

[0058] The hollow body 12 also has an outer hollow body surface 22. An edge surface 20 separates the outer hollow body surface 22 from the inner hollow body surface 16.

[0059] The hollow body opening 18 can be closed by the cover 24, such as Figure 1E and 1F As shown. The cover 24 forms an inner cover surface 26 and an outer cover surface 28. The relationship here refers to a state not shown in the figure, where the hollow body opening 18 is closed by the cover 24. The inner cover surface 26 then faces the inner hollow body space 17, and the outer cover surface 28 faces outward.

[0060] The device 101 has a first retaining device 30 capable of interacting with the hollow body 12. In the illustrated embodiment, the first retaining device 30 includes a retaining surface 32 on which the edge surface 20 of the hollow body 12 can be placed. The first retaining device 30 also includes a locking device 33 by which the hollow space 12 can be sealed to the edge surface 20 and releasably connected to the retaining surface 32.

[0061] In the illustrated embodiment, the retaining surface 32 is formed by a device wall 34, which sequentially includes a first wall portion 36 and a second wall portion 38. The first wall portion 36 and the second wall portion 38 can be connected to each other and then separated from each other again. In this case, the retaining surface 32 is formed by the first wall portion 36. In the connected state, the first wall portion 36 and the second wall portion 38 surround the internal device space 40.

[0062] from Figure 1E and 1F As can be seen, the retaining surface 32 is arranged on the protrusion 42 of the first wall portion 36. Multiple channels 44 are arranged in the protrusion 42 and belong to the fluid conduction device 46, the function of which will be described in more detail below.

[0063] Furthermore, according to the first embodiment, the conical displacement member 481 can be releasably fastened to the first wall portion 36, or the displacement member 481 can be designed to be integral with the first wall portion 36. If the hollow body 12 is placed on the retaining surface 32, such as... Figure 1E and 1F As shown, the displacement member 481 protrudes into the internal hollow space 17, creating a gap between the displacement member 481 and the hollow wall 14. The shape of the displacement member 481 is chosen such that it approximately corresponds to the shape of the internal hollow space 17. Therefore, this gap has at least approximately a constant width. The channel hole 50 passes through the displacement member 481 and leads to the internal hollow space 17, provided that the hollow space 12 has been placed on the retaining surface 32, as... Figure 1E and 1F As shown.

[0064] As described above, the hollow body opening 18 can be closed by the cover 24. The cover 24 is connected to the second wall portion 38 by a second retaining device 52.

[0065] The apparatus 101 according to the first embodiment can be operated in the following manner:

[0066] Before proceeding with the steps described below, the hollow body 12 and the cover 24 have been cleaned with a cleaning fluid in a manner not shown.

[0067] Reference Figure 1A It can be seen that the first wall portion 36 has been released from the second wall portion 38. (This is for illustrative purposes only.) Figure 1A The first wall portion 36 is not shown. The cover 24 has been separated from the hollow body 12 by the clamping and moving device 54; this separation step was also not shown in [the image / document / etc.]. Figure 1A As shown in the image, it is only apparent that the cover 24 is connected to the clamping and moving device 54. The clamping and moving device 54 has a rotating device 56 by which the cover 24 can rotate about the axis of rotation R. In this respect, the cover 24 rotates so that the inner cover surface 26 faces the second retaining device 52. Once the cover 24 is in the corresponding rotated position, the cover 24 is clamped by the displacement device 58 of the clamping and moving device 54 and moved into the internal hollow body space 17, so that the cover 24 contacts the second retaining device 52 and can be held thereby (see image). Figure 1B ).

[0068] The edge surface 20 of the hollow body 12 is placed on the retaining surface 32, such as Figure 1C As shown. The locking device 33 is then activated, thereby sealingly connecting the hollow body 12 to the first wall portion 36. From Figure 1D As can be seen, the first wall portion 36 and the second wall portion 38 are now connected to each other, also using the clamping and moving device 54. (See reference...) Figure 1EA vacuum is applied to the internal device space 40. For this purpose, device 101 includes a evacuation device 60, which, in the illustrated embodiment, includes a vacuum pump 62. The evacuation device is connected to the internal device space 40 via a connecting valve 63. Due to the activation of the vacuum pump 62, fluid, typically air, in the internal device space 40 is drawn out. To prevent air from flowing through the channel orifice 50, the channel orifice 50 is connected to a check valve 64, which is closed for this purpose. The flow of fluid in the employed internal device space 40 is shown with reference to the arrows. It must be noted that fluid can flow through the channel 44, thereby allowing fluid in the internal hollow body space 17 to also be drawn out, forming a locking device 33 here so that the flow toward the vacuum pump 62 is not significantly interrupted.

[0069] As a result, a vacuum is formed on the inner hollow body surface 16, the outer hollow body surface 22, the inner cover surface 26, and the outer cover surface 28, thereby removing residues of cleaning fluid that remained on the surfaces of the hollow body 12 and the cover 24 due to the previous cleaning of the hollow body 12 in the cleaning device. The inner hollow body surface 16, the outer hollow body surface 22, the inner cover surface 26, and the outer cover surface 28 are thus dried.

[0070] refer to Figure 1F As can be seen, upon completion of the drying process, the channel orifice 50 is now connected to the fluid reservoir 65, in which the rinsing fluid, such as nitrogen, resides. This can be done manually or via a corresponding valve connection; a check valve 64 can also be used and can be actuated accordingly to open. The rinsing fluid is conveyed through the device 101 via a delivery device 66, which has a delivery pump 68. The delivery device 66 is also connected to the internal device space 40 via the previously mentioned connecting valve 63. It must be noted at this point that the vacuum pump 62 can be adjusted so that it can also be used as the delivery pump 68. To this extent, the vacuum pump 62 and the delivery pump 68 can be formed from the same components.

[0071] While a vacuum is still applied in the internal device space 40 before the drying process, the flushing fluid can also be delivered to the internal device space 40 in such a way that, through a corresponding embodiment of the check valve 64 and the fluid reservoir, the flushing fluid can be drawn into the internal device space 40 due to the opening of the check valve. Active delivery of the flushing fluid by means of the delivery device 66 is unnecessary, at least until complete pressure equalization. The connecting valve 63 and / or the check valve 64 can be adapted here to not only release and block the flow of the flushing fluid or another fluid, but also to set the volumetric flow rate. Especially when a larger vacuum exists in the internal device space 40, it is meaningful to initially maintain a small volumetric flow rate through the check valve 64 to slowly achieve pressure equalization and avoid pressure surges.

[0072] like Figure 1E As shown, the flushing fluid and the fluid under vacuum flow in approximately the same direction. The arrows also indicate... Figure 1F The flushing fluid, still unloaded, flows out of the fluid reservoir 65 through the channel orifice 50 and then flows over the inner hollow body surface 16. AMC (airborne molecular contaminants) are removed from the inner hollow body surface 16 by means of the evaporation of the flushing fluid, and are thus absorbed and transported by the flushing fluid. The flushing fluid then flows through the channel 44 and then impacts the outer hollow body surface 22. The aforementioned contaminants are also eliminated here.

[0073] The outer hollow body surface 16 is typically dirtier than the inner hollow body surface 16, causing a significant increase in the load of the flushing fluid as it flows over the outer hollow body surface. This portion of the flushing fluid has the highest load here, flowing directly over the outer hollow body surface 22. Since the distance between the cover 24 and the hollow body 12 in the internal device space 40 is not particularly large, the relatively heavily contaminated flushing fluid also flows over the outer cover surface 28. The portion of the flushing fluid flowing along the second wall portion 38 and therefore with less load flows over the inner cover surface 26. Thus, a heavily loaded portion of the flushing fluid is prevented from flowing over the relatively clean inner cover surface 26 and contaminating it instead of cleaning it. The flushing fluid then exits the device 101 and can be stored in a container (not shown) for processing or preparation.

[0074] Similarly, refer to Figure 2 The basic representation illustrates a second embodiment of the device 102 according to the invention. The basic design of the device 102 according to the second embodiment largely corresponds to the basic design of the device 101 according to the first embodiment; therefore, only the major differences will be considered. The device 102 according to the second embodiment includes a rectifier 70, which is designed as a partition wall 72, which can be arranged together with an adjustment device (not shown) in the internal device space 40. The partition wall 72 divides the internal device space 40 into a first sub-section 74 and a second sub-section 76. The hollow body 12 is located in the first sub-section 74, while the cover 24 is located in the second sub-section 76. Therefore, an adjustment device is required to allow access to the second sub-section 76 so that the cover 24 can be arranged there and removed from there.

[0075] The internal device space 40 is connected to another fluid reservoir 78, in which another flushing fluid, the same as the flushing fluid stored in the fluid reservoir 65, can be stored. Here, the other fluid reservoir 78 is in communication with the second sub-section 76.

[0076] As described in the first embodiment of device 101, flushing fluid is delivered through the internal device space 40 via delivery device 66. However, in the second embodiment of device 102, additional flushing fluid is also delivered from another fluid reservoir 78 to the second sub-section 76, and this additional, unloaded flushing fluid flows directly onto the inner cover surface 26, and subsequently onto the outer cover surface 28. The additional flushing fluid then exits the second sub-section 76 through the partition opening 80, where it merges with the flushing fluid from the first sub-section 74. As previously described, the flushing fluid can be directed to a container (not shown) for processing or preparation. This ensures that the inner cover surface 26 is acted upon by unloaded or only very lightly loaded flushing fluid, thereby enabling effective cleaning of the inner cover surface.

[0077] An embodiment where the fluid conduction device 46 has multiple baffles, which divide the flushing fluid into two streams after it has flowed through the channel 44. The outer flow is guided along the second wall portion 38 to the cover 24, and the inner flow is guided along the outer hollow body surface 22. Mixing of the outer and inner streams is largely avoided as long as the outer stream has not yet reached the cover 24. This also prevents flushing fluid filled with a large load from flowing across the inner cover surface 26. A separate fluid reservoir 78 is not required here.

[0078] The third embodiment of the device 103 according to the invention is also referred to Figure 3 The basic representation is shown. When the hollow body 12 is placed on the first wall portion 36, the first wall portion 36 forms a channel opening 82 that is substantially flush with the hollow body opening 18. In this embodiment, the fluid conduction device 46 also includes a channel 44. The first wall portion 36 divides the internal device space 40 into a first sub-part 74 and a second sub-part 76, wherein the hollow body 12 can be arranged in the first sub-part, and the cover 24 can be arranged in the second sub-part 76. The displacement member 48 protrudes from the second sub-part 76 through the channel opening 82 into the first sub-part 74 and into the internal hollow body space 17.

[0079] In the second sub-section 76, the first wall portion 36 forms a wall opening 84. In a third embodiment, a second retaining device 52, which secures the cover 24 in place, is arranged at the cover handling unit 86, through which the cover 24 is releasably engaged when using the second retaining device 52. The cover handling unit 86 is rotatably supported about a rotation axis by a fastening device 88 rotatable at the first wall portion, and is movable between an open position and a closed position. In the open position, the cover handling unit releases the wall opening 84 and thus enters the internal device space 40; in the closed position, the wall opening 84 is closed. Figure 3In this configuration, the cover handling unit 86 is in the closed position. It is important to note that the wall opening 84 is closed by the cover 24, and the inner cover surface 26 faces the internal device space 40.

[0080] The main operating mode of the device 103 according to the third embodiment corresponds here to the main operating mode already described for the first and second embodiments. One of the main differences is the way the cover 24 is handled. Once the cover 24 passes through... Figure 3 The clamping and moving device 54 (not shown) separates from the hollow body 12, and the cover 24 is placed on the second clamping device 52. At this time, the cover processing unit 86 is in the open position, and... Figure 3 Compared to the closed position shown, it has been rotated 90°. The cap 24 is placed on the second retaining device 52 from above, and then the cap handling unit 86 is rotated 90° to the closed position, as shown. Figure 3 As shown. Cover 24 now closes the wall opening 84. Figure 3 The evacuation device 60 (not shown) can now be activated, thereby applying a vacuum in the internal device space 40. This removes any residue of the cleaning fluid from the inner hollow body surface 16, the inner cover surface 26, and the outer hollow body surface 22, and dries the hollow body 12 and the cover 24. It must be noted that in this embodiment, the vacuum is not applied to the outer cover surface 28, allowing any residue of the cleaning fluid to remain there.

[0081] After the drying process is complete, it can be transitioned to [the next step] via the corresponding valve connection. Figure 3 The cleaning process is illustrated. Similarly, as described for other embodiments, the delivery pump 68 of the delivery device 66 is activated, the check valve 64 is opened, and flushing fluid is delivered through the channel orifice 50 into the internal device space 40, which is connected to the fluid reservoir 65 via a valve connection. In this space 40, the flushing fluid flows over the inner hollow body surface 16, the inner cover surface 26, and the outer hollow body surface 22, removing any contaminants located within the space. This also applies to the outer cover surface 28, which is not reached by the flushing fluid and is not cleaned by it.

[0082] Reference Figure 4 The basic representation in the diagram sequentially illustrates a fourth embodiment of the device 104 according to the invention. The basic design of the device 104 according to the fourth embodiment largely corresponds to the basic design of the device 101 according to the first embodiment; therefore, only the major differences will be considered. As in the first embodiment, the device wall 34 is divided into a first wall portion 36 and a second wall portion 38, wherein the separation regions extend in different ways. Figure 4As can be seen, the first wall portion 36 is U-shaped, while the second wall portion is planar, essentially plate-shaped or disc-shaped. The first retaining device 30 is connected to the second wall portion 38 and interacts with the outer hollow body surface 22 using a retaining surface 32, thereby separating the hollow body 12 from the device wall 34 within the internal device space 40. In this respect, the retaining surface 32 in the fourth embodiment is formed by the second wall portion 38. Therefore, in the fourth embodiment of device 104, the hollow body 12 is not placed on the surface but rather "floats" in the internal device space 40. The first retaining device 30 is configured such that a gap 90 is left between the edge surface 20 and the first wall portion 36, through which flushing fluid can flow to move from the inner hollow body surface 16 to the outer hollow body surface 22. In this respect, in the second embodiment, the first retaining device 30, the hollow body wall 14, and the device wall 34 form a fluid conduction device 46 and take over its function. The first retaining device 30 is designed here to ensure that the flow of flushing fluid within the internal device space 40 is substantially uninterrupted. Therefore, protrusion 42 and channel 44 are not required. Locking device 33 can also be omitted.

[0083] A second retaining device 52 for fastening the cover 24 is also arranged on the second wall portion 38.

[0084] The displacement member 481 is integrally formed with the first wall portion 36 in the fourth embodiment of the device 104.

[0085] The device 104 according to the fourth embodiment operates in substantially the same manner as described in the other embodiments. However, it must be noted that the hollow body 12 and the cover 24 are first secured to the second wall portion 38 using the clamping and moving device 54 before being connected to the first wall portion 36. In this respect, the clamping and moving device 54 grips at least one of the two wall portions 36, 38.

[0086] According to the second implementation scheme, displacement member 482, as shown... Figure 5A and 5B As shown. Although the displacement member 481 according to the first embodiment is formed as a solid, the displacement member 482 according to the second embodiment surrounds the hollow space 92, which can be accessed through the channel opening 94 formed by the displacement member wall 96. The displacement member 482 is introduced into the device 105 according to the fifth embodiment such that while atmospheric pressure exists in the hollow space 92, a vacuum can be applied to the outside of the displacement member wall 96 located in the inner device space 40. Only the second wall portion 38 of the device wall 34 of the device 105 according to the fifth embodiment is shown, which in principle can have the same design as the devices 101 to 104 according to the aforementioned embodiments. Figure 5B Only displacement member 482 is shown in the image.

[0087] A receiving flange 104 is arranged in the second wall portion 38, forming a flange opening 106 through which a displacement member 482 can be inserted and thus introduced into the internal device space 40 of the device 105. The receiving flange 104 can also be designed as a separate component. Figure 5A As shown, when the displacement member 482 is blocked through the flange opening 106, at least one O-ring seal 108 (here, two O-ring seals 108) is arranged in the receiving flange 104, which seals the second wall portion 38 relative to the displacement member wall 96. This allows a vacuum to be applied in the device 105. To prevent the displacement member 482 from being pulled into the device 105, the displacement member 482 has a radial expansion portion 110 at its channel opening.

[0088] A heating device 98 is disposed in a hollow space 92, which is fixed to the wall 96 of the displacement member by a bracket 100. The heating device 98 can be accessed through a channel opening 94. As described above, since atmospheric pressure exists in the hollow space 92, no special measures are required to protect the heating device 98 relative to a vacuum. The heating device 98 includes a plurality of infrared diodes 102 for generating infrared radiation. Two sets of infrared diodes 102 can be distinguished here. The first set of infrared diodes 102 mainly irradiates infrared radiation along the longitudinal axis L of the displacement member 482. The first set of infrared diodes 102 is arranged in the region of the closed end of the displacement member 482. Figure 5A In the upper region, opposite the channel opening 94, the second group of infrared diodes 102 irradiates infrared radiation primarily perpendicular to the longitudinal axis and is centrally located. The displacement member wall 96 is made of a material that transmits infrared radiation, such as glass.

[0089] As described above, the volume of the vacuum generated is reduced with the aid of the displacement member 482. Similarly, the vacuum is used to remove cleaning fluid residues from the inner hollow body surface 16 and / or the outer hollow body surface 22. This removal can be supported by the heating device 98. Infrared radiation generated by the infrared diode 102 is within a strictly defined frequency range that can be optimized for the cleaning fluid used. Any cleaning fluid residues remaining on the inner hollow body surface 16 or the outer hollow body surface 22 are heated very effectively and thus eliminated through interaction with the vacuum.

[0090] As previously stated, the displacement member 481 according to the first embodiment has a channel hole 50 (see, for example, see...). Figure 1F and Figure 2 When the drying process is complete, the rinsing fluid (e.g., nitrogen) can be passed through the channel hole 50 along... Figure 5A and Figure 5BThe internal hollow body surface 16 and / or external hollow body surface 22 of the hollow body 12 (not shown) flow. In contrast, the displacement member wall 96 of the displacement member 482 according to the second embodiment is closed, particularly because it is made of glass. However, in order to allow flushing fluid to be introduced into the internal device space 40 of the device 105, a plurality of connecting channels 112 are provided in the receiving flange 104, distributed around the periphery of the receiving flange 104, and, as described with respect to the channel hole 50, can be connected to a check valve 64 and / or a fluid reservoir 65 (e.g., see...). Figure 2 Due to the illustration's purpose, Figure 5A Only one check valve 65 is shown. On the other hand, device 105 operates in the same manner as described for other embodiments of devices 101 to 104.

[0091] Reference Figure 6A and 6B The perspective view shows a sixth embodiment of the device 106 according to the invention. The device 106 has a displacement member 483 according to a third embodiment. In the third embodiment, the displacement member 483 is designed in a parallelepiped shape and can be configured as a hollow or solid body, but... Figure 5A and 5B The second embodiment of the displacement member 482 shown is enclosed. In this embodiment, the displacement member 483 is also connected to a receiving flange 104 fixed to the second wall portion. The receiving flange 104 also has a connection channel for introducing flushing fluid into the internal device space 40. The heating device 98 includes a total of four sets of infrared diodes 102 arranged outside the displacement member 483. In this case, the retainer is formed as a cross-shaped disk, which is fastened to the free end of the displacement member 483. The retainer has a corresponding receiving hole 114 for each set of infrared diodes 102. Furthermore, each set of infrared diodes 102 is connected to the receiving flange 104.

[0092] Infrared diodes 102 are arranged such that they are primarily perpendicular to... Figure 6A and 6B The longitudinal axis of the displacement member 483 (not shown) is used to irradiate infrared radiation. A portion of this infrared radiation is therefore incident on the displacement member 483. The displacement member 483 has a reflective surface 116 through which the infrared radiation incident on the displacement member 483 is reflected and can therefore be used to heat the hollow body 12 without loss. The reflective surface 116 can be provided, for example, because the displacement member 483 is made of metal (e.g., aluminum) and is equipped with a particularly small roughness by, for example, polishing, in which the reflective surface 116 will be arranged.

[0093] On the other hand, the device 106 according to the sixth embodiment operates in essentially the same way as described in the fifth embodiment for the device 105.

[0094] Reference number list:

[0095] 10 devices

[0096] Devices 101, 102, 103, 104, 105, and 106

[0097] 12 hollow bodies

[0098] 14 Hollow body wall

[0099] 16 Hollow Inner Surface

[0100] 17. Internal hollow space

[0101] 18 Hollow Body Opening

[0102] 20 edge surfaces

[0103] 22 External hollow body surface

[0104] 24 caps

[0105] 26 Inner Cover Surface

[0106] 28 Outer Cover Surface

[0107] 30 First holding device

[0108] 32 Maintain surface

[0109] 33 Locking Device

[0110] 34 Device Wall

[0111] 36 First Wall Section

[0112] 38 Second wall section

[0113] 40 Interior space

[0114] 42 protrusions

[0115] 44 channels

[0116] 46 Fluid conduction devices

[0117] 48 displacement components

[0118] Displacement components 481, 482, and 483

[0119] 50-channel hole

[0120] 52 Second holding device

[0121] 54 Clamping and Moving Devices

[0122] 56 Rotating Device

[0123] 58 Displacement Device

[0124] 60 Evacuation Device

[0125] 62 vacuum pump

[0126] 63 connecting valve

[0127] 64 Check Valve

[0128] 65 fluid storage tank

[0129] 66 Conveying Device

[0130] 68 transfer pump

[0131] 70 rectifier

[0132] 72 partition walls

[0133] 74 First Sub-part

[0134] 76 Second Sub-part

[0135] 78 Another fluid storage device

[0136] 80 partition wall opening

[0137] 82-channel opening

[0138] 84 wall opening

[0139] 86 Cap Processing Unit

[0140] 88 Fastening Device

[0141] 90-degree gap

[0142] 92 hollow spaces

[0143] 94-channel opening

[0144] 96 Displacement Component Wall

[0145] 98 heating device

[0146] 100 brackets

[0147] 102 Infrared Diode

[0148] 104 receiving flange

[0149] 106 flange opening

[0150] 108 O-ring seal

[0151] 110 radial expansion section

[0152] 112 connection channel

[0153] 114 receiving port

[0154] 116 reflective surface

[0155] L-axis

[0156] R-axis rotation

Claims

1. An apparatus (10) for drying and / or cleaning a can-shaped hollow body (12) of a transport container for semiconductor wafers or EUV lithography masks, The hollow body (12) comprises: - A hollow body wall (14) forming an inner hollow body surface (16) and an outer hollow body surface (22), said inner hollow body surface (16) including an inner hollow body space (17); and - It has a hollow opening (18) surrounded by a hollow body wall (14) through which the internal hollow body space (17) can be accessed; The device (10) includes: - Device wall (34); - A first holding device (30), the device (10) can interact with the hollow body (12) in a holding manner through the first holding device; o Evacuation device (60) for applying a vacuum in the internal hollow space (17); and / or o Conveying device (66) for conveying flushing fluid through the internal hollow body space (17); and - Displacement member (48), which can be introduced into or be introduced into the internal hollow space (17) through the hollow body opening (18). Its features are, - The device wall (34) has a first wall portion (36) and a second wall portion (38), the first wall portion and the second wall portion being releasably connected to each other and, in the connected state, surrounding the internal device space (40), and - The first holding device (30) includes a holding surface (32), and - The first wall portion (36) forms the retaining surface (32) that at least partially defines the internal device space (40). - The device (10) has at least one fluid conduction device (46) through which flushing fluid can be conducted from the inner hollow body space (17) to the outer hollow body surface (22).

2. The device (10) according to claim 1, characterized in that, The displacement member (48) has a channel hole (50). - When the displacement member (48) has been introduced into the internal hollow space (17), the opening leads to the internal hollow space (17); and - The flushing fluid can be delivered to the internal hollow space (17) and / or a vacuum can be applied to the internal hollow space (17) through it.

3. The apparatus (10) according to claim 1 or 2, characterized in that, - The displacement member (48) can be releasably connected to the device wall (34) or integrated with the device wall (34).

4. The apparatus (10) according to any one of claims 1 or 2, characterized in that, - A vacuum can be applied in the internal hollow space (17) and / or the internal device space (40) by means of a fluid conduction device (46).

5. The apparatus (10) according to claim 3, characterized in that, The hollow body (12) has a cover (24) by which the opening (18) of the hollow body can be closed, and the device (10) has a second retaining device (52) by which the cover (24) can be releasably fastened to the device wall (34).

6. The apparatus (10) according to claim 5, characterized in that: The cover (24) has an inner cover surface (26) and an outer cover surface (28), and the device (10) includes a clamping and moving device (54) by which the cover (24) can be connected to the second retaining device (52) such that the outer cover surface (28) faces the outer hollow body surface (22).

7. The apparatus (10) according to any one of claims 1 or 2, characterized in that, At least one rectifier (70) is provided in the internal device space (40) so that the flow of flushing fluid can be guided within the internal device space (40) by the rectifier.

8. The apparatus (10) according to any one of claims 1 or 2, characterized in that, - The hollow body wall (14) forms an edge surface (20) surrounding the hollow body opening (18); and - The first retaining device (30) includes a locking device (33) through which the hollow body (12) is sealably connected to the edge surface (20) and releasably connected to the retaining surface (32).

9. The apparatus (10) according to any one of claims 1 or 2, characterized in that, The displacement member (48) has a heating device (98), through which the hollow body (12) can be heated and dried.

10. The apparatus (10) according to claim 9, characterized in that, The heating device (98) includes a plurality of infrared diodes (102).

11. The apparatus (10) according to claim 10, characterized in that, The displacement member (48) has a reflective surface to reflect infrared radiation emitted by the infrared diode (102).

12. The apparatus (10) according to any one of claims 1 or 2, characterized in that, - The displacement member (48) surrounds the hollow space (92), which can be accessed through the channel opening (94); and - The heating device (98) is located in the hollow space (92).

13. The apparatus (10) according to claim 12, characterized in that, The displacement member (48) is composed of or includes a material that is transparent to infrared radiation.

14. A method for cleaning a can-shaped hollow body (12) of a transport container for a semiconductor wafer or an EUV lithography mask using the apparatus (10) according to any one of the preceding claims, the method comprising the steps of: - The interaction between the hollow body walls (14) is maintained by the first retaining device (30); - Introduce the displacement member (48) into the internal hollow space (17); and - A vacuum is applied to the internal hollow space (17) by means of a evacuation device (60); and / or - Fluid is conveyed through the internal hollow body space (17) via the conveying device (66).

15. The method according to claim 14, - in, The hollow body (12) has a lid (24) having an inner lid surface (26) and an outer lid surface (28) through which the opening (18) of the hollow body can be closed; and - The device (10) has o Device wall (34); o Second retaining device (52), by which the cover (24) can be releasably fastened to the device wall (34). and o Clamping and moving device (54); And the method described therein includes the following steps: The cover is releasably secured by the clamping and moving device (54) via the second retaining device (52) such that the outer cover surface (28) faces the outer hollow body surface (22) of the hollow body wall.

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