Liquid treatment system and method for displaying device structure

Abstract

The invention relates to a liquid treatment system for showing a device structure, which comprises a washing part, a liquid part and a control part, the washing part comprises a first flow channel, a second flow channel, a sample treatment tank and a water outlet flow channel, and the sample treatment tank is also provided with a valve for controlling the first flow channel and the second flow channel to be communicated with the sample treatment tank; the liquid part comprises a first injection pump, a second injection pump and a liquid recovery part, the first injection pump is communicated with the first flow channel, the second injection pump is communicated with the second flow channel, the liquid recovery part is communicated with the water outlet flow channel, and the control part is used for controlling acid etching and flushing time. A method of visualizing a device structure is also included. According to the liquid treatment system and method for showing the structure of the device, the acid etching time of the device can be controlled and impurities generated during acid etching can be taken away under the condition that the concentration of the acid solution is kept constant, so that an obvious step difference exists among different materials such as silicon, silicon dioxide and silicon nitride on the same surface of the device subjected to acid etching; and observation is more convenient.

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