A tcs concentration detection apparatus, system, method and semiconductor process equipment

Abstract

The application relates to a TCS concentration detection device, system, method and semiconductor process equipment, comprising a first gas conveying unit, a concentration detection unit, a verification unit and a first purging unit. The advantages are that the first gas conveying unit is communicated with the concentration detection unit, a mass spectrometer with higher precision and lower delay is used to detect the TCS concentration, the precision and effect of the TCS concentration detection are improved, the first gas conveying unit is communicated with the verification unit, the weight of the condensed liquid and the total flow of the condensed gas are obtained by condensing and weighing the mixed gas, and the TCS concentration is calculated through the weight of the condensed liquid and the total flow of the condensed gas, so that the result detected by the mass spectrometer detection element is verified, and the reliability of the detection result is improved.

Description

Technical Field

[0001] This invention relates to the field of bubbling equipment technology, and in particular to a TCS concentration detection device, system, method, and semiconductor process equipment. Background Technology

[0002] TCS (trichlorosilane) bubblers are widely used in silicon carbide and silicon epitaxial equipment in the semiconductor industry. In these devices, TCS is an important raw material, and its concentration is a crucial parameter in the epitaxial process. This patent describes a method for detecting the TCS concentration in the TCS-H2 mixture output by the bubbler, ensuring that the bubbler is compatible with various epitaxial equipment.

[0003] Currently, the general process for TCS bubbler concentration detection in semiconductor factories is as follows: after the TCS bubbler is bubbled by H2 under controlled pressure and flow, it outputs a mixture of TCS and H2. After passing through the pressure control module and flow control module at the epitaxial machine end, it is sent to the concentration sensor to detect its TCS concentration. In addition, the concentration sensor used in this detection process is generally an optical sensor.

[0004] However, current concentration sensors are generally optical sensors, which suffer from problems such as high detection delay and low accuracy. In addition, the existing TCS bubbler concentration detection process does not have a process to verify the concentration sensor, and the accuracy of the detection structure provided by the concentration sensor cannot be confirmed.

[0005] Currently, no effective solutions have been proposed for the problems of high detection latency, low accuracy, and inability to verify detection results in related technologies. Summary of the Invention

[0006] The purpose of this invention is to address the shortcomings of existing technologies by providing a TCS concentration detection device, system, method, and semiconductor process equipment to solve problems such as high detection delay, low accuracy, and inability to verify detection results in related technologies.

[0007] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0008] In a first aspect, the present invention provides a TCS concentration detection device, comprising:

[0009] A first gas delivery unit, which is connected to a gas mixing device, is used to acquire and deliver the mixed gas delivered by the gas mixing device.

[0010] A concentration detection unit is connected to the first gas delivery unit and the exhaust gas treatment device, respectively, and is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas.

[0011] The verification unit is connected to the first gas delivery unit and the exhaust gas treatment device, respectively, and is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas in order to verify the first concentration information.

[0012] The first purging unit is connected to the verification unit and the exhaust gas treatment device, respectively, and is used to purge the pipelines of the verification unit and the exhaust gas treatment device.

[0013] Secondly, the present invention also provides a TCS concentration detection system, comprising:

[0014] The TCS concentration detection device as described in the first aspect;

[0015] A gas mixing device, which is connected to the TCS concentration detection device, is used to supply mixed gas to the TCS concentration detection device;

[0016] An exhaust gas treatment device, which is connected to the TCS concentration detection device and the gas mixing device, is used to treat exhaust gas.

[0017] In some embodiments, the gas mixing device includes:

[0018] A liquid supply unit, which is connected to a liquid source, is used to deliver liquid TCS;

[0019] A carrier gas supply unit, which is connected to a carrier gas source and is used to deliver carrier gas;

[0020] A mixing unit is connected to the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, and is used to store liquid TCS and carrier gas and to perform a bubbling reaction on the liquid TCS to generate a mixed gas.

[0021] The second gas delivery unit is connected to the mixing unit and the TCS concentration detection device respectively, and is used to deliver the mixed gas.

[0022] The second purging unit is connected to the purging gas source, the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit, respectively, and is used to purge the pipelines of the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit.

[0023] The first vacuum unit is connected to the power gas source, the second purging unit, and the mixing unit, respectively, and is used to perform vacuum treatment on the entire device.

[0024] In some embodiments, the exhaust gas treatment device includes:

[0025] The second vacuum unit is connected to the TCS concentration detection device and is used to perform vacuum treatment on the TCS concentration detection device.

[0026] An exhaust gas treatment unit is connected to the TCS concentration detection device and the gas mixing device, and is used to treat the exhaust gas discharged from the TCS concentration detection device and the gas mixing unit.

[0027] Thirdly, the present invention also provides a semiconductor process apparatus, comprising:

[0028] The TCS concentration detection device as described in the first aspect; or

[0029] The TCS concentration detection system as described in the second aspect.

[0030] Fourthly, the present invention also provides a TCS concentration detection method, applied to the TCS concentration detection device as described in the first aspect or the TCS concentration detection system as described in the second aspect, comprising:

[0031] The first gas delivery unit is used to acquire and deliver the mixed gas delivered by the gas mixing device;

[0032] The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain the initial concentration information of the mixed gas;

[0033] The verification unit is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas;

[0034] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual concentration.

[0035] Fifthly, the present invention also provides a TCS concentration detection method, applied to the TCS concentration detection system as described in the second aspect, comprising:

[0036] The liquid supply unit is used to deliver liquid to the TCS concentration detection device;

[0037] The carrier gas supply unit is used to supply carrier gas to the TCS concentration detection device;

[0038] The mixing unit is used to bubble liquid TCS and generate mixed gas.

[0039] The second gas delivery unit is used to deliver the mixed gas;

[0040] The first gas delivery unit is used to acquire and deliver the mixed gas delivered by the gas mixing device;

[0041] The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain the initial concentration information of the mixed gas;

[0042] The verification unit is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas;

[0043] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual concentration.

[0044] The present invention adopts the above technical solution and has the following technical effects compared with the prior art:

[0045] The present invention provides a TCS concentration detection device, system, method, and semiconductor process equipment. By connecting a first gas delivery unit to a concentration detection unit, a mass spectrometer with higher accuracy and lower delay is used to detect the TCS concentration, thereby improving the accuracy and effectiveness of TCS concentration detection. By connecting the first gas delivery unit to a verification unit, the weight of the condensate and the total flow rate of the condensate are obtained by condensing and weighing the mixed gas. The TCS concentration is then calculated using the weight of the condensate and the total flow rate of the condensate to verify the results detected by the mass spectrometer detection element, thereby improving the reliability of the detection results. Attached Figure Description

[0046] Figure 1 This is a schematic diagram of the frame of a TCS concentration detection device according to an embodiment of the present invention;

[0047] Figure 2 This is a schematic diagram of the frame of the first gas delivery unit according to an embodiment of the present invention;

[0048] Figure 3 This is a schematic diagram of the framework of a concentration detection unit according to an embodiment of the present invention;

[0049] Figure 4 This is a schematic diagram of the framework of the verification unit according to an embodiment of the present invention;

[0050] Figure 5 This is a schematic diagram of the frame of the first purging unit according to an embodiment of the present invention;

[0051] Figure 6 This is a schematic diagram of the framework of a TCS concentration detection system according to an embodiment of the present invention;

[0052] Figure 7 This is a schematic diagram of the frame of a gas mixing device according to an embodiment of the present invention;

[0053] Figure 8This is a schematic diagram of the framework of the liquid supply unit, carrier gas supply unit, mixing unit, and second gas delivery unit according to an embodiment of the present invention;

[0054] Figure 9 This is a schematic diagram of the frame of the second purging unit according to an embodiment of the present invention;

[0055] Figure 10 This is a schematic diagram of the frame of the first vacuum unit according to an embodiment of the present invention;

[0056] Figure 11 This is a schematic diagram of the frame of the exhaust gas treatment device according to an embodiment of the present invention;

[0057] Figure 12 This is a schematic diagram of the frame of the second vacuum unit and the exhaust gas treatment unit according to an embodiment of the present invention;

[0058] Figure 13 This is a schematic diagram of a specific embodiment of the TCS concentration detection system according to an embodiment of the present invention.

[0059] The reference numerals in the accompanying drawings are as follows: 100, TCS concentration detection device; 110, first gas delivery unit; 111, first gas delivery element; 112, second gas delivery element; 113, third gas delivery element; 120, concentration detection unit; 121, fourth gas delivery element; 122, fifth gas delivery element; 123, mass spectrometry detection element; 130, verification unit; 131, sixth gas delivery element; 132, condensation element; 133, seventh gas delivery element; 134, liquid delivery element; 135, storage element; 136, flow detection element; 137, weight detection element; 140, first purging unit; 141, eighth gas delivery element; 142, ninth gas delivery element; 143, tenth gas delivery element; 144, eleventh gas delivery element; 145, twelfth gas delivery element; 146, thirteenth gas delivery element; 147, fourteenth gas delivery element;

[0060] 200. Gas mixing device; 210. Liquid supply unit; 211. Liquid supply element; 220. Carrier gas supply unit; 221. Carrier gas supply element; 230. Mixing unit; 231. Mixing element; 240. Second gas delivery unit; 241. Fifteenth gas delivery element; 250. Second purging unit; 251. Sixteenth gas delivery element; 252. Seventeenth gas delivery element; 253. Eighteenth gas delivery element; 254. Nineteenth gas delivery element; 255. Twentieth gas delivery element; 260. First vacuum unit; 261. First vacuum pump element; 262. Twenty-first gas delivery element; 263. Twenty-second gas delivery element; 264. Twenty-third gas delivery element;

[0061] 300. Exhaust gas treatment device; 310. Second vacuum unit; 311. Second vacuum pump element; 312. Twenty-fourth gas conveying element; 313. Twenty-fifth gas conveying element; 314. Twenty-sixth gas conveying element; 320. Exhaust gas treatment unit; 321. Exhaust gas treatment element. Detailed Implementation

[0062] To make the objectives, technical solutions, and advantages of this application clearer, the application is described and illustrated below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application. All other embodiments obtained by those skilled in the art based on the embodiments provided in this application without inventive effort are within the scope of protection of this application.

[0063] Obviously, the accompanying drawings described below are merely some examples or embodiments of this application. Those skilled in the art can apply this application to other similar scenarios based on these drawings without any inventive effort. Furthermore, it is understood that although the efforts made in this development process may be complex and lengthy, for those skilled in the art related to the content disclosed in this application, any changes to design, manufacturing, or production based on the technical content disclosed in this application are merely conventional technical means and should not be construed as insufficient disclosure of the content of this application.

[0064] In this application, the reference to "embodiment" means that a specific feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment that is mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0065] Unless otherwise defined, the technical or scientific terms used in this application shall have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms “a,” “an,” “an,” “the,” and similar words used in this application do not indicate quantity limitation and may indicate singular or plural. The terms “comprising,” “including,” “having,” and any variations thereof used in this application are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units not listed, or may include other steps or units inherent to these processes, methods, products, or devices. The terms “connected,” “linked,” “coupled,” and similar words used in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. “Multiple” used in this application refers to two or more. “And / or” describes the relationship between related objects, indicating that three relationships may exist; for example, “A and / or B” can represent: A alone, A and B simultaneously, and B alone. The character " / " generally indicates that the preceding and following objects are in an "or" relationship. The terms "first," "second," and "third" used in this application are merely to distinguish similar objects and do not represent a specific ordering of the objects.

[0066] Example 1

[0067] This embodiment relates to the TCS concentration detection device of the present invention.

[0068] An illustrative embodiment of the present invention, such as Figure 1 As shown, a TCS concentration detection device 100 includes a first gas delivery unit 110, a concentration detection unit 120, a verification unit 130, and a first purging unit 140. The first gas delivery unit 110 is connected to a gas mixing device and is used to acquire and deliver the mixed gas delivered by the gas mixing device. The concentration detection unit 120 is connected to both the first gas delivery unit 110 and a tail gas treatment device and is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information. The verification unit 130 is connected to both the first gas delivery unit 110 and the tail gas treatment device 140 and is used to condense and weigh the mixed gas to obtain second concentration information to verify the first concentration information. The first purging unit 140 is connected to both the verification unit 130 and the tail gas treatment device and is used to purge both the verification unit 130 and the tail gas treatment device.

[0069] like Figure 2As shown, the first gas delivery unit 110 includes a first gas delivery element 111, a second gas delivery element 112, and a third gas delivery element 113. The first gas delivery element 111 is connected to the gas mixing device 200 and is used to acquire and deliver the mixed gas delivered by the gas mixing device. The second gas delivery element 112 is connected to both the first gas delivery element 111 and the concentration detection unit 120, and is used to deliver the mixed gas to the concentration detection unit 120. The third gas delivery element 113 is connected to both the first gas delivery element 111 and the verification unit 130, and is used to deliver the mixed gas to the verification unit 130.

[0070] Specifically, the first end of the first gas conveying element 111 is connected to the gas mixing device, and the second end of the first gas conveying element 111 is connected in parallel with the second gas conveying element 112 and the third gas conveying element 113. In some embodiments, the first gas conveying element 111 includes, but is not limited to, a stainless steel pipe.

[0071] Specifically, the first end of the second gas delivery element 112 is connected to the second end of the first gas delivery element 111, and the second end of the second gas delivery element 112 is connected to the concentration detection unit 120. In some embodiments, the second gas delivery element 112 includes, but is not limited to, a stainless steel tube.

[0072] Specifically, the first end of the third gas delivery element 113 is connected to the second end of the first gas delivery element 111, and the second gas delivery element 112 and the third gas delivery element 113 are arranged in parallel. The second end of the third gas delivery element 113 is connected to the verification unit 130. It should be noted that the first end and the second end of the third gas delivery element 113 are the two ends of its length direction, respectively.

[0073] In some of these embodiments, the third gas delivery element 113 includes, but is not limited to, a stainless steel tube.

[0074] Furthermore, the first gas delivery unit 110 also includes a first control valve element, a second control valve element, a first pressure control element, a first flow control element, and a first pressure monitoring element. Specifically, the first control valve element is disposed on the second gas delivery element 112 and is used to control the flow of gas through the second gas output element; the second control valve element is disposed on the third gas delivery element 113 and is used to control the flow of gas through the third gas delivery element 113; the first pressure control element is disposed on the first gas delivery element 111 and is used to adjust the gas pressure of the first gas delivery element 111; the first flow control element is disposed on the first gas delivery element 111 and is used to adjust the gas flow rate of the first gas delivery element 111; and the first pressure monitoring element is connected to the first gas delivery element 111 and is used to monitor the pressure within the first gas delivery element 111 in real time.

[0075] In some of these embodiments, the first control valve element includes, but is not limited to, a diaphragm valve, such as a first pneumatic diaphragm valve.

[0076] In some of these embodiments, the second control valve element includes, but is not limited to, a diaphragm valve, such as a second pneumatic diaphragm valve.

[0077] In some of these embodiments, the first pressure control element includes, but is not limited to, a PC pressure controller.

[0078] It should be noted that the first flow control element is located downstream of the first pressure control element.

[0079] In some of these embodiments, the first flow control element includes, but is not limited to, a gas mass flow controller.

[0080] It should be noted that the first pressure monitoring element is located downstream of the first pressure control element and upstream of the first flow control element. In some embodiments, the first pressure monitoring element includes, but is not limited to, a pressure sensor.

[0081] like Figure 3 As shown, the concentration detection unit 120 includes a fourth gas delivery element 121, a fifth gas delivery element 122, and a mass spectrometry detection element 123. The fourth gas delivery element 121 is connected to the first gas delivery unit 110 and is used to acquire and deliver the mixed gas. The fifth gas delivery element 122 is connected to both the fourth gas delivery element 121 and the exhaust gas treatment device, and is used to deliver exhaust gas to the exhaust gas treatment device. The mass spectrometry detection element 123 is connected to both the fourth gas delivery element 121 and the exhaust gas treatment device, and is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas.

[0082] Specifically, the first end of the fourth gas delivery element 121 is connected to the second end of the second gas delivery element 112, and the second end of the fourth gas delivery element 121 is connected to the mass spectrometry detection element 123. In some embodiments, the fourth gas delivery element 121 includes, but is not limited to, a stainless steel tube.

[0083] Specifically, the first end of the fifth gas delivery element 122 is connected to the fourth gas delivery element 121, and the second end of the fifth gas delivery element 122 is connected to the exhaust gas treatment device. In some embodiments, the fifth gas delivery element 122 includes, but is not limited to, a stainless steel pipe.

[0084] In some of these embodiments, the mass spectrometry detection element 123 includes, but is not limited to, a mass spectrometer.

[0085] It should be noted that the gas flow rate that the mass spectrometer detection element 123 can pass through is limited. If the mixed gas flow rate delivered by the fourth gas delivery element 121 is too high, the fifth gas delivery element 122 can serve as a bypass venting function.

[0086] Furthermore, the concentration detection unit 120 also includes a third control valve element and a first check valve element. The third control valve element is disposed on the fourth gas delivery element 121 and is used to control the flow of gas in the fourth gas delivery element 121; the first check valve element is disposed on the fifth gas delivery element 122 and is used to prevent backflow of gas in the fifth gas delivery element 122.

[0087] In some of these embodiments, the third control valve element includes, but is not limited to, a diaphragm valve, such as a third pneumatic diaphragm valve.

[0088] In some of these embodiments, the first check valve element includes, but is not limited to, a check valve, such as a first check valve.

[0089] like Figure 4 As shown, the verification unit 130 includes a sixth gas delivery element 131, a condensation element 132, a seventh gas delivery element 133, a liquid delivery element 134, a storage element 135, a flow detection element 136, and a weight detection element 137. The sixth gas conveying element 131 is connected to the first gas conveying unit 110 and the first purging unit 140, respectively, and is used to acquire and convey the mixed gas; the condensing element 132 is connected to the sixth gas conveying element 131, and is used to condense the mixed gas to obtain condensed gas and condensed liquid; the seventh gas conveying element 133 is connected to the condensing element 132, the first purging unit 140 and the tail gas treatment device 300, respectively, and is used to convey the condensed gas to the tail gas treatment device; the liquid conveying element 134 is connected to the condensing element 132, and is used to acquire and convey condensed liquid; the storage element 135 is connected to the liquid conveying element 134, and is used to store condensed liquid; the flow detection element 136 is disposed on the seventh gas conveying element 133, and is used to detect the flow rate of the condensed gas; the weight detection element 137 is disposed at the bottom of the storage element 135, and is used to detect the mass of the condensed liquid in the storage element 135.

[0090] Specifically, the first end of the sixth gas conveying element 131 is connected to the second end of the third gas conveying element 113, and the second end of the sixth gas conveying element 131 is connected to the inlet end of the condensing element 132. It should be noted that the first end and the second end of the sixth gas conveying element 131 are the two ends of its length direction, respectively.

[0091] In some of these embodiments, the sixth gas delivery element 131 includes, but is not limited to, a stainless steel tube.

[0092] Specifically, the condensing element 132 includes a condensing tank, a refrigerator, a first coolant piping element, and a second coolant piping element. The condensing tank is connected to a third gas conveying element 113, an exhaust gas treatment device 300, and a storage element 135 via a sixth gas conveying element 131, a seventh gas conveying element 133, and a liquid conveying element 134, respectively, for condensing the mixed gas to obtain condensed gas and condensed liquid. The first end of the first coolant piping element is connected to the condensing tank, and the second end is connected to the refrigerator. The first end of the second coolant piping element is connected to the refrigerator, and the second end is connected to the condensing tank. The refrigerator can supply coolant to the condensing tank and cool the coolant after heat exchange, realizing the recycling of the coolant.

[0093] More specifically, the condenser also includes an air inlet, an air outlet, a liquid drain, a first cooling port, and a second cooling port. The air inlet is located at the top of the condenser and connects to the second end of the sixth gas delivery element 131; the air outlet is located at the top of the condenser and connects to the seventh gas delivery element 133; the liquid drain is located at the bottom of the condenser and connects to the liquid delivery element 134; the first cooling port is located on the side wall of the condenser and connects to the first coolant piping element; and the second cooling port is located on the side wall of the condenser and connects to the second coolant piping element.

[0094] It should be noted that the temperature inside the condenser is -15℃ to -5℃; preferably, the temperature inside the condenser is -10℃.

[0095] In some embodiments, the condenser includes, but is not limited to, a stainless steel tank.

[0096] In some of these embodiments, the cooler includes, but is not limited to, a chiiller.

[0097] In some of these embodiments, the first coolant piping element includes, but is not limited to, a stainless steel pipe.

[0098] In some of these embodiments, the second coolant piping element includes, but is not limited to, a stainless steel pipe.

[0099] Specifically, the first end of the seventh gas conveying element 133 is connected to the outlet of the condenser, and the second end of the seventh gas conveying element 133 is connected to the exhaust gas treatment device 300. In some embodiments, the seventh gas conveying element 133 includes, but is not limited to, a stainless steel pipe.

[0100] Specifically, the first end of the liquid conveying element 134 is connected to the drain port of the condenser, and the second end of the liquid conveying element 134 is connected to the storage element 135. In some embodiments, the liquid conveying element 134 includes, but is not limited to, a stainless steel pipe.

[0101] Specifically, the storage element 135 is connected to the liquid delivery element 134 and is used to collect the condensed liquid generated in the condensation element 132.

[0102] In some of these embodiments, the storage element 135 includes, but is not limited to, a container bottle.

[0103] In some of these embodiments, the flow detection element 136 includes, but is not limited to, a flow meter.

[0104] In some of these embodiments, the weight detection element 137 includes, but is not limited to, an electronic balance.

[0105] Furthermore, the verification unit 130 also includes a fourth control valve element, a fifth control valve element, a second check valve element, a sixth control valve element, a seventh control valve element, and a second pressure monitoring element. Specifically, the fourth control valve element is located at the inlet end of the condensing element 132 and is used to control the flow between the sixth gas delivery element 131 and the condensing element 132; the fifth control valve element is located at the outlet end of the condensing element 132 and is used to control the flow between the seventh gas delivery element 133 and the condensing element 132; the second check valve element is located at the seventh gas delivery element 133 and is used to prevent backflow of gas within the seventh gas delivery element 133; the sixth control valve element is located at the drain end of the condensing element 132 and is used to control the flow between the condensing element 132 and the liquid delivery element 134; the seventh control valve element is located at the liquid delivery element 134 and is used to control the flow within the liquid delivery element 134; and the second pressure monitoring element is located at the seventh gas delivery element 133 and is used to monitor the pressure of the seventh gas delivery element 133 in real time.

[0106] In some of these embodiments, the fourth control valve element includes, but is not limited to, a diaphragm valve, such as a fourth pneumatic diaphragm valve.

[0107] In some embodiments, the fifth control valve element includes, but is not limited to, a diaphragm valve, such as a fifth pneumatic diaphragm valve.

[0108] It should be noted that the second check valve element is located downstream of the fifth control valve element.

[0109] In some of these embodiments, the second check valve element includes, but is not limited to, a check valve, such as a second check valve.

[0110] In some of these embodiments, the sixth control valve element includes, but is not limited to, a diaphragm valve, such as a first manual diaphragm valve.

[0111] In some embodiments, the seventh control valve element includes, but is not limited to, a diaphragm valve, such as a second manual diaphragm valve.

[0112] It should be noted that the second pressure monitoring element is located downstream of the second check valve element.

[0113] In some of these embodiments, the second pressure monitoring element includes, but is not limited to, a pressure sensor.

[0114] like Figure 5 As shown, the first purging unit 140 includes an eighth gas delivery element 141, a ninth gas delivery element 142, a tenth gas delivery element 143, an eleventh gas delivery element 144, a twelfth gas delivery element 145, a thirteenth gas delivery element 146, and a fourteenth gas delivery element 147. The eighth gas delivery element 141 is connected to the purge gas source and is used to acquire and deliver purge gas; the ninth gas delivery element 142 is connected to the eighth gas delivery element 141 and the air intake structure of the verification unit 130, respectively, and is used to deliver purge gas to the verification unit; the tenth gas delivery element 143 is connected to the air intake structure and the exhaust gas treatment device of the verification unit 130, respectively, and is used to deliver exhaust gas; the eleventh gas delivery element 144 is connected to the eighth gas delivery element 141 and the exhaust structure of the verification unit 130, respectively, and is used to deliver purge gas; the twelfth gas delivery element 145 is connected to the exhaust structure and the exhaust gas treatment device of the verification unit 130, respectively, and is used to deliver exhaust gas; the thirteenth gas delivery element 146 is connected to the eighth gas delivery element 141 and the liquid discharge structure of the verification unit 130, respectively, and is used to deliver purge gas; the fourteenth gas delivery element 147 is connected to the liquid discharge structure and the exhaust gas treatment device of the verification unit 130, respectively, and is used to deliver exhaust gas.

[0115] It should be noted that the purging gas is high-purity argon.

[0116] Specifically, the first end of the eighth gas delivery element 141 is connected to a purge gas source, and the second end of the eighth gas delivery element 141 is connected to the ninth gas delivery element 142, the eleventh gas delivery element 144, and the thirteenth gas delivery element 146, respectively. In some embodiments, the eighth gas delivery element 141 includes, but is not limited to, a stainless steel tube.

[0117] Specifically, the first end of the ninth gas delivery element 142 is connected to the second end of the eighth gas delivery element 141, the second end of the ninth gas delivery element 142 is connected to the sixth gas delivery element 131, and the connection between the ninth gas delivery element 142 and the sixth gas delivery element 131 is located upstream of the fourth control valve element. In some embodiments, the ninth gas delivery element 142 includes, but is not limited to, a stainless steel tube.

[0118] Specifically, the first end of the tenth gas delivery element 143 is connected to the sixth gas delivery element 131, and the connection between the tenth gas delivery element 143 and the sixth gas delivery element 131 is located upstream of the fourth control valve element. The second end of the tenth gas delivery element 143 is connected to the exhaust gas treatment device. In some embodiments, the tenth gas delivery element 143 includes, but is not limited to, a stainless steel pipe.

[0119] Specifically, the first end of the eleventh gas delivery element 144 is connected to the second end of the eighth gas delivery element 141, and the second end of the eleventh gas delivery element 144 is connected to the seventh gas delivery element 133. The connection between the eleventh gas delivery element 144 and the seventh gas delivery element 133 is located downstream of the fifth control valve element. In some embodiments, the eleventh gas delivery element 144 includes, but is not limited to, a stainless steel tube.

[0120] Specifically, the first end of the twelfth gas delivery element 145 is connected to the seventh gas delivery element 133, and the connection between the twelfth gas delivery element 145 and the seventh gas delivery element 133 is located downstream of the fifth control valve element. The second end of the twelfth gas delivery element 145 is connected to the exhaust gas treatment device. In some embodiments, the twelfth gas delivery element 145 includes, but is alternatively, a stainless steel tube.

[0121] Specifically, the first end of the thirteenth gas delivery element 146 is connected to the second end of the eighth gas delivery element 141, and the second end of the thirteenth gas delivery element 146 is connected to the liquid delivery element 134. The connection between the thirteenth gas delivery element 146 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element. In some embodiments, the thirteenth gas delivery element 146 includes, but is not limited to, a stainless steel tube.

[0122] Specifically, the first end of the fourteenth gas delivery element 147 is connected to the liquid delivery element 134, and the connection between the fourteenth gas delivery element 147 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element. The second end of the fourteenth gas delivery element 147 is connected to the exhaust gas treatment device. In some embodiments, the fourteenth gas delivery element 147 includes, but is not limited to, a stainless steel pipe.

[0123] Furthermore, the first purging unit 140 also includes an eighth control valve element, a third check valve element, a fourth check valve element, a ninth control valve element, a tenth control valve element, a fifth check valve element, a sixth check valve element, an eleventh control valve element, a twelfth control valve element, a seventh check valve element, an eighth check valve element, a thirteenth control valve element, and a third pressure monitoring element. The system includes: an eighth control valve element located on the ninth gas delivery element 142 to control the flow of gas within the ninth gas delivery element 142; a third check valve element located on the ninth gas delivery element 142 to prevent backflow of gas within the ninth gas delivery element 142; a fourth check valve element located on the tenth gas delivery element 143 to prevent backflow of gas within the tenth gas delivery element 143; a ninth control valve element located on the tenth gas delivery element 143 to control the flow of gas within the tenth gas delivery element 143; a tenth control valve element located on the eleventh gas delivery element 144 to control the flow of gas within the eleventh gas delivery element 144; a fifth check valve element located on the eleventh gas delivery element 144 to prevent backflow of gas within the eleventh gas delivery element 144; and a sixth check valve element located on the twelfth gas delivery element 145. The eleventh control valve element is located on the twelfth gas delivery element 145 to prevent backflow; the eleventh control valve element is located on the twelfth gas delivery element 145 to control the flow of the twelfth gas delivery element 145; the twelfth control valve element is located on the thirteenth gas delivery element 146 to control the flow of the thirteenth gas delivery element 146; the seventh check valve element is located on the thirteenth gas delivery element 146 to prevent backflow of gas within the thirteenth gas delivery element 146; the eighth check valve element is located on the fourteenth gas delivery element 147 to prevent backflow of gas within the fourteenth gas delivery element 147; the thirteenth control valve element is located on the fourteenth gas delivery element 147 to control the flow of the fourteenth gas delivery element; the third pressure monitoring element is connected to the eighth gas delivery element 141 to monitor the pressure of the eighth gas delivery element 141 in real time.

[0124] In some embodiments, the eighth control valve element includes, but is not limited to, a diaphragm valve, such as a sixth pneumatic diaphragm valve.

[0125] It should be noted that the third check valve element is located downstream of the eighth control valve element.

[0126] In some embodiments, the third check valve element includes, but is not limited to, a check valve, such as a third check valve.

[0127] In some of these embodiments, the fourth check valve element includes, but is not limited to, a check valve, such as a fourth check valve.

[0128] It should be noted that the ninth control valve element is located downstream of the fourth check valve element.

[0129] In some of these embodiments, the ninth control valve element includes, but is not limited to, a diaphragm valve, such as a seventh pneumatic diaphragm valve.

[0130] In some embodiments, the tenth control valve element includes, but is not limited to, a diaphragm valve, such as an eighth pneumatic diaphragm valve.

[0131] It should be noted that the fifth check valve element is located downstream of the tenth control valve element.

[0132] In some embodiments, the fifth check valve element includes, but is not limited to, a check valve, such as a fifth check valve.

[0133] In some of these embodiments, the sixth check valve element includes, but is not limited to, a check valve, such as a sixth check valve.

[0134] It should be noted that the eleventh control valve element is located downstream of the sixth check valve element.

[0135] In some embodiments, the eleventh control valve element includes, but is not limited to, a diaphragm valve, such as a ninth pneumatic diaphragm valve.

[0136] In some of these embodiments, the twelfth control valve element includes, but is not limited to, a diaphragm valve, such as a tenth pneumatic diaphragm valve.

[0137] It should be noted that the seventh check valve element is located downstream of the twelfth control valve element.

[0138] In some embodiments, the seventh check valve element includes, but is not limited to, a check valve, such as a seventh check valve.

[0139] In some of these embodiments, the eighth check valve element includes, but is not limited to, a check valve, such as an eighth check valve.

[0140] It should be noted that the thirteenth control valve element is located downstream of the eighth check valve element.

[0141] In some embodiments, the thirteenth control valve element includes, but is not limited to, a diaphragm valve, such as an eleventh pneumatic diaphragm valve.

[0142] In some of these embodiments, the third pressure monitoring element includes, but is not limited to, a pressure sensor.

[0143] The usage method of this embodiment is as follows:

[0144] (I) Gas Analysis

[0145] The first pressure control element and the first flow control element are activated to adjust the pressure and flow rate of the mixed gas conveyed in the first gas conveying element 111, thereby ensuring the stability of the mixed gas in the first gas conveying element 111.

[0146] The first control valve element and the third control valve element are opened, and the mixed gas is delivered to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112 and the fourth gas delivery element 121. The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information.

[0147] (II) Condensation

[0148] The second and fourth control valve elements are opened, so that the first gas delivery element 111, the sixth gas delivery element 131, and the condensing element 132 are connected to each other, thereby allowing the mixed gas to flow into the condensing element 132, and the condensing element 132 condenses the mixed gas to obtain condensed liquid and condensed gas.

[0149] (III) Collection of Condensate

[0150] Opening the sixth and seventh control valve elements connects the condensing element 132, the liquid conveying element 134, and the storage element 135 to each other, thereby allowing the condensed liquid to flow into the interior of the storage element 135.

[0151] (iv) Condensate gas measurement

[0152] The fifth control valve element is opened, so that the condensing element 132 is connected to the seventh gas delivery element 133. The flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow rate of the condensed gas.

[0153] (V) Purging

[0154] Opening the twelfth and thirteenth control valve elements connects the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the exhaust gas treatment device 300, thereby allowing the liquid delivery element 134 to be purged.

[0155] (vi) Measurement of condensate

[0156] The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135.

[0157] (vii) Verification

[0158] The second concentration information is obtained by calculating the total flow rate of the condensed gas and the weight of the condensed liquid. By comparing the second concentration information with the first concentration information, it is determined whether the result detected by the mass spectrometer detection element 123 is consistent with the actual result.

[0159] The advantages of this embodiment are that by connecting the first gas delivery unit to the concentration detection unit, a mass spectrometer with higher accuracy and lower delay is used to detect the TCS concentration, thereby improving the accuracy and effectiveness of TCS concentration detection; by connecting the first gas delivery unit to the verification unit, the weight of the condensate and the total flow rate of the condensate are obtained by condensing and weighing the mixed gas, and the TCS concentration is calculated from the weight of the condensate and the total flow rate of the condensate, so as to verify the results detected by the mass spectrometer detection element and improve the reliability of the detection results.

[0160] Example 2

[0161] This embodiment relates to the TCS concentration detection system of the invention.

[0162] like Figure 6 As shown, a TCS concentration detection system includes a TCS concentration detection device 100, a gas mixing device 200, and an exhaust gas treatment device 300 as described in Example 1. The gas mixing device 200 is connected to both the TCS concentration detection device 100 and the waste liquid treatment device, and is used to supply a mixed gas to the TCS concentration detection device 100. The exhaust gas treatment device 300 is connected to both the TCS concentration detection device 100 and the gas mixing device 200, and is used to treat the exhaust gas.

[0163] like Figure 7As shown, the gas mixing device 200 includes a liquid supply unit 210, a carrier gas supply unit 220, a mixing unit 230, a second gas delivery unit 240, a second purging unit 250, and a first vacuum unit 260. The system comprises the following components: a liquid supply unit 210 connected to a liquid source for supplying liquid TCS; a carrier gas supply unit 220 connected to a carrier gas source for supplying carrier gas; a mixing unit 230 connected to the liquid supply unit 210, the carrier gas supply unit 220, and the TCS concentration detection device 100 for storing liquid TCS and carrier gas and performing a bubbling reaction on the liquid TCS to generate a mixed gas; a second gas delivery unit 240 connected to the mixing unit 230 and the TCS concentration detection device 100 for acquiring and delivering the mixed gas to the TCS concentration detection device; a second purging unit 250 connected to the purging gas source, the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240 for purging the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240; and a first vacuum unit 260 connected to the power gas source, the mixing unit 230, the second purging unit 250, and the exhaust gas treatment device 300 for vacuum treatment of the entire system.

[0164] like Figure 8 As shown, the liquid supply unit 210 includes a liquid supply element 211. The liquid supply element 211 is connected to the liquid source, the mixing unit 230, and the second purging unit 250, respectively, and is used to deliver liquid TCS to the mixing unit 230.

[0165] Specifically, the first end of the liquid supply element 211 is connected to the liquid source, and the second end of the liquid supply element 211 is connected to the mixing unit 230.

[0166] In some of these embodiments, the liquid supply element 211 includes, but is not limited to, a stainless steel tube.

[0167] Furthermore, the liquid supply unit 210 also includes a fourteenth control valve element. This fourteenth control valve element is disposed on the liquid supply element 211 and is used to control the flow of liquid in the liquid supply element 211.

[0168] In some of these embodiments, the fourteenth control valve element includes, but is not limited to, a diaphragm valve.

[0169] Specifically, the fourteenth control valve element includes a third manual diaphragm valve and a twelfth pneumatic diaphragm valve. The third manual diaphragm valve is located in the liquid supply element 211; the twelfth pneumatic diaphragm valve is located in the liquid supply element 211 and is downstream of the third manual diaphragm valve.

[0170] like Figure 8As shown, the carrier gas supply unit 220 includes a carrier gas supply element 221. The carrier gas supply element 221 is connected to the carrier gas source, the mixing unit 230, and the second purging unit 250, and is used to deliver carrier gas to the mixing unit 230.

[0171] It should be noted that the carrier gas is H2.

[0172] Specifically, the first end of the carrier gas supply element 221 is connected to the carrier gas source, and the second end of the carrier gas supply element 221 is connected to the mixing unit 230.

[0173] In some of these embodiments, the carrier gas supply element 221 includes, but is not limited to, a stainless steel tube.

[0174] Furthermore, the carrier gas supply unit 220 also includes a fifteenth control valve element, a ninth check valve element, a second pressure control element, a second flow control element, and a fourth pressure monitoring element. The fifteenth control valve element is disposed on the carrier gas supply element 221 and is used to control the flow of gas in the carrier gas supply element 221; the ninth check valve element is disposed on the carrier gas supply element 221 and is used to prevent backflow of gas in the carrier gas supply element 221; the second pressure control element is disposed on the carrier gas supply element 221 and is used to regulate the pressure of the carrier gas supply element 221; the second flow control element is disposed on the carrier gas supply element 221 and is used to regulate the flow rate of the carrier gas supply element 221; the fourth pressure monitoring element is connected to the carrier gas supply element 221 and is used to monitor the pressure of the carrier gas supply element 221 in real time.

[0175] In some embodiments, the fifteenth control valve element includes, but is not limited to, a diaphragm valve, such as a fourth manual diaphragm valve and a thirteenth pneumatic diaphragm valve. The thirteenth pneumatic diaphragm valve is located downstream of the fourth manual diaphragm valve.

[0176] It should be noted that the ninth check valve element is located downstream of the second manual diaphragm valve and upstream of the fifteenth pneumatic diaphragm valve.

[0177] In some embodiments, the ninth check valve element includes, but is not limited to, a check valve, such as a ninth check valve.

[0178] It should be noted that the second pressure control element is located downstream of the second manual diaphragm valve and upstream of the ninth check valve element.

[0179] In some of these embodiments, the second pressure control element includes, but is not limited to, a PC pressure regulator.

[0180] It should be noted that the second flow control element is located downstream of the second pressure control element and upstream of the ninth check valve element.

[0181] In some of these embodiments, the second flow control element includes, but is not limited to, a gas mass flow controller.

[0182] In some embodiments, the fourth pressure monitoring element includes, but is not limited to, a pressure sensor.

[0183] It should be noted that the fourth pressure monitoring element is located downstream of the second pressure control element and upstream of the second flow control element.

[0184] like Figure 8 As shown, the mixing unit 230 includes a mixing element 231. The mixing element 231 is connected to the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, the first vacuum unit 260, the TCS concentration detection device 100, and the waste liquid treatment device, and is used to perform a bubbling reaction on the liquid TCS to generate a mixed gas.

[0185] Specifically, the mixing element 231 is connected to the liquid supply element 211, the carrier gas supply element 221, the second gas delivery unit 240, and the first vacuum unit 260, respectively, and is used to bubble the liquid TCS delivered to the mixing element 231 and generate a mixture of gas TCS and H2.

[0186] More specifically, the mixing element 231 also includes a liquid replenishment inlet, a carrier gas inlet, a mixed gas outlet, a waste liquid outlet, a cooling inlet, and a cooling outlet. The liquid replenishment inlet is located at the top of the mixing element 231 and communicates with the second end of the liquid supply element 211; the carrier gas inlet is located at the top of the mixing element 231 and communicates with the second end of the carrier gas supply element 221; the mixed gas outlet is located at the top of the mixing element 231 and communicates with the second gas delivery unit 240; the waste liquid outlet is located on the bottom wall of the sidewall of the mixing element 231 and communicates with a waste liquid treatment device; the cooling inlet is located on the sidewall of the mixing element 231 and communicates with a chiillery cooler via a pipeline; and the cooling outlet is located on the sidewall of the mixing element 231 and communicates with a chiillery cooler via a pipeline.

[0187] It should be noted that the cooling inlet and cooling outlet can circulate the coolant between the mixing element 231 and the chiller, thereby maintaining the stability inside the mixing element 231.

[0188] It should be noted that the volume of the mixing element 231 is 20L to 30L; preferably, the volume of the mixing element 231 is 25L.

[0189] It should be noted that, in actual operation, the liquid TCS inside the mixing element 231 is between 16L and 23L; preferably, the liquid TCS inside the mixing element 231 is between 19L and 20L.

[0190] In some of these embodiments, the mixing element 231 includes, but is not limited to, a bubbling tank.

[0191] Furthermore, the mixing unit 230 also includes a sixteenth control valve element, a liquid level monitoring element, and a temperature monitoring element. The sixteenth control valve element is disposed in the mixing element 231 and is used to control the flow between the mixing element 231 and the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, and the waste liquid treatment device. The liquid level monitoring element is disposed inside the mixing element 231 and is used to monitor the liquid level height inside the mixing element 231 in real time. The temperature monitoring element is disposed inside the mixing element 231 and is used to monitor the liquid temperature inside the mixing element 231 in real time.

[0192] In some embodiments, the sixteenth control valve element includes, but is not limited to, diaphragm valves, such as a fifth manual diaphragm valve, a sixth manual diaphragm valve, a seventh manual diaphragm valve, and an eighth manual diaphragm valve. Specifically, the fifth manual diaphragm valve is located at the liquid replenishment inlet of the mixing element 231 to control the flow between the mixing element 231 and the liquid supply element 211; the sixth manual diaphragm valve is located at the carrier gas inlet of the mixing element 231 to control the flow between the mixing element 231 and the carrier gas supply element 221; the seventh manual diaphragm valve is located at the mixed gas outlet of the mixing element 231 to control the flow between the mixing element 231 and the second gas delivery unit 240; and the eighth manual diaphragm valve is located at the waste liquid outlet of the mixed gas to control the flow between the mixing element 231 and the waste liquid treatment device.

[0193] In some embodiments, the level monitoring element includes, but is not limited to, a level sensor.

[0194] In some of these embodiments, the temperature monitoring element includes, but is not limited to, a temperature sensor.

[0195] like Figure 8 As shown, the second gas delivery unit 240 includes a fifteenth gas delivery element 241. The fifteenth gas delivery element 241 is connected to the mixing unit 230, the second purging unit 250, and the TCS concentration detection device 100, and is used to acquire and deliver the mixed gas to the TCS concentration detection device 100.

[0196] Specifically, the first end of the fifteenth gas conveying element 241 is connected to the gas mixing outlet of the mixing element 231, and the second end of the fifteenth gas conveying element 241 is connected to the first end of the first gas conveying element 111.

[0197] In some of these embodiments, the fifteenth gas delivery element 241 includes, but is not limited to, a stainless steel tube.

[0198] Furthermore, the second gas delivery unit 240 also includes a seventeenth control valve element and a fifth pressure monitoring element. The seventeenth control valve element is disposed on the fifteenth gas delivery element 241 and is used to control the flow of gas in the fifteenth gas delivery element 241; the fifth pressure monitoring element is connected to the fifteenth gas delivery element 241 and is used to monitor the pressure of the fifteenth gas delivery element 241 in real time.

[0199] In some embodiments, the seventeenth control valve element includes, but is not limited to, a diaphragm valve, such as a ninth manual diaphragm valve and a fourteenth pneumatic diaphragm valve. The fourteenth pneumatic diaphragm valve is located upstream of the ninth manual diaphragm valve.

[0200] It should be noted that the fifth pressure monitoring element is located downstream of the fourteenth pneumatic diaphragm valve and upstream of the ninth manual diaphragm valve.

[0201] In some of these embodiments, the fifth pressure monitoring element includes, but is not limited to, a pressure sensor.

[0202] like Figure 9 As shown, the second purging unit 250 includes a sixteenth gas delivery element 251, a seventeenth gas delivery element 252, an eighteenth gas delivery element 253, a nineteenth gas delivery element 254, and a twentieth gas delivery element 255. Specifically, the sixteenth gas delivery element 251 is connected to a purging gas source and is used to deliver purging gas; the seventeenth gas delivery element 252 is connected to the sixteenth gas delivery element 251 and a liquid supply unit 210, respectively, and is used to deliver purging gas to the liquid supply unit 210; the eighteenth gas delivery element 253 is connected to the sixteenth gas delivery element 251 and a carrier gas supply unit 220, respectively, and is used to deliver purging gas to the carrier gas supply unit 220; the nineteenth gas delivery element 254 is connected to the sixteenth gas delivery element 251 and a second gas delivery unit 240, respectively, and is used to deliver purging gas to the second gas delivery unit 240; and the twentieth gas delivery element 255 is connected to the sixteenth gas delivery element 251 and a first vacuum unit 260, respectively, and is used to deliver purging gas to the first vacuum unit 260.

[0203] It should be noted that the purging gas is high-purity argon.

[0204] Specifically, the first end of the sixteenth gas delivery element 251 is connected to the purge gas source, and the second end of the sixteenth gas delivery element 251 is connected to the seventeenth gas delivery element 252, the eighteenth gas delivery element 253, the nineteenth gas delivery element 254, and the twentieth gas delivery element 255, respectively.

[0205] In some of these embodiments, the sixteenth gas delivery element 251 includes, but is not limited to, a stainless steel tube.

[0206] Specifically, the first end of the seventeenth gas delivery element 252 is connected to the second end of the sixteenth gas delivery element 251, the second end of the seventeenth gas delivery element 252 is connected to the liquid supply element 211, and the connection between the seventeenth gas delivery element 252 and the liquid supply element 211 is located downstream of the twelfth pneumatic diaphragm valve.

[0207] In some of these embodiments, the seventeenth gas delivery element 252 includes, but is not limited to, a stainless steel tube.

[0208] Specifically, the first end of the eighteenth gas delivery element 253 is connected to the second end of the sixteenth gas delivery element 251, the second end of the eighteenth gas delivery element 253 is connected to the carrier gas supply element 221, and the connection between the eighteenth gas delivery element 253 and the carrier gas supply element 221 is located downstream of the thirteenth pneumatic diaphragm valve.

[0209] In some of these embodiments, the eighteenth gas delivery element 253 includes, but is not limited to, a stainless steel tube.

[0210] Specifically, the first end of the nineteenth gas conveying element 254 is connected to the second end of the sixteenth gas conveying element 251, the second end of the nineteenth gas conveying element 254 is connected to the fifteenth gas conveying element 241, and the connection between the nineteenth gas conveying element 254 and the fifteenth gas conveying element 241 is located upstream of the fourteenth pneumatic diaphragm valve.

[0211] In some of these embodiments, the nineteenth gas delivery element 254 includes, but is not limited to, a stainless steel tube.

[0212] Specifically, the first end of the twentieth gas delivery element 255 is connected to the second end of the sixteenth gas delivery element 251, and the second end of the twentieth gas delivery element 255 is connected to the first vacuum unit 260.

[0213] In some of these embodiments, the twentieth gas delivery element 255 includes, but is not limited to, a stainless steel tube.

[0214] Furthermore, the second purging unit 250 also includes an eighteenth control valve element, a tenth check valve element, a nineteenth control valve element, a twentieth control valve element, a twenty-first control valve element, a twenty-second control valve element, and a sixth pressure monitoring element. The eighteenth control valve element is located on the sixteenth gas delivery element 251 and is used to control the flow of the sixteenth gas delivery element 251; the tenth check valve element is located on the sixteenth gas delivery element 251 and is used to prevent backflow of gas inside the sixteenth gas delivery element 251; the nineteenth control valve element is located on the seventeenth gas delivery element 252 and is used to control the flow of the seventeenth gas delivery element 252; the twentieth control valve element is located on the eighteenth gas delivery element 253 and is used to control the flow of the eighteenth gas delivery element 253; the twenty-first control valve element is located on the nineteenth gas delivery element 254 and is used to control the flow of the nineteenth gas delivery element 254; the twenty-second control valve element is located on the twentieth gas delivery element 255 and is used to control the flow of the twentieth gas delivery element 255; and the sixth pressure monitoring element is connected to the sixteenth gas delivery element 251 and is used to monitor the pressure of the sixteenth gas delivery element 251 in real time.

[0215] In some embodiments, the eighteenth control valve element includes, but is not limited to, a diaphragm valve, such as a tenth manual diaphragm valve and a fifteenth pneumatic diaphragm valve. The fifteenth pneumatic diaphragm valve is located downstream of the tenth manual diaphragm valve.

[0216] It should be noted that the tenth check valve element is located downstream of the eighth manual diaphragm valve and upstream of the seventeenth pneumatic diaphragm valve.

[0217] In some of these embodiments, the tenth check valve element includes, but is not limited to, a check valve, such as a tenth check valve.

[0218] In some of these embodiments, the tenth check valve element includes, but is not limited to, a check valve, such as a tenth check valve.

[0219] In some embodiments, the nineteenth control valve element includes, but is not limited to, a diaphragm valve, such as a sixteenth pneumatic diaphragm valve.

[0220] In some embodiments, the twentieth control valve element includes, but is not limited to, a diaphragm valve, such as the seventeenth pneumatic diaphragm valve.

[0221] In some embodiments, the twenty-first control valve element includes, but is not limited to, a diaphragm valve, such as the eighteenth pneumatic diaphragm valve.

[0222] In some embodiments, the twenty-second control valve element includes, but is not limited to, a diaphragm valve, such as the nineteenth pneumatic diaphragm valve.

[0223] It should be noted that the connection between the sixth pressure monitoring element and the sixteenth gas delivery element 251 is located downstream of the seventeenth pneumatic diaphragm valve.

[0224] In some embodiments, the sixth pressure monitoring element includes, but is not limited to, a pressure sensor.

[0225] like Figure 10 As shown, the first vacuum unit 260 includes a first vacuum pump element 261, a twenty-first gas delivery element 262, a twenty-second gas delivery element 263, and a twenty-third gas delivery element 264. The first vacuum pump element 261 is connected to the second purging unit 250 and is used to create a vacuum negative pressure at the end of the second purging unit 250. The twenty-first gas delivery element 262 is connected to both the power gas source and the first vacuum pump element 261 and is used to deliver power gas. The twenty-second gas delivery element 263 is connected to both the first vacuum pump element 261 and the exhaust gas treatment device 300 and is used to deliver exhaust gas. The twenty-third gas delivery element 264 is connected to both the mixing unit 230 and the exhaust gas treatment device 300 and is used to deliver exhaust gas.

[0226] Specifically, the first vacuum pump element 261 is connected to the second end of the twentieth gas delivery element 255 to form a vacuum negative pressure at the second end of the twentieth gas delivery element 255.

[0227] In some of these embodiments, the first vacuum pump element 261 includes, but is not limited to, a Venturi vacuum pump.

[0228] Specifically, the first end of the twenty-first gas delivery element 262 is connected to the power gas source, and the second end of the twenty-first gas delivery element 262 is connected to the first vacuum pump element 261.

[0229] In some of these embodiments, the twenty-first gas delivery element 262 includes, but is not limited to, a stainless steel tube.

[0230] Specifically, the first end of the twenty-second gas delivery element 263 is connected to the first vacuum pump element 261, and the second end of the twenty-second gas delivery element 263 is connected to the exhaust gas treatment device 300.

[0231] In some of these embodiments, the twenty-second gas delivery element 263 includes, but is not limited to, a stainless steel tube.

[0232] Specifically, the first end of the twenty-third gas conveying element 264 is connected to the twenty-second gas conveying element 263, and the second end of the twenty-third gas conveying element 264 is connected to the mixing element 231.

[0233] In some of these embodiments, the twenty-third gas delivery element 264 includes, but is not limited to, a stainless steel tube.

[0234] Furthermore, the first vacuum unit 260 also includes a pressure relief valve element and a seventh pressure monitoring element. The pressure relief valve element is disposed on the twenty-third gas delivery element 264 and is used to relieve pressure on the mixing unit 230; the seventh pressure monitoring element is connected to the twentieth gas delivery element 255 and is used to monitor the pressure of the twentieth gas delivery element 255 in real time.

[0235] It should be noted that when the pressure inside the twenty-third gas delivery element 264 exceeds 100 psi, the pressure relief valve element can relieve the pressure inside the mixing element 231.

[0236] In some of these embodiments, the pressure relief valve element includes, but is not limited to, a safety valve.

[0237] It should be noted that the connection between the seventh pressure monitoring element and the twentieth gas delivery element 255 is located downstream of the twenty-second control valve element.

[0238] In some embodiments, the seventh pressure monitoring element includes, but is not limited to, a pressure sensor.

[0239] like Figure 11 As shown, the exhaust gas treatment device 300 includes a second vacuum unit 310 and an exhaust gas treatment unit 320. The second vacuum unit 310 is connected to the TCS concentration detection device 100 and is used to perform vacuum treatment on the TCS concentration detection device 100. The exhaust gas treatment unit 320 is connected to the TCS concentration detection device 100 and the gas mixing device 200 and is used to treat the exhaust gas discharged from the TCS concentration detection device 100 and the gas mixing unit 230.

[0240] like Figure 12 As shown, the second vacuum unit 310 includes a second vacuum pump element 311, a twenty-fourth gas delivery element 312, a twenty-fifth gas delivery element 313, and a twenty-sixth gas delivery element 314. The second vacuum pump element 311 is connected to the TCS concentration detection device 100 and is used to create a vacuum negative pressure at the end of the TCS concentration detection device 100. The twenty-fourth gas delivery element 312 is connected to the concentration detection unit 120 of the TCS concentration detection device 100 and the second vacuum pump element 311, respectively, and is used to deliver exhaust gas. The twenty-fifth gas delivery element 313 is connected to the verification unit 130 of the TCS concentration detection device 100 and the twenty-fourth gas delivery element 312, respectively, and is used to deliver exhaust gas. The twenty-sixth gas delivery element 314 is connected to the second vacuum pump element 311 and the exhaust gas treatment unit 320, respectively, and is used to deliver exhaust gas.

[0241] Specifically, the second vacuum pump element 311 is connected to the TCS concentration detection device 100 and the exhaust gas treatment unit 320 through the twenty-fourth gas delivery element 312 and the twenty-sixth gas delivery element 314, respectively, to form a vacuum negative pressure at the end of the twenty-fourth gas delivery element 312.

[0242] In some of these embodiments, the second vacuum pump element 311 includes, but is not limited to, a vacuum pump.

[0243] Specifically, the first end of the twenty-fourth gas delivery element 312 is connected to the mass spectrometer detection element 123, and the second end of the twenty-fourth gas delivery element 312 is connected to the second vacuum pump element 311.

[0244] In some of these embodiments, the twenty-fourth gas delivery element 312 includes, but is not limited to, a stainless steel tube.

[0245] Specifically, the first end of the twenty-fifth gas conveying element 313 is connected to the tenth gas conveying element 143, the twelfth gas conveying element 145, and the fourteenth gas conveying element 147, respectively. The second end of the twenty-fifth gas conveying element 313 is connected to the twenty-fourth gas conveying element 312, and the connection between the twenty-fifth gas conveying element 313 and the twenty-fourth gas conveying element 312 is located upstream of the second vacuum pump element 311.

[0246] In some of these embodiments, the twenty-fifth gas delivery element 313 includes, but is not limited to, a stainless steel tube.

[0247] Specifically, the first end of the twenty-sixth gas delivery element 314 is connected to the second vacuum pump element 311, and the second end of the twenty-sixth gas delivery element 314 is connected to the exhaust gas treatment unit 320.

[0248] In some of these embodiments, the twenty-sixth gas delivery element 314 includes, but is not limited to, a stainless steel tube.

[0249] like Figure 12 As shown, the exhaust gas treatment unit 320 includes an exhaust gas treatment element 321. The exhaust gas treatment element 321 is connected to the TCS concentration detection device 100 and the mixing unit 230, respectively, and is used to treat the exhaust gas discharged from the TCS concentration detection device 100 and the mixing unit 230.

[0250] Specifically, the exhaust gas treatment element 321 is connected to the seventh gas conveying element 133 and the twenty-sixth gas conveying element 314 respectively, and is used to collect and treat the exhaust gas.

[0251] In some of these embodiments, the exhaust gas treatment element 321 includes, but is not limited to, a scrubber.

[0252] The usage method of this embodiment is as follows:

[0253] (a) Liquid supply

[0254] Opening the fourteenth and sixteenth control valve elements allows the liquid source to connect with the mixing element 231 through the liquid supply element 211, enabling the supply of liquid TCS to the mixing element 231.

[0255] (II) Carrier Gas Supply

[0256] Opening the fifteenth and sixteenth control valve elements allows the carrier gas source to connect with the mixing element 231 through the carrier gas supply element 221, enabling the supply of carrier gas to the mixing element 231.

[0257] The second pressure control element and the second flow control element are activated to adjust the pressure and flow rate of the carrier gas supplied in the carrier gas supply element 221.

[0258] (III) Gas Mixing and Conveying

[0259] Open the seventeenth control valve element and the sixteenth control valve element so that the mixing element 231 is connected to the first gas delivery element 111 through the fifteenth gas delivery element 241;

[0260] (iv) Gas Analysis

[0261] The first pressure control element and the first flow control element are activated to adjust the pressure and flow rate of the mixed gas conveyed in the first gas conveying element 111, thereby ensuring the stability of the mixed gas in the first gas conveying element 111.

[0262] The first control valve element and the third control valve element are opened, and the mixed gas is delivered to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112 and the fourth gas delivery element 121. The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information.

[0263] (V) Condensation

[0264] The second and fourth control valve elements are opened, so that the first gas delivery element 111, the sixth gas delivery element 131, and the condensing element 132 are connected to each other, thereby allowing the mixed gas to flow into the condensing element 132, and the condensing element 132 condenses the mixed gas to obtain condensed liquid and condensed gas.

[0265] (vi) Collection of condensate

[0266] Opening the sixth and seventh control valve elements connects the condensing element 132, the liquid conveying element 134, and the storage element 135 to each other, thereby allowing the condensed liquid to flow into the interior of the storage element 135.

[0267] (vii) Condensate gas measurement

[0268] The fifth control valve element is opened, so that the condensing element 132 is connected to the seventh gas delivery element 133. The flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow rate of the condensed gas.

[0269] (VIII) First purge

[0270] Opening the twelfth and thirteenth control valve elements connects the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the exhaust gas treatment device 300, thereby allowing the liquid delivery element 134 to be purged.

[0271] (ix) Measurement of condensate

[0272] The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135.

[0273] (X) Verification

[0274] The second concentration information is obtained by calculating the total flow rate of the condensed gas and the weight of the condensed liquid. By comparing the second concentration information with the first concentration information, it is determined whether the result detected by the mass spectrometer detection element 123 is consistent with the actual result.

[0275] (xi) Second purge

[0276] If subsequent TCS concentration verification is required, the entire equipment needs to be purged. This involves opening the eighteenth, nineteenth, twentieth, twenty-first, and twenty-second control valves. The purging gas flows through the sixteenth gas delivery element 251, seventeenth gas delivery element 252, eighteenth gas delivery element 253, nineteenth gas delivery element 254, and twentieth gas delivery element 255 to the liquid supply element 211, carrier gas supply element 221, and fifteenth gas delivery element 241, thereby purging the entire pipeline and improving its cleanliness.

[0277] The advantage of this embodiment is that by connecting the gas mixing device with the TCS concentration detection device, the gas mixing device can realize the bubbling reaction of liquid TCS to generate a mixed gas, and the TCS concentration detection device can detect the TCS concentration in the mixed gas; furthermore, by connecting the exhaust gas treatment device with the gas mixing device and the TCS concentration detection device, the exhaust gas generated by the gas mixing device and the TCS concentration detection device can be treated.

[0278] Example 3

[0279] This embodiment relates to the TCS concentration detection method of the present invention.

[0280] A TCS concentration detection method, applied to the TCS concentration detection device 100 as described in Example 1 or the TCS concentration detection system as described in Example 2, includes:

[0281] The first gas delivery unit 110 is used to acquire and deliver the mixed gas delivered by the gas mixing device 200;

[0282] The concentration detection unit 120 is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas;

[0283] Verification unit 130 is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0284] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit 120 is consistent with the actual concentration.

[0285] Specifically, the TCS concentration detection method is as described in Example 1.

[0286] More specifically, the TCS concentration detection method in this embodiment is as follows:

[0287] (1) Activate the first pressure control element and the first flow control element to adjust the pressure and flow rate of the mixed gas conveyed in the first gas conveying element 111, thereby ensuring the stability of the mixed gas in the first gas conveying element 111;

[0288] (2) Open the first pneumatic diaphragm valve and the third pneumatic diaphragm valve, and deliver mixed gas to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121;

[0289] (3) The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information;

[0290] (4) Open the second pneumatic diaphragm valve and the fourth pneumatic diaphragm valve to connect the first gas conveying element 111, the sixth gas conveying element 131 and the condensing element 132 to each other, so that the mixed gas flows into the condensing element 132, and the condensing element 132 condenses the mixed gas to obtain condensed liquid and condensed gas.

[0291] (5) Open the sixth pneumatic diaphragm valve and the seventh pneumatic diaphragm valve to connect the condensing element 132, the liquid conveying element 134 and the storage element 135 to each other, so that the condensed liquid flows into the interior of the storage element 135.

[0292] (6) Open the fifth pneumatic diaphragm valve to connect the condensing element 132 with the seventh gas delivery element 133. The flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow rate of the condensed gas.

[0293] (7) Open the twelfth pneumatic diaphragm valve and the thirteenth pneumatic diaphragm valve to connect the eighth gas conveying element 141, the thirteenth gas conveying element 146, the liquid conveying element 134, the fourteenth gas conveying element 147, and the tail gas treatment device 300, so that the liquid conveying element 134 can be purged.

[0294] (8) The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135;

[0295] (9) The second concentration information is obtained by calculating the total flow rate of the condensed gas and the weight of the condensed liquid. By comparing the second concentration information with the first concentration information, it is determined whether the result detected by the mass spectrometer detection element 123 is consistent with the actual result.

[0296] Example 4

[0297] This embodiment relates to the TCS concentration detection method of the present invention.

[0298] A TCS concentration detection method, applied to the TCS concentration detection system as described in Example 2, includes:

[0299] Gas mixing device 200 is used to acquire liquid TCS and carrier gas, mix them to form a mixed gas, and transport the mixed gas to TCS concentration detection device 100;

[0300] The first gas delivery unit 110 is used to acquire and deliver the mixed gas delivered by the gas mixing device 200;

[0301] The concentration detection unit 120 is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas;

[0302] Verification unit 130 is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0303] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit 120 is consistent with the actual concentration.

[0304] Specifically, the gas mixing device 200, used to acquire liquid TCS and carrier gas, mix them to form a mixed gas, and deliver the mixed gas to the TCS concentration detection device 100, includes:

[0305] Liquid supply unit 210 is used to supply liquid to the TCS concentration detection device 100;

[0306] Carrier gas supply unit 220 is used to supply carrier gas to the TCS concentration detection device 100;

[0307] The mixing unit 230 is used to bubble the liquid TCS and generate a mixed gas.

[0308] The second gas delivery unit 240 is used to deliver the mixed gas.

[0309] Specifically, the TCS concentration detection method is as described in Example 2.

[0310] More specifically, based on Example 3, the TCS concentration detection method in this example further includes:

[0311] (1) Manually open the third manual diaphragm valve and the fifth manual diaphragm valve, and open the fourteenth pneumatic diaphragm valve so that the liquid source can be connected to the mixing element 231 through the liquid supply element 211, and liquid TCS can be delivered to the mixing element 231.

[0312] (2) Manually open the fourth manual diaphragm valve and the sixth manual diaphragm valve, and open the fifteenth pneumatic diaphragm valve so that the carrier gas source is connected to the mixing element 231 through the carrier gas supply element 221, and can deliver carrier gas to the mixing element 231.

[0313] (3) Activate the second pressure control element and the second flow control element to adjust the pressure and flow rate of the carrier gas delivered in the carrier gas supply element 221;

[0314] (4) Manually open the seventh manual diaphragm valve and the ninth manual diaphragm valve, and open the sixteenth pneumatic diaphragm valve so that the mixing element 231 is connected to the first gas conveying element 111 through the fifteenth gas conveying element 241.

[0315] In this embodiment, (1) to (4) are performed before (1) to (9) of embodiment 3. That is, (1) to (9) of embodiment 3 are numbered (5) to (13) in this embodiment.

[0316] Example 5

[0317] This embodiment relates to semiconductor process equipment in this invention.

[0318] A semiconductor process apparatus includes a TCS concentration detection device 100 as described in Example 1, or a TCS concentration detection system as described in Example 2.

[0319] Semiconductor process equipment also includes liquid sources, carrier gas sources, power gas sources, and waste liquid treatment devices. Liquid sources include, but are not limited to, TCS liquid tanks; carrier gas sources include, but are not limited to, H2 tanks; power gas sources include, but are not limited to, helium tanks; and waste liquid treatment devices include, but are not limited to, water purifiers.

[0320] The usage method and advantages of this embodiment are the same as those of Embodiment 1 or Embodiment 2, and will not be repeated here.

[0321] Example 6

[0322] This embodiment relates to a specific implementation of the TCS concentration detection system and method of the present invention.

[0323] like Figure 13 As shown, the first gas delivery unit 110 includes a pneumatic diaphragm valve (PV09, PV10), a PC pressure regulator (PC1), a flow controller (MFC1), and a pressure sensor (PT4).

[0324] The concentration detection unit 120 includes a pneumatic diaphragm valve (PV19), a one-way valve (CV10), and a mass spectrometer (MS).

[0325] The verification unit 130 includes a condenser (Cond), a chiller (Chiller), pneumatic diaphragm valves (PV15, PV16), manual diaphragm valves (MV09, MV10), a check valve (CV09), a pressure sensor (PT5), a cylinder (Cylinder), an electronic balance (EB), and a flow meter (MFM).

[0326] The first purging unit 140 includes pneumatic diaphragm valves (PV11, PV12, PV13, PV14, PV17, PV18), check valves (CV03, CV04, CV05, CV06, CV07, CV08), and a pressure sensor (PT6).

[0327] The liquid supply unit 210 includes a manual diaphragm valve (MV02) and a pneumatic diaphragm valve (PV02).

[0328] The carrier gas supply unit 220 includes a manual diaphragm valve (MV04), a pneumatic diaphragm valve (PV04), a check valve (CV02), a PC pressure regulator (PC2), a flow controller (MFC2), and a pressure sensor (PT3).

[0329] The mixing unit 230 includes a TEMPERATURE CONTROLLED VESSEL, manual diaphragm valves (MV05, MV06, MV07, MV08), a level sensor, and a temperature sensor.

[0330] The second gas delivery unit 240 includes a pneumatic diaphragm valve (PV03), a manual diaphragm valve (MV03), and a pressure sensor (PT0).

[0331] The second purging unit 250 includes a manual diaphragm valve (MV01), pneumatic diaphragm valves (PV01, PV05, PV06, PV07, PV08), and a pressure sensor (PT1).

[0332] The first vacuum unit 260 includes a vacuum pump (VG1), a pressure sensor (PT2), and a safety valve (SV).

[0333] The second vacuum unit 310 includes a vacuum pump (VG2).

[0334] The exhaust gas treatment unit 320 includes a scrubber.

[0335] Specifically, the TCS concentration detection method in this embodiment is as follows:

[0336] (1) Manually open MV02 and MV05, and turn on PV02 so that the liquid source is connected to the TEMPERATURE CONTROLLED VESSEL through the liquid supply element 211, and liquid TCS can be delivered to the TEMPERATURE CONTROLLED VESSEL.

[0337] (2) Manually open MV04 and MV07, and turn on PV04 so that the carrier gas source is connected to the TEMPERATURE CONTROLLED VESSEL through the carrier gas supply element 221, and can deliver carrier gas to the TEMPERATURE CONTROLLED VESSEL.

[0338] (3) Turn on PC2 and MFC2 to adjust the pressure and flow rate of the carrier gas delivered in the carrier gas supply element 221;

[0339] (4) Manually open MV06 and MV03, and turn on PV03 so that TEMPERATURE CONTROLLED VESSEL is connected to the first gas delivery element 111 through the fifteenth gas delivery element 241;

[0340] (5) Turn on PC1 and MFC1 to adjust the pressure and flow rate of the mixed gas conveyed in the first gas conveying element 111, thereby ensuring the stability of the mixed gas in the first gas conveying element 111.

[0341] (6) Turn on PV09 and PV19 to deliver mixed gas to MS through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121;

[0342] (7) MS can detect mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information;

[0343] (8) Turn on PV10 and PV15 to connect the first gas conveying element 111, the sixth gas conveying element 131 and Cond to each other, so that the mixed gas flows into Cond and Cond condenses the mixed gas to obtain condensed liquid and condensed gas.

[0344] (9) Open MV09 and MV10 to connect Cond, liquid delivery element 134 and Cylinder to each other, so that the condensate flows into the interior of Cylinder;

[0345] (10) Turn on PV16 so that Cond is connected to the seventh gas delivery element 133. MFM can detect the condensed gas of the seventh gas delivery element 133 and thus obtain the total flow rate of the condensed gas.

[0346] (11) Turn on PV17 and PV18 to connect the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and SCRUBBER, so that the liquid delivery element 134 can be purged.

[0347] (12) The operator separates the Cylinder from the liquid delivery element 134 and places the Cylinder on the EB to obtain the weight of the condensed liquid inside the Cylinder;

[0348] (13) The second concentration information is obtained by calculating the total flow rate of the condensing gas and the weight of the condensing liquid. The second concentration information is compared with the first concentration information to determine whether the result detected by the MS is consistent with the actual situation.

[0349] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0350] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A TCS concentration detection device, characterized in that, include: A first gas delivery unit, which is connected to a gas mixing device, is used to acquire and deliver the mixed gas delivered by the gas mixing device. A concentration detection unit is connected to the first gas delivery unit and the exhaust gas treatment device, respectively, and is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas. The verification unit is connected to the first gas delivery unit and the exhaust gas treatment device, respectively, and is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas in order to verify the first concentration information. The first purging unit is connected to the verification unit and the exhaust gas treatment device respectively, and is used to purge the verification unit and the exhaust gas treatment device. The verification unit includes: The sixth gas delivery element is connected to the first gas delivery unit and the first purging unit respectively, and is used to acquire and deliver the mixed gas; A condensing element, which is connected to the sixth gas conveying element, is used to condense the mixed gas to obtain condensed gas and condensed liquid; A seventh gas conveying element is connected to the condensing element, the first purging unit, and the tail gas treatment device, respectively, and is used to convey condensed gas to the tail gas treatment device. A liquid conveying element, which is connected to the condensing element, is used to acquire and convey condensed liquid; A storage element, which is connected to the liquid delivery element, is used to store condensate; A flow detection element is disposed on the seventh gas delivery element and is used to detect the flow rate of condensed gas; A weight detection element is disposed at the bottom of the storage element and is used to detect the mass of the condensate in the storage element; The first purging unit includes: The eighth gas delivery element is connected to the purge gas source and is used to acquire and deliver purge gas; A ninth gas delivery element, which is connected to the eighth gas delivery element and the air inlet structure of the verification unit, and is used to deliver purge gas to the verification unit; The tenth gas delivery element is connected to the air intake structure and the exhaust gas treatment device of the verification unit, respectively, and is used to deliver exhaust gas. The eleventh gas delivery element is connected to the eighth gas delivery element and the exhaust structure of the verification unit, respectively, and is used to deliver purge gas. The twelfth gas delivery element is connected to the exhaust structure and tail gas treatment device of the verification unit, respectively, and is used to deliver exhaust gas; The thirteenth gas delivery element is connected to the eighth gas delivery element and the drain structure of the verification unit, respectively, and is used to deliver purge gas. The fourteenth gas delivery element is connected to the liquid discharge structure and the tail gas treatment device of the verification unit, and is used to deliver waste gas.

2. The TCS concentration detection device according to claim 1, characterized in that, The first gas delivery unit includes: A first gas conveying element, which is connected to a gas mixing device, is used to acquire and convey the mixed gas conveyed by the gas mixing device; A second gas delivery element is connected to the first gas delivery element and the concentration detection unit, respectively, and is used to deliver the mixed gas to the concentration detection unit; A third gas delivery element, which is connected to the first gas delivery element and the verification unit respectively, is used to deliver a mixed gas to the verification unit; and / or The concentration detection unit includes: A fourth gas delivery element, which is connected to the first gas delivery unit, is used to acquire and deliver the mixed gas; The fifth gas conveying element is connected to the fourth gas conveying element and the tail gas treatment device respectively, and is used to convey waste gas to the tail gas treatment device. A mass spectrometry detection element is connected to the fourth gas delivery element and the exhaust gas treatment device, respectively, and is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas.

3. The TCS concentration detection device according to claim 2, characterized in that, The first gas delivery unit further includes: A first control valve element, disposed on the second gas delivery element, is used to control the flow through the second gas output element; and / or The first gas delivery unit further includes: A second control valve element, disposed on the third gas delivery element, is used to control the flow through the third gas delivery element; and / or The first gas delivery unit further includes: A first pressure control element, disposed on the first gas delivery element, is used to adjust the gas pressure of the first gas delivery element; and / or The first gas delivery unit further includes: A first flow control element is disposed on the first gas delivery element for adjusting the gas flow rate of the first gas delivery element; and / or The first gas delivery unit further includes: A first pressure monitoring element, connected to the first gas delivery element, is used to monitor the pressure within the first gas delivery element in real time; and / or The concentration detection unit further includes: A third control valve element, disposed on the fourth gas delivery element, is used to control the flow through the fourth gas delivery element; and / or The concentration detection unit further includes: A first one-way valve element is disposed on the fifth gas delivery element to prevent gas backflow within the fifth gas delivery element.

4. The TCS concentration detection device according to claim 1, characterized in that, The verification unit further includes: A fourth control valve element, disposed on the sixth gas delivery element, is used to control the flow between the sixth gas delivery element and the condensation element; and / or The verification unit further includes: A fifth control valve element, wherein the fifth control valve element is configured with the seventh gas delivery element, is used to control the flow between the seventh gas delivery element and the condensation element; and / or The verification unit further includes: A second one-way valve element, disposed on the seventh gas delivery element, is used to prevent backflow of gas within the seventh gas delivery element; and / or The verification unit further includes: A sixth control valve element, disposed on the liquid delivery element, is used to control the flow between the condensation element and the liquid delivery element; and / or The verification unit further includes: A seventh control valve element, disposed on the liquid delivery element, is used to control the flow of liquid within the liquid delivery element; and / or The verification unit further includes: A second pressure monitoring element, disposed on the seventh gas delivery element, is used to monitor the pressure of the seventh gas delivery element in real time; and / or The first purging unit further includes: An eighth control valve element, disposed on the ninth gas delivery element, is used to control the flow through the ninth gas delivery element; and / or The first purging unit further includes: A third one-way valve element, disposed on the ninth gas delivery element, is used to prevent gas backflow within the ninth gas delivery element; and / or The first purging unit further includes: A fourth one-way valve element, disposed on the tenth gas delivery element, is used to prevent backflow of gas within the tenth gas delivery element; and / or The first purging unit further includes: A ninth control valve element, disposed on the tenth gas delivery element, is used to control the flow through the tenth gas delivery element; and / or The first purging unit further includes: The tenth control valve element, disposed on the eleventh gas delivery element, is used to control the flow through the eleventh gas delivery element; and / or The first purging unit further includes: A fifth check valve element, disposed in the eleventh gas delivery element, is used to prevent backflow of gas within the eleventh gas delivery element; and / or The first purging unit further includes: A sixth one-way valve element, disposed on the twelfth gas delivery element, is used to prevent backflow in the twelfth gas delivery element; and / or The first purging unit further includes: An eleventh control valve element, disposed on the twelfth gas delivery element, is used to control the flow through the twelfth gas delivery element; and / or The first purging unit further includes: A twelfth control valve element, disposed on the thirteenth gas delivery element, is used to control the flow through the thirteenth gas delivery element; and / or The first purging unit further includes: A seventh check valve element, disposed on the thirteenth gas delivery element, is used to prevent backflow of gas within the thirteenth gas delivery element; and / or The first purging unit further includes: The eighth check valve element, disposed in the fourteenth gas delivery element, is used to prevent backflow of gas within the fourteenth gas delivery element; and / or The first purging unit further includes: A thirteenth control valve element, disposed on the fourteenth gas delivery element, is used to control the flow through the fourteenth gas delivery element; and / or The first purging unit further includes: A third pressure monitoring element is connected to the eighth gas delivery element and is used to monitor the pressure of the eighth gas delivery element in real time.

5. A TCS concentration detection system, characterized in that, include: The TCS concentration detection device as described in any one of claims 1 to 4; A gas mixing device is connected to the TCS concentration detection device and the waste liquid treatment device respectively, and is used to supply mixed gas to the TCS concentration detection device. An exhaust gas treatment device is connected to the TCS concentration detection device and the gas mixing device, respectively, and is used to treat the exhaust gas.

6. The TCS concentration detection system according to claim 5, characterized in that, The gas mixing device includes: A liquid supply unit, which is connected to a liquid source, is used to deliver liquid TCS; A carrier gas supply unit, which is connected to a carrier gas source and is used to deliver carrier gas; A mixing unit is connected to the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, and is used to store liquid TCS and carrier gas and to perform a bubbling reaction on the liquid TCS to generate a mixed gas. The second gas delivery unit is connected to the mixing unit and the TCS concentration detection device, respectively, and is used to acquire and deliver the mixed gas to the TCS concentration detection device. The second purging unit is connected to the purging gas source, the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit, respectively, and is used to purge the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit. A first vacuum unit, connected to the power gas source, the mixing unit, the second purging unit, and the exhaust gas treatment device, is used to perform vacuum treatment on the entire device; and / or The exhaust gas treatment device includes: The second vacuum unit is connected to the TCS concentration detection device and is used to perform vacuum treatment on the TCS concentration detection device. An exhaust gas treatment unit is connected to the TCS concentration detection device and the gas mixing device, and is used to treat the exhaust gas discharged from the TCS concentration detection device and the gas mixing unit.

7. The TCS concentration detection system according to claim 6, characterized in that, The liquid supply unit includes: A liquid supply element, which is connected to a liquid source, the mixing unit, and the second purging unit, respectively, is used to deliver liquid TCS to the mixing unit; and / or The carrier gas supply unit includes: A carrier gas supply element, which is connected to a carrier gas source, the mixing unit, and the second purging unit, respectively, for supplying carrier gas to the mixing unit; and / or The mixing unit includes: A mixing element, which is connected to the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, the first vacuum unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, for performing a bubbling reaction on liquid TCS and generating a mixed gas; and / or The second gas delivery unit includes: A fifteenth gas delivery element, which is connected to the mixing unit, the second purging unit, and the TCS concentration detection device, respectively, is used to acquire and deliver the mixed gas to the TCS concentration detection device; and / or The second purging unit includes: The sixteenth gas delivery element is connected to the purge gas source and is used to deliver purge gas. The seventeenth gas delivery element is connected to the sixteenth gas delivery element and the liquid supply unit, respectively, and is used to deliver purge gas to the liquid supply unit; The eighteenth gas delivery element is connected to the sixteenth gas delivery element and the carrier gas supply unit, respectively, and is used to deliver purge gas to the carrier gas supply unit; The nineteenth gas delivery element is connected to the sixteenth gas delivery element and the second gas delivery unit, respectively, and is used to deliver purge gas to the second gas delivery unit; The twentieth gas delivery element is connected to the sixteenth gas delivery element and the first vacuum unit, respectively, and is used to deliver purge gas to the first vacuum unit; and / or The first vacuum unit includes: A first vacuum pump element, which is connected to the second purging unit, is used to create a vacuum negative pressure at the end of the second purging unit; The 21st gas delivery element is connected to the power gas source and the first vacuum pump element respectively, and is used to deliver power gas. The 22nd gas delivery element is connected to the first vacuum pump element and the exhaust gas treatment device respectively, and is used to deliver exhaust gas. The twenty-third gas conveying element is connected to the mixing unit and the exhaust gas treatment device respectively, and is used to convey exhaust gas; and / or The second vacuum unit includes: A second vacuum pump element, which is connected to the TCS concentration detection device, is used to create a vacuum negative pressure at the end of the TCS concentration detection device. The twenty-fourth gas delivery element is connected to the concentration detection unit of the TCS concentration detection device and the second vacuum pump element, respectively, and is used to deliver exhaust gas. The 25th gas delivery element is connected to the verification unit of the TCS concentration detection device and the second vacuum pump element, respectively, and is used to deliver exhaust gas. The twenty-sixth gas delivery element is connected to the second vacuum pump element and the exhaust gas treatment unit, respectively, and is used to deliver exhaust gas; and / or The exhaust gas treatment unit includes: An exhaust gas treatment element is connected to the TCS concentration detection device and the gas mixing device, respectively, and is used to treat the exhaust gas discharged from the TCS concentration detection device and the gas mixing device.

8. The TCS concentration detection system according to claim 7, characterized in that, The liquid supply unit also includes: A fourteenth control valve element, wherein the fourteenth control valve element is disposed on the liquid supply element, for controlling the flow of liquid in the liquid supply element; and / or The carrier gas supply unit also includes: A fifteenth control valve element, wherein the fifteenth control valve element is disposed on the carrier gas supply element, is used to control the flow of the carrier gas supply element; and / or The carrier gas supply unit also includes: A ninth one-way valve element, disposed on the carrier gas supply element, is used to prevent backflow of gas into the carrier gas supply element; and / or The carrier gas supply unit also includes: A second pressure control element, disposed on the carrier gas supply element, is used to adjust the pressure of the carrier gas supply element; and / or The carrier gas supply unit also includes: A second flow control element, disposed on the carrier gas supply element, is used to regulate the flow rate of the carrier gas supply element; and / or The carrier gas supply unit also includes: A fourth pressure monitoring element, connected to the carrier gas supply element, is used to monitor the pressure of the carrier gas supply element in real time; and / or The mixing unit further includes: A sixteenth control valve element, disposed on the mixing element, is used to control the flow between the mixing element and the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, and the waste liquid treatment device; and / or The second gas delivery unit further includes: A seventeenth control valve element, disposed on the fifteenth gas delivery element, is used to control the flow through the fifteenth gas delivery element; and / or The second gas delivery unit further includes: A fifth pressure monitoring element, which is connected to the fifteenth gas delivery element, is used to monitor the pressure of the fifteenth gas delivery element in real time; and / or The second purging unit further includes: An eighteenth control valve element, disposed on the sixteenth gas delivery element, is used to control the flow through the sixteenth gas delivery element; and / or The second purging unit further includes: The tenth check valve element, disposed within the sixteenth gas delivery element, is used to prevent backflow of gas within the sixteenth gas delivery element; and / or The second purging unit further includes: A nineteenth control valve element, disposed on the seventeenth gas delivery element, is used to control the flow through the seventeenth gas delivery element; and / or The second purging unit further includes: The twentieth control valve element, disposed on the eighteenth gas delivery element, is used to control the flow through the eighteenth gas delivery element; and / or The second purging unit further includes: The twenty-first control valve element, disposed on the nineteenth gas delivery element, is used to control the flow through the nineteenth gas delivery element; and / or The second purging unit further includes: The twenty-second control valve element, disposed on the twentieth gas delivery element, is used to control the flow through the twentieth gas delivery element; and / or The second purging unit further includes: A sixth pressure monitoring element, connected to the sixteenth gas delivery element, is used to monitor the pressure of the sixteenth gas delivery element in real time; and / or The first vacuum unit further includes: A pressure relief valve element, disposed in the twenty-third gas delivery element, is used to relieve pressure on the mixing unit; and / or The first vacuum unit further includes: A seventh pressure monitoring element is connected to the twentieth gas delivery element and is used to monitor the pressure of the twentieth gas delivery element in real time.

9. A semiconductor process apparatus, comprising: The TCS concentration detection device as described in any one of claims 1 to 4; or The TCS concentration detection system as described in any one of claims 5 to 8.

10. A TCS concentration detection method, applied to the TCS concentration detection device as described in any one of claims 1 to 4 or the TCS concentration detection system as described in any one of claims 5 to 8, comprising: The first gas delivery unit is used to acquire and deliver the mixed gas delivered by the gas mixing device; The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain the initial concentration information of the mixed gas; The verification unit is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas; By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual concentration.

11. A TCS concentration detection method, applied to the TCS concentration detection system as described in any one of claims 5 to 8, comprising: The gas mixing device is used to acquire liquid TCS and carrier gas, mix them to form a mixed gas, and deliver the mixed gas to the TCS concentration detection device. The first gas delivery unit is used to acquire and deliver the mixed gas delivered by the gas mixing device; The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain the initial concentration information of the mixed gas; The verification unit is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas; By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual concentration.

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