Wafer cleaning machine liquid supply device

Abstract

The application belongs to the technical field of semiconductor, and particularly relates to a wafer cleaning machine liquid supply equipment, which comprises an equipment rack, a plurality of liquid supply tanks are fixedly connected to the outer wall of the end of the equipment rack, and the plurality of liquid supply tanks are respectively used for extracting liquid with different concentrations; the inner wall of each of the plurality of liquid supply tanks is slidably connected with a lifting plate; different concentrations of liquid are temporarily stored in the plurality of liquid storage tanks, and liquid with different concentrations is squeezed and flushed according to the requirements of different wafers, so that liquid can be supplied quickly and targeted, thereby ensuring the processing efficiency of the wafer; the wafer is supported in the cleaning tank by the cleaning frame; the piston extracts liquid under the forward rotation of the output end of the stepping motor; the piston squeezes the temporarily stored liquid in the liquid storage tank at the liquid injection pipe to spray and flush the wafer under the reverse rotation of the output end of the stepping motor, so as to play a role in supplying and cleaning the wafer; and the stirring blade stirs the extracted liquid during the extraction of the liquid in the mixing cylinder, so as to improve the uniform mixing effect of the liquid extraction.

Description

Technical Field

[0001] This invention belongs to the field of semiconductor technology, specifically a liquid supply device for a wafer cleaning machine. Background Technology

[0002] A wafer is a chip used to make silicon semiconductor circuits. After the wafer has undergone multiple processing steps, various contaminants will adhere to its surface. These contaminants can easily affect the quality of the wafer. Therefore, liquid cleaning of the wafer is an important process step in the wafer manufacturing process.

[0003] A patent application with publication number CN114951193A discloses a wafer cleaning device and a liquid supply method, including a liquid supply system, a plurality of sequentially stacked covers, a spray system connected to the liquid supply system, a rotation system suitable for placing wafers, a collection system disposed below the covers, and a lifting drive system. This application mainly uses the lifting drive system to sequentially lift or lower the covers, thereby enabling multiple agents to clean the wafers between the covers and avoiding cross-contamination between the agents.

[0004] The aforementioned wafer cleaning solution supply equipment mainly fixes the wafer on a rotating system and relies on various chemicals to clean the wafer between the covers, thereby improving the cleaning effect. When supplying solutions for wafer cleaning, the appropriate concentration of solution is usually supplied according to different wafer models. However, the current solution supply equipment of wafer cleaning machines is usually used to supply a single concentration of solution. When cleaning different wafer models, it is difficult to quickly supply solutions of different concentrations, which can easily affect the wafer processing efficiency.

[0005] Therefore, the present invention provides a liquid supply device for a wafer cleaning machine. Summary of the Invention

[0006] In order to overcome the shortcomings of the prior art, at least one technical problem raised in the background art is solved.

[0007] The technical solution adopted by this invention to solve its technical problem is as follows: A wafer cleaning machine liquid supply device according to this invention includes a machine frame; multiple liquid supply tanks are fixedly connected to the outer wall of the end of the machine frame, and the multiple liquid supply tanks are used to extract liquids of different concentrations respectively; lifting plates are slidably connected to the inner walls of the multiple liquid supply tanks; a piston rod is fixedly connected to the bottom end of one side of the lifting plate, and a piston is installed at the bottom end of the piston rod; a base plate is fixedly connected to the bottom inner wall of the liquid supply tank; a liquid storage tank is fixedly connected to the base plate, and the piston is slidably connected to the inner wall of the liquid storage tank; a one-way pressure valve and two solenoid valves are fixedly connected to the bottom end of the liquid storage tank respectively; a first conduit is fixedly connected to one of the solenoid valves; a cleaning component is provided at the end of the first conduit away from the solenoid valve, and the cleaning component cleans the wafer by squeezing out the liquid through the first conduit; a transmission component is provided inside the multiple liquid supply tanks, and the transmission component is used to drive the lifting plate to slide up and down.

[0008] Preferably, the transmission assembly includes a top plate, a guide rod, a stepper motor, and a lead screw; the top plate is fixed to the top inner wall of the liquid supply tank; the guide rod is fixed to the bottom middle of the top plate, the bottom end of the guide rod is fixed to the top top of the bottom plate, and the guide rod passes through the middle of the lifting plate; the stepper motor is fixed to the bottom of the top plate, and the stepper motor is located on the side of the guide rod away from the liquid storage tank; the lead screw is fixed to the output end of the stepper motor, and the lead screw is connected to the lifting plate through a lead screw and nut pair.

[0009] Preferably, the cleaning assembly includes a primary flow guide box, an injection tube, a support base, a cleaning tank, and a cleaning rack; the primary flow guide box is fixedly connected to the end of a plurality of primary conduits away from the supply tank; the injection tube is fixedly connected to the top center of the primary flow guide box; the support base is fixedly connected to the horizontal part of the equipment frame; the cleaning tank is fixedly connected to the top of the support base, and the end of the injection tube away from the primary flow guide box is connected to the center interior of the cleaning tank; the cleaning rack is slidably connected to the inner wall of the cleaning tank, and the cleaning rack is located below the injection tube.

[0010] Preferably, a mixing cylinder is fixedly connected to the bottom end of the base plate on the side away from the storage tank; a liquid extraction pipe is fixedly connected to the bottom end of the mixing cylinder; a second conduit is fixedly connected to the outer wall of the mixing cylinder, and the second conduit is connected to a one-way pressure valve; multiple storage tanks are fixedly connected to the upper end face of the equipment frame, and the liquid extraction pipe is located inside the storage tank.

[0011] Preferably, a connecting rod is fixedly connected to the bottom end of the lead screw; multiple stirring blades are fixedly connected to the outer wall of the mixing cylinder inside the connecting rod; a filter screen plate is fixedly connected to the inner wall of the mixing cylinder, the connecting rod passes through the middle of the filter screen plate, and the filter screen plate is located below the stirring blades; a scraper is fixedly connected to the outside of the connecting rod, and the scraper is in contact with the bottom surface of the filter screen plate.

[0012] Preferably, a connector is fixed to the bottom end of the liquid extraction tube; short tubes are fixed to both sides of the connector; a long tube is fixed to the bottom end of the connector, and a connecting rod passes through the long tube; an agitator is fixed to the outside of the bottom end of the connecting rod, and the agitator is located at the bottom of the liquid storage tank.

[0013] Preferably, a third conduit is fixedly connected to one of the solenoid valves; a second guide box is fixedly connected to the end of the two third conduits away from the liquid supply tank; a thick pipe is fixedly connected to the middle of the second guide box, and the end of the thick pipe away from the second guide box is installed on the first guide box through a valve.

[0014] Preferably, a liquid storage tank is fixedly connected to the upper end face of the equipment frame; a water pump is fixedly connected to the liquid storage tank; a No. 1 water pipe is fixedly connected to the output end of the water pump, and the end of the No. 1 water pipe away from the water pump is fixedly connected to one side of a No. 1 flow guide box; a No. 2 water pipe is fixedly connected to the end of the No. 1 flow guide box away from the No. 1 water pipe.

[0015] Preferably, a collection groove is provided at the top of the support base; a filter screen is fixed to the inner wall of the collection groove.

[0016] Preferably, a control valve is fixedly connected to the outer wall of the support base, and the control valve is connected to the collection tank; a recovery pipe is fixedly connected to the end of the control valve away from the support base; a one-way valve is installed between the recovery pipe and a liquid storage tank.

[0017] The beneficial effects of this invention are as follows: 1. The wafer cleaning machine liquid supply device of the present invention, by setting up multiple liquid storage tanks to extract and temporarily store liquid solutions of different concentrations, and squeezing liquid solutions of different concentrations to rinse according to the needs of different wafers, can quickly and specifically supply liquid, thereby ensuring the processing efficiency of wafers. The cleaning rack supports the wafers inside the cleaning tank. The output end of the stepper motor rotates in the forward direction to drive the piston to extract the liquid. When the output end of the stepper motor rotates in the reverse direction, the piston squeezes the liquid temporarily stored in the liquid storage tank and sprays it onto the wafer through the injection pipe to rinse it, thereby achieving the function of supplying liquid for cleaning the wafer. During the process of extracting the liquid into the mixing cylinder, the stirring blades agitate the extracted liquid, improving the uniform mixing effect of the extracted liquid.

[0018] 2. The wafer cleaning machine liquid supply device of the present invention connects two short pipes and one long pipe through a connector to extract the upper and lower layers of the liquid in the storage tank, ensuring the concentration of the extracted liquid. By extracting two liquids of different concentrations and sending them to the No. 2 guide box for mixing, the mixture is then sent through the thick pipe to the No. 1 guide box for spraying and cleaning the wafers, thus achieving the effect of mixing the two liquids of different concentrations. A water pump draws clean water from the storage tank and sends it to the No. 1 guide box to rinse away the residual liquid, thus cleaning the inside of the No. 1 guide box. A control valve opens the outlet of the collection tank, and the liquid in the collection tank flows into a storage tank for recycling, achieving the effect of recycling the liquid. Attached Figure Description

[0019] The invention will now be further described with reference to the accompanying drawings.

[0020] Figure 1 This is a perspective view of the present invention; Figure 2 This is a schematic diagram of the structure of the No. 1 flow guide box in this invention; Figure 3 This is a schematic diagram of the structure of the No. 2 flow guide box in this invention; Figure 4 This is a schematic diagram of the liquid storage tank in this invention; Figure 5 This is a partial structural cross-sectional view of the mixing cylinder in this invention.

[0021] In the diagram: 1. Equipment frame; 11. Liquid supply tank; 12. Lifting plate; 13. Piston rod; 14. Base plate; 15. Liquid storage tank; 16. No. 1 conduit; 2. Top plate; 21. Smooth rod; 22. Stepper motor; 23. Lead screw; 3. No. 1 flow guide box; 31. Injection pipe; 32. Support base; 33. Cleaning tank; 34. Cleaning rack; 4. Mixing cylinder; 41. Suction pipe; 42. No. 2 43. Conduit; 5. Storage tank; 6. Connecting rod; 7. Stirring blade; 8. Filter plate; 9. Scraper; 10. Connector; 11. Short pipe; 12. Long pipe; 13. Stirring blade; 14. No. 3 conduit; 15. No. 2 guide box; 16. Coarse pipe; 17. Storage tank; 18. Water pump; 19. No. 1 water pipe; 10. No. 2 water pipe; 11. Control valve; 12. Recovery pipe; 13. Check valve. Detailed Implementation

[0022] To make the technical means, creative features, objectives and effects of this invention easier to understand, the invention will be further described below in conjunction with specific embodiments.

[0023] like Figures 1 to 4As shown in the embodiment of the present invention, a wafer cleaning machine liquid supply device includes a machine frame 1; a plurality of liquid supply tanks 11 are fixedly connected to the outer wall of the end of the machine frame 1, and the plurality of liquid supply tanks 11 are respectively used to extract liquids of different concentrations; a lifting plate 12 is slidably connected to the inner wall of the plurality of liquid supply tanks 11; a piston rod 13 is fixedly connected to the bottom end of one side of the lifting plate 12, and a piston is installed at the bottom end of the piston rod 13; a bottom plate 14 is fixedly connected to the inner wall of the bottom of the liquid supply tank 11; a liquid storage tank 15 is fixedly connected to the bottom plate 14, and the piston is slidably connected to the inner wall of the liquid storage tank 15. The bottom of the liquid storage tank 15 is fixedly connected to a one-way pressure valve and two solenoid valves; a first conduit 16 is fixedly connected to one of the solenoid valves; a cleaning assembly is provided at the end of the first conduit 16 away from the solenoid valve, and the cleaning assembly cleans the wafer by squeezing out the liquid in the first conduit 16; a transmission assembly is provided inside the multiple liquid supply tanks 11, which is used to drive the lifting plate 12 to slide up and down; when supplying liquid for wafer cleaning, the equipment frame 1 serves as the main structure of the wafer liquid supply equipment, and the multiple liquid supply tanks 11 are fixed to the outer wall of the equipment frame 1 as... The protective shell of the liquid supply component houses multiple liquid medicines of different concentrations in various liquid medicine containers. A one-way pressure valve is connected to the liquid medicine containers via a pipeline. The base plate 14 fixes the storage tank 15 to the bottom inner wall of the supply tank 11. The storage tank 15 is used to temporarily store the supplied liquid medicine. A sensor can be installed inside the storage tank 15 to monitor the concentration of the supplied liquid medicine. As the transmission component drives the lifting plate 12 to slide up against the inner wall of the supply tank 11, the lifting plate 12 can simultaneously drive the piston rod 13 to pull the piston. The piston slides up the inner wall of the storage tank 15, and the liquid medicine is drawn out through the pipeline connected to the one-way pressure valve. The liquid medicine in the container is transferred to the storage tank 15. At this time, the one-way pressure valve is open and multiple solenoid valves are closed. As the transmission component reverses and drives the lifting plate 12 to slide down, the piston squeezes the liquid medicine inside the storage tank 15. At this time, the solenoid valve connected to the first conduit 16 opens, allowing the liquid medicine to enter the first conduit 16 through the solenoid valve. Finally, the liquid medicine is squeezed out to clean the wafer. Depending on the type of wafer being cleaned, different concentrations of liquid medicine are extracted from different liquid medicine containers using a wafer liquid supply device. This allows for rapid and targeted liquid supply, thereby ensuring the processing efficiency of the wafer.

[0024] The transmission assembly includes a top plate 2, a guide rod 21, a stepper motor 22, and a lead screw 23. The top plate 2 is fixed to the inner top wall of the liquid supply tank 11. The guide rod 21 is fixed to the bottom middle of the top plate 2, and the bottom end of the guide rod 21 is fixed to the top top of the bottom plate 14, with the guide rod 21 penetrating the middle of the lifting plate 12. The stepper motor 22 is fixed to the bottom of the top plate 2, and the stepper motor 22 is located on the side of the guide rod 21 away from the liquid storage tank 15. The lead screw 23 is fixed to the output end of the stepper motor 22, and the lead screw 23 is connected to the lifting plate 12 through a screw and nut pair. When extracting the medicine, the top plate 2 is fixed to the inner top wall of the liquid supply tank 11 to support the stepper motor. 22. The output end of the stepper motor 22 drives the lead screw 23 to rotate in the forward direction. The lead screw 23 then synchronously drives the lifting plate 12 connected to the lead screw nut pair to rise. The lifting plate 12 slides on the outer wall of the guide rod 21. The lifting plate 12 pulls the piston rod 13 and the piston to draw the liquid into the storage tank 15 through the pipeline connected to the one-way pressure valve. When the liquid is squeezed and conveyed, the output end of the stepper motor 22 drives the lead screw 23 to rotate in the reverse direction. The lifting plate 12 slides down the outer wall of the guide rod 21. The lifting plate 12 drives the piston rod 13 and the piston to squeeze the liquid in the storage tank 15. The liquid is discharged from the first conduit 16 to clean the wafer, which plays the role of extracting and discharging the liquid.

[0025] like Figure 1 and Figure 2 As shown, the cleaning assembly includes a first flow guide box 3, an injection pipe 31, a support base 32, a cleaning tank 33, and a cleaning rack 34. The first flow guide box 3 is fixedly connected to the end of a plurality of first conduits 16 away from the supply tank 11. The injection pipe 31 is fixedly connected to the top center of the first flow guide box 3. The support base 32 is fixedly connected to the horizontal part of the equipment frame 1. The cleaning tank 33 is fixedly connected to the top of the support base 32, and the end of the injection pipe 31 away from the first flow guide box 3 is connected to the center of the cleaning tank 33. The cleaning rack 34 is slidably connected to the cleaning... The inner wall of the box 33 is provided, and the cleaning rack 34 is located below the liquid injection pipe 31. When the wafer is being cleaned, the liquid temporarily stored in the storage tank 15 is pumped into the first guide box 3 through the first conduit 16. Then the liquid reaches the inside of the liquid injection pipe 31 and is sent to the middle top of the cleaning box 33. The cleaning rack 34 is used to support the wafer for auxiliary cleaning. The liquid is sprayed from the top of the inside of the cleaning box 33 to rinse the wafer on the cleaning rack 34. After rinsing the wafer, the liquid falls through the holes provided on the cleaning rack 34 into the support base 32 for temporary storage, which plays a role in cleaning the wafer.

[0026] like Figures 1 to 5As shown, a mixing cylinder 4 is fixedly connected to the bottom end of the base plate 14 away from the storage tank 15; a suction pipe 41 is fixedly connected to the bottom end of the mixing cylinder 4; a second conduit 42 is fixedly connected to the outer wall of the mixing cylinder 4, and the second conduit 42 is connected to a one-way pressure valve; multiple storage tanks 43 are fixedly connected to the upper end face of the equipment frame 1, and the suction pipe 41 is located inside the storage tank 43; when extracting the drug solution, multiple drug solutions of different concentrations are stored in multiple storage tanks 43 respectively. According to the different types of wafers, the piston rod 13 above the storage tank 43 containing different concentrations of drug solution drives the piston to extract the drug solution. The drug solution is extracted from the inside of the storage tank 43 by the suction pipe 41 and circulated in the mixing cylinder 4. The drug solution is extracted by the second conduit 42 and sent to the inside of the storage tank 15 through the one-way pressure valve, which plays the role of extracting the drug solution.

[0027] A connecting rod 5 is fixedly connected to the bottom end of the lead screw 23; multiple stirring blades 51 are fixedly connected to the outer wall of the mixing cylinder 4 inside the connecting rod 5; a filter screen plate 52 is fixedly connected to the inner wall of the mixing cylinder 4, the connecting rod 5 passes through the middle of the filter screen plate 52, and the filter screen plate 52 is located below the stirring blades 51; a scraper blade 53 is fixedly connected to the outside of the connecting rod 5, and the scraper blade 53 is in contact with the bottom surface of the filter screen plate 52; when the liquid medicine is drawn into the interior of the mixing cylinder 4, the output end of the stepper motor 22 drives the lead screw 23 to rotate. The screw 23 drives multiple stirring blades 51 on the connecting rod 5 to rotate synchronously. The multiple stirring blades 51 agitate the extracted liquid medicine, improving the uniform mixing effect of the liquid medicine. The filter screen plate 52 is fixed below the stirring blades 51 and can filter out large pieces of material after the liquid medicine has settled. The scraper blade 53 rotates to break up the large pieces of material, further improving the uniform mixing effect of the liquid medicine. At the same time, the scraper blade 53 can scrape against the bottom of the filter screen plate 52, reducing the possibility of blockage caused by the material attached to the bottom of the filter screen plate 52.

[0028] like Figures 1 to 4 As shown, a connector 6 is fixedly connected to the bottom end of the extraction pipe 41; short pipes 61 are fixedly connected to both sides of the connector 6; a long pipe 62 is fixedly connected to the bottom end of the connector 6, and a connecting rod 5 passes through the long pipe 62; an agitator 63 is fixedly connected to the outside of the bottom end of the connecting rod 5, and the agitator 63 is located at the bottom of the storage tank 43; when extracting the medicine liquid inside the storage tank 43, because the medicine liquid is prone to sedimentation and stratification after long-term storage, the connector 6 is used to fix the extraction pipe 41. The bottom end of 1 serves as a connector, with two short pipes 61 installed on both sides of the connector 6 to draw out the upper layer of medicine inside the storage tank 43. The long pipe 62 is fixed to the bottom end of the connector 6 and extends to the bottom end of the storage tank 43 to draw out the lower layer of medicine inside the storage tank 43. The stirring blade 63 rotates with the connecting rod 5 to stir the lower layer of medicine inside the storage tank 43, so that the lower layer of precipitated medicine is stirred. The upper and lower layers of medicine are drawn into the mixing cylinder 4 for mixing to ensure the concentration of the extracted medicine.

[0029] like Figures 1 to 3 As shown, a No. 3 conduit 7 is fixedly connected to one of the solenoid valves; a No. 2 flow guide box 71 is fixedly connected to one end of the two No. 3 conduits 7 away from the liquid supply tank 11; a thick pipe 72 is fixedly connected to the middle of the No. 2 flow guide box 71, and the end of the thick pipe 72 away from the No. 2 flow guide box 71 is installed on the No. 1 flow guide box 3 through a valve; when extracting the drug solution, it is necessary to take the concentration between the two drug solutions, and at the same time, the two liquid storage tanks 15 extract the drug solution inside the two liquid storage tanks 43, and then squeeze the drug solution temporarily stored in the two liquid storage tanks 15 to discharge it from the two No. 3 conduits 7. The two No. 3 conduits 7 discharge the two different drug solutions into the No. 2 flow guide box 71 to accumulate, and then transport it to the No. 1 flow guide box 3 by the thick pipe 72. Finally, the wafer is sprayed and rinsed at the top of the cleaning tank 33 by the injection pipe 31, which plays the role of mixing drug solutions of different concentrations.

[0030] like Figure 1 and Figure 2 As shown, a liquid storage tank 8 is fixedly connected to the upper end face of the equipment frame 1; a water pump 81 is fixedly connected to the liquid storage tank 8; a first water pipe 82 is fixedly connected to the output end of the water pump 81, and the end of the first water pipe 82 away from the water pump 81 is fixedly connected to one side of the first flow guide box 3; a second water pipe 83 is fixedly connected to the end of the first flow guide box 3 away from the first water pipe 82; after the liquid is extracted to rinse the wafer, some liquid remains inside the first flow guide box 3. The liquid storage tank 8 stores clean water, and the water pump 81 extracts the clean water from the liquid storage tank 8 and sends the clean water to the inside of the first flow guide box 3 through the first water pipe 82 for rinsing, thereby cleaning the inside of the first flow guide box 3.

[0031] The top of the support base 32 is provided with a collection groove; a filter screen is fixed to the inner wall of the collection groove; when the wafer is cleaned, the wafer is placed on the cleaning rack 34 for cleaning with the cleaning solution, and the cleaning solution falls through the cleaning rack 34 into the collection groove of the support base 32. The filter screen filters out excessive impurities in the solution, thus collecting the solution.

[0032] A control valve 9 is fixedly connected to the outer wall of the support base 32, and the control valve 9 is connected to the collection tank. A recovery pipe 91 is fixedly connected to the end of the control valve 9 away from the support base 32. A one-way valve 92 is installed between the recovery pipe 91 and a storage tank 43. After the wafer is cleaned with the chemical solution, part of the chemical solution is temporarily stored in the collection tank of the support base 32. The control valve 9 is opened to connect with the recovery pipe 91, and the chemical solution in the collection tank is sent to the one-way valve 92 through the recovery pipe 91. The chemical solution enters a storage tank 43 for storage through the one-way valve 92. This storage tank 43 is used to collect and mix the recovered chemical solution. The recovered chemical solution can be extracted for cleaning low-quality wafers, thus playing the role of recycling the chemical solution.

[0033] Working process: During wafer cleaning and liquid supply, the equipment frame 1 serves as the main structure of the wafer liquid supply equipment. Multiple liquid supply tanks 11 are fixed to the outer wall of the equipment frame 1 as protective shells for the liquid supply components. Various solutions of different concentrations are placed in multiple solution containers. A one-way pressure valve is connected to the solution containers through a pipeline. The base plate 14 fixes the storage tank 15 to the bottom inner wall of the liquid supply tank 11. The storage tank 15 is used to temporarily store the supplied solution. A sensor can be installed inside the storage tank 15 to monitor the concentration of the supplied solution. As the transmission component drives the lifting plate 12 to slide up the inner wall of the liquid supply tank 11, the lifting plate 12 can simultaneously drive the piston rod 13 to pull the piston. The piston slides up the inner wall of the storage tank 15, and the solution is drawn from the storage tank through the pipeline connected to the one-way pressure valve. The cleaning solution in the device flows into the storage tank 15. At this time, the one-way pressure valve is open, and multiple solenoid valves are closed. As the transmission component reverses and drives the lifting plate 12 to slide down, the piston squeezes the cleaning solution inside the storage tank 15. At this time, the solenoid valve connected to the first conduit 16 opens, allowing the cleaning solution to enter the first conduit 16 through the solenoid valve. Finally, the cleaning solution is squeezed out to clean the wafer. Depending on the type of wafer being cleaned, different concentrations of cleaning solution are extracted from different cleaning solution containers using a wafer liquid supply device. This allows for rapid and targeted liquid supply, thereby ensuring the processing efficiency of the wafer. During the extraction of the cleaning solution, the top plate 2 is fixed to the inner wall of the top of the liquid supply tank 11, supporting the stepper motor 22. The output end of the stepper motor 22 drives the lead screw 23 to rotate in the forward direction. The 23rd stepper motor synchronously drives the lifting plate 12 connected to the lead screw nut pair to rise. The lifting plate 12 slides on the outer wall of the guide rod 21. The lifting plate 12 pulls the piston rod 13 and the piston to draw the liquid into the storage tank 15 through the pipeline connected to the one-way pressure valve. When the liquid is squeezed and conveyed, the output end of the stepper motor 22 drives the lead screw 23 to rotate in the opposite direction. The lifting plate 12 slides down the outer wall of the guide rod 21. The lifting plate 12 drives the piston rod 13 and the piston to squeeze the liquid in the storage tank 15. The liquid is discharged from the first conduit 16 to clean the wafer, which plays the role of liquid extraction and discharge. When the liquid is supplied to clean the wafer, the liquid temporarily stored in the storage tank 15 is pumped into the first guide box 3 through the first conduit 16. Then the liquid reaches the injection pipe 31. The wafer is sent to the top of the middle of the cleaning tank 33. The cleaning rack 34 is used to support the wafer for auxiliary cleaning. The cleaning solution is sprayed from the top of the cleaning tank 33 to rinse the wafer on the cleaning rack 34. After rinsing the wafer, the cleaning solution falls through the holes on the cleaning rack 34 into the support base 32 for temporary storage, which plays a role in cleaning the wafer. When the cleaning solution is extracted, multiple solutions of different concentrations are stored in multiple storage tanks 43. According to the different types of wafers, the piston rod 13 above the storage tank 43 containing different concentrations of cleaning solution drives the piston to extract the cleaning solution. The cleaning solution is extracted from the storage tank 43 by the extraction pipe 41 to the mixing cylinder 4 for circulation. The cleaning solution is extracted by the second conduit 42 and sent to the inside of the storage tank 15 through the one-way pressure valve, which plays a role in extracting the cleaning solution.When the liquid medicine is drawn into the mixing cylinder 4, the output end of the stepper motor 22 drives the lead screw 23 to rotate. The lead screw 23 can drive multiple stirring blades 51 on the connecting rod 5 to rotate synchronously. The multiple stirring blades 51 agitate the drawn liquid medicine, improving the uniform mixing effect of the liquid medicine. The filter screen plate 52 is fixed below the stirring blades 51 and can filter out large pieces of material after the liquid medicine has settled. The scraper blade 53 rotates to break up the large pieces of material, further improving the uniform mixing effect of the liquid medicine. At the same time, the scraper blade 53 can scrape against the bottom of the filter screen plate 52, reducing the possibility of blockage caused by the material attached to the bottom of the filter screen plate 52. When extracting the medicine from the storage tank 43, the medicine is prone to sedimentation and stratification due to long-term storage. The connector 6 is fixed to the bottom of the extraction pipe 41 as a joint. Two short pipes 61 are installed on both sides of the connector 6 to extract the upper layer of medicine from the storage tank 43. The long pipe 62 is fixed to the bottom of the connector 6 and extends to the bottom of the storage tank 43 to extract the lower layer of medicine from the storage tank 43. The stirring blade 63 rotates with the connecting rod 5 to stir the lower layer of medicine in the storage tank 43, so that the sedimented medicine in the lower layer is stirred. The upper and lower layers of medicine are extracted into the mixing cylinder 4 for mixing to ensure the concentration of the extracted medicine. When extracting the drug solution, the concentration between the two drug solutions needs to be measured. At the same time, the two storage tanks 15 extract the drug solution from the two storage tanks 43. Then, the drug solution temporarily stored in the two storage tanks 15 is squeezed out from the two No. 3 conduits 7. The two No. 3 conduits 7 discharge the two different drug solutions into the No. 2 diversion box 71 for collection. The solution is then transported to the No. 1 diversion box 3 by the thick pipe 72. Finally, the solution is sprayed and rinsed on the top of the cleaning tank 33 by the injection pipe 31, which serves to mix and use drug solutions of different concentrations. After the solution is extracted to rinse the wafer, some solution remains inside the No. 1 flow box 3. Clean water is stored inside the liquid storage tank 8, and the water pump 81 extracts the clean water from the liquid storage tank 8 and sends it to the No. 1 flow box 3 through the No. 1 water pipe 82 to rinse the inside of the No. 1 flow box 3, thereby cleaning the inside of the No. 1 flow box 3. When cleaning wafers, the wafers are placed on the cleaning rack 34 and cleaned with the cleaning solution. The cleaned solution flows through the cleaning rack 34 and falls into the collection tank of the support base 32. The filter screen filters out excessive substances in the solution, thus collecting the solution. After cleaning the wafers with the solution, some of the solution is temporarily stored in the collection tank of the support base 32. The control valve 9 is opened to connect with the recovery pipe 91. The solution in the collection tank is sent to the one-way valve 92 through the recovery pipe 91. The solution then enters a storage tank 43 for storage. This storage tank 43 is used to collect and mix the recovered solution. The recovered solution can be extracted for cleaning low-quality wafers, thus achieving the purpose of recycling the solution.

[0034] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of the present invention is defined by the appended claims and their equivalents.

Claims

1. A liquid supply device for a wafer cleaning machine, characterized in that: The equipment includes a frame (1); multiple liquid supply tanks (11) are fixedly connected to the outer wall of the end of the frame (1), and the multiple liquid supply tanks (11) are used to extract liquids of different concentrations respectively; a lifting plate (12) is slidably connected to the inner wall of the multiple liquid supply tanks (11); a piston rod (13) is fixedly connected to the bottom end of one side of the lifting plate (12), and a piston is installed at the bottom end of the piston rod (13); a bottom plate (14) is fixedly connected to the inner wall of the bottom of the liquid supply tank (11); a storage tank (1) is fixedly connected to the bottom plate (14). 5), and the piston is slidably connected to the inner wall of the storage tank (15); a one-way pressure valve and two solenoid valves are fixedly connected to the bottom of the storage tank (15); a first conduit (16) is fixedly connected to one of the solenoid valves; a cleaning component is provided at the end of the first conduit (16) away from the solenoid valve, and the cleaning component cleans the wafer by squeezing out the liquid in the first conduit (16); a transmission component is provided inside the multiple supply tanks (11), and the transmission component is used to drive the lifting plate (12) to slide up and down; The transmission assembly includes a top plate (2), a guide rod (21), a stepper motor (22), and a lead screw (23); the top plate (2) is fixed to the top inner wall of the liquid supply tank (11); the guide rod (21) is fixed to the bottom middle part of the top plate (2), the bottom end of the guide rod (21) is fixed to the top top of the bottom plate (14), and the guide rod (21) passes through the middle of the lifting plate (12); the stepper motor (22) is fixed to the bottom of the top plate (2), and the stepper motor (22) is located on the side of the guide rod (21) away from the liquid storage tank (15); the lead screw (23) is fixed to the output end of the stepper motor (22), and the lead screw (23) is connected to the lifting plate (12) through a lead screw and nut pair; The cleaning assembly includes a first flow guide box (3), an injection pipe (31), a support base (32), a cleaning tank (33), and a cleaning rack (34); the first flow guide box (3) is fixed to one end of a plurality of first conduits (16) away from the liquid supply tank (11); the injection pipe (31) is fixed to the top of the middle part of the first flow guide box (3); the support base (32) is fixed to the horizontal part of the equipment frame (1); the cleaning tank (33) is fixed to the top of the support base (32), and the end of the injection pipe (31) away from the first flow guide box (3) is connected to the center interior of the cleaning tank (33); the cleaning rack (34) is slidably connected to the inner wall of the cleaning tank (33), and the cleaning rack (34) is located below the injection pipe (31); A mixing cylinder (4) is fixedly connected to the bottom end of the base plate (14) away from the storage tank (15); a liquid extraction pipe (41) is fixedly connected to the bottom end of the mixing cylinder (4); a second conduit (42) is fixedly connected to the outer wall of the mixing cylinder (4), and the second conduit (42) is connected to a one-way pressure valve; multiple storage tanks (43) are fixedly connected to the upper end face of the equipment frame (1), and the liquid extraction pipe (41) is located inside the storage tank (43); A connecting rod (5) is fixedly connected to the bottom end of the lead screw (23); multiple stirring blades (51) are fixedly connected to the outer wall of the mixing cylinder (4); a filter screen plate (52) is fixedly connected to the inner wall of the mixing cylinder (4), the connecting rod (5) passes through the middle of the filter screen plate (52), and the filter screen plate (52) is located below the stirring blades (51); a scraper (53) is fixedly connected to the outside of the connecting rod (5), and the scraper (53) is attached to the bottom surface of the filter screen plate (52); The bottom end of the liquid extraction tube (41) is fixed with a connector (6); short tubes (61) are fixed on both sides of the connector (6); a long tube (62) is fixed at the bottom end of the connector (6); an agitator (63) is fixed to the outside of the bottom end of the connecting rod (5), and the agitator (63) is located at the bottom of the liquid storage tank (43).

2. The wafer cleaning machine liquid supply device according to claim 1, characterized in that: A third conduit (7) is fixedly connected to one of the solenoid valves; a second flow guide box (71) is fixedly connected to one end of the two third conduits (7) away from the liquid supply tank (11); a thick pipe (72) is fixedly connected to the middle of the second flow guide box (71), and the end of the thick pipe (72) away from the second flow guide box (71) is installed on the first flow guide box (3) through a valve.

3. The wafer cleaning machine liquid supply device according to claim 1, characterized in that: A liquid storage tank (8) is fixedly connected to the upper end face of the equipment frame (1); a water pump (81) is fixedly connected to the liquid storage tank (8); a No. 1 water pipe (82) is fixedly connected to the output end of the water pump (81), and the end of the No. 1 water pipe (82) away from the water pump (81) is fixedly connected to the side of the No. 1 flow guide box (3); a No. 2 water pipe (83) is fixedly connected to the end of the No. 1 flow guide box (3) away from the No. 1 water pipe (82).

4. The wafer cleaning machine liquid supply device according to claim 1, characterized in that: The top of the support base (32) is provided with a collection groove; a filter screen is fixed to the inner wall of the collection groove.

5. The wafer cleaning machine liquid supply device according to claim 4, characterized in that: A control valve (9) is fixed to the outer wall of the support base (32), and the control valve (9) is connected to the collection tank; a recovery pipe (91) is fixed to the end of the control valve (9) away from the support base (32); a one-way valve (92) is installed between the recovery pipe (91) and a liquid storage tank (43).

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