Substrate cleaning apparatus, substrate processing apparatus, substrate cleaning method, and program

By setting a rotatable cleaning member in the substrate cleaning device and changing the cleaning conditions, the problem of insufficient cleaning of substrates in the prior art is solved, and a cleaner and safer substrate processing is achieved.

CN119318002APending Publication Date: 2025-01-14EBARA CORP
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Patent Information

Application Number
CN202380045004.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2022-04-08
Filing Date
2023-04-07
Publication Date
2025-01-14

AI Technical Summary

Technical Problem

In the conventional substrate cleaning method, the surface of the brush is constant with respect to the substrate, resulting in the possibility that the substrate cannot be sufficiently cleaned.

Method used

By providing a cleaning assembly in the substrate cleaning device, the assembly includes a conveying mechanism for conveying the substrate in the first direction, and abutting the cleaning member rotating around a rotation axis extending in the second direction that is not perpendicular to the first direction. The substrate also changes the rotation axis direction, the rotation speed of the cleaning member and the conveying speed of the substrate based on the information of the substrate and the cleaning component.

Benefits of technology

A cleaner substrate cleaning effect is achieved, and more comprehensive cleaning is provided through rubbing and kneading in multiple directions, reducing the risk of damage to the cleaning components and substrates.

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Abstract

The substrate cleaning apparatus includes: a cleaning unit including a conveyance mechanism that conveys a substrate in a first direction, the cleaning unit cleaning the substrate conveyed in the first direction by causing a cleaning member that rotates about a rotation axis that extends in a second direction that is not perpendicular to the first direction to abut against the substrate conveyed in the first direction; and a control device that changes cleaning conditions including at least one of the direction of the rotating shaft, the rotational speed of the cleaning member, and the conveyance speed of the substrate, on the basis of information on at least one of the substrate and the cleaning unit.
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Citation Information

Patent Citations

  • Substrate cleaning method

    JP1994091986B2

  • Substrate cleaning device and method

    JP2009128910A

  • Light sensor

    JP2022064479A