Method for monitoring inclination of exposure area along Y axis
CN119356035APending Publication Date: 2025-01-24SIEN (QINGDAO) INTEGRATED CIRCUITS CO LTD
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Patent Information
- Application Number
- CN202410778626.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-17
- Publication Date
- 2025-01-24
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Figure CN119356035A_ABST
Abstract
According to the method for monitoring the inclination of the exposure area along the Y axis, the inclination of the exposure area along the Y axis can be monitored in real time as required according to the linear relation formula between the inclination angle value along the Y axis and the overlay deviation value, and the inclination angle value along the Y axis can be obtained as long as the overlay deviation value is substituted into the linear relation formula. According to the monitoring method, downtime calibration testing is not needed, high-frequency regular detection can be carried out in real time, the online productivity pressure is effectively relieved, the production efficiency is improved, and the cost is reduced; besides, a mathematical formula established by the Y-axis inclination angle and the overlay deviation value is a linear relation formula, so that the realization of monitoring automation is facilitated, long-time measurement and analysis are not needed, and the labor cost is reduced; and a machine account for monitoring the machine can be established based on a linear relation formula to monitor the long-term condition of the Y-axis inclination angle of the machine, and the method is simple, convenient and easy to implement.
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