A polishing cloth opening device and method

Abstract

The application discloses a polishing cloth opening device and method, and relates to the technical field of polishing machines.The polishing cloth opening device comprises a support base and an adjusting base.The support base is provided with a first cutter body, a cloth pressing body and an expansion body.The support base is installed at the outlet end of a liquid guide hole of a polishing disc.The first cutter body is used for cutting the polishing cloth at the outlet end of the liquid guide hole.The cloth pressing body is used for pressing the cut edge of the polishing cloth into the liquid guide hole and abutting against the inner wall of the outlet end of the liquid guide hole.The adjusting base is installed at the inlet end of the liquid guide hole.The adjusting base is matched with the expansion body so that the expansion body is tightly supported on the inner wall of the liquid guide hole after being matched, and the support base is fixed in the liquid guide hole.The polishing cloth opening device realizes accurate trimming and fixing of the polishing cloth at the position of the liquid guide hole, and effectively avoids the problems of polishing cloth peeling and wafer scratching caused by improper manual trimming.

Description

Technical Field

[0001] This application relates to the field of polishing machine technology, and in particular to a polishing cloth perforation device and method. Background Technology

[0002] Due to its unique physical properties, cadmium zinc telluride (CZN) has become a key substrate material in the manufacture of infrared detectors. During the processing of CZN, polishing cloths are used in double-sided polishing machines to ensure the flatness and smoothness of the material surface.

[0003] In existing technologies, the installation of polishing cloths has defects. Aligning the holes in pre-drilled polishing cloths is difficult; wrinkles appear during application and require re-stretching, which can cause deformation at the holes and affect subsequent use. Drilling holes after the polishing cloth is applied requires manual trimming and chamfering, which carries risks such as damaging the polishing cloth surface, over-trimming, poor adhesive adhesion, and scratching the surface of the cadmium zinc telluride wafer. Summary of the Invention

[0004] The purpose of this application is to provide a polishing cloth perforation device, which enables precise trimming and fixing of the polishing cloth at the liquid guide hole position, effectively avoiding problems such as polishing cloth delamination and wafer scratches caused by improper manual trimming. Another purpose of this application is to provide a polishing cloth perforation method.

[0005] To achieve the above objectives, this application provides a polishing cloth perforation device, comprising:

[0006] The support is provided with a first cutter body, a pressing cloth body and an expansion body. The support is inserted into the outlet end of the liquid guiding hole of the polishing disc. The first cutter body is used to cut the polishing cloth at the outlet end of the liquid guiding hole. The pressing cloth body is used to press the cut edge of the polishing cloth into the liquid guiding hole and abut against the inner wall of the outlet end of the liquid guiding hole.

[0007] An adjusting seat is inserted through the inlet end of the liquid guiding hole. The adjusting seat cooperates with the expansion body to ensure that the expansion body is tightly supported on the inner wall of the liquid guiding hole after cooperation, thereby fixing the support in the liquid guiding hole.

[0008] In some embodiments, the adjusting seat is in sealed contact with the liquid guiding hole to prevent polishing fluid from flowing to the cutting edge of the polishing cloth through the gap between the adjusting seat and the liquid guiding hole.

[0009] In some embodiments, the polishing cloth perforation device further includes:

[0010] The first positioning rod is provided with a positioning structure. The first positioning rod cooperates with the support through the positioning structure to drive the support into the liquid guide hole.

[0011] In some embodiments, the first positioning rod is further provided with a first positioning tip and a second cutting body, wherein the first positioning tip, the second cutting body and the first cutting body cut the polishing cloth in sequence.

[0012] In some embodiments, the polishing cloth perforation device further includes:

[0013] A positioning block is provided at the inlet end of the liquid guiding hole. The positioning block cooperates with the first positioning rod and is used to position the first positioning rod to move along the axial direction of the liquid guiding hole.

[0014] In some embodiments, the polishing cloth perforation device further includes:

[0015] The second positioning rod is provided with a second positioning tip. The second positioning rod cooperates with the positioning block to realize that the second positioning rod is inserted from the inlet end of the liquid guiding hole and moves along the axial direction of the liquid guiding hole to cut the polishing cloth at the outlet end of the liquid guiding hole.

[0016] In some embodiments, the liquid guiding hole includes a first orifice and a second orifice that communicate with each other, the second orifice being located at the outlet end of the liquid guiding hole, and the orifice diameter of the second orifice being larger than the orifice diameter of the first orifice.

[0017] The cut edge of the polishing cloth abuts against the inner wall of the second hole;

[0018] The expansion body is held tightly against the inner wall of the first hole.

[0019] In some embodiments, the expansion body is provided with deformation grooves, which are distributed in the circumferential direction of the support, and the expansion body is provided with threads inside;

[0020] The adjusting seat includes:

[0021] The fixing member gradually expands outward from the outlet end of the liquid guide hole towards the inlet end. The fixing member is threaded on the outside and is threaded with the expansion body. The expansion body is expanded by rotating the fixing member.

[0022] An elastic element is sleeved on the fixed element, and the outer periphery of the elastic element is interference-fitted with the inner wall of the liquid guiding hole.

[0023] This application also provides a method for creating holes in a polishing cloth, applied to the aforementioned polishing cloth hole-creating device, the method comprising:

[0024] Align the support with the outlet end of the liquid guide hole of the polishing disc, and prepare to insert it into the liquid guide hole;

[0025] The polishing cloth at the outlet end of the liquid guiding hole is cut by the first blade of the support, and the cut edge of the polishing cloth is pressed into the liquid guiding hole by the pressing body of the support and abuts against the inner wall of the outlet end of the liquid guiding hole.

[0026] Align the adjusting seat with the inlet end of the liquid guiding hole, and prepare to install the adjusting seat;

[0027] The expansion body of the adjusting seat and the support cooperates, so that the expansion body is stretched tightly against the inner wall of the liquid guiding hole after cooperation, thereby fixing the support in the liquid guiding hole.

[0028] In some embodiments, before the support is prepared to be inserted into the liquid guide hole, the following is also included:

[0029] Attach the polishing cloth to the polishing pad;

[0030] Install the positioning block at the inlet end of the liquid guide hole of the polishing disc;

[0031] Insert the second positioning rod into the positioning block, so that the second positioning rod is inserted from the inlet end of the liquid guiding hole. Insert the second positioning rod and cut the polishing cloth at the outlet end of the liquid guiding hole through the second positioning tip of the second positioning rod.

[0032] Remove the second positioning rod from the inlet end of the liquid guiding hole;

[0033] The bracket is engaged with the first positioning rod;

[0034] Cutting the polishing cloth through the support includes:

[0035] Aligning the first positioning tip with the second positioning tip of the first positioning rod at their cutting positions, insert the first positioning rod and cut the polishing cloth at the outlet end of the liquid guiding hole along the cutting position of the second positioning tip, through the first positioning tip, the second blade of the first positioning rod, and the first blade of the support. Insert the first positioning rod into the positioning block and press the cut edge of the polishing cloth into the liquid guiding hole and abut against the inner wall of the outlet end of the liquid guiding hole through the cloth pressing body of the support. The first positioning rod pushes out of the positioning block.

[0036] Remove the first positioning rod from the inlet end of the liquid guiding hole;

[0037] The expansion body is tightened by the adjusting seat, including:

[0038] The fixing member of the adjusting seat and the expansion body of the support are connected by threads. When the fixing member is rotated, the expansion body expands under the action of the fixing member, so that the expansion body is pressed against the inner wall of the liquid guiding hole, and the support is fixed in the liquid guiding hole. The elastic member of the adjusting seat is interference-fitted with the inner wall of the liquid guiding hole, and the cut edge of the polishing cloth is sealed in the liquid guiding hole.

[0039] Compared to the aforementioned background technology, the polishing cloth perforation device provided in this application mainly includes a support and an adjusting seat. The support is provided with a first cutting body, a pressing body, and an expanding body. The support is inserted into the outlet end of the liquid guiding hole of the polishing disc. The first cutting body is used to cut the polishing cloth at the outlet end of the liquid guiding hole. The pressing body is used to press the cut edge of the polishing cloth into the liquid guiding hole and abut against the inner wall of the outlet end of the liquid guiding hole. The adjusting seat is inserted into the inlet end of the liquid guiding hole. The adjusting seat cooperates with the expanding body to realize that the expanding body is tightened on the inner wall of the liquid guiding hole after cooperation, thereby fixing the support in the liquid guiding hole.

[0040] The polishing cloth perforation device provided in this application effectively solves the problems in the installation and trimming process of polishing cloth in the prior art through its innovative structural design. The device mainly includes a support and an adjusting seat, wherein the support integrates a first cutter body, a cloth pressing body, and an expanding body. The support is inserted from the liquid guide hole outlet end of the polishing disc, and the first cutter body is responsible for precisely cutting the polishing cloth at the liquid guide hole outlet end, avoiding inaccurate cutting and over-trimming that may occur with manual trimming. This precise mechanical cutting ensures the neatness of the polishing cloth edge and reduces the risk of damage to the polishing cloth.

[0041] The pressing body then presses the cut edge of the polishing cloth into the liquid guiding hole and holds it against the inner wall of the outlet end of the liquid guiding hole. This step ensures a tight fit between the polishing cloth and the liquid guiding hole, avoiding damage to the polishing cloth surface or peeling of the adhesive backing due to improper manual operation. This tight fit not only improves the stability of the polishing cloth but also reduces the possibility of the polishing cloth peeling off during the polishing process.

[0042] The adjusting seat is inserted from the inlet end of the liquid guide hole and cooperates with the expansion body. After cooperation, the expansion body is tightened against the inner wall of the liquid guide hole, thereby fixing the support. This fixing method provides mechanical locking, ensuring the positional stability of the support in the liquid guide hole, and further avoiding the risk of wafer scratches caused by the movement or detachment of the polishing cloth.

[0043] Based on the above structural and process descriptions, it can be seen that the polishing cloth perforation device has at least the following beneficial effects: the polishing cloth perforation device enables precise trimming and fixing of the polishing cloth at the liquid guiding hole position, effectively avoiding problems such as polishing cloth delamination and wafer scratches caused by improper manual trimming. Attached Figure Description

[0044] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0045] Figure 1A schematic diagram of the support provided in the embodiments of this application;

[0046] Figure 2 A schematic diagram of the bottom of the support provided in the embodiments of this application;

[0047] Figure 3 A schematic diagram of the adjustment seat provided in an embodiment of this application;

[0048] Figure 4 A cross-sectional view of the adjustment seat provided in an embodiment of this application;

[0049] Figure 5 A schematic diagram of the first positioning rod provided in an embodiment of this application;

[0050] Figure 6 A schematic diagram of a positioning block provided in an embodiment of this application;

[0051] Figure 7 A schematic diagram of the second positioning rod provided in an embodiment of this application;

[0052] Figure 8 A first rendering of the polishing cloth perforation device provided in the embodiments of this application;

[0053] Figure 9 A second rendering of the polishing cloth perforation device provided in the embodiments of this application;

[0054] Figure 10 A third rendering of the polishing cloth perforation device provided in the embodiments of this application;

[0055] Figure 11 The fourth rendering of the polishing cloth perforation device provided in the embodiments of this application;

[0056] Figure 12 The fifth rendering of the polishing cloth perforation device provided in the embodiments of this application.

[0057] in:

[0058] Polishing disc 01, liquid guide hole 02, first hole body 021, second hole body 022, polishing cloth 03

[0059] Support 1, First cutter body 11, Pressing cloth body 12, Expansion body 13, Deformation groove 131, Internal thread 132, Limiting groove 133

[0060] Adjusting seat 2, fixing part 21, external thread 211, positioning groove 212, elastic part 22, wing ring 221

[0061] First positioning rod 3, positioning structure 31, first positioning tip 32, second cutter body 33

[0062] Positioning block 4

[0063] Second positioning rod 5, second positioning tip 51. Detailed Implementation

[0064] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0065] To enable those skilled in the art to better understand the present application, the present application will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0066] Please refer to Figure 1 , Figure 3 , Figure 11 and Figure 12 ,in, Figure 1 This is a schematic diagram of the support provided in an embodiment of this application. Figure 3 This is a schematic diagram of the adjustment seat provided in an embodiment of this application. Figure 11 This is a fourth rendering of the polishing cloth perforation device provided in the embodiments of this application. Figure 12 The fifth rendering of the polishing cloth perforation device provided in the embodiments of this application.

[0067] In a first specific embodiment, the polishing cloth perforation device provided in this application mainly includes a support 1 and an adjustment seat 2.

[0068] like Figure 1 As shown, the support 1 is provided with a first blade body 11, a pressing body 12 and an expansion body 13.

[0069] like Figure 11 As shown, the support 1 is inserted into the outlet end of the liquid guiding hole 02 of the polishing disc 01. The first cutter body 11 is used to cut the polishing cloth 03 at the outlet end of the liquid guiding hole 02. The cloth pressing body 12 is used to press the cut edge of the polishing cloth 03 into the liquid guiding hole 02 and hold it against the inner wall of the outlet end of the liquid guiding hole 02.

[0070] like Figure 12 As shown, the adjusting seat 2 is inserted into the inlet end of the liquid guiding hole 02. The adjusting seat 2 cooperates with the expansion body 13 so that the expansion body 13 is supported on the inner wall of the liquid guiding hole 02 after cooperation, thereby fixing the support 1 in the liquid guiding hole 02.

[0071] The polishing cloth perforation device provided in this application effectively solves the problems in the installation and trimming process of polishing cloth in the prior art through its innovative structural design. The device mainly includes a support 1 and an adjusting seat 2, wherein the support 1 integrates a first cutter body 11, a cloth pressing body 12, and an expansion body 13. The support 1 is inserted from the outlet end of the liquid guiding hole 02 of the polishing disc 01. The first cutter body 11 is responsible for precisely cutting the polishing cloth 03 at the outlet end of the liquid guiding hole 02, avoiding inaccurate cutting and over-trimming that may be caused by manual trimming. This precise mechanical cutting ensures the neatness of the edges of the polishing cloth 03 and reduces the risk of damage to the polishing cloth 03.

[0072] The pressing body 12 then presses the cut edge of the polishing cloth 03 into the liquid guiding hole 02 and holds it against the inner wall of the outlet end of the liquid guiding hole 02. This step ensures a tight fit between the polishing cloth 03 and the liquid guiding hole 02, avoiding surface damage or adhesive peeling of the polishing cloth 03 due to improper manual operation. This tight fit not only improves the stability of the polishing cloth 03 but also reduces the possibility of the polishing cloth 03 peeling off during the polishing process.

[0073] The adjusting seat 2 is inserted from the inlet end of the liquid guiding hole 02 and cooperates with the expansion body 13. After cooperation, the expansion body 13 is tightened on the inner wall of the liquid guiding hole 02, thereby fixing the support 1. This fixing method provides mechanical locking, ensuring the positional stability of the support 1 in the liquid guiding hole 02, and further avoiding the risk of wafer scratches caused by the movement or fall off of the polishing cloth 03.

[0074] Based on the above structural and process descriptions, it can be seen that the polishing cloth opening device has at least the following beneficial effects: the polishing cloth opening device enables precise trimming and fixing of the polishing cloth 03 at the liquid guiding hole 02 position, effectively avoiding the problems of polishing cloth 03 delamination and wafer scratches caused by improper manual trimming.

[0075] It is important to note that once the adjusting seat 2 and the support 1 are fixed in the liquid guiding hole 02, they will form a complete structure with the liquid guiding hole 02, participating in the subsequent guiding and polishing of the polishing fluid. For example, the polishing fluid will first flow into the interior of the adjusting seat 2 from the inlet end of the liquid guiding hole 02, then flow into the interior of the support 1 along the interior of the adjusting seat 2, and finally exit from the outlet end of the liquid guiding hole 02 along the interior of the support 1. When the polishing work is completed and the polishing cloth 03 needs to be removed, the adjusting seat 2 and the support 1 will be removed from the liquid guiding hole 02. For example, first remove the adjusting seat 2 from the support 1 to release the fixed state of the support 1 and the liquid guiding hole 02, then remove the support 1 from the liquid guiding hole 02, completing the removal of the adjusting seat 2 and the support 1 from the liquid guiding hole 02. At this point, the polishing cloth 03 can be removed.

[0076] In some cases, when the adjusting seat 2 is inserted into the inlet end of the liquid guide hole 02 and cooperates with the expansion body 13, the adjusting seat 2 is inserted into the interior of the support 1. The support 1 is deformed in an expansion form by the expansion action of the adjusting seat 2 from the inside out, so that the expansion body 13, which was originally in clearance fit or normal fit with the liquid guide hole 02, changes to interference fit. Thus, after the adjusting seat 2 and the support 1 are cooperated, the support 1 is tightly supported on the inner wall of the liquid guide hole 02, and the support 1 is in a fixed state in the liquid guide hole 02.

[0077] It should be noted that this embodiment does not limit the movement form of the support 1 and the movement form of its first blade 11, including but not limited to movement and rotation; in particular, the support 1 in this embodiment adopts a movement form. When the support 1 is inserted into the liquid guide hole 02, the first blade 11 cuts the polishing cloth 03 with a blade parallel to the movement direction.

[0078] In some cases, when the support 1 is inserted from the outlet end of the liquid guide hole 02 of the polishing disc 01, the support 1 adopts an insertion motion, thereby realizing the cutting of the polishing cloth 03 at the outlet end of the liquid guide hole 02 by the first cutter body 11, and the pressing body 12 pressing the cut edge of the polishing cloth 03 into the liquid guide hole 02. It is particularly important to note that after the cut edge of the polishing cloth 03 is pressed into the liquid guide hole 02, the cut edge of the polishing cloth 03 is always subjected to the force of the outer edge of the pressing body 12, and is held against the inner wall of the outlet end of the liquid guide hole 02.

[0079] During the above process, especially when the cut edge of the polishing cloth 03 changes from pressing in to resisting, the cut edge of the polishing cloth 03 will undergo appropriate stretching deformation, making the thickness of the cut edge of the polishing cloth 03 thinner. This change is more conducive to the pressure body 12 resisting and fixing the cut edge of the polishing cloth 03, while fully avoiding the problem of the adhesive on the back of the polishing cloth 03 being exposed.

[0080] Please continue to refer to this. Figure 12 In some embodiments, the adjusting seat 2 is in sealed contact with the liquid guiding hole 02 to prevent the polishing liquid from flowing to the cutting edge of the polishing cloth 03 through the gap between the adjusting seat 2 and the liquid guiding hole 02.

[0081] In this embodiment, the adjusting seat 2 is designed to achieve a sealed contact with the liquid guiding hole 02. The main purpose of this design is to ensure that the cut edge of the polishing cloth 03 is effectively sealed in the liquid guiding hole 02. Through the sealed fit between the adjusting seat 2 and the liquid guiding hole 02, leakage of polishing fluid inside the liquid guiding hole 02 to the cut edge of the polishing cloth 03 can be prevented, thereby ensuring that the polishing fluid inside the liquid guiding hole 02 can be output to the outlet end of the liquid guiding hole 02 along the flow path inside the support 1.

[0082] This sealing design not only improves the efficiency of the polishing process but also helps reduce the waste of polishing material that may result from polishing fluid leakage. This is especially important when the polishing fluid contains substances that react with the adhesive on the polishing cloth 03, preventing the polishing fluid from flowing down and gradually penetrating to the bottom and contacting the adhesive, which could lead to adhesive failure. Furthermore, the sealed contact helps maintain the stability of the polishing cloth 03 within the fluid guide hole 02, reducing movement or deformation of the polishing cloth 03 caused by polishing fluid flow, thereby improving polishing quality and process reliability. Through this sealing structure, the polishing cloth opening device can more precisely control the polishing process, meeting the requirements of high-precision polishing.

[0083] Please refer to Figure 5 and Figure 10 ,in, Figure 5 This is a schematic diagram of the first positioning rod provided in an embodiment of this application. Figure 10 This is a third rendering of the polishing cloth perforation device provided in the embodiments of this application.

[0084] In some embodiments, the polishing cloth perforation device further includes:

[0085] The first positioning rod 3 is provided with a positioning structure 31. The first positioning rod 3 cooperates with the support 1 through the positioning structure 31 to realize that the first positioning rod 3 drives the support 1 into the liquid guiding hole 02.

[0086] In this embodiment, the polishing cloth opening device is equipped with a first positioning rod 3, which has a positioning structure 31. This design is to ensure that the support 1 can be accurately positioned on the first positioning rod 3. When the first positioning rod 3 is inserted into the liquid guiding hole 02, the support 1 is inserted synchronously with the first positioning rod 3 on the first positioning rod 3.

[0087] Guided and driven by the first positioning rod 3, the support 1 can be smoothly and accurately inserted into the liquid guiding hole 02. This process helps ensure that the installation position of the support 1 is accurate, thereby ensuring that the opening position of the polishing cloth 03 is accurately aligned with the liquid guiding hole 02. This precise positioning and installation is crucial for improving the efficiency and polishing quality of the polishing cloth 03.

[0088] Furthermore, the use of the first positioning rod 3 helps reduce errors that may occur during manual operation, improving the installation efficiency and reliability of the entire polishing cloth perforation device. This structure enables automated or semi-automated installation, further improving production efficiency and reducing labor intensity.

[0089] Please refer to Figure 2 , Figure 2 This is a schematic diagram of the bottom of the support provided in an embodiment of this application.

[0090] In some cases, the support 1 is provided with a limiting groove 133, which cooperates with the positioning structure 31; optionally, the positioning structure 31 adopts a positioning pin, which engages with the first positioning rod 3 and the support 1 through the locking action of the positioning pin in the limiting groove 133. In particular, the limiting groove 133 is located at the bottom of the support 1.

[0091] Alternatively, the engagement with the positioning structure 31 can also be achieved through the deformation groove 131 on the support 1. These two methods are not the only options. Please refer to [further details]. Figure 5 In some embodiments, the first positioning rod 3 is further provided with a first positioning tip 32 and a second cutting body 33, and the first positioning tip 32, the second cutting body 33 and the first cutting body 11 cut the polishing cloth 03 in sequence.

[0092] It should be noted that since the first positioning rod 3 is positioned with the support 1 through the positioning structure 31, the second blade 33 on the first positioning rod 3 is aligned with the first blade 11 on the support 1, thereby ensuring the cutting quality.

[0093] In this embodiment, the design of the first positioning rod 3 further includes a first positioning tip 32 and a second cutter body 33. These two components work together with the first cutter body 11 on the support 1 to achieve precise cutting of the polishing cloth 03. The function of the first positioning tip 32 is to act as a guide point, which first contacts the polishing cloth 03 to ensure precise initiation of the cutting process.

[0094] Subsequently, the second blade 33 continues the cutting process, with the first positioning rod 3 having completed the cutting action first. Finally, the support 1 takes over, and the first blade 11 of the support 1 performs the final cut on the polishing cloth 03. This design allows the polishing cloth 03 to be precisely cut at the outlet end of the liquid guide hole 02, ensuring a neat and clean cutting edge and avoiding unevenness or damage that may be caused by manual trimming.

[0095] The combined use of the first positioning tip 32 and the second cutter body 33 not only improves the cutting accuracy but also enhances the operational safety and efficiency of the entire polishing cloth perforation device. This continuous cutting mechanism ensures the cutting quality of the polishing cloth 03, helps reduce material waste, and improves the uniformity and effectiveness of subsequent polishing processes.

[0096] Please refer to Figure 6 and Figure 9 ,in, Figure 6 This is a schematic diagram of a positioning block provided in an embodiment of this application. Figure 9 This is a second rendering of the polishing cloth perforation device provided in an embodiment of this application.

[0097] In some embodiments, the polishing cloth perforation device further includes:

[0098] Positioning block 4 is located at the inlet end of liquid guide hole 02. Positioning block 4 cooperates with first positioning rod 3. Positioning block 4 is used to position the first positioning rod 3 to move along the axial direction of liquid guide hole 02.

[0099] In this embodiment, a positioning block 4 is added to the polishing cloth perforation device. This positioning block 4 is located at the inlet end of the liquid guiding hole 02 and cooperates with the first positioning rod 3. The main function of the positioning block 4 is to provide precise guidance for the first positioning rod 3, ensuring its stable movement along the axial direction of the liquid guiding hole 02. This guiding effect is crucial for improving the cutting effect of the first positioning tip 32 and the second blade 33 on the first positioning rod 3, as they need to be precisely aligned and cut the polishing cloth 03.

[0100] The positioning block 4 not only guides the first positioning rod 3 but also indirectly affects the positioning of the support 1. Since the support 1 is equipped with the first cutter body 11, the positioning block 4 ensures the precise guidance of the first positioning rod 3, meaning that the support 1 and its first cutter body 11 can more accurately position and cut the polishing cloth 03. This precise guidance and cutting is crucial for ensuring the cutting quality of the polishing cloth 03, as well as the uniformity and effectiveness of the subsequent polishing process.

[0101] Furthermore, the design of the first positioning rod 3 and the positioning block 4 allows them to be disassembled after the support 1 is installed. After the first positioning rod 3 successfully drives the support 1 into the liquid guide hole 02, the positioning block 4 and the first positioning rod 3 can be removed. Subsequently, the adjusting seat 2 can be installed from the inlet end of the liquid guide hole 02 to mate with the support 1, completing the assembly of the polishing cloth perforation device. This design improves the installation flexibility and ease of operation of the device, making the entire installation process of the polishing cloth perforation device more efficient and reliable.

[0102] Please refer to Figure 7 and Figure 8 ,in, Figure 7 This is a schematic diagram of the second positioning rod provided in an embodiment of this application. Figure 8 The first effect of the polishing cloth perforation device provided in the embodiments of this application. (Figure)

[0103] In some embodiments, the polishing cloth perforation device further includes:

[0104] The second positioning rod 5 is provided with a second positioning tip 51. The second positioning rod 5 cooperates with the positioning block 4 to realize that the second positioning rod 5 is inserted from the inlet end of the liquid guiding hole 02 and moves along the axial direction of the liquid guiding hole 02 to cut the polishing cloth 03 at the outlet end of the liquid guiding hole 02.

[0105] In this embodiment, the design of the polishing cloth perforation device includes a second positioning rod 5, which is equipped with a second positioning tip 51. The second positioning rod 5 is used before the first positioning rod 3 and the support 1, which means that the second positioning tip 51 will first contact the polishing cloth 03 and cut a positioning hole in it. The function of this positioning hole is to provide a precise guide point for subsequent operations.

[0106] As the second positioning rod 5 moves axially along the liquid guide hole 02, its tip 51 cuts a positioning hole in the polishing cloth 03. This hole then serves as a guide for the first positioning tip 32 of the first positioning rod 3. This design ensures that when the first positioning rod 3 and the support 1 are introduced and pushed through the liquid guide hole 02, the first positioning tip 32 can accurately pass through the cut positioning hole, thereby guaranteeing the alignment and precise cutting of the entire device.

[0107] The pre-positioning of the second positioning rod 5 improves the accuracy and efficiency of the entire polishing cloth opening process. This staged cutting method reduces unnecessary damage to the polishing cloth 03 while ensuring that the first cutter 11 on the support 1 can make the final cut in the correct position to form the opening of the polishing cloth 03 at the outlet end of the liquid guide hole 02. This precise positioning and cutting mechanism is crucial for ensuring the correct installation of the polishing cloth 03 and the uniformity of the polishing process.

[0108] In some embodiments, the liquid guiding hole 02 includes a first orifice 021 and a second orifice 022 that are in communication with each other. The second orifice 022 is located at the outlet end of the liquid guiding hole 02, and the orifice diameter of the second orifice 022 is larger than the orifice diameter of the first orifice 021.

[0109] The cut edge of the polishing cloth 03 abuts against the inner wall of the second hole 022;

[0110] The expansion body 13 is tightly supported on the inner wall of the first hole 021.

[0111] In this embodiment, the liquid guiding hole 02 is designed to include two connected orifice bodies, namely a first orifice body 021 and a second orifice body 022. This structural design allows the liquid guiding hole 02 to have different orifice diameters, wherein the second orifice body 022 is located at the outlet end of the liquid guiding hole 02, and its orifice diameter is larger than that of the first orifice body 021. This design helps to achieve different functions in different areas.

[0112] The cut edge of the polishing cloth 03 is designed to abut against the inner wall of the second orifice 022. This design allows the polishing cloth 03 to fit tightly against the outlet end of the liquid guiding hole 02, ensuring that the polishing liquid, after being output from the outlet end of the liquid guiding hole 02, can be distributed onto the polishing cloth 03 outside the liquid guiding hole 02. At the same time, this abutting design also helps to maintain the stability of the polishing cloth 03 during the polishing process, reducing the movement of the polishing cloth 03 caused by the flow of polishing liquid or polishing pressure.

[0113] The expansion body 13 is designed to be tightly supported against the inner wall of the first orifice 021. This support helps to fix the position of the support 1 in the liquid guide hole 02, ensuring that the support 1 will not shift or fall off during polishing. The tight fit between the expansion body 13 and the inner wall of the first orifice 021 provides a stable support for the support 1, thereby ensuring the stability and reliability of the entire polishing cloth opening device.

[0114] Through this structural design, the polishing cloth perforation device can achieve precise positioning and fixation of the polishing cloth 03, while ensuring that the polishing liquid in the liquid guiding hole 02 can flow smoothly and be evenly distributed, thereby improving the efficiency and quality of the polishing process. This design considers both the stability of the polishing cloth 03 and the functional requirements of the liquid guiding hole 02, demonstrating the innovation and practicality of this technical solution.

[0115] Please refer to Figure 4 , Figure 4 This is a cross-sectional view of the adjustment seat provided in an embodiment of this application.

[0116] In some embodiments, the expansion body 13 is provided with deformation grooves 131, which are distributed in the circumferential direction of the support 1, and the expansion body 13 is provided with internal threads 132.

[0117] Adjustment seat 2 includes:

[0118] The fixing member 21 gradually expands outward from the outlet end of the liquid guide hole 02 towards the inlet end. The fixing member 21 is provided with an external thread 211. The fixing member 21 is threadedly engaged with the expansion body 13. The expansion body 13 is expanded by rotating the fixing member 21.

[0119] The elastic element 22 is sleeved on the fixed element 21, and the outer periphery of the elastic element 22 is interference-fitted with the inner wall of the liquid guiding hole 02.

[0120] In this embodiment, the expansion body 13 is designed with deformation grooves 131 distributed circumferentially on the support 1. This design allows the expansion body 13 to undergo predetermined deformation when subjected to external forces, thereby adapting to different installation conditions and closely fitting the inner wall of the liquid guiding hole 02. The presence of the deformation grooves 131 improves the flexibility and adaptability of the expansion body 13, ensuring good fixation in liquid guiding holes 02 of different sizes.

[0121] The expander 13 is also provided with internal threads 132, which engage with the external threads 211 on the fixing member 21 in the adjusting seat 2. By rotating the fixing member 21, the expander 13 can be expanded, thereby allowing the expander 13 to be tightly supported on the inner wall of the first hole 021. This threaded engagement provides a simple and effective mechanism to adjust the tension of the expander 13 and ensure that the support 1 is in a stable position in the liquid guide hole 02.

[0122] The adjusting seat 2 includes a fixing member 21 and an elastic member 22. The fixing member 21 is designed to gradually widen at its outer periphery, especially in the direction from the outlet end of the liquid guide hole 02 to the inlet end. This design helps to stably fix the fixing member 21 in the liquid guide hole 02. The fixing member 21 has an external thread 211 on its exterior, which mates with the internal thread 132 of the expansion body 13. The degree of expansion of the expansion body 13 is controlled by rotating the fixing member 21.

[0123] The elastic element 22 is fitted onto the fixed element 21, and its outer periphery forms an interference fit with the inner wall of the liquid guiding hole 02. This fit further improves the stability of the adjusting seat 2 in the liquid guiding hole 02 and ensures a good sealing effect. The material and design of the elastic element 22 enable it to provide the necessary elastic support when the fixed element 21 expands, while also helping to buffer the pressure and impact generated during the polishing process.

[0124] In some cases, the outer edge of the elastic element 22 is provided with a wing ring 221, which protrudes outward. Since the radial dimension of the wing ring 221 is larger than the diameter of the first hole 021 of the liquid guiding hole 02 when the elastic element 22 enters the liquid guiding hole 02 along with the fixing element 21, the wing ring 221 will be deformed by the pressure of the liquid guiding hole 02. This achieves an interference fit between the elastic element 22 and the liquid guiding hole 02, forming a sealed space and preventing the polishing liquid from flowing into the cutting edge of the polishing cloth 03. In particular, the elastic element 22 is made of rubber.

[0125] In some cases, the structural design of the support 1 can be further integrated, such as integrating the deformation groove 131 and the limiting groove 133 into the same structure, or using the deformation groove 131 to achieve the function of the limiting groove 133, which should also fall within the scope of this embodiment.

[0126] In some cases, the adjusting seat 2 is also provided with a positioning groove 212. The limiting groove 133 on the support 1 and the positioning groove 212 on the adjusting seat 2 are used to control the adjusting seat 2 to cooperate with the support 1. Specifically, after the support 1 is inserted into the liquid guiding hole 02 and the first positioning rod 3 and positioning block 4 are removed, the adjusting seat 2 is inserted. A tool is used to wedge into the limiting groove 133 of the support 1 (preferably, the cooperation with the positioning structure 31 is achieved through the deformation groove 131 on the support 1, and the limiting groove 133 is used for tool insertion) to hold the support 1 in place. Then, another tool is used to wedge into the positioning groove 212 of the adjusting seat 2 to control the adjusting seat 2 to rotate relative to the support 1, so that the adjusting seat 2 rotates into the support 1 until the support 1 completes expansion and is fixed in the liquid guiding hole 02.

[0127] In this embodiment, the limiting groove 133 and the positioning groove 212 are structures provided to facilitate the tool's operation of the support 1 and the adjusting seat 2. In addition to this method, there may be other ways to operate the support 1 and the adjusting seat 2, which should also fall within the scope of this embodiment.

[0128] This application also provides a method for creating holes in a polishing cloth, applied to the aforementioned polishing cloth hole-creating device. The method for creating holes in a polishing cloth includes:

[0129] Align the support 1 with the outlet end of the liquid guide hole 02 of the polishing disk 01, and prepare to insert it into the liquid guide hole 02.

[0130] The polishing cloth 03 at the outlet end of the liquid guiding hole 02 is cut by the first cutter body 11 of the support 1, and the cut edge of the polishing cloth 03 is pressed into the liquid guiding hole 02 and held against the inner wall of the outlet end of the liquid guiding hole 02 by the cloth pressing body 12 of the support 1.

[0131] Align the adjusting seat 2 with the inlet end of the liquid guide hole 02, and prepare to install the adjusting seat 2;

[0132] By adjusting the expansion body 13 of the seat 2 and the support 1, the expansion body 13 is tightened on the inner wall of the liquid guide hole 02 after the adjustment, so that the support 1 is fixed in the liquid guide hole 02.

[0133] In this embodiment, the provided polishing cloth perforation method details how to use the aforementioned polishing cloth perforation device to precisely install and secure the polishing cloth. This method ensures the correct positioning and tightness of the polishing cloth, thereby achieving optimal polishing results during the polishing process.

[0134] First, align the support 1 with the outlet end of the liquid guide hole 02 on the polishing disc 01, preparing to insert it into the liquid guide hole 02. This step is crucial because it ensures the correct positioning of the support 1, laying the foundation for subsequent cutting and fixing steps.

[0135] Next, the polishing cloth 03 at the outlet end of the liquid guiding hole 02 is cut by the first cutter body 11 of the support 1. This cutting action needs to be precise to ensure that the edge of the polishing cloth 03 is neat and burr-free. Subsequently, the pressing body 12 of the support 1 presses the cut edge of the polishing cloth 03 into the liquid guiding hole 02 and holds it against the inner wall of the outlet end of the liquid guiding hole 02. This step ensures a tight fit between the polishing cloth 03 and the liquid guiding hole 02, providing stable support for the polishing cloth 03.

[0136] Then, the adjusting seat 2 is aligned with the inlet end of the liquid guiding hole 02, ready to be installed. The installation of the adjusting seat 2 is to further fix the support 1 and ensure that the support 1 is stably positioned in the liquid guiding hole 02.

[0137] Finally, by adjusting the expansion body 13 of the support 1 and the expansion body 2, the expansion body 13 is tightened against the inner wall of the liquid guiding hole 02 after engagement, thereby fixing the support 1 in the liquid guiding hole 02. This step, through mechanical locking, ensures that the support 1 will not shift or fall off during polishing, and also ensures the stability of the polishing cloth 03, avoiding the risk of wafer scratches caused by the movement or fall off of the polishing cloth 03.

[0138] This method of perforating the polishing cloth, through precise steps and the coordination of mechanical structures, achieves accurate installation and fixation of the polishing cloth 03, improving the efficiency and quality of the polishing process while reducing the risk of polishing fluid leakage and wafer damage. The implementation of this method enables the polishing cloth perforation device to perform its function more reliably, meeting the requirements of high-precision polishing.

[0139] In some embodiments, before the support 1 is prepared to insert the liquid guide hole 02, it further includes:

[0140] Attach the polishing cloth 03 to the polishing pad 01;

[0141] Install the positioning block 4 at the inlet end of the liquid guide hole 02 of the polishing disc 01;

[0142] Insert the second positioning rod 5 into the positioning block 4, so that the second positioning rod 5 is installed from the inlet end of the liquid guiding hole 02. Insert the second positioning rod 5 and cut the polishing cloth 03 at the outlet end of the liquid guiding hole 02 through the second positioning tip 51 of the second positioning rod 5.

[0143] Remove the second positioning rod 5 from the inlet end of the liquid guide hole 02;

[0144] The support 1 is engaged with the first positioning rod 3.

[0145] In this embodiment, the method for creating the polishing cloth hole involves several key preparatory steps before the liquid guiding hole 02 is inserted into the support 1. These steps ensure the correct installation and positioning of the polishing cloth 03, laying the foundation for subsequent precise hole creation.

[0146] First, the polishing cloth 03 is attached to the polishing pad 01 to ensure that it remains stably in place during the polishing process. The secure placement of the polishing cloth 03 is crucial for ensuring the uniformity and consistency of the polishing effect.

[0147] Next, the positioning block 4 is installed at the inlet end of the liquid guide hole 02 of the polishing disc 01. The function of the positioning block 4 is to provide stable support and guidance for the subsequent positioning rods (such as the second positioning rod 5 and the first positioning rod 3), ensuring that the positioning rods can move accurately along the axial direction of the liquid guide hole 02.

[0148] Then, the second positioning rod 5 is inserted into the positioning block 4 and installed through the inlet end of the liquid guiding hole 02. The insertion of the second positioning rod 5 allows its two positioning tips 51 to cut the polishing cloth 03 at the outlet end of the liquid guiding hole 02. This step forms a precise positioning hole in the polishing cloth 03, creating conditions for the installation and fixation of the support 1.

[0149] After the cutting is completed, the second positioning rod 5 is removed from the inlet end of the liquid guide hole 02. This is to remove obstacles in the subsequent steps and ensure that the support 1 can be installed smoothly.

[0150] Finally, the support 1 engages with the first positioning rod 3. This step is to use the first positioning rod 3 to guide and drive the support 1 into the liquid guiding hole 02. The positioning structure 31 of the first positioning rod 3 engages with the limiting groove 133 of the support 1 to ensure the precise positioning and stable movement of the support 1 during the installation process.

[0151] These steps, through the perforation method of the polishing cloth, ensure the precise installation and fixation of the polishing cloth 03, providing a solid foundation for achieving efficient and uniform polishing results. The precise execution of these steps is crucial for improving the efficiency and quality of the entire polishing process.

[0152] In some embodiments, cutting the polishing cloth 03 via the support 1 includes:

[0153] Align the first positioning tip 32 of the first positioning rod 3 with the cutting position of the second positioning tip 51, insert the first positioning rod 3, and cut along the cutting position of the second positioning tip 51, i.e. the hole cut out. Cut the polishing cloth 03 at the outlet end of the liquid guiding hole 02 through the first positioning tip 32, the second blade 33 of the first positioning rod 3, and the first blade 11 of the support 1. Insert the first positioning rod 3 into the positioning block 4, and press the cut edge of the polishing cloth 03 into the liquid guiding hole 02 and hold it against the inner wall of the outlet end of the liquid guiding hole 02 through the pressing body 12 of the support 1. The first positioning rod 3 pushes out the positioning block 4.

[0154] Remove the first positioning rod 3 from the inlet end of the liquid guide hole 02.

[0155] In this embodiment, a method for precisely cutting and fixing the polishing cloth 03 is described, which is achieved using the cooperation of the support 1 and the first positioning rod 3. This process begins with aligning the cutting position of the first positioning tip 32 of the first positioning rod 3 with the cutting position of the second positioning tip 51, that is, using the positioning hole to guide the first positioning tip 32, ensuring the precision and consistency of the cut.

[0156] Subsequently, the first positioning rod 3 is inserted, and the first positioning tip 32, the second blade 33 of the first positioning rod 3, and the first blade 11 of the support 1 work together to complete the cutting of the polishing cloth 03. This continuous cutting action ensures that the cutting edge is clean and uniform, avoiding unevenness or damage caused by manual operation.

[0157] The first positioning rod 3 is inserted into the positioning block 4. This step ensures that the first positioning rod 3 moves stably in the liquid guiding hole 02 and accurately guides the support 1. Next, the cut edge of the polishing cloth 03 is pressed into the liquid guiding hole 02 by the pressure body 12 of the support 1, and abuts against the inner wall of the outlet end of the liquid guiding hole 02. This step not only ensures the fixation of the polishing cloth 03, but also helps to prevent polishing fluid leakage and movement of the polishing cloth 03 during the polishing process.

[0158] Finally, the first positioning rod 3 pushes out the positioning block 4, which signifies that the polishing cloth 03 has been successfully fixed at the outlet end of the liquid guiding hole 02. Once the polishing cloth 03 is fixed, the first positioning rod 3 can be removed from the inlet end of the liquid guiding hole 02, completing its task in the process of opening the polishing cloth.

[0159] Through this series of precise operations, the polishing cloth 03 is effectively fixed at the outlet end of the liquid guiding hole 02, ensuring the uniform distribution of the polishing liquid and the smooth progress of the polishing process. This method improves the accuracy and reliability of the polishing cloth 03 installation, reduces potential problems during the polishing process, such as displacement of the polishing cloth 03 or leakage of the polishing liquid, thereby improving the efficiency and quality of the entire polishing process.

[0160] In some embodiments, the expansion body 13 is tightened by the adjusting seat 2, including:

[0161] The fixing part 21 of the adjusting seat 2 and the expansion body 13 of the support 1 are connected by threads. When the fixing part 21 is rotated, the expansion body 13 expands under the action of the fixing part 21, so that the expansion body 13 is tightened on the inner wall of the liquid guiding hole 02, and the support 1 is fixed in the liquid guiding hole 02. The elastic part 22 of the adjusting seat 2 is interference-fitted with the inner wall of the liquid guiding hole 02, and the cutting edge of the polishing cloth 03 is sealed in the liquid guiding hole 02.

[0162] In this embodiment, a method is described for tightening the expansion body 13 by adjusting the seat 2 to ensure that the support 1 is firmly fixed in the liquid guide hole 02 and to achieve the sealing of the cut edge of the polishing cloth 03 in the liquid guide hole 02.

[0163] First, the fixing member 21 of the adjusting seat 2 is threadedly engaged with the expansion body 13 of the support 1. This threaded engagement allows the fixing member 21 to drive the expansion body 13 during rotation, causing it to expand and tighten against the inner wall of the liquid guiding hole 02. This step is crucial because it not only ensures the stability of the support 1 in the liquid guiding hole 02, but also provides a solid support structure for the polishing cloth 03.

[0164] As the fixing member 21 rotates, the expansion body 13 expands under the action of the fixing member 21, thereby tightly fitting the inner wall of the liquid guiding hole 02. This tight contact not only fixes the support 1, but also prevents the leakage of polishing liquid, ensuring the efficiency of the polishing process and the uniform distribution of polishing liquid.

[0165] Furthermore, the elastic element 22 of the adjusting seat 2 is interference-fitted with the inner wall of the liquid guiding hole 02, further enhancing the sealing effect. The material and design of the elastic element 22 enable it to provide the necessary elastic support when the fixing element 21 expands, while also helping to buffer the pressure and impact generated during the polishing process. This interference fit forms a sealed space, preventing polishing fluid from flowing into the cut edge of the polishing cloth 03, ensuring a good seal of the cut edge of the polishing cloth 03 in the liquid guiding hole 02.

[0166] This structure and method effectively seals the cut edges of the polishing cloth 03, preventing leakage of polishing fluid and movement of the polishing cloth 03, thereby improving the quality and reliability of the polishing process. The implementation of this method allows the polishing cloth perforation device to more precisely control the polishing process, meeting the demands of high-precision polishing.

[0167] This application provides a device and method for opening holes in polishing cloth, which aims to solve the problems that occur in the prior art when manually opening holes and trimming polishing cloth.

[0168] In existing cadmium zinc telluride (CZN) processing technologies, the application and perforation of polishing cloths are done manually, which is not only inefficient but also prone to damage to the polishing cloth and adhesive peeling. While pre-perforated polishing cloths can simplify some steps, hole alignment is difficult during use, and wrinkles and deformation can easily occur during application, affecting the adhesion between the polishing cloth and the polishing pad, thus impacting the polishing effect. Furthermore, manually adjusting the liquid guide holes on the polishing cloth can lead to various problems, such as damaging the cloth surface, over-adjustment, poor adhesive adhesion, and leaving foreign matter like loose threads, all of which can cause scratches or damage to the wafer surface.

[0169] In one specific embodiment, the usage process of the polishing cloth perforation device and method is described as follows.

[0170] like Figure 8 As shown, the polishing cloth 03 is attached to the polishing disc 01, corresponding to the lower side of the disc and also the side closest to the outlet end of the liquid guide hole 02, ensuring accurate positioning of the polishing cloth 03 for subsequent operations. Next, the positioning block 4 is installed at the inlet end of the liquid guide hole 02 on the polishing disc 01, ensuring its stable fixation. Then, the second positioning rod 5 is inserted into the positioning block 4, inserted from the inlet end of the liquid guide hole 02, causing the second positioning tip 51 to cut the polishing cloth 03 at the outlet end of the liquid guide hole 02. After cutting, the second positioning rod 5 is removed from the inlet end of the liquid guide hole 02.

[0171] like Figure 9 As shown, the support 1 is engaged with the first positioning rod 3, and the cutting positions of the first positioning tip 32 and the second positioning tip 51 are aligned. The first positioning rod 3 is then inserted to achieve continuous cutting. In this step, the polishing cloth 03 is cut sequentially by the first positioning tip 32, the second blade 33 of the first positioning rod 3, and the first blade 11 of the support 1, while the first positioning rod 3 is inserted into the positioning block 4.

[0172] like Figure 10 As shown, the cut edge of the polishing cloth 03 is pressed into the liquid guiding hole 02 by the pressing body 12 of the support 1 and abuts against the inner wall of the outlet end of the liquid guiding hole 02. The first positioning rod 3 pushes out the positioning block 4, thus fixing the polishing cloth. After the cutting and fixing of the polishing cloth are completed, the first positioning rod 3 is removed from the inlet end of the liquid guiding hole 02.

[0173] like Figure 11 As shown, the adjusting seat 2 is aligned with the inlet end of the liquid guiding hole 02, ready to be installed.

[0174] like Figure 12 As shown, the fixing member 21 of the adjusting seat 2 and the expansion body 13 of the support 1 are engaged by the internal thread 132 and the external thread 211. By rotating the fixing member 21, the expansion body 13 expands under the action of the fixing member 21 and is tightened against the inner wall of the liquid guiding hole 02, thereby fixing the support 1. The elastic member 22 of the adjusting seat 2 is interference-fitted with the inner wall of the liquid guiding hole 02 to ensure that the cut edge of the polishing cloth 03 is sealed in the liquid guiding hole 02, thus completing the entire process of opening the polishing cloth.

[0175] It should be noted that many of the components mentioned in this application are general standard parts or components known to those skilled in the art, and their structure and principle can be learned by those skilled in the art through technical manuals or through conventional experimental methods.

[0176] It should be noted that in this specification, relational terms such as first and second are used only to distinguish one entity from several other entities, and do not necessarily require or imply any such actual relationship or order between these entities.

[0177] The polishing cloth perforation device and method provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the embodiments above are only for the purpose of helping to understand the method and core ideas of this application. It should be noted that those skilled in the art can make several improvements and modifications to this application without departing from the principles of this application, and these improvements and modifications also fall within the protection scope of the claims of this application.

Claims

1. A device for opening holes in a polishing cloth, characterized in that, include: The support is provided with a first cutter body, a pressing cloth body and an expansion body. The support is inserted into the outlet end of the liquid guiding hole of the polishing disc. The first cutter body is used to cut the polishing cloth at the outlet end of the liquid guiding hole. The pressing cloth body is used to press the cut edge of the polishing cloth into the liquid guiding hole and abut against the inner wall of the outlet end of the liquid guiding hole. An adjusting seat is inserted into the inlet end of the liquid guiding hole. The adjusting seat cooperates with the expansion body to make the expansion body tightly supported on the inner wall of the liquid guiding hole after cooperation, thereby fixing the support in the liquid guiding hole. The first positioning rod is provided with a positioning structure. The first positioning rod cooperates with the support through the positioning structure to drive the support into the liquid guide hole. The first positioning rod is also provided with a first positioning tip and a second cutting body. The first positioning tip, the second cutting body and the first cutting body cut the polishing cloth in sequence. A positioning block is provided at the inlet end of the liquid guiding hole. The positioning block cooperates with the first positioning rod. The positioning block is used to position the first positioning rod to move along the axial direction of the liquid guiding hole. The second positioning rod is provided with a second positioning tip. The second positioning rod cooperates with the positioning block to realize that the second positioning rod is inserted from the inlet end of the liquid guiding hole and moves along the axial direction of the liquid guiding hole to cut the polishing cloth at the outlet end of the liquid guiding hole.

2. The polishing cloth perforation device according to claim 1, characterized in that, The adjusting seat is in sealed contact with the liquid guiding hole to prevent the polishing liquid from flowing to the cutting edge of the polishing cloth through the gap between the adjusting seat and the liquid guiding hole.

3. The polishing cloth perforation device according to claim 1, characterized in that, The liquid guiding hole includes a first orifice and a second orifice that are connected. The second orifice is located at the outlet end of the liquid guiding hole, and the diameter of the second orifice is larger than that of the first orifice. The cut edge of the polishing cloth abuts against the inner wall of the second hole; The expansion body is held tightly against the inner wall of the first hole.

4. The polishing cloth perforation device according to claim 1, characterized in that, The expansion body is provided with deformation grooves, which are distributed in the circumferential direction of the support, and the expansion body is provided with threads inside; The adjusting seat includes: The fixing member gradually expands outward from the outlet end of the liquid guide hole towards the inlet end. The fixing member is threaded on the outside and is threaded with the expansion body. The expansion body is expanded by rotating the fixing member. An elastic element is sleeved on the fixed element, and the outer periphery of the elastic element is interference-fitted with the inner wall of the liquid guiding hole.

5. A method for opening holes in a polishing cloth, applied to the polishing cloth opening device as described in any one of claims 1 to 4, characterized in that, The method for creating holes in the polishing cloth includes: Align the support with the outlet end of the liquid guide hole of the polishing disc, and prepare to insert it into the liquid guide hole; The polishing cloth at the outlet end of the liquid guiding hole is cut by the first blade of the support, and the cut edge of the polishing cloth is pressed into the liquid guiding hole by the pressing body of the support and abuts against the inner wall of the outlet end of the liquid guiding hole. Align the adjusting seat with the inlet end of the liquid guiding hole, and prepare to install the adjusting seat; The expansion body of the adjusting seat and the support cooperates, so that the expansion body is stretched tightly against the inner wall of the liquid guiding hole after cooperation, thereby fixing the support in the liquid guiding hole.

6. The method for creating holes in a polishing cloth according to claim 5, characterized in that, Before the support is inserted into the liquid guide hole, it also includes: Attach the polishing cloth to the polishing pad; Install the positioning block at the inlet end of the liquid guide hole of the polishing disc; Insert the second positioning rod into the positioning block, so that the second positioning rod is inserted from the inlet end of the liquid guiding hole. Insert the second positioning rod and cut the polishing cloth at the outlet end of the liquid guiding hole through the second positioning tip of the second positioning rod. Remove the second positioning rod from the inlet end of the liquid guiding hole; The bracket is engaged with the first positioning rod; Cutting the polishing cloth through the support includes: Aligning the first positioning tip with the second positioning tip of the first positioning rod at their cutting positions, insert the first positioning rod and cut the polishing cloth at the outlet end of the liquid guiding hole along the cutting position of the second positioning tip, through the first positioning tip, the second blade of the first positioning rod, and the first blade of the support. Insert the first positioning rod into the positioning block and press the cut edge of the polishing cloth into the liquid guiding hole and abut against the inner wall of the outlet end of the liquid guiding hole through the cloth pressing body of the support. The first positioning rod pushes out of the positioning block. Remove the first positioning rod from the inlet end of the liquid guiding hole; The expansion body is tightened by the adjusting seat, including: The fixing member of the adjusting seat and the expansion body of the support are connected by threads. When the fixing member is rotated, the expansion body expands under the action of the fixing member, so that the expansion body is pressed against the inner wall of the liquid guiding hole, and the support is fixed in the liquid guiding hole. The elastic member of the adjusting seat is interference-fitted with the inner wall of the liquid guiding hole, and the cut edge of the polishing cloth is sealed in the liquid guiding hole.

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