Quartz crucible polishing apparatus
CN119427095BActive Publication Date: 2026-08-28JIANGSU MERICK NEW MATERIAL TECHNOLOGY CO LTD
Patent Information
- Application Number
- CN202411496821.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-25
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2044-10-25
AI Technical Summary
Technical Problem
[0003]现有的石英坩埚打磨设备多个通过调控打磨球头对石英坩埚的内外壁进行直上直下的打磨抛光,但是,由于石英坩埚内部会存在圆面凹槽,现有的打磨设备较难调整打磨角度对石英坩埚的圆面凹槽进行打磨
Benefits of technology
[0007]本申请实施例的石英坩埚打磨设备,能够灵活的调节打磨角度,对石英坩埚内壁凹面进行高效打磨,不仅缩短了打磨周期,同时提高了整体生产效率。
✦ Generated by Eureka AI based on patent content.
Smart Images

Figure CN119427095B_ABST
Abstract
The application discloses a quartz crucible polishing equipment, which comprises a supporting frame, a supporting table, a clamping device, a telescopic device and a polishing device, wherein the supporting table is movably arranged on the supporting frame, and a through hole is arranged in the middle of the supporting table; the clamping device is arranged on the bottom wall of the supporting frame and below the supporting table; the telescopic device is arranged on the top wall of the supporting frame, and the output end of the telescopic device is fixedly connected with the supporting table through a connecting frame; the polishing device comprises a supporting disc, a polishing mechanism, a transmission mechanism and a driving assembly, wherein the supporting disc is rotatably arranged on the supporting table and above the through hole, and a through groove is arranged in the supporting disc; the polishing mechanism is rotatably arranged in the through groove; and the transmission mechanism is fixedly arranged on the supporting table and connected with the polishing mechanism. Therefore, the polishing angle can be flexibly adjusted, the inner wall concave surface of the quartz crucible can be efficiently polished, the polishing period is shortened, and the overall production efficiency is improved.
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Citation Information
Patent Citations
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