A polishing liquid circulation supply system for a mask substrate polishing machine

Abstract

The present application relates to a kind of polishing liquid circulation supply system for mask substrate polishing machine, including support assembly, supply mechanism for supplying polishing liquid is equipped on the support assembly, the supply mechanism includes the barrel for storing polishing liquid, polishing liquid output pipeline assembly, water injection pipeline assembly, drain pipeline assembly, polishing liquid input pipeline assembly.The present application has with polishing liquid self-circulation and pipeline self-dredging function.

Description

Technical Field

[0001] This invention relates to the field of liquid circulation equipment, and in particular to a polishing fluid circulation supply system for a mask substrate polishing machine. Background Technology

[0002] Photomasks control the diffraction and reflection of light in a lithography system, ultimately helping to achieve nanometer-precision pattern transfer and determining the minimum critical size of a chip. A photomask mainly consists of a mask substrate, a light-shielding layer, and a protective mold. The substrate (primarily made of glass, including quartz and soda ash) accounts for up to 90% of the direct raw material cost. The mask substrate is the photosensitive blank plate used to create micro-mask patterns.

[0003] The precision and production quality of the mask substrate are crucial to the production of photomasks. The precision of the mask substrate is primarily improved through polishing using a polishing machine. Polishing the mask substrate is a complex process requiring multiple steps, each using a different polishing slurry. During the polishing machine's standby period, the polishing slurry is prone to agglomeration, clogging the pipes and affecting the polishing precision of the mask substrate. Summary of the Invention

[0004] This application provides a polishing slurry circulation supply system for a mask substrate polishing machine, which has the functions of polishing slurry self-circulation and pipeline self-dredging.

[0005] The polishing slurry circulation supply system for a mask substrate polishing machine provided in this application adopts the following technical solution: A polishing slurry circulation supply system for a mask substrate polishing machine includes a support assembly, the support assembly being provided with a supply mechanism for supplying polishing slurry, the supply mechanism including a tank for storing polishing slurry, a polishing slurry output pipeline assembly, and a water injection pipeline assembly. The polishing slurry output pipeline assembly is connected to the tank and the polishing machine. When the polishing machine is operating, the polishing slurry output pipeline assembly is connected to both the tank and the polishing machine, and outputs the polishing slurry from the tank to the polishing machine. When the polishing machine is in standby mode, the polishing slurry output pipeline assembly is connected to the tank but not to the polishing machine, and the polishing slurry in the circulating tank circulates between the tank and the polishing slurry output pipeline assembly. When the polishing machine is not operating, the polishing slurry output pipeline assembly is not connected to either the tank or the polishing machine. The water injection pipeline assembly is connected to the barrel and the polishing liquid output pipeline assembly. When the polishing machine is operating, the water injection pipeline assembly is connected to the barrel but not to the polishing liquid output pipeline assembly; the barrel water injection pipeline assembly injects deionized water into the barrel. When the polishing machine is in standby mode, the water injection pipeline assembly is not connected to either the barrel or the polishing liquid output pipeline assembly. When the polishing machine is stopped, the water injection pipeline assembly is not connected to the barrel but is connected to the polishing liquid output pipeline assembly; the water injection pipeline assembly injects deionized water into the polishing liquid output pipeline assembly, and the deionized water circulates within the polishing liquid output pipeline assembly.

[0006] By adopting the above technical solution, when the polishing machine is in operation, the water injection pipeline assembly injects deionized water into the tank, thereby controlling the concentration of the polishing fluid. When the polishing machine is in standby mode, the polishing fluid in the tank circulates between the tank and the polishing fluid output pipeline assembly, preventing the polishing fluid from clustering. Simultaneously, the circulation process also clears the pipes within the polishing fluid output pipeline assembly, preventing blockages. When the polishing machine is not in operation, the water injection pipeline assembly injects deionized water into the polishing fluid output pipeline assembly, causing the deionized water to circulate within the assembly and clean the pipe walls.

[0007] Preferably, the polishing slurry output pipeline assembly includes, in sequence, a polishing slurry pumping pipe, a lower ball valve, a short bend, a pump, a reducer, a pumping straight pipe, a polishing slurry pumping tee connector, a rear PFA connector, a pre-filter pipe, a left ball valve, a filter element, a right ball valve, a post-filter pipe, a first gas-liquid valve, an output pipe, a mounting plate, a first flange, and an output interface. The polishing slurry pumping pipe is connected to the inner cavity of the barrel, and the output interface is connected to the polishing machine via an external pipeline. The polishing slurry output pipeline assembly also includes, in sequence, an input short bend, an upper ball valve, an input long bend, a front PFA connector, an input short straight pipe, and an input long straight pipe. The input short bend is connected to the polishing slurry pumping tee connector, and both the polishing slurry pumping pipe and the input long straight pipe extend into the inner cavity of the barrel. In the polishing machine's working or standby state, the polishing slurry pumping pipe is connected to the inner cavity of the barrel; in the polishing machine's non-working state, the polishing slurry pumping pipe is not connected to the inner cavity of the barrel.

[0008] By adopting the above technical solution, in the standby state of the polishing machine, opening the upper ball valve and closing the right ball valve allows the polishing fluid to circulate between the polishing fluid output pipeline assembly and the tank. In the working state of the polishing machine, closing the upper ball valve and opening the right ball valve allows the polishing fluid to be input into the polishing machine through the output interface. In the non-working state of the polishing machine, closing the right ball valve, the upper ball valve, and the connection between the polishing fluid pump outlet pipeline and the tank allows deionized water to be injected into the polishing fluid output pipeline assembly via the water injection pipeline assembly, causing the deionized water to circulate within the polishing fluid output pipeline assembly.

[0009] Preferably, the water injection pipeline assembly includes, in sequence, a water injection output pipe, a short water injection pipe, a PFA connector for the water injection pipeline, a long bend for the water injection pipe, a pressure reducing valve, a short bend for the water injection pipe, a ball valve, a water injection input pipe, and a water injection pipeline connector. The water injection output pipe extends into the inner cavity of the barrel body. The water injection output pipe of the barrel body is provided with an overlapping pipe, which is connected to the polishing liquid pump outlet pipe. In the working state and standby state of the polishing machine, the water injection output pipe is connected to the inner cavity of the barrel body, and the overlapping pipe is not connected to the water injection output pipe and the polishing liquid pump outlet pipe. In the non-working state of the polishing machine, the water injection output pipe is not connected to the inner cavity of the barrel body, and the overlapping pipe is connected to the water injection output pipe and the polishing liquid pump outlet pipe.

[0010] By adopting the above technical solution, it is possible to adjust the concentration of polishing slurry and clean the polishing slurry output pipeline components.

[0011] Preferably, the supply mechanism further includes a polishing liquid input pipeline assembly disposed on the support assembly for supplying polishing liquid, the polishing liquid input pipeline assembly being used to replenish polishing liquid into the tank; the polishing liquid input pipeline assembly includes an input interface, a second flange disposed on the mounting plate, an input pipe, a long bend connecting a ball valve, a second gas-liquid valve, a short bend, a second PFA connector, a short straight pipe, and a long straight pipe connected in sequence, the long straight pipe being connected to the inner cavity of the tank.

[0012] By adopting the above technical solution, the automatic addition of polishing fluid can be achieved.

[0013] Preferably, the supply mechanism further includes a drainage pipeline assembly, which includes a top drainage inlet pipe, an upper PFA connector, a long bend for drainage, a drainage pipeline tee connector, a straight drainage pipe, and a drainage pipeline connector connected in sequence. The top drainage inlet pipe communicates with the inner cavity of the tank body, and the connection port of the top drainage inlet pipe to the tank body is located at the top of the tank body. The drainage pipeline assembly also includes a third gas-liquid valve connected to the drainage pipeline tee connector, a short bend for drainage connected to the third gas-liquid valve, a lower PFA connector connected to the short bend for drainage, and a bottom drainage inlet pipe connected to the lower PFA connector. The bottom drainage inlet pipe communicates with the inner cavity of the tank body, and the connection port of the bottom drainage inlet pipe to the tank body is located at the bottom of the tank body.

[0014] By adopting the above technical solution, when the polishing liquid in the tank is too full, it can be discharged from the tank through the top drain inlet pipe, preventing the polishing liquid from overflowing. Normally, the polishing liquid in the tank can be added through the bottom drain.

[0015] Preferably, the barrel body is provided with a stirring shaft flange, a stirring shaft, and a motor, and the stirring shaft is connected to the motor through the stirring shaft flange.

[0016] By adopting the above technical solution, the polishing fluid in the tank can be stirred and monitored, preventing polishing fluid agglomeration.

[0017] Preferably, the support assembly includes a mounting frame made of several aluminum profiles and casters.

[0018] By adopting the above technical solution, the displacement of the polishing fluid circulation supply system is facilitated.

[0019] Preferably, the support component is provided with two sets of supply mechanisms, which are symmetrically distributed on the support component.

[0020] The main technical effects of this invention are reflected in the following aspects: 1. This invention enables the polishing fluid to circulate itself, preventing polishing fluid agglomeration; 2. This invention cleans the pipes and prevents polishing fluid from clustering by injecting deionized water into the tank when the machine is in hibernation. 3. This invention can stir and monitor the polishing liquid inside the barrel, preventing polishing liquid from clustering. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the polishing slurry circulation supply system.

[0022] Figure 2 This is a structural diagram of the supply organization.

[0023] Figure 3This is a schematic diagram of the structure after the side walls of the barrel have been removed from the supply unit.

[0024] Figure 4 yes Figure 3 A schematic diagram of the structure of the middle barrel and the polishing fluid output pipeline assembly.

[0025] Figure 5 yes Figure 3 A schematic diagram of the structure of the middle barrel and the polishing fluid inlet pipeline assembly.

[0026] Figure 6 yes Figure 3 Schematic diagram of the structure of the middle barrel, polishing fluid output pipeline assembly, and water injection pipeline assembly.

[0027] Figure 7 yes Figure 6 A schematic diagram of the structure of the middle tank and the water injection pipeline assembly.

[0028] Attached reference numerals: 1. Electrical control cabinet; 2. Supply assembly; 4. Support assembly; 4-1. Mounting bracket; 4-2. Corner joint; 4-3. Casters; 6-1. Tank body; 6-2. Agitator shaft flange; 6-3. Agitator shaft; 6-4. Motor; 7. Water injection pipeline assembly; 7-1. Water injection outlet pipe; 7-2. Short water injection pipe; 7-3. PFA connector for water injection pipeline; 7-4. Long bend for water injection; 7-5. Pressure reducing valve; 7-6. Short bend for water injection; 7-7. Ball valve 7-8. Water inlet pipe; 7-9. Water inlet pipe connector; 8. Drainage pipe assembly; 8-1. Top drain inlet pipe; 8-2. Upper PFA connector; 8-3. Long bend for drainage; 8-4. Drainage pipe tee connector; 8-5. Third gas / chemical valve; 8-6. Short bend for drainage; 8-7. Lower PFA connector; 8-8. Bottom drain inlet pipe; 8-9. Straight pipe for drainage; 8-10. Drainage pipe connector; 9. Polishing fluid outlet pipe assembly; 9-1 Polishing fluid pump outlet pipe; 9-2 Lower ball valve; 9-3 Short bend pipe; 9-4 Pump; 9-5 Reducer; 9-6 Pump outlet straight pipe; 9-7 Polishing fluid pump outlet tee connector; 9-8 Rear PFA connector; 9-9 Pre-filter pipe; 9-10 Left ball valve; 9-11 Filter element; 9-12 Right ball valve; 9-13 Post-filter pipe; 9-14 First gas-chemical valve; 9-15 Output pipe; 9-16 Output interface; 9-17. 9-18. Input short bend; 9-19. Upper ball valve; 9-20. Input long bend; 9-21. Front PFA connector; 9-22. Input short straight pipe; 9-23. Input long straight pipe; 10. Polishing fluid input pipeline assembly; 10-1. Input interface; 10-2. Input pipe; 10-3. Ball valve; 10-4. Long bend; 10-5. Second gas / liquid valve; 10-6. Short bend; 10-7. PFA connector; 10-8. Short straight pipe; 10-9. Long straight pipe. Detailed Implementation

[0029] The present invention will be further described in detail below with reference to the accompanying drawings, so that the technical solution of this application can be more easily understood and mastered.

[0030] Reference Figure 1 and Figure 2 This embodiment provides a polishing slurry circulation supply system for a mask substrate polishing machine, including a support assembly 4. The support assembly 4 includes a mounting frame 4-1 made of several aluminum profiles and casters 4-3 mounted on the bottom of the mounting frame 4-1. The aluminum profiles constituting the mounting frame 4-1 are connected by corner joints 4-2, and the casters 4-3 are mounted on the bottom of the mounting frame 4-1.

[0031] Reference Figure 2 and Figure 3 Two sets of supply mechanisms 2 for supplying polishing fluid are installed on the mounting frame 4-1, and the two sets of supply mechanisms 2 are symmetrically distributed on the support assembly 4. The supply mechanism 2 includes a tank 6-1 for storing polishing fluid, which is mounted on the mounting frame 4-1. The tank 6-1 is equipped with a stirring shaft flange 6-2, a stirring shaft 6-3, and a motor 6-4. The stirring shaft 6-3 is connected to the motor 6-6 via the stirring shaft flange 6-2; the motor 6-6 drives the stirring shaft 6-5 to rotate, thereby stirring the polishing fluid in the tank and preventing the polishing fluid from agglomerating.

[0032] Reference Figures 2-4 The supply mechanism 2 also includes a polishing fluid output pipeline assembly 9 mounted on the mounting bracket 4-1, comprising a polishing fluid pump outlet pipe 9-1, a lower ball valve 9-2, a short bend pipe 9-3, a pump 9-4, a reducer 9-5, a pump outlet straight pipe 9-6, a polishing fluid pump outlet tee connector 9-7, a rear PFA connector 9-8, a pre-filter pipe 9-9, a left ball valve 9-10, a filter element 9-11, a right ball valve 9-12, a post-filter pipe 9-13, a first gas-liquid valve 9-14, an output pipe 9-15, and an output interface 9-16. The polishing fluid pump outlet pipe 9-1 extends into the tank 6-1.

[0033] Reference Figures 2-4The polishing fluid pump outlet pipe 9-1, at the end furthest from the tank 6-1, is connected to one end of a short bend pipe 9-3 via a lower ball valve 9-2. The other end of the short bend pipe 9-3 is connected to the inlet of pump 9-4. The outlet of pump 9-4 is connected to one end of a straight pump outlet pipe 9-6 via a reducer 9-5. The other end of the straight pump outlet pipe 9-6 is connected to the first port of a polishing fluid pump outlet tee connector 9-7. The second port of the polishing fluid pump outlet tee connector 9-7 is connected to one end of a pre-filter pipe 9-9 via a rear PFA connector 9-8. The other end of the pre-filter pipe 9-9 is sequentially connected to a left ball valve 9-10, a filter element 9-11, and a right ball valve 9-12. The right ball valve 9-12 is connected to one end of a post-filter pipe 9-13. The other end of the post-filter pipe 9-13 is connected to the first gas-liquid valve 9-14. The first gas-liquid valve 9-14 is connected downward to the output pipe 9-15. The output pipe 9-15 is connected to the output interface 9-17 through the first flange 9-16. The output interface 9-17 is connected to the polishing machine through an external pipeline.

[0034] Reference Figures 2-4 The polishing fluid output pipeline assembly 9 also includes an input short bend 9-17, an upper ball valve 9-18, an input long bend 9-19, a front PFA connector 9-20, an input short straight pipe 9-21, and an input long straight pipe 9-22. The input short bend 9-17 is connected to the polishing fluid pump outlet tee connector 9-7, and the input long straight pipe 9-22 extends into the inner cavity of the barrel 6-1 and connects to the inner cavity of the barrel 6-1.

[0035] Reference Figures 2-4 The polishing fluid pump outlet tee connector 9-7 is connected to one end of the input short bend pipe 9-18. One end of the input short bend pipe 9-18 is connected to one end of the input long bend pipe 9-20 through the upper ball valve 9-19. The other end of the input long bend pipe 9-20 is connected to one end of the input short straight pipe 9-22 through the front PFA connector 9-21. The input short straight pipe 9-22 is installed on the barrel 6-1 and connected to the input long straight pipe 9-23. The input long straight pipe 9-23 extends into the inside of the barrel 6-1 and connects to the inner cavity of the barrel 6-1.

[0036] Reference Figures 2-4 A valve is installed inside the polishing liquid pump outlet pipe 9-1. When the polishing machine is in working or standby mode, the valve inside the polishing liquid pump outlet pipe 9-1 is in the open state, and the polishing liquid pump outlet pipe 9-1 is connected to the inner cavity of the barrel. When the polishing machine is not in working mode, the valve inside the polishing liquid pump outlet pipe 9-1 is in the closed state, and the polishing liquid pump outlet pipe 9-1 is not connected to the inner cavity of the barrel.

[0037] Reference Figures 2-4When the polishing machine is in operation, close the upper ball valve 9-19 and open the right ball valve 9-12. At this time, the polishing fluid cannot enter the pipe after the upper ball valve 9-19; it will only be delivered to the polishing machine through the output port 9-17. When the polishing machine is in standby mode, open the upper ball valve 9-19 and close the right ball valve 9-12. The polishing fluid, after passing through the polishing fluid pump outlet tee connector 9-7, will enter the input short bend pipe 9-18, and then sequentially pass through the upper ball valve 9-19, the input long bend pipe 9-20, the front PFA connector 9-21, the input short straight pipe 9-22, and the input long straight pipe 9-23, entering the tank 6-1. Then, from inside the tank 6-1, it is pumped by pump 9-4 into the polishing fluid pump outlet pipe 9-1, repeating the same path. The polishing liquid inside the barrel 6-1 will continuously circulate between the barrel 6-1 and the polishing liquid output pipeline assembly 9. The continuous movement of the polishing liquid will prevent the polishing liquid from clustering and ensure that the polishing liquid will not block the polishing liquid output pipeline assembly 9.

[0038] Reference Figure 2 and Figure 5 The supply mechanism 2 also includes a polishing liquid input pipeline assembly 10 mounted on the mounting frame 4-1. The polishing liquid input pipeline assembly 10 is used to replenish polishing liquid into the barrel 6-1. The polishing liquid input pipeline assembly 10 includes an input interface 10-1, an input pipe 10-2, a connecting ball valve 10-3, a long bend 10-4, a second gas liquid valve 10-5, a short bend 10-6, a second PFA connector 10-7, a short straight pipe 10-8, and a long straight pipe 10-9. The long straight pipe 10-9 is connected to the inner cavity of the barrel 6-1.

[0039] Reference Figure 2 and Figure 5 The input interface 10-1 is connected to one end of the input pipe 10-2 via the second flange 10-2. The other end of the input pipe 10-2 is connected to one end of the long bend 10-4 via the ball valve 10-3. The other end of the long bend 10-4 is connected to the second gas-liquid valve 10-5, which is also connected to the short bend 10-6. The other end of the short bend 10-6 is connected in sequence to the second PFA connector 10-7 and the short straight pipe 10-8. The short straight pipe 10-8 is installed on the barrel lid (6-3) and connected to the long straight pipe 10-9. The long straight pipe 10-9 is located inside the barrel body 6-1 and communicates with the inner cavity of the barrel body.

[0040] Reference Figure 1 , Figure 2 and Figure 5The top of the mounting bracket 4-1 is also equipped with an electrical control cabinet 1 for controlling the polishing slurry input pipeline assembly 10. When the polishing slurry in the tank 6-1 is insufficient, the polishing slurry input function of the polishing slurry input pipeline assembly 10 can be activated through the electrical control cabinet 1. This function allows the prepared polishing slurry to enter the polishing slurry input pipeline assembly 10 through the input interface 10-1 via an external pipeline. The polishing slurry passes sequentially through flange 10-2, input pipe 10-2, ball valve 10-3, long bend pipe 10-4, second gas-liquid valve 10-5, short bend pipe 10-6, second PFA connector 10-7, short straight pipe 10-8, and long straight pipe 10-9, finally entering the tank 6-1 to replenish the polishing slurry.

[0041] Reference Figure 2 , Figure 6 and Figure 7 The supply mechanism 2 also includes a water injection pipeline assembly 7 located on the mounting bracket 4-1. The water injection function of the water injection pipeline assembly 7 is controlled by the electrical control cabinet 1. The water injection pipeline assembly 7 includes a water injection output pipe 7-1, a short water injection pipe 7-2, a water injection pipeline PFA connector 7-3, a long water injection bend 7-4, a pressure reducing valve 7-5, a short water injection bend 7-6, a ball valve 7-7, a water injection input pipe 7-8, and a water injection pipeline connector 7-9. The water injection output pipe 7-1 extends into the inner cavity of the tank body 6-1.

[0042] Reference Figure 2 , Figure 6 and Figure 7 A valve is also installed inside the water supply outlet pipe 7-1. When the polishing machine is in working or standby mode, the valve inside the water supply outlet pipe 7-1 is in the open state, and the water supply outlet pipe 7-1 is connected to the inner cavity of the barrel 6-1. When the polishing machine is not in working mode, the valve inside the water supply outlet pipe 7-1 is in the closed state, and the water supply outlet pipe 7-1 is not connected to the inner cavity of the barrel 6-1.

[0043] Reference Figure 2 , Figure 6 and Figure 7 The water outlet pipe 7-1 is equipped with an overlapping pipe 7-10, which connects to the polishing liquid pump outlet pipe 9-1. A valve is also installed inside the overlapping pipe 7-10. When the polishing machine is in working or standby mode, the valve in the overlapping pipe 7-10 is closed, and the overlapping pipe 7-10 is not connected to the water outlet pipe 7-1 and the polishing liquid pump outlet pipe 9-1. When the polishing machine is not in working mode, the valve in the overlapping pipe 7-10 is open, and the overlapping pipe 7-10 connects the water outlet pipe 7-1 and the polishing liquid pump outlet pipe 9-1.

[0044] Reference Figure 2 , Figure 6 and Figure 7When the polishing machine is in operation, the water injection function of the water injection pipeline assembly 7 is activated through the electrical control cabinet 1, allowing deionized water to enter the water injection pipeline assembly 7 through the water injection pipeline connector 7-9. Then, the water flows through the water injection inlet pipe 7-8, ball valve 7-7, short bend pipe 7-6, pressure reducing valve 7-5, long bend pipe for water injection 7-4, PFA connector for water injection pipeline 7-3, short pipe for water injection 7-2, and water injection outlet pipe 7-1, finally reaching the inside of the tank 6-1, where it mixes with the polishing liquid to achieve concentration control of the polishing liquid.

[0045] Reference Figure 2 , Figure 6 and Figure 7 When the polishing machine is not in operation, the water injection function of the water injection pipeline assembly 7 is turned on by electronic control, so that deionized water enters the polishing liquid output pipeline assembly 9 through the water injection output pipe 7-1 and the connecting pipe 7-10, so that the deionized water circulates in the polishing liquid output pipeline assembly 9 and cleans the pipe wall of the polishing liquid output pipeline assembly 9.

[0046] Reference Figure 2 , Figure 3 and Figure 5 The supply mechanism 2 also includes a drainage pipe assembly 8 mounted on the mounting bracket 4-1, and the electrical control cabinet 1 can control the drainage pipe assembly 8. The drainage pipe assembly 8 includes a top drainage inlet pipe 8-1, an upper PFA connector 8-2, a long bend for drainage 8-3, a drainage pipe tee connector 8-4, a straight drainage pipe 8-9, and a drainage pipe connector 8-10 connected in sequence. The top drainage inlet pipe 8-1 communicates with the inner cavity of the tank body 6-1, and the connection port between the top drainage inlet pipe 8-1 and the tank body 6-1 is located at the top of the tank body 6-1.

[0047] Reference Figure 2 , Figure 3 and Figure 5 If there is too much liquid in the tank 6-1, in order to prevent overflow, the liquid in the tank 6-1 can be discharged out of the system through the top water inlet pipe 8-1, the upper PFA connector 8-2, the long bend for drainage 8-3, the tee connector for drainage pipe 8-4, the straight pipe for drainage 8-9 and the drain pipe connector 8-10.

[0048] Reference Figure 2 , Figure 3 and Figure 5 The drainage pipeline assembly 8 also includes a third gas liquid valve 8-5 connected to the drainage pipeline tee connector 8-4, a short drain bend 8-6 connected to the third gas liquid valve 8-5, a lower PFA connector 8-7 connected to the short drain bend 8-6, and a bottom drain inlet pipe 8-8 connected to the lower PFA connector 8-7. The bottom drain inlet pipe 8-8 is connected to the inner cavity of the tank body 6-1, and the connection port between the bottom drain inlet pipe 8-8 and the tank body 6-1 is located at the bottom of the tank body 6-1.

[0049] Reference Figure 2 , Figure 3 and Figure 5 When it is necessary to replace the polishing fluid or clean the tank 6-1, the drainage function of the drainage pipe assembly 8 can be activated through the electrical control cabinet 1. After activation, the polishing fluid in the tank 6-1 will enter the drainage pipe tee connector 8-4 through the bottom drain inlet pipe 8-8, PFA connector 8-7, short bend pipe 8-6, and third gas liquid valve 8-5, and then be discharged to the outside of the system through the straight drain pipe 8-9 and drainage pipe connector (8-10).

[0050] Of course, the above are just typical examples of this application. In addition, this application may have many other specific implementation methods. All technical solutions formed by equivalent substitution or equivalent transformation fall within the scope of protection claimed in this application.

Claims

1. A polishing slurry circulation supply system for a mask substrate polishing machine, comprising a support assembly (4), characterized in that: The support assembly (4) is provided with a supply mechanism (2) for supplying polishing liquid. The supply mechanism (2) includes a tank (6-1) for storing polishing liquid, a polishing liquid output pipeline assembly (9), and a water injection pipeline assembly (7). The polishing liquid output pipeline assembly (9) is connected to the tank (6-1) and the polishing machine. When the polishing machine is working, the polishing liquid output pipeline assembly (9) is connected to both the tank (6-1) and the polishing machine, and the polishing liquid output pipeline assembly (9) outputs the polishing liquid in the tank to the polishing machine. When the polishing machine is in standby mode, the polishing liquid output pipeline assembly (9) is connected to the tank (6-1) but not connected to the polishing machine, and the polishing liquid in the circulating tank (6-1) circulates between the tank (6-1) and the polishing liquid output pipeline assembly (9). When the polishing machine is not working, the polishing liquid output pipeline assembly (9) is not connected to either the tank (6-1) or the polishing machine. The water injection pipeline assembly (7) is connected to the barrel (6-1) and the polishing liquid output pipeline assembly (9). When the polishing machine is working, the water injection pipeline assembly (7) is connected to the barrel (6-1) and not connected to the polishing liquid output pipeline assembly (9). The barrel water injection pipeline assembly (7) injects deionized water into the barrel (6-1). When the polishing machine is in standby mode, the water injection pipeline assembly (7) is not connected to the barrel (6-1) and the polishing liquid output pipeline assembly (9). When the polishing machine is stopped, the water injection pipeline assembly (7) is not connected to the barrel (6-1) and is connected to the polishing liquid output pipeline assembly (9). The water injection pipeline assembly (7) injects deionized water into the polishing liquid output pipeline assembly (9), and the deionized water circulates in the polishing liquid output pipeline assembly (9). The polishing fluid output pipeline assembly (9) includes, in sequence, a polishing fluid pump outlet pipe (9-1), a lower ball valve (9-2), a short bend pipe (9-3), a pump (9-4), a reducer (9-5), a pump outlet straight pipe (9-6), a polishing fluid pump outlet tee connector (9-7), a rear PFA connector (9-8), a pre-filter pipe (9-9), a left ball valve (9-10), a filter element (9-11), a right ball valve (9-12), a post-filter pipe (9-13), a first gas-liquid valve (9-14), an output pipe (9-15), and an output interface (9-16). The polishing fluid pump outlet pipe (9-1) is connected to the inner cavity of the barrel (6-1), and the output interface (9-16) is connected to the polishing machine through an external pipeline. The polishing fluid output pipeline assembly (9) further includes an input short bend (9-17), an upper ball valve (9-18), an input long bend (9-19), a front PFA connector (9-20), an input short straight pipe (9-21), and an input long straight pipe (9-22) connected in sequence. The input short bend (9-17) is connected to the polishing fluid pump outlet tee connector (9-7). The polishing fluid pump outlet pipe (9-1) and the input long straight pipe (9-22) both extend into the inner cavity of the barrel (6-1). In the working state or standby state of the polishing machine, the polishing fluid pump outlet pipe (9-1) is connected to the inner cavity of the barrel (6-1). In the non-working state of the polishing machine, the polishing fluid pump outlet pipe (9-1) is not connected to the inner cavity of the barrel (6-1).

2. The polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The water injection pipeline assembly (7) includes, in sequence, a water injection outlet pipe (7-1), a short water injection pipe (7-2), a water injection pipeline PFA connector (7-3), a long water injection bend (7-4), a pressure reducing valve (7-5), a short water injection bend (7-6), a ball valve (7-7), a water injection inlet pipe (7-8), and a water injection pipeline connector (7-9). The water injection outlet pipe (7-1) extends into the inner cavity of the tank body (6-1). The water injection outlet pipe (7-1) of the tank body is provided with an overlapping pipe (7-10). (7-10) is connected to the polishing liquid pump outlet pipe (9-1); in the working state and standby state of the polishing machine, the water injection outlet pipe (7-1) is connected to the inner cavity of the barrel (6-1), and the overlapping pipe (7-10) is not connected to the water injection outlet pipe (7-1) and the polishing liquid pump outlet pipe (9-1); in the non-working state of the polishing machine, the water injection outlet pipe (7-1) is not connected to the inner cavity of the barrel (6-1), and the overlapping pipe (7-10) is connected to the water injection outlet pipe (7-1) and the polishing liquid pump outlet pipe (9-1).

3. The polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The supply mechanism (2) further includes a polishing liquid input pipeline assembly (10) provided on the support assembly (4) for supplying polishing liquid. The polishing liquid input pipeline assembly (10) is used to replenish polishing liquid into the barrel (6-1). The polishing liquid input pipeline assembly (10) includes an input interface (10-1), an input pipe (10-2), a connecting ball valve (10-3), a long bend (10-4), a second gas liquid valve (10-5), a short bend (10-6), a second PFA connector (10-7), a short straight pipe (10-8), and a long straight pipe (10-9) connected in sequence. The long straight pipe (10-9) is connected to the inner cavity of the barrel (6-1).

4. The polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The supply mechanism (2) further includes a drainage pipe assembly (8), which includes a top drainage inlet pipe (8-1), an upper PFA connector (8-2), a long bend for drainage (8-3), a tee for drainage (8-4), a straight pipe for drainage (8-9), and a drainage pipe connector (8-10) connected in sequence. The top drainage inlet pipe (8-1) is connected to the inner cavity of the barrel (6-1), and the connection port between the top drainage inlet pipe (8-1) and the barrel (6-1) is located at the top of the barrel (6-1). 8) It also includes a third gas liquid valve (8-5) connected to the drain pipe tee joint (8-4), a short drain bend (8-6) connected to the third gas liquid valve (8-5), a lower PFA joint (8-7) connected to the short drain bend (8-6), and a bottom drain inlet pipe (8-8) connected to the lower PFA joint (8-7). The bottom drain inlet pipe (8-8) is connected to the inner cavity of the barrel (6-1), and the connection port of the bottom drain inlet pipe (8-8) to the barrel (6-1) is located at the bottom of the barrel (6-1).

5. A polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The barrel body (6-1) is provided with a stirring shaft flange (6-2), a stirring shaft (6-3), and a motor (6-4). The stirring shaft (6-3) is connected to the motor (6-4) through the stirring shaft flange (6-2).

6. A polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The support assembly (4) includes a mounting bracket (4-1) made of several aluminum profiles and casters (4-2).

7. A polishing slurry circulation supply system for a mask substrate polishing machine according to claim 1, characterized in that: The support component (4) is provided with two sets of supply mechanisms (2), which are symmetrically distributed on the support component (4).

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