Regulation and control method of hafnium-based thin film crystal structure
CN119571280AActive Publication Date: 2025-03-07SHANGHAI JIAOTONG UNIV +1
Patent Information
- Application Number
- CN202411677025.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-22
- Publication Date
- 2025-03-07
- Estimated Expiration
- 2044-11-22
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Figure CN119571280A_ABST
Abstract
The invention provides a regulation and control method of a hafnium-based thin film crystal structure. The regulation and control method comprises the following steps: providing a substrate; preparing a hafnium-based thin film on the substrate, and changing the strain of the hafnium-based thin film by controlling the preparation parameters of the hafnium-based thin film; and carrying out thermal annealing on the film structure, and regulating and controlling the crystal structure of the hafnium-based film by controlling the annealing temperature based on the temperature-strain phase diagram of the hafnium-based film. According to the method, different strains are introduced into the film by regulating and controlling parameters in the hafnium-based film preparation process, so that the purpose of effectively and finely regulating the crystal structure of the hafnium-based film is achieved by cooperatively controlling the temperature in the annealing process and the strain of the hafnium-based film, the material performance can be optimized, and the quality of the hafnium-based film is improved. Compared with traditional single temperature or thin film parameter control, the regulation and control method is more accurate and effective.
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Citation Information
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