Radio frequency probe test contact resistance analysis method and device and computer equipment

CN119578316APending Publication Date: 2025-03-07SHANGHAI CANAANTEK CO LTD +3
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Patent Information

Application Number
CN202411626702.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-14
Publication Date
2025-03-07

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Abstract

The invention relates to a radio frequency probe test contact resistance analysis method and device and computer equipment. The method comprises the steps that scattering parameters obtained through analysis of a straight-through structure equivalent circuit model and measurement under different metal interconnection line lengths are obtained; the straight-through structure equivalent circuit model is obtained by modeling according to a straight-through structure; performing parameter analysis according to the scattering parameters, and determining an admittance matrix of the n-shaped equivalent circuit; performing conversion analysis according to the admittance matrix of the n-shaped equivalent circuit, and determining reference data corresponding to the T-shaped equivalent circuit under different metal interconnection line lengths; and curve fitting is performed based on reference data corresponding to the T-shaped equivalent circuit under different metal interconnection line lengths, and the contact resistance is determined according to the fitted curve so as to be used for radio frequency filter design modeling, so that the probe contact resistance can be accurately acquired.
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