Preparation method of copper-diamond / copper composite material
Patent Information
- Application Number
- CN202411521049.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-29
- Publication Date
- 2025-03-14
- Estimated Expiration
- 2044-10-29
AI Technical Summary
The processing of traditional diamond/copper materials is difficult, resulting in the destruction of diamond particles at the processing boundary. The electroplating process is severely polluted, poor uniformity and stability, making it difficult to meet the needs of industrialization.
The hot-pressed semi-cladding process is used to closely combine the copper layer with diamond/copper material through interatomic diffusion, control the thickness of the copper layer, and electroplating is carried out through the near-forming process to reduce the cost of material preparation.
The firm combination of the copper layer and diamond/copper material is achieved, the thermal conductivity and low expansion of the material are improved, the electroplating process is optimized, the preparation cost is reduced, and the problem of difficult processing of the material is solved.
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Abstract
Citation Information
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