Embedded control system, embedded control method and photoetching machine
Patent Information
- Application Number
- CN202411678246.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-22
- Publication Date
- 2025-03-14
Smart Images
Figure CN119620647A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of integrated circuit equipment manufacturing, and more specifically, to an embedded control system, an embedded control method and a lithography machine. Background Art
[0002] With the continuous development of integrated circuits, the design and manufacturing process of integrated circuits has become more and more complicated. Among them, one of the difficulties in semiconductor chip production is how to make the target circuit pattern on the silicon wafer. The above process is generally achieved through photolithography, which is the most complex and critical process step in the production process of semiconductor chips. The process level of photolithography directly determines the process level and performance level of the chip.
[0003] In order to ensure the performance of semiconductor chips, the photolithography process requires high manufacturing precision. In the prior art, photolithography machines usually use a single processor to handle control tasks. However, due to the heavy control tasks, a single processor may not be able to handle all control tasks, resulting in low control precision of the control system for the motion of the workpiece stage, which cannot meet the high-speed, real-time and high-precision process requirements. Summary of the invention
[0004] In order to at least overcome the above-mentioned deficiencies in the prior art, the purpose of the present application is to provide an embedded control system, an embedded control method and a lithography machine.
[0005] In a first aspect, an embodiment of the present application provides an embedded control system, which is applied to a lithography machine, and includes a main control module, and a motion control module and an interferometer data processing module connected to the main control module via a transmission bus, wherein the transmission bus includes a VME bus, a Serial RapidIO bus, and a P2BUS bus;
[0006] The main control module is used to process the instructions sent by the host computer and send motion control instructions and configuration data to the motion control module;
[0007] The interferometer data processing module is used to obtain the position data of the workpiece stage of the lithography machine based on the optical path signal of the interferometer, and send the position data to the motion control module;
[0008] The motion control module is used to receive the motion control instructions and configuration data sent by the main control module, read the position data solved by the interferometer data processing module in real time, control the movement of the workpiece stage based on the motion control instructions and the workpiece stage position data, and send the micro-motion position data of the workpiece stage in six degrees of freedom directions and the position data to the main control module.
[0009] In a possible implementation, the main control module is specifically used to:
[0010] Acquire a real-time gap value sent by a gap measurement server, wherein the real-time gap value is used to represent a gap value between a wafer placed on the workpiece stage and a mask, and calculate a vertical control amount of a vertical piezoelectric motor based on the real-time gap value;
[0011] Acquire a real-time first alignment phase difference value sent by the alignment measurement server, and calculate an actual alignment deviation value based on the first alignment phase difference value;
[0012] A motion control instruction is generated based on the vertical control amount and the alignment deviation value, and the motion control instruction is sent to the motion control module.
[0013] In a possible implementation, the motion control module is specifically used to:
[0014] receiving a motion control instruction sent by the main control module, and sending a vertical control instruction to the vertical piezoelectric motor based on the vertical control amount, so that the vertical piezoelectric motor controls the motion of the workpiece platform in the vertical direction;
[0015] Based on the alignment deviation value and the position data, a horizontal control instruction is sent to the horizontal piezoelectric motor, and the horizontal piezoelectric motor controls the movement of the workpiece table in the horizontal direction, and the micro-motion position data is used as a feedback signal to adjust the horizontal piezoelectric motor.
[0016] In a possible implementation, the interferometer data processing module includes a first interferometer data processing module and a second interferometer data processing module;
[0017] The first interferometer data processing module is used to obtain an optical path signal of the interferometer, obtain initial position data of the workpiece stage based on the optical path signal, and send the initial position data of the workpiece stage to the second interferometer data processing module;
[0018] The second interferometer data processing module is used to obtain the initial position data of the workpiece stage, calculate the final position data of the workpiece stage based on the initial position data of the workpiece stage, and send the final position data of the workpiece stage to the motion control module.
[0019] In a possible implementation, the embedded control system further includes an analog output module and an analog acquisition module;
[0020] The analog output module is used to receive the vertical control instruction and the horizontal control instruction, generate corresponding analog signals based on the vertical control instruction and the horizontal control instruction, and output the analog signals to the vertical piezoelectric motor and the horizontal piezoelectric motor to drive the vertical piezoelectric motor and the horizontal piezoelectric motor to move;
[0021] The analog quantity acquisition module is used to acquire the micro-motion position data of the workpiece table in the six axis directions, convert the micro-motion position data from analog quantity to digital quantity, and send the digital quantity to the motion control module.
[0022] In a possible implementation, the embedded control system further includes a synchronous clock management module, and the synchronous clock management module is used to provide a synchronous clock signal for each module in the embedded control system.
[0023] In a possible implementation, the embedded control system further includes a data exchange module, and the data exchange module is used to implement data communication between various modules through the Serial RapidIO bus under the synchronous clock signal.
[0024] In a second aspect, an embodiment of the present application further provides an embedded control method, which is applied to the embedded control system described in any one of the first aspects, and the method includes:
[0025] The main control module receives the communication information sent by the host computer, and sends instructions and data to the motion control module, the synchronous clock management module and the interferometer data processing module;
[0026] The interferometer data processing module acquires an optical path signal based on the interferometer, obtains position data of a workpiece stage of the lithography machine based on the optical path signal, and sends the position data to the motion control module;
[0027] The motion control module receives the motion control instructions sent by the main control module and the position data sent by the interferometer data processing module, and controls the motion of the workpiece stage based on the motion control instructions and the position data.
[0028] In a possible implementation, the step of the motion control module receiving the motion control instruction sent by the main control module and the position data sent by the interferometer data processing module, and controlling the motion of the workpiece stage based on the motion control instruction and the position data includes:
[0029] The motion control module receives the motion control instruction sent by the main control module, and sends a vertical control instruction to the vertical piezoelectric motor based on the vertical control amount, so that the vertical piezoelectric motor controls the movement of the workpiece platform in the vertical direction;
[0030] Based on the alignment deviation value and the position data, a horizontal control instruction is sent to the horizontal piezoelectric motor, and the horizontal piezoelectric motor controls the movement of the workpiece table in the horizontal direction, and the micro-motion position data is used as a feedback signal to adjust the horizontal piezoelectric motor.
[0031] In a third aspect, an embodiment of the present application further provides a lithography machine, characterized in that it comprises a level measurement system, an alignment measurement system and an embedded control system as described in any one of the first aspects that are communicatively connected;
[0032] The horizontal measurement system is used to detect the gap value between the wafer placed on the workpiece table and the mask in real time;
[0033] The alignment measurement system is used to detect the alignment phase difference between the wafer placed on the workpiece stage and the mask;
[0034] The embedded control system is used to control the level measurement system and the alignment measurement system.
[0035] Based on any of the above aspects, the embedded control system, embedded control method and lithography machine provided by the embodiment of the present application adopt a distributed task management mode, and other modules such as the main control module, the interferometer data processing module and the motion control module can execute different functions in parallel, thereby distributing the heavy control tasks to different processors to run, thereby improving the processing efficiency and overall performance of the embedded control system. In addition, the use of the Serial RapidIO bus to achieve high-speed data communication between modules can also improve the timeliness and accuracy of data transmission, ensure mutual coordination between modules, and achieve high-speed, real-time and high-precision motion control of the workpiece stage. BRIEF DESCRIPTION OF THE DRAWINGS
[0036] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.
[0037] Figure 1 A functional module diagram of an embedded control system provided in an embodiment of the present application;
[0038] Figure 2 Another functional module diagram of the embedded control system provided in the embodiment of the present application;
[0039] Figure 3 A flowchart of an embedded control method provided in an embodiment of the present application. DETAILED DESCRIPTION
[0040] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.
[0041] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for which protection is sought, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.
[0042] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.
[0043] In the description of this application, it should be noted that the terms "upper", "lower", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of the application is usually placed when in use, which is only for the convenience of describing this application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application. In addition, the terms "first", "second", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.
[0044] In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "disposed", "connected", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal connection of two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0045] It should be noted that, in the absence of conflict, different features in the embodiments of the present application may be combined with each other.
[0046] It should be noted that the embedded control system provided in the embodiment of the present application can be applied to a lithography machine, and can control the high-speed, real-time, and high-precision movement of the workpiece stage of the lithography machine and the corresponding sensor data acquisition.
[0047] To solve the above problems, please refer to Figure 1 An embodiment of the present application provides an embedded control system 100, including a main control module 110, a motion control module 120 and an interferometer data solution processing module 130 connected to the main control module 110 via a transmission bus, wherein the transmission bus includes a VME bus, a Serial RapidIO bus and a P2BUS bus, the VME bus is used to implement the action of the main control module 110 sending configuration data to other modules, the Serial RapidIO bus is used to implement high-speed data communication between modules to ensure the timeliness and accuracy of message transmission, and the P2BUS bus is used for data communication within the interferometer data processing module 130.
[0048] The main control module 110 can be used to process control instructions and configuration data sent by the host computer, and send responsive motion control instructions and related configuration data to the motion control module 120, as well as other sensor data collection and motion control functions.
[0049] The interferometer data processing module 130 can be used to solve and process the optical path signal of the interferometer to obtain the position data of the workpiece stage of the lithography machine, and transmit the position data to the motion control module 120 through the Serial RapidIO bus, so that the motion control module 120 can accurately adjust the position of the workpiece stage according to the motion control instructions and position data in time to improve the alignment accuracy of the wafer and the mask.
[0050] The motion control module 120 is used to receive the motion control instructions and related configuration data sent by the main control module 110, and at the same time read the position data of the workpiece stage calculated by the interferometer data processing module 130 in real time, and run the workpiece stage closed-loop control algorithm at high speed based on the motion control instructions and position data and output the analog control quantity in real time, control the various motion axes of the workpiece stage to perform high-precision movement, and send the micro-motion position data, position data and measurement data of other sensors of the workpiece stage in the six degrees of freedom directions to the main control module 110 as needed, and upload it to the host computer by the main control module 110 to realize real-time monitoring of the motion trajectory of the workpiece stage.
[0051] In the above structure, the embedded control system provided by the embodiment of the present application adopts a distributed task management method. The embedded control system includes other modules such as a main control module 110, an interferometer data processing module 130, and a motion control module 120. These modules can execute different tasks in parallel, and can distribute heavy control tasks to different processors for processing, thereby improving the processing efficiency and overall performance of the embedded control system. In addition, the use of a high-speed serial bus (Serial RapidIO bus) to achieve high-speed data communication between modules can also improve the timeliness and accuracy of data transmission, ensure mutual coordination between modules, and achieve high-speed, real-time and high-precision motion control of the workpiece stage.
[0052] As a possible implementation of the embodiment of the present application, the main control module 110 can be specifically used to implement the following functions.
[0053] First, the main control module 110 can obtain the real-time gap value sent by the gap measurement server in real time, and calculate the vertical control amount of the vertical piezoelectric motor based on the real-time gap value, wherein the main control module 110 can communicate with the gap measurement server through the network transmission control protocol (TCP), and the real-time gap value can be used to represent the gap value between the wafer and the mask placed on the workpiece stage. The vertical piezoelectric motor is used to control the movement of the workpiece stage in the vertical direction, such as Figure 2 The Z1, Z2, and Z3 directions are shown.
[0054] Secondly, the main control module 110 can obtain the alignment phase difference of the exposure field mark sent by the alignment measurement server in real time, and calculate the actual alignment deviation value based on the alignment phase difference, and generate vertical motion control instructions and horizontal motion control instructions based on the vertical control amount and the alignment deviation value, and send the vertical motion control instructions to the vertical piezoelectric motor, which drives the workpiece stage to move vertically, and send the horizontal motion control instructions to the motion control module 120, which drives the workpiece stage to move horizontally.
[0055] Furthermore, the motion control module 120 can be specifically used to implement the following functions.
[0056] First, the motion control module 120 can receive the motion control instructions sent by the main control module 110, and send control instructions to the vertical piezoelectric motor based on the vertical control amount. The vertical piezoelectric motor controls the movement of the worktable in the vertical direction to adjust the gap value between the wafer and the mask.
[0057] Next, the motion control module 120 can send a horizontal control instruction to the horizontal piezoelectric motor based on the alignment deviation value and the position data, so that the horizontal piezoelectric motor controls the movement of the workpiece stage in the horizontal direction, and uses the micro-motion position data as a feedback signal to adjust the horizontal piezoelectric motor. Specifically, the motion control module 120 can determine the control of the horizontal piezoelectric motor through the position data, and use the micro-motion position data as a feedback signal to close the loop to adjust the control of the horizontal piezoelectric motor. Through the closed-loop feedback control method, the horizontal piezoelectric motor can drive the workpiece stage with high precision to ensure the alignment accuracy of the wafer and the mask.
[0058] As a possible implementation method of the present application, please refer to Figure 2 The embedded control system 100 further includes a synchronous clock management module 140, which is used to provide a synchronous clock signal for each module in the embedded control system 100 to ensure that each module works synchronously.
[0059] Furthermore, the interferometer data processing module 130 includes a first interferometer data processing module and a second interferometer data processing module, wherein the first interferometer data processing module and the second interferometer data processing module can communicate via a P2BUS bus.
[0060] The first interferometer data processing module is used to obtain the optical path signal of the interferometer, obtain the initial position data of the workpiece stage based on the optical path signal, and send the initial position data of the workpiece stage to the second interferometer data processing module.
[0061] Under the high-speed synchronous clock signal provided by the synchronous clock management module 140, the second interferometer data processing module can obtain the initial position data of the workpiece stage through the P2BUS bus, calculate the final position data of the workpiece stage based on the initial position data of the workpiece stage, and send the final position data of the workpiece stage to the motion control module 120.
[0062] Further, please refer again to Figure 2 The embedded control system 100 also includes an analog output module 150 and an analog acquisition module 160 .
[0063] The analog output module 150 is used to receive the vertical control instructions and the horizontal control instructions, and generate corresponding analog signals based on the vertical control instructions and the horizontal control instructions, and output the analog signals to the vertical piezoelectric motor and the horizontal piezoelectric motor under the high-speed synchronous clock signal provided by the synchronous clock management module 140, so as to drive the vertical piezoelectric motor and the horizontal piezoelectric motor to move with high precision. The analog acquisition module 160 is used to collect the micro-motion position data of the workpiece stage in the six axis directions, and convert the micro-motion position data from analog quantity to digital quantity, and send the digital quantity to the motion control module 120.
[0064] Furthermore, the embedded control system 100 also includes a data exchange module 170, which can complete the data communication between the modules on the transmission bus at high speed and in real time under the synchronous clock signal of the synchronous clock management module 140. Specifically, the data exchange module 170 can complete the data transmission between the modules on the Serial RapidIO bus at high speed under the synchronous clock signal.
[0065] Based on the same inventive concept, the present application embodiment also provides an embedded control method, which can be applied to the embedded control system 100 of any of the above embodiments. Figure 3 The flow chart shown provides an exemplary description of the embedded control method provided in the embodiment of the present application.
[0066] Step S210 : the main control module 110 receives the communication information sent by the host computer, and sends instructions and data to the motion control module 120 , the synchronous clock management module 140 and the interferometer data processing module 130 .
[0067] In this embodiment, the main control module 110 can obtain the real-time gap value sent by the gap measurement server, and calculate the vertical control amount of the vertical piezoelectric motor based on the real-time gap value, wherein the main control module 110 can communicate with the gap measurement server through the network transmission control protocol (TCP), and the real-time gap value can be used to characterize the gap value between the wafer and the mask placed on the workpiece table. Then, the main control module 110 can obtain the real-time first alignment phase difference value sent by the alignment measurement server, calculate the actual alignment deviation value based on the first alignment phase difference value, and generate a motion control instruction based on the vertical control amount and the alignment deviation value, and send the motion control instruction to the motion control module 120.
[0068] It should be noted that the main control module 110 can be connected to other modules via a VME bus and a Serial RapidIO bus, wherein the VME bus is used to implement the action of the main control module 110 sending configuration data to other modules, and the Serial RapidIO bus is used to implement high-speed data communication between modules to ensure the timeliness and accuracy of message transmission.
[0069] Step S220 : the interferometer data processing module 130 acquires an optical path signal based on the interferometer, obtains position data of the workpiece stage based on the optical path signal, and sends the position data to the motion control module 120 .
[0070] In this step, the interferometer data processing module 130 can transmit the position data to the motion control module 120 via the Serial RapidIO bus, so that the motion control module 120 can adjust the position of the worktable in time according to the motion control instructions and the position data, thereby improving the alignment accuracy between the wafer and the mask.
[0071] Step S230: The motion control module 120 receives the motion control instruction sent by the main control module 110 and the position data sent by the interferometer data processing module 130, and controls the movement of the workpiece stage of the lithography machine based on the motion control instruction and the position data.
[0072] In this step, the motion control module 120 can receive the motion control instructions sent by the main control module 110, and send the vertical control instructions to the vertical piezoelectric motor based on the vertical control amount, so that the vertical piezoelectric motor controls the movement of the worktable in the vertical direction to achieve the leveling of the worktable. Then, a horizontal control instruction can also be sent to the horizontal piezoelectric motor based on the alignment deviation value and the position data, so that the horizontal piezoelectric motor controls the movement of the worktable in the horizontal direction, and uses the micro-motion position data as a feedback signal to adjust the horizontal piezoelectric motor. Specifically, the motion control module 120 can determine the control of the horizontal piezoelectric motor through the position data, and use the micro-motion position data as a feedback signal to close the loop to adjust the control of the horizontal piezoelectric motor. Through the closed-loop feedback control method, the horizontal piezoelectric motor can drive the worktable with high precision to ensure the alignment accuracy of the wafer and the mask.
[0073] In this embodiment, the embedded control system provided by the embodiment of the present application adopts a distributed task management method, and other modules such as the main control module 110, the interferometer data processing module 130 and the motion control module 120 can execute different functions in parallel, thereby distributing heavy control tasks to different processors to run, thereby improving the processing efficiency and overall performance of the embedded control system. In addition, the use of the Serial RapidIO bus to achieve high-speed data communication between modules can also improve the timeliness and accuracy of data transmission, ensure mutual coordination between modules, and achieve high-speed, real-time and high-precision motion control of the workpiece stage.
[0074] The embodiment of the present application also provides a photolithography machine, including a communication-connected horizontal measurement system, an alignment measurement system and an embedded control system 100 of any one of the above embodiments, wherein the horizontal measurement system is used to detect the gap value between the wafer placed on the workpiece stage and the mask in real time, the alignment measurement system is used to detect the alignment phase difference between the wafer placed on the workpiece stage and the mask, and the embedded control system 100 is used to control the horizontal measurement system and the alignment measurement system. The embedded control system adopts a distributed task management method, and other modules such as the main control module 110, the interferometer data processing module 130 and the motion control module 120 can execute different functions in parallel, and distribute the heavy control tasks to different processors to run, which can speed up the processing efficiency of the embedded control system and improve the overall performance of the photolithography machine. In addition, the embedded control system adopts the Serial RapidIO bus to realize high-speed data communication between the modules, and can also improve the timeliness and accuracy of data transmission, ensure the coordination and cooperation between the modules, realize high-speed, real-time and high-precision motion control of the workpiece stage, and improve the reliability of the photolithography machine.
[0075] In summary, the embodiment of the present application provides an embedded control system, an embedded control method and a lithography machine, wherein the embedded control system includes other modules such as a main control module 110, an interferometer data processing module 130 and a motion control module 120, which can execute different tasks in parallel and distribute heavy control tasks to different processors for processing, thereby improving the processing efficiency and overall performance of the embedded control system. In addition, the use of a high-speed serial bus (Serial RapidIO bus) to achieve high-speed data communication between modules can also improve the timeliness and accuracy of data transmission, ensure mutual coordination between modules, and achieve high-speed, real-time and high-precision motion control of the workpiece stage.
[0076] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims
1. An embedded control system, characterized in that: Applied to a lithography machine, the system comprises a main control module, and a motion control module and an interferometer data processing module connected to the main control module via a transmission bus, wherein the transmission bus comprises a VME bus, a Serial RapidIO bus and a P2BUS bus; The main control module is used to process the instructions sent by the host computer and send motion control instructions and configuration data to the motion control module; The interferometer data processing module is used to obtain the position data of the workpiece stage of the lithography machine based on the optical path signal of the interferometer, and send the position data to the motion control module; The motion control module is used to receive the motion control instructions and configuration data sent by the main control module, read the position data solved by the interferometer data processing module in real time, control the movement of the workpiece stage based on the motion control instructions and the workpiece stage position data, and send the micro-motion position data of the workpiece stage in six degrees of freedom directions and the position data to the main control module.
2. The embedded control system according to claim 1, characterized in that: The main control module is specifically used for: Acquire a real-time gap value sent by a gap measurement server, wherein the real-time gap value is used to represent a gap value between a wafer placed on the workpiece stage and a mask, and calculate a vertical control amount of a vertical piezoelectric motor based on the real-time gap value; Acquire a real-time first alignment phase difference value sent by the alignment measurement server, and calculate an actual alignment deviation value based on the first alignment phase difference value; A motion control instruction is generated based on the vertical control amount and the alignment deviation value, and the motion control instruction is sent to the motion control module.
3. The embedded control system according to claim 2, characterized in that: The motion control module is specifically used for: receiving a motion control instruction sent by the main control module, and sending a vertical control instruction to the vertical piezoelectric motor based on the vertical control amount, so that the vertical piezoelectric motor controls the motion of the workpiece platform in the vertical direction; Based on the alignment deviation value and the position data, a horizontal control instruction is sent to the horizontal piezoelectric motor, and the horizontal piezoelectric motor controls the movement of the workpiece table in the horizontal direction, and the micro-motion position data is used as a feedback signal to adjust the horizontal piezoelectric motor.
4. The embedded control system according to claim 1, characterized in that: The interferometer data processing module includes a first interferometer data processing module and a second interferometer data processing module; The first interferometer data processing module is used to obtain an optical path signal of the interferometer, obtain initial position data of the workpiece stage based on the optical path signal, and send the initial position data of the workpiece stage to the second interferometer data processing module; The second interferometer data processing module is used to obtain the initial position data of the workpiece stage, calculate the final position data of the workpiece stage based on the initial position data of the workpiece stage, and send the final position data of the workpiece stage to the motion control module.
5. The embedded control system according to claim 3, characterized in that: The embedded control system also includes an analog output module and an analog acquisition module; The analog output module is used to receive the vertical control instruction and the horizontal control instruction, generate corresponding analog signals based on the vertical control instruction and the horizontal control instruction, and output the analog signals to the vertical piezoelectric motor and the horizontal piezoelectric motor to drive the vertical piezoelectric motor and the horizontal piezoelectric motor to move; The analog quantity acquisition module is used to acquire the micro-motion position data of the workpiece table in the six axis directions, convert the micro-motion position data from analog quantity to digital quantity, and send the digital quantity to the motion control module.
6. The embedded control system according to claim 1, characterized in that: The embedded control system further comprises a synchronous clock management module, and the synchronous clock management module is used to provide a synchronous clock signal for each module in the embedded control system.
7. The embedded control system according to claim 6, characterized in that: The embedded control system further comprises a data exchange module, and the data exchange module is used to realize data communication between various modules through the Serial RapidIO bus under the synchronous clock signal.
8. An embedded control method, characterized in that: Applied to the embedded control system according to any one of claims 1 to 7, the method comprising: The main control module receives the communication information sent by the host computer, and sends instructions and data to the motion control module, the synchronous clock management module and the interferometer data processing module; The interferometer data processing module acquires an optical path signal based on the interferometer, obtains position data of a workpiece stage of the lithography machine based on the optical path signal, and sends the position data to the motion control module; The motion control module receives the motion control instructions sent by the main control module and the position data sent by the interferometer data processing module, and controls the motion of the workpiece stage based on the motion control instructions and the position data.
9. The embedded control method according to claim 8, characterized in that: The step of the motion control module receiving the motion control instruction sent by the main control module and the position data sent by the interferometer data processing module, and controlling the motion of the workpiece stage based on the motion control instruction and the position data includes: The motion control module receives the motion control instruction sent by the main control module, and sends a vertical control instruction to the vertical piezoelectric motor based on the vertical control amount, so that the vertical piezoelectric motor controls the movement of the workpiece platform in the vertical direction; Based on the alignment deviation value and the position data, a horizontal control instruction is sent to the horizontal piezoelectric motor, and the horizontal piezoelectric motor controls the movement of the workpiece table in the horizontal direction, and the micro-motion position data is used as a feedback signal to adjust the horizontal piezoelectric motor.
10. A photolithography machine, characterized in that: A level measurement system, an alignment measurement system and an embedded control system according to any one of claims 1 to 7 that are in communication connection; The horizontal measurement system is used to detect the gap value between the wafer placed on the workpiece table and the mask in real time; The alignment measurement system is used to detect the alignment phase difference between the wafer placed on the workpiece stage and the mask; The embedded control system is used to control the level measurement system and the alignment measurement system.