高密度Sn2+掺杂硅硼钆闪烁玻璃及其制备方法和应用

By using Sn2+-doped high-density gadolinium borosilicate scintillation glass, combined with Gd2O3 and GdF3, the problems of high cost and low luminous efficiency of high-density scintillation glass have been solved, enabling the application of high-density, low-cost scintillation materials in X-ray imaging.

CN119638194BActive Publication Date: 2026-07-17HARBIN ENG UNIV

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HARBIN ENG UNIV
Filing Date
2024-12-12
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing high-density scintillation glass cannot guarantee high scintillation efficiency while increasing density, and the cost is high. There is little research on scintillation glass materials with rare earth ions as luminescence centers, and the application of high-density scintillation glass materials with non-rare earth ion luminescence centers is limited.

Method used

By using Sn2+-doped high-density gadolinium borosilicate scintillation glass, and by combining Gd2O3 and GdF3 to increase the glass density, and using Sn2+ as the luminescent center, combined with SiO2, B2O3, Gd2O3, GdF3 and other components, a scintillation material with high photoluminescence quantum efficiency was prepared.

Benefits of technology

A high-density, low-cost scintillation glass with high photoluminescence quantum efficiency and high spatial resolution has been achieved, making it suitable for X-ray imaging. This reduces manufacturing costs and improves the stability and transparency of the material.

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Abstract

一种高密度Sn2+掺杂硅硼钆闪烁玻璃及其制备方法和应用,属于闪烁发光材料领域。该高密度Sn2+掺杂硅硼钆闪烁玻璃,包括主体组分、还原剂和外掺Sn2+;主体组分包括SiO2、B2O3、Gd2O3、GdF3和X,X为Al2O3、AlF3、BaO、BaF2中的一种或几种;SiO2、B2O3、Gd2O3、GdF3和X的摩尔百分比为SiO2为5‑10mol%,B2O3为15‑30mol%,Gd2O3为25‑35mol%,GdF3为25‑35mol%,X为5‑15mol%;主体组分之和为100mol%;还原剂的摩尔百分比为0.5‑2mol%;外掺Sn2+的摩尔百分比为0.5‑2mol%;高密度Sn2+掺杂硅硼钆闪烁玻璃密度为6‑6.26g / cm3,光致发光量子效率75%‑90%,大幅度提高了闪烁玻璃的密度、光致发光量子效率和X射线成像分辨率,并且降低了高密度闪烁玻璃的制备成本。
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