A laser processing apparatus

Abstract

The application discloses a kind of laser processing equipment including warehouse, cleaning coating mechanism, processing platform and handling mechanism;The warehouse is provided with feeding station and discharging station, cleaning coating mechanism is provided with the cleaning station for cleaning and / or gluing material, in first direction, the side of cleaning station is provided with waiting station, processing platform can be moved to waiting station along the second direction perpendicular to first direction;Handling mechanism includes first handling component and second handling component, first handling component is used to feed from feeding station and discharge material to cleaning station, and feed from cleaning station and discharge material to discharging station, second handling component is used to feed from cleaning station and discharge material to waiting station, and feed from waiting station and discharge material to cleaning station.The handling mechanism of scheme realizes the flow of material between warehouse, cleaning coating mechanism and processing platform by the same module, with the advantages of small volume, high integration, low cost.

Description

Technical Field

[0001] This invention relates to the field of wafer fabrication technology, and more specifically, to a laser processing device. Background Technology

[0002] Laser processing equipment is a device that uses lasers to process wafers to create specific processing marks. The handling mechanism is a crucial component of laser processing equipment, responsible for performing wafer picking, loading, and unloading operations. Specifically, the handling mechanism first removes the wafer from the hopper and then sends it to the cleaning and coating mechanism for cleaning and coating treatment. After treatment, the handling mechanism then transports the wafer to the processing platform for loading. After processing is completed, the handling mechanism returns the wafer to the hopper for storage.

[0003] Existing technologies typically employ three independent modules—a material handling module, a loading module, and a unloading module—to handle the transfer of wafers between the material hopper and the cleaning and coating mechanism, between the cleaning and coating mechanism and the processing platform, and between the processing platform and the material hopper, respectively. This design suffers from large space requirements and high costs. Therefore, optimizing the structure of the handling mechanism to reduce space requirements and lower costs has become a pressing technical problem for those skilled in the art. Summary of the Invention

[0004] In view of this, the purpose of the present invention is to provide a laser processing device that reduces space occupation and lowers costs.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] A laser processing device includes a hopper, a cleaning and coating mechanism, a processing platform, and a handling mechanism;

[0007] The hopper is provided with a loading station and a unloading station for storing materials. The cleaning and coating mechanism is provided with a cleaning station for cleaning and / or applying adhesive to the materials. In the first direction, a waiting station is provided on one side of the cleaning station. The processing platform can move to the waiting station in a second direction perpendicular to the first direction.

[0008] The conveying mechanism includes a first conveying component and a second conveying component. The first conveying component is used to load materials from the loading station and unload them to the cleaning station, and to load materials from the cleaning station and unload them to the unloading station. The second conveying component is used to load materials from the cleaning station and unload them to the waiting station, and to load materials from the waiting station and unload them to the cleaning station.

[0009] Optionally, the laser processing equipment described above further includes a position adjustment mechanism, which has an adjustment station. The cleaning and coating mechanism is located below the position adjustment mechanism and extends upward along a third direction. The adjustment station and the cleaning station are positioned correspondingly, and the third direction is perpendicular to the first direction and the second direction, respectively.

[0010] Optionally, in the laser processing equipment described above, the conveying mechanism includes a conveying track extending along a first direction and a conveying slider slidably disposed on the conveying track. The conveying track extends sequentially to the hopper, the cleaning and coating mechanism, and the processing platform. The first conveying component and the second conveying component are both disposed on the conveying slider to move and convey materials between the hopper, the cleaning and coating mechanism, and the processing platform along with the conveying slider.

[0011] Optionally, in the laser processing equipment described above, the first conveying component includes a conveying unit and a first material handling unit. Both the conveying unit and the first material handling unit are disposed on the conveying slider. The conveying unit is used to load material from the loading station and unload it at the adjustment station, and to load material from the adjustment station and unload it at the unloading station. The first material handling unit is used to load material from the adjustment station and then convey and unload it along the third direction at the cleaning station, and to load material from the cleaning station and then convey and unload it along the third direction at the adjustment station.

[0012] Optionally, in the aforementioned laser processing equipment, the first material handling unit includes:

[0013] A first lifting mechanism is mounted on the transport slider;

[0014] The second lifting mechanism is mounted on the first lifting mechanism;

[0015] The first suction cup assembly is disposed on the second lifting mechanism and includes a plurality of first suction cups, wherein the first suction cups form an adsorption plane for adsorbing materials;

[0016] Wherein, the first lifting mechanism is used to drive the second lifting mechanism to move the first suction cup assembly along the third direction by a first preset distance, the first preset distance being equal to the interval distance between the adjustment station and the cleaning station, and the second lifting mechanism is used to drive the first suction cup assembly along the third direction by a second preset distance, so that the adsorption plane adsorbs the material.

[0017] Optionally, in the above-described laser processing equipment, the conveying unit includes:

[0018] A rotating mechanism is disposed on the conveying slider or the first material handling unit;

[0019] A gripper assembly, connected to the rotating mechanism, is used to grip materials;

[0020] The rotating mechanism is used to drive the gripper assembly to rotate and switch between a first position and a second position. When the gripper assembly is in the first position, it is used to grip the material. When the gripper assembly is in the second position, it avoids the adsorption plane.

[0021] Optionally, in the laser processing equipment described above, the second transport component includes a second material handling unit and a third lifting mechanism. The third lifting mechanism is disposed on the transport slider, and the second material handling unit is connected to the third lifting mechanism. The third lifting mechanism is used to drive the second material handling unit to move a third preset distance along the third direction.

[0022] Optionally, in the laser processing equipment described above, the position adjustment mechanism includes a mounting frame, an adjustment component, and a drive mechanism;

[0023] There are two adjustment components, which are movably mounted on the mounting frame to form the adjustment station;

[0024] The mounting bracket is provided with two limiting grooves, which extend along the moving direction of the adjusting member.

[0025] The adjusting component is provided with a limiting block, which corresponds one-to-one with the limiting groove and is slidably disposed in the limiting groove;

[0026] The drive mechanism is mounted on the mounting frame and connected to the adjustment components. The drive mechanism is used to drive the two adjustment components to move closer to each other to adjust the posture of the material at the adjustment station, and to drive the two adjustment components to move away from each other so that the conveying mechanism can load and unload materials at the adjustment station, and avoid the movement of the conveying mechanism and materials between the adjustment station and the cleaning station.

[0027] Optionally, in the laser processing equipment described above, elastic buffers are provided on both end faces of the limiting block along the extension direction of the limiting groove, and the elastic buffers are used to abut against the end walls of the limiting groove.

[0028] Optionally, in the laser processing equipment described above, the mounting frame is provided with a first limit sensor and a second limit sensor. The first limit sensor is used to detect whether the adjusting member has moved to the initial position, and the second limit sensor is used to detect whether the adjusting member has moved to the limited position.

[0029] When the adjusting member is in the initial position, the two adjusting members are spaced apart by a first distance to avoid the movement of the conveying mechanism and materials between the adjusting station and the cleaning station. When the adjusting member is in the defined position, the two adjusting members are spaced apart by a second distance, and the first distance is greater than the second distance.

[0030] Optionally, in the aforementioned laser processing equipment, a hopper sensor is provided on the side of the mounting frame facing the hopper, and the hopper sensor is used to detect whether material is placed at the loading station; and / or,

[0031] An adjustment sensor is provided on the side of the mounting frame facing the hopper. The adjustment sensor is used to detect whether each material stored in the hopper protrudes from the hopper.

[0032] Optionally, in the aforementioned laser processing equipment, the mounting frame is equipped with a barcode scanning component, which is used to scan the material being transported by the transport mechanism during the movement of the transport mechanism from the hopper to the adjusting component; and / or,

[0033] The mounting frame is equipped with a material sensor, which is used to detect whether the conveying mechanism is carrying material during the process of the conveying mechanism moving from the hopper to the adjusting component.

[0034] Optionally, in the laser processing equipment described above, the cleaning and coating mechanism includes a cleaning and coating tank, a rotating platform, a cleaning swing arm, and a coating swing arm;

[0035] The cleaning and coating tank has an opening for material to enter and exit;

[0036] The rotating platform is rotatably disposed inside the cleaning and coating tank to form the cleaning station that drives the material to rotate;

[0037] The cleaning swing arm is swayably disposed inside the cleaning coating tank and is provided with a first water outlet, which is arranged toward the rotating platform.

[0038] The coating arm is oscillatingly positioned inside the cleaning and coating tank and is equipped with a glue applicator, which is oriented toward the rotating platform.

[0039] Optionally, in the aforementioned laser processing equipment, the cleaning swing arm includes a first motor, a first connecting shaft, and a first swing arm shaft. The first motor is disposed outside the cleaning coating tank, the first swing arm shaft is disposed inside the cleaning coating tank, and the first water outlet is disposed on the first swing arm shaft. The first connecting shaft is drivingly connected between the first motor and the first swing arm shaft; and / or,

[0040] The coating swing arm includes a second motor, a second connecting shaft, and a second swing arm shaft. The second motor is located outside the cleaning and coating tank, the second swing arm shaft is located inside the cleaning and coating tank, and the adhesive application port is located on the second swing arm shaft. The second connecting shaft is drivingly connected between the second motor and the second swing arm shaft.

[0041] Optionally, the laser processing equipment described above also includes a lifting assembly, which is connected to the rotating platform and is used to drive the rotating platform to move up and down between the bottom and the opening of the cleaning and coating tank.

[0042] When the rotating platform rises to the opening of the cleaning and coating tank, the conveying mechanism loads or unloads materials at the cleaning station. When the rotating platform descends to the bottom of the cleaning and coating tank, the first water outlet and the adhesive inlet are arranged facing the rotating platform.

[0043] Optionally, in the laser processing equipment described above, a first clearance space and a second clearance space are provided on the side wall of the cleaning and coating tank, the first clearance space being used to accommodate the first swing arm shaft and the second clearance space being used to accommodate the second swing arm shaft.

[0044] When the first swing arm shaft and the second swing arm shaft swing into the first clearance space and the second clearance space respectively, the cleaning swing arm and the coating swing arm are both misaligned with the rotating platform along the bottom of the cleaning and coating tank towards the opening, so as to avoid the lifting and lowering movement of the rotating platform in the cleaning and coating tank.

[0045] Optionally, in the laser processing equipment described above, an atomizing nozzle is provided at the first water outlet. The atomizing nozzle is provided with a first interface, a second interface, and a spray outlet. The first interface is connected to a water inlet pipe through the first water outlet, the second interface is connected to an air inlet pipe, and the spray outlet is connected to both the first interface and the second interface and is arranged towards the rotating platform.

[0046] Optionally, in the aforementioned laser processing equipment, the material is supported by a support member, and the cleaning swing arm is provided with a second water outlet, which is arranged towards the support member; and / or,

[0047] The coating arm is provided with a third water outlet, which is arranged facing the adhesive application port.

[0048] Optionally, the laser processing equipment described above also includes a water-blocking roller shutter, which has a water-blocking state and a retracted state;

[0049] When the water-blocking roller shutter is in the water-blocking state, it blocks the opening of the cleaning and coating tank. When the water-blocking roller shutter is in the retracted state, it avoids the opening of the cleaning and coating tank.

[0050] The laser processing equipment provided by this invention includes a hopper, a cleaning and coating mechanism, a processing platform, and a conveying mechanism. The hopper is provided with a loading station and a unloading station for storing materials. The cleaning and coating mechanism is provided with a cleaning station for cleaning and / or applying adhesive to the materials. In a first direction, a waiting station is provided on one side of the cleaning station. The processing platform can move to the waiting station in a second direction perpendicular to the first direction and process the materials in the waiting station. The conveying mechanism includes a first conveying component and a second conveying component. The first conveying component is used to load materials from the loading station and unload them to the cleaning station, and to load materials from the cleaning station and unload them to the unloading station. The second conveying component is used to load materials from the cleaning station and unload them to the waiting station, and to load materials from the waiting station and unload them to the cleaning station.

[0051] Compared with existing technologies, the material handling mechanism of the laser processing equipment provided by this invention realizes the flow of materials between the hopper, the cleaning and coating mechanism and the processing platform through the same module. It has the advantages of small size, high integration and low cost, and is easy to realize modular design. Attached Figure Description

[0052] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0053] Figure 1 This is a schematic diagram of the overall structure of the laser processing equipment disclosed in an embodiment of the present invention;

[0054] Figure 2 This is a simplified schematic diagram of the handling mechanism disclosed in an embodiment of the present invention;

[0055] Figure 3 This is a schematic diagram of the overall structure of the first and second transport components disclosed in an embodiment of the present invention;

[0056] Figure 4 This is a schematic diagram of the structure of the first transport assembly disclosed in an embodiment of the present invention. Figure 1 ;

[0057] Figure 5 This is a schematic diagram of the structure of the first transport assembly disclosed in an embodiment of the present invention. Figure 2 ;

[0058] Figure 6 This is a schematic diagram of the structure of the transport unit disclosed in an embodiment of the present invention;

[0059] Figure 7 This is a schematic diagram of the material straightening structure of the position adjustment mechanism disclosed in an embodiment of the present invention;

[0060] Figure 8 This is a schematic diagram of the position adjustment mechanism disclosed in an embodiment of the present invention. Figure 1 ;

[0061] Figure 9 This is a schematic diagram of the position adjustment mechanism disclosed in an embodiment of the present invention. Figure 2 ;

[0062] Figure 10 This is a schematic diagram of the structure of the mounting bracket disclosed in an embodiment of the present invention. Figure 1 ;

[0063] Figure 11 This is a schematic diagram of the structure of the mounting bracket disclosed in an embodiment of the present invention. Figure 2 ;

[0064] Figure 12 This is a schematic diagram showing the relative position of the position adjustment mechanism and the hopper disclosed in an embodiment of the present invention;

[0065] Figure 13 This is a schematic diagram of the cleaning and coating mechanism disclosed in an embodiment of the present invention. Figure 1 ;

[0066] Figure 14 This is a schematic diagram of the cleaning and coating mechanism disclosed in an embodiment of the present invention. Figure 2 ;

[0067] Figure 15 for Figure 14 Cross-sectional view at point AA;

[0068] Figure 16 for Figure 14 Cross-sectional view at point BB;

[0069] Figure 17 This is a schematic diagram of the cleaning and coating mechanism disclosed in an embodiment of the present invention. Figure 3 ;

[0070] Figure 18 for Figure 17 Cross-sectional view at point C;

[0071] Figure 19 This is a schematic diagram of the cleaning swing arm disclosed in an embodiment of the present invention;

[0072] Figure 20This is a schematic diagram of the structure of the coated swing arm disclosed in an embodiment of the present invention;

[0073] Figure 21 This is a schematic diagram of the structure of the rotating platform disclosed in an embodiment of the present invention;

[0074] Figure 22 This is a schematic diagram of the structure of the atomizing nozzle disclosed in an embodiment of the present invention.

[0075] Among them, 100a is the mounting bracket, 101a is the limiting groove, 110a is the first guide rail, 111a is the slider, and 120a is the baffle; 200a is the adjusting component, 201a is the elastic buffer component, and 210a is the limiting block; 300a is the drive motor, 310a is the synchronous pulley, and 320a is the synchronous belt; 400a is the barcode scanning component, 410a is the first limit sensor, 411a is the second limit sensor, 420a is the hopper sensor, 430a is the material sensor, and 440a is the adjusting sensor;

[0076] 100b is the cleaning and coating tank; 101b is the side panel; 102b is the chassis; 110b is the water-blocking roller shutter; 111b is the second guide rail; 200b is the rotating platform; 210b is the rotary motor; 220b is the lifting motor; 230b is the lifting guide column; 300b is the cleaning swing arm; 310b is the first motor; 320b is the first connecting shaft; 321b is the first water inlet; 330b is the first swing arm shaft; 331b is the first water outlet; 332b is the second... Two water outlets: 340b is the atomizing nozzle, 341b is the first interface, 342b is the second interface, and 343b is the spray outlet; 400b is the coating swing arm, 410b is the second motor, 420b is the second connecting shaft, 421b is the second water inlet, 430b is the second swing arm shaft, 431b is the glue application port, and 432b is the third water outlet; 500b is the base, 510b is the support frame, 520b is the first shock absorber, and 530b is the second shock absorber.

[0077] 100c is the transport slider, 101c is the transport track, 110c is the transport unit, 111c is the rotating mechanism, 112c is the gripper drive, 113c is the first clamping plate, 114c is the second clamping plate, 120c is the first material handling unit, 121c is the first lifting mechanism, 122c is the second lifting mechanism, 123c is the first suction cup assembly, 130c is the second transport assembly, and 131c is the third lifting mechanism.

[0078] 100d is the hopper, 101d is the lifting mechanism, 110d is the position adjustment mechanism, 120d is the cleaning and coating mechanism, 130d is the processing platform, 140d is the handling mechanism, and 200d is the material. Detailed Implementation

[0079] The core of this invention is to disclose a laser processing device that reduces space occupation and lowers costs.

[0080] Hereinafter, embodiments will be described with reference to the accompanying drawings. Furthermore, the embodiments shown below do not limit the scope of the invention as described in the claims. Additionally, the complete contents of the structures represented in the embodiments below are not limited to those necessary for the solution of the invention as described in the claims. It should be noted that, for ease of description, only the parts relevant to the invention are shown in the drawings. Unless otherwise specified, the embodiments and features described in the present invention can be combined with each other.

[0081] Combination Figures 1-22 The laser processing equipment disclosed in this invention includes a material hopper 100d, a cleaning and coating mechanism 120d, a processing platform 130d, and a conveying mechanism 140d. The material hopper 100d is equipped with a loading station and a unloading station for storing materials 200d. The cleaning and coating mechanism 120d is equipped with a cleaning station for cleaning and / or applying adhesive to the materials 200d. In a first direction, a waiting station is provided on one side of the cleaning station. The processing platform 130d can move to the waiting station in a second direction perpendicular to the first direction and process the materials 200d at the waiting station. The material handling mechanism 140d includes a first handling component and a second handling component 130c. The first handling component is used to load material 200d (material to be processed) from the loading station and unload it from the cleaning station, and to load material 200d (processed material) from the cleaning station and unload it from the unloading station. The second handling component is used to load material 200d (material to be processed) from the cleaning station and unload it from the waiting station, and to load material 200d (processed material) from the waiting station and unload it from the cleaning station to the cleaning station. The loading station and unloading station can be the same station or different stations. That is, processed material can return to its original station in the material silo 100d, or return to a new station in the material silo 100d. Material 200d includes, but is not limited to, wafers.

[0082] Compared with the prior art, the handling mechanism 140d of the laser processing equipment disclosed in this invention realizes the flow of material 200d between the hopper 100d, the cleaning and coating mechanism 120d and the processing platform 130d through the same module. It has the advantages of small size, high integration and low cost, and is easy to realize modular design.

[0083] Specifically, the laser processing equipment can be a laser surface cutting machine.

[0084] Furthermore, the laser processing equipment disclosed in this invention also includes a position adjustment mechanism 110d, which has an adjustment station. The cleaning and coating mechanism 120d is located below the position adjustment mechanism 110d and extends upward along a third direction. The positions of the adjustment station and the cleaning station correspond. The third direction is perpendicular to both the first and second directions.

[0085] In one embodiment, the first conveying component loads material 200d (material to be processed) from the loading station and unloads it to the adjustment station. Then, the adjustment station loads material 200d (unprocessed material) and unloads it to the cleaning station. After that, the second conveying component 130c loads material 200d (unprocessed material) from the cleaning station and unloads it to the waiting station. After the processing platform 130d processes material 200d, the second conveying component 130c unloads material 200d (processed material) from the waiting station to the cleaning station. After cleaning, the second conveying component 130c loads material 200d (processed material) from the cleaning station and unloads it to the adjustment station. Then, the first conveying component loads material 200d (processed material) from the adjustment station and unloads it to the unloading station.

[0086] In one embodiment, the conveying mechanism 140d includes a conveying track 101c extending along a first direction and a conveying slider 100c slidably disposed on the conveying track 101c. The conveying track 101c extends to the hopper 100d, the cleaning and coating mechanism 120d, and the processing platform 130d. The first conveying component and the second conveying component 130c are both disposed on the conveying slider 100c to move with the conveying slider 100c between the hopper 100d, the cleaning and coating mechanism 120d, and the processing platform 130d.

[0087] The first conveying assembly includes a conveying unit 110c and a first picking unit 120c. Both the conveying unit 110c and the first picking unit 120c are disposed on the conveying slider 100c. The conveying unit 110c is used to load material 200d from the loading station and unload it to the adjustment station, and to load material 200d from the adjustment station and unload it to the unloading station. The first picking unit 120c is used to load material 200d from the adjustment station and then transport it along a third direction and unload it to the cleaning station, and to load material 200d from the cleaning station and then transport it along a third direction and unload it to the adjustment station. After material 200d is discharged from silo 100d, it needs to be transported to the adjustment station of position adjustment mechanism 110d for posture correction, and then transported to cleaning and coating mechanism 120d for cleaning and adhesive application. After cleaning and adhesive application, material 200d needs to be transported to the waiting station of processing platform 130d for processing. After processing, material 200d needs to be transported back to silo 100d.

[0088] Specifically, the conveying unit 110c can take the material 200d out of the hopper 100d and move it to the position adjustment mechanism 110d by sliding the conveying slider 100c on the conveying track 101c. The conveying unit 110c can also unload the material 200d at the adjustment station on the position adjustment mechanism 110d for posture correction. After correction, the first picking unit 120c grabs the material 200d and moves it along a third direction towards the cleaning and coating mechanism 120d until the material 200d is placed at the cleaning station on the cleaning and coating mechanism 120d. After the material 200d is cleaned and coated by the cleaning and coating mechanism 120d, the second conveying component 130c can pick up the material 200d from the cleaning station and transport it to the waiting station on the processing platform 130d. The material 200d before and after cleaning is transported by the first picking unit 120c and the second conveying component 130c respectively, which can avoid secondary contamination. The processed material 200d can be returned via the same route following the steps described above, which will not be repeated here.

[0089] Specifically, in one embodiment, combined with Figures 3-6 The first material handling unit 120c includes a first lifting mechanism 121c, a second lifting mechanism 122c, and a first suction cup assembly 123c. The first lifting mechanism 121c is mounted on the transport slider 100c; the second lifting mechanism 122c is mounted on the first lifting mechanism 121c; and the first suction cup assembly 123c is mounted on the second lifting mechanism 122c and includes multiple first suction cups for adsorbing material 200d, each first suction cup forming an adsorption plane for adsorbing material 200d. Specifically, both the first lifting mechanism 121c and the second lifting mechanism 122c include cylinders. The first material handling unit 120c disclosed in this invention can compatiblely adsorb materials 200d of different sizes, making it highly practical. The transport unit 110c can be specifically mounted on the transport slider 100c, the first lifting mechanism 121c, the second lifting mechanism 122c, or the first suction cup assembly 123c.

[0090] Material 200d is transported from hopper 100d to adjustment station by transport unit 110c for straightening. During this process, first suction cup assembly 123c needs to avoid transport unit 110c and material 200d transported by transport unit 110c. After material 200d is straightened at adjustment station, second lifting mechanism 122c drives first suction cup assembly 123c to move a second preset distance along a third direction, so that first suction cup can move to a position that can adsorb material 200d located at adjustment station. After adsorption, first lifting mechanism 121c drives first suction cup assembly 123c to move a first preset distance along a third direction, so that material 200d can be moved from adjustment station to cleaning station and placed on cleaning coating mechanism 120d. That is, the first preset distance is equal to the distance between adjustment station and cleaning station.

[0091] Those skilled in the art will understand that the first lifting mechanism 121c and the second lifting mechanism 122c can also achieve their functions by exchanging their positions.

[0092] In one embodiment, the conveying unit 110c includes a rotating mechanism 111c and a gripper assembly. The rotating mechanism 111c is disposed on the conveying slider 100c or the first picking unit 120c. The gripper assembly is connected to the rotating mechanism 111c and is used to grip the material 200d. The rotating mechanism 111c drives the gripper assembly to rotate and switch between a first position and a second position. When the gripper assembly is in the first position, it grips the material 200d; when it is in the second position, it avoids the suction plane of the first suction cup assembly 123c. By ensuring the material 200d is properly positioned at the adjustment station, the first conveying assembly can switch between the working states of the conveying unit 110c and the first picking unit 120c, thereby realizing the conveying and movement of the material 200d in different directions.

[0093] Specifically, in combination Figure 6 The gripper assembly includes a first clamping plate 113c, a second clamping plate 114c, and a gripper drive 112c. The first clamping plate 113c is connected to the rotating mechanism 111c. The gripper drive 112c is disposed on the first clamping plate 113c and connected to the second clamping plate 114c, enabling it to drive the second clamping plate 114c to move closer to or further away from the first clamping plate 113c, thereby gripping the material 200d. The conveying unit 110c disclosed in this invention can compatiblely grip materials 200d of different sizes, making it highly practical.

[0094] To further optimize the design, elastic buffer pads are provided on the facing surfaces of the first clamping plate 113c and the second clamping plate 114c to avoid damage to the material 200d during the clamping process.

[0095] Combination Figure 3The second conveying assembly 130c includes a second material-grabbing unit and a third lifting mechanism 131c. The third lifting mechanism 131c is disposed on the conveying slider 100c, and the second material-grabbing unit is connected to the third lifting mechanism 131c. The third lifting mechanism 131c is used to drive the second material-grabbing unit to move a third preset distance in a third direction. Specifically, the third lifting mechanism 131c includes a cylinder, and the second material-grabbing unit includes multiple second suction cups for adsorbing materials 200d. The second material-grabbing unit disclosed in this invention can compatiblely adsorb materials 200d of different sizes, and has strong practicality.

[0096] The scheme is further optimized so that the loading station and the adjustment station are on the same straight line along the first direction, which makes it convenient for the handling unit 110c to directly drag the material 200d from the loading station to the adjustment station by the translational movement of the handling slider 100c on the handling track 101c.

[0097] Further optimize the plan, combined with Figure 2 Along the first direction, the waiting station and the adjustment station or cleaning station are on the same straight line, so that after the second conveying component 130c adsorbs the material 200d, the material 200d can be directly moved and dragged between the adjustment station or cleaning station and the waiting station by the translational movement of the conveying slider 100c on the conveying track 101c.

[0098] Depending on the actual situation, the processed material 200d can be cleaned at the cleaning and coating mechanism 120d during the unloading process, or it can be directly transported back to the storage bin 100d. After the material 200d is processed, if it can be directly stored in the storage bin 100d without cleaning, it is preferable to wait for the workstation and the adjustment workstation to be aligned in the first direction, that is, the first preset distance is equal to the third preset distance, so that after the material 200d is processed, the second conveying component 130c can directly transport the material 200d from the processing platform 130d to the position adjustment mechanism 110d via the translational movement of the conveying slider 100c on the conveying track 101c, and then directly transported back to the storage bin 100d by the conveying unit 110c, without going through the cleaning workstation on the cleaning and coating mechanism 120d and the handover of the first picking unit 120c. Accordingly, combined with Figure 2 During the feeding process, after the second material picking unit picks up the material at the cleaning station, the third lifting mechanism 131c drives the second material picking unit to move the material 200d from the cleaning station to the adjustment station. Then, through the movement of the transport slider 100c on the transport track 101c, the material 200d is transported from the adjustment station to the waiting station.

[0099] Combination Figure 1 and Figure 3The first and second transport components 130c can be installed on opposite sides of the transport slider 100c respectively to avoid mutual interference.

[0100] In some embodiments, the conveying mechanism 140d disclosed in this invention further includes sensing components, including but not limited to a position sensor for detecting the specific position of the conveying slider 100c on the conveying track 101c, and a position sensor for detecting whether the extension and retraction stroke of each cylinder has reached the required position. The arrangement of each sensor can be adjusted according to actual conditions, and will not be elaborated here.

[0101] It should be noted that after the position adjustment mechanism 110d has regulated the material 200d, in order to avoid affecting the movement of the conveying mechanism 140d and the material 200d in the third direction, the two adjusting parts 200a of the position adjustment mechanism 110d are moved to a clearance position in a direction away from each other, so as to facilitate the conveying mechanism 140d to drive the material 200d to rise and fall.

[0102] Those skilled in the art will understand that the laser processing equipment disclosed in this invention can process two materials 200d simultaneously. Specifically, during the process of the first material 200d being unloaded onto the processing platform 130d for processing, the transport mechanism 140d can transport the second material 200d. During the cleaning and coating process of the second material 200d, the transport mechanism 140d can unload the first material 200d to improve work efficiency.

[0103] In one embodiment, the laser processing equipment also includes an ion air bar, and the transport track 101c extends to the location of the ion air bar to remove static electricity during the transport of material 200d, preventing damage to material 200d and the equipment.

[0104] Combination Figures 7-11The position adjustment mechanism 110d disclosed in this invention includes a mounting frame 100a, an adjustment member 200a, and a driving mechanism. The mounting frame 100a is provided with two limiting grooves 101a, which extend along the moving direction of the adjustment member 200a. Two adjustment members 200a are movably mounted on the mounting frame 100a to form an adjustment station. Each adjustment member 200a is provided with a limiting block 210a, which corresponds one-to-one with the limiting groove 101a. It is slidably set in the limiting groove 101a; the drive mechanism is set on the mounting frame 100a and connected to the adjustment member 200a. The drive mechanism is used to drive the two adjustment members 200a to move closer to each other to adjust the posture of the material 200d at the adjustment station, and to drive the two adjustment members 200a to move further apart so that the conveying mechanism 140d can load and unload at the adjustment station, and avoid the movement of the conveying mechanism 140d and the material 200d between the adjustment station and the cleaning station.

[0105] In the initial state, the two adjusting members 200a are spaced apart by a first distance, and the material 200d can be placed on the bearing surface of the adjusting member 200a. During the straightening process, combined with... Figure 7 and Figure 8 The two adjusting members 200a move closer to each other until the two sides of the material 200d are in contact with the regular surfaces on the two adjusting members 200a, thereby adjusting the posture of the material 200d. After adjustment, the material 200d can be moved away by the conveying mechanism 140d, and the driving mechanism drives the two adjusting members 200a to reset. During the process of the driving mechanism driving the two adjusting members 200a to move closer or further apart, the two limiting blocks 210a slide in their respective limiting grooves 101a. When the limiting block 210a slides to the end position of both ends of the limiting groove 101a and abuts against the end wall of the limiting groove 101a, the limiting block 210a can no longer slide, and the adjusting member 200a stops moving, thereby limiting the movement limit position of the adjusting member 200a.

[0106] The position adjustment mechanism 110d disclosed in this invention achieves movement limitation of the adjustment member 200a through the abutment cooperation between the limiting groove 101a and the limiting block 210a. By opening the limiting groove 101a for limiting, the weight of the mounting bracket 100a can be reduced. At the same time, since the limiting block 210a can be partially embedded in the limiting groove 101a, the space occupied is greatly saved, and the portability and compactness of the position adjustment mechanism 110d are improved.

[0107] Combination Figure 10In a specific embodiment of the present invention, elastic buffer members 201a are provided at both ends of the limiting block 210a along the extending direction of the limiting groove 101a. The elastic buffer members 201a are used to abut against the end walls of the limiting groove 101a. The elastic buffer members 201a specifically include, but are not limited to, elastic rubber pads. When the limiting block 210a slides to the two ends of the limiting groove 101a, the elastic buffer members 201a are pressed between the limiting block 210a and the end walls of the limiting groove 101a, thereby avoiding direct contact between the limiting block 210a and the limiting groove 101a and buffering the collision between the limiting groove 101a and the limiting block 210a.

[0108] Further optimize the plan, combined with Figure 10 The mounting bracket 100a is equipped with a first limit sensor 410a and a second limit sensor 411a. The first limit sensor 410a detects whether the adjusting member 200a has moved to its initial position, and the second limit sensor 411a detects whether the adjusting member 200a has moved to a limited position. When the adjusting member 200a is in its initial position, the two adjusting members 200a are spaced apart by a first distance, avoiding movement of the conveying mechanism 140d and the material 200d between the adjustment station and the cleaning station. When the adjusting member 200a is in its limited position, the two adjusting members 200a are spaced apart by a second distance, and the first distance is greater than the second distance. During normal operation of the position adjustment mechanism 110d, the movement stroke of the adjusting member 200a is limited by the setting of the first limit sensor 410a and the second limit sensor 411a. When the first limit sensor 410a and the second limit sensor 411a fail, the movement stroke of the adjusting member 200a is limited by the cooperation of the limit groove 101a and the limit block 210a.

[0109] To facilitate timely reminders to operators when the position adjustment mechanism 110d malfunctions, fault alarm sensors can be installed on the end walls at both ends of the limit groove 101a or on both ends of the limit block 210a along the moving direction of the adjustment member 200a. These fault alarm sensors are triggered when the limit block 210a contacts the end wall of the limit groove 101a, which can remind operators that the position adjustment mechanism 110d has malfunctioned and needs maintenance.

[0110] Furthermore, the two limiting grooves 101a can be arranged in parallel and staggered so that the position arrangement of the two limiting grooves 101a does not affect each other, thereby appropriately extending the length of the limiting grooves 101a and further reducing the weight of the position adjustment mechanism 110d.

[0111] To ensure reliable sliding of the adjusting component 200a, combined with Figure 10The mounting bracket 100a is provided with at least one first guide rail 110a. The first guide rail 110a extends along the moving direction of the adjusting member 200a, and the adjusting member 200a is slidably disposed on the first guide rail 110a by a slider 111a. During the process of the driving mechanism driving the adjusting member 200a to move, the adjusting member 200a slides along the extending direction of the first guide rail 110a, and the first guide rail 110a guides the sliding of the adjusting member 200a.

[0112] In one embodiment, combined with Figure 9 There are two first guide rails 110a arranged in parallel. The two first guide rails 110a are respectively set on both sides of the limiting groove 101a, and the two adjusting members 200a are slidably connected to the two first guide rails 110a through the slider 111a. The adjusting member 200a extends in the direction perpendicular to the first guide rail 110a. By setting two first guide rails 110a, the fixing points of the adjusting member 200a can be effectively increased, thereby improving the load-bearing capacity of the cantilevered adjusting member 200a.

[0113] Combination Figure 11 The mounting bracket 100a includes a mounting base plate, a fixing plate, and mounting side plates. A limiting groove 101a is provided on the mounting base plate. The fixing plate is parallel to the mounting base plate and is used to fix it to the ground or base. The mounting side plates are connected between the mounting base plate and the fixing plate.

[0114] In one embodiment, combined with Figure 11 The drive mechanism includes a drive motor 300a, a synchronous pulley 310a, and a synchronous belt 320a. The drive motor 300a is mounted on the mounting side plate. There are two synchronous pulleys 310a. The drive motor 300a is connected to one synchronous pulley 310a, and the other synchronous pulley 310a is rotatably mounted on the mounting base plate. The synchronous belt 320a is connected between the two synchronous pulleys 310a. The adjusting member 200a is connected to the synchronous belt 320a. The two adjusting members 200a are respectively connected to two opposite parts of the synchronous belt 320a. When the drive motor 300a drives the synchronous belt 320a to rotate, the two adjusting members 200a move synchronously with the synchronous belt 320a and move closer to or further away from each other.

[0115] Combination Figure 12 The hopper 100d is mounted on the lifting mechanism 101d. The lifting mechanism 101d can lift the hopper 100d along a third direction, so that multiple storage positions arranged in sequence along the vertical direction inside the hopper 100d can be lifted to the loading and unloading positions respectively, thus facilitating the loading and unloading of materials by the handling mechanism 140d.

[0116] In one embodiment, combined with Figure 12 , Figure 12The arrows indicate the transport direction in which the transport mechanism 140d moves material 200d from the silo 100d to the position adjustment mechanism 110d. A silo sensor 420a is installed on the side of the mounting frame 100a facing the silo 100d. The silo sensor 420a is used to detect whether material 200d is placed at the loading station of the silo 100d to avoid invalid transport by the transport mechanism 140d.

[0117] Combination Figure 7 An adjustment sensor 440a is provided on the side of the mounting frame 100a facing the silo 100d. The adjustment sensor 440a is used to detect whether each material 200d stored in the silo 100d protrudes from the silo 100d, thereby facilitating the handling by the handling mechanism 140d.

[0118] Combination Figure 7 The mounting frame 100a is equipped with a barcode scanning component 400a, which is used to scan the material 200d being transported by the transport mechanism 140d during the process of the transport mechanism 140d moving from the hopper 100d to the adjusting component 200a.

[0119] In one embodiment, a material sensor 430a is provided on the mounting frame 100a. The material sensor 430a is used to detect whether the conveying mechanism 140d is carrying material 200d during the process of the conveying mechanism 140d moving from the hopper 100d to the adjusting member 200a, so as to avoid the conveying mechanism 140d carrying material ineffectively.

[0120] Combination Figure 12 The extension direction of the adjusting component 200a is parallel to the first direction. The aforementioned barcode scanning component 400a and material sensor 430a are both arranged between the hopper 100d and the adjusting station to detect the material 200d before the conveying mechanism 140d places it on the adjusting station.

[0121] Combination Figure 12 A baffle 120a is provided on the mounting frame 100a to protect the various structures on the mounting frame 100a. A clearance hole is provided on the mounting frame 100a to avoid affecting the detection of the hopper sensor 420a and the material sensor 430a.

[0122] Those skilled in the art will understand that the types of sensors in this invention are not limited to photoelectric sensors, travel sensors, etc., as long as they can achieve their functions.

[0123] Combination Figures 13-22The cleaning and coating mechanism 120d disclosed in this invention includes a cleaning and coating tank 100b, a rotating platform 200b, a cleaning swing arm 300b, and a coating swing arm 400b. The cleaning and coating tank 100b has an opening for the material 200d to enter and exit. The rotating platform 200b is rotatably disposed inside the cleaning and coating tank 100b. The material 200d is placed on the rotating platform 200b. The rotating platform 200b can drive the material 200d to rotate at high speed, so as to quickly dry the moisture on the material 200d and make the protective liquid on the material 200d evenly distributed. The cleaning station is located on the rotating platform 200b. The cleaning swing arm 300b is oscillatingly disposed within the cleaning and coating tank 100b and is provided with a first water outlet 331b, which is arranged toward the rotating platform 200b to spray water onto the material 200d during the oscillation process; the coating swing arm 400b is oscillatingly disposed within the cleaning and coating tank 100b and is provided with an adhesive applicator 431b, which is arranged toward the rotating platform 200b to apply adhesive onto the material 200d during the oscillation process.

[0124] After material 200d enters the cleaning and coating tank 100b and is placed on the rotating platform 200b, the cleaning swing arm 300b swings above the material 200d on the rotating platform 200b, and sprays water onto the material 200d through the first water outlet 331b. Simultaneously, the swing of the cleaning swing arm 300b allows for cleaning of different positions on the material 200d. After cleaning, the rotating platform 200b rotates the material 200d to quickly dry it. After drying, the cleaning swing arm 300b swings to a position that does not interfere with the swing of the coating swing arm 400b, while the coating swing arm 400b swings above the material 200d on the rotating platform 200b, and applies adhesive through the adhesive application nozzle 431b. During the adhesive application process, the rotating platform 200b continuously rotates the material 200d to ensure uniform coating of the protective liquid under centrifugal force. All splashed water and protective liquid during the cleaning and adhesive application processes are collected by the cleaning and coating tank 100b.

[0125] The cleanliness of the material after 200 days of cleaning can be ensured by adjusting the swing speed of the cleaning swing arm 300b and the water output of the first outlet 331b; the uniformity of the coating can be ensured by adjusting the swing speed of the coating swing arm 400b and the glue output of the glue outlet 431b. Preferably, the cleaning swing arm 300b and the coating swing arm 400b are arranged symmetrically with respect to the axis of the cleaning and coating tank 100b to avoid interference between their swings.

[0126] The cleaning and coating mechanism 120d disclosed in this invention cleans and coats the material 200d with adhesive using a cleaning swing arm 300b and a coating swing arm 400b, respectively. During the cleaning process, the coating swing arm 400b can swing the coating port 431b to a position that avoids the material 200d, thus preventing adhesive dripping and ensuring the cleanliness of the material 200d. During the coating process, the cleaning swing arm 300b can swing the first water outlet 331b to a position that avoids the material 200d, thus preventing water dripping and ensuring the uniformity of the protective liquid coating.

[0127] In one embodiment, the cleaning swing arm 300b includes a first motor 310b, a first connecting shaft 320b, and a first swing arm shaft 330b. The first motor 310b is disposed outside the cleaning coating tank 100b, and the first swing arm shaft 330b is disposed inside the cleaning coating tank 100b. A first water outlet 331b is disposed on the first swing arm shaft 330b. The first connecting shaft 320b is drivingly connected between the first motor 310b and the first swing arm shaft 330b. The first motor 310b can drive the first connecting shaft 320b and the first swing arm shaft 330b. The coating swing arm 400b includes a second motor 410b, a second connecting shaft 420b, and a second swing arm shaft 430b. The second motor 410b is located outside the cleaning coating tank 100b, and the second swing arm shaft 430b is located inside the cleaning coating tank 100b. The glue application port 431b is located on the second swing arm shaft 430b. The second connecting shaft 420b is connected to the second motor 410b and the second swing arm shaft 430b. The second motor 410b can drive the second connecting shaft 420b and the second swing arm shaft 430b to rotate together.

[0128] Specifically, a reducer is provided at the output end of the first motor 310b, and the reducer is connected to the first connecting shaft 320b via a coupling. A reducer is also provided at the output end of the second motor 410b, and the reducer is connected to the second connecting shaft 420b via a coupling. Both the first connecting shaft 320b and the second connecting shaft 420b extend vertically, and both the first swing arm shaft 330b and the second swing arm shaft 430b swing in a horizontal plane.

[0129] Combination Figure 19 The first connecting shaft 320b and the first swing arm shaft 330b can be interconnected pipe structures, and a first water inlet 321b is provided at the end of the first connecting shaft 320b located outside the cleaning coating tank 100b, and the first water outlet 331b is connected to the first swing arm shaft 330b so as to supply water to the first water outlet 331b through the first water inlet 321b.

[0130] Material 200d is placed into the cleaning and coating tank 100b by the conveying mechanism 140d for cleaning and adhesive application. After cleaning and adhesive application, it is transferred out of the cleaning and coating tank 100b by the conveying mechanism 140d. To facilitate the transfer and placement of material 200d, in a specific embodiment of the present invention, the cleaning and coating mechanism 120d further includes a lifting assembly connected to the rotating platform 200b, used to drive the rotating platform 200b to rise and fall between the bottom and the opening of the cleaning and coating tank 100b. When the rotating platform 200b rises to the opening of the cleaning and coating tank 100b, the conveying mechanism 140d loads or unloads material at the cleaning station. When the rotating platform 200b descends to the bottom of the cleaning and coating tank 100b, the first water outlet 331b and the adhesive application port 431b are arranged facing the rotating platform 200b.

[0131] Specifically, during the process of material 200d being moved by the conveying mechanism 140d to the opening of the cleaning and coating tank 100b, the lifting component drives the rotating platform 200b to rise to the opening of the cleaning and coating tank 100b. This allows the conveying mechanism 140d to place material 200d directly onto the rotating platform 200b without needing to extend into the cleaning and coating tank 100b. Then, material 200d is lowered by the rotating platform 200b to the bottom of the cleaning and coating tank 100b, facilitating the spraying of water and application of adhesive by the cleaning swing arm 300b and the coating swing arm 400b. After cleaning and adhesive application are completed, the lifting component raises the rotating platform 200b again, positioning material 200d at the opening of the cleaning and coating tank 100b. This allows the conveying mechanism 140d to remove material 200d directly from outside the cleaning and coating tank 100b and receive the next material 200d.

[0132] Specifically, the rotating platform 200b is driven to rotate by a rotary motor 210b, and the lifting assembly includes a lifting motor 220b, which is fixed to the support assembly and can drive the rotating platform 200b and the rotary motor 210b to rise and fall together. Figure 21 The rotating platform 200b is connected to the lifting guide column 230b, and the lifting guide column 230b slides with the bracket assembly to achieve lifting guidance.

[0133] To avoid interference between the lifting and lowering movements of the cleaning swing arm 300b and the coating swing arm 400b and the rotating platform 200b, a first clearance space and a second clearance space are provided protruding outward on the side wall of the cleaning and coating tank 100b. The first clearance space is used to accommodate the first swing arm shaft 330b, and the second clearance space is used to accommodate the second swing arm shaft 430b. When the first swing arm shaft 330b and the second swing arm shaft 430b swing into the first clearance space and the second clearance space respectively, the first swing arm shaft 330b and the second swing arm shaft 430b are misaligned with the rotating platform 200b along the bottom of the cleaning and coating tank 100b towards the opening, thereby avoiding the lifting and lowering movements of the rotating platform 200b, that is, avoiding the entry and exit path of the material 200d in the cleaning and coating tank 100b.

[0134] Further optimizing the design, the cleaning and coating mechanism 120d also includes an atomizing nozzle 340b. The atomizing nozzle 340b is equipped with a first interface 341b, a second interface 342b, and a spray outlet 343b. The first interface 341b is connected to a water inlet pipe via a first water outlet 331b, the second interface 342b is connected to an air inlet pipe, and the spray outlet 343b is connected to both the first interface 341b and the second interface 342b, and is positioned towards the rotating platform 200b. The atomizing nozzle 340b allows the cleaning arm 300b to spray pure water, water mist, and pure air. The water spray mode and the mist spray mode can be used for cleaning the material 200d, while the air spray mode can be used during the spin-drying process of the material 200d to shorten the drying time.

[0135] Material 200d is supported by a support member located circumferentially on the material 200d. During the adhesive application process, splashed protective liquid will fall onto the support member. Therefore, to facilitate cleaning of the support member, a second water outlet 332b is provided on the cleaning swing arm 300b. The second water outlet 332b is connected to the water inlet pipe and is oriented towards the support member so that the support member can be cleaned separately after the material 200d has been coated with adhesive. The rotating platform 200b can be used to fix the support member by means of suction cup adsorption, snap-fit, etc., so that the material 200d rotates with the rotating platform 200b.

[0136] To prevent the protective liquid at the glue application port 431b from crystallizing and affecting normal glue dispensing, a third water outlet 432b is provided on the coating swing arm 400b. The third water outlet 432b is arranged facing the glue application port 431b so that water can be sprayed onto the glue application port 431b for cleaning after the glue application is completed.

[0137] Combination Figure 20The second connecting shaft 420b and the second swing arm shaft 430b can be interconnected pipe structures, and a second water inlet 421b is provided at one end of the second connecting shaft 420b outside the cleaning coating tank 100b. The second swing arm shaft 430b is connected to the third water outlet 432b so that water can enter the third water outlet 432b through the second water inlet 421b.

[0138] Combination Figure 14 The cleaning and coating tank 100b includes a base 102b and a side panel 101b, which are sealed together. A rotating platform 200b is mounted on the base 102b, and a leakage detection sensor is installed on the outer wall of the base 102b. To improve waterproof performance, waterproof adhesive or other waterproof coatings can be evenly applied to the connection point between the base 102b and the side panel 101b, as well as to their inner walls.

[0139] The aforementioned air inlet or water inlet pipe can pass through the side panel 101b and enter the cleaning and coating tank 100b. A water outlet is provided on the chassis 102b, which is connected to a drain pipe for waste liquid discharge.

[0140] To prevent cleaning water or protective liquid from being splashed out of the cleaning coating tank 100b during the cleaning and coating process, the cleaning coating mechanism 120d also includes a water-blocking roller shutter 110b. The water-blocking roller shutter 110b has a water-blocking state and a retracted state. When the water-blocking roller shutter 110b is in the water-blocking state, it blocks the opening of the cleaning coating tank 100b. When the water-blocking roller shutter 110b is in the retracted state, it avoids the opening of the cleaning coating tank 100b.

[0141] Specifically, the switching between the water-blocking roller shutter 110b and the retracted state can be driven by a motor. For example, one end of the water-blocking roller shutter 110b is fixed to the cleaning and coating tank 100b, and the other end is extended via a pull rod. This pull rod can be connected to the motor via a gear and rack transmission structure to achieve positional movement, thereby realizing the switching between the water-blocking roller shutter 110b and the retracted state. Furthermore, combined with… Figure 15 A second guide rail 111b can also be provided on the cleaning and coating tank 100b to facilitate the movement of the pull rod along the second guide rail 111b.

[0142] Combination Figure 14The cleaning and coating tank 100b is mounted on a support assembly, which includes a base 500b and a support frame 510b. A first shock-absorbing component 520b is provided on the first side of the base 500b; the support frame 510b is provided on the second side of the base 500b, and the cleaning and coating tank 100b is mounted on the support frame 510b, with a second shock-absorbing component 530b between the tank and the support frame 510b. The first and second shock-absorbing components 520b effectively reduce the vibration impact during the operation of the cleaning and coating mechanism 120d.

[0143] In addition, the laser processing equipment disclosed in this invention also includes structures such as an optical path assembly, a gantry assembly, a CCD positioning assembly, and an outer contour positioning assembly. The optical path assembly includes a laser, optical elements, etc., used to form the laser processing optical path; the gantry assembly includes a marble platform, an X-axis, a Y-axis, etc., used as a skeleton to support various mechanisms; the CCD positioning assembly includes an upper CCD assembly and a lower CCD assembly, both of which include a camera, a light source, a lens, and their fixtures, used to detect the material 200d located at the waiting station; the outer contour positioning assembly mainly consists of a camera and its fixtures; the processing platform assembly mainly consists of a stage, a hollow motor, and a glass platform. These structures are all prior art and will not be described in detail here.

[0144] The terms "first" and "second," etc., used in the specification and claims of this invention are used to distinguish different objects, not to describe a specific order, and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. Additionally, in the description of embodiments of this invention, "a plurality of" refers to two or more.

[0145] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Specific technical means in some embodiments may be incorporated, in whole or in part, into another embodiment without being explicitly excluded by another embodiment. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A laser processing device, characterized in that, It includes a hopper (100d), a cleaning and coating unit (120d), a processing platform (130d), and a handling unit (140d). The hopper (100d) is provided with a loading station and a unloading station for storing materials (200d). The cleaning and coating mechanism (120d) is provided with a cleaning station for cleaning and / or applying adhesive to the materials (200d). In the first direction, a waiting station is provided on one side of the cleaning station. The processing platform (130d) can move to the waiting station in a second direction perpendicular to the first direction. The conveying mechanism (140d) includes a first conveying component and a second conveying component (130c). The first conveying component is used to load material (200d) from the loading station and unload it to the cleaning station, and to load material (200d) from the cleaning station and unload it to the unloading station. The second conveying component is used to load material (200d) from the cleaning station and unload it to the waiting station, and to load material (200d) from the waiting station and unload it to the cleaning station. It also includes a position adjustment mechanism (110d), which is provided with an adjustment station. The position adjustment mechanism (110d) includes two adjustment components (200a) and a drive mechanism. The two adjustment components (200a) form the adjustment station. The drive mechanism is connected to the adjustment components (200a) and is used to adjust the posture of the material (200d) at the adjustment station. It also includes a first limit sensor (410a) for detecting whether the adjustment member (200a) has moved to the initial position, and a second limit sensor (411a) for detecting whether the adjustment member (200a) has moved to the defined position; when the adjustment member (200a) is in the initial position, the two adjustment members (200a) are spaced apart by a first distance to avoid the movement of the conveying mechanism (140d) and the material (200d) between the adjustment station and the cleaning station; when the adjustment member (200a) is in the defined position, the two adjustment members (200a) are spaced apart by a second distance, the first distance being greater than the second distance.

2. The laser processing equipment as described in claim 1, characterized in that, The cleaning and coating mechanism (120d) is located below the position adjustment mechanism (110d) and extends upward along a third direction. The positions of the adjustment station and the cleaning station correspond, and the third direction is perpendicular to the first direction and the second direction, respectively.

3. The laser processing equipment as described in claim 2, characterized in that, The conveying mechanism (140d) includes a conveying track (101c) extending along a first direction and a conveying slider (100c) slidably disposed on the conveying track (101c). The conveying track (101c) extends sequentially to the hopper (100d), the cleaning and coating mechanism (120d), and the processing platform (130d). The first conveying component and the second conveying component (130c) are both disposed on the conveying slider (100c) to move and convey materials (200d) between the hopper (100d), the cleaning and coating mechanism (120d), and the processing platform (130d) along with the conveying slider (100c).

4. The laser processing equipment as described in claim 3, characterized in that, The first conveying assembly includes a conveying unit (110c) and a first picking unit (120c). Both the conveying unit (110c) and the first picking unit (120c) are disposed on the conveying slider (100c). The conveying unit (110c) is used to load material (200d) from the loading station and unload it at the adjustment station, and to load material (200d) from the adjustment station and unload it at the unloading station. The first picking unit (120c) is used to load material (200d) from the adjustment station and then transport and unload it along the third direction at the cleaning station, and to load material (200d) from the cleaning station and then transport and unload it along the third direction at the adjustment station.

5. The laser processing equipment as described in claim 4, characterized in that, The first material handling unit (120c) includes: The first lifting mechanism (121c) is disposed on the transport slider (100c); The second lifting mechanism (122c) is disposed on the first lifting mechanism (121c); The first suction cup assembly (123c) is disposed on the second lifting mechanism (122c) and includes a plurality of first suction cups, the first suction cups forming an adsorption plane for adsorbing material (200d); Wherein, the first lifting mechanism (121c) is used to drive the second lifting mechanism (122c) to move the first suction cup assembly (123c) along the third direction by a first preset distance, the first preset distance being equal to the interval distance between the adjustment station and the cleaning station, and the second lifting mechanism (122c) is used to drive the first suction cup assembly (123c) along the third direction by a second preset distance, so that the adsorption plane adsorbs the material (200d).

6. The laser processing equipment as described in claim 5, characterized in that, The conveying unit (110c) includes: A rotating mechanism (111c) is disposed on the conveying slider (100c) or the first material handling unit (120c); The gripper assembly, connected to the rotating mechanism (111c), is used to grip the material (200d). The rotating mechanism (111c) is used to drive the gripper assembly to rotate and switch between a first position and a second position. When the gripper assembly is in the first position, the gripper assembly is used to grip the material (200d). When the gripper assembly is in the second position, the gripper assembly avoids the adsorption plane.

7. The laser processing equipment as described in claim 3, characterized in that, The second conveying assembly (130c) includes a second picking unit and a third lifting mechanism (131c). The third lifting mechanism (131c) is disposed on the conveying slider (100c), and the second picking unit is connected to the third lifting mechanism (131c). The third lifting mechanism (131c) is used to drive the second picking unit to move a third preset distance along the third direction.

8. The laser processing equipment as described in claim 2, characterized in that, The position adjustment mechanism (110d) includes a mounting bracket (100a); The adjusting member (200a) is movably disposed on the mounting bracket (100a); The mounting bracket (100a) is provided with two limiting grooves (101a), which extend along the moving direction of the adjusting member (200a). The adjusting member (200a) is provided with a limiting block (210a), the limiting block (210a) corresponds one-to-one with the limiting groove (101a), and is slidably disposed in the limiting groove (101a); The drive mechanism is mounted on the mounting bracket (100a). The drive mechanism is used to drive the two adjustment members (200a) to move closer to each other to adjust the posture of the material (200d) at the adjustment station, and to drive the two adjustment members (200a) to move further apart so that the conveying mechanism (140d) can load and unload materials at the adjustment station, and to avoid the movement of the conveying mechanism (140d) and the material (200d) between the adjustment station and the cleaning station.

9. The laser processing equipment as described in claim 8, characterized in that, Along the extension direction of the limiting groove (101a), elastic buffer members (201a) are provided on both end faces of the limiting block (210a), and the elastic buffer members (201a) are used to abut against the end wall of the limiting groove (101a).

10. The laser processing equipment as described in claim 8, characterized in that, The first limit sensor (410a) and the second limit sensor (411a) are mounted on the mounting bracket (100a).

11. The laser processing equipment as described in claim 8, characterized in that, A hopper sensor (420a) is provided on the side of the mounting bracket (100a) facing the hopper (100d). The hopper sensor (420a) is used to detect whether material (200d) is placed at the loading station; and / or, An adjustment sensor (440a) is provided on the side of the mounting bracket (100a) facing the hopper (100d). The adjustment sensor (440a) is used to detect whether each material (200d) stored in the hopper (100d) protrudes from the hopper (100d).

12. The laser processing equipment as described in claim 8, characterized in that, The mounting bracket (100a) is equipped with a barcode scanning component (400a), which is used to scan the material (200d) transported by the transport mechanism (140d) during the movement of the transport mechanism (140d) from the hopper (100d) to the adjusting member (200a); and / or, A material sensor (430a) is provided on the mounting frame (100a). The material sensor (430a) is used to detect whether the conveying mechanism (140d) is carrying material (200d) during the process of the conveying mechanism (140d) moving from the hopper (100d) to the adjusting member (200a).

13. The laser processing equipment as described in claim 1, characterized in that, The cleaning and coating mechanism (120d) includes a cleaning and coating tank (100b), a rotating platform (200b), a cleaning swing arm (300b), and a coating swing arm (400b). The cleaning and coating tank (100b) has an opening for the material (200d) to enter and exit; The rotating platform (200b) is rotatably disposed inside the cleaning and coating tank (100b) to form the cleaning station that drives the material (200d) to rotate; The cleaning swing arm (300b) is oscillatingly disposed inside the cleaning coating tank (100b) and is provided with a first water outlet (331b), which is arranged toward the rotating platform (200b). The coating swing arm (400b) is oscillatingly disposed inside the cleaning coating tank (100b) and is provided with a glue applicator (431b) which is arranged toward the rotating platform (200b).

14. The laser processing equipment as described in claim 13, characterized in that, The cleaning swing arm (300b) includes a first motor (310b), a first connecting shaft (320b), and a first swing arm shaft (330b). The first motor (310b) is disposed outside the cleaning coating tank (100b), the first swing arm shaft (330b) is disposed inside the cleaning coating tank (100b), and the first water outlet (331b) is disposed on the first swing arm shaft (330b). The first connecting shaft (320b) is drivingly connected between the first motor (310b) and the first swing arm shaft (330b); and / or, The coating swing arm (400b) includes a second motor (410b), a second connecting shaft (420b), and a second swing arm shaft (430b). The second motor (410b) is located outside the cleaning coating tank (100b), and the second swing arm shaft (430b) is located inside the cleaning coating tank (100b). The glue applicator (431b) is located on the second swing arm shaft (430b), and the second connecting shaft (420b) is drivingly connected between the second motor (410b) and the second swing arm shaft (430b).

15. The laser processing equipment as described in claim 14, characterized in that, It also includes a lifting assembly connected to the rotating platform (200b) for driving the rotating platform (200b) to move up and down between the bottom and the opening of the cleaning coating tank (100b); When the rotating platform (200b) rises to the opening of the cleaning and coating tank (100b), the conveying mechanism (140d) loads or unloads materials at the cleaning station. When the rotating platform (200b) descends to the bottom of the cleaning and coating tank (100b), the first water outlet (331b) and the glue application port (431b) are arranged facing the rotating platform (200b).

16. The laser processing equipment as described in claim 15, characterized in that, The cleaning and coating tank (100b) has a first clearance space and a second clearance space protruding outward on its side wall. The first clearance space is used to accommodate the first swing arm shaft (330b), and the second clearance space is used to accommodate the second swing arm shaft (430b). When the first swing arm shaft (330b) and the second swing arm shaft (430b) swing into the first clearance space and the second clearance space respectively, the cleaning swing arm (300b) and the coating swing arm (400b) are both misaligned with the rotating platform (200b) along the bottom of the cleaning and coating tank (100b) towards the opening, so as to avoid the lifting and lowering movement of the rotating platform (200b) in the cleaning and coating tank (100b).

17. The laser processing equipment as described in claim 13, characterized in that, An atomizing nozzle (340b) is provided at the first water outlet (331b). The atomizing nozzle (340b) is provided with a first interface (341b), a second interface (342b), and a spray outlet (343b). The first interface (341b) is connected to the water inlet pipe through the first water outlet (331b), and the second interface (342b) is connected to the air inlet pipe. The spray outlet (343b) is connected to both the first interface (341b) and the second interface (342b) and is arranged toward the rotating platform (200b).

18. The laser processing equipment as described in claim 14, characterized in that, The material (200d) is supported by a support member, and the cleaning swing arm (300b) is provided with a second water outlet (332b), which is arranged toward the support member; and / or, The coating swing arm (400b) is provided with a third water outlet (432b), which is arranged facing the glue application port (431b).

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