Epitaxial wafer resistance value measurement preprocessing device

Abstract

The invention relates to the technical field of epitaxial wafer production equipment, and discloses an epitaxial wafer resistance value measurement pretreatment device, which comprises a main body, the top of the main body is sequentially provided with a first-stage cleaning pool, a second-stage cleaning pool and a third-stage cleaning pool, and the epitaxial wafer resistance value measurement pretreatment device further comprises a placement frame, a placing groove; a fluid channel; the cleaning rollers are in a hollow circular tube shape, the cleaning rollers are rotationally arranged on the frame body, the two ends of the cleaning rollers communicate with the fluid channel, and the two cleaning rollers are arranged on the two sides of the lower portion of the frame body in a mirror image opposite mode; the paddles are fixedly arranged at the end parts of the cleaning rollers; the spray washing holes are uniformly formed in the middle of the cleaning roller; the pressing assembly enables the epitaxial wafer to abut against the cleaning roller; and the pump is arranged on one side of the third-stage cleaning pool. The invention can solve or at least alleviate the problems that the existing epitaxial wafer surface pretreatment device is easy to cause scratches on the surface of the epitaxial wafer and more fine particles are attached, and provides the epitaxial wafer resistance value measurement pretreatment device.

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