OLED (Organic Light Emitting Diode) display device, manufacturing method thereof and display device

By introducing a metal micro-nano structure layer into the first electrode of the OLED display device, the problem of low light extraction efficiency of the existing OLED display device is solved, and a higher light extraction efficiency and better display effect are achieved.

CN119744080APending Publication Date: 2025-04-01BOE TECHNOLOGY GROUP CO LTD
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Patent Information

Application Number
CN202411746938.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-29
Publication Date
2025-04-01

AI Technical Summary

Technical Problem

The light extraction efficiency of existing OLED display devices is low, resulting in large light extraction loss and affecting the display effect.

Method used

A metal micro-nano structure layer is introduced into the first electrode of the OLED display device, including a plurality of array-arranged convex structures, and the convex structures are periodically distributed in at least one direction.

Benefits of technology

Through the introduction of metal micro-nano structure layer, the light extraction efficiency of the display device is effectively improved, the light output loss caused by the substrate mode and waveguide mode is reduced, the apparent deviation of the display device is improved, and the energy of SPPs loss is restored.

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Abstract

The invention provides an OLED display device, a manufacturing method thereof and a display device, and belongs to the technical field of display. The OLED display device comprises a substrate base plate, a plurality of light emitting diodes and a plurality of light emitting diodes, the driving circuit layer is positioned on the substrate; the pixel planarization layer is positioned on one side, far away from the substrate, of the driving circuit layer; the first electrode is positioned on one side, far away from the substrate, of the pixel planarization layer; the second electrode is positioned on one side, far away from the substrate, of the first electrode; a light emitting layer between the first electrode and the second electrode; wherein the first electrode comprises a first conducting layer, a metal micro-nano structure layer and a second conducting layer which are arranged in sequence, the metal micro-nano structure layer is located on the side, close to the substrate, of the second conducting layer, and the metal micro-nano structure layer comprises a plurality of protruding structures arranged in an array mode; and the bulge structures are periodically distributed in at least one direction. The light emitting efficiency of the display device can be improved.
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Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to an OLED display device and a manufacturing method thereof, and a display apparatus. Background Art

[0002] OLED (Organic Light-Emitting Diode) display devices have been listed as the next generation display technology with great development prospects due to their advantages such as thinness, lightness, wide viewing angle, active light emission, continuously adjustable light color, low cost, fast response speed, low energy consumption, low driving voltage, wide operating temperature range, simple production process, high light emission efficiency and flexible display. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide an OLED display device and a manufacturing method thereof, and a display device, which can improve the light extraction efficiency of the display device.

[0004] To solve the above technical problems, the embodiments of the present invention provide the following technical solutions:

[0005] In one aspect, an OLED display device is provided, comprising:

[0006] substrate substrate;

[0007] A driving circuit layer located on the substrate;

[0008] A pixel planarization layer located on a side of the driving circuit layer away from the base substrate;

[0009] A first electrode located on a side of the pixel planarization layer away from the substrate;

[0010] A second electrode located at a side of the first electrode away from the substrate;

[0011] a light emitting layer located between the first electrode and the second electrode;

[0012] Among them, the first electrode includes a first conductive layer, a metal micro-nano structure layer and a second conductive layer arranged in sequence, the metal micro-nano structure layer is located on a side of the second conductive layer close to the substrate, the metal micro-nano structure layer includes a plurality of array-arranged protrusion structures, and the protrusion structures are periodically distributed in at least one direction.

[0013] In some embodiments, in the first direction, the protrusion structures are arranged at intervals to form a plurality of protrusion structure rows;

[0014] The protrusion structures in adjacent rows are staggered and arranged with a preset width.

[0015] In some embodiments, there is a concave structure between adjacent protrusion structures, and the concave structure is a part of a sphere. In the first direction, the concave structures are arranged closely together, and the preset width is 1 / 2 of the diameter of the sphere.

[0016] In some embodiments, the protruding structures are periodically distributed in the first direction, the second direction, and the third direction, the second direction is 60° to the first direction, and the third direction is 120° to the first direction.

[0017] In some embodiments, the diameter of the sphere is 440nm-480nm, 500nm-560nm and / or 580nm-670nm.

[0018] In some embodiments, the metal micro-nanostructure layer includes Ag or Al.

[0019] In some embodiments, the thickness of the metal micro-nanostructure layer is 10-50 nm.

[0020] An embodiment of the present invention further provides a display device, comprising the OLED display device as described above.

[0021] An embodiment of the present invention further provides a method for manufacturing an OLED display device, comprising:

[0022] Providing a substrate;

[0023] forming a driving circuit layer on the base substrate;

[0024] forming a pixel planarization layer on a side of the driving circuit layer away from the base substrate;

[0025] Forming a first electrode on a side of the pixel planarization layer away from the base substrate;

[0026] forming a second electrode on a side of the first electrode away from the substrate;

[0027] forming a light-emitting layer between the first electrode and the second electrode;

[0028] Wherein, forming the first electrode comprises:

[0029] forming a first conductive layer;

[0030] forming a metal micro-nano structure layer, wherein the metal micro-nano structure layer comprises a plurality of convex structures arranged in an array, and the convex structures are periodically distributed in at least one direction;

[0031] A second conductive layer is formed on the metal micro-nano structure layer.

[0032] In some embodiments, forming the metal micro-nano structure layer comprises:

[0033] forming a mixed film layer of ethanol and polystyrene beads on the first conductive layer;

[0034] After ethanol evaporates, forming a polystyrene ball array on the first conductive layer;

[0035] magnetron sputtering a metal layer covering the polystyrene ball array on the polystyrene ball array;

[0036] The polystyrene beads are washed away by an organic solvent to obtain a transitional micro-nano structure;

[0037] The transitional micro-nano structure is heated and annealed to obtain the metal micro-nano structure layer.

[0038] The embodiments of the present invention have the following beneficial effects:

[0039] In the above scheme, the first electrode includes a metal micro-nano structure layer, so that the first electrode and other film layers located on the first electrode have micro-nano structures. The periodically distributed micro-nano structures can effectively improve the light extraction efficiency of the display device, reduce the light loss caused by the substrate mode and the waveguide mode, improve the isotropy of the light emitted by the display device, and improve the color deviation of the viewing angle of the OLED display device. In addition, the metal micro-nano structure can use the diffraction effect of the metal periodic structure to recover the energy lost by SPPs, further improving the light extraction efficiency of the display device. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1 It is a structural schematic diagram of an existing OLED display device;

[0041] Figure 2-Figure 11 A schematic diagram of manufacturing an OLED display device according to an embodiment of the present invention;

[0042] Figure 12-Figure 19 A schematic diagram of manufacturing an OLED display device according to another embodiment of the present invention;

[0043] Fig. 20 and Fig.21 This is a schematic diagram of the dimensions of the metal micro-nano structure layer according to an embodiment of the present invention;

[0044] Fig. 22 Schematic diagram of an OLED display device with a metal micro-nanostructure layer.

[0045] Reference numerals

[0046] 001 Substrate

[0047] 002 First buffer layer

[0048] 003 Gate insulation layer

[0049] 004 Second buffer layer

[0050] 005 Pixel Flattening Layer

[0051] 006 Pixel Definition Layer

[0052] 008 Ethanol and PS beads mixed film layer

[0053] 009 PS ball array

[0054] 010 Metal layer

[0055] 011 Transitional Micro-Nano Structures

[0056] 012 Metal micro-nano structure layer

[0057] 013First conductive layer

[0058] 014 Anode

[0059] 015 Hole transport layer

[0060] 016 Organic light-emitting layer

[0061] 017 Hole blocking layer

[0062] 018 Electron Transport Layer

[0063] 019 Cathode

[0064] 020 ITO layer

[0065] 021 Ag layer

[0066] 030 Anode

[0067] 032 First Electrode

[0068] 033 Micro-nanostructure substrate

[0069] 034 Second conductive layer

[0070] 035 Luminous Layer

[0071] 036 Second Electrode

[0072] 041 Active layer

[0073] 042 Gate

[0074] 043 Source

[0075] 044 Drain DETAILED DESCRIPTION

[0076] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention more clear, a detailed description will be given below with reference to the accompanying drawings and specific embodiments.

[0077] The light-emitting principle of OLED display devices is as follows: electrons and holes are injected into the organic functional layer from the cathode and anode of the device respectively, and then recombine in the "light-emitting layer" and convert electrical energy into light energy to be emitted out of the device in the form of luminous radiation. As a self-luminous device, OLED display devices have high appeal in the field of outdoor display devices such as smartphones and vehicles due to their excellent electroluminescent properties.

[0078] Figure 1 It is a schematic diagram of the structure of an existing OLED display device, which includes a substrate 001, a first buffer layer 002, a gate insulating layer 003, a second buffer layer 004, a pixel planarization layer 005, a pixel defining layer 006 and an anode 030. Generally speaking, OLED display devices are limited by high refractive index components, and the light extraction efficiency is only about 20%. About 80% of the light is limited inside the display device and eventually absorbed. Among them, the main forms of light loss include: absorption mode, substrate mode, waveguide mode and plasma mode, among which waveguide mode and plasma mode account for about 60%.

[0079] Based on the near-field radiation characteristics of surface plasmon polaritons (SPPs) loss in OLED, it is caused by the interaction between exciton radiation and metal, so the simplest way to reduce SPPs loss is to increase the distance between the exciton and the metal electrode, but this will increase the loss of the waveguide mode and increase the operating voltage of the display device. It is an effective method to use the diffraction effect of the metal periodic structure to recover the energy of SPPs loss. At the same time, the waveguide mode originates from total reflection, and the periodic fold structure destroys the conditions for forming the waveguide effect, which can effectively improve the light extraction of the substrate and waveguide mode.

[0080] Template imprinting is often used in related technologies to prepare wrinkles or periodic concave-convex structures, but existing OLED display devices have fine TFT backplane structures and small pixel sizes, which are difficult to achieve through imprinting. The wrinkles or periodic concave-convex structures prepared by etching and template imprinting are mostly non-metallic materials. Although they can improve the light extraction of substrate modes and waveguide modes, they cannot recover the energy lost by SPPs.

[0081] The embodiments of the present invention provide an OLED display device and a manufacturing method thereof, and a display device, which can improve the light extraction efficiency of the display device.

[0082] An embodiment of the present invention provides an OLED display device, comprising:

[0083] substrate substrate;

[0084] A driving circuit layer located on the substrate;

[0085] A pixel planarization layer located on a side of the driving circuit layer away from the base substrate;

[0086] A first electrode located on a side of the pixel planarization layer away from the substrate;

[0087] A second electrode located at a side of the first electrode away from the substrate;

[0088] a light emitting layer located between the first electrode and the second electrode;

[0089] Among them, Fig.11 and Fig.19 As shown, the driving circuit layer includes film layers such as an active layer 041, a gate insulating layer 003, a gate 042, a source electrode 043, and a drain electrode 044. The first electrode 032 includes a first conductive layer 013, a metal micro-nano structure layer 012, and a second conductive layer 034 arranged in sequence, the metal micro-nano structure layer 012 is located on a side of the second conductive layer 034 close to the base substrate 001, and the metal micro-nano structure layer 012 includes a plurality of convex structures arranged in an array, and the convex structures are periodically distributed in at least one direction.

[0090] In this embodiment, the first electrode includes a metal micro-nano structure layer, so that the first electrode and other film layers located on the first electrode have micro-nano structures. The periodically distributed micro-nano structures can effectively improve the light extraction efficiency of the display device, reduce the light loss caused by the substrate mode and the waveguide mode, improve the isotropy of the light emitted by the display device, and improve the color deviation of the viewing angle of the OLED display device. In addition, the metal micro-nano structure can use the diffraction effect of the metal periodic structure to recover the energy lost by SPPs, further improving the light extraction efficiency of the display device.

[0091] In some embodiments, in the first direction, the protrusion structures are arranged at intervals to form a plurality of protrusion structure rows; adjacent rows of the protrusion structure rows are arranged staggered with a preset width.

[0092] In some embodiments, there is a concave structure between adjacent protrusion structures, and the concave structure is a part of a sphere. In the first direction, the concave structures are arranged closely together, and the preset width is 1 / 2 of the diameter of the sphere. This allows the protrusions to be arranged periodically in multiple directions, which can improve the extraction efficiency of waveguide modes and plasma modes, and eliminate the problem of up-down and left-right display symmetry in the display effect.

[0093] In some embodiments, the protrusion structures are periodically distributed in the first direction, the second direction and the third direction, the second direction is 60° to the first direction, and the third direction is 120° to the first direction. In this embodiment, the metal micro-nano structure layer is periodically arranged in multiple directions, which can improve the extraction efficiency of the waveguide mode and the plasma mode, and there will be no problem of up-down and left-right display symmetry in the display effect.

[0094] In some embodiments, the diameter of the sphere may be 440 nm to 480 nm, 500 nm to 560 nm and / or 580 nm to 670 nm.

[0095] like Fig. 20 and Fig.21 As shown, the concave structures between the convex structures are part of the sphere, and the convex structures are arranged at intervals to form a plurality of convex structure rows; the convex structure rows in adjacent rows are arranged at a staggered preset width, and the preset width is equal to the sphere diameter D. The size x of the metal micro-nano structure and the diameter D of the sphere have the following relationship:

[0096]

[0097] According to classical electrodynamics or electromagnetic field theory, and the principle of reversibility of optical paths, Bragg scattering of periodic microstructures can restore light. Specifically, a periodic structure with a period of L can increase or decrease the wave vector of SPPs through Bragg scattering, and the relationship is: Where θ is the angle of the emitted light in free space, k is the wave vector of the emitted light, and k SPP is the wave vector of SPPs, m is the scattering order modulus, 2π / L is the wave vector of the periodic structure, and D = 2L. According to this relationship, when the diameter D of the sphere is 440nm to 480nm, the size x of the metal micro-nano structure can be obtained to be 161nm to 176nm, so that the blue light lost to SPPs energy can be restored to light on the vertical plane; when the diameter D of the sphere is 500nm to 560nm, the size x of the metal micro-nano structure can be obtained to be 183nm to 205nm, so that the green light lost to SPPs energy can be restored to light on the vertical plane; when the diameter D of the sphere is 580nm to 670nm, the size x of the metal micro-nano structure can be obtained to be 212nm to 245nm, so that the red light lost to SPPs energy can be restored to light on the vertical plane.

[0098] An embodiment of the present invention further provides a display device, comprising the OLED display device as described above.

[0099] The display device includes but is not limited to: a radio frequency unit, a network module, an audio output unit, an input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply. Those skilled in the art will appreciate that the structure of the above-mentioned display device does not constitute a limitation on the display device, and the display device may include more or less of the above-mentioned components, or a combination of certain components, or different component arrangements. In an embodiment of the present invention, the display device includes but is not limited to a display, a mobile phone, a tablet computer, a television, a wearable electronic device, a navigation display device, and the like.

[0100] The display device may be any product or component with a display function, such as a television, a monitor, a digital photo frame, a mobile phone, a tablet computer, etc., wherein the display device further includes a flexible circuit board, a printed circuit board and a backplane.

[0101] An embodiment of the present invention further provides a method for manufacturing an OLED display device, comprising:

[0102] Providing a substrate;

[0103] forming a driving circuit layer on the base substrate;

[0104] Forming a pixel planarization layer on a side of the driving circuit layer away from the base substrate;

[0105] Forming a first electrode on a side of the pixel planarization layer away from the base substrate;

[0106] forming a second electrode on a side of the first electrode away from the substrate;

[0107] forming a light-emitting layer between the first electrode and the second electrode;

[0108] Wherein, forming the first electrode comprises:

[0109] forming a first conductive layer;

[0110] forming a metal micro-nano structure layer, wherein the metal micro-nano structure layer comprises a plurality of convex structures arranged in an array, and the convex structures are periodically distributed in at least one direction;

[0111] A second conductive layer is formed on the metal micro-nano structure layer.

[0112] In this embodiment, the first electrode includes a metal micro-nano structure layer, so that the first electrode and other film layers located on the first electrode have micro-nano structures. The periodically distributed micro-nano structures can effectively improve the light extraction efficiency of the display device, reduce the light loss caused by the substrate mode and the waveguide mode, improve the isotropy of the light emitted by the display device, and improve the color deviation of the viewing angle of the OLED display device. In addition, the metal micro-nano structure can use the diffraction effect of the metal periodic structure to recover the energy lost by SPPs, further improving the light extraction efficiency of the display device.

[0113] In a specific embodiment, the method for manufacturing an OLED display device comprises the following steps:

[0114] Step 1: Figure 2 As shown, after the driving circuit layer is prepared on the substrate, a layer of polyimide colloid is coated on the substrate, and a pixel planarization layer 005 is formed after leveling and curing;

[0115] Step 2: Figure 3 As shown, a layer of ITO with a thickness of 50-80 nm is prepared on the pixel planarization layer 005 as the first conductive layer 013;

[0116] Step 3: Figure 4 As shown, a mixed colloid of ethanol and polystyrene (PS) beads is prepared by magnetic stirring to achieve uniform mixing of PS beads and ethanol, and the distribution density of PS beads is controlled by controlling the content of PS beads, and a layer of ethanol and PS beads mixed film layer 08 is prepared on the first conductive layer 013 by Langmuir-Blodgett method;

[0117] Step 4: Figure 5 As shown, after ethanol evaporates, a polystyrene ball array 009 is formed on the first conductive layer. The arrangement diagram of the polystyrene ball array 009 is shown in FIG. Figure 6 As shown, the polystyrene spheres are hexagonally packed, and each polystyrene sphere is tightly packed in a hexagon formed by the six surrounding polystyrene spheres;

[0118] Step 5: Figure 7 As shown, a metal layer 010 covering the polystyrene ball array is magnetron sputtered on the polystyrene ball array. The metal layer 010 can be Ag or Al, or other metals with high reflectivity, with a thickness of 10 to 50 nm. The metal layer 010 not only covers the polystyrene ball array, but also forms in the gaps between the polystyrene balls, and contacts the first conductive layer 013.

[0119] Step 6: Figure 8As shown, the polystyrene beads are washed away by an organic solvent such as chlorobenzene or tetrahydrofuran to obtain a transitional micro-nano structure 011. The plan view of the transitional micro-nano structure 011 is shown in Fig. 9 As shown;

[0120] Step 7: Fig.10 As shown, the transitional micro-nano structure is heated and annealed to obtain the metal micro-nano structure layer 012. The tip of the transitional micro-nano structure 011 can be smoothed by heating and annealing;

[0121] Step 8: Fig.11 As shown, ITO with a thickness of 50 to 80 nm can be prepared on the metal micro-nano structure layer 012 as the second conductive layer 034, and the first conductive layer 013, the metal micro-nano structure layer 012 and the second conductive layer 034 are used to form the first electrode 032, and then the pixel defining layer 006, the light-emitting layer 035 and the second electrode 036 are prepared to obtain an OLED display device.

[0122] The OLED display device prepared in this embodiment is a bottom-emitting display device. The technical solution of the present invention can also be used to prepare a top-emitting display device. The preparation method of the top-emitting display device includes the following steps:

[0123] Step 1: Fig.12 As shown, after the driving circuit layer is prepared on the substrate, a layer of polyimide colloid is coated on the substrate, and a pixel planarization layer 005 is formed after leveling and curing;

[0124] Step 2: Fig.13 As shown, an ITO layer 020 with a thickness of 3 to 10 nm and an Ag layer 021 with a thickness of 80 to 120 nm are prepared on the pixel planarization layer 005 as a first conductive layer;

[0125] Step 3: Fig.14 As shown, a mixed colloid of ethanol and polystyrene (PS) beads is prepared by magnetic stirring to achieve uniform mixing of PS beads and ethanol, and the distribution density of PS beads is controlled by controlling the content of PS beads, and a mixed film layer of ethanol and PS beads is prepared on the first conductive layer by the Langmuir-Blodgett method 08;

[0126] Step 4: Fig.15 As shown, after ethanol evaporates, a polystyrene ball array 009 is formed on the first conductive layer. The arrangement diagram of the polystyrene ball array 009 is shown in FIG. Figure 6 As shown, the polystyrene spheres are hexagonally packed, and each polystyrene sphere is tightly packed in a hexagon formed by the six surrounding polystyrene spheres;

[0127] Step 5: Fig.16 As shown, a metal layer 010 covering the polystyrene ball array is magnetron sputtered on the polystyrene ball array. The metal layer 010 can be Ag or Al, or other metals with high reflectivity, with a thickness of 10 to 50 nm. The metal layer 010 not only covers the polystyrene ball array, but also forms in the gaps between the polystyrene balls, and contacts the first conductive layer 013.

[0128] Step 6: Fig.17 As shown, the polystyrene beads are washed away by an organic solvent such as chlorobenzene or tetrahydrofuran to obtain a transitional micro-nano structure 011. The plan view of the transitional micro-nano structure 011 is shown in Fig. 9 As shown;

[0129] Step 7: Fig.18 As shown, the transitional micro-nano structure is heated and annealed to obtain the metal micro-nano structure layer 012. The tip of the transitional micro-nano structure 011 can be smoothed by heating and annealing;

[0130] Step 8: Fig.19 As shown, ITO with a thickness of 3 to 10 nm can be prepared on the metal micro-nano structure layer 012 as the second conductive layer 034, and the first conductive layer 013, the metal micro-nano structure layer 012 and the second conductive layer 034 are used to form the first electrode 032, and then the pixel defining layer 006, the light-emitting layer 035 and the second electrode 036 are prepared to obtain an OLED display device.

[0131] like Fig. 20 and Fig.21 As shown, the concave structures between the convex structures are part of the sphere, and the convex structures are arranged at intervals to form a plurality of convex structure rows; the convex structure rows in adjacent rows are arranged at a staggered preset width, and the preset width is equal to the sphere diameter D. The size x of the metal micro-nano structure and the diameter D of the sphere have the following relationship:

[0132]

[0133] According to classical electrodynamics or electromagnetic field theory, and the principle of reversibility of optical paths, Bragg scattering of periodic microstructures can restore light. Specifically, a periodic structure with a period of L can increase or decrease the wave vector of SPPs through Bragg scattering, and the relationship is: Where θ is the angle of the emitted light in free space, k is the wave vector of the emitted light, and k SPPis the wave vector of SPPs, m is the scattering order modulus, 2π / L is the wave vector of the periodic structure, and D = 2L. According to this relationship, when the diameter D of the sphere is 440nm~480nm, the size x of the metal micro-nano structure can be obtained to be 161nm~176nm, so that the blue light lost to SPPs energy can be restored on the vertical plane; when the diameter D of the sphere is 500nm~560nm, the size x of the metal micro-nano structure can be obtained to be 183nm~205nm, so that the green light lost to SPPs energy can be restored on the vertical plane; when the diameter D of the sphere is 580nm~670nm, the size x of the metal micro-nano structure can be obtained to be 212nm~245nm, so that the red light lost to SPPs energy can be restored on the vertical plane.

[0134] The equivalent schematic diagram of the OLED display device prepared in this embodiment is as follows Fig. 22 As shown, an anode 014, a hole transport layer 015, an organic light-emitting layer 016, a hole blocking layer 017, an electron transport layer 018 and a cathode 019 are formed on a micro-nanostructure substrate 033. Since the micro-nanostructure substrate 033 has a micro-nanostructure, the anode 014, the hole transport layer 015, the organic light-emitting layer 016, the hole blocking layer 017, the electron transport layer 018 and the cathode 019 formed on the micro-nanostructure substrate 033 also have a micro-nanostructure, so that the entire OLED display device has a micro-nanostructure.

[0135] The preparation process of this embodiment is compatible with the existing substrate preparation process, and there is no need to prepare the micro-nano structure through template imprinting. The multi-directional periodically distributed micro-nano structure can effectively improve the light extraction efficiency of the display device, reduce the light loss caused by the substrate mode and the waveguide mode, and increase the isotropy of the light output of the display device, which can greatly improve the color deviation of the viewing angle caused by the microcavity effect. In addition, the multi-directional periodically distributed metal micro-nano structure can use the diffraction effect of the metal periodic structure to recover the energy lost by SPPs, further improving the light extraction efficiency. In terms of the display effect of the display, the multi-directional periodically distributed micro-nano structure is also better than the unidirectional periodic microstructure, and can improve the symmetry of the display.

[0136] In the various method embodiments of the present invention, the serial numbers of the steps cannot be used to limit the sequence of the steps. For ordinary technicians in this field, without paying creative work, changes to the sequence of the steps are also within the protection scope of the present invention.

[0137] It should be noted that each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the embodiments, since they are basically similar to the product embodiments, the description is relatively simple, and the relevant parts can be referred to the partial description of the product embodiments.

[0138] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0139] It will be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” or “under” another element, it can be “directly on” or “under” the other element or intervening elements may be present.

[0140] In the description of the above embodiments, specific features, structures, materials or characteristics may be combined in a suitable manner in any one or more embodiments or examples.

[0141] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art who is familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present disclosure, which should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. An OLED display device, characterized in that: include: substrate substrate; A driving circuit layer located on the substrate; A pixel planarization layer located on a side of the driving circuit layer away from the base substrate; A first electrode located on a side of the pixel planarization layer away from the substrate; A second electrode located at a side of the first electrode away from the substrate; a light emitting layer located between the first electrode and the second electrode; Among them, the first electrode includes a first conductive layer, a metal micro-nano structure layer and a second conductive layer arranged in sequence, the metal micro-nano structure layer is located on a side of the second conductive layer close to the substrate, the metal micro-nano structure layer includes a plurality of array-arranged protrusion structures, and the protrusion structures are periodically distributed in at least one direction.

2. The OLED display device according to claim 1, characterized in that: In the first direction, the protrusion structures are arranged at intervals to form a plurality of protrusion structure rows; The protrusion structures in adjacent rows are staggered and arranged with a preset width.

3. The OLED display device according to claim 2, characterized in that: There is a concave structure between adjacent protrusion structures, and the concave structure is a part of a sphere. In the first direction, the concave structures are arranged closely together, and the preset width is equal to the diameter of the sphere.

4. The OLED display device according to claim 3, characterized in that: The protruding structures are periodically distributed in the first direction, the second direction and the third direction, the second direction is 60° to the first direction, and the third direction is 120° to the first direction.

5. The OLED display device according to claim 3, characterized in that: The diameter of the sphere is 440nm-480nm, 500nm-560nm and / or 580nm-670nm.

6. The OLED display device according to any one of claims 1 to 5, characterized in that: The metal micro-nano structure layer includes Ag or Al.

7. The OLED display device according to any one of claims 1 to 5, characterized in that: The thickness of the metal micro-nano structure layer is 10-50 nm.

8. A display device, characterized in that: The OLED display device comprises the OLED display device as claimed in any one of claims 1 to 7.

9. A method for manufacturing an OLED display device, characterized in that: include: Providing a substrate; forming a driving circuit layer on the base substrate; Forming a pixel planarization layer on a side of the driving circuit layer away from the base substrate; Forming a first electrode on a side of the pixel planarization layer away from the base substrate; forming a second electrode on a side of the first electrode away from the substrate; forming a light-emitting layer between the first electrode and the second electrode; Wherein, forming the first electrode comprises: forming a first conductive layer; forming a metal micro-nano structure layer, wherein the metal micro-nano structure layer comprises a plurality of convex structures arranged in an array, and the convex structures are periodically distributed in at least one direction; A second conductive layer is formed on the metal micro-nano structure layer.

10. The method for manufacturing an OLED display device according to claim 9, characterized in that: The forming of the metal micro-nano structure layer comprises: forming a mixed film layer of ethanol and polystyrene beads on the first conductive layer; After ethanol evaporates, forming a polystyrene ball array on the first conductive layer; magnetron sputtering a metal layer covering the polystyrene ball array on the polystyrene ball array; The polystyrene beads are washed away by an organic solvent to obtain a transitional micro-nano structure; The transitional micro-nano structure is heated and annealed to obtain the metal micro-nano structure layer.