A porous tantalum dental implant with optimized jaw connection stability and a preparation method thereof
CN119745545BActive Publication Date: 2025-08-15SHANDONG MAIER DENTAL MATERIALS CO LTD
Patent Information
- Application Number
- CN202410832949.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-26
- Publication Date
- 2025-08-15
- Estimated Expiration
- 2044-06-26
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Figure CN119745545B_ABST
Abstract
The present invention relates to the technical field related to dental implants, and discloses a porous tantalum dental implant that optimizes the stability of mandibular connection and a preparation method thereof. The porous tantalum dental implant includes a crown portion, a base portion and a root portion. The outer wall of the root portion is provided with a threaded portion, and the root portion has a three-dimensional gradient porous structure at a microscopic level. The root portion and the base portion are formed of pure tantalum material. The root portion has an inner cavity opening upward, and the opening of the inner cavity has a lower conical inner wall. The crown portion has a positioning groove, and the inner wall of the positioning groove has an upper conical inner wall. The base portion includes an upper positioning cone portion and a lower positioning cone portion connected in sequence. The outer wall of the upper positioning cone portion is provided with a plurality of circumferentially spaced first elastic cone plates, and the outer wall of the lower positioning cone portion is provided with a plurality of circumferentially spaced second elastic cone plates, so as to reduce the impact between the crown portion and the base portion, thereby improving the stability of the connection between the crown portion, the base portion and the root portion.
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Citation Information
Patent Citations
Liquid-containing metal porous buffer dental implant abutment
CN109875706A
Jar-type buffer implant
KR101503214B1