A porous tantalum dental implant with optimized jaw connection stability and a preparation method thereof

CN119745545BActive Publication Date: 2025-08-15SHANDONG MAIER DENTAL MATERIALS CO LTD
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Patent Information

Application Number
CN202410832949.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-06-26
Publication Date
2025-08-15
Estimated Expiration
2044-06-26

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Abstract

The present invention relates to the technical field related to dental implants, and discloses a porous tantalum dental implant that optimizes the stability of mandibular connection and a preparation method thereof. The porous tantalum dental implant includes a crown portion, a base portion and a root portion. The outer wall of the root portion is provided with a threaded portion, and the root portion has a three-dimensional gradient porous structure at a microscopic level. The root portion and the base portion are formed of pure tantalum material. The root portion has an inner cavity opening upward, and the opening of the inner cavity has a lower conical inner wall. The crown portion has a positioning groove, and the inner wall of the positioning groove has an upper conical inner wall. The base portion includes an upper positioning cone portion and a lower positioning cone portion connected in sequence. The outer wall of the upper positioning cone portion is provided with a plurality of circumferentially spaced first elastic cone plates, and the outer wall of the lower positioning cone portion is provided with a plurality of circumferentially spaced second elastic cone plates, so as to reduce the impact between the crown portion and the base portion, thereby improving the stability of the connection between the crown portion, the base portion and the root portion.
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Citation Information

Patent Citations

  • Liquid-containing metal porous buffer dental implant abutment

    CN109875706A

  • Jar-type buffer implant

    KR101503214B1