An automatic cleaning and drying machine for quartz wafers

Abstract

This invention relates to the field of quartz wafer processing technology, and more particularly to an automatic integrated cleaning and drying machine for quartz wafers. The technical solution includes: a mounting plate rotatably mounted on a hydraulic rod, several mounting rods rotatably mounted on the mounting plate, and clamping assemblies rotatably mounted at the bottom of the mounting rods. The retracting and expanding device also includes a protruding seat disposed within the drying housing, with a spin-drying device and a heating air duct arranged around the protruding seat. A cleaning mechanism is disposed within the cleaning housing. The mounting rods are retracted within the cleaning housing and expanded within the drying housing, resulting in a closer distance between the quartz wafers during cleaning. This allows for the uniform cleaning of a large number of quartz wafers using a single cleaning mechanism, thus reducing the amount of cleaning solution used. Conversely, the greater distance between the quartz wafers during drying ensures uniform heat distribution and prevents condensation.

Description

Technical Field

[0001] This invention relates to the field of quartz wafer processing technology, and in particular to an automatic integrated cleaning and drying machine for quartz wafers. Background Technology

[0002] Quartz crystal wafers are thin sheets made of quartz (silicon dioxide, SiO2) and are widely used in electronics, optics, and precision instruments. The etching process for quartz crystal wafers aims to remove excess material from the surface using chemical methods to achieve the desired size and shape. This is followed by efficient and thorough cleaning of the etched quartz crystal wafer to ensure a clean, impurity-free surface, laying a good foundation for subsequent drying and further processing.

[0003] Combining cleaning and drying improves efficiency and reduces the number of times quartz wafers are transferred between different steps, thereby reducing the risk of contamination. Currently, in use, a washing and drying integrated machine holds several quartz wafers to be cleaned, which are then uniformly placed into designated fixtures. The relative distance between the fixtures is stable, ensuring that the distance between the placed quartz wafers remains constant during both cleaning and drying processes.

[0004] However, during use, it was found that if the distance between adjacent quartz wafers during cleaning is too far, the amount of cleaning solution used will increase, leading to higher cleaning costs. If the adjacent quartz wafers are too close during the drying process, the airflow and heat will be uneven, and condensation will easily occur, causing moisture to accumulate between adjacent wafers and form condensate droplets. Summary of the Invention

[0005] The purpose of this invention is to address the problems existing in the background art by proposing an automatic quartz wafer cleaning and drying integrated machine.

[0006] The technical solution of the present invention: an automatic cleaning and drying machine for quartz wafers, comprising a hydraulic rod, a cleaning shell and a drying shell fixed on a frame from top to bottom, the hydraulic rod extending and retracting within the cleaning shell and the drying shell, and a retracting and expanding device provided between the cleaning shell and the drying shell; The gathering and spreading device includes a mounting plate rotatably mounted on a hydraulic rod, a plurality of mounting rods rotatably mounted on the mounting plate, and a clamp assembly rotatably mounted on the bottom of the mounting rods. The gathering and spreading device also includes a protruding seat disposed in the drying shell, and a spin-drying device and a heating air pipe are provided on the periphery of the protruding seat. A cleaning mechanism is provided in the cleaning shell. Some of the mounting rods are retracted when the housing is cleaned and extended when the housing is dried.

[0007] Preferably, a connecting block is fixed to the outer end of the mounting rod. The clamp assembly includes a frame that is rotatably mounted on the connecting block. Movable grooves are provided on both inner walls of the frame. An arc-shaped groove is provided on the side of the movable groove away from the mounting rod. The clamp assembly also includes a clamp body. Slider blocks are fixedly mounted on both sides of the clamp body. The sliders are slidably mounted in the movable grooves. An arc-shaped head that matches the arc-shaped groove is provided on the side of the slider away from the mounting rod.

[0008] Preferably, auxiliary wheels are rotatably mounted on both sides of the clamp body, and the clamp body includes clamping grooves.

[0009] Preferably, the raised seat is divided into an upper raised body and a lower arc body. The upper raised body has several limiting grooves on its periphery and an inlet in the middle of the upper raised body. The inlet includes a plug. The spin-drying device includes a spin-drying seat. The raised seat is fixed on the spin-drying seat. The bottom of the spin-drying seat is fixedly connected to the output end of the motor. The motor is fixed inside the drying shell. The axis of symmetry of the raised seat and the output end of the motor are located on the same horizontal line.

[0010] Preferably, the spin-drying device further includes a filter disc and a fixed disc fixed on the spin-drying base. The filter disc and the fixed disc are arranged in a shape that surrounds the lower arc body. The periphery of the lower arc body is fixedly connected to the fixed disc. A spin-drying chamber is formed between the filter disc and the fixed disc. A drain frame is installed at the bottom of the drying shell. The spin-drying chamber and the drain frame are connected.

[0011] Preferably, a heating fan is installed on the frame, the heating air pipe is connected to the heating fan, the heating air pipe includes multiple air outlets located above the protrusion, and multiple exhaust ports are opened on the top of the drying shell.

[0012] Preferably, the cleaning mechanism includes two cleaning water pipes distributed from bottom to bottom, and the cleaning water pipes are provided with multiple spray heads inclined towards the hydraulic rod. A partition sealing device is provided between the cleaning housing and the drying housing. The partition sealing device includes a baffle located between the two cleaning water pipes. During the cleaning of the quartz wafer, the clamp body is located on the baffle.

[0013] Preferably, the partition sealing device further includes a receiving shell fixed to the drying shell and communicating with the cleaning shell. A sealing seat is slidably installed inside the receiving shell. An electric push rod fixed to the drying shell is provided outside the receiving shell. The pushing end of the electric push rod is fixedly connected to the sealing seat. A liquid collecting shell is fixed on the receiving shell. A drain port located below the cleaning water pipe is opened in the cleaning shell. The drain port is communicating with the liquid collecting shell and a drain pipe is connected to the drain port. A plug seat adapted to the drain port is fixed on the sealing seat. An opening for a hydraulic rod to pass through is opened on the sealing seat and the plug seat. A sealing cover is fixed on the hydraulic rod.

[0014] Compared with existing technologies, the beneficial effects of this invention are as follows: This solution uses a retractable and expandable device, which uses a hydraulic rod to push several mounting rods to move, so that the mounting rods are retracted in the cleaning housing and expanded in the drying housing. This results in a closer distance between the quartz crystals during cleaning, allowing a large number of quartz crystals to be cleaned uniformly with a single cleaning mechanism, thus requiring less cleaning solution. Conversely, the greater distance between the quartz crystals during drying ensures uniform heat distribution and prevents condensation. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the structure of the present invention; Figure 2 This is a cross-sectional structural diagram of the present invention; Figure 3 This is a schematic diagram of the structure of the isolation and sealing device of the present invention; Figure 4 This is a schematic diagram of the structure of the clamp assembly of the present invention; Figure 5 This is a schematic diagram of the structure of the protrusion seat of the present invention; Figure 6 This is a schematic diagram of the structure of the spin-drying device of the present invention; Figure 7 This is a schematic diagram of the structure when the hydraulic rod of the present invention moves into the drying housing; Figure 8 This is a schematic diagram of the structure of the baffle of the present invention.

[0016] Reference numerals: 1. Cleaning housing; 2. Drying housing; 3. Isolation sealing device; 4. Mounting plate; 5. Mounting rod; 6. Clamp assembly; 7. Protruding seat; 8. Spin-drying device; 9. Heating air duct; 10. Heating fan; 11. Exhaust port; 31. Storage housing; 33. Sealing seat; 32. Liquid collection housing; 33. Sealing seat; 34. Plug seat; 35. Drain port; 36. Electric push rod; 37. Drain pipe; 51. Connecting block; 61. Frame; 62. 63. Fixture body; 64. Moving groove; 65. Slider; 66. Arc groove; 67. Arc head; 68. Auxiliary wheel; 79. Clamping groove; 70. Upper protrusion; 71. Lower arc body; 72. Limiting groove; 73. Inlet; 74. Insertion port; 85. Filter disc; 86. Fixed disc; 87. Motor; 88. Spin-drying seat; 89. Spin-drying chamber; 80. Drainage frame; 100. Hydraulic rod; 200. Baffle; 300. Cleaning water pipe; 400. Sealing cover. Detailed Implementation

[0017] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0018] See attached document Figure 1-8 An automatic cleaning and drying machine for quartz wafers includes a hydraulic rod 100, a cleaning shell 1, and a drying shell 2 fixed on a frame from top to bottom. The hydraulic rod 100 extends and retracts within the cleaning shell 1 and the drying shell 2. A retracting and expanding device is provided between the cleaning shell 1 and the drying shell 2. The gathering and spreading device includes a mounting plate 4 rotatably mounted on a hydraulic rod 100, a plurality of mounting rods 5 rotatably mounted on the mounting plate 4, and a clamp assembly 6 rotatably mounted on the bottom of the mounting rods 5. The gathering and spreading device also includes a protruding seat 7 disposed in the drying shell 2. A spin-drying device 8 and a heating air pipe 9 are provided on the periphery of the protruding seat 7. A cleaning mechanism is provided in the cleaning shell 1. Several mounting rods 5 are retracted when inside the cleaning housing 1 and extended when inside the drying housing 2.

[0019] During operation, the quartz wafers to be cleaned are fixed in place by the clamping assembly 6. When several mounting rods 5 are located inside the cleaning housing 1, several clamping assemblies 6 will retract as the mounting rods 5 retract. The quartz wafers on them can be cleaned by the cleaning mechanism. At this time, the clamping assembly 6 in a retracted shape will make the distance between several quartz wafers closer. This allows a large number of quartz wafers to be cleaned uniformly by a single cleaning mechanism, and thus the amount of cleaning solution used is relatively small. When drying is required after cleaning, several mounting rods 5 move into the drying housing 2 along with the hydraulic rod 100. The mounting rods 5 will contact the protrusion 7. The special shape of the protrusion 7 will cause several mounting rods 5 to be spread apart. Several clamping components 6 will also be spread apart as the mounting rods 5 are spread apart. In this way, the distance between several quartz wafers will be greater. Then, the spin-drying device 8 and the heating air pipe 9 can dry more quartz wafers in a relatively far apart manner, thereby making the drying heat uniform and preventing condensation.

[0020] Specifically, a connecting block 51 is fixed to the outer side of the end of the mounting rod 5. The clamp assembly 6 includes a frame 61, which is rotatably mounted on the connecting block 51. The inner walls on both sides of the frame 61 are provided with moving grooves 63. The side of the moving groove 63 away from the mounting rod 5 is provided with an arc-shaped groove 65. The clamp assembly 6 also includes a clamp body 62. Slider 64 is fixedly mounted on both sides of the clamp body 62. The slider 64 is slidably mounted in the moving groove 63. The side of the slider 64 away from the mounting rod 5 is provided with an arc-shaped head 66 that matches the arc-shaped groove 65. Auxiliary wheels 67 are rotatably mounted on both sides of the clamp body 62. The clamp body 62 includes a clamping groove 68. Before using the equipment, the quartz wafer to be cleaned must first be installed in the fixture body 62 and fixed by snapping the quartz wafer into the clamping groove 68. It should be noted that the fixture body 62 is a common fixture in this technical field. This solution mainly focuses on the cooperation relationship between the fixture body 62 and the frame 61. Therefore, the fixture body 62 will not be described in detail here. Once fixed within the fixture body 62, the quartz wafer can move with the extension and retraction of the mounting rod 5, rotate with the mounting rod 5, and rotate with the frame 61, thus providing a basis for its retraction and expansion. The auxiliary wheel 67 is provided to facilitate the movement of the fixture assembly 6.

[0021] In addition, in this embodiment, the protruding seat 7 is divided into an upper protrusion 71 and a lower arc body 72. The upper protrusion 71 has several limiting grooves 73 on its periphery and an inlet 74 in the middle of the upper protrusion 71. The inlet 74 includes a socket 75. The spin-drying device 8 includes a spin-drying seat 84. The protruding seat 7 is fixed on the spin-drying seat 84. The bottom of the spin-drying seat 84 is fixedly connected to the output end of the motor 83. The motor 83 is fixed inside the drying shell 2. The axis of symmetry of the protruding seat 7 and the output end of the motor 83 are on the same horizontal line. The spin-drying device 8 also includes a filter circular plate 81 and a fixed circular plate 82 fixed on the spin-drying seat 84. The filter circular plate 81 and the fixed circular plate 82 are arranged in a way that surrounds the lower arc body 72. The periphery of the lower arc body 72 is fixedly connected to the fixed circular plate 82. A spin-drying cavity 85 is formed between the filter circular plate 81 and the fixed circular plate 82. A drain frame 86 is installed at the bottom of the drying shell 2. The spin-drying cavity 85 and the drain frame 86 are connected.

[0022] like Figure 7 As shown, during the specific operation, after the quartz wafer is cleaned in the cleaning housing 1, the hydraulic rod 100 is activated and extends into the drying housing 2, causing the mounting rod 5 to move into the drying housing 2. When the clamp assembly 6 moves into the drying housing 2, the clamp assembly 6 becomes vertical due to downward gravity. As the hydraulic rod 100 continues to move, it penetrates into the insertion port 75. The clamp assembly 6 contacts the top of the upper protrusion 71 outside the inlet 74. With continued movement, the mounting rod 5 enters the limiting groove 73 and tilts under the support of the limiting groove 73. Finally, the mounting plate 4 enters the inlet 74, and the tilted mounting rods 5 form an open shape, causing the clamp assembly 6 to also open. Subsequently, the clamp assembly 6 falls into the spin-drying chamber 85. The starting motor 83 drives the spin-drying chamber 85 to rotate, generating centrifugal force through high-speed rotation for dehydration. Figure 7 The direction of movement S of the clamp assembly 6 is marked in the middle.

[0023] It should also be noted that a heating fan 10 is installed on the frame, and the heating air pipe 9 is connected to the heating fan 10. The heating air pipe 9 includes multiple air outlets located above the protrusion 7, and multiple exhaust ports 11 are opened on the top of the drying shell 2. After the spin-drying device 8 has finished its operation, the heating fan 10 can be started to generate hot air which is input into the heating air pipe 9. The multiple air outlets of the heating air pipe 9 are aligned with the top of the spin-drying chamber 85, which can dry the quartz wafers located in the spin-drying chamber 85.

[0024] Furthermore, in this embodiment, as Figure 3 and Figure 8 As shown, the cleaning mechanism includes two cleaning water pipes 300 distributed from bottom to bottom. The cleaning water pipes 300 are equipped with multiple spray heads that are inclined towards the hydraulic rod 100. A partition sealing device 3 is provided between the cleaning housing 1 and the drying housing 2. The partition sealing device 3 includes a baffle 200 located between the two cleaning water pipes 300. During the cleaning of the quartz wafer, the clamp body 62 is located on the baffle 200. Specifically, the cleaning water pipe 300 is equipped with an inlet that connects to an external liquid supply device. During the cleaning of the quartz wafer, the auxiliary wheel 67 rests on the baffle 200, making the clamp assembly 6 horizontal, which facilitates the comprehensive cleaning of the quartz wafer. The inclined spray head of the cleaning water pipe 300 sprays water towards the hydraulic rod 100, so that the cleaning solution is sprayed directly onto the quartz wafer. The vertically arranged cleaning water pipe 300 allows the quartz wafer to be cleaned from both the top and bottom, ensuring the cleanliness of the cleaning. Furthermore, because the water from the spray head is diffused, one spray head can clean at least two quartz wafers that are close to each other. In addition, the water sprayed after impact at close range can also clean the quartz wafer, thus saving cleaning solution.

[0025] It should also be noted that the partition sealing device 3 also includes a storage shell 31 fixed on the drying shell 2 and connected to the cleaning shell 1. A sealing seat 33 is slidably installed inside the storage shell 31. An electric push rod 36 fixed on the drying shell 2 is provided outside the storage shell 31. The pushing end of the electric push rod 36 is fixedly connected to the sealing seat 33. A liquid collection shell 32 is fixed on the storage shell 31. A drain port 35 located below the cleaning water pipe 300 is opened inside the cleaning shell 1. The drain port 35 is connected to the liquid collection shell 32. A drain pipe 37 is connected to the drain port 35. A plug seat 34 adapted to the drain port 35 is fixed on the sealing seat 33. An opening for the hydraulic rod 100 to pass through is opened on the sealing seat 33 and the plug seat 34. A sealing cover 400 is fixed on the hydraulic rod 100. Specifically, during the cleaning of quartz wafers, the electric push rod 36 is activated to push the sealing seat 33 into the cleaning housing 1, so that the two sealing seats 33 can seal the bottom of the cleaning housing 1. When the hydraulic rod 100 extends and moves, it enters the opening, so that the two sealing seats 33 and the plug seat 34 can surround and seal the bottom of the hydraulic rod 100. The liquid generated during cleaning will be discharged into the liquid collection shell 32 through the drain port 35, and finally discharged through the drain pipe 37. In this way, during cleaning, the liquid will not flow into the drying housing 2, ensuring the dryness inside the drying housing 2.

[0026] Working principle: Before operation, the clamp assembly 6 is moved outside the cleaning housing 1 by the hydraulic rod 100, and the quartz wafer is fixed by the clamp body 62. Then, the hydraulic rod 100 is started to move into the cleaning housing 1. When the hydraulic rod 100 moves, the frame 61 will be vertical due to the downward weight, and the clamp body 62 will also move out of the frame 61 and be vertical due to the downward weight. The slider 64 will move from the moving groove 63 to the arc groove 65, and the mounting rod 5 will also be vertical due to the downward weight, so that several mounting rods 5 are in a retracted state. At this time, the hydraulic rod 100 moves above the cleaning housing 1, and the two sealing seats 33 close to seal the bottom. During cleaning, as the hydraulic rod 100 extends, the clamp assembly 6 moves to the baffle 200, and the clamp body 62 contacts the baffle 200, which provides support. As the frame 61 also moves to this position, the frame 61 and the baffle 200 become flush. At this time, the hydraulic rod 100 is closed, so that the clamp body 62 is horizontally supported by the baffle 200, and the slider 64 moves back into the moving groove 63 due to the resistance of the wall of the cleaning housing 1. The hydraulic rod 100 is located at the bottom of the cleaning housing 1 between the two sealing seats 33. Then, the cleaning solution is introduced into the cleaning water pipe 300 through the external liquid supply device. The inclined spray heads of the two cleaning water pipes 300 clean the quartz wafer, and the cleaned water is discharged from the drain port 35. During drying, after the liquid in the cleaning housing 1 has been drained, the electric push rod 36 is activated to pull the sealing seat 33 into the receiving housing 31. At this time, the plug seat 34 moves into the drain port 35 to block it and prevent liquid backflow. The bottom of the cleaning housing 1 is then opened, and the hydraulic rod 100 is activated again to move into the drying housing 2. During the movement, the clamp assembly 6 passes the baffle 200, and without support, it becomes vertical again due to downward gravity. The slider 64 moves into the arc groove 65 again. Subsequently, as the hydraulic rod 100 continues to extend and move, the clamp assembly 6 and the mounting rod 5 will fall on the upper protrusion 71, and then the mounting rod 5 will enter the limiting groove 73. The hydraulic rod 100 enters the inlet 74 and moves downwards. The support of the limiting groove 73 causes the mounting rod 5 to rotate. Several mounting rods 5 form an open shape, allowing the clamp assembly 6 to move on the lower arc body 72. The lower arc body 72 provides support for the clamp assembly 6. When the hydraulic rod 100 moves into the insertion port 75, the hydraulic rod 100 stops moving. At this time, the mounting rod 5 pushes the clamp assembly 6 to the edge of the lower arc body 72. The edge of the lower arc body 72 is the spin-drying chamber 85. At this time, the clamp assembly 6 will be vertical again due to the downward gravity because it is no longer supported. This allows the clamp body 62 to enter the spin-drying chamber 85. At this time, the start motor 83 drives the spin-drying device 8 and the protruding seat 7 to rotate. Since the mounting rod 5 is inserted into the limiting groove 73, the rotation of the protruding seat 7 will drive the mounting rod 5 to rotate, causing the mounting plate 4 to rotate along the hydraulic rod 100. Thus, the quartz crystal in the clamp body 62 generates centrifugal force through high-speed rotation to dehydrate. After dehydration is completed, the heating fan 10 is started to generate hot air which is input into the heating air pipe 9. The multiple air outlets of the heating air pipe 9 are aligned with the top of the spin-drying chamber 85, which can dry the quartz wafers located in the spin-drying chamber 85.

[0027] The above are merely preferred embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. An automatic quartz wafer cleaning and drying integrated machine, characterized in that, Includes a hydraulic rod (100) fixed to the frame from top to bottom, a cleaning shell (1) and a drying shell (2). The hydraulic rod (100) moves telescopically within the cleaning shell (1) and the drying shell (2). A retractable and expandable device is provided between the cleaning shell (1) and the drying shell (2). The gathering and spreading device includes a mounting plate (4) rotatably mounted on a hydraulic rod (100), a plurality of mounting rods (5) rotatably mounted on the mounting plate (4), and a clamp assembly (6) rotatably mounted on the bottom of the mounting rods (5). The gathering and spreading device also includes a protruding seat (7) disposed in the drying shell (2). The protruding seat (7) is provided with a spin-drying device (8) and a heating air pipe (9) on its periphery. The cleaning shell (1) is provided with a cleaning mechanism. Some of the mounting rods (5) are in a retracted state when inside the cleaning housing (1) and in a stretched state when inside the drying housing (2).

2. The automatic quartz wafer cleaning and drying integrated machine according to claim 1, characterized in that, The mounting rod (5) has a connecting block (51) fixed on the outer side of its end. The clamp assembly (6) includes a frame (61) which is rotatably mounted on the connecting block (51). The inner walls of both sides of the frame (61) are provided with moving grooves (63). The side of the moving groove (63) away from the mounting rod (5) is provided with an arc groove (65). The clamp assembly (6) also includes a clamp body (62). The sides of the clamp body (62) are fixedly mounted with sliders (64). The sliders (64) are slidably mounted in the moving grooves (63). The side of the sliders (64) away from the mounting rod (5) is provided with an arc head (66) that matches the arc groove (65).

3. The automatic quartz wafer cleaning and drying integrated machine according to claim 2, characterized in that, The clamp body (62) is rotatably mounted on both sides with auxiliary wheels (67), and the clamp body (62) includes clamping grooves (68).

4. The automatic quartz wafer cleaning and drying integrated machine according to claim 1, characterized in that, The raised seat (7) is divided into an upper raised body (71) and a lower arc body (72). Several limiting grooves (73) are provided on the periphery of the upper raised body (71). An inlet (74) is provided in the middle of the upper raised body (71). The inlet (74) includes a socket (75). The spin-drying device (8) includes a spin-drying seat (84). The raised seat (7) is fixed on the spin-drying seat (84). The bottom of the spin-drying seat (84) is fixedly connected to the output end of the motor (83). The motor (83) is fixed inside the drying shell (2). The axis of symmetry of the raised seat (7) and the output end of the motor (83) are on the same horizontal line.

5. The automatic quartz wafer cleaning and drying integrated machine according to claim 4, characterized in that, The spin-drying device (8) also includes a filter disc (81) and a fixed disc (82) fixed on the spin-drying base (84). The filter disc (81) and the fixed disc (82) are arranged in a way that surrounds the lower arc body (72). The periphery of the lower arc body (72) and the fixed disc (82) are fixedly connected. A spin-drying chamber (85) is formed between the filter disc (81) and the fixed disc (82). A drain frame (86) is installed at the bottom of the drying shell (2). The spin-drying chamber (85) and the drain frame (86) are connected.

6. The automatic quartz wafer cleaning and drying integrated machine according to claim 1, characterized in that, A heating fan (10) is installed on the frame, and the heating air pipe (9) is connected to the heating fan (10). The heating air pipe (9) includes multiple air outlets located above the protrusion (7), and multiple exhaust ports (11) are opened on the top of the drying shell (2).

7. The automatic quartz wafer cleaning and drying integrated machine according to claim 2, characterized in that, The cleaning mechanism includes two cleaning water pipes (300) distributed from bottom to top. The cleaning water pipes (300) are equipped with multiple spray heads that are inclined towards the hydraulic rod (100). A partition sealing device (3) is provided between the cleaning housing (1) and the drying housing (2). The partition sealing device (3) includes a baffle (200) located between the two cleaning water pipes (300). When cleaning the quartz wafer, the fixture body (62) is located on the baffle (200).

8. The automatic quartz wafer cleaning and drying integrated machine according to claim 7, characterized in that, The partition sealing device (3) further includes a storage shell (31) fixed on the drying shell (2) and connected to the cleaning shell (1). A sealing seat (33) is slidably installed inside the storage shell (31). An electric push rod (36) fixed on the drying shell (2) is provided outside the storage shell (31). The pushing end of the electric push rod (36) is fixedly connected to the sealing seat (33). A liquid collection shell (32) is fixed on the storage shell (31). A drain port (35) located below the cleaning water pipe (300) is opened inside the cleaning shell (1). The drain port (35) is connected to the liquid collection shell (32). A drain pipe (37) is connected to the drain port (35). A plug seat (34) adapted to the drain port (35) is fixed on the sealing seat (33). An opening for the hydraulic rod (100) to pass through is opened on the sealing seat (33). A sealing cover (400) is fixed on the hydraulic rod (100).

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