Graphene copper alloy sintering device

Abstract

The application relates to the technical field of conductive material preparation, and specifically discloses a graphene copper alloy sintering device, which comprises a sintering kettle, supporting legs are fixedly installed on the outer surface of the sintering kettle, a top cover is arranged at the top end of the sintering kettle, a feeding cover is clamped in the inner cavity of the top cover, a mixing assembly is arranged in the inner cavity of the sintering kettle, and a feeding assembly is fixedly installed on the upper surface of the sintering kettle. The mixing assembly can bidirectionally stir the mixed material, the stirring efficiency is improved, the mixture at the bottom can be prevented from being deposited, the mixture can participate in the stirring process again, the mixing uniformity of the whole material is improved, the material can be filtered without the help of other equipment after stirring, the process flow is saved, the production efficiency is improved, the feeding assembly can uniformly feed the material, the feeding amount can be adjusted according to requirements, the reaction uniformity is improved, the reaction condition is optimized, the surface properties of graphene are improved, and the product quality is improved.

Description

Technical Field

[0001] This application relates to the field of conductive material preparation technology, and in particular to a graphene copper alloy sintering apparatus. Background Technology

[0002] With the rapid development of the power industry, infrastructure construction, and household appliances, the demand and application of conductive wires are becoming increasingly widespread, placing higher demands on their performance. While traditional copper conductive wires offer excellent conductivity, they suffer from limitations such as resource scarcity and heavy weight, making them unsuitable for direct use, especially in aerospace and other fields requiring weight reduction. Graphene, a material with excellent conductivity and mechanical properties, is widely used in the preparation of various composite materials. Traditionally, electroless copper plating of graphene is employed, using graphene as the matrix material and depositing a layer of copper on its surface through specific chemical reactions. Alkaline washing is a crucial step, utilizing the chemical reactivity of alkaline solutions to react with oil and impurities on the graphene surface, generating soluble salts or oxides that are then removed. Simultaneously, the alkaline solution neutralizes acidic substances on the graphene surface, further improving its surface properties. In the preparation of graphene-copper alloys, these reactions must be carried out in a sintering apparatus.

[0003] The existing technology still has the following problems:

[0004] 1. Existing sintering equipment requires mixing graphene and alkaline solution during the graphene alkaline washing process, followed by heating, stirring, and filtration. However, the existing sintering equipment has poor stirring effect, and graphene is prone to precipitation during stirring, resulting in uneven mixing. Uneven mixing may lead to uneven distribution of alkaline solution on the graphene surface, with some areas potentially being excessively corroded. Uneven mixing may also leave unreacted alkaline solution or other impurities on the graphene surface, thereby reducing its conductivity. In addition, filtration is required after alkaline washing, but existing sintering equipment does not have a filtration function, thus relying on other tools for filtration, which reduces production efficiency.

[0005] 2. Existing sintering equipment does not have a uniform feeding mechanism. During the feeding process, a large amount of material is usually added, and then the required raw materials are replenished to ensure that the mixing ratio of the reaction raw materials meets the production requirements. Multiple weighing and feeding wastes time, and inaccurate mixing ratios result in incomplete graphene reaction, thus affecting the effect of graphene copper plating. Summary of the Invention

[0006] To overcome the shortcomings of existing sintering equipment, such as poor stirring effect, easy precipitation of graphene during stirring, uneven mixing, uneven distribution of alkali solution on the graphene surface, excessive corrosion in some areas, and unreacted alkali solution or other impurities remaining on the graphene surface, thereby reducing its conductivity, and the lack of filtration after alkali washing, which reduces production efficiency by relying on other tools, and the absence of a uniform feeding mechanism, which wastes production time, the present invention aims to provide a graphene-copper alloy sintering device to solve the above-mentioned deficiencies.

[0007] This application provides a graphene copper alloy sintering apparatus, including a sintering kettle, a support leg fixedly installed on the outer surface of the sintering kettle, a top cover provided at the top of the sintering kettle, a feed cover engaged in the inner cavity of the top cover, a mixing component provided in the inner cavity of the sintering kettle, a feed component fixedly installed on the upper surface of the sintering kettle, the mixing component including a motor, a bidirectional rotation mechanism provided at the bottom end of the top cover, a stirring mechanism provided at the bottom end of the bidirectional rotation mechanism, a floating disk slidably connected to the inner cavity of the sintering kettle, a protrusion fixedly installed on the upper surface of the floating disk, a buffer mechanism provided on the lower surface of the floating disk, a filtration mechanism fixedly installed on the inner wall of the sintering kettle, and a filtration pump provided in the inner cavity at the bottom end of the sintering kettle.

[0008] Furthermore, the bidirectional rotation mechanism includes a first connecting frame, a first bevel gear rotatably connected to the middle part of the first connecting frame, a first rotating rod rotatably connected to the bottom inner cavity of the first connecting frame, a second bevel gear fixedly installed at the top of the first rotating rod, a second rotating rod rotatably connected to the top of the first connecting frame, a third bevel gear fixedly installed at the bottom of the second rotating rod, and a connecting rod fixedly connected to the bottom of the third bevel gear.

[0009] Furthermore, the first connecting frame and the top cover are fixedly connected, the output end of the motor and the second rotating rod are sleeved together, the second bevel gear and the third bevel gear are both meshed with the first bevel gear, the connecting rod passes through the second bevel gear and the first rotating rod, and there is a gap between the connecting rod and the inner cavity of the first rotating rod and the second bevel gear.

[0010] Furthermore, the stirring mechanism includes a stirring frame, which is fixedly connected to a first rotating rod. A first stirring blade is fixedly installed on the outer surface of the stirring frame. A rolling ball is rolledly connected to the bottom end of the first stirring blade. A second stirring blade is fixedly connected to the outer surface of the connecting rod. The first and second stirring blades are distributed in an alternating manner. The protrusion is raised in the middle, and the bottom end of the rolling ball is located between the bottom and top ends of the protrusion.

[0011] Furthermore, the buffer mechanism includes a buffer frame, a fixed rod is fixedly installed on the inner wall of the buffer frame, a slide block is slidably connected to the outer surface of the fixed rod, a connecting strip is sleeved on the outer surface of the fixed rod, there are two slide blocks, and the connecting strip is located between the two slide blocks, a first spring is rotatably connected to the inner cavity of the slide block, a buffer plate is rotatably connected to the end of the first spring away from the slide block, and the upper surface of the buffer plate is in close contact with the floating disk.

[0012] Furthermore, the filtration mechanism includes a second connecting frame, with shielding cylinders fixedly sleeved at both ends of the second connecting frame. A fixing strip is fixedly sleeved on the outer surface of the shielding cylinder, and the end of the fixing strip away from the shielding cylinder is fixedly connected to the inner wall of the sintering kettle. A filtration cylinder is slidably connected to the inner cavity of the shielding cylinder, and filtration holes are opened on the outer surface of the filtration cylinder. A lifting mechanism is provided on the upper surface of the second connecting frame, and a sliding strip is fixedly installed on the outer surface of the filtration cylinder. The sliding strip and the shielding cylinder are slidably connected, and a buffer frame and the second connecting frame are fixedly connected.

[0013] Furthermore, the lifting mechanism includes a cylinder, which is fixedly connected to a second connecting frame. A piston rod is slidably connected to the inner cavity of the cylinder. A push block is fixedly installed at one end of the piston rod. The outer surface of the push block is inclined. A lifting frame is fixedly connected to the outer surface of the slide bar. Limit rods are slidably connected to the inner cavities of both ends of the lifting frame. A rotating wheel is rotatably connected to the bottom end of the lifting frame. The push block and the second connecting frame are slidably connected. The push block slides past the bottom end of the rotating wheel. A second spring is sleeved on the outer surface of the limit rod. The limit rod and the floating plate are fixedly connected. The second spring is located between the floating plate and the lifting frame. The filtration hole is located in the inner cavity of the shielding cylinder, and the floating plate is located above the filtration hole. The floating plate and the shielding cylinder are slidably connected.

[0014] Furthermore, the feeding assembly includes a storage bin, a cover is fitted onto the upper surface of the storage bin, a baffle is fixedly installed in the inner cavity of the storage bin, and a discharge port is opened at the bottom of the storage bin. There are two discharge ports, which are symmetrically distributed about the baffle. An adjustment mechanism is provided at the bottom of the storage bin, and a support plate is provided at the bottom of the adjustment mechanism. The support plate and the top cover are fixedly connected.

[0015] Furthermore, the adjustment mechanism includes a rotating ring with a connecting hole on its upper surface. A storage cylinder is fixedly connected to the bottom end of the rotating ring, and an adjusting cylinder is slidably connected to the inner cavity of the storage cylinder. The bottom end of the adjusting cylinder is in close contact with the support plate. A connecting block is sleeved on the outer surface of the adjusting cylinder, and an adjusting block is fixedly connected to the bottom end of the storage cylinder. An adjusting rod is slidably connected to the inner cavity of the adjusting block, and an insertion hole is opened on the outer surface of the adjusting rod. A plug is threadedly connected to the inner cavity of the adjusting block, and the plug and the insertion hole are engaged. A storage rod is sleeved on the outer surface of the adjusting rod.

[0016] Furthermore, the rotating ring and the bottom of the storage bucket are rotatably connected. When the rotating ring rotates, the connecting hole passes through the discharge port. The adjusting cylinder and the adjusting block are slidably connected. The adjusting block and the receiving rod are rotatably connected. The adjusting rod and the receiving rod are movably connected. When the rotating ring rotates, the adjusting cylinder passes through the discharge port, and the end of the connecting block away from the adjusting cylinder passes through the discharge port.

[0017] The technical solution provided in this application has at least the following technical effects or advantages:

[0018] 1. By employing a mixing component, this invention effectively solves the problem of existing sintering equipment requiring the mixing of graphene and alkaline solution during the graphene alkali washing process, followed by heating, stirring, and filtration. Existing sintering equipment suffers from poor stirring, leading to graphene precipitation and uneven mixing. This uneven mixing can result in uneven distribution of the alkali solution on the graphene surface, potentially causing excessive corrosion in some areas. Furthermore, it can leave unreacted alkali or other impurities on the graphene surface, reducing its conductivity. Additionally, existing sintering equipment lacks filtration capabilities after alkali washing, requiring the use of other tools and reducing production efficiency. This invention, through its mixing component, enables bidirectional stirring of the mixture, improving stirring efficiency and preventing sedimentation at the bottom, allowing sediment to re-enter the stirring process. This enhances the overall uniformity of the mixture. Moreover, filtration can be performed without additional equipment after stirring, saving process steps and increasing production efficiency.

[0019] 2. By adopting a feeding assembly, the problem of existing sintering devices lacking a uniform feeding mechanism is effectively solved. During the feeding process, large amounts of material are usually added, and then the required raw materials are replenished to ensure that the mixing ratio of the reaction raw materials meets production needs. Multiple weighing and feeding wastes time, and inaccurate mixing ratios result in incomplete graphene reaction, thus affecting the copper plating effect of graphene. This invention, through the feeding assembly, can achieve uniform feeding and can adjust the feeding amount according to needs, which helps to improve reaction uniformity, optimize reaction conditions, improve graphene surface properties, and improve product quality. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure in the embodiments of this application;

[0021] Figure 2 This is a schematic cross-sectional view of the sintering reactor structure in the embodiments of this application;

[0022] Figure 3 This is a schematic diagram of the floating disk structure in an embodiment of this application;

[0023] Figure 4 This is a schematic diagram of the bump structure in an embodiment of this application;

[0024] Figure 5 This is a schematic diagram of the rolling ball structure in an embodiment of this application;

[0025] Figure 6 This is a schematic diagram of the bidirectional rotation mechanism in the embodiments of this application;

[0026] Figure 7 This is a schematic diagram of the connecting frame structure in an embodiment of this application;

[0027] Figure 8 This is a schematic cross-sectional view of the shielding cylinder structure in the embodiments of this application;

[0028] Figure 9 This is a schematic diagram of the buffer mechanism structure in the embodiments of this application;

[0029] Figure 10 This is a schematic diagram of the lifting mechanism structure in the embodiments of this application;

[0030] Figure 11 This is a schematic diagram of the feeding assembly structure in the embodiments of this application;

[0031] Figure 12 This is a schematic cross-sectional view of the shielding cover structure in the embodiments of this application;

[0032] Figure 13 This is a partial structural diagram of the storage tank in an embodiment of this application.

[0033] In the diagram: 1. Sintering kettle; 2. Support leg; 3. Top cover; 4. Feed cover; 5. Mixing assembly; 51. Motor; 52. Bidirectional rotation mechanism; 521. First connecting frame; 522. First bevel gear; 523. First rotating rod; 524. Second bevel gear; 525. Second rotating rod; 526. Third bevel gear; 527. Connecting rod; 53. Stirring mechanism; 531. Stirring frame; 532. First stirring blade; 533. Rolling ball; 534. Second stirring blade; 54. Floating disc; 55. Protrusion; 56. Buffer mechanism; 561. Buffer frame; 562. Fixed rod; 563. Slide; 564. Connecting bar; 565. First spring; 566. Buffer plate; 57. Filtering mechanism; 571. Second connecting rod. 572. Frame; 573. Baffle cylinder; 574. Fixing strip; 575. Filter cylinder; 576. Filter hole; 5777. Lifting mechanism; 5761. Cylinder; 5762. Piston rod; 5763. Push block; 5764. Lifting frame; 5765. Limiting rod; 5766. Rotary wheel; 5767. Second spring; 577. Sliding bar; 6. Feeding assembly; 61. Storage hopper; 62. Baffle cover; 63. Baffle; 64. Discharge port; 65. Adjustment mechanism; 651. Rotating ring; 652. Connecting hole; 653. Storage cylinder; 654. Adjusting cylinder; 655. Connecting block; 656. Adjustment block; 657. Adjusting rod; 658. Insertion hole; 659. Insertion bolt; 6510. Storage rod; 66. Support plate; 67. Discharge port. Detailed Implementation

[0034] To address the issue of graphene precipitation during stirring, this invention utilizes a mixing component to perform bidirectional stirring of the mixture, improving stirring efficiency and preventing sedimentation at the bottom, thus reintroducing the sediment into the stirring process and enhancing the overall uniformity of the mixture. Furthermore, to address the time-consuming issue of multiple weighing and feeding operations, this invention employs a feeding component for uniform feeding, allowing for adjustment of the feeding amount as needed.

[0035] To better understand the above technical solutions, the following will provide a detailed explanation of the technical solutions in conjunction with the accompanying drawings and specific implementation methods.

[0036] Example:

[0037] Please see Figure 1As shown, a graphene copper alloy sintering apparatus includes a sintering kettle 1, a support leg 2 fixedly installed on the outer surface of the sintering kettle 1, a top cover 3 provided at the top of the sintering kettle 1, a feed cover 4 engaged in the inner cavity of the top cover 3, a mixing component 5 provided in the inner cavity of the sintering kettle 1, and a feed component 6 fixedly installed on the upper surface of the sintering kettle 1. The sintering kettle 1 as a whole can be used for heating, the support leg 2 is used to support the sintering kettle 1, the top cover 3 is used to close the sintering kettle 1, the feed cover 4 is used for large-volume feeding, the mixing component 5 is used for mixing and stirring and can be used for vacuum filtration, and the feed component 6 is used for quantitative and uniform mixing and feeding.

[0038] Please see Figure 2 , Figure 3 and Figure 4 As shown, the mixing component 5 includes a motor 51, a bidirectional rotation mechanism 52 is provided at the bottom of the top cover 3, a stirring mechanism 53 is provided at the bottom of the bidirectional rotation mechanism 52, a floating disk 54 is slidably connected to the inner cavity of the sintering kettle 1, a protrusion 55 is fixedly installed on the upper surface of the floating disk 54, a buffer mechanism 56 is provided on the lower surface of the floating disk 54, a suction filtration mechanism 57 is fixedly installed on the inner wall of the sintering kettle 1, and a suction filtration pump is provided in the inner cavity at the bottom of the sintering kettle 1. The bidirectional rotation mechanism 52 is driven by the operation of the motor 51. The stirring mechanism 53 rotates, which drives the graphene and alkaline solution in the inner cavity of the sintering kettle 1 to mix. The stirring mechanism 53 squeezes the protrusion 55, causing the floating disk 54 to squeeze the buffer mechanism 56, making the floating disk 54 shake up and down in the inner cavity of the sintering kettle 1, thereby causing the precipitate on the floating disk 54 to shake, which facilitates more uniform mixing. The filtration mechanism 57 is used to filter the graphene and alkaline solution after mixing by using a filtration pump, saving the time cost consumed by filtration with other equipment.

[0039] Please see Figure 4 , Figure 5 and Figure 6As shown, the bidirectional rotation mechanism 52 includes a first connecting frame 521. A first bevel gear 522 is rotatably connected to the middle part of the first connecting frame 521. A first rotating rod 523 is rotatably connected to the bottom cavity of the first connecting frame 521. A second bevel gear 524 is fixedly installed at the top of the first rotating rod 523. A second rotating rod 525 is rotatably connected to the top of the first connecting frame 521. A third bevel gear 526 is fixedly installed at the bottom of the second rotating rod 525. A connecting rod 527 is fixedly connected to the bottom of the third bevel gear 526. The first connecting frame 521 and the top cover 3 are fixedly connected. The output end of the motor 51 is sleeved with the second rotating rod 525. The second bevel gear 524 and the third bevel gear 525 are connected together. All wheels 526 mesh with the first bevel gear 522. The connecting rod 527 passes through the second bevel gear 524 and the first rotating rod 523, and there is a gap between the connecting rod 527 and the inner cavity of the first rotating rod 523 and the second bevel gear 524. The stirring mechanism 53 includes a stirring frame 531, which is fixedly connected to the first rotating rod 523. A first stirring blade 532 is fixedly installed on the outer surface of the stirring frame 531. A ball 533 is rolledly connected to the bottom end of the first stirring blade 532. A second stirring blade 534 is fixedly connected to the outer surface of the connecting rod 527. The first stirring blade 532 and the second stirring blade 534 are distributed alternately. A protrusion 55 protrudes in the middle, and the bottom end of the ball 533 is located at the protrusion 55. Between the bottom and top of the floating disk 54, the overall mass increases during feeding, causing the floating disk 54 to sink and compress the buffer mechanism 56. At this time, the ball 533 will compress the protrusion 55, that is, the protrusion 55 is compressed when the ball 533 rotates, which facilitates the reciprocating movement of the floating disk 54 in the inner cavity of the motor 51. When mixing the raw materials in the inner cavity of the sintering kettle 1, the operation of the motor 51 drives the second rotating rod 525 to rotate. The rotation of the second rotating rod 525 drives the third bevel gear 526 to rotate. The rotation of the third bevel gear 526 drives the first bevel gear 522 to rotate on the first connecting frame 521. The rotation of the first connecting frame 521 drives the second bevel gear 524 to rotate. The rotation of gear 524 drives the first rotating rod 523 to rotate on the first connecting frame 521. The rotation of the first rotating rod 523 drives the stirring frame 531 to rotate. The rotation of the stirring frame 531 drives the first stirring blade 532 to rotate. The rotation of the third bevel gear 526 drives the connecting rod 527 to rotate. The rotation of the connecting rod 527 drives the second stirring blade 534 to rotate. Under the transmission of the first bevel gear 522, the second bevel gear 524 and the third bevel gear 526 rotate in both directions, so that the first stirring blade 532 and the second stirring blade 534 can achieve forward and reverse rotation. The bidirectional stirring can quickly mix the raw materials evenly through bidirectional rotation, improve production efficiency, and make the production process faster and smoother.

[0040] Please see Figure 4 , Figure 7 and Figure 9As shown, the buffer mechanism 56 includes a buffer frame 561. A fixed rod 562 is fixedly installed on the inner wall of the buffer frame 561. A slide block 563 is slidably connected to the outer surface of the fixed rod 562. A connecting strip 564 is sleeved on the outer surface of the fixed rod 562. There are two slide blocks 563, and the connecting strip 564 is located between the two slide blocks 563. A first spring 565 is rotatably connected to the inner cavity of the slide block 563. A buffer plate 566 is rotatably connected to the end of the first spring 565 away from the slide block 563. The upper surface of the buffer plate 566 is in close contact with the floating disk 54. When the stirring mechanism 53 is mixing, the rotation of the stirring frame 531 drives the ball 533 to rotate. The rotation of the ball 533 causes the ball 533 to pass through the protrusion 55, thereby squeezing the protrusion 55. The protrusion 55 being squeezed causes the floating disk 54 to move downward in the inner cavity of the sintering kettle 1. The downward movement of the floating disk 54 causes the floating disk 54 to exert pressure on the buffer plate 566. The compression of the buffer plate 566 causes the first spring 565 to rotate. The rotation of the first spring 565 causes the slide 563 to slide on the fixed rod 562, thereby the slide 563 compresses the connecting strip 564, allowing the floating disk 54 to move downward in the inner cavity of the sintering kettle 1. After the ball 533 passes the protrusion 55, the buffer plate 566 returns to its original position under the elastic force of the connecting strip 564, thereby causing the floating disk 54 to move upward. In conjunction with the periodic compression of the protrusion 55 by the ball 533, the floating disk 54 can move up and down reciprocally, thereby causing the bottom sediment to shake, which can break the sedimentation state of the material at the bottom of the mixing container and allow it to re-participate in the mixing process, thereby improving the overall mixing uniformity of the material. The shaking of the bottom sediment can accelerate the mixing process of the material, thereby improving the mixing efficiency. This is because the shaking can increase the contact area between the materials, thereby accelerating the interaction between the materials.

[0041] Please see Figure 4 , Figure 8 and Figure 10As shown, the filtration mechanism 57 includes a second connecting frame 571, with baffle cylinders 572 fixedly sleeved at both ends of the second connecting frame 571. A fixing strip 573 is fixedly sleeved on the outer surface of the baffle cylinder 572. The end of the fixing strip 573 away from the baffle cylinder 572 is fixedly connected to the inner wall of the sintering kettle 1. A filtration cylinder 574 is slidably connected to the inner cavity of the baffle cylinder 572. A filtration hole 575 is opened on the outer surface of the filtration cylinder 574. A lifting mechanism 576 is provided on the upper surface of the second connecting frame 571. A sliding strip 577 is fixedly installed on the outer surface of the filtration cylinder 574, and the sliding strip 577 and the baffle cylinder 572 are slidably connected. A buffer frame 561 is fixedly connected to the second connecting frame 571. The lifting mechanism 576 includes a cylinder 5761, and the cylinder 5761 and the second connecting frame 571 are connected. The two connecting frames 571 are fixedly connected. A piston rod 5762 is slidably connected to the inner cavity of the cylinder 5761. A push block 5763 is fixedly installed at one end of the piston rod 5762. The outer surface of the push block 5763 is inclined. A lifting frame 5764 is fixedly connected to the outer surface of the slide bar 577. Limit rods 5765 are slidably connected to the inner cavities of both ends of the lifting frame 5764. A rotating wheel 5766 is rotatably connected to the bottom end of the lifting frame 5764. The push block 5763 is slidably connected to the second connecting frame 571. The push block 5763 slides past the bottom end of the rotating wheel 5766. A second spring 5767 is sleeved on the outer surface of the limit rod 5765. The limit rod 5765 and the floating plate 574 are fixedly connected. The second spring 5767 is located between the floating plate 54 and the lifting frame 5761. Between positions 64, the filtration hole 575 is located inside the baffle cylinder 572, and the floating disk 54 is located above the filtration hole 575. The floating disk 54 and the baffle cylinder 572 are slidably connected. After the graphene and alkaline solution inside the sintering kettle 1 are mixed and allowed to stand for a period of time, the mixture inside the sintering kettle 1 is filtered by the filtration mechanism 57. The filtration pump generates a negative pressure in the inner cavity at the bottom of the floating disk 54. At this time, the operation of the cylinder 5761 drives the piston rod 5762 to slide inside the cylinder 5761. One end of the piston rod 5762 drives the push block 5763 to slide on the second connecting frame 571. The sliding of the push block 5763 drives the rotating wheel 5766 to move upward. The upward movement of the rotating wheel 5766 causes the lifting frame 5764 to compress the second spring 5767. At this time, the lifting frame 5764 slides on the limiting rod 5765, and the upward movement of the lifting frame 5764 drives the sliding bar 577 to move upward. The upward movement of the sliding bar 577 drives the suction filter cylinder 574 to slide in the inner cavity of the shielding cylinder 572, so that the suction hole 575 is exposed above the floating plate 54, allowing the solution to be filtered to enter the inner cavity of the suction filter cylinder 574 through the suction hole 575 and reach the bottom of the sintering kettle 1. The floating plate 54 is used to separate the mixture and filtrate after suction. The fixing bar 573 is used to fix the shielding cylinder 572 and the second connecting frame 571. At the same time, when there is no suction, the shielding cylinder 572 is used to cover the suction hole 575, so that when the floating plate 54 moves downward, the floating plate 54 slides down on the shielding cylinder 572. At this time, the rotating wheel 5766 is not lifted.The floating disc 54 has an elastic force on the slider 577, which in turn causes the slider 577 to exert a compressive force on the lifting frame 5764. This causes the lifting frame 5764 to press the slider 577 down, ensuring that the slider 577 is located at the fixed strip 573 when the floating disc 54 is pressed down. This is used to house the filtration hole 575, preventing the alkaline solution from leaking from the filtration hole 575 when the floating disc 54 shakes up and down. In other words, the floating disc 54 shakes during stirring and remains stationary during filtration. At the same time, the filtration hole 575 is housed within the cavity of the baffle cylinder 572 when the floating disc 54 shakes. Simultaneously, when the lifting frame 5764 moves upward, the limiting rod 5765 provides overall support for the floating disc 54. During the filtration of the mixture above the cavity of the floating disc 54, the overall mass of the mixture becomes lighter. If there is no rigid support at this time, the support effect of the buffer mechanism 56 will be unstable. During the graphene gold plating process, the mixture needs to be allowed to settle during filtration. The limiting rod 5765 replaces the flexible support of the buffer mechanism 56, ensuring the stability of the mixture above the floating disk 54 during filtration.

[0042] Please see Figure 11 and Figure 12 As shown, the feeding assembly 6 includes a storage bin 61, with a cover 62 fastened to the upper surface of the storage bin 61. A baffle 63 is fixedly installed inside the storage bin 61. Two discharge ports 64 are provided at the bottom of the storage bin 61, symmetrically distributed about the baffle 63. A volume adjustment mechanism 65 is provided at the bottom of the storage bin 61, and a support plate 66 is provided at the bottom of the volume adjustment mechanism 65. The support plate 66 is fixedly connected to the top cover 3, allowing for large-scale feeding through the feeding cover 4, i.e., feeding the weighed raw material... Material can be directly fed through the feed cover 4. When replenishment is needed, it can be quantitatively fed through the feed assembly 6, that is, quantitatively replenished. The inner cavity of the storage tank 61 can hold graphene and alkaline solution, and is divided by the baffle 63. The shielding cover 62 is used to seal the storage tank 61. The discharge port 64 is used for feeding. The metering mechanism 65 is used for quantitative feeding and can adjust the raw material. The support plate 66 is used to support and seal the top cover 3, that is, to ensure the sealing of the inside of the sintering kettle 1.

[0043] Please see Figure 11 , Figure 12 and Figure 13As shown, the adjustment mechanism 65 includes a rotating ring 651, with a connecting hole 652 on its upper surface. A storage cylinder 653 is fixedly connected to the bottom end of the rotating ring 651. An adjusting cylinder 654 is slidably connected to the inner cavity of the storage cylinder 653. The bottom end of the adjusting cylinder 654 is in close contact with the support plate 66. A connecting block 655 is sleeved on the outer surface of the adjusting cylinder 654. An adjusting block 656 is fixedly connected to the bottom end of the storage cylinder 653. An adjusting rod 657 is slidably connected to the inner cavity of the adjusting block 656. The outer surface of the adjusting rod 657 is... A socket 658 is provided, and a bolt 659 is threadedly connected to the inner cavity of the adjusting block 656. The bolt 659 and the socket 658 are inserted into each other. A receiving rod 6510 is sleeved on the outer surface of the adjusting rod 657. The rotating ring 651 is rotatably connected to the bottom end of the storage tank 61. When the rotating ring 651 rotates, the connecting hole 652 passes through the discharge port 64. The adjusting cylinder 654 and the adjusting block 656 are slidably connected. The adjusting block 656 and the receiving rod 6510 are rotatably connected. The adjusting rod 657 and the receiving rod 6510 are movably connected. When the rotating ring 651 rotates, the adjusting rod 657 adjusts the material. The section cylinder 654 passes through the discharge port 67, and the end of the connecting block 655 away from the regulating cylinder 654 also passes through the discharge port 67. By rotating the rotating ring 651, the connecting hole 652 is aligned with the discharge port 64, allowing the raw material in the inner cavity of the storage tank 61 to enter the inner cavity of the receiving cylinder 653 and the regulating cylinder 654. By rotating the rotating ring 651, the bottom end of the regulating cylinder 654 is aligned with the discharge port 67, allowing the raw material to enter the inner cavity of the sintering kettle 1. The amount of material to be discharged each time can be adjusted by adjusting the depth of the regulating cylinder 654 in the inner cavity of the receiving cylinder 653. The amount of material to be discharged each time can be adjusted by rotating the plug. 659 disengages the plug 659 from the socket 658. At this time, the sliding adjustment block 656 moves the adjustment rod 657 within the cavity of the receiving rod 6510. When the position is suitable, the plug 659 and the socket 658 are re-engaged, causing the depth of the adjustment cylinder 654 within the cavity of the receiving cylinder 653 to change, thereby altering the capacity of the receiving cylinder 653 and the adjustment cylinder 654. This facilitates feeding according to the required amount. When feeding is not required, one end of the connecting block 655 can be covered to cover the feeding port 67 to ensure the sealing of the sintering kettle 1.

[0044] In summary, the sintering kettle 1 can be used for heating as a whole, the support legs 2 are used to support the sintering kettle 1, the top cover 3 is used to seal the sintering kettle 1, the feed cover 4 is used for large-scale material feeding, the mixing component 5 is used for mixing and stirring and can perform vacuum filtration, and the feeding component 6 is used for quantitative and uniform mixing and feeding. The operation of the motor 51 causes the bidirectional rotation mechanism 52 to drive the stirring mechanism 53 to rotate. The rotation of the stirring mechanism 53 causes the graphene and alkaline solution in the inner cavity of the sintering kettle 1 to mix. The stirring mechanism 53 squeezes the protrusion 55, causing the floating disk 54 to squeeze the buffer mechanism 56, causing the floating disk 54 to sway up and down in the inner cavity of the sintering kettle 1, thereby causing the floating disk 54 to move upwards and downwards. The precipitate is shaken to facilitate more uniform mixing. The filtration mechanism 57 is used to filter the graphene and alkaline solution after mixing by a filtration pump, saving the time cost of filtration with other equipment. When replenishment is needed, the feed assembly 6 can be used for quantitative feeding, that is, quantitative replenishment of raw materials. The inner cavity of the storage tank 61 can hold graphene and alkaline solution and is divided by the baffle 63. The cover 62 is used to seal the storage tank 61. The discharge port 64 is used for discharging. The metering mechanism 65 is used for quantitative discharging and can adjust the raw materials. The support plate 66 is used to support and seal the top cover 3, that is, to ensure the sealing of the inside of the sintering kettle 1.

[0045] Obviously, those skilled in the art can make various modifications and variations to this invention without departing from its spirit and scope. Therefore, if these modifications and variations fall within the scope of the claims of this invention and their equivalents, this invention also intends to include these modifications and variations.

[0046] The above description is merely a preferred embodiment of the present application, but the scope of protection of the present application is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present application, based on the technical solution and concept of the present application, should be covered within the scope of protection of the present application.

Claims

1. A graphene-copper alloy sintering apparatus, comprising a sintering kettle (1), characterized in that, The outer surface of the sintering kettle (1) is fixedly equipped with a support leg (2), the top of the sintering kettle (1) is provided with a top cover (3), the inner cavity of the top cover (3) is fitted with a feed cover (4), the inner cavity of the sintering kettle (1) is provided with a mixing component (5), and the upper surface of the sintering kettle (1) is fixedly equipped with a feed component (6). The mixing component (5) includes a motor (51), the bottom end of the top cover (3) is provided with a bidirectional rotation mechanism (52), the bottom end of the bidirectional rotation mechanism (52) is provided with a stirring mechanism (53), the inner cavity of the sintering kettle (1) is slidably connected with a floating disk (54), the upper surface of the floating disk (54) is fixedly installed with a protrusion (55), the lower surface of the floating disk (54) is provided with a buffer mechanism (56), the inner wall of the sintering kettle (1) is fixedly installed with a suction filter mechanism (57), and the bottom inner cavity of the sintering kettle (1) is provided with a suction filter pump; The buffer mechanism (56) includes a buffer frame (561); The filtration mechanism (57) includes a second connecting frame (571), with shielding cylinders (572) fixedly sleeved at both ends of the second connecting frame (571). A fixing strip (573) is fixedly sleeved on the outer surface of the shielding cylinder (572). The end of the fixing strip (573) away from the shielding cylinder (572) is fixedly connected to the inner wall of the sintering kettle (1). A filtration cylinder (574) is slidably connected to the inner cavity of the shielding cylinder (572). A filtration hole (575) is opened on the outer surface of the filtration cylinder (574). A lifting mechanism (576) is provided on the upper surface of the second connecting frame (571). A sliding strip (577) is fixedly installed on the outer surface of the filtration cylinder (574). The sliding strip (577) and the shielding cylinder (572) are slidably connected. The buffer frame (561) is fixedly connected to the second connecting frame (571). The lifting mechanism (576) includes a cylinder (5761), which is fixedly connected to a second connecting frame (571). A piston rod (5762) is slidably connected to the inner cavity of the cylinder (5761). A push block (5763) is fixedly installed at one end of the piston rod (5762). The outer surface of the push block (5763) is an inclined surface. A lifting frame (5764) is fixedly connected to the outer surface of the slide bar (577). Limit rods (5765) are slidably connected to the inner cavities of both ends of the lifting frame (5764). A rotating wheel (5766) is rotatably connected to the bottom end of the lifting frame (5764). The push block (5763) and the second connecting frame (571) are slidably connected. The push block (5763) slides past the bottom end of the rotating wheel (5766). The outer surface of the limiting rod (5765) is fitted with a second spring (5767). The limiting rod (5765) and the floating disk (54) are fixedly connected. The second spring (5767) is located between the floating disk (54) and the lifting frame (5764). The suction hole (575) is located in the inner cavity of the shielding cylinder (572), and the floating disk (54) is located above the suction hole (575). The floating disk (54) and the shielding cylinder (572) are slidably connected.

2. The graphene-copper alloy sintering apparatus as described in claim 1, characterized in that, The bidirectional rotation mechanism (52) includes a first connecting frame (521), a first bevel gear (522) is rotatably connected to the middle part of the first connecting frame (521), a first rotating rod (523) is rotatably connected to the bottom cavity of the first connecting frame (521), a second bevel gear (524) is fixedly installed at the top of the first rotating rod (523), a second rotating rod (525) is rotatably connected to the top of the first connecting frame (521), a third bevel gear (526) is fixedly installed at the bottom of the second rotating rod (525), and a connecting rod (527) is fixedly connected to the bottom of the third bevel gear (526).

3. The graphene-copper alloy sintering apparatus as described in claim 2, characterized in that, The first connecting frame (521) and the top cover (3) are fixedly connected. The output end of the motor (51) and the second rotating rod (525) are sleeved together. The second bevel gear (524) and the third bevel gear (526) are both meshed with the first bevel gear (522). The connecting rod (527) passes through the second bevel gear (524) and the first rotating rod (523), and there is a gap between the connecting rod (527) and the inner cavity of the first rotating rod (523) and the second bevel gear (524).

4. The graphene-copper alloy sintering apparatus as described in claim 3, characterized in that, The stirring mechanism (53) includes a stirring frame (531), which is fixedly connected to a first rotating rod (523). A first stirring blade (532) is fixedly installed on the outer surface of the stirring frame (531). A ball (533) is rolledly connected to the bottom end of the first stirring blade (532). A second stirring blade (534) is fixedly connected to the outer surface of the connecting rod (527). The first stirring blade (532) and the second stirring blade (534) are distributed in a cross pattern. The protrusion (55) protrudes in the middle. The bottom end of the ball (533) is located between the bottom end and the top end of the protrusion (55).

5. The graphene-copper alloy sintering apparatus as described in claim 1, characterized in that, A fixing rod (562) is fixedly installed on the inner wall of the buffer frame (561). A slide block (563) is slidably connected to the outer surface of the fixing rod (562). A connecting strip (564) is sleeved on the outer surface of the fixing rod (562). There are two slide blocks (563), and the connecting strip (564) is located between the two slide blocks (563). A first spring (565) is rotatably connected to the inner cavity of the slide block (563). A buffer plate (566) is rotatably connected to the end of the first spring (565) away from the slide block (563). The upper surface of the buffer plate (566) is in close contact with the floating disk (54).

6. The graphene-copper alloy sintering apparatus as described in claim 1, characterized in that, The feeding assembly (6) includes a storage bin (61), a cover (62) is fitted on the upper surface of the storage bin (61), a baffle (63) is fixedly installed in the inner cavity of the storage bin (61), and a discharge port (64) is opened at the bottom of the storage bin (61). There are two discharge ports (64), which are symmetrically distributed about the baffle (63). An adjustment mechanism (65) is provided at the bottom of the storage bin (61), and a support plate (66) is provided at the bottom of the adjustment mechanism (65). The support plate (66) and the top cover (3) are fixedly connected.

7. The graphene-copper alloy sintering apparatus as described in claim 6, characterized in that, The adjustment mechanism (65) includes a rotating ring (651), the upper surface of which has a connecting hole (652), the bottom end of which is fixedly connected to a storage cylinder (653), the inner cavity of which is slidably connected to an adjusting cylinder (654), the bottom end of which is in close contact with a support plate (66), and the outer surface of which is fitted with a connecting block (655). The bottom end of the storage tube (653) is fixedly connected to an adjustment block (656), and an adjustment rod (657) is slidably connected to the inner cavity of the adjustment block (656). An insertion hole (658) is opened on the outer surface of the adjustment rod (657). A plug (659) is threadedly connected to the inner cavity of the adjustment block (656). The plug (659) and the insertion hole (658) are inserted into each other. A storage rod (6510) is sleeved on the outer surface of the adjustment rod (657).

8. The graphene-copper alloy sintering apparatus as described in claim 7, characterized in that, The rotating ring (651) and the bottom of the storage bucket (61) are rotatably connected. When the rotating ring (651) rotates, the connecting hole (652) passes through the discharge port (64). The adjusting cylinder (654) and the adjusting block (656) are slidably connected. The adjusting block (656) and the receiving rod (6510) are rotatably connected. The adjusting rod (657) and the receiving rod (6510) are movably connected. When the rotating ring (651) rotates, the adjusting cylinder (654) passes through the discharge port (67), and the end of the connecting block (655) away from the adjusting cylinder (654) passes through the discharge port (67).

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