Vacuum chuck and process treatment equipment

CN119833464AActive Publication Date: 2025-04-15SHENZHEN SICARRIER IND MACHINES CO LTD
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Patent Information

Application Number
CN202510047745.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-10
Publication Date
2025-04-15
Estimated Expiration
2045-01-10

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Abstract

The invention relates to the technical field of process treatment, in particular to a vacuum chuck and process treatment equipment. The vacuum chuck includes a chuck and a support structure. The chuck is provided with a surface and a bottom surface which are opposite, the chuck is provided with an air exhaust hole penetrating through the surface and the bottom surface, the air exhaust hole is provided with an air inlet located in the surface of the chuck and an air outlet located in the bottom surface of the chuck, and the air flow area of the air inlet is smaller than that of the air outlet; an air groove structure communicated with the air outlet is arranged on the surface of the chuck; the supporting structure is connected to one side of the bottom face of the chuck. The supporting structure is provided with an exhaust pipe set, one end of the exhaust pipe set communicates with the air outlet, and the other end of the exhaust pipe set is used for being connected with vacuumizing equipment. The vacuum chuck can weaken the state of low pressure near the air inlet caused by vacuumizing, and further weaken the influence of the air exhaust holes on the air pressure distribution between the surface of the chuck and the part to be processed. Therefore, the thermal resistance between the chuck and the to-be-processed part is reduced, and the temperature uniformity of the to-be-processed part is improved.
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Citation Information

Patent Citations

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    EP2520415A1

  • Vacuum chuck

    JP2008300426A