Mild cleaning mask applicable to sensitive skin and composition and preparation method thereof
CN119837796APending Publication Date: 2025-04-18N O D TOPIA (GUANGZHOU) BIOTECHNOLOGY CO LTD
Patent Information
- Application Number
- CN202510049221.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-13
- Publication Date
- 2025-04-18
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Figure CN119837796A_ABST
Abstract
The invention discloses a mild cleaning mask applicable to sensitive skin and a composition and a preparation method thereof, and belongs to the technical field of cosmetics. The composition comprises the following components in parts by weight: 16-23 parts of a mud component, 0.5-4 parts of a skin conditioner, 18-22 parts of a humectant and 2-6 parts of an emollient, the mud component comprises 1-3 parts of sludge, 0.5-1 part of sea mud extract and 1-3 parts of salt mine mud; the skin conditioner is prepared from the following components in parts by weight: 0.01 to 0.5 part of lithocladus vespae extract, 0.01 to 1 part of roselle flower extract and 0.01 to 2 parts of phellinus linteus extract. According to the mild cleaning mask composition and the mask, the mud component containing specific components is used as the mask substrate, absorption of a skin conditioner with specific components can be promoted, and the moisturizing agent and the emollient are matched, so that the mild cleaning mask composition and the mask can be suitable for sensitive skin, are not dry or tight after being applied for 30-35 minutes, and have multiple effects of cleaning, oil control, acne removal and the like.
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Citation Information
Patent Citations
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