显示基板及其制备方法、显示装置
By setting a p-type oxide-doped anode modification layer and an n-type material layer on the OLED substrate, the crosstalk and voltage rise problems caused by p-dopant doping are solved, thus improving the OLED display performance.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BOE TECHNOLOGY GROUP CO LTD
- Filing Date
- 2025-01-03
- Publication Date
- 2026-07-17
AI Technical Summary
In the OLED panel manufacturing process, excessively high p-dopant doping concentration leads to poor crosstalk, while excessively low concentration leads to increased operating voltage and power consumption, affecting display performance.
An anode modification layer and an n-type material layer are disposed on the display substrate. The anode modification layer uses a p-type oxide-doped anode material, and the n-type material layer forms a pn junction with the hole injection layer to regulate the interface energy level and suppress lateral current.
It effectively improves the problem of increased operating voltage in OLED devices, reduces crosstalk, and enhances display performance.
Smart Images

Figure CN119855444B_ABST