Display substrate and display device

Abstract

The invention discloses a display substrate and a display device. The display substrate includes a substrate, a plurality of sub-pixels, an insulating layer, and a pixel defining pattern. The insulating layer includes a plurality of grooves, the grooves are at least partially located between adjacent sub-pixels, and the pixel defining pattern includes a pixel defining portion surrounding the plurality of first openings and the plurality of second openings. The display substrate further comprises an isolation layer, the isolation layer comprises a flat part, and the edge of the flat part is covered by the pixel limiting part; an isolation structure is arranged in the groove and comprises a first isolation part and a second isolation part, and the edge of the second isolation part protrudes relative to the edge of the first isolation part to form a protruding part. The protruding part is configured to partition at least one of the multiple film layers, and the second isolation part is a part, exposed by the second opening, in the isolation layer. The isolation layer and the isolation structure are arranged, so that the smear problem can be relieved and the crosstalk problem between the adjacent sub-pixels can be improved while the flatness of the first electrode is improved.

Description

Technical Field

[0001] At least one embodiment of the present disclosure relates to a display substrate and a display device. Background Art

[0002] Tandem organic light-emitting display devices increase the life and brightness of light-emitting devices and reduce power consumption by adding at least one light-emitting layer and a charge generating layer in the organic light-emitting device to meet users' requirements for the life and power consumption of display devices. Summary of the invention

[0003] At least one embodiment of the present disclosure provides a display substrate and a display device.

[0004] At least one embodiment of the present disclosure provides a display substrate, including a substrate; a plurality of sub-pixels, located on the substrate, each of at least some of the sub-pixels includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the substrate, the first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer includes a plurality of film layers; an insulating layer, located between the first electrode and the substrate; the insulating layer includes a plurality of grooves, and the grooves are at least partially located between adjacent sub-pixels; a pixel defining pattern, located on a side of the first electrode away from the substrate, the pixel defining pattern includes a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, one sub-pixel corresponds to at least one first opening, and the light-emitting functional layer of the sub-pixel is at least partially located in the In the first opening corresponding to the sub-pixel, the first opening is configured to expose the first electrode; wherein the display substrate also includes an isolation layer, which is located between the first electrode and the insulating layer; the isolation layer includes a flat portion, which overlaps with the first electrode in a direction perpendicular to the base substrate, and the edge of the flat portion is covered by the pixel defining portion; an isolation structure is arranged in at least part of the groove, and at least part of the isolation structure is exposed by the second opening; the isolation structure includes a first isolation portion and a second isolation portion arranged in a stacked manner, the first isolation portion is located between the second isolation portion and the base substrate, at least part of the first isolation portion is located in the groove, the edge of the second isolation portion protrudes relative to the edge of the first isolation portion to form a protrusion, and the protrusion is configured to isolate at least one layer of the multi-layer film layer; the second isolation portion is a portion of the isolation layer exposed by the second opening.

[0005] For example, according to at least one embodiment of the present disclosure, the first isolation portion and the insulating layer are an integrally formed structure.

[0006] For example, according to at least one embodiment of the present disclosure, in the arrangement direction of adjacent sub-pixels, there is a gap between the orthographic projection of the isolation structure on the base substrate and the orthographic projection of the pixel defining portion on the base substrate.

[0007] For example, according to at least one embodiment of the present disclosure, the protrusion is configured to separate the second electrode.

[0008] For example, according to at least one embodiment of the present disclosure, in a direction perpendicular to the base substrate, a ratio of a distance between the flat portion and the base substrate to a distance between the second isolation portion and the base substrate is 0.9-1.1.

[0009] For example, according to at least one embodiment of the present disclosure, the maximum depth of the groove is greater than the maximum dimension of the light-emitting functional layer in a direction perpendicular to the base substrate; the maximum depth of the groove is 0.2 micrometers to 0.5 micrometers.

[0010] For example, according to at least one embodiment of the present disclosure, the orthographic projection of the first electrode on the base substrate is located within the orthographic projection of the flat portion on the base substrate; in any direction parallel to the base substrate, the size of the flat portion is not smaller than the size of the first electrode.

[0011] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a portion located in the groove, and the portion is spaced apart from the first isolation portion.

[0012] For example, according to at least one embodiment of the present disclosure, an isolation column is disposed in the second opening and is located on a side of the isolation structure away from the base substrate, and the isolation column covers at least a portion of the second isolation portion except the protrusion.

[0013] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a first side wall, and the angle between at least a portion of the first side wall and the contact surface between the pixel defining portion and the bottom wall of the groove is a first slope angle; the orthographic projection of the first side wall on the substrate overlaps with the orthographic projection of the bottom wall of the groove on the substrate; the isolation column includes a second side wall, and the angle between at least a portion of the second side wall and the contact surface between the isolation column and the second isolation portion is a second slope angle; the first slope angle is greater than the second slope angle, and the first slope angle and the second slope angle are both less than 90 degrees.

[0014] For example, according to at least one embodiment of the present disclosure, the pixel defining portion and the isolation column are configured to be formed by one patterning process.

[0015] For example, according to at least one embodiment of the present disclosure, the display substrate also includes a touch structure located on a side of the pixel defining pattern away from the base substrate; the touch structure includes a multilayer touch electrode, and the orthographic projection of at least one layer of the multilayer touch electrode on the base substrate overlaps with the orthographic projection of a portion of the isolation structure other than the protrusion on the base substrate.

[0016] For example, according to at least one embodiment of the present disclosure, an isolation column is provided in the second opening, located on a side of the isolation structure away from the base substrate, and the isolation column covers at least a portion of the second isolation portion except the protrusion; the orthographic projection of at least one of the multilayer touch electrodes on the base substrate overlaps with the orthographic projection of the isolation column on the base substrate.

[0017] For example, according to at least one embodiment of the present disclosure, the isolation structure in at least one groove includes a plurality of sub-isolation structures, and the plurality of sub-isolation structures are arranged at intervals in an arrangement direction of adjacent sub-pixels.

[0018] For example, according to at least one embodiment of the present disclosure, the number of the second openings is smaller than the number of groove openings of the groove.

[0019] For example, according to at least one embodiment of the present disclosure, a spacing between an orthographic projection of the second isolation portion on the base substrate and an orthographic projection of the adjacent pixel defining portion on the base substrate in the arrangement direction of the adjacent sub-pixels is 1 micron to 3 microns.

[0020] For example, according to at least one embodiment of the present disclosure, a dimension of the protrusion in the arrangement direction of adjacent sub-pixels is greater than a maximum thickness of the light-emitting functional layer.

[0021] For example, according to at least one embodiment of the present disclosure, a size of the second isolation portion in an arrangement direction of adjacent sub-pixels is 5 micrometers to 7 micrometers.

[0022] At least one embodiment of the present disclosure provides a display device, comprising the display substrate described in any of the above embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0024] Figure 1 A schematic plan view of a display substrate provided as an example in at least one embodiment of the present disclosure.

[0025] Figure 2 for Figure 1The schematic cross-sectional view is taken along line AA'.

[0026] Figure 3 for Figure 1 The diagram shows a cross-sectional view of a partial structure of a display substrate.

[0027] Figure 4 A schematic cross-sectional view of a display substrate provided as an example in at least one embodiment of the present disclosure.

[0028] Figure 5 A schematic plan view of a display substrate provided as an example in at least one embodiment of the present disclosure.

[0029] Figure 6 for Figure 5 The cross-sectional schematic diagram is shown along the BB' line.

[0030] Figure 7 and Figure 8 A schematic cross-sectional view of a display substrate provided for different examples in at least one embodiment of the present disclosure.

[0031] Fig. 9 and Fig.10 A schematic cross-sectional view of a display substrate provided for different examples in at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0033] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. The words "include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0034] The features "parallel", "perpendicular", and "identical" used in the present disclosure include the features "parallel", "perpendicular", and "identical" in a strict sense, as well as the cases where "approximately parallel", "approximately perpendicular", "approximately identical", etc. contain certain errors, taking into account the errors associated with the measurement of specific quantities (that is, the limitations of the measurement system), indicating that the acceptable deviation range for a specific value is determined by ordinary technicians in this field. The "center" in the embodiments of the present disclosure can include a position strictly located at the geometric center and a position approximately centered within a small area around the geometric center. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value.

[0035] A single-layer organic light-emitting display device is an organic light-emitting display device that includes a single light-emitting layer, also known as a single device. Since the display life of a single device is limited and it is difficult to meet user needs, Tandem technology came into being. Since Tandem devices require at least two evaporation processes of light-emitting materials, the crosstalk problem is particularly severe.

[0036] During the study, the inventors of the present application found that an inorganic isolation structure can be designed around the sub-pixel to isolate the light-emitting layer, thereby improving the above-mentioned crosstalk problem. During the study, the inventors of the present application also found that after the introduction of the above-mentioned inorganic isolation structure, new optical problems exist under new process conditions, and the display panel has more serious ghosting and crosstalk problems under low brightness conditions. Specifically, in the light-emitting layer that is isolated at the position of the isolation groove, the charge generation layer and the cathode are in direct contact at a position close to the light-emitting area of ​​the sub-pixel, resulting in a short circuit in the second-layer device (such as the second light-emitting layer and other film layers), and the total capacitance of the second-layer device is too large. For example, limited by the material properties of the light-emitting layer in the green sub-pixel, the capacitance of the green sub-pixel is large and the efficiency is high, which will cause the display screen of the display device to have a ghosting problem.

[0037] At least one embodiment of the present disclosure provides a display substrate and a display device. The display substrate includes a base substrate, a plurality of sub-pixels, an insulating layer, and a pixel defining pattern. A plurality of sub-pixels are located on the base substrate, and each of at least some of the sub-pixels includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the base substrate, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; an insulating layer is located between the first electrode and the base substrate; the insulating layer includes a plurality of grooves, and the grooves are at least partially located between adjacent sub-pixels; a pixel defining pattern is located on a side of the first electrode away from the base substrate, the pixel defining pattern includes a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, one sub-pixel corresponds to at least one first opening, and the light-emitting functional layer of the sub-pixel is at least partially located in the first opening corresponding to the sub-pixel The first opening is configured to expose the first electrode; wherein the display substrate further comprises an isolation layer, which is located between the first electrode and the insulating layer; the isolation layer comprises a flat portion, which overlaps with the first electrode in a direction perpendicular to the base substrate, and the edge of the flat portion is covered by the pixel defining portion; an isolation structure is arranged in at least part of the groove, and at least part of the isolation structure is exposed by the second opening; the isolation structure comprises a first isolation portion and a second isolation portion which are stacked, the first isolation portion is located between the second isolation portion and the base substrate, at least part of the first isolation portion is located in the groove, an edge of the second isolation portion protrudes relative to an edge of the first isolation portion to form a protrusion, and the protrusion is configured to isolate at least one layer of the multi-layer film layer; the second isolation portion is a portion of the isolation layer exposed by the second opening.

[0038] The display substrate and display device provided by at least one embodiment of the present disclosure can improve the crosstalk problem between adjacent sub-pixels by providing an isolation layer, while using the flat portion to improve the flatness of the first electrode, and using the protrusion of the second isolation portion to isolate at least one layer of the multi-layer film layer of the light-emitting functional layer. Moreover, the isolation structure provided in the groove can divide the groove into a plurality of sub-grooves, which is beneficial to extend the crosstalk path between adjacent sub-pixels. In addition, in the case where the protrusion isolates at least one layer of the multi-layer film layer in the light-emitting functional layer, even if the isolated film layer directly contacts the second electrode as shown in the figure and a short circuit occurs, since the short circuit occurs at the isolation structure, that is, on the side of the sub-groove away from the sub-pixel light-emitting area, the impact of the short circuit on the sub-pixel can be reduced or even eliminated, which is beneficial to alleviate the problem of ghosting.

[0039] The display substrate and the display device are described below with reference to the accompanying drawings and through some embodiments.

[0040] Figure 1 A schematic plan view of a display substrate provided as an example in at least one embodiment of the present disclosure. Figure 2 for Figure 1The schematic cross-sectional view is taken along line AA'. Figure 3 for Figure 1 The diagram shows a cross-sectional view of a partial structure of a display substrate.

[0041] For example, Figure 3 The cross-sectional schematic diagram of the display substrate is shown in FIG. Figure 2 The cross-sectional schematic diagram of the display substrate shown is different in that Figure 3 The display substrate in the embodiment omits the light-emitting functional layer and the second electrode. It is understandable that Figure 3 The structure in the display substrate shown can be Figure 2 The structure of the display substrate shown is the same except for the light-emitting functional layer and the second electrode. However, the present disclosure is not limited thereto. Figure 3 The display substrate shown can also be Figure 2 The display substrate shown has other differences.

[0042] refer to Figure 1 , Figure 2 and Figure 3 , the display substrate includes a base substrate 01, a plurality of sub-pixels 100, an insulating layer 200 and a pixel defining pattern 300. The plurality of sub-pixels 100 are located on the base substrate 01, and each of at least some of the sub-pixels 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 along a direction Z perpendicular to the base substrate 01, the first electrode 110 is located between the light-emitting functional layer 130 and the base substrate 10, and the light-emitting functional layer 130 includes a plurality of film layers. For example, all sub-pixels may include a light-emitting functional layer, a first electrode and a second electrode. However, the present disclosure is not limited thereto, and only some of the sub-pixels may include a light-emitting functional layer, a first electrode and a second electrode.

[0043] refer to Figure 1 , Figure 2 and Figure 3 The insulating layer 200 is located between the first electrode 110 and the base substrate 01, and the insulating layer 200 includes a plurality of grooves 210, and the grooves 210 are at least partially located between adjacent sub-pixels 100. Figure 3 As shown, the dotted box schematically shows the area where the groove 210 is located. For example, adjacent sub-pixels refer to the absence of other sub-pixels between the two adjacent sub-pixels. For example, the groove may be completely located between adjacent sub-pixels, or only a portion of the groove may be located between adjacent sub-pixels, and the present disclosure does not limit this.

[0044] refer to Figure 1 , Figure 2 and Figure 3The pixel defining pattern 300 is located on a side of the first electrode 110 away from the base substrate 01. The pixel defining pattern 300 includes a plurality of first openings 301 and a plurality of second openings 302, and a pixel defining portion 310 surrounding the plurality of first openings 301 and the plurality of second openings 302. One sub-pixel 100 corresponds to at least one first opening 301. For example, one sub-pixel may correspond to one first opening, or may correspond to more than two first openings.

[0045] refer to Figure 1 , Figure 2 and Figure 3 , the light-emitting functional layer 130 of the sub-pixel 100 is at least partially located in the first opening 301 corresponding to the sub-pixel 100, and the first opening 301 is configured to expose the first electrode 110. For example, the first electrode 110 and the second electrode 120 located on both sides of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 in the first opening 301 of the pixel defining pattern 300 to emit light. For example, the light-emitting functional layer can be located only in the first opening, or can be located in the first opening and on the pixel defining portion, or can be located in the first opening, on the pixel defining portion, and in the second opening and on the isolation structure in the examples described later, and the present disclosure is not limited to this.

[0046] refer to Figure 1 , Figure 2 and Figure 3 , the display substrate further includes an isolation layer 02, which is located between the first electrode 110 and the insulating layer 200. The isolation layer 02 includes a flat portion 400, which overlaps with the first electrode 110 in a direction perpendicular to the base substrate 01, and the edge of the flat portion 400 is covered by the pixel defining portion 310. For example, the flat portion 400 can provide a flat surface for the first electrode 110, reducing the risk of disconnection of the first electrode 110.

[0047] refer to Figure 1 , Figure 2 and Figure 3 , an isolation structure 500 is disposed in at least part of the grooves 210. For example, the isolation structure may be disposed in all grooves, or only in part of the grooves, and the present disclosure is not limited thereto. At least part of the isolation structure 500 is exposed by the second opening 302. For example, the second opening may expose the entire structure of the isolation structure, or only expose a part of the isolation structure, and the present disclosure is not limited thereto.

[0048] refer to Figure 1 , Figure 2 and Figure 3The isolation structure 500 includes a first isolation portion 510 and a second isolation portion 520 which are stacked, and the first isolation portion 510 is located between the second isolation portion 520 and the base substrate 01. At least a portion of the first isolation portion 510 is located in the groove 210. For example, the first isolation portion may be completely located in the groove, or only a portion of the first isolation portion may be located in the groove, and the present disclosure is not limited to this.

[0049] refer to Figure 1 , Figure 2 and Figure 3 The edge of the second isolation portion 520 protrudes relative to the edge of the first isolation portion 510 to form a protrusion 521, and the protrusion 521 is configured to isolate at least one layer of the multi-layer film layer. The second isolation portion 520 is a portion of the isolation layer 02 exposed by the second opening 302. For example, the protrusion can isolate one layer of the multi-layer film layer, or can isolate all the layers of the multi-layer film layer, and the present disclosure is not limited to this.

[0050] refer to Figure 1 , Figure 2 and Figure 3 The display substrate provided by the embodiment of the present disclosure, by providing an isolation layer 02, can improve the flatness of the first electrode 110 by using the flat portion 400, and at least one layer of the multi-layer film layer of the light-emitting functional layer 130 can be isolated by using the protrusion 521 of the second isolation portion 520, thereby improving the crosstalk problem between adjacent sub-pixels 100. Moreover, the isolation structure 500 provided in the groove 210 can divide the groove 210 into a plurality of sub-grooves, which is beneficial to extend the crosstalk path between adjacent sub-pixels 100. In addition, when the protrusion 521 isolates at least one layer of the multi-layer film layer in the light-emitting functional layer 130, even if Figure 2 The isolated film layer shown is in direct contact with the second electrode 120 and a short circuit occurs. Since the short circuit occurs at the isolation structure 500, that is, on the side of the sub-groove away from the light-emitting area of ​​the sub-pixel 100, the impact of the short circuit on the sub-pixel 100 can be reduced or even eliminated, which is beneficial to improving the ghosting problem.

[0051] For example, the material of the first isolation portion is different from the material of the second isolation portion, so that the protrusion of the second isolation portion can be formed by utilizing the different material properties of the first isolation portion and the second isolation portion during the etching process.

[0052] For example, the material of the isolation layer includes an inorganic non-metallic material, and the material of the insulating layer includes an organic material. For example, the material of the isolation layer may include silicon nitride or silicon oxide. For example, the insulating layer may be a planarization layer, and the material of the insulating layer may include materials such as polyimide. It can be understood that, in combination with the above examples, the materials of the flat portion and the second isolation portion may both be inorganic non-metallic materials, and the material of the first isolation portion may be an organic material.

[0053] refer to Figure 1 , Figure 2 and Figure 3 After forming an insulating material layer on the substrate, a flat isolation material layer can be formed, and the isolation material layer can be etched with an etching solution to form a flat portion, a groove, and an isolation structure disposed in the groove. Taking the example of etching two sub-grooves in the isolation material layer with an etching solution to form an isolation structure, since the etching selectivity of the etching solution to the material of the insulating material layer is greater than the etching selectivity of the etching solution to the material of the isolation material layer, the edges of the two sub-grooves formed after etching are retracted relative to the edges of the flat portion and the second isolation portion, respectively. As a result, the edge of the second isolation portion can protrude relative to the edge of the first isolation portion, thereby forming a protruding portion of the second isolation portion, and the edge of the flat portion can protrude relative to the edge of the groove, thereby forming a protruding portion of the flat portion.

[0054] For example, Figure 2 The protrusion 521 of the second isolation part 520 is schematically circled in a dotted frame, and the protrusion 410 in the flat part 400 that protrudes relative to the edge of the groove 211 is divided by a dotted line. For example, the protrusion 521 and the portion of the second isolation part 520 other than the protrusion 521 are an integrally formed structure. For example, the protrusion 410 and the portion of the flat part 400 other than the protrusion 410 are an integrally formed structure.

[0055] refer to Figure 1 ,For example, Figure 1 The schematic diagram shows a plurality of openings on the isolation layer 02. Figure 1 and Figure 2 As shown, the opening of the isolation layer 02 is along the arrangement direction of the adjacent sub-pixels 100, and the space between the flat portion 400 and the second isolation portion 520 is located between the adjacent sub-pixels 100. Figures 1 to 3 , the opening of the isolation layer 02 is located in the groove opening 201 of the groove 210 , and the isolation structure 500 is located between the openings of two isolation layers 02 that are adjacent to each other along the arrangement direction of adjacent sub-pixels 100 .

[0056] refer to Figure 1 , Figure 2 and Figure 3 For example, the plurality of sub-pixels 100 may include a first sub-pixel 101, a second sub-pixel 102, and a third sub-pixel 103. For example, the first sub-pixel 101 may be a red sub-pixel, the second sub-pixel 102 may be a green sub-pixel, and the third sub-pixel 103 may be a blue sub-pixel.

[0057] refer to Figure 1 , Figure 2 and Figure 3For example, the first opening 301 surrounded by the pixel defining portion 310 is used to define the light emitting area of ​​the sub-pixel 100. For example, the second opening 302 can be formed by surrounding the pixel defining portion 310. For example, the light emitting area can refer to the area where the sub-pixel effectively emits light, and the shape of the light emitting area refers to a two-dimensional shape, for example, the shape of the light emitting area can be the same as the shape of the first opening 301 surrounded by the pixel defining portion 310.

[0058] refer to Figure 1 , Figure 2 and Figure 3 For example, the first electrode 110 may be an anode, and the second electrode 120 may be a cathode. For example, the anode may be formed of a transparent conductive material having a high work function. For example, the cathode may be formed of a material having high conductivity and low work function, for example, the cathode may be made of a metal material.

[0059] refer to Figure 1 For example, the first electrode 110 may include a main body portion 111 and a connecting portion 112. For example, the first opening 301 exposes a portion of the main body portion 111 to define a light emitting area of ​​the sub-pixel 100. For example, the connecting portion 112 is configured to be electrically connected to other structures, such as the connecting portion 112 is configured to be electrically connected to the pixel circuit through a via.

[0060] refer to Figure 1 , Figure 2 and Figure 3 For example, the light-emitting functional layer 130 may include a first light-emitting layer (EML), a charge generation layer 133 (CGL) and a second light-emitting layer (EML) which are stacked, and the charge generation layer 133 is located between the first light-emitting layer and the second light-emitting layer. The charge generation layer 133 has strong conductivity, which can make the light-emitting functional layer have the advantages of long life, low power consumption and high brightness. For example, compared with a light-emitting functional layer without a charge generation layer, the sub-pixel can increase the light-emitting brightness by nearly double by setting a charge generation layer in the light-emitting functional layer.

[0061] refer to Figure 1 and Figure 2 For example, in each sub-pixel 100, the light-emitting functional layer 130 may further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL) and an electron injection layer (EIL). For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer and the charge generation layer are all common film layers of multiple sub-pixels, which may be referred to as common layers. For example, the common layer and the second electrode may be film layers formed using an open mask.

[0062] refer to Figure 1 and Figure 2For example, the second light-emitting layer may be located between the first light-emitting layer and the second electrode 120, and the hole injection layer may be located between the first electrode 110 and the first light-emitting layer. For example, an electron transport layer may be provided between the charge generation layer and the first light-emitting layer. For example, a hole transport layer may be provided between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer may be provided between the second light-emitting layer and the second electrode 120.

[0063] refer to Figure 1 and Figure 2 For example, the material of the flat portion 400 may be the same as the material of the second isolation portion 520 , so that the flat portion 400 and the second isolation portion 520 may be formed by one patterning process, thereby simplifying the manufacturing process.

[0064] refer to Figure 1 and Figure 2 In some examples, the first isolation portion 510 and the insulating layer 200 are integrally formed to simplify the manufacturing process. Figure 2 The dashed line extending along the X direction schematically shows the boundary between the first isolation part 510 and the insulating layer 200. For example, the material of the first isolation part can be the same as that of the material layer. For example, two sub-grooves can be formed by etching to form an isolation structure disposed in the groove.

[0065] However, the present disclosure is not limited thereto. For example, the first isolation portion may also be a structure that is not integrally formed with the insulating layer. For example, the material of the first isolation portion may be different from the material of the insulating layer.

[0066] refer to Figure 2 In some examples, in the arrangement direction of adjacent sub-pixels 100, such as the X direction, there is a gap G between the orthographic projection of the isolation structure 500 on the substrate 01 and the orthographic projection of the pixel defining portion 310 on the substrate 01, so that the gap G can be used in conjunction with the protrusion 521 to allow a portion of the light-emitting functional layer 130 to extend to the bottom wall of the groove 210, thereby preventing the portion of the light-emitting functional layer 130 covering the second isolation portion 520 from directly contacting the portion of the light-emitting functional layer 130 covering the pixel defining portion 310, thereby achieving isolation of at least one film layer in the light-emitting functional layer 130.

[0067] refer to Figure 1 and Figure 2 ,For example, Figure 1 and Figure 2 A group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the X direction is schematically shown, but the present disclosure does not limit the arrangement direction of the sub-pixels to the X direction. Figure 1Also shown are a group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the Y direction, a group of adjacent green sub-pixels 102 and red sub-pixels 101 arranged in the X direction, and a group of red sub-pixels 101 and green sub-pixels 102 arranged in the Y direction.

[0068] refer to Figure 1 For example, the X direction is perpendicular to the Y direction and both are parallel to the base substrate 01 .

[0069] refer to Figure 2 In some examples, the protrusion 521 is configured to isolate the second electrode 120. For example, the protrusion 521 can isolate all film layers in the light-emitting functional layer 130 and the second electrode 120, thereby improving the improvement effect on the crosstalk problem.

[0070] refer to Figure 3 In some examples, in the direction Z perpendicular to the base substrate 01, the ratio of the distance D1 between the flat portion 400 and the base substrate 01 to the distance D2 between the second isolation portion 520 and the base substrate 01 is 0.9-1.1. For example, the distance D1 between the flat portion 400 and the base substrate 01 is substantially the same as the distance D2 between the second isolation portion 520 and the base substrate 01, so as to facilitate the arrangement of the flat portion 400 and the second isolation portion 520 in the same layer.

[0071] refer to Figure 3 For example, the ratio of the spacing D1 to the spacing D2 may be 0.91-1.09. For example, the ratio of the spacing D1 to the spacing D2 may be 0.91-1.09. For example, the ratio of the spacing D1 to the spacing D2 may be 0.95-1.05. For example, the ratio of the spacing D1 to the spacing D2 may be 1.

[0072] refer to Figure 2 and Figure 3 In some examples, the maximum depth D3 of the groove 210 is greater than the maximum dimension D4 of the light-emitting functional layer 130 in the direction Z perpendicular to the substrate 01, and the maximum depth D3 of the groove 210 is 0.2 micrometers to 0.5 micrometers. Thus, the groove 210 can be used to assist the isolation structure 500 in isolating the light-emitting functional layer 130.

[0073] refer to Figure 2 In some examples, the orthographic projection of the first electrode 110 on the base substrate 01 is located within the orthographic projection of the flat portion 400 on the base substrate 01. Thus, the flat portion 400 can provide a larger flat surface for the first electrode 110 thereon, which is beneficial to prevent the first electrode 110 from forming structures such as steps and causing disconnection.

[0074] refer to Figure 2In some examples, in any direction parallel to the base substrate 01 (eg, X direction), the size of the flat portion 400 is not less than the size of the first electrode 110 , so as to facilitate the flatness of the first electrode 110 .

[0075] For example, in any direction parallel to the substrate, the size of the flat portion may be greater than the size of the first electrode. For example, in any direction parallel to the substrate, the size of the flat portion may be equal to the size of the first electrode.

[0076] refer to Figure 2 and Figure 3 In some examples, the pixel defining portion 310 includes a portion 311 located in the groove 210, and the portion 311 is spaced apart from the first isolating portion 510. The portion 311 of the pixel defining portion 310 extends into the groove 210, so that the edge of the flat portion 400 can be covered to prevent the light-emitting functional layer 130 and the second electrode 120 from being separated by the flat portion 400, which is beneficial to extend the crosstalk path of the charge generation layer while allowing the second electrode 120 to be continuously disposed on the pixel defining portion 310.

[0077] refer to Figure 2 and Figure 3 For example, the material of the flat portion 400 may be different from that of the insulating layer 200. In combination with the aforementioned example of using an etching solution to etch the protrusion 521 of the second isolation portion 520, after etching with the etching solution, the edge of the flat portion 400 protrudes relative to the opening of the groove 210 to form the protrusion 410. The portion 311 of the pixel defining portion 310 is located in the groove 210, and the protrusion 410 can be covered, so that the light-emitting functional layer 130 and the second electrode 120 can be continuously arranged on the side of the pixel defining portion 310 away from the base substrate 01 without being separated.

[0078] refer to Figure 1 and Figure 3 For example, in the X direction, the dimension a of the edge of the first electrode 110 covered by the pixel defining portion 310 is not greater than 2 micrometers. By setting the numerical range of the dimension a, the pixel aperture ratio can be increased while improving the covering effect of the first electrode 110.

[0079] refer to Figure 1 and Figure 3, for example, the dimension a can be 2 microns. For example, the dimension a can be 0.1 microns to 1.9 microns. For example, the dimension a can be 0.2 microns to 1.85 microns. For example, the dimension a can be 0.3 microns to 1.8 microns. For example, the dimension a can be 0.4 microns to 1.7 microns. For example, the dimension a can be 0.5 microns to 1.6 microns. For example, the dimension a can be 0.6 microns to 1.5 microns. For example, the dimension a can be 0.7 microns to 1.4 microns. For example, the dimension a can be 0.8 microns to 1.3 microns. For example, the dimension a can be 0.9 microns to 1.2 microns. For example, the dimension a can be 1 micron to 1.1 microns. It can be understood that the dimension a can also be other values ​​within the above range, which are not listed one by one in the present disclosure.

[0080] refer to Figure 1 , Figure 2 and Figure 3 For example, in the X direction, the difference between the size of the orthographic projection of the pixel defining portion 310 on the base substrate 01 and the size a is the size b, and the size b is 3 micrometers to 4.5 micrometers. By setting the numerical range of the size b, the protrusion 410 of the planar layer 400 can be well covered to prevent the light-emitting functional layer 130 and the second electrode 120 from being separated.

[0081] refer to Figure 1 , Figure 2 and Figure 3 , for example, the dimension b may be 3 microns to 4.4 microns. For example, the dimension b may be 3.1 microns to 4.35 microns. For example, the dimension b may be 3.15 microns to 4.3 microns. For example, the dimension b may be 3.2 microns to 4.25 microns. For example, the dimension b may be 3.25 microns to 4.2 microns. For example, the dimension b may be 3.3 microns to 4.15 microns. For example, the dimension b may be 3.4 microns to 4.1 microns. For example, the dimension b may be 3.5 microns to 4 microns. For example, the dimension b may be 3.6 microns to 3.9 microns. For example, the dimension b may be 3.7 microns to 3.8 microns. It is understood that the dimension b may also be other values ​​within the above range, which are not listed one by one in the present disclosure.

[0082] refer to Figure 1 , Figure 2 and Figure 3 In some examples, the spacing c between the orthographic projection of the second isolating portion 520 on the base substrate 01 and the orthographic projection of the pixel defining portion 310 adjacent thereto on the base substrate 01 in the arrangement direction of the adjacent sub-pixels 100 is 1 micrometer to 3 micrometers. By setting the numerical range of the above spacing c, the second isolating portion 520 can be prevented from directly contacting the pixel defining portion 310, so that at least one layer of the light-emitting functional layer 130 can be isolated by the protruding portion 521 of the second isolating portion 520.

[0083] refer to Figure 1 , Figure 2 and Figure 3 For example, the spacing c may be 1.1 microns to 2.9 microns. For example, the spacing c may be 1.2 microns to 2.8 microns. For example, the spacing c may be 1.3 microns to 2.7 microns. For example, the spacing c may be 1.4 microns to 2.6 microns. For example, the spacing c may be 1.5 microns to 2.5 microns. For example, the spacing c may be 1.55 microns to 2.4 microns. For example, the spacing c may be 1.6 microns to 2.3 microns. For example, the spacing c may be 1.65 microns to 2.2 microns. For example, the spacing c may be 1.7 microns to 2.1 microns. For example, the spacing c may be 1.75 microns to 2 microns. For example, the spacing c may be 1.8 microns to 1.9 microns. It is understood that the spacing c may also be other values ​​within the above range, which are not listed one by one in the present disclosure.

[0084] refer to Figure 1 , Figure 2 and Figure 3 For example, the orthographic projection of the second isolation portion 520 on the substrate substrate 01 and the orthographic projection of the pixel defining portion 310 on the substrate substrate 01 that are adjacent to each other means that there is no other orthographic projection of the second isolation portion 520 on the substrate substrate 01, and there is no other orthographic projection of the pixel defining portion 310 on the substrate substrate 01 between the two orthographic projections. However, there may be orthographic projections of other film layers or other structures between the two orthographic projections, such as there may be an orthographic projection of the insulating layer 200 on the substrate substrate 01 between the two orthographic projections, and the present disclosure does not limit this.

[0085] refer to Figure 1 , Figure 2 and Figure 3 In some examples, the dimension d of the second isolation portion 520 in the arrangement direction of adjacent sub-pixels 100 is 5 microns to 7 microns. For example, the dimension d can be much larger than the maximum thickness of the light-emitting functional layer 130. By setting the numerical range of the dimension d, it is beneficial to isolate at least one film layer in the light-emitting functional layer 130, and make the position where the second electrode 120 directly contacts the charge generation layer 133 in the light-emitting functional layer 130 and short-circuits as far away from the first electrode 110 as possible, thereby reducing the impact of the short circuit on the sub-pixel 100.

[0086] refer to Figure 1 , Figure 2 and Figure 3For example, the dimension d may be 5.1 microns to 6.9 microns. For example, the dimension d may be 5.2 microns to 6.8 microns. For example, the dimension d may be 5.3 microns to 6.7 microns. For example, the dimension d may be 5.4 microns to 6.6 microns. For example, the dimension d may be 5.5 microns to 6.5 microns. For example, the dimension d may be 5.65 microns to 6.45 microns. For example, the dimension d may be 5.7 microns to 6.4 microns. For example, the dimension d may be 5.75 microns to 6.39 microns. For example, the dimension d may be 5.8 microns to 6.31 microns. For example, the dimension d may be 5.9 microns to 6.3 microns. For example, the dimension d may be 5.95 microns to 6.25 microns. For example, the dimension d may be 6 microns to 6.2 microns. For example, the dimension d may be 6.1 microns to 6.15 microns. It is understood that the dimension d may also be other values ​​within the above range, which are not listed one by one in the present disclosure.

[0087] refer to Figure 1 , Figure 2 and Figure 3 In some examples, the size of the protrusion 521 in the arrangement direction of adjacent sub-pixels 100 (such as the X direction) is greater than the maximum thickness of the light-emitting functional layer 130 , so that the protrusion 521 can be used to isolate all film layers in the light-emitting functional layer 130 .

[0088] refer to Figure 1 , Figure 2 and Figure 3 For example, the maximum thickness of the light-emitting functional layer 130 may refer to the maximum distance between the surface of the light-emitting functional layer 130 on the flat surface away from the substrate 01 and the flat surface in the direction Z perpendicular to the substrate 01. For example, the flat surface may refer to the surface of the first electrode 110 on the side away from the substrate 01. For example, the flat surface may refer to the surface of the second isolation portion 520 on the side away from the substrate 01.

[0089] refer to Figure 1 , Figure 2 and Figure 3For example, the size of the protrusion 521 in the arrangement direction of adjacent sub-pixels 100 (such as the X direction) is greater than the sum of the maximum thickness of the light-emitting functional layer 130 and the maximum thickness of the second electrode 120, so that the protrusion 521 is used to isolate all the film layers in the light-emitting functional layer 130 and the second electrode 120. For example, the maximum thickness of the second electrode 120 may refer to the maximum distance between the surface of the second electrode 120 on the flat surface away from the substrate 01 and the flat surface in the direction Z perpendicular to the substrate 01. For example, the above-mentioned flat surface may refer to the surface of the first electrode 110 on the side away from the substrate 01. For example, the above-mentioned flat surface may refer to the surface of the second isolation portion 520 on the side away from the substrate 01.

[0090] refer to Figure 2 and Figure 3 For example, other film layers 011 are provided between the insulating layer 200 and the base substrate 01, and the other film layers 011 may include a gate insulating layer, an interlayer insulating layer, film layers in a pixel circuit (for example, including a thin film transistor, a storage capacitor, and other structures), a data line, a gate line, an initialization signal line, a power signal line, a reset power signal line, a reset control signal line, a light emission control signal line, and other film layers or structures. For example, a surface of the insulating layer 200 facing the base substrate 01 may be in contact with the interlayer insulating layer.

[0091] refer to Figures 1 to 3 For example, in the arrangement direction of adjacent sub-pixels 100 (such as the X direction), the distance between the orthographic projection of the isolation structure 500 on the substrate 01 and the orthographic projection of the first electrodes 100 of the two sub-pixels 100 on the substrate 01 is substantially the same. For example, the isolation structure 500 can be arranged in the middle of the groove 210 as much as possible to facilitate the crosstalk path of the extended charge generation layer of each sub-pixel 100 to be consistent. However, the present disclosure is not limited to this, for example, the isolation structure can also be located closer to one of the two adjacent sub-pixels.

[0092] Figure 4 A schematic cross-sectional view of a display substrate provided as an example in at least one embodiment of the present disclosure.

[0093] For example, Figure 4 Only part of the structure of the display substrate is schematically shown, such as omitting the structure of the light-emitting functional layer, the second electrode, etc. For example, Figure 4 The display substrate shown is Figure 3 The difference between the display substrate shown is that Figure 4 The display substrate shown includes isolation columns. It is understood that Figure 4 The structure in the display substrate shown can be Figure 3 The display substrates shown have the same structure except for the spacer columns. Figure 4The display substrate shown can also be Figure 3 The display substrate shown has other differences, which are not limited by the present disclosure.

[0094] refer to Figure 4 In some examples, an isolation column 320 is provided in the second opening 302, and is located on the side of the isolation structure 500 away from the base substrate 01, and the isolation column 320 covers at least part of the second isolation portion 520 except the protrusion 521. The isolation column 320 avoids the part where the protrusion 521 is located, which is conducive to the protrusion 521 reliably isolating at least one film layer in the light-emitting functional layer. By providing the isolation column 320, it is conducive to extending the crosstalk path of the light-emitting functional layer, thereby alleviating the smear problem of the sub-pixel and reducing the crosstalk between adjacent sub-pixels.

[0095] refer to Figure 4 For example, the second opening 302 may be formed surrounded by the pixel defining portion 310 .

[0096] refer to Figure 4 For example, the isolation column 320 may cover the entire isolation structure 500 except the protrusion 521 , or may only cover a portion of the isolation structure 500 except the protrusion 521 , and the present disclosure is not limited thereto.

[0097] refer to Figure 4 In some examples, the pixel defining portion 310 includes a first side wall 3101, the angle between at least a portion of the first side wall 3101 and the contact surface between the pixel defining portion 310 and the bottom wall 211 of the groove 210 is a first slope angle p, and the orthographic projection of the first side wall 3101 on the base substrate 01 overlaps the orthographic projection of the bottom wall 211 of the groove 210 on the base substrate 01. For example, in the arrangement direction of adjacent sub-pixels 100 (such as the X direction), the first side wall 3101 is the side wall of the pixel defining portion 310 on the side away from the first electrode 110.

[0098] refer to Figure 4 In some examples, the isolation column 320 includes a second side wall 3201 , and an angle between at least a portion of the second side wall 3201 and a contact surface between the isolation column 320 and the second isolation portion 520 is a second slope angle q.

[0099] refer to Figure 4 In some examples, the first slope angle p is greater than the second slope angle q, and both the first slope angle p and the second slope angle q are less than 90 degrees, which is beneficial for achieving continuous setting of the light-emitting functional layer and the second electrode by setting the second slope angle q with a smaller angle.

[0100] refer to Figure 4For example, the pixel defining portion 310 also includes a third side wall 3102 opposite to the first side wall 3101 in the X direction, and the slope angle between at least a portion of the third side wall 3102 and a plane parallel to the contact surface between the first electrode 110 and the pixel defining portion 310 is a third slope angle m, and the third slope angle m is less than the first slope angle p.

[0101] refer to Figure 4 For example, the third slope angle m is not greater than the second slope angle q. For example, the third slope angle m may be equal to the second slope angle q. For example, the third slope angle m may be less than the second slope angle q.

[0102] refer to Figure 4 For example, the isolation column 320 also includes a fourth side wall 3202 opposite to the second side wall 3201 in the X direction, and the slope angle between at least a portion of the fourth side wall 3202 and a plane parallel to the contact surface between the isolation column 320 and the second isolation portion 520 is a fourth slope angle n, and the fourth slope angle n is basically the same as the second slope angle q.

[0103] For example, the slope angle refers to the acute angle between two surfaces. For example, the slope angle ranges from 20 degrees to 60 degrees. For example, the slope angle ranges from 30 degrees to 50 degrees. For example, the slope angle ranges from 35 degrees to 45 degrees.

[0104] For example, Figure 4 It is schematically shown that the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202 are all straight edges, but the invention is not limited thereto. In the actual process, the above-mentioned side walls (for example, the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202) may also be curved edges. For example, the curved edge bends toward a side away from the center of the pixel defining portion (for example, the pixel defining portion 310, the isolation column 320) where the curved edge is located, or the curved edge bends toward a side close to the center of the pixel defining portion where the curved edge is located. At this time, the slope angle between the above-mentioned curved edge and the contact surface may refer to the angle between the tangent line at the midpoint of the curved edge and the contact surface, or may refer to the angle between the tangent line at the intersection of the curved edge and the contact surface and the contact surface.

[0105] refer to Figure 4 In some examples, the pixel defining portion 310 and the isolation column 320 are configured to be formed by one patterning process to simplify the manufacturing process.

[0106] Figure 5 A schematic plan view of a display substrate provided as an example in at least one embodiment of the present disclosure. Figure 6 for Figure 5 The cross-sectional schematic diagram is shown along the BB' line.

[0107] For example, Figure 5The display substrate shown is Figure 1 The difference between the display substrate shown is that Figure 5 The display substrate shown includes a touch structure. It is understandable that Figure 5 The structures other than the touch control structure in the display substrate shown in the figure can be Figure 1 The display substrate structure shown is the same. However, Figure 5 The display substrate shown can also be Figure 1 The display substrate shown has other differences, which are not limited by the present disclosure.

[0108] refer to Figure 5 and Figure 6 In some examples, the display substrate further includes a touch structure 600 located on a side of the pixel defining pattern 300 away from the base substrate 01. The touch structure 600 includes a multi-layer touch electrode 610, and an orthographic projection of at least one layer of the multi-layer touch electrode 610 on the base substrate 01 overlaps with an orthographic projection of a portion of the isolation structure 500 other than the protrusion 521 on the base substrate 01.

[0109] refer to Figure 5 and Figure 6 , the second electrode 120 located above the isolation structure 500 (i.e., the side away from the base substrate 01) will not be isolated, so that the signals transmitted by the structures such as data lines, gate lines, initialization signal lines, etc. between the insulating layer 200 and the base substrate 01 can be shielded by the second electrode 120. Therefore, at least one layer of the multi-layer touch electrodes 610 is arranged above the isolation structure 500 while avoiding the protrusion 521, and the second electrode 120 can be used to achieve signal shielding to prevent the signal transmitted by the touch structure 600 from being affected by the coupling of other signals. In this way, it is helpful to prevent the function of the touch structure from being abnormal, so as to improve the display effect.

[0110] For example, only one layer of the orthographic projection of the touch control electrode on the base substrate may overlap with the orthographic projection of the portion of the isolation structure other than the protrusion on the base substrate. For example, multiple layers of the orthographic projection of the touch control electrode on the base substrate may overlap with the orthographic projection of the portion of the isolation structure other than the protrusion on the base substrate. For example, the orthographic projections of all the touch control electrodes on the base substrate may overlap with the orthographic projection of the portion of the isolation structure other than the protrusion on the base substrate.

[0111] For example, the touch structure may be a single-layer touch structure or a double-layer touch structure, and the present disclosure does not limit this. For example, the touch electrode may include a first touch electrode and a second touch electrode. Figure 5 , Figure 5The schematic diagram shows that when the touch structure is a single-layer touch structure, the first touch electrode and the second touch electrode are arranged in the same layer. When the touch structure is a double-layer touch structure, the first touch electrode and the second touch electrode are arranged in different layers. The embodiment of the present disclosure does not limit the specific structure of the touch structure.

[0112] For example, refer to Figure 6 Another film layer 012 may be disposed between the second electrode 120 and the touch control structure 600 . The other film layer 012 may be a film layer such as an encapsulation layer, and the present disclosure does not limit this.

[0113] Figure 7 and Figure 8 A schematic cross-sectional view of a display substrate provided for different examples in at least one embodiment of the present disclosure.

[0114] For example, Figure 7 The display substrate shown is Figure 6 The difference between the display substrate shown is that Figure 7 The display substrate shown includes spacer columns. For example, Figure 7 The light-emitting functional layer in the display substrate shown in the figure can be a multi-layer film layer, such as Figure 6 The light-emitting functional layers in the display substrate shown have the same structure. Figure 7 The display substrate shown can also be Figure 6 The display substrate shown has other differences, which are not limited by the present disclosure.

[0115] For example, Figure 8 The light-emitting functional layer and the second electrode are omitted in the display substrate shown in FIG. Figure 8 The display substrate shown in the figure also includes other differences compared with the display substrates shown in other figures, which will be explained in detail later.

[0116] refer to Figure 7 In some examples, an isolation column 320 is disposed in the second opening 302 and is located on a side of the isolation structure 500 away from the base substrate 01. The isolation column 320 covers at least a portion of the second isolation portion 520 except the protrusion 521. The orthographic projection of at least one of the multilayer touch electrodes 610 on the base substrate 01 overlaps with the orthographic projection of the isolation column 320 on the base substrate 01.

[0117] refer to Figure 7, the isolation column 320 avoids the part where the protrusion 521 is located, which is conducive to the protrusion 521 to reliably isolate at least one film layer in the light-emitting functional layer. By setting the isolation column 320, it is conducive to extending the crosstalk path of the light-emitting functional layer, thereby alleviating the smear problem of the sub-pixel and reducing the crosstalk between adjacent sub-pixels. At the same time, at least one of the multi-layer touch electrodes 610 is set above the isolation column 320, and the second electrode 120 located above the isolation column 320 can be used to achieve signal shielding to prevent the signal transmitted by the touch structure 600 from being affected by the coupling of other signals. In this way, it is conducive to preventing the function of the touch structure from being abnormal, so as to improve the display effect.

[0118] For example, the isolation column may cover the entire second isolation portion except the protruding portion, or may only cover a portion of the second isolation portion except the protruding portion, and the present disclosure is not limited in this regard.

[0119] For example, the orthographic projection of the first touch electrode on the base substrate may overlap with the orthographic projection of the isolation column on the base substrate. For example, the orthographic projection of the second touch electrode on the base substrate may overlap with the orthographic projection of the isolation column on the base substrate. For example, the orthographic projections of the first touch electrode and the second touch electrode on the base substrate may both overlap with the orthographic projection of the isolation column on the base substrate.

[0120] refer to Figure 7 For example, in the arrangement direction of adjacent sub-pixels 100 (such as the X direction), the distances between the orthographic projections of the isolation column 320 on the substrate 01 and the orthographic projections of the first electrodes 110 of the two sub-pixels 100 on the substrate 01 are substantially the same. For example, the isolation column 320 can be arranged in the middle of the second isolation portion 520 as much as possible to facilitate the crosstalk paths of the extended charge generation layers of each sub-pixel 100 to be consistent. However, the present disclosure is not limited thereto, and for example, the isolation column can also be located closer to one of the two adjacent sub-pixels.

[0121] For example, Figure 8 The display substrate shown is Figure 3 The display substrate shown differs in that Figure 8 The isolation structure in the display substrate shown is different from Figure 3 The isolation structure in the display substrate is shown.

[0122] refer to Figure 8 In some examples, the isolation structure 500 within at least one groove 210 includes a plurality of sub-isolation structures 501 . Figure 8The dashed box schematically encircles a sub-isolation structure 501. A plurality of sub-isolation structures 501 are arranged at intervals in the arrangement direction (such as the X direction) of adjacent sub-pixels 100. By providing a plurality of sub-isolation structures 501, the groove 210 can be divided into a plurality of sub-grooves, thereby facilitating the extension of the crosstalk path of the charge generation layer in the light-emitting functional layer, and also enhancing the isolation effect on the light-emitting functional layer.

[0123] For example, refer to Figure 8 , the isolation structure 500 in at least one groove 210 may include two sub-isolation structures 501, thereby dividing the groove 210 into three sub-grooves. For example, three sub-grooves may be formed by etching, thereby forming two sub-isolation structures disposed in the groove. However, the present disclosure is not limited thereto, and the isolation structure may also include more than three isolation structures.

[0124] For example, refer to Figure 8 , each sub-isolation structure 501 includes a sub-first isolation portion 5101 and a sub-second isolation portion 5202, and the edge of the sub-second isolation portion 5202 protrudes relative to the sub-first isolation portion 5101 to form a protrusion. Therefore, when the isolation structure 500 includes a plurality of sub-isolation structures 501, the protrusion of each sub-second isolation portion 5202 can be used to increase the number of positions that can isolate the light-emitting functional layer, so as to extend the crosstalk path and enhance the isolation effect.

[0125] For example, only one groove may be provided with Figure 8 The isolation structure shown includes multiple sub-isolation structures. For example, there may be multiple grooves with Figure 8 The isolation structure shown includes multiple sub-isolation structures. For example, all grooves may be provided with Figure 8 The isolation structure shown includes multiple sub-isolation structures.

[0126] Fig. 9 and Fig.10 A schematic cross-sectional view of a display substrate provided for different examples in at least one embodiment of the present disclosure.

[0127] Fig. 9 The display substrate shown is Fig.10 The display substrate shown differs in that Fig. 9 The number of the second openings of the display substrate is Fig.10 The number of second openings of the display substrate shown is different. However, the present disclosure is not limited thereto. Fig. 9 The display substrate shown is Fig.10 The display substrate shown can also have more differences, such as Fig. 9 The shape of the second opening is similar to Fig.10 The second opening shown has a different shape.

[0128] refer to Fig. 9 , in combination with the above example, the opening of the isolation layer 02 is located in the groove opening 201 of the groove 210, and the isolation structure 500 is located between the openings of the two isolation layers 02 that are adjacent to each other along the arrangement direction of the adjacent sub-pixels 100. For example, the number of the second openings 302 is the same as the number of the groove openings 201 of the groove 210. For example, the shape of the second openings 302 and the shape of the groove openings 201 are both rectangular. For example, a plurality of second openings 302 correspond one-to-one to a plurality of groove openings 201 of a plurality of grooves 210. For example, two adjacent sub-pixels 100 are grouped together, and in each group of sub-pixel groups, a second opening 302 formed by a pixel defining portion 310 is included between the two sub-pixels 100, and the second openings 302 in different sub-pixel groups may not be connected. Thus, the groove openings 201 may be arranged one-to-one with the second openings 302.

[0129] refer to Fig.10 In some examples, the number of second openings 302 is different from the number of groove openings 201 of the groove 210. For example, two adjacent sub-pixels 100 are grouped together, and in each sub-pixel group, the two sub-pixels 100 include a second opening 302 surrounded by the pixel defining portion 310, and the second openings 302 in different sub-pixel groups can be interconnected. Fig.10 As shown, the groove opening 201 is rectangular, and the second openings 302 in different sub-pixel groups are irregularly shaped because they can be interconnected. Therefore, the number of groove openings 201 can be different from the number of second openings 302 to facilitate extending the crosstalk path between adjacent sub-pixels 100.

[0130] refer to Fig.10 For example, in different sub-pixel groups, only the second openings 302 in some sub-pixel groups may be connected to each other. However, the present disclosure is not limited thereto, for example, the second openings in all sub-pixel groups may be connected to each other.

[0131] For example, Fig. 9 and Fig.10 The arrangement of sub-pixels is only schematically shown as a real sub-pixel (Real RGB) arrangement. However, the present disclosure is not limited thereto. Figures 2 to 4 , Figures 6 to 8 The cross-sectional view shown can also be matched with other sub-pixel arrangements to form a corresponding display substrate.

[0132] The embodiment of the present disclosure further provides a display device, comprising the above display substrate. Since the display device according to the embodiment of the present disclosure comprises the above display substrate, it also has corresponding beneficial technical effects, which will not be described in detail here.

[0133] For example, the display device may be a display device such as an organic light emitting diode display device, as well as any product or component with a display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, navigator, etc., which includes the display device, but the present embodiment is not limited thereto.

[0134] There are a few points to note:

[0135] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can refer to the general design.

[0136] (2) Unless there is a conflict, features in the same embodiment or in different embodiments of the present disclosure may be combined with each other.

[0137] The above description is merely an exemplary embodiment of the present disclosure and is not intended to limit the protection scope of the present disclosure. The protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: substrate substrate; A plurality of sub-pixels are located on the substrate, each of at least some of the sub-pixels comprises a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the substrate, the first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer comprises a plurality of film layers; An insulating layer, located between the first electrode and the base substrate; the insulating layer comprises a plurality of grooves, wherein at least part of the grooves are located between adjacent sub-pixels; a pixel defining pattern, located on a side of the first electrode away from the substrate, the pixel defining pattern comprising a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, one of the sub-pixels corresponds to at least one first opening, a light-emitting functional layer of the sub-pixel is at least partially located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode; Wherein, the display substrate further includes an isolation layer, which is located between the first electrode and the insulating layer; the isolation layer includes a flat portion, the flat portion overlaps with the first electrode in a direction perpendicular to the base substrate, and an edge of the flat portion is covered by the pixel defining portion; An isolation structure is disposed in at least part of the groove, and at least part of the isolation structure is exposed by the second opening; the isolation structure comprises a first isolation portion and a second isolation portion which are stacked, the first isolation portion is located between the second isolation portion and the substrate, at least part of the first isolation portion is located in the groove, an edge of the second isolation portion protrudes relative to an edge of the first isolation portion to form a protrusion, and the protrusion is configured to isolate at least one layer of the multi-layer film layer; The second isolation portion is a portion of the isolation layer exposed by the second opening.

2. The display substrate according to claim 1, wherein: The first isolation portion and the insulating layer are integrally formed.

3. The display substrate according to claim 1, wherein: In the arrangement direction of adjacent sub-pixels, there is a gap between the orthographic projection of the isolation structure on the base substrate and the orthographic projection of the pixel defining portion on the base substrate.

4. The display substrate according to claim 1, wherein: The protrusion is configured to block the second electrode.

5. The display substrate according to claim 1, wherein: In a direction perpendicular to the base substrate, a ratio of a distance between the flat portion and the base substrate to a distance between the second isolation portion and the base substrate is 0.9-1.

1.

6. The display substrate according to claim 1, wherein: The maximum depth of the groove is greater than the maximum dimension of the light-emitting functional layer in a direction perpendicular to the substrate; The maximum depth of the groove is 0.2 micrometers to 0.5 micrometers.

7. The display substrate according to claim 1, wherein: The orthographic projection of the first electrode on the base substrate is located within the orthographic projection of the flat portion on the base substrate; In any direction parallel to the base substrate, the size of the flat portion is not smaller than the size of the first electrode.

8. The display substrate according to claim 1, wherein: The pixel defining portion includes a portion located in the groove, and the portion is spaced apart from the first isolation portion.

9. The display substrate according to any one of claims 1 to 8, wherein: An isolation column is disposed in the second opening and is located at a side of the isolation structure away from the base substrate. The isolation column covers at least a portion of the second isolation portion except the protruding portion.

10. The display substrate according to claim 9, wherein: The pixel defining portion comprises a first side wall, wherein an angle between at least a portion of the first side wall and a contact surface between the pixel defining portion and the bottom wall of the groove is a first slope angle; an orthographic projection of the first side wall on the base substrate overlaps an orthographic projection of the bottom wall of the groove on the base substrate; The isolation column comprises a second side wall, and an angle between at least a portion of the second side wall and a contact surface between the isolation column and the second isolation portion is a second slope angle; The first slope angle is greater than the second slope angle, and both the first slope angle and the second slope angle are less than 90 degrees.

11. The display substrate according to claim 10, wherein: The pixel defining portion and the isolation column are configured to be formed by one patterning process.

12. The display substrate according to any one of claims 1 to 8, wherein: It also includes a touch structure located on a side of the pixel definition pattern away from the base substrate; The touch control structure includes a plurality of layers of touch control electrodes, and an orthographic projection of at least one layer of the plurality of layers of touch control electrodes on the base substrate overlaps with an orthographic projection of a portion of the isolation structure other than the protruding portion on the base substrate.

13. The display substrate according to claim 12, wherein: An isolation column is disposed in the second opening and is located on a side of the isolation structure away from the substrate, and the isolation column covers at least a portion of the second isolation portion except the protruding portion; An orthographic projection of at least one of the multi-layer touch electrodes on the base substrate overlaps with an orthographic projection of the isolation column on the base substrate.

14. The display substrate according to any one of claims 1 to 8, wherein: The isolation structure in at least one groove includes a plurality of sub-isolation structures, and the plurality of sub-isolation structures are arranged at intervals in an arrangement direction of adjacent sub-pixels.

15. The display substrate according to any one of claims 1 to 8, wherein: The number of the second openings is smaller than the number of groove openings of the groove.

16. The display substrate according to any one of claims 1 to 8, wherein: A distance between an orthographic projection of the second isolation portion on the base substrate and an orthographic projection of the pixel defining portion adjacent thereto on the base substrate in an arrangement direction of the adjacent sub-pixels is 1 micrometer to 3 micrometers.

17. The display substrate according to any one of claims 1 to 8, wherein: The dimension of the protrusion in the arrangement direction of adjacent sub-pixels is greater than the maximum thickness of the light emitting function layer.

18. The display substrate according to any one of claims 1 to 8, wherein: The size of the second isolation portion in the arrangement direction of adjacent sub-pixels is 5 micrometers to 7 micrometers.

19. A display device comprising the display substrate according to any one of claims 1 to 18.

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