A cleaning method and apparatus for improving the cleanliness of a solid surface

Abstract

The application discloses a cleaning method and device for improving the cleanliness of a solid surface. The cleaning method comprises: injecting a cleaning medium into a cleaning tank, the cleaning medium comprising micro-nano bubbles with a particle size ranging from 10 to 200 nanometers; applying a periodic pressure pulse to the cleaning medium in the cleaning tank, the frequency of the pressure pulse being 0.1-2.0 Hz to induce surface interface oscillation of the micro-nano bubbles; applying a radio frequency wave with a frequency ranging from 1 to 10 MHz to the cleaning tank to excite resonance of the micro-nano bubbles; and adjusting the circulation flow of the cleaning medium in the cleaning tank to clean the solid surface. The cleaning method for improving the cleanliness of a solid surface provided by the application fully utilizes the synergistic effect of pressure pulse, radio frequency resonance and micro-nano bubbles, and significantly improves the cleaning effect.

Description

Technical Field

[0001] This application relates to the field of cleaning technology, and in particular to a cleaning method and apparatus for improving the cleanliness of solid surfaces. Background Technology

[0002] In modern industry, solid surface cleaning technology plays a crucial role, especially in microelectronics, optics, medical devices, and other precision manufacturing fields. The removal of surface contaminants not only affects the appearance and function of products but also directly relates to their quality and performance. With the continuous development of manufacturing technology, the standards for surface cleanliness are becoming increasingly stringent, placing higher demands on cleaning technologies. Traditional surface cleaning methods, while meeting industrial needs to some extent, often struggle to cope with the growing demand for high-precision cleaning, particularly when dealing with tiny particles, complex contaminants, and delicate surfaces, where the effectiveness and efficiency of existing methods are significantly limited. With the continuous advancement of science and technology, especially the application of nanotechnology, micro / nano bubble technology, as a novel surface cleaning method, has gradually attracted widespread attention from academia and industry. This technology achieves surface cleaning by generating extremely small bubbles and utilizing their unique physical properties, showing great application potential.

[0003] Currently, common surface cleaning technologies include manual cleaning, chemical cleaning, mechanical friction cleaning, and ultrasonic cleaning. While manual cleaning is simple to operate, it is less effective at removing minute contaminants and can easily introduce secondary pollution during the cleaning process, failing to meet the requirements of modern precision manufacturing. Chemical cleaning primarily uses solvents or other chemical reagents to remove contaminants, suitable for removing grease, dust, and other pollutants. However, chemical cleaning methods often pose potential hazards to the environment and operator health, and in some cases, chemical reagents may damage the surface being cleaned. Mechanical friction cleaning relies on physical contact to remove contaminants, but this method is ineffective at removing tiny particles and may cause scratches or other damage to the surface. Ultrasonic cleaning uses bubbles generated by high-frequency sound waves to remove surface contaminants. This method performs excellently in removing tiny particles, especially suitable for cleaning micro or complex surfaces. However, ultrasonic cleaning still has some limitations, particularly in terms of the unevenness of bubble generation and distribution, and bubble stability, making it difficult to meet the demands for higher precision and efficiency.

[0004] With the development of micro- and nanobubble technology, it has gradually demonstrated its unique advantages in the cleaning field. Micro- and nanobubble are bubbles with diameters ranging from tens of nanometers to several micrometers, possessing extremely high surface activity and strong kinetic effects. Compared with traditional bubbles, micro- and nanobubble have a larger specific surface area, higher surface energy, and longer residence time, giving them unique advantages in cleaning and decontamination processes. Micro- and nanobubble can be uniformly distributed in liquids, generating strong physical effects that effectively remove deposits from solid surfaces, especially demonstrating excellent results in dealing with difficult-to-remove micro-contaminants. Furthermore, micro- and nanobubble also have strong penetrating power, capable of reaching into complex surface structures to remove hard-to-reach contaminants. Therefore, micro- and nanobubble technology shows broad application prospects in surface cleaning, wastewater treatment, and medical device cleaning. Despite the significant advantages of micro- and nanobubble technology, it still faces some technical challenges in practical applications. Currently, the generation and control methods of micro- and nanobubble still have certain limitations. Summary of the Invention

[0005] The main technical problem addressed by this application is to provide a cleaning method and equipment for improving the cleanliness of solid surfaces, thereby enhancing cleaning efficiency and effectiveness.

[0006] To solve the above-mentioned technical problems, one technical solution adopted in this application is: providing a cleaning method for improving the cleanliness of solid surfaces, the cleaning method comprising: injecting a cleaning medium into a cleaning tank, the cleaning medium comprising micro-nano bubbles with a particle size ranging from 10 to 200 nanometers; applying periodic pressure pulses to the cleaning medium in the cleaning tank, the pressure pulses having a frequency of 0.1-2.0 Hz to induce oscillation at the surface interface of the micro-nano bubbles; applying radio frequency waves with a frequency range of 1-10 MHz into the cleaning tank to excite resonance of the micro-nano bubbles; and adjusting the circulation of the cleaning medium in the cleaning tank to clean the solid surface.

[0007] In one embodiment, the method further includes adjusting the gas-liquid ratio in the cleaning tank to between 1:5 and 1:20.

[0008] In one embodiment, the method further includes controlling the shear stress of the fluid in the cleaning tank to be 0.1-10 Pa.

[0009] In one embodiment, the amplitude range of the periodic pressure pulse is 0.1-2 MPa.

[0010] In one embodiment, the method further includes: during the cleaning process, using multi-frequency resonance technology to dynamically adjust the frequency of radio frequency waves to adapt to changes in bubble size.

[0011] In one embodiment, the method further includes: during the cleaning process, introducing micro-nano bubbles formed by alternating different gases.

[0012] In one embodiment, the cleaning medium further includes a surface tension modifier, which is used to reduce the surface tension of the solution, and the concentration of the surface tension modifier is 0.0005-0.05 wt%; optionally, the surface tension modifier includes a surfactant.

[0013] In one embodiment, the gas includes one or more of oxygen, ozone, nitrogen, carbon dioxide, or an inert gas.

[0014] In one embodiment, after the cleaning process is completed, the micro-nano bubbles in the cleaning medium are recycled and reused using separation technology.

[0015] In one embodiment, the method is used to clean electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relic surfaces, precision mechanical parts, and medical device surfaces.

[0016] To solve the above-mentioned technical problems, one technical solution adopted in this application is: providing a cleaning device for improving the cleanliness of solid surfaces. This cleaning device includes a cleaning tank, a pressure pulse generator, a radio frequency excitation device, and a reflux device. The cleaning tank contains a cleaning medium and the device to be cleaned. The cleaning tank includes a medium inlet and a medium outlet. The medium inlet is used to receive the cleaning medium, which includes micro-nano bubbles with a particle size range of 10-200 nanometers. The pressure pulse generator is connected to the cleaning tank and is used to apply periodic pressure pulses to the cleaning medium within the cleaning tank. The frequency range of the pressure pulses is 0.1 to 2 Hz. The radio frequency excitation device is located outside the cleaning tank and is used to apply radio frequency waves with a frequency range of 1-10 MHz into the cleaning tank. The reflux device includes a reflux pipe connected to both the medium inlet and the medium outlet. The reflux device is used to regulate the circulation of the cleaning medium within the cleaning tank to clean the solid surface.

[0017] In one embodiment, the reflux device includes a dynamic fluid shearing device, which includes rotatable blades and a regulating valve for generating continuously adjustable shear stress and controlling the shear stress of the fluid in the cleaning tank to be 0.1-10 Pa.

[0018] In one embodiment, the cleaning equipment further includes a micro / nano bubble generator, which includes a gas mixing module for alternately introducing different gases to form a variety of micro / nano bubbles.

[0019] In one embodiment, the pressure pulse generator generates periodic pressure pulses with an amplitude range of 0.1-2 MPa via a hydraulic drive device.

[0020] In one embodiment, the radio frequency excitation device uses a multi-frequency resonance mode to dynamically adjust the frequency of the radio frequency wave to adapt to changes in the bubble size.

[0021] In one embodiment, the cleaning tank is made of high-strength titanium alloy or corrosion-resistant stainless steel.

[0022] In one embodiment, the cleaning equipment further includes a temperature control system, which includes a temperature sensor and a heating / cooling unit for controlling the temperature of the cleaning medium within the range of 0-100°C.

[0023] In one embodiment, the cleaning equipment further includes a control unit, which is electrically connected to a micro / nano bubble generator, a pressure pulse generator, a radio frequency excitation device, a reflux device, and a temperature control system. The control unit is used to monitor the micro / nano bubble size, pressure pulse parameters, radio frequency wave parameters, and temperature parameters, and automatically adjust the equipment operating parameters based on the monitoring data.

[0024] In one embodiment, the cleaning equipment further includes a centrifugal separation device for recycling and reusing micro-nano bubbles in the cleaning medium.

[0025] In one embodiment, the cleaning equipment is used to clean electronic components, optical lenses, silicon wafer surfaces, quartz surfaces, food surfaces, cultural relic surfaces, precision mechanical parts, and medical device surfaces.

[0026] The above description is only an overview of the technical solution of this application. In order to better understand the technical means of this application and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this application more obvious and understandable, the following are specific embodiments of this application. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a cross-sectional structural diagram of a cleaning device according to one or more embodiments of this application. Detailed Implementation

[0029] To make the objectives, technical solutions, and effects of this application clearer and more explicit, the embodiments of the technical solutions of this application will be described in detail below with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solutions of this application, and are therefore merely examples, and should not be used to limit the scope of protection of this application.

[0030] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application; the terms “comprising” and “having”, and any variations thereof, in the specification, claims, and foregoing description of the drawings are intended to cover non-exclusive inclusion.

[0031] In the description of the embodiments of this application, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary and secondary relationship of the indicated technical features. In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces), unless otherwise explicitly specified.

[0032] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0033] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0034] Quantities, ratios, and other numerical values ​​are presented in range format in this document. It should be understood that this range format is for convenience and brevity and should be interpreted flexibly to include not only numerical values ​​explicitly specified as range limits, but also all individual numerical values ​​or subranges covered within the range, as if each numerical value and subrange were explicitly specified.

[0035] Unless otherwise specified, all steps of this application may be performed sequentially, randomly, or in parallel, preferably sequentially. For example, the method includes steps (a) and (b), indicating that the method may include steps (a) and (b) performed sequentially, or steps (b) and (a) performed sequentially, or steps (a) and (b) may be performed simultaneously in parallel. For example, the method may also include step (c), indicating that step (c) may be added to the method in any order. For example, the method may include steps (a), (b), and (c), or steps (a), (c), and (b), or steps (c), (a), and (b), etc.

[0036] Existing methods for generating micro / nanobubbles typically rely on equipment such as high-pressure gas dissolution, bubble generators, and static mixers. However, these methods often struggle to ensure uniform bubble distribution in the liquid, and the size, concentration, and stability of the bubbles are difficult to control precisely. These factors limit the effectiveness of micro / nanobubble technology in cleaning processes, especially in applications requiring high precision cleaning and removal of complex contaminants. The stability and repeatability of cleaning results remain critical issues to be addressed. This makes it difficult to achieve the desired cleaning efficiency and precision. Therefore, optimizing bubble generation and movement to achieve efficient and precise surface cleaning is a key problem that current micro / nanobubble cleaning technology urgently needs to solve. Developing more efficient and precise micro / nanobubble generation and control technologies remains crucial for advancing this field.

[0037] This application overcomes various shortcomings of existing technologies by innovatively optimizing the generation, distribution, and movement of micro- and nano-bubbles, and combining precise control with pressure pulses and radio frequency resonance, thus providing a more efficient and precise solution in the field of surface cleaning. Through radio frequency resonance and pressure pulse control, this application achieves uniform bubble generation and precise control, and fully leverages the synergistic effect of pressure pulses, radio frequency resonance, and micro- and nano-bubbles to significantly improve cleaning performance. This technology not only solves the problems of bubble instability and uneven cleaning effects in existing technologies, but also ensures that the surface is not damaged during the cleaning process, meeting the stringent surface cleanliness requirements of modern high-end manufacturing industries.

[0038] In one embodiment, this application provides a cleaning method for improving the cleanliness of solid surfaces. The method includes injecting a cleaning medium into a cleaning tank, the cleaning medium comprising micro-nano bubbles with a particle size ranging from 10 to 200 nanometers; applying periodic pressure pulses to the cleaning medium in the cleaning tank, the pressure pulses having a frequency of 0.1-2.0 Hz to induce oscillations at the surface interface of the micro-nano bubbles; applying radio frequency waves with a frequency range of 1-10 MHz into the cleaning tank to excite resonance in the micro-nano bubbles; and adjusting the circulation of the cleaning medium within the cleaning tank to clean the solid surface.

[0039] The selection of cleaning liquid should be based on the material and characteristics of the contaminants on the solid surface to be cleaned, in order to ensure the cleaning effect and avoid damage to the substrate. That is, select a cleaning liquid that is suitable for the object to be cleaned and the type of contaminant, such as ultrapure water or environmentally friendly cleaning liquid, and add it to the cleaning tank.

[0040] The cleaning gas is mixed with the cleaning liquid in the form of micro-nano bubbles, or in other words, the cleaning gas exists in the cleaning medium in the form of micro-nano bubbles. The gas can be introduced into the cleaning liquid using a micro-nano bubble generator, employing forced mixing to ensure full contact with the cleaning liquid and generate micro-nano bubbles with a particle size range of 10 to 200 nanometers. The gas can be any one or more combinations of oxygen, ozone, nitrogen, carbon dioxide, or inert gases to enhance cleaning performance. The micro-nano bubble generator can generate the micro-nano bubbles using pressure dissolution, micropore aeration, membrane aeration, electrolysis, hydraulic cavitation, rotating flow, turbulent static mixing, ejector nozzle, or hammer mill rotation methods.

[0041] Furthermore, periodic pressure pulses are applied to the cleaning medium within the cleaning tank. The frequency of these pressure pulses is 0.1-2.0 Hz, for example, 0.1 Hz, 0.3 Hz, 0.5 Hz, 0.8 Hz, 1.0 Hz, 1.2 Hz, 1.5 Hz, 1.8 Hz, 2.0 Hz, etc. The pressure pulses induce interfacial oscillations at the surface of micro- and nano-bubbles, generating high-frequency vibrations and cavitation effects to achieve a cleaning effect. Simultaneously, the cleaning medium is circulated within the cleaning tank through water distribution pipes and a return system, forming a stable flow field that ensures sufficient contact between the cleaning medium and the solid surface, thereby improving cleaning efficiency.

[0042] Furthermore, radio frequency waves with a frequency range of 1-10 MHz are applied into the cleaning tank to excite the resonance of micro- and nano-bubbles. Radio frequency waves are essentially high-frequency alternating electromagnetic waves, electromagnetic frequencies that can radiate into space, and are generally generated by radio frequency excitation devices. The introduction of radio frequency waves further excites the resonance of micro- and nano-bubbles, thereby improving cleaning efficiency.

[0043] In one embodiment, periodic pressure pulses are generated by a hydraulic drive device, with an amplitude of 0.1 to 2 MPa, for example, 0.1 MPa, 0.3 MPa, 0.5 MPa, 0.8 MPa, 1.0 MPa, 1.2 MPa, 1.5 MPa, 1.8 MPa, 2.0 MPa, etc. This setting allows for the control of the bubble oscillation degree, thereby enhancing the cleaning effect.

[0044] In one embodiment, the gas-liquid ratio in the cleaning tank is adjusted to be between 1:5 and 1:20, for example, 1:5, 1:8, 1:10, 1:12, 1:15, 1:18, 1:20, etc. This setting optimizes the distribution and aggregation of bubbles, making the micro-nano bubbles in the cleaning medium more stable and more evenly distributed, thereby enhancing the cleaning effect.

[0045] In one embodiment, the shear stress of the fluid in the cleaning tank is controlled to be between 0.1 and 10 Pa, for example, 0.1 Pa, 0.5 Pa, 0.8 Pa, 1.0 Pa, 3.0 Pa, 5.0 Pa, 8.0 Pa, 10.0 Pa, etc. This setting improves the efficiency of removing particles adhering to solid surfaces and enhances the cleaning effect.

[0046] In one embodiment, during the cleaning process, the frequency of radio frequency waves is dynamically adjusted using multi-frequency resonance technology to adapt to changes in bubble size, thereby stimulating the resonance of micro- and nano-bubbles and enhancing the cleaning effect.

[0047] In one embodiment, micro-nano bubbles formed by alternating introduction of different gases are used during the cleaning process. Alternating introduction of different gases enhances the diversity of bubbles and the cleaning ability.

[0048] In one embodiment, the cleaning medium is circulated within the cleaning tank via a water distribution pipe and a return system to create a stable flow field. This flow field is formed by adjusting the flow velocity and flow rate, ensuring sufficient contact between the cleaning medium and the solid surface, thereby improving cleaning efficiency. The flow velocity of the cleaning medium is controlled between 0.01 and 2 m / s, for example, 0.01 m / s, 0.03 m / s, 0.05 m / s, 0.08 m / s, 0.10 m / s, 0.15 m / s, 0.20 m / s, 0.50 m / s, 0.80 m / s, 1.00 m / s, 1.20 m / s, 1.50 m / s, 1.80 m / s, 2.00 m / s, etc., to ensure uniform distribution of the cleaning medium and enhance the cleaning effect.

[0049] In one embodiment, the cleaning medium further includes a surface tension modifier, which is used to reduce the surface tension of the solution. The concentration of the surface tension modifier is from 0.0005 to 0.05 wt%, for example, it can be 0.0005 wt%, 0.0008 wt%, 0.0010 wt%, 0.0030 wt%, 0.0050 wt%, 0.0080 wt%, 0.010 wt%, 0.020 wt%, 0.030 wt%, 0.040 wt%, 0.050 wt%, etc.; optionally, the surface tension modifier includes a surfactant. The surface tension modifier can adjust the surface tension of the cleaning medium, prevent bubble aggregation, and improve the cleaning effect.

[0050] In one embodiment, the cleaning method further includes controlling the temperature within the cleaning tank within the range of 0 to 100°C. The temperature of the medium within the cleaning tank is controlled within this range using a temperature control system, for example, at 5°C, 10°C, 15°C, 25°C, 35°C, 50°C, 80°C, or 100°C. The temperature control system includes a temperature sensor and a heating / cooling unit, capable of monitoring and adjusting the temperature of the cleaning liquid in real time, enhancing cleaning efficiency and preventing excessive accumulation and collapse of air bubbles.

[0051] In one embodiment, the cleaning method further includes real-time monitoring of micro / nano bubble particle size, pressure pulse parameters, radio frequency wave parameters, and temperature parameters by a control unit, and automatic adjustment of operating parameters such as the frequency and amplitude of the pressure pulse and the frequency of the radio frequency wave based on the monitoring data to ensure the stability and efficiency of the cleaning process.

[0052] In one embodiment, the cleaning method further includes rinsing the cleaned solid surface a second time with deionized water after cleaning to remove residual impurities. The flow rate of the rinsing solution (deionized water) is controlled within the range of 0.5 to 2 m / s to ensure complete removal of residues. Subsequently, the cleaned solid material is dried in a drying device with a certain temperature and vacuum to obtain a clean product.

[0053] In one embodiment, the cleaning method further includes recycling and reusing the micro-nano bubbles in the cleaning medium through separation technology, and reusing the recycled effective components for the next round of cleaning process, so as to improve resource utilization and reduce operating costs.

[0054] Example 1: This invention provides a cleaning method for improving the cleanliness of solid surfaces, comprising the following steps: S1: Mix ultrapure water with sodium dodecyl sulfate, a surfactant, at a concentration of 0.005 wt%. Inject oxygen through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 50-150 nm. Adjust the gas-liquid ratio to 1:10.

[0055] S2: Apply periodic pressure pulses with a frequency of 1.0 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium to 2 Pa, and set the circulation velocity of the cleaning medium to 0.5 m / s to clean the solid surface. The cleaning temperature is controlled at 25℃ and the cleaning time is 20 minutes.

[0056] S3: Place the solids cleaned in S2 into ultrapure water at 25°C for rinsing for 10 minutes.

[0057] S4: The rinsed solids are dried in a vacuum drying oven at 70℃ and -0.09MPa.

[0058] Example 2: This embodiment uses different gases to prepare nanobubbles to improve the cleanliness of solid surfaces. Ozone is mainly used as the gas source.

[0059] S1: Mix ultrapure water with surfactant polyoxyethylene ether at a concentration of 0.01 wt%, inject ozone through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 60-200 nm, and adjust the gas-liquid ratio to 1:15.

[0060] S2: Apply periodic pressure pulses with a frequency of 0.5 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium to 5 Pa, and set the circulation velocity of the cleaning medium to 1.1 m / s to clean the solid surface. The cleaning temperature is controlled at 40℃ and the cleaning time is 15 minutes.

[0061] S3: Place the solids cleaned in S2 into ultrapure water at 45℃ for rinsing for 10 minutes.

[0062] S4: The rinsed solids are dried in a vacuum drying oven at 80℃ and -0.09MPa.

[0063] Example 3: In this embodiment, different gases are used to prepare nanobubbles, and nonionic surfactants are used to enhance the solid surfactant. The gas source used is carbon dioxide.

[0064] S1: Mix ultrapure water with a nonionic surfactant at a concentration of 0.0001 wt%, inject carbon dioxide through a micro-nano bubble generator to generate micro-nano bubbles with a particle size of 10-50 nm, and adjust the gas-liquid ratio to 1:7.

[0065] S2: Apply periodic pressure pulses with a frequency of 0.2 Hz to the cleaning medium in the cleaning tank, adjust the shear stress of the cleaning medium to 0.5 Pa, and set the circulation velocity of the cleaning medium to 0.1 m / s to clean the solid surface. The cleaning temperature is controlled at 50℃ and the cleaning time is 10 minutes.

[0066] S3: Place the solids cleaned in S2 into ultrapure water at 50°C for rinsing for 10 minutes.

[0067] S4: The rinsed solids are dried in a vacuum drying oven at 35°C.

[0068] Table 1: Cleaning effect of each embodiment The solid surface cleaning method combining micro / nano bubbles with pressure pulses and radio frequency technology provided in this application aims to significantly improve cleaning efficiency and effectiveness by optimizing bubble generation, distribution, and stability, and by precisely controlling the interaction between micro / nano bubbles and pressure pulses / radio frequency. This method is particularly suitable for the efficient and uniform cleaning of precision surfaces such as electronic components, optical lenses, silicon wafers, quartz surfaces, food surfaces, cultural relics surfaces, precision mechanical parts, and medical devices, overcoming problems such as uneven bubble generation, poor stability, and imprecise pressure pulse control in existing technologies.

[0069] Please see Figure 1 , Figure 1 This is a cross-sectional structural diagram of a cleaning device according to one or more embodiments of this application. This application provides a cleaning device for improving the cleanliness of solid surfaces. The cleaning device includes a cleaning tank 10, a pressure pulse generator 20, a radio frequency excitation device 30, and a reflux device 40, wherein: The cleaning tank 10 is used to contain the cleaning medium and the device to be cleaned. The cleaning tank 10 includes a medium inlet 101 and a medium outlet 102. The medium inlet 101 is used to connect the cleaning medium, which includes a mixture of cleaning liquid and gas. The cleaning gas exists in the cleaning medium in the form of micro-nano bubbles, and the particle size of the micro-nano bubbles ranges from 10 to 200 nanometers.

[0070] The pressure pulse generator 20 is connected to the cleaning tank 10 and is used to apply periodic pressure pulses to the cleaning medium in the cleaning tank 10. The frequency range of the pressure pulses is 0.1 to 2 Hz.

[0071] The radio frequency excitation device 30 is disposed outside the cleaning tank 10 and is used to apply radio frequency waves with a frequency range of 1-10MHz into the cleaning tank 10.

[0072] The reflux device 40 includes a reflux pipe 401, which is connected to the medium inlet 101 and the medium outlet 102 respectively. The reflux device 40 is used to regulate the circulation of the cleaning medium in the cleaning tank 10 to clean the solid surface.

[0073] In one embodiment, the inner surface of the cleaning tank 10 is covered with an anti-corrosion coating to extend the service life of the cleaning tank 10 and maintain the stability of the cleaning process. The cleaning tank 10 can be made of high-strength titanium alloy or corrosion-resistant stainless steel to adapt to different cleaning environments and media.

[0074] In one embodiment, the pressure pulse generator 20 generates periodic pressure pulses with an amplitude range of 0.1-2 MPa via a hydraulic drive device. Specifically, the pressure pulse generator 20 generates pulses with a pressure amplitude of 0.1 to 2 MPa via a high-precision hydraulic control system.

[0075] In one embodiment, the radio frequency excitation device 30 dynamically adjusts the frequency of the radio frequency wave using a multi-frequency resonance mode to adapt to changes in the bubble size. Specifically, the radio frequency excitation device 30 further excites the resonance of micro- and nano-bubbles. As the size of the micro- and nano-bubbles changes, the resonance frequency also changes. The radio frequency excitation device 30 employs multi-frequency resonance technology to dynamically adjust the frequency during the cleaning process to adapt to changes in bubble size, thereby achieving continuous resonance and enhancing the cleaning effect.

[0076] In one embodiment, the reflux device 40 includes a dynamic fluid shearing device, comprising rotatable blades and a regulating valve, for generating continuously adjustable shear stress to control the shear stress of the fluid in the cleaning tank to be between 0.1 and 10 Pa. Controlling the shear stress of the fluid in the cleaning tank through the dynamic fluid shearing device helps to peel off particles adhering to the solid surface, enhancing the cleaning effect.

[0077] In one embodiment, the reflux device 40 includes a reflux pipe 401 and a fluid pump (not shown). The reflux pipe 401 is connected to the cleaning tank 10. The reflux device 40 is used to circulate the cleaning medium within the cleaning tank 10, forming a stable flow field. The fluid pump can be an adjustable flow rate pump used to control the fluid flow field within the cleaning tank. Specifically, the flow velocity of the cleaning medium can be controlled within the range of 0.01 to 2 m / s. The formation of the flow field, by adjusting the flow velocity and flow rate, ensures uniform distribution of the liquid medium, allowing the liquid medium to fully contact the solid surface, enhancing the cleaning effect, and improving cleaning efficiency.

[0078] The reflux system uses a Grundfos UP15-42F pump with variable frequency control to ensure the stability of the flow field and the uniform distribution of the liquid medium.

[0079] In one embodiment, the cleaning equipment further includes an input device, which includes a micro-nano bubble generator. The input device introduces gas into the cleaning liquid through the micro-nano bubble generator, and uses a forced mixing method to fully contact the gas with the cleaning liquid to generate micro-nano bubbles with a particle size range of 10 to 200 nanometers. The mixed cleaning medium is then input into the cleaning tank.

[0080] Micro- and nano-bubbles are generated by a multiphase flow jet module of a bubble excitation device, which further includes a gas mixing module for alternately introducing oxygen, nitrogen, and inert gases to enhance cleaning performance.

[0081] In one embodiment, the cleaning equipment further includes a temperature control system comprising a temperature sensor and a heating / cooling unit, used to control the temperature of the cleaning liquid within the range of 0 to 100°C. The system can precisely regulate the temperature to prevent excessive accumulation and collapse of bubbles, thereby improving cleaning efficiency. The temperature control module's accuracy is controlled within ±0.5°C, ensuring temperature stability and controllability.

[0082] In one embodiment, the cleaning equipment further includes a control unit electrically connected to a micro / nano bubble generator, a pressure pulse generator, a radio frequency excitation device, a reflux device, and a temperature control system. The control unit monitors bubble size, pressure pulse parameters, radio frequency parameters, and temperature parameters, and automatically adjusts the equipment's operating parameters based on the monitoring data. The control unit employs an artificial intelligence-based adjustment algorithm, capable of optimizing the pressure pulse frequency, amplitude, and radio frequency resonant frequency in real time according to the object being cleaned, ensuring the high efficiency and stability of the cleaning process.

[0083] In one embodiment, the cleaning equipment further includes a deionized water system for secondary rinsing after cleaning, ensuring the final cleanliness of the solid material surface. The deionized water system uses the Sartorius Arium® series ultrapure water system from Germany, ensuring the provision of high-quality ultrapure water that meets stringent water quality requirements.

[0084] In one embodiment, the cleaning equipment further includes a centrifugal separation device for recovering micro-nano bubbles from the cleaning liquid after the cleaning process. This device can separate bubbles with a diameter of less than 200 nanometers and return them to the micro-nano bubble generator to achieve bubble reuse, improve resource utilization, and reduce operating costs.

[0085] In one embodiment, the cleaning equipment further includes a drying device for drying the cleaned solid material at a temperature controlled between 60 and 80°C, a vacuum level controlled between -0.08 and -0.1 MPa, and a drying time of 6 to 12 hours. The drying device is lined with stainless steel and DuPont PTFE to ensure durability and corrosion resistance.

[0086] This application provides a solid surface cleaning method and corresponding cleaning equipment that combines micro / nano bubbles with pressure pulses and radio frequency resonance technology. The aim is to significantly improve cleaning efficiency and effectiveness by optimizing bubble generation, distribution, and stability, and by precisely controlling the interaction between pressure pulses, radio frequency technology, and bubbles. This invention is particularly suitable for the efficient and uniform cleaning of precision surfaces such as electronic components, optical lenses, silicon wafers, quartz surfaces, food surfaces, artifact surfaces, precision mechanical parts, and medical device surfaces, overcoming problems such as uneven bubble generation, poor stability, and imprecise ultrasonic control in existing technologies. The above descriptions are merely embodiments of this application and do not limit the patent scope of this application. Any equivalent structural or procedural transformations made based on the description and drawings of this application, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A cleaning method for improving the cleanliness of solid surfaces, characterized in that, The cleaning method includes: A cleaning medium is injected into a cleaning tank, the cleaning medium comprising micro-nano bubbles, the micro-nano bubbles having a particle size range of 10 to 200 nanometers; Periodic pressure pulses are applied to the cleaning medium in the cleaning tank, with a frequency of 0.1-2.0 Hz, to induce oscillations at the surface interface of the micro / nano bubbles; the shear stress of the fluid in the cleaning tank is controlled to be 0.1-10 Pa; and the amplitude range of the pressure pulses is 0.1-2 MPa. Radio frequency waves with a frequency range of 1-10 MHz are applied into the cleaning tank to excite the resonance of the micro-nano bubbles; The cleaning medium is circulated within the cleaning tank to clean the solid surface.

2. The cleaning method for improving the cleanliness of solid surfaces according to claim 1, characterized in that, The method further includes: Adjust the gas-liquid ratio in the cleaning tank to between 1:5 and 1:

20.

3. The cleaning method for improving the cleanliness of solid surfaces according to claim 1, characterized in that, The method further includes: During the cleaning process, the frequency of the radio frequency wave is dynamically adjusted using multi-frequency resonance technology to adapt to changes in the bubble size.

4. The cleaning method for improving the cleanliness of solid surfaces according to claim 1, characterized in that, The method further includes: During the cleaning process, micro-nano bubbles formed by alternating introduction of different gases; and / or The gas includes one or more of oxygen, ozone, nitrogen, carbon dioxide, or inert gases.

5. The cleaning method for improving the cleanliness of solid surfaces according to claim 1, characterized in that, The cleaning medium also includes a surface tension modifier, which is used to reduce the surface tension of the solution. The concentration of the surface tension modifier is 0.0005-0.05 wt%. The surface tension modifier includes a surfactant.

6. The cleaning method for improving the cleanliness of solid surfaces according to claim 1, characterized in that, The method is used to clean the surfaces of electronic components, optical lenses, silicon wafers, quartz surfaces, food surfaces, cultural relics, precision mechanical parts, and medical devices.

7. A cleaning device for improving the cleanliness of solid surfaces, characterized in that, The cleaning equipment includes: A cleaning tank is used to contain cleaning media and devices to be cleaned. The cleaning tank includes a media inlet and a media outlet. The media inlet is used to receive the cleaning media. The cleaning media includes micro-nano bubbles with a particle size range of 10-200 nanometers. A pressure pulse generator, connected to the cleaning tank, is used to apply periodic pressure pulses to the cleaning medium in the cleaning tank, wherein the frequency range of the pressure pulses is 0.1-2 Hz. A radio frequency excitation device is disposed outside the cleaning tank and is used to apply radio frequency waves with a frequency range of 1-10MHz into the cleaning tank; A reflux device includes a reflux pipe connected to both the medium inlet and the medium outlet. The reflux device is used to regulate the circulation of the cleaning medium within the cleaning tank to clean solid surfaces. The reflux device also includes: A dynamic fluid shearing device, including rotatable blades and regulating valves, is used to generate continuously adjustable shear stress and control the shear stress of the fluid in the cleaning tank to be 0.1-10 Pa.

8. The cleaning equipment for improving the cleanliness of solid surfaces according to claim 7, characterized in that, The cleaning equipment also includes: A micro / nano bubble generator includes a gas mixing module for alternately introducing different gases to form a variety of micro / nano bubbles.

9. The cleaning equipment for improving the cleanliness of solid surfaces according to claim 7, characterized in that, The pressure pulse generator generates periodic pressure pulses with an amplitude range of 0.1-2 MPa via a hydraulic drive device. and / or The radio frequency excitation device uses a multi-frequency resonance mode to dynamically adjust the frequency of the radio frequency wave to adapt to changes in the bubble size.

10. The cleaning equipment for improving the cleanliness of solid surfaces according to claim 7, characterized in that, The cleaning equipment also includes: A temperature control system, comprising a temperature sensor and a heating / cooling unit, is used to control the temperature of the cleaning medium within the range of 0 to 100°C; and / or The control unit is electrically connected to the micro / nano bubble generator, pressure pulse generator, radio frequency excitation device, reflux device and temperature control system. It is used to monitor the micro / nano bubble particle size, pressure pulse parameters, radio frequency wave parameters and temperature parameters, and automatically adjust the equipment operating parameters based on the monitoring data.

11. The cleaning equipment for improving the cleanliness of solid surfaces according to claim 7, characterized in that, The cleaning equipment also includes: A centrifugal separation device, wherein the centrifugal separation device is used to recover and reuse micro-nano bubbles in the cleaning medium; and / or The cleaning tank is made of high-strength titanium alloy or corrosion-resistant stainless steel.

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