A plasma optical emission spectrometry device and method

Abstract

The application provides a kind of plasma optical emission spectrometry detection device and method, it is related to plasma technology, sensor technology and detection technical field, the device includes optical acquisition module, spectral analysis and data processing module, control module, plasma generation module and shell and protection system, wherein, optical acquisition module realizes the accurate positioning and stable acquisition of lens by the mirror table of liftable and movable, spectral analysis and data processing module designs specific analysis and detection module to signal decomposition, and by self-defined plasma component decomposition decoupling optimization method, spectral characteristics are extracted and the concentration of ions, gas, electron and active group in plasma is calculated, control module carries out dynamic feedback regulation to plasma parameter to optimize signal acquisition quality.The application has high detection precision, strong adaptability, modular design and dynamic optimization capability, and is widely used in plasma characteristic analysis, industrial process control and environmental monitoring and other fields.

Description

Technical Field

[0001] This invention relates to the fields of plasma technology, sensor technology, and detection technology, and in particular to a plasma optical emission spectroscopy detection device and method. Background Technology

[0002] Low-temperature plasma has wide applications in sterilization and decomposition of organic pollutants due to its ability to generate reactive substances. However, existing plasma component detection methods typically rely on large spectrometers or mass spectrometers, which are costly, impractical, and unable to meet the demands of real-time online detection. Furthermore, the application of flexible plasma devices in complex environments places higher demands on the miniaturization and intelligence of detection equipment. Therefore, there is an urgent need for a miniaturized, real-time, and highly adaptable plasma component detection device and method. Summary of the Invention

[0003] In order to overcome the shortcomings of the prior art, the purpose of this invention is to provide a plasma optical emission spectroscopy detection device and method.

[0004] To achieve the above objectives, the present invention provides the following solution:

[0005] This invention provides a plasma optical emission spectrum detection device, comprising: a base, an optical acquisition module, a spectral analysis and data processing module, a control module, a plasma generation module, and a housing and protective system. The optical acquisition module, the control module, and the plasma generation module are disposed on the base. The spectral analysis and data processing module is disposed on the back of the optical acquisition module. The housing and protective system are disposed on the base. The optical acquisition module, the spectral analysis and data processing module, and the plasma generation module are all connected to the control module.

[0006] The optical acquisition module is used to acquire spectral signals;

[0007] The spectral analysis and data processing module is used to decompose and detect the acquired spectral signals, analyze the spectral data, extract spectral feature information, and determine the ions, gases, electrons, and active group components in the plasma.

[0008] The control module is used to regulate the parameters of the plasma generation module and the working state of the optical acquisition module in order to optimize the acquisition effect of the spectral signal.

[0009] The plasma generating module is used to generate the plasma to be tested;

[0010] The outer casing and protective system are used to protect the internal structure of the device.

[0011] Preferably, the optical acquisition module includes a vertical lifting mechanism, a lens stage, a linear guide rail mechanism, a locking device, a shockproof system, and a scale and position indication system. The vertical lifting mechanism is mounted on the base, and the lens stage is mounted on the front of the vertical lifting mechanism. The vertical lifting mechanism is used to drive the lens stage to move vertically via a precision screw to adapt to plasma emission sources of different heights. The linear guide rail mechanism is mounted on the top of the lens stage. The linear guide rail mechanism consists of two mutually perpendicular slide rails, on which a lens is mounted. The lens is connected to the spectral analysis and data processing module via an optical fiber. The linear guide rail mechanism is used to move the lens along the X and Y axes. The locking device is mounted on the linear guide rail mechanism to fix the lens. The shockproof system is mounted at the lower part of the vertical lifting mechanism to reduce the impact of external vibrations on the spectral acquisition process. The scale and position indication system is mounted on the vertical lifting mechanism for users to quickly locate and adjust the lens position. The vertical lifting mechanism, the linear guide rail mechanism, and the locking device are all connected to the control module.

[0012] Preferably, the spectral analysis and data processing module includes a mounting frame, a spectral decomposition unit, an optical path switching device, a detection array, a spectral calibration system, and a temperature control and protection module. The mounting frame has an optical fiber inlet for the entry of an optical fiber connecting to a lens. The spectral decomposition unit is located inside the mounting frame corresponding to the optical fiber inlet. The spectral decomposition unit includes a high-precision optical deconstruction device and a servo motor. The high-precision optical deconstruction device is located inside the mounting frame via the servo motor. The surface of the high-precision optical deconstruction device has finely grooved surfaces. The center of the mounting frame opposite the optical fiber inlet... The optical path switching device is positioned and includes a linear moving guide rail moving structure, an electrically controllable reflector, and a beam splitter for optical path switching. The detection array is mounted on the mounting frame opposite the spectral decomposition unit via an elastic mounting bracket. The spectral calibration system is mounted on the same side as the optical fiber inlet. The spectral calibration system has a built-in spectral calibration light source. The temperature control and protection module is installed inside the mounting frame for temperature control. The spectral decomposition unit, optical path switching device, detection array, spectral calibration system, and temperature control and protection module are all connected to the control module.

[0013] Preferably, the control module includes a real-time monitoring unit and a feedback control unit. The real-time monitoring unit is used to collect the spectral characteristic signals and emission uniformity parameters of the plasma, and detects the discharge voltage, discharge current, gas flow rate, gas pressure and operating frequency through built-in sensors. The feedback control unit is used to dynamically adjust the discharge parameters to meet the optimization target based on the monitoring data, combined with the target spectral signal and uniformity standard.

[0014] Preferably, the plasma generating module includes an anode, a cathode, a cooling backplate, and a micro pusher. The cooling backplate is disposed on the base, and the cathode and anode are respectively disposed on both sides of the middle position of the cooling backplate. The micro pusher is disposed between the back of the cathode and anode and the side of the cooling backplate. The micro pusher is used to push the cathode and anode, thereby adjusting the electrode discharge cooperation space. The surfaces of the cathode and anode are both processed using microstructure technology, and their shapes include serrated, needle-like, or conical.

[0015] The present invention also provides a method for plasma optical emission spectroscopy detection, comprising:

[0016] The device performs automated self-tests, automatically detecting the working status of the optical acquisition module, spectral analysis, and data processing module. If an abnormality is detected, the device immediately alarms and suspends operation; if no abnormality is detected, it continues.

[0017] To generate plasma, the plasma generation module is activated. The operating parameters of the plasma generation module, including input voltage, frequency, and gas flow rate, are set and adjusted to form a stable plasma. Based on the characteristics of the sample to be tested, a working gas or mixed gas is selected as the plasma medium to optimize the plasma generation conditions. The discharge parameters are then controlled in real time through the control module.

[0018] The system collects spectral signals, adjusts the optical acquisition module, and modulates the height and lateral position of the lens to ensure that the optical acquisition path is accurately aligned with the plasma emission source, ensuring that the acquisition area covers the optimal spectral region of plasma emission. The acquired spectral signals are then transmitted to the spectral analysis and data processing module using optical fiber.

[0019] The spectral signal is decomposed and detected. In the spectral analysis and data processing module, a high-resolution optical deconstruction device is used to decompose the spectral signal into spectral lines of different bands to distinguish the characteristic emission of each component in the plasma. The intensity distribution and peak position of each spectral line are recorded by a detection array.

[0020] Data analysis and component extraction are performed. The spectral analysis and data processing modules perform noise filtering, background subtraction and signal normalization on the collected data. After processing, the spectral feature matching method is used to identify and match the spectral feature lines of each band. The overlapping spectral lines are separated by the spectral deconvolution method, and the emission intensity corresponding to each component is calculated. A dynamic spectral feature inversion method is used to calculate the concentration of each component in the plasma.

[0021] The analysis results of the concentration and spectral characteristics of each component are compiled into a detection report and output in real time via a display screen or external interface. Based on the detection results, the plasma generation parameters are adjusted using the control module to optimize the plasma generation conditions. The control process adopts a feedback mechanism to ensure that the spectral signal intensity and component resolution are always at their best.

[0022] Preferably, the spectral analysis and data processing module employs a spectral feature matching method to identify and match spectral feature lines in each band, separates overlapping spectral lines using a spectral deconvolution method, and calculates the emission intensity corresponding to each component. This is specifically achieved through the following mathematical model:

[0023] Spectral decomposition is performed using a multidimensional eigenvalue decomposition model. The spectral signal is represented by the superposition of multiple characteristic basis functions, as shown in the following expression:

[0024]

[0025] In the formula, I(λ) represents the spectral signal at wavelength λ, and Ψ k (λ,θ k ) is the k-th characteristic basis function, based on the parameter θ k Generate, ω k ξ represents the intensity weight of the k-th basis function, reflecting the relative contribution of this component; ξ is the random noise interference term; and N is the total number of spectral characteristic basis functions.

[0026] The feature function generation mechanism is as follows: feature basis function Ψ k (λ,θ k It is generated from the normalized information of spectral data under specific physical conditions, and its functional form is:

[0027]

[0028] In the formula, A k B k μ is the magnitude parameter of the basis functions. k and σ k f represents the center wavelength and bandwidth of the k-th feature, respectively. k The selected modulation frequency reflects higher-order spectral characteristics;

[0029] The total emission intensity of each spectral component is calculated as follows:

[0030]

[0031] In the formula, λ1 and λ2 represent the spectral wavelength range of a specific component. The component type is obtained by comparing it with a known spectral feature database, and finally a spectral component report is generated.

[0032] Preferably, a dynamic spectral feature inversion method is used to calculate the concentration of each component in the plasma, specifically as follows:

[0033] The spectral emission intensity is normalized. The acquired spectral data I(λ) is normalized to remove instrument background interference and noise, resulting in the net emission spectrum I. norm (λ) is:

[0034]

[0035] In the formula, I bg For the instrument background signal, max[I(λ)-I bg [] represents the maximum value of the spectral signal, used for normalization;

[0036] Characteristic spectral intensity separation is performed, and the characteristic emission intensity I of specific components is extracted using a piecewise integration method. k for:

[0037]

[0038] In the formula, λ k1 and λ k2 The emission band range for k components;

[0039] The concentration C of each component was calculated based on the concentration inversion formula. k for:

[0040]

[0041] In the formula, C k Let η be the concentration of the k-th component. k Let σ be the emission cross section of this component. k T represents the particle collision cross section of the plasma. k This represents the local temperature of this component in the plasma;

[0042] Based on the dynamic spectral feature inversion algorithm, the concentration weighting factor β of each component is dynamically adjusted. k for:

[0043]

[0044] In the formula, β k Let N be the concentration percentage of the k-th component, and N be the total number of components in the plasma.

[0045] The inversion results are calibrated based on a linear correction model to reduce the impact of instrument errors on concentration calculations.

[0046]

[0047] In the formula, The calibrated concentration value, γ k and δ k The correction factor is determined by the calibration experiment.

[0048] Preferably, the plasma generation parameters are adjusted using a control module to optimize the plasma generation conditions. The control process employs a feedback mechanism to ensure that the spectral signal intensity and component resolution are always at their optimal levels. Specifically:

[0049] The control module employs an adaptive plasma parameter control method, achieving dynamic optimization of plasma generation parameters through real-time monitoring and feedback adjustment. The control module includes a real-time monitoring unit and a feedback control unit. The real-time monitoring unit acquires the plasma's spectral characteristic signal I(λ) and emission uniformity parameter U, and detects discharge voltage V, discharge current I, gas flow rate F, gas pressure P, and operating frequency f using built-in sensors. The feedback control unit, based on the monitoring data and combined with the target spectral signal I... target (λ) and uniformity standard U target Dynamically adjust discharge parameters to meet optimization objectives;

[0050] The real-time monitoring unit monitors the intensity distribution I(λ) and emission uniformity U of the plasma spectrum emission in real time. It detects the discharge voltage V, discharge current I, gas flow rate F, gas pressure P, and operating frequency f using built-in sensors to determine if there are deviations from the target values. It then calculates the error between the current parameters and the target values, which is:

[0051] E I =|I(λ)-I target (λ)|,E U =|UU target |

[0052] If the error E I or E U If the preset threshold is exceeded, a feedback control mechanism is triggered. Based on the feedback control unit, an adaptive plasma parameter control method is adopted, and the parameters are updated using the following iterative formula:

[0053]

[0054] In the formula, t is the current iteration number, and α is the step size factor. To optimize the gradient of the objective function with respect to each parameter;

[0055] When the objective function J converges to the preset threshold, the adjustment is stopped, and the final optimization parameter V is output. opt ,f opt ,F op t,P opt ;

[0056] The parameter optimization model J is:

[0057] min {V,f,F,P} J=ω1·|I(λ)-I target (λ)| 2 +ω2·|UU target | 2

[0058] In the formula, J is the objective function, ω1 and ω2 are weighting coefficients used to balance the optimization requirements of spectral signal and uniformity, and I(λ) is the real-time acquired spectral signal. target (λ) represents the target spectral signal, and U represents the current plasma emission uniformity parameter. target The target uniformity parameter.

[0059] According to specific embodiments provided by the present invention, the present invention discloses the following technical effects:

[0060] This invention provides a plasma optical emission spectroscopy detection device and method. The device includes an optical acquisition module, a spectral analysis and data processing module, a control module, a plasma generation module, and a housing and protective system. The optical acquisition module achieves precise lens positioning and stable acquisition through a liftable and movable stage. The spectral analysis and data processing module incorporates specific analysis and detection modules to decompose the signal and extracts spectral features using a custom plasma decoupling optimization method to calculate the concentrations of ions, gases, electrons, and active groups in the plasma. The control module dynamically adjusts plasma parameters to optimize signal acquisition quality. This invention features high detection accuracy, strong adaptability, modular design, and dynamic optimization capabilities, making it widely applicable in fields such as plasma characteristic analysis, industrial process control, and environmental monitoring. Attached Figure Description

[0061] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0062] Figure 1 This is a schematic diagram of the structure of the plasma optical emission spectroscopy detection device provided in an embodiment of the present invention;

[0063] Figure 2 This is a structural diagram of the optical acquisition module of the plasma optical emission spectroscopy detection device provided in an embodiment of the present invention;

[0064] Figure 3This is a schematic diagram of the spectral analysis module structure of the plasma optical emission spectroscopy detection device provided in an embodiment of the present invention;

[0065] Figure 4 A structural diagram of the high-precision optical deconstruction device in the spectral analysis module of the plasma optical emission spectroscopy detection device is provided for embodiments of the present invention.

[0066] Figure 5 The side and top views of the detector array in the analysis module provided in this embodiment of the invention;

[0067] Figure 6 This is a schematic diagram of the electrothermal cooler structure in the spectral analysis module provided in an embodiment of the present invention;

[0068] Figure 7 This is a schematic diagram of the adjustable plasma generation module provided in an embodiment of the present invention;

[0069] Figure 8 A schematic diagram of the anode structure of the adjustable plasma generation module provided in an embodiment of the present invention;

[0070] Figure 9 This is a schematic diagram of the cathode structure of the adjustable plasma generation module provided in an embodiment of the present invention;

[0071] Figure 10 A schematic diagram of the cooling backplate of the adjustable plasma generation module provided in an embodiment of the present invention;

[0072] Figure 11 This is a schematic diagram of the outer casing of the plasma component detection device provided in an embodiment of the present invention;

[0073] Figure 12 This is a schematic diagram of the plasma optical emission spectroscopy detection method provided in an embodiment of the present invention.

[0074] Reference numerals: 1. Plasma optical emission spectroscopy detection device; 11. Optical acquisition module; 111. Mirror stage; 112. Vertical lifting mechanism; 113. One-line guide rail mechanism; 114. Locking device; 115. Anti-vibration system; 12. Spectral analysis and data processing module; 121. High-precision optical deconstruction device; 122. Servo motor; 123. Reflector; 124. Beam splitter; 125. Detector array; 126. Flexible mounting bracket; 127. Light source A; 128. Light source B; 129. Electric cooler; 13. Control module; 14. Plasma generation module; 141. Electrode anode; 142. Electrode cathode; 143. Miniature push rod; 144. Cooling back plate; 15. Outer shell and protection system; 16. Base. Detailed Implementation

[0075] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0076] The purpose of this invention is to provide a plasma optical emission spectroscopy detection device and method, which has significant advantages such as high detection accuracy, strong adaptability, modular design and dynamic optimization capability. It is applicable to multiple fields such as plasma component detection, industrial process monitoring and quality control, and has broad application prospects.

[0077] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0078] Figure 1 The device structure diagram provided in the embodiments of the present invention is as follows: Figure 1 As shown, the present invention provides a plasma optical emission spectrum detection device, including: a base 16, an optical acquisition module 11, a spectral analysis and data processing module 12, a control module 13, a plasma generation module 14, and a housing and protective system 15. The optical acquisition module 11, the control module 13, and the plasma generation module 14 are disposed on the base 16. The spectral analysis and data processing module 12 is disposed on the back of the optical acquisition module 11. The housing and protective system 15 are disposed on the base 16. The optical acquisition module 11, the spectral analysis and data processing module 12, and the plasma generation module 14 are all connected to the control module 13.

[0079] The optical acquisition module is used to acquire spectral signals;

[0080] The spectral analysis and data processing module is used to decompose and detect the acquired spectral signals, analyze the spectral data, extract spectral feature information, and determine the ions, gases, electrons, and active group components in the plasma.

[0081] The control module is used to regulate the parameters of the plasma generation module and the working state of the optical acquisition module in order to optimize the acquisition effect of the spectral signal.

[0082] The plasma generating module is used to generate the plasma to be tested;

[0083] like Figure 11 As shown, the housing and protective system are used to protect the internal structure of the device and ensure detection stability and safety.

[0084] like Figure 2As shown, the optical acquisition module 11 includes a vertical lifting mechanism 112, a lens stage 111, a linear guide rail mechanism 113, a locking device 114, a shockproof system 115, and a scale and position indication system. The vertical lifting mechanism 112 is mounted on the base 16, and the lens stage 111 is mounted on the front of the vertical lifting mechanism 112. The vertical lifting mechanism 112 is used to drive the lens stage 111 to move vertically via a precision screw to adapt to plasma emission sources of different heights. The linear guide rail mechanism 113 is mounted on the top of the lens stage 111. The linear guide rail mechanism 113 consists of two mutually perpendicular slide rails, on which a lens is mounted. The spectral analysis and data processing module is connected via optical fiber. The linear guide rail mechanism 113 is used to move the lens along the X and Y axes. The locking device 114 is provided on the linear guide rail mechanism 113 to fix the lens. The locking device 114 can be a manual or electric locking mechanism. The anti-vibration system 115 is provided at the lower part of the vertical lifting mechanism 112. It can be a damping shock absorber to reduce the impact of external vibration on the spectral acquisition process. The vertical lifting mechanism 112 is provided with a precision scale and position indication system for users to quickly locate and adjust the lens position. The vertical lifting mechanism, the linear guide rail mechanism and the locking device are all connected to the control module.

[0085] like Figure 3 As shown, the spectral analysis and data processing module 12 includes a mounting frame, a spectral decomposition unit, an optical path switching device, a detector array 125, a spectral calibration system, and a temperature control and protection module. The mounting frame has an optical fiber inlet for the optical fiber connecting the lens to enter. The spectral decomposition unit is located inside the mounting frame corresponding to the optical fiber inlet. Figure 4 As shown, the spectral decomposition unit includes a high-precision optical decomposition device 121 and a servo motor 122. The high-precision optical decomposition device 121 is disposed inside the mounting frame via the servo motor 122. The surface of the high-precision optical decomposition device 121 has fine grooves and integrates an adjustable fine-tuning mechanism to achieve high-resolution separation of optical signals. The resolution can reach Δλ. It is controlled by the servo motor 122, which controls the rotation angle of the grating, and supports precise angle adjustment to optimize the spectral resolution effect. It is suitable for the spectrum in the wavelength range λ1 to λ2.

[0086] The optical path switching device is located at the center of the mounting frame opposite the optical fiber inlet. The optical path switching device includes a linear moving guide rail moving structure, an electrically controllable reflector 123 and a beam splitter 124. The optical path switching device is equipped with a dual optical path switching component to realize rapid switching between optical path A and optical path B. The switching time of the linear moving guide rail moving structure is controlled within t seconds.

[0087] like Figure 5 As shown, the detector array 125 is mounted on the mounting frame on the opposite side of the spectral decomposition unit via an elastic mounting bracket 126. The detector array 125 is equipped with a high-sensitivity charge-coupled module and a photodiode module. The photoelectric conversion efficiency is designed to be η, and it has high quantum efficiency to improve signal response capability. The elastic mounting bracket 126 has an embedded vibration isolation layer to reduce external vibration interference.

[0088] The spectral calibration system is installed on the same side as the optical fiber inlet. The spectral calibration system has a built-in spectral calibration light source, including light source A 127 and light source B 128, which are used for spectral calibration in wavelength ranges λ3 to λ4 and λ5 to λ6, respectively. The calibration function is periodically triggered by programmable control to ensure that the wavelength accuracy and signal sensitivity of the system are always in the best state.

[0089] like Figure 6 As shown, the temperature control and protection module is installed inside the mounting frame for temperature control. The thermoelectric cooler 129 is used to control the temperature of the detector, with a temperature control accuracy of ΔT. It is also equipped with a sealed window with an anti-reflective coating to isolate external dust and moisture, ensuring stable operation of the detector in complex environments.

[0090] The spectral decomposition unit, optical path switching device, detection array, spectral calibration system, and temperature control and protection module are all connected to the control module.

[0091] The control module includes a real-time monitoring unit and a feedback control unit. The real-time monitoring unit is used to collect the spectral characteristic signals and emission uniformity parameters of the plasma, and detects the discharge voltage, discharge current, gas flow rate, gas pressure and operating frequency through built-in sensors. The feedback control unit is used to dynamically adjust the discharge parameters to meet the optimization target based on the monitoring data, combined with the target spectral signal and uniformity standard.

[0092] like Figure 7 As shown, the plasma generating module has an adjustable electrode structure. The design of the electrode structure can optimize the uniformity and stability of the plasma emission spectrum by adjusting the electrode spacing and shape. Its specific structure includes an electrode structure, a cooling backplate 144, and a micro-push rod 143, wherein, as... Figure 8 and Figure 9 As shown, the electrode structure is an adjustable electrode, divided into an anode 141 and a cathode 142, both of which are made of materials with excellent electrical conductivity and resistance to high temperature corrosion.

[0093] The cooling back plate 144 is provided on the base 16. The cathode 142 and anode 141 are respectively provided on both sides of the middle position of the cooling back plate 144. The micro push rod 143 is provided between the back of the cathode 142 and anode 141 and the side of the cooling back plate 144. The micro push rod 143 is used to push the cathode and anode, thereby adjusting the electrode discharge cooperation space.

[0094] like Figure 10 As shown, the cooling backplate 144 integrates cooling channels to maintain the stability of the electrode temperature through air cooling or liquid cooling, preventing electrode surface ablation and performance degradation caused by long-term discharge.

[0095] The surfaces of the cathode 142 and anode 141 are both fabricated using microstructure technology, and their shapes include serrated, needle-like, or conical shapes. The optimal shape can be selected according to the application requirements of plasma emission spectrum. The goal of surface morphology optimization is to enhance the uniformity of plasma discharge and improve the emission intensity of specific spectral bands.

[0096] The adjustment range d of the miniature push rod 143 min to d max It supports multiple discharge modes, integrates multiple electrode modules, and can be quickly replaced to adapt to different experimental needs.

[0097] The plasma generation module has the following advantages:

[0098] Electrode performance is optimized, and discharge uniformity is improved. The electrode surface design incorporates a multi-point micro-discharge structure to effectively disperse discharge points and avoid discharge instability caused by local overheating or electric field concentration. The electrode spacing adjustment supports an adaptive optimization algorithm and works in conjunction with the plasma control module to ensure real-time matching of discharge parameters with spectral requirements, thereby enhancing spectral signal quality. For specific application scenarios (such as when high signal-to-noise ratio is required for spectral signal acquisition), the microstructure characteristics of the electrode surface are adjusted to enhance the emission intensity of specific wavelength bands. A cooling device is used to reduce the impact of electrode temperature rise on spectral emission stability and improve service life. High-temperature resistant and corrosion-resistant materials are used in conjunction with the cooling system to extend the working life of the electrodes and reduce maintenance frequency.

[0099] like Figure 11 As shown, the outer casing and protective system are used to protect the internal structure of the device and ensure detection stability and safety. It includes the following structural and functional modules:

[0100] Housing Design: Modular housing structure. The housing adopts a modular splicing design, consisting of multiple detachable units, which facilitates maintenance, upgrades, and expansion of device functions. The housing material is selected from high-temperature resistant and corrosion-resistant polymer composite materials or lightweight metal alloys, which can adapt to the high-temperature plasma operation environment and have good mechanical strength. Isolation and protection structure: The housing is equipped with a multi-layer shielding structure, including a thermal shielding layer and an electromagnetic shielding layer, to isolate the thermal radiation and electromagnetic interference generated during plasma discharge, ensuring the safe operation of optical and electronic components. The housing surface is covered with an anti-static coating to avoid the impact of static electricity accumulation on the optical acquisition module and the spectral analysis module.

[0101] Cooling system: Active cooling module, integrating air cooling and liquid cooling channels, using cooling fans or circulating coolant to maintain stable internal temperature of the device. The inlet and outlet of the cooling system are equipped with adjustable valves and filters to prevent dust or contaminants from entering the device.

[0102] Temperature control system: Thermistors or infrared temperature sensors are installed in key parts of the outer casing to monitor the internal temperature of the device in real time. The temperature control system is linked with the control module. When the temperature exceeds the set threshold, the heat dissipation device is automatically activated to cool down the device quickly.

[0103] Protection features: Vibration and shock protection. A damping shock absorber is installed at the bottom of the housing to reduce the interference of external vibration or shock on the internal optical acquisition module and spectral analysis module. Key internal components (such as the spectrometer and detector) are fixed by a soft support structure to further improve vibration resistance.

[0104] Environmentally sealed design: The housing is designed as a sealed structure and equipped with a high-performance sealing ring to prevent external moisture, dust or corrosive gases from entering the device.

[0105] like Figure 12 As shown, the present invention also provides a plasma optical emission spectroscopy detection method, applied to the above-mentioned device, comprising:

[0106] Step 1: Generate plasma;

[0107] Start the plasma generation module, set and adjust the working parameters of the plasma generation module, including input voltage, frequency and gas flow rate, to form a stable plasma; select the working gas (such as inert gas, oxygen or nitrogen) or mixed gas as the plasma medium according to the characteristics of the sample to be tested, to ensure that the generated optical emission spectrum is adapted to the target analysis requirements, and optimize the plasma generation conditions: adjust the discharge parameters in real time through the control module to ensure that the intensity and stability of the plasma spectral signal reach the best level;

[0108] Step 2: Acquire spectral signals;

[0109] Adjusting the optical acquisition module: Adjusting the height and lateral position of the lens using the stage in the optical acquisition module ensures the optical acquisition path is accurately aligned with the plasma emission source; using a linear guide rail for precise lens positioning ensures the acquisition area covers the optimal spectral region of plasma emission. Acquiring spectral signals: Transmitting the acquired light signals to the spectral analysis module using fiber optic components; simultaneously focusing or collimating the beam using an optical lens group improves the acquisition efficiency of the spectral signals; during acquisition, a shockproof system and environmentally sealed design ensure the optical signals are protected from interference by external vibrations, airflow, or contaminants.

[0110] Step 3: Decomposition and detection of spectral signals;

[0111] Spectral decomposition: In the spectral analysis module, a high-resolution optical deconstruction device is used to decompose the optical signal into spectral lines of different wavelengths to distinguish the characteristic emissions of each component in the plasma. The spectroscopic processing employs a high-precision diffraction grating or prism system to ensure that the spectral resolution meets the requirements for detecting trace components. Signal detection: A high-sensitivity detector records the intensity distribution and peak position of each spectral line; the detector is connected to a cooling system to reduce noise and improve detection accuracy.

[0112] Step 4: Perform data analysis and component extraction;

[0113] Data transmission and preprocessing: The acquired spectral data is transmitted to the data processing module; noise filtering, background subtraction, and signal normalization are performed on the raw spectral data to ensure the accuracy of the analysis data. Spectral feature extraction and component analysis: Spectral feature matching methods are used to identify and match spectral feature lines in each band; overlapping spectral lines are separated using spectral deconvolution methods, and the emission intensity corresponding to each component is calculated.

[0114] Step 5: Feedback and adjustment of test results;

[0115] Detection result output: In the data processing module, the concentration and spectral characteristic information of each component obtained from the analysis are compiled into a detection report and output in real time through the display screen or external interface; the detection results can be stored in the local storage system or sent to a remote database through the wireless transmission module. Plasma parameter optimization: Based on the detection results, the control module is used to adjust the plasma generation parameters (such as voltage, gas flow rate, etc.) to optimize the plasma generation conditions; the control process adopts a feedback mechanism to ensure that the spectral signal intensity and component resolution are always at the optimal state;

[0116] Step 6: Self-checking and security assurance of the method;

[0117] Automated self-test: Before the method starts, the system automatically checks the working status of the optical acquisition module, spectral analysis module, and data processing module; if an abnormal state is detected (such as fiber breakage or weak spectral signal), the system immediately alarms and suspends operation. Environmental adaptability: The detection method has the ability to automatically adapt to environmental temperature, humidity, and vibration conditions, and the protective system of the enclosure ensures the operational stability of the device.

[0118] In step 4, the spectral analysis and data processing module analyzes and processes the acquired spectral data using a multidimensional eigenvalue decomposition method, and calculates the spectral emission intensity and compositional characteristics of each component using the following mathematical model:

[0119] Spectral decomposition is performed using a multidimensional eigenvalue decomposition model. The spectral signal is represented by the superposition of multiple characteristic basis functions, as shown in the following expression:

[0120]

[0121] In the formula, I(λ) represents the spectral signal at wavelength λ, and Ψ k (λ,θ k ) is the k-th characteristic basis function, based on the parameter θ k Generate, ω k ξ represents the intensity weight of the k-th basis function, reflecting the relative contribution of this component; ξ is the random noise interference term; and N is the total number of spectral characteristic basis functions.

[0122] The feature function generation mechanism is as follows: feature basis function Ψ k (λ,θ k It is generated from the normalized information of spectral data under specific physical conditions, and its functional form is:

[0123]

[0124] In the formula, A k B k μ is the magnitude parameter of the basis functions. k and σ k f represents the center wavelength and bandwidth of the k-th feature, respectively. k The selected modulation frequency reflects higher-order spectral characteristics;

[0125] The total emission intensity of each spectral component is calculated as follows:

[0126]

[0127] In the formula, λ1 and λ2 represent the spectral wavelength range of a specific component. The component type is obtained by comparing it with a known spectral feature database, and finally a spectral component report is generated.

[0128] In step 5, the spectral analysis and data processing module uses a dynamic spectral feature inversion method to calculate the concentration of each component in the plasma, and achieves accurate inversion through the following model:

[0129] The spectral emission intensity is normalized. The acquired spectral data I(λ) is normalized to remove instrument background interference and noise, resulting in the net emission spectrum I. norm (λ) is:

[0130]

[0131] In the formula, I bg For the instrument background signal, max[I(λ)-I bg [] represents the maximum value of the spectral signal, used for normalization;

[0132] Characteristic spectral intensity separation is performed, and the characteristic emission intensity I of specific components is extracted using a piecewise integration method. k for:

[0133]

[0134] In the formula, λ k1 and λ k2 The emission band range for k components;

[0135] The concentration C of each component was calculated based on the concentration inversion formula. k for:

[0136]

[0137] In the formula, C k Let η be the concentration of the k-th component. k Let σ be the emission cross section of this component. k T represents the particle collision cross section of the plasma. k This represents the local temperature of this component in the plasma;

[0138] Based on the dynamic spectral feature inversion algorithm, the concentration weighting factor β of each component is dynamically adjusted. k for:

[0139]

[0140] In the formula, β k Let N be the concentration percentage of the k-th component, and N be the total number of components in the plasma.

[0141] The inversion results are calibrated based on a linear correction model to reduce the impact of instrument errors on concentration calculations.

[0142]

[0143] In the formula, The calibrated concentration value, γ k and δ k The correction factor is determined by the calibration experiment.

[0144] In step 6, the plasma generation parameters are adjusted using the control module to optimize the plasma generation conditions. The control process employs a feedback mechanism to ensure that the spectral signal intensity and composition resolution are always at their optimal levels. Specifically:

[0145] The control module employs an adaptive plasma parameter control method, achieving dynamic optimization of plasma generation parameters through real-time monitoring and feedback adjustment. The control module includes a real-time monitoring unit and a feedback control unit. The real-time monitoring unit acquires the plasma's spectral characteristic signal I(λ) and emission uniformity parameter U, and detects discharge voltage V, discharge current I, gas flow rate F, gas pressure P, and operating frequency f using built-in sensors. The feedback control unit, based on the monitoring data and combined with the target spectral signal I... target (λ) and uniformity standard U target Dynamically adjust discharge parameters to meet optimization objectives;

[0146] The real-time monitoring unit monitors the intensity distribution I(λ) and emission uniformity U of the plasma spectrum emission in real time. It detects the discharge voltage V, discharge current I, gas flow rate F, gas pressure P, and operating frequency f using built-in sensors to determine if there are deviations from the target values. It then calculates the error between the current parameters and the target values, which is:

[0147] E I =|I(λ)-I target (λ)|,E U =|UU target |

[0148] If the error E I or E U If the preset threshold is exceeded, a feedback control mechanism is triggered. Based on the feedback control unit, an adaptive plasma parameter control method is adopted, and the parameters are updated using the following iterative formula:

[0149]

[0150] In the formula, t is the current iteration number, and α is the step size factor. To optimize the gradient of the objective function with respect to each parameter;

[0151] When the objective function J converges to the preset threshold, the adjustment is stopped, and the final optimization parameter V is output. op t,f op t,F op t,P op t;

[0152] The parameter optimization model J is:

[0153] min {V,f,F,P} J=ω1·|I(λ)-I target (λ)| 2 +ω2·|UU target | 2

[0154] In the formula, J is the objective function, ω1 and ω2 are weighting coefficients used to balance the optimization requirements of spectral signal and uniformity, and I(λ) is the real-time acquired spectral signal. target (λ) represents the target spectral signal, and U represents the current plasma emission uniformity parameter. target The target uniformity parameter.

[0155] This invention provides an embodiment in which the optical emission spectrum signal of argon plasma is acquired using the apparatus and method of this invention, and the internal ions (Ar) are analyzed. + Concentration distribution of excited-state atoms (Ar*), electrons, and active groups (such as OH, O, etc.);

[0156] Experimental Procedure: Plasma Generation: Argon plasma was generated using a plasma generation module. The discharge power was set to P (ranging from 50W to 100W), and the argon flow rate was set to Q (ranging from 2L / min to 5L / min). Optical Signal Acquisition: The stage was adjusted to align the lens with the plasma emission region. The stage was precisely positioned using a vertical lifting mechanism and a guide rail. The plasma optical emission spectrum signal was acquired, covering a wavelength range of 200nm to 800nm. The spectral analysis module dispersed the acquired spectral signal, and the detector recorded its intensity. A custom plasma decoupling optimization algorithm was used to decouple the spectral data and extract the characteristic values ​​corresponding to each spectral line. Data Processing: The concentration of each component was calculated according to the above formula.

[0157] In the experiment, the spectral emission intensity was measured. and I OU =150, combined with launch efficiency and η OH =0.5, and electron temperature T e =3.5eV, calculated as follows:

[0158]

[0159] This invention significantly improves the acquisition accuracy and analysis efficiency of plasma optical emission spectral signals by optimizing the optical acquisition module, innovating the spectral analysis algorithm, and using dynamic feedback control methods. The height-adjustable stage and cross-rail structure ensure the device's adaptability to plasma sources at different heights and positions. The customized "Plasma Component Decoupling Optimization Calculation (PCCOA)" achieves efficient decoupling of spectral features and accurate calculation of component concentrations. The dynamic control function can optimize the plasma operating state in real time, enhancing signal stability and data accuracy. This invention not only possesses high sensitivity and high resolution detection capabilities but also features excellent modular design and environmental adaptability, making it suitable for multiple fields such as industrial monitoring, environmental detection, and scientific research. It has significant application value and promising prospects for widespread application.

[0160] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0161] This document uses specific examples to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. Furthermore, those skilled in the art will recognize that, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. A plasma optical emission spectroscopy detection device, characterized in that, include: The system comprises a base, an optical acquisition module, a spectral analysis and data processing module, a control module, a plasma generation module, and a housing and protective system. The optical acquisition module, control module, and plasma generation module are mounted on the base. The spectral analysis and data processing module is mounted on the back of the optical acquisition module. The housing and protective system cover the base. The optical acquisition module, spectral analysis and data processing module, and plasma generation module are all connected to the control module. The optical acquisition module is used to acquire spectral signals; The spectral analysis and data processing module is used to decompose and detect the acquired spectral signals, analyze the spectral data, extract spectral feature information, and determine the ions, gases, electrons, and active group components in the plasma. The control module is used to regulate the parameters of the plasma generation module and the working state of the optical acquisition module in order to optimize the acquisition effect of the spectral signal. The plasma generating module is used to generate the plasma to be tested; The outer casing and protective system are used to protect the internal structure of the device; The optical acquisition module includes a vertical lifting mechanism, a lens stage, a linear guide rail mechanism, a locking device, a shockproof system, and a scale and position indication system. The vertical lifting mechanism is mounted on the base, and the lens stage is mounted on the front of the vertical lifting mechanism. The vertical lifting mechanism is used to drive the lens stage to move vertically via a precision screw to adapt to plasma emission sources of different heights. The linear guide rail mechanism is mounted on the top of the lens stage. The linear guide rail mechanism consists of two mutually perpendicular slide rails, on which a lens is mounted. The lens is connected to the spectral analysis and data processing module via an optical fiber. The linear guide rail mechanism is used to move the lens along the X and Y axes. The locking device is mounted on the linear guide rail mechanism to fix the lens. The shockproof system is located at the lower part of the vertical lifting mechanism to reduce the impact of external vibrations on the spectral acquisition process. The scale and position indication system is mounted on the vertical lifting mechanism for users to quickly locate and adjust the lens position. The vertical lifting mechanism, the linear guide rail mechanism, and the locking device are all connected to the control module. The spectral analysis and data processing module includes a mounting frame, a spectral decomposition unit, an optical path switching device, a detector array, a spectral calibration system, and a temperature control and protection module. The mounting frame has an optical fiber inlet for the entry of optical fibers connecting to the lens. The spectral decomposition unit is located inside the mounting frame corresponding to the optical fiber inlet. The spectral decomposition unit includes a high-precision optical deconstruction device and a servo motor. The high-precision optical deconstruction device is located inside the mounting frame via the servo motor and has a finely grooved surface. The optical path switching device is located at the center of the mounting frame opposite the optical fiber inlet. The optical path switching device includes a linear moving guide rail structure, an electrically controllable reflector, and a beam splitter for optical path switching. The detector array is mounted on the mounting frame opposite the spectral decomposition unit via a flexible mounting bracket. The spectral calibration system is located on the same side as the optical fiber inlet and has a built-in spectral calibration light source. The temperature control and protection module is located inside the mounting frame for temperature control. The spectral decomposition unit, optical path switching device, detector array, spectral calibration system, and temperature control and protection module are all connected to the control module. The control module includes a real-time monitoring unit and a feedback control unit. The real-time monitoring unit is used to collect the spectral characteristic signals and emission uniformity parameters of the plasma, and detects the discharge voltage, discharge current, gas flow rate, gas pressure and operating frequency through built-in sensors. The feedback control unit is used to dynamically adjust the discharge parameters to meet the optimization target based on the monitoring data, combined with the target spectral signal and uniformity standard.

2. The apparatus according to claim 1, characterized in that, The plasma generating module includes an anode, a cathode, a cooling backplate, and a micro pusher. The cooling backplate is mounted on the base. The cathode and anode are respectively mounted on both sides of the center of the cooling backplate. The micro pusher is positioned between the back of the cathode and anode and the side of the cooling backplate. The micro pusher is used to push the cathode and anode, thereby adjusting the electrode discharge cooperation space. The surfaces of the cathode and anode are both fabricated using microstructure processing technology, and their shapes include serrated, needle-like, or conical.

3. A plasma optical emission spectroscopy detection method, characterized in that, The method, applied to the apparatus of any one of claims 1 to 2, comprises: The device performs automated self-tests, automatically detecting the working status of the optical acquisition module, spectral analysis, and data processing module. If an abnormality is detected, the device immediately alarms and suspends operation; if no abnormality is detected, it continues. To generate plasma, the plasma generation module is activated. The operating parameters of the plasma generation module, including input voltage, frequency, and gas flow rate, are set and adjusted to form a stable plasma. Based on the characteristics of the sample to be tested, a working gas or mixed gas is selected as the plasma medium to optimize the plasma generation conditions. The discharge parameters are then controlled in real time through the control module. Acquire spectral signals, adjust the optical acquisition module, and adjust the height and lateral position of the lens to ensure that the optical acquisition path is accurately aligned with the plasma emission source, ensuring that the acquisition area covers the optimal spectral region of plasma emission, and use optical fiber to transmit the acquired spectral signals to the spectral analysis and data processing module. The spectral signal is decomposed and detected. In the spectral analysis and data processing module, a high-resolution optical deconstruction device is used to decompose the spectral signal into spectral lines of different bands to distinguish the characteristic emission of each component in the plasma. The intensity distribution and peak position of each spectral line are recorded by a detection array. Data analysis and component extraction are performed. The spectral analysis and data processing modules perform noise filtering, background subtraction and signal normalization on the collected data. After processing, the spectral feature matching method is used to identify and match the spectral feature lines of each band. The overlapping spectral lines are separated by the spectral deconvolution method, and the emission intensity corresponding to each component is calculated. A dynamic spectral feature inversion method is used to calculate the concentration of each component in the plasma. The analysis results of the concentration and spectral characteristics of each component are compiled into a detection report and output in real time via a display screen or external interface. Based on the detection results, the plasma generation parameters are adjusted using the control module to optimize the plasma generation conditions. The control process adopts a feedback mechanism to ensure that the spectral signal intensity and component resolution are always at their best.

4. The method according to claim 3, characterized in that, The spectral analysis and data processing module employs a spectral feature matching method to identify and match spectral feature lines in each band. It then separates overlapping spectral lines using spectral deconvolution and calculates the emission intensity corresponding to each component. This is achieved through the following mathematical model: Spectral decomposition is performed using a multidimensional eigenvalue decomposition model. The spectral signal is represented by the superposition of multiple characteristic basis functions, as shown in the following expression: In the formula, I(λ) represents the wavelength. Spectral signal at that location, For the first Each characteristic basis function, based on parameters generate, For the first The strength weights of each basis function reflect the relative contribution of that component. For random noise interference, N is the total number of spectral characteristic basis functions; The feature function generation mechanism is as follows: feature basis function It is generated from the normalized information of spectral data under specific physical conditions, and its functional form is: In the formula, , The magnitude parameter of the basis function. and The first The center wavelength and bandwidth of each characteristic The selected modulation frequency reflects higher-order spectral characteristics; The total emission intensity of each spectral component is calculated as follows: In the formula, and The spectral wavelength range of a specific component is determined by comparing it with a known spectral feature database, ultimately forming a spectral component report.

5. The method according to claim 4, characterized in that, The concentrations of various components in the plasma are calculated using a dynamic spectral feature inversion method, specifically: Normalize the spectral emission intensity of the collected spectral data. Normalization was performed to remove instrument background interference and noise, resulting in the net emission spectrum. for: In the formula, This is the instrument's background signal. The maximum value of the spectral signal is used for normalization; Characteristic spectral intensity separation is performed, and the characteristic emission intensity of specific components is extracted using a piecewise integration method. for: In the formula, and for The characteristic emission band range of each component; The concentration of each component was calculated based on the concentration inversion formula. for: In the formula, For the first The concentration of each component This is the emission cross section of the component. This represents the particle collision cross section of the plasma. This represents the local temperature of this component in the plasma; Based on the dynamic spectral feature inversion algorithm, the concentration weighting factors of each component are dynamically adjusted. for: In the formula, For the first The concentration percentage of each component The total number of components in the plasma; The inversion results are calibrated based on a linear correction model to reduce the impact of instrument errors on concentration calculations. In the formula, The calibrated concentration value. and The correction factor is determined by the calibration experiment.

6. The method according to claim 5, characterized in that, The plasma generation parameters are adjusted using a control module to optimize the plasma generation conditions. A feedback mechanism is employed in the control process to ensure that the spectral signal intensity and composition resolution are always at their optimal levels. Specifically: The control module employs an adaptive plasma parameter control method, achieving dynamic optimization of plasma generation parameters through real-time monitoring and feedback adjustment. The control module includes a real-time monitoring unit and a feedback control unit, wherein the real-time monitoring unit acquires the spectral characteristic signals of the plasma. and emission uniformity parameters Discharge voltage is detected by built-in sensors. Discharge current Gas flow rate air pressure and operating frequency The feedback control unit is based on monitoring data and combined with the target spectral signal. and uniformity standard Dynamically adjust discharge parameters to meet optimization objectives; The real-time monitoring unit monitors the intensity distribution of plasma spectral emission in real time. and emission uniformity Discharge voltage is detected by built-in sensors. Discharge current Gas flow rate air pressure and operating frequency To determine if the value deviates from the target value, calculate the error between the current parameter and the target value: If error or If the preset threshold is exceeded, a feedback control mechanism is triggered. Based on the feedback control unit, an adaptive plasma parameter control method is adopted, and the parameters are updated using the following iterative formula: In the formula, This represents the current iteration number. Step size factor To optimize the gradient of the objective function with respect to each parameter; When optimizing the objective function When the convergence reaches the preset threshold, the adjustment stops, and the final optimized parameters are output. ; Among them, parameter optimization model for: In the formula, To optimize the objective function, and These are weighting coefficients used to balance the optimization requirements of spectral signal and uniformity. For real-time acquisition of spectral signals, For the target spectral signal, The current plasma emission uniformity parameters, The target uniformity parameter.

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