Color filter for micro-display, micro-display device with color filter and forming process

Abstract

The invention relates to the field of semiconductors, in particular to a color filter for a micro-display, a micro-display device with the color filter and a forming process, and the color filter comprises a color filter layer, a black matrix layer and a first filling layer; the color filter layer is embedded in the black matrix layer, and the black matrix layer is embedded in the first filling layer; the color filter layer, the black matrix layer and the first filling and leveling layer are mutually embedded, so that the problem of color film Peeling caused by insufficient adhesiveness of a color film material and the first filling and leveling layer can be solved; and by limiting the structure of the black matrix layer, the crosstalk problem caused by light emission of different pixels can be solved.

Description

Technical Field

[0001] The invention relates to the field of semiconductors, in particular to a color filter for a micro display, a micro display device having the color filter and a molding process. Background Art

[0002] In the Micro OLED device structure, the existing technology mostly uses white light OLED + color film RGB, and the RGB pixels responsible for color presentation are arranged side by side; the lower OLED emits a point light source, which passes through the RGB sub-pixels and displays the three colors of Red / Green / Blue respectively.

[0003] The existing pixel arrangement is prone to the problem of optical crosstalk between adjacent pixels.

[0004] In the field of traditional flat panel displays, black photoresist materials are generally used to prepare a black matrix BM (Black Matrix) pattern by coating, exposure and development, and then RGB sub-pixels are prepared thereon by coating, exposure and development to prevent optical crosstalk between the RGB sub-pixels.

[0005] However, because Micro OLED display devices require higher pixel density and lower RGB sub-pixel size (5μm and smaller, the line width of the black matrix is ​​required to be less than 1μm, and the large line width affects the RGB sub-pixel display area (affecting the aperture ratio). Therefore, a small line width black matrix can increase the aperture ratio, while a small black matrix line width will reduce the adhesion between the black matrix material and the underlying structure, which is very likely to cause peeling (photoresist stripping), and the risk of process failure is high.

[0006] CN117500307A-Micro OLED manufacturing method and Micro OLED display device, discloses a MicroOLED manufacturing method, including the steps of: making an anode structure; making a dielectric layer; making an organic light-emitting layer and an encapsulation layer; making a first flat layer; making a color film RGB; making a second flat layer; attaching a glass cover plate to the second flat layer; exposing the Pad; cutting; splitting; and bonding the circuit board; and also fails to solve the above technical problems.

[0007] In addition, the existing R, G, and B color film structures are not designed and are usually produced in sequence in a tiling manner. When the R, G, and B color films are produced separately, peeling will occur in each layer, resulting in yield loss. In addition, the tiling structure is prone to crosstalk problems caused by the light emission of different pixels.

[0008] Therefore, in order to improve or solve at least one of the above problems, it is necessary to optimize the film layer structure of the existing micro display device. Summary of the invention

[0009] The object of the present invention is to provide a color filter capable of reducing peeling of the color filter layer.

[0010] In order to achieve the above object, the technical solution adopted by the present invention is:

[0011] A color filter for a micro display comprises a color filter layer, a black matrix layer and a first filling layer; the color filter layer is embedded in the black matrix layer, and the black matrix layer is embedded in the first filling layer.

[0012] The black matrix layer comprises a matrix layer body; the matrix layer body is provided with matrix grooves; and the matrix grooves are stepped grooves.

[0013] The matrix layer includes a plurality of monomer matrix strips; adjacent monomer matrix strips are spaced and arranged in parallel or perpendicular to each other; each of the monomer matrix strips includes a lower strip body, a middle strip body and an upper strip body; the upper strip body is connected to the lower strip body through the middle strip body; and a protrusion is provided on the lower strip body.

[0014] The horizontal projection area of ​​the upper strip in each monomer matrix strip is larger than the horizontal projection area of ​​the middle strip; the horizontal projection area of ​​the middle strip is not smaller than the horizontal projection area of ​​the lower strip.

[0015] The color filter layer comprises a plurality of single filter layers; each single filter layer is provided with an embedding groove near the edge of the black matrix layer.

[0016] The first filling layer is provided with a sawtooth groove for embedding a black matrix layer.

[0017] A micro display device, characterized in that it comprises a display module, on which the color filter is arranged; and on which a lens layer and a cover plate are arranged in sequence.

[0018] A molding process of the micro display device, the molding process comprising the following steps:

[0019] Step 1: Make the display module;

[0020] Step 2: Making a color filter on the display module;

[0021] Step 3: After step 2 is completed, a lens layer and a cover plate are made on the color filter;

[0022] Step 4: After step 3 is completed, a micro display device is formed. If a new micro display device is to be formed repeatedly, just repeat steps 1-3.

[0023] The method for manufacturing the color filter on the display module in step 2 comprises the following steps:

[0024] S1: first apply a first filling layer on the display module;

[0025] S2: Opening a sawtooth groove on the first filling layer;

[0026] S3: Apply BM glue layer in the zigzag groove in S2 and on the first filling layer;

[0027] S4: Processing the BM glue layer in S3 into a black matrix layer through a photolithography process;

[0028] S5: pouring color film glue into the black matrix layer to form a color filter layer;

[0029] S6: After S5 is completed, the color filter is produced on the display module.

[0030] In S2, it is required to first coat a photoresist on the first fill-up layer, then form an undercut on the photoresist through an exposure process; and then form a corresponding sawtooth groove on the first fill-up layer through an etching process.

[0031] The advantages of the present invention are:

[0032] The invention discloses a color filter for a micro display, a micro display device having the color filter, and a molding process.

[0033] The present invention can solve the problem of color film peeling caused by insufficient adhesion between the color filter material and the first filling layer by mutually embedding the color filter layer, the black matrix layer and the first filling layer. At the same time, the setting of the black matrix layer; by limiting the structure of the black matrix layer, it can also solve the crosstalk problem caused by the light emission of different pixels. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The following is a brief description of the contents expressed in the drawings of the present invention and the symbols in the drawings:

[0035] Figure 1 It is a schematic diagram of the structure of the color filter in the present invention.

[0036] Figure 2 It is the film structure of the display module in the present invention.

[0037] Figure 3 This is the film layer structure after S1 in the present invention is coated with photoresist.

[0038] Figure 4 This is the film layer structure after the grooves are opened on the photoresist in S1 of the present invention.

[0039] Figure 5 This is the film structure after S2 processing in the present invention.

[0040] Figure 6 This is the film structure after S3 processing in the present invention.

[0041] Figure 7 It is the film structure of the photoresist after photolithography processing in the present invention.

[0042] Figure 8 This is the film structure after the black matrix layer is etched in the present invention.

[0043] Fig. 9 This is the film layer structure after the first filling layer is etched in the present invention.

[0044] Fig.10 This is the film layer structure of the micro display device after molding according to the present invention.

[0045] The marks in the above figure are:

[0046] 00, substrate, 01, substrate-top-SIO; 02 anode reflective layer, 03, connecting layer, 04, optical cavity adjustment layer, 05, filling layer, 06, pixel definition layer, 07, transparent conductive anode, 08, organic light-emitting layer, 09, thin film encapsulation layer, 10, first filling layer, 11 first color filter layer, 12, second color filter layer, 13, third color filter layer, 14, black matrix layer, 15, second filling layer, 16, lens layer, 17, third filling layer, 18, CG;

[0047] 1-1, color filter layer, 1-11, monomer filter layer, 141, monomer matrix strip, 1411, upper strip body, 1412, middle strip body, 1413, lower strip body, 1414, protrusion, 101, sawtooth groove. DETAILED DESCRIPTION

[0048] The specific implementation of the present invention will be further explained in detail below by describing the optimal embodiment with reference to the accompanying drawings.

[0049] A color filter for a micro display comprises a color filter layer 1-1, a black matrix layer 14 and a first filling layer 10; the color filter layer 1-1 is embedded in the black matrix layer 14, and the black matrix layer 14 is embedded in the first filling layer 10; the present invention can solve the problem of color film peeling caused by insufficient adhesion between the color filter material and the first filling layer 10 by mutually embedding the color filter layer 1-1, the black matrix layer 14 and the first filling layer 10, and at the same time, the arrangement of the black matrix layer 14; by limiting the structure of the black matrix layer 14, it can also solve the crosstalk problem caused by the light emission of different pixels.

[0050] In the present invention, the color filter layer 1-1 is a key part for realizing color display, which presents colors such as red, green, and blue by selectively transmitting light of a specific wavelength.

[0051] Position of the color filter layer 1 - 1 : embedded in the black matrix layer 14 , ie, separated and surrounded by the black matrix layer 14 .

[0052] The color filter layer 1 - 1 is usually composed of a plurality of single filters, each of which corresponds to a pixel unit and is responsible for displaying a color (such as the three primary colors of RGB).

[0053] The edge of each single filter may be provided with an embedding groove 1 - 12 to better combine with the black matrix layer 14 .

[0054] The black matrix layer 14 (BM layer) is mainly used to separate pixels: the main function of the black matrix layer 14 is to separate filter units of different colors to prevent color crosstalk (ie, light leakage between different pixels leads to color impurity).

[0055] Meanwhile, in the present invention, the black matrix layer 14 plays a light shielding role: absorbing or blocking the light in the non-display area, thereby improving the contrast and display quality.

[0056] The black matrix layer 14 is embedded in the first fill layer 10 and wraps the color filter layer 1 - 1 .

[0057] In the present invention, the first filling layer 10 provides a flat substrate: it provides a flat supporting surface for the color filter layer 1-1 and the black matrix layer 14, ensuring uniform coating and processing of subsequent film layers.

[0058] Meanwhile, in the present invention, the color filter layer 1-1, the black matrix layer 14 and the first filling layer 10 are nested in structure: by designing a specific groove structure (such as the sawtooth groove 101) and embedding the black matrix layer 14, the stability and bonding force of the overall structure are enhanced.

[0059] The first filling layer 10 is located at the bottom layer of the entire color filter structure and wraps the black matrix layer 14 .

[0060] The color filter layer 1-1 is embedded in the black matrix layer 14, separated and protected by the black matrix layer 14; the black matrix layer 14 is embedded in the first filling layer 10 and fixed by the groove structure of the filling layer (such as the sawtooth groove 101); the first filling layer 10 serves as the bottom support, provides a flat base, and enhances the stability of the overall structure by combining with the black matrix layer 14.

[0061] The present invention is based on the above design and can prevent color crosstalk: through the separation of the black matrix layer 14, light leakage between different pixels is effectively avoided, thereby ensuring the purity of color.

[0062] Enhanced bonding strength: Through the serrated or T-shaped structure design, the adhesion between the layers is improved and the peeling phenomenon is reduced.

[0063] The light shielding function of the black matrix layer 14 can absorb light in the non-display area, thereby improving the display contrast.

[0064] The color filter layer 1 - 1 is embedded in the black matrix layer 14 , and the black matrix layer 14 is embedded in the first fill layer 10 , thereby achieving a display effect with high contrast, high color accuracy and high stability.

[0065] Furthermore, in the present invention, the black matrix layer 14 includes a matrix layer body 143; a matrix groove 142 is provided on the matrix layer body 143; the matrix groove 142 is a stepped groove; the matrix layer body 143 is the main part of the black matrix layer 14, which plays a supporting and separating role; the matrix layer body 143 separates different pixel units of the color filter layer 1-1 to prevent color crosstalk; and also provides a stable framework for the entire color filter structure.

[0066] The matrix groove 142 is a groove designed on the matrix layer body 143 for embedding the color filter layer 1 - 1 ; the matrix groove 142 embeds the color filter: the matrix groove 142 provides a precise positioning and fixing space for the color filter layer 1 - 1 .

[0067] By designing the shape of the grooves, the optical performance can be improved, such as reducing light scattering and reflection.

[0068] The matrix grooves 142 adopt a stepped structure, that is, the depth or width of the grooves is different at different positions, forming a stepped geometric shape.

[0069] With such a design, the step groove can increase the contact area and mechanical stability between the black matrix layer 14 and the color filter layer 1-1, and reduce the problem of color film peeling; the step groove can optimize the light propagation path, reduce crosstalk, and improve contrast and color purity; the step groove design can better adapt to the color filter layer 1-1 materials of different thicknesses, ensuring the uniformity and consistency of the overall structure.

[0070] The step groove design increases the bonding force and reduces the peeling phenomenon of the color filter layer 1-1 caused by stress or process defects during use.

[0071] The stepped grooves can more effectively separate different pixel units and prevent light leakage between adjacent pixels, thereby improving display quality.

[0072] The stepped groove design can optimize the optical path and reduce light reflection and scattering in non-display areas, thereby improving display contrast.

[0073] Furthermore, in the present invention, the matrix layer 143 includes a plurality of monomer matrix strips 141; adjacent monomer matrix strips 141 are spaced apart and distributed in parallel or perpendicular to each other; each of the monomer matrix strips 141 includes a lower strip body 1413, a middle strip body 1412 and an upper strip body 1411; the upper strip body 1411 is connected to the lower strip body 1413 through the middle strip body 1412; a protrusion 1414 is provided on the lower strip body 1413; the matrix layer 143 of the black matrix layer 14 is composed of a plurality of monomer matrix strips 141.

[0074] These single matrix strips 141 are used to separate the pixel units in the color filter layer 1 - 1 to prevent color crosstalk.

[0075] Adjacent monomer matrix bars 141 may be arranged in parallel with each other or perpendicular to each other. This distribution method helps to optimize the display effect and adapt to different display requirements. The monomer matrix bars 141 are arranged perpendicularly to each other to form a rectangular frame structure.

[0076] In addition, in the present invention, each monomer matrix strip 141 is composed of the following parts: a lower strip body 1413: located at the bottom of the monomer matrix strip 141, in contact with the substrate, and plays a supporting role.

[0077] The lower strip body 1413 is provided with a protrusion 1414, which may be used to enhance the bonding force with the substrate; based on the arrangement of the protrusion 1414, a sawtooth structure is formed on the side surface of the lower strip body 1413.

[0078] The middle strip 1412 connects the lower strip 1413 and the upper strip 1411 to play a role of transition and support.

[0079] Upper strip body 1411: located at the top of the single matrix strip 141, connected to the lower strip body 1413 through the middle strip body 1412.

[0080] The horizontal projection area of ​​the upper strip 1411 is larger than that of the middle strip 1412 . This design may be used to optimize optical performance.

[0081] The protrusion 1414 on the lower strip body 1413 can increase the adhesion between the single matrix strip 141 and the first filling layer 10 and reduce the peeling phenomenon.

[0082] The larger area design of the upper strip 1411 can better block the light in the non-display area, reduce light leakage, and thus improve the display contrast.

[0083] The spaced parallel or vertical distribution of the individual matrix strips 141 can effectively separate different pixel units and prevent color crosstalk.

[0084] Furthermore, in the present invention, the horizontal projection area of ​​the upper bar 1411 in each single matrix bar 141 is larger than the horizontal projection area of ​​the middle bar 1412; the horizontal projection area of ​​the middle bar 1412 is not less than the horizontal projection area of ​​the lower bar 1413; the horizontal projection area of ​​the upper bar 1411 refers to the area vertically projected from above onto the first filling layer 10; the larger area of ​​the upper bar 1411 can better block the light in the non-display area, reduce light leakage, and thus improve the display contrast.

[0085] The larger upper strip 1411 can provide a more stable structural support and reduce deformation caused by stress or process defects.

[0086] The horizontal projection area of ​​the middle body 1412 is not less than that of the lower body 1413; the middle body 1412 connects the upper body 1411 and the lower body 1413, playing a role of transition and support; the area of ​​the middle body 1412 is not less than that of the lower body 1413, which can ensure the bonding force with the lower body 1413 and reduce peeling.

[0087] By designing the areas of the upper strip 1411 , the middle strip 1412 , and the lower strip 1413 , the bonding force between the single matrix strip 141 and the substrate can be enhanced, and the peeling phenomenon can be reduced.

[0088] The larger area of ​​the upper strip 1411 can better block the light in the non-display area, reduce light leakage, and thus improve the display contrast.

[0089] Furthermore, the color filter layer 1-1 described in the present invention includes multiple monomer filter layers 1-11; each monomer filter layer 1-11 is provided with an embedding groove 1-12 near the edge of the black matrix layer 14; the color filter layer 1-1 is a key part for realizing color display in the micro display, and is usually composed of multiple monomer filter layers 1-11.

[0090] Each single filter layer 1-11 is responsible for filtering light of a specific wavelength, thereby achieving the display of colors such as red, green, and blue (RGB); this design can ensure high-resolution and high-definition color display.

[0091] Each monomer filter layer 1-11 is provided with an embedding groove 1-12 near the edge of the black matrix layer 14. This design has the following functions and advantages: the embedding groove 1-12 can ensure the precise alignment and fixation of the monomer filter layer 1-11 and the black matrix layer 14, reducing color crosstalk caused by position deviation.

[0092] The monomer filter layer 1-11 is divided into a first color filter layer, a second color filter layer and a third color filter layer according to different setting positions.

[0093] By embedding the groove 1-12, the combination between the monomer filter layer 1-11 and the black matrix layer 14 is tighter, thereby enhancing the stability of the overall structure.

[0094] The design of the embedded grooves 1-12 can reduce light leakage at the edge of the filter layer and further improve the display contrast.

[0095] Furthermore, in the present invention, the first filling layer 10 is provided with a sawtooth groove 101 for embedding the black matrix layer 14 ; the design of the sawtooth groove 101 can significantly increase the contact area and mechanical bonding force between the black matrix layer 14 and the first filling layer 10 .

[0096] This structure is similar to mechanical interlocking, and can effectively prevent the black matrix layer 14 from peeling off during subsequent processes or use.

[0097] The shape and structure of the sawtooth groove 101 can optimize the light propagation path and reduce the scattering and reflection of light at the edge of the black matrix, thereby improving display contrast and color purity.

[0098] The design of the sawtooth groove 101 increases the bonding force, thereby reducing the peeling phenomenon of the color filter layer 1 - 1 caused by stress or process defects during use.

[0099] The sawtooth grooves 101 can more effectively separate different pixel units, prevent light leakage between adjacent pixels, and thus reduce color crosstalk.

[0100] During the manufacturing process, the sawtooth groove 101 is usually formed by photolithography and etching processes.

[0101] The specific steps include: coating photoresist on the first filling layer 10, and forming a photoresist layer with a specific shape through exposure and development processes; transferring the shape of the photoresist to the filling layer by an etching process to form a sawtooth groove 101; filling the sawtooth groove 101 with black matrix material (such as BM glue), and forming a black matrix layer 14 through subsequent processes.

[0102] A micro display device, characterized in that it comprises a display module, on which the color filter is arranged; a lens layer and a cover plate are arranged in sequence on the color filter; the display module is the core part of the micro display device, and is usually composed of a pixel array, a driving circuit and a light-emitting element. For example, in an OLED micro display, the light-emitting element is directly integrated on a silicon substrate.

[0103] The color filter is located above the display module and is used to achieve color display.

[0104] It is usually composed of multiple single filter layers, each of which is responsible for filtering a specific wavelength of light (such as red, green, and blue), thereby achieving high-resolution and high-definition color display.

[0105] A lens layer, usually a microlens array, is disposed outside the color filter.

[0106] The microlens array consists of a plurality of neatly arranged microlenses, and the shape of each microlens can be circular, square, etc.

[0107] The function of the lens layer is to optimize the propagation path of light, improve light output efficiency and display quality.

[0108] The cover plate is located on the outside of the lens layer and plays a role of protection and packaging; it is usually made of highly transparent materials to ensure smooth transmission of light.

[0109] By optimizing the design of color filters and microlens arrays, microdisplay devices can achieve high-resolution and high-contrast display effects.

[0110] The integrated design of color filter and microlens array can reduce light interference between adjacent pixels and ensure color purity.

[0111] The combination of the lens layer and the cover plate can provide additional mechanical protection and ensure the long-term stability of the display device.

[0112] A molding process of the micro display device, the molding process comprising the following steps:

[0113] Step 1: Make the display module;

[0114] Step 2: Making a color filter on the display module;

[0115] Step 3: After step 2 is completed, a lens layer and a cover plate are made on the color filter;

[0116] Step 4: After step 3 is completed, a micro display device is formed. If a new micro display device is to be formed repeatedly, just repeat steps 1-3.

[0117] The present invention can realize the molding operation of the micro display device through the above molding process.

[0118] Step 1: Make the display module;

[0119] The display module is the core part of the microdisplay device and is responsible for generating image signals.

[0120] Step 2: Make color filter on the display module

[0121] Color filters are used to achieve color display by filtering specific wavelengths of light to present colors such as red, green, and blue.

[0122] Applying a leveling layer: Applying a first leveling layer 10 on the display module to provide a flat surface for subsequent processes.

[0123] Making the sawtooth groove 101: forming the sawtooth groove 101 on the fill layer by photolithography and etching process, for embedding the black matrix layer 14.

[0124] Applying BM glue: filling the sawtooth groove 101 with black matrix material (such as low-temperature BM glue) to form a black matrix layer 14 .

[0125] Filling the color filter glue: Filling the color filter glue into the gaps of the black matrix layer 14 to form the color filter layer 1 - 1 .

[0126] The shape and size of the sawtooth groove 101 are precisely controlled to enhance the bonding force and reduce the peeling of the color film.

[0127] The alignment accuracy between the color filter layer 1 - 1 and the black matrix layer 14 is ensured to prevent color crosstalk.

[0128] Step 3: Making a lens layer and a cover plate on the color filter;

[0129] The mirror layer is used to optimize the optical performance, and the cover plate is used to protect the entire display structure.

[0130] A photoresist or other transparent material is coated on the color filter.

[0131] The shape of the microlens array is formed by a photolithography process.

[0132] The formation of the microlens is completed by a curing or etching process.

[0133] A cover material with high transparency (such as glass or polymer) is coated on the lens layer; and the cover is manufactured by a curing or encapsulation process.

[0134] Step 4: Forming and Repeating

[0135] Complete the fabrication of a microdisplay device and provide repeatability for mass production.

[0136] When manufacturing the sawtooth groove 101 , a more precise undercut structure can be formed by enhancing the standing wave effect, thereby enhancing the bonding force.

[0137] Furthermore, the method for manufacturing the color filter on the display module in step 2 of the present invention includes the following steps:

[0138] S1: first coating a first filling layer 10 on the display module;

[0139] S2: Opening a sawtooth groove 101 on the first filling layer 10;

[0140] S3: Applying a BM glue layer in the sawtooth groove 101 and on the first filling layer 10 in S2;

[0141] S4: Processing the BM glue layer in S3 into a black matrix layer 14 by photolithography;

[0142] S5: pouring color film glue into the black matrix layer 14 to form a color filter layer 1-1;

[0143] S6: After S5 is completed, the color filter is produced on the display module.

[0144] Based on the above design, it is convenient to make color filters on the display module.

[0145] Firstly, a first filling layer 10 is coated on the display module;

[0146] The function of a filling layer is to provide a flat surface for subsequent processes and to enhance the mechanical stability and optical performance of the entire structure.

[0147] Select appropriate filling materials (such as photoresists, polymers, etc.) to ensure that they have good adhesion and optical properties.

[0148] The filling material is evenly coated on the display module by spin coating, spray coating or printing.

[0149] A sawtooth groove 101 is formed on the first filling layer 10;

[0150] The sawtooth groove 101 is used to embed the black matrix layer 14, so as to enhance the bonding force between the black matrix and the filling layer, prevent peeling, and optimize the optical performance.

[0151] Photoresist is coated on the fill layer, and a photoresist pattern of a specific shape is formed through a photolithography process (exposure and development).

[0152] The pattern of the photoresist is transferred to the filling layer by an etching process (such as dry etching or wet etching) to form the sawtooth groove 101 .

[0153] The shape and size of the sawtooth groove 101 need to be precisely controlled to ensure smooth progress of subsequent processes.

[0154] S3: Apply a BM glue layer in the zigzag groove 101 and on the first filling layer 10.

[0155] The BM glue layer is used to form a black matrix to separate the pixel units of the color filter and prevent color crosstalk.

[0156] Select appropriate BM glue material (such as low-temperature curing black photoresist) to ensure it has good adhesion and optical properties.

[0157] The BM glue is evenly coated on the sawtooth groove 101 and the filling layer by spin coating, spray coating or printing.

[0158] S4: Processing the BM glue layer into a black matrix layer 14 by photolithography;

[0159] The BM glue is processed into a black matrix layer 14 through a photolithography process to form a structure for separating pixel units.

[0160] Photoresist is coated on the BM layer, and a photoresist pattern of a specific shape is formed through exposure and development processes.

[0161] The pattern of the photoresist is transferred to the BM layer by an etching process to form a black matrix layer 14 .

[0162] The remaining photoresist is removed to complete the production of the black matrix layer 14 .

[0163] S5: pouring color film glue into the black matrix layer 14 to form a color filter layer 1-1;

[0164] The color film glue is used to form a color filter layer 1-1, and realizes color display by filtering light of a specific wavelength.

[0165] Select appropriate color film adhesive material (such as RGB three-color photoresist) to ensure that it has good optical properties and adhesion.

[0166] The color film glue is poured into the gaps of the black matrix layer 14 by spin coating, spray coating or printing.

[0167] A single filter layer is formed by a photolithography process (exposure and development).

[0168] Repeat the above steps to form red, green and blue filter layers respectively.

[0169] S6: After S5 is completed, the color filter is produced on the display module;

[0170] After the color filter layer 1-1 is manufactured, the entire display module has the function of color display.

[0171] Furthermore, in S2 described in the present invention, it is required to first coat photoresist on the first fill layer 10, and then form an undercut on the above photoresist through an exposure process; and then form a corresponding sawtooth groove 101 on the first fill layer 10 through an etching process; and coat the photoresist to evenly coat a layer of photoresist on the first fill layer 10.

[0172] Photoresist is a light-sensitive material that undergoes a chemical reaction that changes its solubility after exposure to light.

[0173] An undercut is formed on the photoresist through an exposure process.

[0174] The exposure process is to transfer the pattern on the mask to the photoresist through ultraviolet light.

[0175] During the exposure process, the photosensitive part of the photoresist will undergo a chemical reaction, causing its solubility in the developer to change.

[0176] In order to form an undercut, the exposure time and intensity need to be precisely controlled to avoid overexposure or underexposure.

[0177] Development process: The exposed photoresist is developed, and the unexposed part of the photoresist is dissolved by the developer, leaving a pattern with an undercut structure.

[0178] The pattern on the photoresist is transferred to the first fill-up layer 10 by an etching process to form a sawtooth groove 101 .

[0179] The etching process can be divided into dry etching and wet etching, among which dry etching (such as plasma etching) can achieve higher precision and better graphic fidelity.

[0180] After the etching is completed, the remaining photoresist is removed to expose the sawtooth groove 101 structure on the first fill layer 10 .

[0181] Through the above process, the sawtooth groove 101 can be accurately formed on the first fill-up layer 10, providing a good foundation for the subsequent production of the black matrix layer 14 and the color filter layer 1-1. Specific embodiment:

[0183] The present invention forms a black matrix layer 14 between each monomer filter layer 1-11; the black matrix layer 14 includes a matrix layer body 143; the matrix layer body 143 includes a plurality of monomer matrix strips 141; in the present invention, the monomer matrix strips 141 are sawtooth T-shaped B structures, a step structure is formed between the upper strip body 1411 and the middle strip body 1412, and then an undercut is formed, and the color film glue is poured into the sawtooth T-shaped BM by glue coating, and the color film glue forms a dense fit with the sawtooth T-shaped BM in this way, effectively avoiding the peeling of the color film caused by insufficient adhesion between the color film material and the filling layer OC, and the sawtooth T-shaped BM is embedded with the first filling layer 10 to prevent the BM layer from peeling, and at the same time, the film layer design can effectively avoid the problem of light crosstalk between different pixels.

[0184] When R, G, and B are coated separately in each matrix groove 142 of the present invention, R, G, and B color glues are poured into the inner side of the sawtooth T-shaped structure to form a dense fit with the sawtooth T-shaped structure, which can solve the problem of color film peeling caused by insufficient adhesion between the color film material and the filling layer OC. At the same time, using BM material to make the sawtooth T-shaped structure can solve the crosstalk problem caused by the light emission of different pixels.

[0185] In the present invention, the single matrix strip 141 is a sawtooth T-shaped structure, which solves the peeling problem of the color film and solves the crosstalk problem caused by the light emission of different pixels.

[0186] The specific implementation steps are as follows;

[0187] The display module is manufactured by conventional processes; Figure 1 Membrane structure;

[0188] By coating photoresist on the display module; Figure 2 Membrane structure;

[0189] During exposure, the standing wave effect is enhanced to form an undercut on the photoresist; Figure 3 Membrane structure;

[0190] After etching, the morphology of the photoresist is nested, and the first fill-in layer 10OC maintains the same morphology as the photoresist, such as Figure 4 Membrane structure;

[0191] A low-temperature BM glue is coated on the first filling layer 10, and the BM glue is poured into the sawtooth groove 101 of the filling layer to form a sawtooth BM, such as Figure 5 Membrane structure;

[0192] Through coating, exposure and development Figure 6 The membrane structure;

[0193] Obtained by etching Figure 7 The membrane structure;

[0194] By controlling the etching selectivity ratio of the first fill layer 10OC and BM, the following is obtained: Figure 8 The membrane structure;

[0195] The color film glue is poured into the black matrix layer 14 by coating, and then the color film glue is poured into the black matrix layer 14 by the traditional process. Fig. 9 The membrane structure.

[0196] Obviously, the specific implementation of the present invention is not limited to the above-mentioned methods. As long as various non-substantial improvements are made using the method concept and technical solution of the present invention, they are all within the protection scope of the present invention.

Claims

1. A color filter for a micro display, characterized in that: It comprises a color filter layer, a black matrix layer and a first filling layer; the color filter layer is embedded in the black matrix layer, and the black matrix layer is embedded in the first filling layer.

2. A color filter for a micro display according to claim 1, characterized in that: The black matrix layer comprises a matrix layer body; the matrix layer body is provided with matrix grooves; and the matrix grooves are stepped grooves.

3. A color filter for a micro display according to claim 2, characterized in that: The matrix layer includes a plurality of monomer matrix strips; adjacent monomer matrix strips are spaced and arranged in parallel or perpendicular to each other; each of the monomer matrix strips includes a lower strip body, a middle strip body and an upper strip body; the upper strip body is connected to the lower strip body through the middle strip body; and a protrusion is provided on the lower strip body.

4. A color filter for a micro display according to claim 3, characterized in that: The horizontal projection area of ​​the upper strip in each monomer matrix strip is larger than the horizontal projection area of ​​the middle strip; the horizontal projection area of ​​the middle strip is not smaller than the horizontal projection area of ​​the lower strip.

5. A color filter for a micro display according to any one of claims 1 to 4, characterized in that: The color filter layer comprises a plurality of single filter layers; each single filter layer is provided with an embedding groove near the edge of the black matrix layer.

6. A color filter for a micro display according to any one of claims 1 to 4, characterized in that: The first filling layer is provided with a sawtooth groove for embedding a black matrix layer.

7. A micro display device, characterized in that: It comprises a display module, on which is arranged a color filter as claimed in any one of claims 1 to 6; and on the color filter are arranged a lens layer and a cover plate in sequence.

8. A forming process of a micro display device as claimed in claim 7, characterized in that: The molding process comprises the following steps: Step 1: Make the display module; Step 2: Making a color filter on the display module; Step 3: After step 2 is completed, a lens layer and a cover plate are made on the color filter; Step 4: After step 3 is completed, a micro display device is formed. If a new micro display device is to be formed repeatedly, just repeat steps 1-3.

9. A forming process of a micro display device according to claim 8, characterized in that: The method for manufacturing the color filter on the display module in step 2 comprises the following steps: S1: first apply a first filling layer on the display module; S2: Opening a sawtooth groove on the first filling layer; S3: Apply BM glue layer in the zigzag groove in S2 and on the first filling layer; S4: Processing the BM glue layer in S3 into a black matrix layer through a photolithography process; S5: pouring color film glue into the black matrix layer to form a color filter layer; S6: After S5 is completed, the color filter is produced on the display module.

10. A forming process of a micro display device according to claim 9, characterized in that: In S2, it is required to first coat a photoresist on the first fill-up layer, then form an undercut on the photoresist through an exposure process; and then form a corresponding sawtooth groove on the first fill-up layer through an etching process.

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