Display device and manufacturing method thereof

Abstract

The invention relates to a display device and a manufacturing method thereof. The display device includes: a substrate including a light transmitting region and a light blocking region; a color filter layer including a color filter on the light transmissive region; a first pattern under the color filter layer and overlapping the light transmitting region; and a second pattern under the color filter layer and overlapping the light blocking region.

Description

[0001] Cross - reference to related applications

[0002] This application claims the priority and benefit of Korean Patent Application No. 10 - 2023 - 0169766, filed with the Korean Intellectual Property Office on November 29, 2023, the entire disclosure of which is incorporated herein by reference. Technical field

[0003] Aspects of embodiments of the present disclosure relate to a display device and a method of manufacturing a display device. Background art

[0004] With the development of information technology, the importance of display devices as a connection medium between users and information has been highlighted. Accordingly, the use of display devices such as liquid crystal display devices, organic light - emitting display devices, etc. has increased. Summary of the invention

[0005] Embodiments of the present disclosure provide a display device and a method of manufacturing a display device, which is easy to manufacture and can reduce manufacturing costs.

[0006] Aspects of the present disclosure are not limited to those described herein, and other aspects not mentioned herein will be clearly understood by those skilled in the art from the description of the present disclosure.

[0007] According to an embodiment of the present disclosure, a display device includes: a substrate including a light - transmissive region and a light - blocking region; a color filter layer including color filters on the substrate; a first pattern below the color filter layer and overlapping with the light - transmissive region; and a second pattern below the color filter layer and overlapping with the light - blocking region.

[0008] The first pattern and the second pattern may be at the same layer.

[0009] The first pattern and the second pattern may include the same material.

[0010] The first pattern and the second pattern may include a scatterer.

[0011] The display device may further include dams that define first openings surrounding the first pattern and respectively exposing portions of the first pattern.

[0012] The dams may further define second openings surrounding the second pattern and respectively exposing portions of the second pattern.

[0013] The display device may further include a spacer overlapping with one of the second patterns.

[0014] The spacer and the dams may include the same material.

[0015] The spacer and the bank may include at least one of a light-blocking material, a black material, and a reflective material.

[0016] The spacer and the bank may include a non-liquid-repellent material.

[0017] The display device may further include a low-refractive-index layer overlapping the color filter layer and a cover layer overlapping the low-refractive-index layer.

[0018] The display device may further include a display substrate having a light-emitting structure, wherein there is no light conversion layer between the color filter layer and the light-emitting structure.

[0019] According to an embodiment of the present disclosure, a method of manufacturing a display device includes: providing a substrate including a light-transmitting region and a light-blocking region; forming a color filter layer including color filters on the substrate; forming a first pattern overlapping the light-transmitting region on the color filter layer; and forming a second pattern overlapping the light-blocking region on the color filter layer.

[0020] The first pattern and the second pattern may be formed in one process.

[0021] The first pattern and the second pattern may be made of the same material.

[0022] The first pattern and the second pattern may include scatterers.

[0023] The method may further include forming a bank on the first pattern and the second pattern, and forming a spacer on one of the second patterns.

[0024] The bank and the spacer may be formed in one process.

[0025] The bank may define a first opening surrounding the first pattern and respectively exposing portions of the first pattern, and define a second opening surrounding the second pattern and respectively exposing portions of the second pattern.

[0026] The spacer and the bank may include the same material.

[0027] The spacer and the bank may include at least one of a light-blocking material, a black material, and a reflective material.

[0028] The spacer and the bank may include a non-liquid-repellent material.

[0029] The method may further include forming a low-refractive-index layer overlapping the color filter layer and forming a cover layer overlapping the low-refractive-index layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The above and other aspects of the present disclosure will become more apparent by describing embodiments of the present disclosure in more detail with reference to the accompanying drawings.

[0031] Figure 1Is a perspective view of a display device according to one or more embodiments.

[0032] Figure 2 Is a cross-sectional view taken along line I-I' of Figure 1 .

[0033] Figure 3 Is a schematic layout of a pixel arrangement of a display device according to one or more embodiments.

[0034] Figure 4 Is a cross-sectional view of a display device according to one or more embodiments.

[0035] Figure 5 Is a cross-sectional view of a display device according to one or more embodiments.

[0036] Figure 6 Is a flowchart of a method of manufacturing a display device according to one or more embodiments.

[0037] Figures 7 to 14 Is a cross-sectional view of a process operation of a method of manufacturing a display device according to one or more embodiments. Detailed Description of Specific Embodiments

[0038] Aspects of some embodiments of the present disclosure and methods of implementing the present disclosure can be more easily understood by referring to the detailed description of the embodiments and the accompanying drawings. The described embodiments are provided as examples so that the present disclosure will be thorough and complete, and will fully convey the aspects of the present disclosure to those skilled in the art. Accordingly, processes, elements, and techniques that are redundant, not relevant to the description of the embodiments, or unnecessary for those of ordinary skill in the art to fully understand the aspects of the present disclosure may be omitted. Unless otherwise indicated, throughout the drawings and the written description, the same reference numerals, characters, or combinations thereof represent the same elements, and thus, repeated descriptions thereof may be omitted.

[0039] The described embodiments may have various modifications and may be implemented in different forms, and should not be construed as limited to the embodiments illustrated herein. The use of "able to", "may", or "may not" when describing an embodiment corresponds to one or more embodiments of the present disclosure. The present disclosure encompasses all modifications, equivalents, and substitutions within the spirit and scope of the present disclosure. In addition, each feature of each embodiment of the present disclosure may be partially or wholly combined with each other, and various interlocks and drives are possible technically. Each embodiment may be implemented independently of each other, or may be implemented in association with each other.

[0040] In the accompanying drawings, for clarity and / or for the purposes of description, the relative dimensions of elements, layers, and regions may be exaggerated. In addition, the use of cross-hatching and / or shading in the drawings is generally used to clarify the boundaries between adjacent elements. Thus, unless otherwise specified, the presence or absence of cross-hatching or shading does not convey or indicate any preference or requirement for a particular material, material property, dimension, ratio, commonality between the elements shown, and / or any other characteristic, attribute, property, etc. of the elements.

[0041] Various embodiments are described herein with reference to cross-sectional views that are schematic illustrations of embodiments and / or intermediate structures. As such, variations from the shapes as illustrated, for example due to manufacturing techniques and / or tolerances, are to be expected. In addition, the specific structural or functional descriptions disclosed herein are for the purpose of describing embodiments in accordance with the concepts of the present disclosure only. Thus, the embodiments disclosed herein should not be construed as limited to the shapes of the elements, layers, or regions shown, but should include deviations in shape resulting from, for example, manufacturing.

[0042] For example, an implantation region shown as rectangular generally has rounded or curved features at its edges and / or has a gradient of implantation concentration, rather than a binary change from the implantation region to the non-implantation region. Similarly, a buried region formed by implantation can result in some implantation in the region between the buried region and the surface through which the implantation is performed.

[0043] For ease of description, spatially relative terms such as "beneath", "below", "lower", "underside", "under", "above", "upper", "upper side", etc. may be used herein to describe the relationship of one element or feature to another element(s) or feature(s) as illustrated in the figures. It should be understood that, in addition to the orientation depicted in the figures, spatially relative terms are intended to encompass different orientations of the device in use or in operation. For example, if the device in the figures is flipped, an element or feature described as "beneath", "below", or "under" another element or feature will then be oriented "above" the other element or feature. Thus, the exemplary terms "beneath" and "under" can include both an orientation above and below. The device may be otherwise oriented (e.g., rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein should be interpreted accordingly. Similarly, when a first part is described as being disposed "on" a second part, this means that the first part is disposed at the upper side or the lower side of the second part based on the direction of gravity, and is not limited to being disposed at the upper side of the second part based on the direction of gravity.

[0044] In addition, the phrase "in a plan view" means when the object part is viewed from above, and the phrase "in a schematic cross-sectional view" means when the schematic cross-section obtained by vertically cutting the object part is viewed from the side. The term "overlap" or "overlapped" means that the first object can be above or below the second object, or to one side of the second object, and vice versa. Additionally, the term "overlap" can include stacking, facing or facing, extending over, covering or partially covering, or any other suitable terms that those of ordinary skill in the art will appreciate and understand. The expression "not overlapping with" can include such as "spaced apart from", "disposed beside", "offset from", and any other suitable equivalent meanings that those of ordinary skill in the art will appreciate and understand. The terms "face" and "facing" can mean that the first object can be directly or indirectly opposite the second object. In the case where a third object is between the first object and the second object, although the first object and the second object still face each other, they can be understood as indirectly opposite each other.

[0045] It should be understood that when an element, layer, region or component is referred to as being formed on, on, connected to or (operatively or communicatively) coupled to another element, layer, region or component, it can be directly formed on, directly on, directly connected to or directly coupled to another element, layer, region or component, or indirectly formed on, indirectly on, indirectly connected to or indirectly coupled to another element, layer, region or component, such that there can be one or more intermediate elements, layers, regions or components. Additionally, this can collectively mean direct or indirect connection or coupling and integral or non-integral connection or coupling. For example, when a layer, region or component is referred to as being electrically connected or electrically coupled to another layer, region or component, it can be directly electrically connected or directly electrically coupled to another layer, region and / or component, or there can be one or more intermediate layers, regions or components. One or more intermediate components can include switches, resistors, capacitors, etc. When describing an embodiment, unless explicitly described as a direct connection, the expression of connection indicates an electrical connection, and "direct connection / direct coupling" or "directly on" means that one component is directly connected or directly coupled to another component or directly on another component without an intermediate component.

[0046] In addition, in this specification, when a part of a layer, film, region, plate, etc. is formed on another part, the forming direction is not limited to the upward direction, but includes forming the part on a side surface or in a downward direction. Conversely, when a part of a layer, film, region, plate, etc. is formed under another part, this includes not only the case where the part is directly under the other part, but also the case where there is another part between the part and the other part. At the same time, other expressions describing the relationship between components such as "between", "directly between", or "adjacent" and "directly adjacent" can be similarly interpreted. It should be understood that when an element or layer is said to be between two elements or layers, it can be the only element or layer between the two elements or layers, or there can also be one or more intermediate elements or layers.

[0047] For the purposes of this disclosure, when an expression such as "at least one of...", "any one of...", or "one or more of..." appears after a list of elements, it modifies the elements of the entire list and does not modify a single element in the list. For example, "at least one of X, Y, and Z", "at least one selected from the group consisting of X, Y, and Z", and "at least one selected from the group consisting of X, Y, or Z" can be interpreted as only X, only Y, only Z, any combination of two or more of X, Y, and Z (such as, for example, XYZ, XY, YZ, and Z), or any variation thereof. Similarly, the expression "at least one of A and B" can include A, B, or A and B. As used herein, "or" generally means "and / or", and the term "and / or" includes any and all combinations of one or more of the related listed items. For example, the expression "A and / or B" can include A, B, or A and B. Similarly, expressions such as "at least one of...", "a plurality of", "one of...", and other prepositional phrases, when before / after a list of elements, modify the elements of the entire list and do not modify a single element in the list.

[0048] It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and / or sections, these elements, components, regions, layers, and / or sections should not be limited by these terms. These terms do not correspond to a specific order, position, or preference, and are only used to distinguish one element, member, component, region, area, layer, section, or part from another element, member, component, region, area, layer, or section. Thus, without departing from the spirit and scope of the present disclosure, the first element, component, region, layer, or section described below may be referred to as the second element, component, region, layer, or section. The description of an element as a "first" element may not require or imply the existence of a second element or other elements. The terms "first", "second", etc. may also be used herein to distinguish different categories of elements or different sets of elements. For the sake of brevity, the terms "first", "second", etc. may respectively represent "first category (or first set)", "second category (or second set)", etc.

[0049] In the examples, the x-axis, y-axis, and / or z-axis are not limited to the three axes of a rectangular coordinate system and may be interpreted in a broader sense. For example, the x-axis, y-axis, and z-axis may be perpendicular to each other, or may represent different directions that are not perpendicular to each other. This also applies to the first direction, second direction, and / or third direction.

[0050] The terms used herein are for the purpose of describing embodiments only and are not intended to limit the present disclosure. Unless the context clearly indicates otherwise, as used herein, the singular forms "a" and "an" are intended to also include the plural forms, and the plural forms are also intended to include the singular forms. It will be further understood that the terms "comprises", "comprising", "have", "having", "includes", and "including", when used in this specification, specify the presence of the recited features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0051] When one or more embodiments can be implemented differently, a specific processing order may be performed differently from the described order. For example, two consecutively described processes may be performed substantially simultaneously, or in an order opposite to the described order.

[0052] As used herein, the terms "substantially", "about", "approximately" and similar terms are used as approximate terms and not as terms of degree, and are intended to allow for a margin of inherent deviation of measured or calculated values that would be recognized by a person of ordinary skill in the art. For example, "substantially" may include a range of + / - 5% of the corresponding value. As used herein, "about" or "approximately" includes the recited value and means within an acceptable deviation range of the particular value as determined by a person of ordinary skill in the art in view of the measurements being discussed and the errors associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, "about" may mean within one or more standard deviations, or within ±30%,

[0053] ±20%, ±10%, ±5% of the recited value. Additionally, when describing embodiments of the present disclosure, the use of "may" refers to "one or more embodiments of the present disclosure".

[0054] Unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as commonly understood by a person of ordinary skill in the art to which this disclosure pertains. It should also be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art and / or this specification, and should not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0055] Figure 1 is a perspective view of a display device according to one or more embodiments. Figure 2 is a cross-sectional view taken along line Figure 1 I-I' of.

[0056] Referring to Figure 1 and Figure 2 , the display device 1 may refer to any electronic device that provides a display screen. For example, the display device 1 may include a television, a laptop computer, a monitor, a billboard, a mobile phone, a smartphone, a tablet personal computer (PC), an electronic watch, a smart watch, a watch phone, a mobile communication terminal, an electronic notebook, an e-book, a portable multimedia player (PMP), a navigation device, a game console, a digital camera, an Internet of Things device that provides a display screen.

[0057] The first direction DR1 and the second direction DR2 may be directions perpendicular to each other in a plane. The third direction DR3 may be a direction perpendicular to the plane in which the first direction DR1 and the second direction DR2 lie. The third direction DR3 may be perpendicular to the first direction DR1 and the second direction DR2, respectively. In an embodiment, the third direction DR3 represents the thickness direction of the display device 1.

[0058] The display device 1 may have a rectangular shape in a plan view. For example, the display device 1 may have a rectangular planar shape having a long side in the first direction DR1 and a short side in the second direction DR2. The corners where the long side of the display device 1 in the first direction DR1 and the short side in the second direction DR2 meet may be formed as right angles or rounded to have a curvature (e.g., a predetermined curvature). The planar shape of the display device 1 is not limited to this example and may be applied as a circular shape or other shapes.

[0059] The display device 1 may include a display area DA for displaying an image and a non-display area NDA for not displaying an image. The display area DA may include pixels PX. The non-display area NDA may be around the display area DA and may surround the display area DA (e.g., in a plan view).

[0060] The display device 1 may include a display substrate 10 and a color filter substrate 30 facing the display substrate 10. The display device 1 may further include a filling layer 20 filled between the display substrate 10 and the color filter substrate 30 and a sealing member 40 connecting the display substrate 10 and the color filter substrate 30.

[0061] The display substrate 10 may emit light having a peak wavelength (e.g., a predetermined peak wavelength) from a light-emitting area of the display area DA. The display substrate 10 may include elements and circuits for displaying an image. For example, the display substrate 10 may include a pixel circuit such as a switching element, a pixel defining film PDL (see Figure 4 ) defining a light-emitting area and a non-light-emitting area of the display area DA, and a self-light-emitting element. The self-light-emitting element may include at least one of an organic light-emitting diode, a quantum dot light-emitting diode, an inorganic-based micro light-emitting diode (e.g., a micro LED), and an inorganic-based nano light-emitting element (e.g., a nano LED), but the embodiments are not limited thereto.

[0062] The color filter substrate 30 may be located on the upper part of the display substrate 10 and may face the display substrate 10. The color filter substrate 30 may maintain and transmit the peak wavelength of the light emitted from the display substrate 10, but the embodiments are not limited thereto. For example, the color filter substrate 30 may convert and transmit the peak wavelength of the light emitted from the display substrate 10.

[0063] The sealing member 40 may be located between the display substrate 10 and the color filter substrate 30 in the non-display area NDA. The sealing member 40 is positioned along the edges of the display substrate 10 and the color filter substrate 30 in the non-display area NDA and may surround the display area DA in a plan view. The display substrate 10 and the color filter substrate 30 may be joined to each other by the sealing member 40.

[0064] The filling layer 20 may be located in a space between the display substrate 10 and the color filter substrate 30, surrounded by the sealing member 40. The filling layer 20 may fill the space between the display substrate 10 and the color filter substrate 30. The filling layer 20 may be made of a material that can transmit light. The filling layer 20 may include an organic material. For example, the filling layer 20 may be made of a silicon-based organic material, an epoxy-based organic material, etc., but the embodiments are not limited thereto.

[0065] Figure 3 is a schematic layout of a pixel arrangement of a display device according to one or more embodiments.

[0066] Referring to Figure 1 and Figure 3 , the display area DA of the display device 1 includes pixels PX. Each of the pixels PX represents the smallest unit of repeated display. In order to display full color, each of the pixels PX may include a first sub-pixel PXS1, a second sub-pixel PXS2, and a third sub-pixel PXS3 that emit different corresponding colors. For example, each of the pixels PX may include a first sub-pixel PXS1 that emits light of a first color, a second sub-pixel PXS2 that emits light of a second color, and a third sub-pixel PXS3 that emits light of a third color. The first color may be blue, the second color may be green, and the third color may be red, but the embodiments are not limited thereto. The first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 may be set individually for each of the pixels PX, but the embodiments are not limited thereto.

[0067] Each of the pixels PX may include a light-transmitting region TA and a light-blocking region BA surrounding the light-transmitting region TA. The light-transmitting region TA may be a region where light emitted from the display substrate 10 is transmitted through the color filter substrate 30 and emitted to the outside of the display device 1. The light-blocking region BA may be a region where light emitted from the display substrate 10 is not transmitted.

[0068] Each of the light-transmitting regions TA may include a first light-transmitting region TA1, a second light-transmitting region TA2, and a third light-transmitting region TA3. The first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3 may be the light-transmitting regions of the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3, respectively. For example, the first light-transmitting region TA1 may be the light-transmitting region of the first sub-pixel PXS1, the second light-transmitting region TA2 may be the light-transmitting region of the second sub-pixel PXS2, and the third light-transmitting region TA3 may be the light-transmitting region of the third sub-pixel PXS3.

[0069] The first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3 can be positioned in each of the pixels PX in an S-Stripe type. For example, the second light-transmitting region TA2 and the third light-transmitting region TA3 can be located in odd-numbered rows and can be continuously and alternately located in the row direction. The first light-transmitting region TA1 can be located in even-numbered rows and can be continuously located in the row direction.

[0070] The shapes of the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 can have a similar shape relationship with respect to the shapes of the light-transmitting regions of the corresponding pixels, but the embodiments are not limited thereto. The shapes and arrangements of the first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3 are not limited to corresponding to Figure 3 one or more embodiments, and various modifications can be made.

[0071] The light-blocking region BA can surround the light-transmitting region TA. For example, the first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3 can be divided or defined by the light-blocking region BA. The light-blocking region BA of each of the pixels PX directly contacts the light-blocking region BA of an adjacent pixel PX. For example, the light-blocking regions BA of adjacent pixels PX can be connected into one. In addition, the light-blocking regions BA of all the pixels PX can be connected into one, but the embodiments are not limited thereto.

[0072] In one or more embodiments, the display device 1 can include at least one spacer CS. The spacer CS can be located in the light-blocking region BA. For example, the spacer CS can overlap with the light-blocking region BA and can not overlap with the light-transmitting region TA. The spacer CS can be located between one or more adjacent pixels PX among the pixels PX, but the embodiments are not limited thereto. For example, in one or more other embodiments, one spacer CS or multiple spacer CSs can be positioned for each of the pixels PX. That is, the number and arrangement of the spacer CSs can be changed according to the resolution, product specifications, etc. of the display device 1.

[0073] The spacer CS can be used to maintain the gap between the display substrate 10 and the color filter substrate 30.

[0074] The pixels PX can be alternately arranged in the matrix direction, but the embodiments are not limited thereto. The shapes and arrangements of the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 included in each of the pixels PX can be the same, but the embodiments are not limited thereto. The shape of each of the pixels PX can be substantially a square shape, but the embodiments are not limited thereto. For example, the shape of each of the pixels PX can be variously modified, such as a rhombus shape and a rectangular shape.

[0075] Figure 4 A cross-sectional view of a display device according to one or more embodiments.

[0076] Referring to Figure 4 , the display substrate 10 may include a first substrate 110, a pixel defining layer PDL, a light emitting element LD, and a package layer 120 covering the light emitting element LD on one surface of the first substrate 110. The color filter substrate 30 may include a second substrate 310 facing the first substrate 110, and a color filter layer CFL, a low reflection layer LRL, a cover layer CPL, a first pattern PT1, a second pattern PT2, a bank BNK, and a spacer CS on one surface (e.g., below) of the second substrate 310.

[0077] Hereinafter, the display substrate 10 will be described in more detail.

[0078] The first substrate 110 may be an insulating substrate. The first substrate 110 may include a transparent material. For example, the first substrate 110 may include a transparent insulating material such as glass, quartz, etc., but the embodiments are not limited thereto. The first substrate 110 may be a rigid substrate, but the embodiments are not limited thereto. For example, the first substrate 110 may include a plastic such as polyimide and may have a flexible property that can be bent, folded, or curled.

[0079] The anode electrode AE may be located on one surface of the first substrate 110. For example, the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3 may be arranged on one surface of the first substrate 110 to be separated from each other. A circuit layer for driving the first light emitting element LD1, the second light emitting element LD2, and the third light emitting element LD3 respectively may be located between the first substrate 110 and the first anode electrode AE1, the second anode electrode AE2, and the third anode electrode AE3. The circuit layer may include a thin film transistor, a capacitor, etc.

[0080] The anode electrode AE may have a structure in which a material layer having a high work function and a reflective material layer are stacked. The material layer having a high work function is such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and indium oxide (In2O3), and the reflective material layer is such as silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), palladium (Pd), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), or a mixture thereof. The material layer having a high work function may be located above the reflective material layer to be close to the first light emitting layer, the second light emitting layer, and the third light emitting layer. For example, the anode electrode AE may have a multilayer structure such as ITO / Mg, ITO / Ag, and ITO / Ag / ITO, but the embodiments are not limited thereto.

[0081] The pixel defining layer PDL may be located on one surface of the first substrate 110. The pixel defining layer PDL is located on the anode electrode AE and may include an opening exposing the anode electrode AE. The non-light emitting area NEA and the first light emitting area EMA1, the second light emitting area EMA2, and the third light emitting area EMA3 may be distinguished by the pixel defining layer PDL and the opening of the pixel defining layer PDL. The pixel defining layer PDL may separate and insulate the anode electrodes AE from each other.

[0082] The pixel defining layer PDL may include an organic insulating material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenylene ether resin, polyphenylene sulfide resin, or benzocyclobutene, but the embodiments are not limited thereto. For example, the pixel defining layer PDL may include an inorganic material.

[0083] The light emitting structure EMS may be located on the anode electrode AE exposed by the pixel defining layer PDL. The light emitting structure EMS may include a first light emitting structure EMS1, a second light emitting structure EMS2, and a third light emitting structure EMS3. For example, the first light emitting structure EMS1 may be located on the first anode electrode AE1, the second light emitting structure EMS2 may be located on the second anode electrode AE2, and the third light emitting structure EMS3 may be located on the third anode electrode AE3.

[0084] In one or more embodiments, the light emitting structure EMS may include a light emitting layer. For example, the light emitting structure EMS may include a first light emitting layer that emits light in a first color (e.g., blue) wavelength band, a second light emitting layer that emits light in a second color (e.g., green) wavelength band, and a third light emitting layer that emits light in a third color (e.g., red). However, the embodiments are not limited thereto, and the wavelength band of the light emitted by the light emitting layer and the number of light emitting layers may be changed. The light emitting layer may be configured by an organic light emitting layer including an organic material and / or an inorganic light emitting layer including an inorganic material. In some embodiments, the light emitting structure EMS may further include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer as auxiliary layers for assisting light emission.

[0085] In one or more embodiments, the light emitting structure EMS may have a cascade structure including light emitting layers overlapping each other in the thickness direction and charge generation layers located between the light emitting layers. The light emitting layers overlapping each other may emit light of different wavelengths, but the embodiments are not limited thereto. For example, the light emitting layers overlapping each other may emit light of the same wavelength.

[0086] In one or more embodiments, the color of the light emitted by each of the light-emitting structures EMS may be the same for each light-emitting element LD. For example, the first light-emitting structure EMS1 of the first light-emitting element LD1, the second light-emitting structure EMS2 of the second light-emitting element LD2, and the third light-emitting structure EMS3 of the third light-emitting element LD3 may emit light of a color (e.g., white) that is a mixture of a first color (e.g., blue), a second color (e.g., green), and a third color (e.g., red). That is, the light-emitting structures EMS may emit light of the same color. In this case, the light of the same color emitted from the light-emitting structures EMS may be separated into light of a desired color by a color filter layer CFL, which will be described later.

[0087] The cathode electrode CE may be located on the light-emitting structure EMS. For example, the cathode electrode CE may be located on the first light-emitting structure EMS1, the second light-emitting structure EMS3, and the third light-emitting structure EMS3. The cathode electrode CE may not only be in contact with the first light-emitting structure EMS1, the second light-emitting structure EMS3, and the third light-emitting structure EMS3, but may also be in contact with the upper surface of the pixel defining layer PDL. The cathode electrode CE may be connected to the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 without distinction (see Figure 3 ). For example, the cathode electrode CE may be a front electrode that is integrally and non-distinguishably positioned among the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3.

[0088] The cathode electrode CE may include a material layer having a small work function, such as Li, Ca, LiF, Al, Mg, Ag, Pt, Pd, Ni, Au, Nd, Ir, Cr, BaF 2 , Ba, or a compound or mixture thereof, or a material having a multi-layer structure such as LiF / Ca or LiF / Al, but the embodiments are not limited thereto. For example, the cathode electrode CE may further include a transparent metal oxide layer located on the material layer having a small work function.

[0089] The anode electrode AE, the light-emitting structure EMS, and the cathode electrode CE may configure the light-emitting element LD. For example, the first anode electrode AE1, the first light-emitting structure EMS1, and the cathode electrode CE may configure the first light-emitting element LD1, the second anode electrode AE2, the second light-emitting structure EMS2, and the cathode electrode CE may configure the second light-emitting element LD2, and the third anode electrode AE3, the third light-emitting structure EMS3, and the cathode electrode CE may configure the third light-emitting element LD3. The light emitted from the light-emitting element LD may be emitted in the display direction, e.g., through the cathode electrode CE in the third direction DR3.

[0090] The encapsulation layer 120 may be located on top of the cathode electrode CE. The encapsulation layer 120 may include at least one thin film. For example, the encapsulation layer 120 may include a first inorganic layer 121, an organic layer 122, and a second inorganic layer 123. Each of the first inorganic layer 121 and the second inorganic layer 123 may include silicon nitride, silicon oxide, silicon oxynitride, etc. The organic layer 122 may include an organic insulating material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenylene ether resin, polyphenylene sulfide resin, or benzocyclobutene.

[0091] Hereinafter, the color filter substrate 30 will be described in more detail.

[0092] The color filter substrate 30 may face the display substrate 10 on top of the encapsulation layer 120. When sequentially describing the cross-sectional structure of the color filter substrate 30 in the opposite direction of the third direction DR3, i.e., in the down / downward direction, the second substrate 310 of the color filter substrate 30 may include a transparent material. For example, the second substrate 310 may include a transparent insulating material such as glass, quartz, etc., but the embodiments are not limited thereto. The second substrate 310 may be a rigid substrate, but the embodiments are not limited thereto. For example, the second substrate 310 may include a plastic such as polyimide and may have a flexible property that can be bent, folded, or curled.

[0093] The second substrate 310 may be the same substrate as the first substrate 110, or may be a substrate different from the first substrate 110 in terms of material, thickness, transmittance, etc. For example, the second substrate 310 may have a transmittance higher than that of the first substrate 110. Since the second substrate 310 includes a light-transmitting material, the light emitted from the first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3 can be provided to the outside.

[0094] The color filter layer CFL may be located on one surface of the second substrate 310. For example, the color filter layer CFL may be positioned throughout the first light-transmitting region TA1, the second light-transmitting region TA2, the third light-transmitting region TA3, and the light-blocking region BA. The color filter layer CFL may block the light emitted from each light-emitting element LD that has a color different from the desired color.

[0095] The color filter layer CFL may include a first color filter CF1, a second color filter CF2, and a third color filter CF3. Each of the first color filter CF1, the second color filter CF2, and the third color filter CF3 may transmit light of a corresponding color and may block or absorb light of a color (colors) different from the corresponding color.

[0096] The first color filter CF1 can selectively transmit light of a first color (e.g., blue light), and can block or absorb light of a second color (e.g., green light) and a third color (e.g., red light) different from the light of the first color. Thus, light of the first color can be emitted from the first sub-pixel PXS1 (see Figure 3 ). The first color filter CF1 can include a blue colorant, such as a blue dye or a blue pigment. The first color filter CF1 can be located on one surface of the second substrate 310 in the first light-transmitting region TA1. The first color filter CF1 can also be partially located on one surface of the second substrate 310 in the light-blocking region BA.

[0097] The second color filter CF2 can selectively transmit light of a second color (e.g., green light), and can block or absorb light of a first color (e.g., blue light) and a third color (e.g., red light) different from the light of the second color. Thus, light of the second color can be emitted from the second sub-pixel PXS2 (see Figure 3 ). The second color filter CF2 can include a green colorant, such as a green dye or a green pigment. The second color filter CF2 can be located on one surface of the second substrate 310 in the second light-transmitting region TA2. The second color filter CF2 can be partially located on one surface of the second substrate 310 in the light-blocking region BA and on the first color filter CF1.

[0098] The third color filter CF3 can selectively transmit light of a third color (e.g., red light), and can block or absorb light of a first color (e.g., blue light) and a second color (e.g., green light) different from the light of the third color. Thus, light of the third color can be emitted from the third sub-pixel PXS3 (see Figure 3 ). The third color filter CF3 can include a red colorant such as a red dye or a red pigment. The third color filter CF3 can be located on one surface of the second substrate 310 in the third light-transmitting region TA3. The third color filter CF3 can be partially located on one surface of the second substrate 310 in the light-blocking region BA, and between the first color filter CF1 and the second color filter CF2.

[0099] The low refractive index layer LRL can be located on the color filter layer CFL. The refractive index of the low refractive index layer LRL can be less than the refractive indices of the first pattern PT1 and the second pattern PT2. The low refractive index layer LRL can include an organic film having a relatively low refractive index. The low refractive index layer LRL can also include or define hollow particles and / or voids dispersed in the organic film, and the refractive index of the low refractive index layer LRL can be adjusted by the ratio of the hollow particles and / or voids.

[0100] The capping layer CPL can be located on the low refractive index layer LRL. The capping layer CPL can reduce or prevent impurities such as moisture or air from infiltrating from the outside and damaging or contaminating the color filter layer CFL. In addition, the capping layer CPL can reduce or prevent the possibility of the colorant in the color filter layer CFL diffusing into other components. The capping layer CPL can include an inorganic material. For example, the capping layer CPL can include silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, silicon oxynitride, or a combination thereof.

[0101] The first pattern PT1 can be located on the capping layer CPL (e.g., under the capping layer CPL). For example, some of the first pattern PT1 can be on the capping layer CPL (e.g., under the capping layer CPL) located on the first color filter CF1 in the first light transmissive region TA1. For example, some of the first pattern PT1 can be on the capping layer CPL (e.g., under the capping layer CPL) located on the second color filter CF2 in the second light transmissive region TA2. For example, some of the first pattern PT1 can be on the capping layer CPL (e.g., under the capping layer CPL) located on the third color filter CF3 in the third light transmissive region TA3. Some of the first pattern PT1 can also be on the capping layer CPL (e.g., under the capping layer CPL) in the light blocking region BA. The first pattern PT1 can be spaced apart from each other on the capping layer CPL (e.g., under the capping layer CPL).

[0102] Each of the first pattern PT1 can include a first base resin BRS1 and a first scatterer SCP1 dispersed within the first base resin BRS1. In one or more embodiments, each of the first pattern PT1 can omit a wavelength conversion material (e.g., quantum dots). Since the first light emitting element LD1, the second light emitting element LD2, and the third light emitting element LD3 emit light of a color (e.g., white) mixed with a first color (e.g., blue), a second color (e.g., green), and a third color (e.g., red), rather than emitting light of a single color, various colors can be achieved without a wavelength conversion material.

[0103] The first base resin BRS1 can include a material having a relatively high light transmittance. The first base resin BRS1 can be made of a transparent organic material. For example, the first base resin BRS1 can include at least one organic material such as an epoxy resin, an acrylic resin, a Cardo resin, or an imide resin.

[0104] The first scatterer SCP1 may have a different refractive index from the first base resin BRS1 and may form an optical interface with the first base resin BRS1. The first scatterer SCP1 may include light-scattering particles that scatter at least a portion of the transmitted light. For example, the first scatterer SCP1 may include metal oxides such as titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ), aluminum oxide (Al 2 O 3 ), indium oxide (In 2 O 3 ), zinc oxide (ZnO), or tin oxide (SnO 2 ), or may include organic particles such as acrylic resin or polyurethane resin. Regardless of the incident direction of the incident light, the first scatterer SCP1 may scatter light in random directions with substantially no conversion of the peak wavelength of the incident light.

[0105] Some of the first pattern PT1 may overlap with the first color filter CF1 located in the first light-transmitting region TA1 in the third direction DR3. Some of the first pattern PT1 may maintain and transmit the wavelength of the light emitted from the display substrate 10 and incident on some of the first pattern PT1. For example, light of the first color (e.g., blue light) emitted from the first light-emitting region EMA1 may be transmitted through some of the first pattern PT1 and the first color filter CF1 to be emitted to the outside.

[0106] Some of the first pattern PT1 may overlap with the second color filter CF2 located in the second light-transmitting region TA2 in the third direction DR3. Some of the first pattern PT1 may maintain and transmit the wavelength of the light emitted from the display substrate 10 and incident on some of the first pattern PT1. For example, light of the second color (e.g., green light) emitted from the second light-emitting region EMA2 may be transmitted through some of the first pattern PT1 and the second color filter CF2 to be emitted to the outside.

[0107] Some of the first pattern PT1 may overlap with the third color filter CF3 located in the third light-transmitting region TA3 in the third direction DR3. Some of the first pattern PT1 may maintain and transmit the wavelength of the light emitted from the display substrate 10 and incident on some of the first pattern PT1. For example, light of the third color (e.g., red light) emitted from the third light-emitting region EMA3 may be transmitted through some of the first pattern PT1 and the third color filter CF3 to be emitted to the outside.

[0108] The second pattern PT2 may be located on the cover layer CPL (e.g., below the cover layer CPL). For example, the second pattern PT2 may be located on the cover layer CPL (e.g., below the cover layer CPL) in the light-blocking region BA. The second patterns PT2 may be spaced apart from each other on the cover layer CPL (e.g., below the cover layer CPL). The second pattern PT2 may be spaced apart from the first pattern PT1 on the cover layer CPL (e.g., below the cover layer CPL). The second pattern PT2 may be formed together with the first pattern PT1 in a single process. For example, the first pattern PT1 and the second pattern PT2 may be patterned in parallel or substantially simultaneously by exposure and development after applying a photosensitive material. The second pattern PT2 may be located on the same layer as the first pattern PT1.

[0109] Each of the second patterns PT2 may include a second base resin BRS2 and a second scatterer SCP2 dispersed within the second base resin BRS2. In one or more embodiments, each of the second patterns PT2 may omit a wavelength conversion material (e.g., quantum dots). The second base resin BRS2 may include substantially the same material as the first base resin BRS1. The second scatterer SCP2 may include substantially the same material as the first scatterer SCP1. The second scatterer SCP2 may perform the same function as the first scatterer SCP1, but may overlap with the non-light-emitting region NEA to have substantially no incident light.

[0110] The second pattern PT2 may provide a surface step to the light-blocking region BA, thereby facilitating the formation of the bank BNK and the spacer CS and the height adjustment of the spacer CS.

[0111] The bank BNK may be located on the cover layer CPL (e.g., below the cover layer CPL). For example, the bank BNK may be located on the cover layer CPL (e.g., below the cover layer CPL) in the light-blocking region BA. The bank BNK may surround the first pattern PT1 and the second pattern PT2. For example, the bank BNK adjacent to the first pattern PT1 may extend along the first pattern PT1 to be partially located on / under the first pattern PT1 in the first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3. The bank BNK adjacent to the second pattern PT2 may extend along the second pattern PT2 to be partially located on / under the second pattern PT2 in the light-blocking region BA.

[0112] The bank BNK may include a first opening OP1 that partially exposes the corresponding first pattern PT1. The light emitted from the light-emitting element LD may be incident on the first pattern PT1 through the first opening OP1. The bank BNK may include a second opening OP2 that partially exposes the corresponding second pattern PT2. At least one spacer CS may be located on the second pattern PT2 (e.g., below the second pattern PT2) exposed by the second opening OP2.

[0113] The bank BNK can reduce or prevent color mixing caused by the introduction of light between adjacent first sub-pixels PXS1, second sub-pixels PXS2, and third sub-pixels PXS3 (see Figure 3 ). The bank BNK can include a material capable of blocking light transmission or capable of reflecting light. For example, the bank BNK can include at least one of an organic / inorganic light-blocking material, a black material (such as a black pigment or a black dye), and a reflective material.

[0114] In one or more embodiments, the bank BNK can be made of a non-liquid-repellent material. When forming the first pattern PT1 and the second pattern PT2 by a photolithography process, the bank BNK is formed using a low-cost non-liquid-repellent material, thereby reducing the manufacturing cost. When forming the first pattern PT1 and the second pattern PT2 by an inkjet process, the manufacturing cost may increase because an expensive liquid-repellent material is used to form the bank BNK to stably eject the ink composition to a desired position.

[0115] The spacer CS can be located on the second pattern PT2 (e.g., below the second pattern PT2) in the blocking region BA. For example, the spacer CS can be located on the second pattern PT2 (e.g., below the second pattern PT2) exposed by the second opening OP2 of the bank BNK. Figure 4 The spacer CS shown is located on one of the two patterns PT2 (e.g., below one of the second patterns PT2), but the embodiment is not limited thereto. For example, according to the design, the spacer CS can be selectively positioned to overlap each of the second patterns PT2. The spacer CS can be located on the second pattern PT2 (e.g., below the second pattern PT2) to contact the encapsulation layer 120.

[0116] In one or more embodiments, the spacer CS can include substantially the same material as the bank BNK. For example, the spacer CS and the bank BNK can include a non-liquid-repellent material. The spacer CS can be formed together with the bank BNK in one process. For example, after applying a photosensitive material, the bank BNK and the spacer CS can be patterned in parallel or substantially simultaneously by exposure and development. Based on the surface of the second pattern PT2 exposed by the second opening OP2, the spacer CS can be patterned to be thicker than the bank BNK.

[0117] The spacer CS can maintain a gap with the structure located above it. For example, the spacer CS can maintain a cell gap (or distance) between the display substrate 10 and the color filter substrate 30. As a result, since the spacer CS can be located between the second substrate 310 of the color filter substrate 30 and the display substrate 10 to maintain the gap between the two members of the second substrate 310 of the color filter substrate 30 and the display substrate 10, it may not be necessary to separately design the viscosity and / or degree of curing of the filling layer 20 for maintaining the gap between the display substrate 10 and the color filter substrate 30. Therefore, the manufacturing process time can be shortened, and the design of the filling layer 20 can be promoted. In addition, since the distance between the display substrate 10 and the color filter substrate 30 can be kept constant, the thicknesses of various components can be kept constant compared to the case where the distance between the display substrate 10 and the color filter substrate 30 is adjusted according to the filling layer 20. Therefore, the occurrence of stains that may occur due to the uneven distance between the display substrate 10 and the color filter substrate 30 can be reduced.

[0118] As Figure 4 shown, the color filter substrate 30 can omit a light conversion layer (or wavelength conversion layer) that converts the wavelength of the light emitted from the light-emitting element LD. Therefore, there may be no light conversion layer (or wavelength conversion layer) between the color filter substrate 30 and the display substrate 10. For example, there may be no light conversion layer (or wavelength conversion layer) between the color filter layer CFL and the light-emitting structure EMS.

[0119] The filling layer 20 can be located between the display substrate 10 and the color filter substrate 30. For example, the filling layer 20 can be located between the encapsulation layer 120 of the display substrate 10 and the first pattern PT1, the second pattern PT2, and the bank BNK of the color filter substrate 30. The filling layer 20 may not be located in the area overlapping with the spacer CS, but may surround the spacer CS. However, the embodiment is not limited thereto. For example, a cover layer can be located on the first pattern PT1, the second pattern PT2, the bank BNK, and the spacer CS of the color filter substrate 30, and the filling layer 20 can be located between the cover layer and the encapsulation layer 120 of the display substrate 10. The filling layer 20 can be made of a silicon-based organic material, an epoxy-based organic material, etc., but the embodiment is not limited thereto.

[0120] Figure 5 is a cross-sectional view of a display device according to one or more embodiments. Regarding Figure 5 , the description of the content overlapping with Figure 4 is simplified or omitted.

[0121] Referring to Figure 5, the display substrate 10 may include a first substrate 110, a pixel defining layer PDL, a light emitting element LD, a packaging layer 120 covering the light emitting element LD, a first pattern PT1, a second pattern PT2, a bank BNK, and a spacer CS on one surface of the first substrate 110.

[0122] The color filter substrate 30 may include a second substrate 310 facing the first substrate 110, a color filter layer CFL, a low reflection layer LRL, and a cover layer CPL on one side of the second substrate 310. That is, different from Figure 4 , the first pattern PT1, the second pattern PT2, the bank BNK, and the spacer CS may be included in the display substrate 10.

[0123] The first pattern PT1 may be located on the packaging layer 120 (as used herein, "on" may mean "above"). For example, some of the first pattern PT1 may be located on the packaging layer 120 in the first light transmissive region TA1. For example, some of the first pattern PT1 may be second located on the packaging layer 120 in the light transmissive region TA2. For example, some of the first pattern PT1 may be located on the packaging layer 120 in the third light transmissive region TA3. Some of the first pattern PT1 may also be located on the packaging layer 120 in the light blocking region BA. The first pattern PT1 may be spaced apart from each other on the packaging layer 120.

[0124] The second pattern PT2 may be located on the packaging layer 120. For example, the second pattern PT2 may be located on the packaging layer 120 in the light blocking region BA. The second pattern PT2 may be spaced apart from each other on the packaging layer 120. The second pattern PT2 may be spaced apart from the first pattern PT1 on the packaging layer 120. The second pattern PT2 may be formed together with the first pattern PT1 in a single process. For example, the first pattern PT1 and the second pattern PT2 may be patterned in parallel or substantially simultaneously by exposure and development after applying a photosensitive material. The second pattern PT2 may be located on the same layer as the first pattern PT1.

[0125] The bank BNK may be located on the packaging layer 120. For example, the bank BNK may be located on the packaging layer 120 in the light blocking region BA. The bank BNK may surround the first pattern PT1 and the second pattern PT2. For example, the bank BNK adjacent to the first pattern PT1 may extend along the first pattern PT1 to partially cover the first pattern PT1 in the first light transmissive region TA1, the second light transmissive region TA2, and the third light transmissive region TA3. The bank BNK adjacent to the second pattern PT2 may extend along the second pattern PT2 to partially cover the second pattern PT2 in the light blocking region BA.

[0126] The spacer CS can be located on the second pattern PT2 in the light-blocking region BA. For example, the spacer CS can be located on the second pattern PT2 exposed by the second opening OP2 of the bank BNK. Figure 5 The spacer CS located on one of the second patterns PT2 is shown, but the embodiment is not limited thereto. For example, according to the design, the spacer CS can be selectively located in each of the second patterns PT2. The spacer CS can be located on the second pattern PT2 to contact the cover layer CPL.

[0127] The filling layer 20 can be located between the display substrate 10 and the color filter substrate 30. For example, the filling layer 20 can be located between the first pattern PT1, the second pattern PT2, and the bank BNK of the display substrate 10 and the cover layer CPL of the color filter substrate 30. The filling layer 20 can not be located in the region overlapping with the spacer CS, but can surround the spacer CS.

[0128] As Figure 5 shown, the color filter substrate 30 can omit the light conversion layer (or wavelength conversion layer) that converts the wavelength of the light emitted from the light-emitting element LD. Therefore, there can be no light conversion layer (or wavelength conversion layer) between the color filter substrate 30 and the display substrate 10. For example, there can be no light conversion layer (or wavelength conversion layer) between the color filter layer CFL and the light-emitting structure EMS.

[0129] Figure 6 is a flowchart of a method for manufacturing a display device according to one or more embodiments. Figures 7 to 14 is a cross-sectional view of a process operation of a method for manufacturing a display device according to one or more embodiments. Figure 6 The operations S100, S200, S300, and S400 and their corresponding Figures 7 to 13 can be Figure 4 the manufacturing method of the color filter substrate 30 shown.

[0130] Referring to Figure 4 and Figure 6 According to one or more embodiments, a method for manufacturing a display device 1 (see Figure 1 ) may include providing a second substrate 310 (operation S100), forming a color filter layer CFL on the second substrate 310 (operation S200), forming a first pattern PT1 and a second pattern PT2 on the color filter layer CFL (operation S300), forming a bank BNK on the first pattern PT1 and the second pattern PT2, forming a spacer CS on at least one of the second patterns PT2 (operation S400), and bonding the display substrate 10 and the color filter substrate 30 (operation S500). Hereinafter, the manufacturing method of the display device 1 will be described sequentially.

[0131] First, a second substrate 310 can be provided (operation S100).

[0132] Referring to Figure 7 , a second substrate 310 can be provided that includes a light-transmitting region TA (see Figure 3 ).) and a light-blocking region BA. The second substrate 310 can include a first light-transmitting region TA1, a second light-transmitting region TA2, and a third light-transmitting region TA3 that are spaced apart from each other, and a light-blocking region BA between the first light-transmitting region TA1, the second light-transmitting region TA2, and the third light-transmitting region TA3. The second substrate 310 can be a base member of the color filter substrate 30.

[0133] Next, a color filter layer CFL can be formed (operation S200).

[0134] Referring to Figure 8 , a first color filter CF1 can be formed on the second substrate 310. For example, a first color filter CF1 can be formed that overlaps the first light-transmitting region TA1 and the light-blocking region BA and does not overlap the second light-transmitting region TA2 and the third light-transmitting region TA3. After applying a first photosensitive material to the second substrate 310, the first photosensitive material can be exposed and developed through a first mask MK1 to pattern the first color filter CF1.

[0135] The first photosensitive material can have a first color (e.g., blue). The portion of the first photosensitive material that overlaps the first region MA1 of the first mask MK1 can be retained, and this portion of the first photosensitive material can be developed due to light diffraction, etc. The portion of the first photosensitive material that overlaps the second region MA2 of the first mask MK1 can be developed and removed. In Figure 8 , the first photosensitive material is shown as positive type, but the embodiment is not limited thereto. For example, the first photosensitive material can be negative type, and the shape of the first mask MK1 can be changed accordingly.

[0136] Referring to Figure 9 , a third color filter CF3 can be formed on the second substrate 310 and the first color filter CF1. For example, a third color filter CF3 can be formed that overlaps the third light-transmitting region TA3 and the light-blocking region BA and does not overlap the first light-transmitting region TA1 and the second light-transmitting region TA2. After applying a third photosensitive material to the second substrate 310 and the first color filter CF1, the third photosensitive material is exposed and developed through a second mask MK2 to pattern the third color filter CF3.

[0137] The third photosensitive material may have a third color (e.g., red). The portion of the third photosensitive material that overlaps with the first region MA1 of the second mask MK2 may be retained, and this portion of the third photosensitive material may be developed due to light diffraction or the like. The portion of the third photosensitive material that overlaps with the second region MA2 of the second mask MK2 may be developed and removed. The portion of the third photosensitive material that overlaps with the third region MA3 of the second mask MK2 may be partially developed and removed. The third region MA3 of the second mask MK2 may have an exposure amount smaller than that of the second region MA2 of the second mask MK2, so the portion of the third photosensitive material that overlaps with the third region MA3 may be retained. In Figure 9 , the third photosensitive material is shown as positive type, but the embodiment is not limited thereto. For example, the third photosensitive material may be negative type, and the shape of the second mask MK2 may be changed accordingly.

[0138] Referring to Figure 10 , the second color filter CF2 may be formed on the second substrate 310, the first color filter CF1, and the third color filter CF3. For example, the second color filter CF2 may be formed to overlap with the second light-transmitting region TA2 and the light-blocking region BA and not overlap with the first light-transmitting region TA1 and the third light-transmitting region TA3. After applying the second photosensitive material onto the second substrate 310, the first color filter CF1, and the third color filter CF3, the second photosensitive material is exposed and developed through the third mask MK3 to pattern the second color filter CF2.

[0139] The second photosensitive material may have a second color (e.g., green). The portion of the second photosensitive material that overlaps with the first region MA1 of the third mask MK3 may be retained, and this portion of the second photosensitive material may be developed due to light diffraction or the like. The portion of the second photosensitive material that overlaps with the second region MA2 of the third mask MK3 may be developed and removed. The portion of the second photosensitive material that overlaps with the third region MA3 of the third mask MK3 may be partially developed and removed. The third region MA3 of the third mask MK3 may have an exposure amount smaller than that of the second region MA2 of the third mask MK3, so the portion of the second photosensitive material that overlaps with the third region MA3 may be retained. In Figure 10 , the second photosensitive material is shown as positive type, but the embodiment is not limited thereto. For example, the second photosensitive material may be negative type, and the shape of the third mask MK3 may be changed accordingly.

[0140] Referring to Figure 11 , a low refractive index layer LRL may be formed on the color filter layer CFL, and a cover layer CPL may be formed on the low refractive index layer LRL, but the embodiment is not limited thereto. For example, the operations for forming the low refractive index layer LRL and the cover layer CPL may be omitted.

[0141] Next, a first pattern PT1 and a second pattern PT2 can be formed (operation S300).

[0142] Referring to Figure 12 , the first pattern PT1 and the second pattern PT2 spaced apart from each other can be formed on the cover layer CPL (e.g., above the cover layer CPL). For example, the first pattern PT1 overlapping with the first color filter CF1 can be formed in the first light-transmitting region TA1 on the cover layer CPL. The first pattern PT1 overlapping with the second color filter CF2 can be formed in the second light-transmitting region TA2 on the cover layer CPL. The first pattern PT1 overlapping with the third color filter CF3 can be formed in the third light-transmitting region TA3 on the cover layer CPL. The second pattern PT2 overlapping with the light-blocking region BA can be formed on the cover layer CPL. After applying the fourth photosensitive material to the cover layer CPL, the fourth photosensitive material can be exposed and developed through the fourth mask MK4 to pattern the first pattern PT1 and the second pattern PT2. That is, the first pattern PT1 and the second pattern PT2 can be patterned in parallel or substantially simultaneously using one mask.

[0143] The fourth photosensitive material includes a first base resin BRS1 and a first scatterer SCP1, and can have a fourth color (e.g., white). Optionally, the fourth photosensitive material includes a second base resin BRS2 and a second scatterer SCP2, and can have a fourth color (e.g., white). The second base resin BRS2 can be substantially the same as the first base resin BRS1, and the second scatterer SCP2 can be substantially the same as the first scatterer SCP1. The portion of the fourth photosensitive material overlapping with the first region MA1 of the fourth mask MK4 can be retained, and this portion of the fourth photosensitive material can be developed due to light diffraction or the like. The portion of the fourth photosensitive material overlapping with the second region MA2 of the fourth mask MK4 can be developed and removed. In Figure 12 , the fourth photosensitive material is shown as positive type, but the embodiment is not limited thereto. For example, the fourth photosensitive material can be negative type, and the shape of the fourth mask MK4 can be changed accordingly.

[0144] Next, a bank BNK and a spacer CS can be formed (operation S400).

[0145] Referring to Figure 13, a bank BNK surrounding the first pattern PT1 and the second pattern PT2 and a spacer CS on at least one of the second patterns PT2 can be formed. For example, a bank BNK extending along the first pattern PT1 to expose a part of each of the first patterns PT1 can be formed. A bank BNK extending along the second pattern PT2 to expose a part of each of the second patterns PT2 can be formed. A spacer CS can be formed on at least one exposed part of the second pattern PT2. After applying the fifth photosensitive material to the cover layer CPL, the first pattern PT1, and the second pattern PT2, the fifth photosensitive material can be exposed and developed through the fifth mask MK5 to pattern the bank BNK and the spacer CS. That is, the bank BNK and the spacer CS can be patterned using one mask in parallel or substantially simultaneously. Although one spacer CS is shown in Figure 13 , the embodiment is not limited thereto, and the number of spacers CS can be two or more.

[0146] The fifth photosensitive material includes a non-liquid-repellent material and can have a fifth color (e.g., black), but the embodiment is not limited thereto. For example, the fifth photosensitive material can have various colors such as red, green, blue, and white. The part of the fifth photosensitive material overlapping with the first region MA1 of the fifth mask MK5 can be retained, and the part of the fifth photosensitive material can be developed due to light diffraction or the like. Thus, a trapezoidal spacer CS can be formed. The part of the fifth photosensitive material overlapping with the second region MA2 of the fifth mask MK5 can be developed and removed. The part of the fifth photosensitive material overlapping with the third region MA3 of the fifth mask MK5 can be partially developed and removed. The third region MA3 of the fifth mask MK5 can have an exposure amount smaller than that of the second region MA2 of the fifth mask MK5, so a part of the fifth photosensitive material overlapping with the third region MA3 can be retained. Thus, a first opening OP1 exposing a part of the corresponding first pattern PT1 and a second opening OP2 exposing a part of the corresponding second pattern PT2 can be formed in the bank BNK. In Figure 13 , the fifth photosensitive material is shown as a positive type, but the embodiment is not limited thereto. For example, the fifth photosensitive material can be a negative type, and the shape of the fifth mask MK5 can be changed accordingly.

[0147] In this way, the color filter substrate 30 can be manufactured using the first mask MK1, the second mask MK2, the third mask MK3, the fourth mask MK4, and the fifth mask MK5 (i.e., five masks) (see Figure 4 ).

[0148] Next, the display substrate 10 and the color filter substrate 30 can be bonded together (operation S500).

[0149] Referring to Figure 14, the display substrate 10 manufactured by a separate process and the color filter substrate 30 manufactured through operations S100, S200, S300, and S400 can be joined together. For example, the spacers CS of the color filter substrate 30 can be located on the encapsulation layer 120 of the display substrate 10. An internal space SP is formed between the display substrate 10 and the color filter substrate 30 by the spacers CS. The display substrate 10 and the color filter substrate 30 can be joined together by forming a filling layer 20 (see Figure 4 ) by filling the internal space SP with a filler (such as an organic material).

[0150] As described above, since the first pattern PT1 and the second pattern PT2 are formed by a photolithographic process, the manufacturing process can be easily performed. In addition, instead of using an expensive liquid-repellent material to form the partition wall for the first pattern PT1, a bank BNK made of a low-cost non-liquid-repellent material is formed, and the bank BNK and the spacers CS are formed through one mask, which can reduce the manufacturing cost of the display device 1.

[0151] However, aspects of the present disclosure are not limited to those described above, and those of ordinary skill in the art will understand various other aspects within the spirit and scope of the present disclosure.

[0152] The embodiments described in detail above are provided to illustrate the present disclosure, but these embodiments are not intended to limit the scope of the present disclosure. Those skilled in the art should understand that various changes, substitutions, and replacements can be made to the present disclosure without departing from the scope of the present disclosure defined by the appended claims and their functional equivalents.

[0153] The scope of the present disclosure is not limited by the detailed description of this specification and should be defined by the appended claims and their equivalents. In addition, all changes or modifications derived from the claims and their equivalents should be construed as being included within the scope of the present disclosure. Embodiments can be combined to form additional embodiments.

Claims

1. A display device, comprising: a substrate including a light-transmitting region and a light-blocking region; a color filter layer including a color filter on the substrate; A first pattern, below the color filter layer and overlapping the light-transmitting area; as well as A second pattern is below the color filter layer and overlaps the light blocking area.

2. The display device according to claim 1, wherein: The first pattern and the second pattern are at the same layer.

3. The display device according to claim 1, wherein: The first pattern and the second pattern include the same material.

4. The display device according to claim 3, wherein: The first pattern and the second pattern include scatterers. 5 . The display device of claim 1 , further comprising dams defining first openings surrounding the first patterns and respectively exposing portions of the first patterns.

6. The display device according to claim 5, wherein: The dam also defines second openings surrounding the second patterns and respectively exposing portions of the second patterns. 7 . The display device of claim 5 , further comprising a spacer overlapping one of the second patterns.

8. The display device according to claim 7, wherein: The spacer and the bank include the same material.

9. The display device according to claim 8, wherein: The spacer and the bank include at least one of a light blocking material, a black material, and a reflective material.

10. The display device according to claim 8, wherein: The spacers and the banks include a non-liquid repellent material.

11. The display device according to claim 1, further comprising: a low refractive index layer overlapping the color filter layer; as well as A capping layer overlaps with the low refractive index layer.

12. The display device according to claim 1, further comprising a display substrate, wherein the display substrate comprises a light emitting structure. in, There is no light conversion layer between the color filter layer and the light emitting structure.

13. A method for manufacturing a display device, the method comprising: providing a substrate including a light-transmitting region and a light-blocking region; forming a color filter layer including a color filter on the substrate; forming a first pattern on the color filter layer that overlaps with the light-transmitting area; as well as A second pattern overlapping the light blocking area is formed on the color filter layer.

14. The method according to claim 13, wherein: The first pattern and the second pattern are formed in one process.

15. The method according to claim 13, wherein: The first pattern and the second pattern are made of the same material.

16. The method according to claim 15, wherein: The first pattern and the second pattern include scatterers.

17. The method according to claim 13, further comprising: forming a bank on the first pattern and the second pattern; as well as A spacer is formed on one of the second patterns.

18. The method according to claim 17, wherein: The bank and the spacer are formed in one process.

19. The method according to claim 17, wherein: The dam defines first openings surrounding the first patterns and respectively exposing portions of the first patterns, and defines second openings surrounding the second patterns and respectively exposing portions of the second patterns.

20. The method according to claim 17, wherein: The spacer and the bank include the same material.

21. The method according to claim 20, wherein: The spacer and the bank include at least one of a light blocking material, a black material, and a reflective material.

22. The method according to claim 20, wherein: The spacers and the banks include a non-liquid repellent material.

23. The method of claim 13, further comprising: forming a low refractive index layer overlapping the color filter layer; as well as A cap layer is formed to overlap the low refractive index layer.

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