Slurry delivery apparatus and chemical mechanical polishing apparatus
By designing flow guides and flow dividers in the chemical mechanical polishing equipment, the problems of low slurry diffusion efficiency and incomplete crystallization cleaning were solved, resulting in a more uniform slurry distribution and higher wafer yield.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SIEN (QINGDAO) INTEGRATED CIRCUITS CO LTD
- Filing Date
- 2025-05-06
- Publication Date
- 2026-07-21
AI Technical Summary
In existing technologies, the diffusion efficiency of polishing slurries is not high, and chemical mechanical polishing equipment cannot effectively clean the crystals that have splashed onto other parts after high-pressure water rinsing, which affects wafer yield.
Design a grinding fluid delivery device, including a flow guide and a flow divider. The flow guide has a baffle and an opening at the outlet, and the flow divider forms a flow channel between the baffle and the flow divider. The flow rate and distribution of the grinding fluid are controlled by the flow channel and the opening, and the cleaning fluid is used to clean the relevant parts by splashing under the flow divider.
It improves the diffusion efficiency of the polishing slurry on the polishing pad and effectively cleans the crystals of polishing slurry on the equipment, thereby improving wafer yield.
Smart Images
Figure CN120116149B_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of semiconductor manufacturing technology, and more specifically, relates to a slurry delivery device and a chemical mechanical polishing (CMP) device. Background Technology
[0002] CMP (Chemical-Mechanical Planarization), also known as Chemical-Mechanical Polishing, is a technique in semiconductor device manufacturing that uses chemical etching and mechanical force to planarize silicon wafers or substrate materials during processing, precisely controlling the required thickness and flatness of the pattern. During polishing, the polishing slurry flows out through the slurry delivery tube and falls near the center of the polishing pad. Then, under centrifugal force, the slurry is dispersed across the entire polishing pad. After the polishing step is completed, a polishing pad cleaner, in conjunction with high-pressure water, cleans and tidies up the polishing pad.
[0003] Furthermore, during the cleaning of the grinding pad after the grinding process, the high-pressure water will splash the grinding fluid from the grinding pad onto other parts of the grinding chamber, especially the high-pressure water side baffle, the grinding fluid delivery arm, and the upper side of the grinding head. This will cause the grinding fluid to crystallize in these areas. If the crystals fall onto the grinding pad, they will scratch the wafer and affect the wafer yield.
[0004] Currently, in existing technologies, the grinding slurry of mainstream chemical mechanical grinding (CMP) equipment has a single landing point, mainly relying on centrifugal force to disperse it across the entire grinding pad, resulting in low diffusion efficiency of the grinding slurry. Furthermore, existing CMP equipment cannot effectively clean the sides of the grinding slurry delivery arm and grinding head. Summary of the Invention
[0005] The purpose of this application is to provide a grinding fluid delivery device to solve the technical problem that the diffusion efficiency of grinding fluid in the prior art still needs to be improved.
[0006] To achieve the above objectives, a first aspect of this application is to provide a grinding slurry delivery device including a delivery pipe for delivering grinding slurry, and further comprising: A flow guide is connected to the liquid outlet of the conveying pipe and is spaced apart from the liquid outlet. The edge of the flow guide is provided with a baffle, which extends circumferentially along the flow guide and has an opening. A flow divider protrudes from the side of the flow guide facing the liquid outlet. The position of the flow divider corresponds to the position of the liquid outlet, and the flow divider is spaced apart from the baffle. A flow guide channel is formed between the flow divider and the baffle, and the flow guide channel communicates with the opening. A portion of the grinding fluid flows from the distributor to the opening, and a portion of the grinding fluid flows to the opening through the guide channel; A portion of the cleaning fluid flows from the diverter to the opening, and a portion of the cleaning fluid flows from the guide channel to the opening to clean the guide and the diverter. Additionally, a portion of the cleaning fluid cleans the delivery pipe under the splashing action of the diverter.
[0007] Optionally, the guide member is angled to the axis of the conveying pipe, and the guide member has a first end and a second end opposite to each other. Along the axis of the conveying pipe, the distance between the first end and the liquid outlet is smaller than the distance between the second end and the liquid outlet, and the opening is located at the second end.
[0008] Optionally, the diversion element includes: The first guide surface is set at an angle to the guide member; The second guide surface is located at the end of the first guide surface near the opening and is set at a first angle to the first guide surface; The third and fourth flow guiding surfaces are symmetrically arranged on both sides of the first flow guiding surface with respect to the direction from the first end to the second end, and both the third and fourth flow guiding surfaces are arranged at a second angle to the first flow guiding surface.
[0009] Optionally, the first angle and the second angle are equal.
[0010] Optionally, the retaining edge includes: The first baffle extends from one side of the guide member in the direction from the first end to the second end. The second baffle extends from the other side of the guide member in the direction from the first end to the second end; The first and second guard edges are spaced apart near the end walls of the second end to form the opening.
[0011] Optionally, the flow channel includes: The first flow channel is formed between the first baffle and the third guide surface; The second flow channel is formed between the second baffle and the fourth guide surface; The first flow channel and the second flow channel are symmetrically arranged along the direction from the first end to the second end.
[0012] Optionally, The first baffle has a first blocking part protruding from the part near the second end toward the side of the conveying pipe, and the second baffle has a second blocking part protruding from the part near the second end toward the side of the conveying pipe. Both the first blocking part and the second blocking part have an arc-shaped curved surface structure toward the side of the conveying pipe.
[0013] Optionally, Along the axial direction of the conveying pipe, the area of the conveying pipe is smaller than the area of the guide member.
[0014] Optionally, it also includes: A cover is fitted over the outside of the conveying pipe; The connector has one end connected to the cover and the other end opposite to the cover connected to the guide.
[0015] The beneficial effects of the grinding slurry delivery device provided in this application are as follows: Compared with the prior art, the grinding slurry delivery device provided in this application includes a delivery pipe for delivering grinding slurry and a flow guide provided at the outlet of the delivery pipe. The edge of the flow guide is provided with a baffle, and the baffle is provided with an opening. A flow divider is protruding on the side of the flow guide facing the outlet. A flow guide channel is formed between the flow divider and the baffle. The flow guide channel is connected to the opening. When the grinding slurry delivery pipe delivers grinding slurry to the grinding pad at a first flow rate, under the diversion of the flow divider, part of the grinding slurry flows directly from the flow divider to the opening, and then from the opening to the grinding pad. Another part of the grinding slurry flows into the flow guide channel and then from the flow guide channel to the opening, thereby realizing the diversion of the grinding slurry to control the flow rate of the grinding slurry, so that the flow rate of the grinding slurry is more stable. Subsequently, the grinding slurry flows from the opening to the grinding pad, so that the distribution of the grinding slurry on the grinding pad is more uniform, which facilitates the rapid and uniform diffusion of the grinding slurry on the grinding pad, thereby improving the diffusion efficiency of the grinding slurry.
[0016] Simultaneously, when the cleaning fluid is conveyed through the cleaning fluid delivery pipeline, under the diversion of the diverter, part of the cleaning fluid enters the opening through the diverter, and part of the cleaning fluid enters the guide channel through the diverter and then enters the opening to clean the guide channel and the diverter. Subsequently, the cleaning fluid flows out from the opening to clean the parts that need to be cleaned, such as the upper surface of the grinding pad, the lower surface of the grinding head, the circumferential side wall of the grinding head, and the surface of the high-pressure water side baffle, to clean the grinding fluid crystals that have formed in the above parts. At the same time, under the splashing of the diverter, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipeline, thereby cleaning the grinding fluid crystals on the end of the delivery pipeline near the outlet. Meanwhile, part of the cleaning fluid splashed by the diverter flows to the upper surface of the grinding head to clean the grinding fluid crystals on the upper surface of the grinding head.
[0017] Secondly, this application provides a chemical mechanical grinding apparatus, comprising: The grinding pad rotates around a preset axis; A grinding head, which rotates relative to the grinding pad, is used to press the target wafer onto the grinding pad to grind the target wafer; A grinding slurry delivery device is used to deliver grinding slurry and cleaning liquid to the grinding pad, wherein the grinding slurry delivery device is any one of the grinding slurry delivery devices described above.
[0018] The beneficial effects of the chemical mechanical polishing (CMP) equipment provided in this application are as follows: Compared with the prior art, the CMP equipment provided in this application includes the aforementioned polishing slurry conveying device. The polishing slurry conveying device includes a conveying pipe for conveying polishing slurry and a guide member disposed at the outlet of the conveying pipe. The edge of the guide member is provided with a baffle, and the baffle is provided with an opening. A diverter is protruding from the side of the guide member facing the outlet, and a guide channel is formed between the diverter and the baffle. The guide channel is connected to the opening. When the polishing slurry conveying pipe delivers a first flow rate... When the polishing fluid is delivered to the polishing pad, under the diversion of the flow divider, part of the polishing fluid flows directly from the flow divider to the opening, and then from the opening to the polishing pad. Another part of the polishing fluid flows into the guide channel and then from the guide channel to the opening. This achieves the diversion of the polishing fluid to control the flow rate of the polishing fluid, thereby making the flow rate of the polishing fluid more stable. Subsequently, the polishing fluid flows from the opening to the polishing pad, thereby making the distribution of the polishing fluid on the polishing pad more uniform. This facilitates the rapid and uniform diffusion of the polishing fluid on the polishing pad, thereby improving the diffusion efficiency of the polishing fluid.
[0019] Simultaneously, when the cleaning fluid is conveyed through the cleaning fluid delivery pipeline, under the diversion of the diverter, part of the cleaning fluid enters the opening through the diverter, and part of the cleaning fluid enters the guide channel through the diverter and then enters the opening to clean the guide channel and the diverter. Subsequently, the cleaning fluid flows out from the opening to clean the parts that need to be cleaned, such as the upper surface of the grinding pad, the lower surface of the grinding head, the circumferential side wall of the grinding head, and the surface of the high-pressure water side baffle, to clean the grinding fluid crystals that have formed in the above parts. At the same time, under the splashing of the diverter, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipeline, thereby cleaning the grinding fluid crystals on the end of the delivery pipeline near the outlet. Meanwhile, part of the cleaning fluid splashed by the diverter flows to the upper surface of the grinding head to clean the grinding fluid crystals on the upper surface of the grinding head. Attached Figure Description
[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 This is a schematic diagram of the structure of the chemical mechanical grinding apparatus provided in the embodiments of this application; Figure 2 This is a schematic diagram of the structure of the grinding fluid delivery device provided in the embodiments of this application; Figure 3 This is a schematic diagram of the grinding fluid delivery device provided in an embodiment of this application from another perspective; Figure 4 This is a schematic diagram of the structure of a grinding fluid delivery device provided in another embodiment of this application; Figure 5 This is a cross-sectional view of the grinding fluid delivery device provided in an embodiment of this application.
[0022] The following are the labeling elements in the figure: 10. Delivery pipe; 11. Grinding fluid delivery pipe; 12. Cleaning fluid delivery pipe; 20. Flow guide; 21. Opening; 22. Flow guide channel; 221. First flow channel; 222. Second flow channel; 30. Flow divider; 31. First flow guide surface; 32. Second flow guide surface; 33. Third flow guide surface; 34. Fourth flow guide surface; 40. Side guard; 41. First side guard; 411. First shielding part; 42. Second side guard; 421. Second shielding part; 50. Grinding pad; 60. Cover; 70. Connector; 80. Grinding head; 90. Grinding table. Detailed Implementation
[0023] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.
[0024] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.
[0025] It should be understood that the terms "length", "width", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0026] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.
[0027] Please refer to the following: Figures 1 to 5 The grinding slurry delivery device and chemical mechanical grinding equipment provided in the embodiments of this application will now be described.
[0028] The first aspect of this application is to provide a grinding fluid delivery device, including a delivery pipe 10, a guide member 20, and a diverter 30 for delivering grinding fluid.
[0029] Please see Figures 1 to 3 The guide member 20 is connected to the liquid outlet of the conveying pipe 10 and is spaced apart from the liquid outlet. The edge of the guide member 20 is provided with a baffle 40, which extends circumferentially along the guide member 20 and has an opening 21.
[0030] The diverter 30 protrudes from the guide 20 on the side facing the liquid outlet. The position of the diverter 30 corresponds to the position of the liquid outlet, and the diverter 30 and the baffle 40 are spaced apart. A guide channel 22 is formed between the diverter 30 and the baffle 40, and the guide channel 22 is connected to the opening 21.
[0031] Specifically, the conveying pipe 10 is provided with a grinding fluid conveying pipe 11 and a cleaning fluid conveying pipe 12. When the grinding fluid is conveyed to the grinding pad 50 by the grinding fluid conveying pipe 11, under the diversion of the diverting component 30, part of the grinding fluid flows directly from the diverting component 30 to the opening 21, and then from the opening 21 to the grinding pad 50. Another part of the grinding fluid flows into the guide channel 22 and then from the guide channel 22 to the opening 21, thereby realizing the diversion of the grinding fluid to control the flow rate of the grinding fluid. Subsequently, the grinding fluid flows from the opening 21 to the grinding pad 50, thereby making the distribution of the grinding fluid on the grinding pad 50 more uniform and improving the diffusion efficiency of the grinding fluid on the grinding pad 50.
[0032] When the cleaning fluid is delivered through the cleaning fluid delivery pipe 12, the cleaning fluid is diverted by the diverter 30. Part of the cleaning fluid enters the opening 21 through the diverter 30, and part of the cleaning fluid enters the guide channel 22 through the diverter 30 and then enters the opening 21 to clean the guide channel 20 and the diverter 30. Subsequently, the cleaning fluid flows out through the opening 21 to clean the parts that need to be cleaned, such as the upper surface of the grinding pad 50, the lower surface of the grinding head 80, the circumferential side wall of the grinding head 80, and the surface of the high-pressure water side baffle 40, so as to clean the grinding fluid crystals that are generated in the above parts. At the same time, under the splashing of the diverter 30, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipe 12, thereby cleaning the grinding fluid crystals near the outlet on the delivery pipe 10.
[0033] Meanwhile, in the cleaning fluid splashed by the diverter 30, a portion of the cleaning fluid is splashed onto the upper surface of the grinding head 80 to clean the grinding fluid crystals located on the upper surface of the grinding head 80.
[0034] In this application, the flow rate of the grinding slurry is 300 ml / min and the flow rate of the cleaning slurry is 1000 ml / min.
[0035] Compared with the prior art, the grinding slurry delivery device provided in this application has a guide member 20 at the outlet of the delivery pipe 10, a baffle 40 at the edge of the guide member 20, and an opening 21 on the baffle 40. A diverter 30 protrudes from the side of the guide member 20 facing the outlet, and a guide channel 22 is formed between the diverter 30 and the baffle 40. The guide channel 22 is connected to the opening 21. When the grinding slurry delivery pipe 11 delivers grinding slurry to the grinding pad 50 at a first flow rate, part of the grinding slurry is diverted by the diverter 30. The grinding fluid flows directly from the distributor 30 to the opening 21, and then from the opening 21 to the grinding pad 50. Another part of the grinding fluid flows into the guide channel 22 and then from the guide channel 22 to the opening 21, thereby guiding the grinding fluid to control the flow rate of the grinding fluid, making the flow rate of the grinding fluid more stable. Subsequently, the grinding fluid flows from the opening 21 to the grinding pad 50, making the distribution of the grinding fluid on the grinding pad 50 more uniform, which facilitates the rapid and uniform diffusion of the grinding fluid on the grinding pad 50, thereby improving the diffusion efficiency of the grinding fluid.
[0036] Meanwhile, when the cleaning fluid is conveyed through the cleaning fluid delivery pipe 12, under the diversion of the diverter 30, part of the cleaning fluid enters the opening 21 through the diverter 30, and part of the cleaning fluid enters the guide channel 22 through the diverter 30 and then enters the opening 21 to clean the guide channel 20 and the diverter 30. Subsequently, the cleaning fluid flows out from the opening 21 to clean the parts that need to be cleaned, such as the upper surface of the grinding pad 50, the lower surface of the grinding head 80, the circumferential side wall of the grinding head 80, and the surface of the high-pressure water side baffle 40, so as to clean the grinding fluid crystals generated in the above parts. At the same time, under the splashing of the diverter 30, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipe 12, thereby cleaning the grinding fluid crystals on the end of the delivery pipe 10 near the outlet. In the cleaning fluid splashed by the diverter 30, a portion of the cleaning fluid is splashed onto the upper surface of the grinding head 80 to clean the grinding fluid crystals located on the upper surface of the grinding head 80.
[0037] In one embodiment of this application, please refer to the figure. Figure 2 and Figure 3 The guide member 20 is circular in shape. In other embodiments of this application, the guide member 20 may also be other shapes, such as square, as long as it is necessary to guide the grinding fluid and cleaning fluid. For ease of explanation, this application will use a circular shape for the guide member 20 as an example.
[0038] In the application, the guide member 20 is set at an angle to the axis of the conveying pipe 10, and the guide member 20 has a first end and a second end opposite to each other. Along the axis of the conveying pipe 10, the distance between the first end and the liquid outlet is smaller than the distance between the second end and the liquid outlet, and the opening 21 is located at the second end.
[0039] For details, please refer to the figure. Figure 2 and Figure 3 The first end is the high end of the guide member 20, and the second end is the low end of the guide member 20. When the grinding fluid flows from the guide channel 22 on the diverter 30 to the opening 21, by setting the guide member 20 at an angle to the axis of the conveying pipe 10, the grinding fluid, under the action of gravity, flows from the guide channel 22 to the opening 21 located on the second end of the guide member 20, and from the opening 21 to the grinding pad 50, thereby allowing the guide member 20 to control the angle at which the grinding fluid flows to the grinding pad 50.
[0040] When a portion of the cleaning fluid flows from the guide channel 22 on the diverter 30 to the opening 21, the guide 20 is set at an angle to the axial direction of the delivery pipe 10 so that the guide 20 controls the angle at which the cleaning fluid flows toward the grinding pad 50.
[0041] In this application, the diversion component 30 includes a first diversion surface 31, a second diversion surface 32, a third diversion surface 33, and a fourth diversion surface 34.
[0042] For details, please refer to the figure. Figure 2 and Figure 3 The first guide surface 31 is angled to the guide member 20. The second guide surface 32 is located at the end of the first guide surface 31 near the opening 21 and is angled to the first guide surface 31. The third guide surface 33 and the fourth guide surface 34 are symmetrically arranged on both sides of the first guide surface 31 about the direction from the first end to the second end, and both the third guide surface 33 and the fourth guide surface 34 are angled to the first guide surface 31.
[0043] After the grinding fluid or cleaning fluid enters the distributor 30 through the outlet, part of the grinding fluid or cleaning fluid enters the opening 21 along the first guide surface 31 and the second guide surface 32, and part of the grinding fluid or cleaning fluid enters the guide channel 22 through the first guide surface 31, the third guide surface 33, or the fourth guide surface 34. At the same time, when the cleaning fluid flows towards the first guide surface 31, the first guide surface 31 is also used to splash the first cleaning fluid so that the cleaning fluid cleans the grinding fluid crystals on the conveying pipe 10 near the outlet.
[0044] In one embodiment of this application, the first angle and the second angle are equal and both are 90 degrees.
[0045] In some other embodiments of this application, the first angle and the second angle are equal and both are obtuse angles, such as 135 degrees, and the first angle and the second angle are other obtuse angles, which is necessary to enable the diversion of the grinding fluid or cleaning fluid.
[0046] In one embodiment of this application, the plane containing the first guide surface 31 is perpendicular to the axial direction of the conveying pipe 10.
[0047] In other embodiments of this application, please refer to Figure 4 The plane containing the first guide surface 31 is set at an angle to the axis of the conveying pipe 10, and the distance between the side of the first guide surface 31 near the second end and the liquid outlet is smaller than the distance between the side of the first guide surface 31 near the first end and the liquid outlet.
[0048] In this embodiment, when the cleaning fluid flows onto the first guide surface 31, the plane containing the first guide surface 31 is set at an angle to the axial direction of the conveying pipe 10 so that a portion of the cleaning fluid is splashed onto the side wall of the conveying pipe 10 near the outlet.
[0049] In this application, please refer to Figure 2 and Figure 3 The retaining edge 40 includes a first retaining edge 41 and a second retaining edge 42.
[0050] The first baffle 41 extends from one side of the guide member 20 in the direction from the first end to the second end. The second baffle 42 extends from the other side of the guide member 20 in the direction from the first end to the second end.
[0051] Furthermore, the first guard edge 41 and the second guard edge 42 are integrally formed at the ends of the first end, and the end walls of the first guard edge 41 and the second guard edge 42 near the second end are spaced apart to form an opening 21.
[0052] After the grinding fluid or cleaning fluid enters the guide channel 22 through the diverter 30, the first baffle 41 and the second baffle 42 cooperate with the diverter 30 to guide the grinding fluid and cleaning fluid in the guide channel 22.
[0053] In this application, the flow channel 22 includes a first flow channel 221 and a second flow channel 222.
[0054] The first flow channel 221 is formed between the first baffle 41 and the third guide surface 33, and the second flow channel 222 is formed between the second baffle 42 and the fourth guide surface 34. The first flow channel 221 and the second flow channel 222 are symmetrically arranged along the direction from the first end to the second end.
[0055] Under the action of the diverter 30, some of the grinding fluid or cleaning fluid enters the first flow channel 221 through the first guide surface 31 and the third guide surface 33, and then flows from the first flow channel 221 to the opening 21. Additionally, some of the grinding fluid or cleaning fluid enters the second flow channel 222 through the first guide surface 31 and the fourth guide surface 34, and then flows from the second flow channel 222 to the opening 21.
[0056] By symmetrically arranging the first flow channel 221 and the second flow channel 222, the flow rates of the grinding fluid entering the first flow channel 221 and the second flow channel 222 are the same, thereby making the flow rates of the grinding fluid flowing towards the opening 21 in the first flow channel 221 and the second flow channel 222 the same, so as to control the flow rate of the grinding fluid towards the grinding pad 50 and ensure that the grinding fluid flows evenly towards the grinding pad 50.
[0057] In this application, a first blocking portion 411 protrudes from the side of the first retaining edge 41 near its second end toward the conveying pipe 10, and a second blocking portion 421 protrudes from the side of the second retaining edge 42 near its second end toward the conveying pipe 10. Both the first blocking portion 411 and the second blocking portion 421 have arc-shaped curved surface structures on the side toward the conveying pipe 10. The sidewall of the first blocking portion 411 near the opening 21 coincides with the sidewall of the first retaining edge 41 near the opening 21, and the sidewall of the second blocking portion 421 near the opening 21 coincides with the sidewall of the second retaining edge 42 near the opening 21.
[0058] Since the guide member 20 is set at an angle to the axis of the conveying pipe 10, when the axis of the conveying pipe 10 coincides with the vertical direction, the opening 21 on the second end of the guide member 20 is located at the lowest end. When the grinding fluid flows from the first flow channel 221 and the second flow channel 222 to the opening 21, in order to prevent the grinding fluid from overflowing from the guide member 20 at the end of the first baffle 41 and the second baffle 42 near the opening 21, a first blocking part 411 is provided on the side of the first baffle 41 near the second end facing the conveying pipe 10, and a second blocking part 421 is provided on the side of the second baffle 42 near the second end facing the conveying pipe 10, so as to improve the blocking ability of the first baffle 41 and the second baffle 42 near the second end for the grinding fluid.
[0059] In one embodiment of this application, please refer to the figure. Figure 2 and Figure 5 Along the axial direction of the conveying pipe 10, the area of the conveying pipe 10 is smaller than the area of the guide member 20, that is, the diameter of the guide member 20 is larger than the diameter of the conveying pipe 10.
[0060] By setting the area of the guide member 20 to be larger than the area of the conveying pipe 10, when the cleaning fluid flows onto the diverter 30 on the guide member 20, the cleaning fluid splashed by the diverter 30 flows towards the end of the conveying pipe 10 near the outlet under the guidance of the baffle 40.
[0061] In one embodiment of this application, the grinding fluid delivery device further includes a cover 60 and a connector 70.
[0062] Specifically, the cover 60 is fitted onto the outside of the conveying pipe 10 and spaced apart from the liquid outlet. The diameter of the cover 60 is larger than the diameter of the conveying pipe 10 and larger than the diameter of the guide member 20. One end of the connector 70 is connected to the cover 60, and the other end opposite to it is connected to the guide member 20.
[0063] There are two connectors 70. One of the connectors 70 is connected at one end to the first baffle 41 and at the other end to the cover 60. The other connector 70 is connected at one end to the second baffle 42 and at the other end to the cover 60, thereby connecting the guide 20 to the cover 60.
[0064] When the cleaning fluid is conveyed through the cleaning fluid delivery pipe 12, under the splashing of the diverter 30, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipe 12. Under the guidance of the baffle 40, the cleaning fluid flows to the end of the delivery pipe 10 near the outlet and to the cover 60, thereby cleaning the grinding fluid crystals on the end of the delivery pipe 10 near the outlet and the cover 60.
[0065] Secondly, this application provides a chemical mechanical grinding apparatus, including a grinding pad 50, a grinding head 80, and a grinding fluid delivery device.
[0066] Please see Figure 1 The polishing pad 50 rotates around a preset axis under the drive of the polishing table 90. The polishing head 80 rotates relative to the polishing pad 50 to press the target wafer onto the polishing pad 50 for polishing the target wafer. The polishing slurry delivery device is used to deliver polishing slurry and cleaning liquid to the polishing pad 50, and the polishing slurry delivery device is any of the polishing slurry delivery devices mentioned above.
[0067] Compared with the prior art, the chemical mechanical polishing equipment provided in this application includes the above-mentioned polishing slurry conveying device. In the polishing slurry conveying device, a guide member 20 is provided on the outlet of the conveying pipe 10, and a baffle 40 is provided on the edge of the guide member 20. An opening 21 is provided on the baffle 40. A diverter 30 protrudes from the side of the guide member 20 facing the outlet. A guide channel 22 is formed between the diverter 30 and the baffle 40. The guide channel 22 is connected to the opening 21. When the polishing slurry conveying pipe 11 conveys polishing slurry to the polishing pad 50 at a first flow rate, the diverter... With the flow divided at 30, part of the grinding fluid flows directly from the diverter 30 to the opening 21, and then from the opening 21 to the grinding pad 50. Another part of the grinding fluid flows into the guide channel 22 and then from the guide channel 22 to the opening 21, thereby guiding the flow of the grinding fluid to control the flow rate of the grinding fluid, making the flow rate of the grinding fluid more stable. Subsequently, the grinding fluid flows from the opening 21 to the grinding pad 50, making the distribution of the grinding fluid on the grinding pad 50 more uniform, facilitating the rapid and uniform diffusion of the grinding fluid on the grinding pad 50, thereby improving the diffusion efficiency of the grinding fluid.
[0068] Meanwhile, when the cleaning fluid is conveyed through the cleaning fluid delivery pipe 12, under the diversion of the diverter 30, part of the cleaning fluid enters the opening 21 through the diverter 30, and part of the cleaning fluid enters the guide channel 22 through the diverter 30 and then enters the opening 21 to clean the guide channel 20 and the diverter 30. Subsequently, the cleaning fluid flows out from the opening 21 to clean the parts that need to be cleaned, such as the upper surface of the grinding pad 50, the lower surface of the grinding head 80, the circumferential side wall of the grinding head 80, and the surface of the high-pressure water side baffle 40, so as to clean the grinding fluid crystals generated in the above parts. At the same time, under the splashing of the diverter 30, part of the cleaning fluid flows in the opposite direction to the cleaning fluid flowing out of the cleaning fluid delivery pipe 12, thereby cleaning the grinding fluid crystals on the end of the delivery pipe 10 near the outlet. In the cleaning fluid splashed by the diverter 30, a portion of the cleaning fluid is splashed onto the upper surface of the grinding head 80 to clean the grinding fluid crystals located on the upper surface of the grinding head 80.
[0069] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. A grinding slurry conveying device, comprising a conveying pipe for conveying grinding slurry and cleaning fluid, characterized in that, Also includes: A flow guide is connected to the outlet of the conveying pipe and spaced apart from the outlet. The edge of the flow guide is provided with a baffle that extends circumferentially along the flow guide and has an opening. The flow guide is angled to the axis of the conveying pipe and has a first end and a second end opposite to each other. Along the axis of the conveying pipe, the distance between the first end and the outlet is smaller than the distance between the second end and the outlet, and the opening is located at the second end. A diverter is provided on the side of the guide member facing the liquid outlet. The position of the diverter corresponds to the position of the liquid outlet, and the diverter is spaced apart from the baffle. A guide channel is formed between the diverter and the baffle, and the guide channel is connected to the opening. A portion of the grinding fluid flows from the distributor to the opening, and a portion of the grinding fluid flows to the opening through the guide channel; A portion of the cleaning fluid flows from the diverter to the opening, and a portion of the cleaning fluid flows from the guide channel to the opening to clean the guide and the diverter. Additionally, a portion of the cleaning fluid is used to clean the delivery pipe under the splashing action of the diverter.
2. The grinding fluid delivery device as described in claim 1, characterized in that, The diversion component includes: The first guide surface is set at an angle to the guide member; The second guide surface is located at the end of the first guide surface near the opening and is set at a first angle to the first guide surface; The third and fourth flow guiding surfaces are symmetrically arranged on both sides of the first flow guiding surface with respect to the direction from the first end to the second end, and both the third and fourth flow guiding surfaces are arranged at a second angle to the first flow guiding surface.
3. The grinding fluid delivery device as described in claim 2, characterized in that, The first angle and the second angle are equal.
4. The grinding fluid delivery device as described in claim 3, characterized in that, The retaining edge includes: The first baffle extends from one side of the guide member in the direction from the first end to the second end. The second baffle extends from the other side of the guide member in the direction from the first end to the second end; The first and second guard edges are spaced apart near the end walls of the second end to form the opening.
5. The grinding fluid delivery device as described in claim 4, characterized in that, The flow guiding channel includes: The first flow channel is formed between the first baffle and the third guide surface; The second flow channel is formed between the second baffle and the fourth guide surface; The first flow channel and the second flow channel are symmetrically arranged along the direction from the first end to the second end.
6. The grinding fluid delivery device as described in claim 5, characterized in that, The first baffle has a first blocking part protruding from the part near the second end toward the side of the conveying pipe, and the second baffle has a second blocking part protruding from the part near the second end toward the side of the conveying pipe. Both the first blocking part and the second blocking part have an arc-shaped curved surface structure toward the side of the conveying pipe.
7. The grinding fluid delivery device as described in claim 1 or 6, characterized in that, Along the axial direction of the conveying pipe, the cross-sectional area of the conveying pipe is smaller than the area of the guide member.
8. The grinding fluid delivery device as described in claim 1, characterized in that, Also includes: A cover is fitted over the outside of the conveying pipe; The connector has one end connected to the cover and the other end opposite to the cover connected to the guide.
9. A chemical mechanical grinding apparatus, characterized in that, include: The grinding pad rotates around a preset axis; A grinding head, which rotates relative to the grinding pad, is used to press the target wafer onto the grinding pad to grind the target wafer; A grinding slurry delivery device is used to deliver grinding slurry and cleaning liquid to the grinding pad, wherein the grinding slurry delivery device is the grinding slurry delivery device according to any one of claims 1-8.