Preparation method of anti-fatigue DLC film

Abstract

The invention discloses a preparation method of an anti-fatigue DLC (diamond-like carbon) film. The preparation method comprises the following steps: polishing the surface of a base material by using a positive electrode electron beam; a DLC film is formed on the surface of the base material through deposition, and the flow and the deposition rate of reaction gas are adjusted in the deposition process of the DLC film; after deposition of the DLC film is finished, annealing treatment is performed. According to the technical scheme, the anti-fatigue performance of the DLC film can be improved.

Description

Technical Field

[0001] The present invention relates to the technical field of thin film preparation, and particularly to a method for preparing a DLC film with anti-fatigue properties. Background Art

[0002] DLC (Diamond-like Carbon) film is a thin film with high hardness, high wear resistance and chemical inertness, and has wide applications in the fields of automobiles, machinery, aerospace, etc. However, stress accumulation is likely to occur during the preparation process of DLC films, and problems such as cracking or peeling are likely to occur during use. Therefore, it is necessary to seek more effective methods to improve the anti-fatigue performance of DLC films. Summary of the Invention

[0003] An object of an embodiment of the present invention is to provide a method for preparing a DLC film with anti-fatigue properties, which can improve the anti-fatigue performance of the DLC film.

[0004] To achieve the above object, an embodiment of the present invention provides a method for preparing a DLC film with anti-fatigue properties, including:

[0005] Using a positive electron beam to polish the surface of a substrate;

[0006] Depositing a DLC film on the surface of the substrate, and adjusting the flow rate of the reaction gas and the deposition rate during the deposition of the DLC film;

[0007] After the deposition of the DLC film is completed, an annealing treatment is performed.

[0008] Further, the substrate is a titanium alloy.

[0009] Further, the depositing a DLC film on the surface of the substrate specifically includes:

[0010] Placing the substrate in a reaction chamber, introducing a reaction gas into the reaction chamber, and maintaining the air pressure in the reaction chamber at 0.5 Pa, and depositing a DLC film on the surface of the substrate; wherein, the reaction gas is methane and nitrogen.

[0011] Further, the initial flow rate of the methane is 50 sccm, and the initial flow rate of the nitrogen is 100 sccm.

[0012] Further, the initial deposition rate of the DLC film is 5 nm / min.

[0013] Compared with the prior art, the embodiment of the present invention provides a method for preparing a DLC film with anti-fatigue properties. First, the surface of the substrate is polished using a positive electron beam; then, a DLC film is deposited on the surface of the substrate, and the flow rate of the reaction gas and the deposition rate are adjusted during the deposition of the DLC film; finally, after the deposition of the DLC film is completed, annealing treatment is performed. The DLC film prepared by the embodiment of the present invention has both the advantages of high hardness, high wear resistance and chemical inertness, and good ductility and anti-fatigue properties, and can meet a wide range of application requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 FIG. is a flowchart of a preferred embodiment of a method for preparing a DLC film with anti-fatigue properties provided by the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0015] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art in the technical field of the present invention without creative efforts based on the embodiments of the present invention belong to the scope of protection of the present invention.

[0016] The embodiment of the present invention provides a method for preparing a DLC film with anti-fatigue properties. Refer to Figure 1 As shown in FIG., which is a flowchart of a preferred embodiment of a method for preparing a DLC film with anti-fatigue properties provided by the present invention, the method includes steps S11 to S13:

[0017] Step S11: The surface of the substrate is polished using a positive electron beam;

[0018] Step S12: A DLC film is deposited on the surface of the substrate, and the flow rate of the reaction gas and the deposition rate are adjusted during the deposition of the DLC film;

[0019] Step S13: After the deposition of the DLC film is completed, annealing treatment is performed.

[0020] In specific implementation, first, in the pre-treatment stage of preparing the DLC film, the surface of the substrate is polished using a positive electron beam to remove the original oxides and contaminants on the surface of the substrate; then, a DLC film is deposited on the surface of the substrate, and during the deposition of the DLC film, the flow rate of the reaction gas and the deposition rate are appropriately adjusted to cause local melting and flow phenomena in the growth of the DLC film to increase the strain release inside the DLC film; finally, after the deposition of the DLC film is completed, annealing treatment is performed to further release the residual stress inside the DLC film, thereby improving the anti-fatigue performance of the DLC film.

[0021] It should be noted that in the embodiments of the present invention, by adopting the positive electrode electron beam polishing treatment, the contamination and oxide layer on the surface of the substrate can be effectively removed, thereby improving the bonding strength between the DLC film and the substrate; by adjusting the flow rate of the reaction gas and the deposition rate during the preparation of the DLC film, a dynamic crystallization phenomenon can occur inside the DLC film, alleviating stress accumulation, thereby improving the ductility of the DLC film; by annealing treatment, the residual stress inside the DLC film can be further released, maximizing the ductility of the DLC film, and thus obtaining a DLC film with good anti-fatigue performance.

[0022] In one optional embodiment, the substrate is a titanium alloy.

[0023] Specifically, in combination with the above embodiments, the substrate used in the embodiments of the present invention is usually a titanium alloy. Correspondingly, in specific implementation, first, in the pretreatment stage of preparing the DLC film, the surface of the titanium alloy substrate is polished with a positive electrode electron beam to remove the original oxides and contaminants on the surface of the titanium alloy substrate; then, a DLC film is deposited on the surface of the titanium alloy substrate, and during the deposition of the DLC film, the flow rate of the reaction gas and the deposition rate are appropriately adjusted to cause local melting and flow phenomena during the growth of the DLC film to increase the strain release inside the DLC film; finally, after the deposition of the DLC film is completed, annealing treatment is performed to further release the residual stress inside the DLC film, thereby improving the anti-fatigue performance of the DLC film.

[0024] In one optional embodiment, depositing a DLC film on the surface of the substrate specifically includes:

[0025] Placing the substrate in a reaction chamber, introducing a reaction gas into the reaction chamber, and maintaining the air pressure in the reaction chamber at 0.5 Pa to deposit a DLC film on the surface of the substrate; wherein, the reaction gas is methane and nitrogen.

[0026] Specifically, in combination with the above embodiments, in the process of preparing the DLC film according to the embodiments of the present invention, the titanium alloy substrate is first placed in the reaction chamber, and then the following reaction conditions are adopted to deposit a DLC film on the surface of the titanium alloy substrate: the reaction gases are methane and nitrogen, and the air pressure in the reaction chamber is maintained at 0.5 Pa. Correspondingly, in specific implementation, first, in the pretreatment stage of preparing the DLC film, the surface of the titanium alloy substrate is polished using a positive electron beam to remove the original oxides and contaminants on the surface of the titanium alloy substrate; then, the titanium alloy substrate is placed in the reaction chamber, the reaction gases are introduced into the reaction chamber, and the air pressure in the reaction chamber is maintained at 0.5 Pa, and a DLC film is deposited on the surface of the titanium alloy substrate. During the deposition process of the DLC film, the flow rate of the reaction gases and the deposition rate are appropriately adjusted to cause local melting and flow phenomena to occur during the growth of the DLC film, so as to increase the strain release inside the DLC film; wherein, the reaction gases are methane and nitrogen; finally, after the deposition of the DLC film is completed, annealing treatment is performed to further release the residual stress inside the DLC film, thereby improving the anti-fatigue performance of the DLC film.

[0027] In one optional embodiment, the initial flow rate of the methane is 50 sccm, and the initial flow rate of the nitrogen is 100 sccm.

[0028] Specifically, in combination with the above embodiments, the initial flow rate of the methane introduced into the reaction chamber is 50 sccm, and the initial flow rate of the nitrogen introduced into the reaction chamber is 100 sccm. Correspondingly, in specific implementation, first, in the pretreatment stage of preparing the DLC film, the surface of the titanium alloy substrate is polished using a positive electron beam to remove the original oxides and contaminants on the surface of the titanium alloy substrate; then, the titanium alloy substrate is placed in the reaction chamber, the reaction gases are introduced into the reaction chamber, and the air pressure in the reaction chamber is maintained at 0.5 Pa, and a DLC film is deposited on the surface of the titanium alloy substrate. During the deposition process of the DLC film, the flow rate of the reaction gases and the deposition rate are appropriately adjusted to cause local melting and flow phenomena to occur during the growth of the DLC film, so as to increase the strain release inside the DLC film; wherein, the reaction gases are methane and nitrogen, the initial flow rate of the methane is 50 sccm, and the initial flow rate of the nitrogen is 100 sccm; finally, after the deposition of the DLC film is completed, annealing treatment is performed to further release the residual stress inside the DLC film, thereby improving the anti-fatigue performance of the DLC film.

[0029] In one optional embodiment, the initial deposition rate of the DLC film is 5 nm / min.

[0030] Specifically, in combination with the above embodiments, in the process of preparing the DLC film according to the embodiments of the present invention, the initial deposition rate of the DLC film is 5 nm / min. Correspondingly, in specific implementation, first, in the pretreatment stage of preparing the DLC film, the surface of the titanium alloy substrate is polished using a positive electron beam to remove the original oxides and contaminants on the surface of the titanium alloy substrate; then, the titanium alloy substrate is placed in the reaction chamber, reaction gas is introduced into the reaction chamber, and the air pressure in the reaction chamber is maintained at 0.5 Pa. A DLC film is deposited on the surface of the titanium alloy substrate, and during the deposition process of the DLC film, the flow rate and deposition rate of the reaction gas are appropriately adjusted to cause local melting and flow phenomena to occur during the growth of the DLC film, so as to increase the strain release inside the DLC film; wherein, the reaction gas is methane and nitrogen, the initial flow rate of methane is 50 sccm, the initial flow rate of nitrogen is 100 sccm, and the initial deposition rate is 5 nm / min; finally, after the deposition of the DLC film is completed, annealing treatment is performed to further release the residual stress inside the DLC film, thereby improving the anti-fatigue performance of the DLC film.

[0031] In summary, for the method for preparing a DLC film with anti-fatigue property provided by the embodiments of the present invention, first, the surface of the substrate is polished using a positive electron beam; then, a DLC film is deposited on the surface of the substrate, and the flow rate and deposition rate of the reaction gas are adjusted during the deposition process of the DLC film; finally, after the deposition of the DLC film is completed, annealing treatment is performed. The DLC film prepared by using the embodiments of the present invention not only has the advantages of high hardness, high wear resistance, and chemical inertness, but also has good ductility and anti-fatigue performance, and can meet a wide range of application requirements.

[0032] The above are only the preferred embodiments of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the technical principle of the present invention, several improvements and deformations can still be made, and these improvements and deformations should also be regarded as the protection scope of the present invention.

Claims

1. A preparation method of a DLC film with anti-fatigue property, characterized in that, Including: Polishing the surface of the substrate using a positive electron beam; Depositing a DLC film on the surface of the substrate, and adjusting the flow rate of the reaction gas and the deposition rate during the deposition of the DLC film; Performing an annealing treatment after the deposition of the DLC film is completed.

2. The method for preparing a DLC film with anti-fatigue property according to claim 1, characterized in that, The substrate is a titanium alloy.

3. The preparation method of the DLC film with anti-fatigue property according to claim 1, characterized in that, The depositing a DLC film on the surface of the substrate specifically includes: Placing the substrate in a reaction chamber, introducing a reaction gas into the reaction chamber, and maintaining the air pressure in the reaction chamber at 0.5 Pa to deposit a DLC film on the surface of the substrate; wherein, the reaction gas is methane and nitrogen.

4. The method for preparing a DLC film with anti-fatigue property according to claim 3, wherein, The initial flow rate of the methane is 50 sccm, and the initial flow rate of the nitrogen is 100 sccm.

5. The method for preparing a DLC film with anti-fatigue property according to claim 3, characterized in that, The initial deposition rate of the DLC film is 5 nm / min.

Images