Laser processing apparatus, laser processing system, and method for manufacturing electronic device

By using the first optical slit part and the second optical slit part to converge lasers in different directions in the laser processing device, the problems of short mask pulse life and low laser utilization efficiency are solved, and efficient and high-quality hole processing is achieved.

CN120347409APending Publication Date: 2025-07-22AURORA ADVANCED LASER CO LTD
View PDF 5 Cites 0 Cited by

Patent Information

Application Number
CN202411750201.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-01-22
Filing Date
2024-12-02
Publication Date
2025-07-22

AI Technical Summary

Technical Problem

In the existing laser processing devices, the pulse life of the mask is short and the laser utilization efficiency is low, making it difficult to achieve efficient and high-quality pore processing.

Method used

A laser convergence system is adopted that is arranged in different directions in the first optical slit part and the second optical slit part respectively. The first convergence optical system and the second convergence optical system converge laser light in the V direction and H direction to form a rectangular light spot, reduce damage to the optical slit part, and image it on the surface of the processed object through the projection optical system.

Benefits of technology

The pulse life of the optical slit is extended, the laser utilization efficiency is improved, efficient and high-quality hole processing is achieved, and the damage risk of optical components is reduced.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN120347409A_ABST
    Figure CN120347409A_ABST
Patent Text Reader

Abstract

A laser processing apparatus, a laser processing system, and a method of manufacturing an electronic device are provided. The laser processing apparatus performs hole processing by irradiating a workpiece with laser light, and includes: a first optical slit portion disposed at a first position on an optical path of the laser light, the first optical slit portion having an opening extending in a second direction orthogonal to the first direction; a second optical slit portion disposed at a second position on the optical path of the laser light, the second optical slit portion having an opening extending in the first direction; an illumination optical system including: a first converging optical system that converges laser light in a first direction to form a first linear shape and irradiates the first optical slit; and a second converging optical system that converges the laser light in the second direction to form a second linear shape and irradiates the laser light to the second optical slit. And a projection optical system that forms an image on the surface of the workpiece such that the shape of the opening of the first optical slit and the shape of the opening of the second optical slit overlap each other after the laser light has passed through the first optical slit and the second optical slit.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Method for correcting fault by using laser beam machine

    JP1993042381A

  • Laser beam machining device

    JP2006289443A

  • Laser beam machining apparatus

    JP2008060274A

  • Divergence angle confirmation device, divergence angle adjusting device, divergence angle confirmation method and divergence angle adjusting method

    JP2018025632A

  • Laser machining utilizing a spacial filter

    US5237149A