一种用于金刚石衬底的精抛液及其制备方法、金刚石衬底的抛光方法
By using a polishing solution containing diamond, alumina, or silica sol, combined with dispersants and oxidants, the problems of low diamond polishing rate and high surface roughness are solved, achieving a high-efficiency and non-destructive polishing effect.
CN120365854BActive Publication Date: 2026-07-17SHENZHEN ZHONGJI NEW MATERIAL CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENZHEN ZHONGJI NEW MATERIAL CO LTD
- Filing Date
- 2025-04-03
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
Existing diamond polishing processes suffer from low polishing rates, high surface roughness, and poor surface quality. Traditional polishing methods struggle to achieve the ideal ultra-smooth and damage-free surface.
Method used
Fine polishing fluid containing diamond, alumina, or silica sol as abrasives, combined with dispersants, suspending agents, and oxidants, improves polishing rate and surface smoothness through chemical reaction and physical cutting, while reducing scratches and roughness.
Benefits of technology
It achieves high polishing rates and surface smoothness, reduces the risk of processing damage, and improves the surface quality and processing efficiency of diamond substrates.
✦ Generated by Eureka AI based on patent content.
Smart Images
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Abstract
本发明公开了一种用于金刚石衬底的精抛液及其制备方法、金刚石衬底的抛光方法，涉及金刚石加工技术领域。所述用于金刚石衬底的精抛液包括第一精抛液或第二精抛液，其中：所述第一精抛液包括以下原料：第一磨料1~7份、分散剂0.1~1份、悬浮剂0.1~1份、氧化剂2~3份，余量为水，合计100份，所述第一磨料包括金刚石或氧化铝；所述第二精抛液包括以下原料：第二磨料89~97份、分散剂0.1~1份、氧化剂3~10份，合计100份，所述第二磨料包括硅溶胶。通过氧化剂提高金刚石衬底的表面能，软化表面，使金刚石衬底更容易与磨料进行物理切削；通过加入分散剂和悬浮剂使磨料颗粒分散均匀，获得相对一致的加工表面。
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