一种具备CMP复合沟槽机械抛光垫及其制备方法
By setting composite grooves on the surface of the polishing layer and setting support components inside the base layer, the problems of insufficient liquid delivery and support in the grooves of the mechanical polishing pad are solved, thereby improving the polishing effect and dimensional stability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ANHUI HECHEN NEW MATERIAL CO LTD
- Filing Date
- 2025-06-17
- Publication Date
- 2026-07-17
AI Technical Summary
When using existing mechanical polishing pads, the grooves cannot effectively deliver polishing fluid and cannot adequately support the mechanical polishing pad, resulting in poor mechanical polishing effects.
A composite groove consisting of circular and strip grooves is formed on the surface of the polishing layer, which are interconnected. A support assembly is set inside the base layer, which consists of a support member, a connector, a support column and a positioning block. The support assembly supports the base layer, improves the delivery performance of the polishing fluid and prevents deformation.
It effectively improves the polishing fluid delivery performance of the mechanical polishing pad, prevents deformation during polishing, ensures uniform transmission of polishing pressure, and improves the mechanical polishing effect and dimensional stability.
Smart Images
Figure CN120480799B_ABST