A polishing liquid processing ph detection sampling device

Abstract

The application relates to the technical field of polishing liquid and discloses a PH detection sampling device for polishing liquid processing, which comprises a reaction kettle, a temperature adjusting assembly is arranged on the surface of the reaction kettle, a liquid storage cylinder is welded at the center of the top of the reaction kettle, a through hole is formed in the top of the reaction kettle, the reaction kettle is communicated with the liquid storage cylinder through the through hole, a stirring assembly is arranged at the axis of the reaction kettle and the liquid storage cylinder, a liquid dropping assembly is arranged in the top of the liquid storage cylinder, and a circulating pipetting assembly is arranged on the top of the liquid storage cylinder. In the process of three rotations of the bevel gear, the rotating disc is driven to rotate, the V-shaped boss extrudes the rubber hose and sweeps on the rubber hose, the inside of the vertical pipe is in negative pressure, the reaction liquid in the liquid storage cylinder passes through the vertical pipe, the rubber hose and the liquid dropping head, part of the reaction liquid discharged from the bottom end of the liquid dropping head enters the storage cylinder, the reaction liquid in the storage cylinder can be pumped through the straw for sampling, and the sampling is convenient.

Description

Technical Field

[0001] This invention relates to the field of polishing fluid technology, specifically to a pH detection and sampling device for polishing fluid processing. Background Technology

[0002] Silicon wafer polishing slurry is a key consumable in the chemical mechanical polishing (CMP) process of semiconductor manufacturing. It is mainly used to remove microscopic bumps and impurities on the wafer surface, providing a flat substrate for multilayer wiring of chips. During the polishing process, the pH value of the polishing slurry needs to be strictly controlled; for example, semiconductor fine polishing requires a pH of around 9.5, while aluminum nitride polishing slurry is weakly alkaline (pH 7.1–8.5).

[0003] Because the polishing slurry contains particulate matter, it is necessary to sample it immediately after homogenization and test its pH value. Furthermore, the testing time after sampling is short, requiring prompt testing. This necessitates high sampling and testing efficiency for testing personnel. Additionally, when collecting a large number of samples, frequent sampling and testing become cumbersome, warranting further improvement. Summary of the Invention

[0004] (a) Technical problems to be solved

[0005] To address the shortcomings of existing technologies, this invention provides a pH detection and sampling device for polishing slurry processing, which has advantages such as convenient sampling when monitoring the pH of the reaction solution, and solves the problem of inconvenient sampling operation when repeatedly detecting the pH of the reaction solution.

[0006] (II) Technical Solution

[0007] To facilitate sampling when monitoring the pH of the reaction solution, the present invention provides the following technical solution: a pH detection and sampling device for polishing slurry processing, comprising a reaction vessel, a temperature regulating component disposed on the surface of the reaction vessel, a liquid storage cylinder welded to the center of the top of the reaction vessel, a through hole through the top of the reaction vessel, the reaction vessel communicating with the liquid storage cylinder through the through hole, a stirring component disposed at the axis of the reaction vessel and the liquid storage cylinder, a dripping component disposed through the top of the liquid storage cylinder, and a circulating liquid transfer component disposed at the top of the liquid storage cylinder.

[0008] Preferably, a feed port is fixedly installed on the top of the reactor, a sealing cap is provided on the top of the feed port, a discharge port is provided at the bottom of the reactor, and a switch valve is provided on the discharge port.

[0009] Preferably, the stirring assembly includes a motor base welded to the top of the reactor, a drive motor fixedly mounted on the top of the motor base, a drive shaft fixedly mounted on the bottom output end of the drive motor, the drive shaft being arranged along the axis of the reactor and the storage tank, and U-shaped rods fixedly arranged in an array on the surface of the drive shaft inside the reactor, with stirring blades fixedly arranged in an array on the U-shaped rods.

[0010] Preferably, the drive shaft includes an inner core rod fixedly mounted on the bottom output end of the drive motor. A hollow shaft is sleeved on the outer side of the inner core rod, and both ends of the hollow shaft are sealed. The inner core rod is rotatably connected to the center of the top end of the hollow shaft. A bevel gear one is fixedly mounted on the surface of the inner core rod, and a bevel gear two is fixedly mounted on the top of the hollow shaft. A bevel gear three meshes between the bevel gear one and the bevel gear two. A spiral blade is fixedly mounted on the surface of the inner core rod inside the hollow shaft. An array of liquid inlet holes is formed on the side of the bottom end of the hollow shaft, through which the hollow shaft communicates with the reaction vessel. An array of liquid outlet holes is formed on the side of the top end of the hollow shaft, through which the hollow shaft communicates with the storage cylinder.

[0011] Preferably, the dripping assembly includes a support cover fixedly installed on the top of the liquid storage cylinder. The upper half of the support cover is semi-circular. A vertical tube is fixedly installed through the liquid storage cylinder. A rubber hose is connected to the top end of the vertical tube. The rubber hose is fixedly installed on the inner wall of the upper half of the support cover. The other end of the rubber hose is connected to a dripping head. A turntable is rotatably connected to the center of the upper half of the support cover. V-shaped protrusions are arranged in an array on the circumference of the turntable. The turntable is coaxially fixed with a bevel gear.

[0012] Preferably, the circulating pipetting assembly includes an arched frame fixedly mounted on the output end of a drive motor. A rotating ring is fixedly mounted at the bottom of the arched frame. Storage cylinders are arrayed and fixedly fixed on the rotating ring. The storage cylinders are located directly below the bottom of the dropper head. Each storage cylinder has a sealing valve at its bottom. Circumvention grooves are arrayed and opened through the rotating ring. The storage cylinders and circulation grooves are spaced apart. An inner support ring and an outer support ring are fixedly mounted on the top of the storage cylinder. A support ring is fixedly mounted between the inner and outer support rings. A recessed portion is provided on the right side of the support ring. The middle of the recessed portion is horizontal, and both ends are inclined. A reflux groove is opened through the middle of the recessed portion and the top of the storage cylinder. The storage cylinder is located directly above the reflux groove.

[0013] Preferably, the tops of both the inner and outer support rings are higher than the top of the support ring, and the middle part of the recessed portion is fixedly installed on the top of the liquid storage cylinder.

[0014] Preferably, the sealing valve includes an embedded ring and a perforated plate fixedly installed on the inner wall of the storage cylinder. The embedded ring is located above the perforated plate. Multiple water leakage holes are opened through the perforated plate and the bottom of the storage cylinder. A sliding column is slidably connected through the center of the perforated plate. The sliding column is slidably connected through the bottom of the storage cylinder. An insert is fixedly installed on the top of the sliding column. The insert is inserted into the embedded ring and seals the embedded ring. An annular flange is fixedly installed on the surface of the sliding column. The annular flange is located between the perforated plate and the bottom wall of the storage cylinder. A spring is sleeved on the outside of the sliding column. The two ends of the spring are fixedly installed on the bottom of the perforated plate and the top of the annular flange, respectively.

[0015] Preferably, an mounting plate is fixedly installed on the top of the liquid storage cylinder. The mounting plate has an inverted L-shaped cross-section. The horizontal part of the mounting plate is attached to the top of the storage cylinder. An air blowing pipe is connected to the top of the mounting plate and passes through the top and right side of the liquid storage cylinder.

[0016] Preferably, the temperature regulating component includes a coating cylinder fixedly installed on the outside of the reactor. The bottom of the coating cylinder is connected to a water inlet pipe, and the top of the coating cylinder is connected to a water outlet pipe. Spacer rings are arranged in a vertical array between the inner wall of the coating cylinder and the outer wall of the reactor. Each spacer ring has a through-hole, and the through-holes on two adjacent spacer rings are staggered. A heater is provided through the bottom side of the reactor.

[0017] (III) Beneficial Effects

[0018] Compared with the prior art, the present invention provides a pH detection and sampling device for polishing slurry processing, which has the following beneficial effects:

[0019] 1. This pH detection and sampling device for polishing slurry processing uses a drive motor to rotate the inner core rod. Through the transmission of bevel gear three, bevel gear one and bevel gear two rotate in opposite directions, thus causing the inner core rod and hollow shaft to rotate in opposite directions. The hollow shaft drives the U-shaped rod and stirring blades to rotate, stirring the reaction liquid inside the reactor. As the inner core rod and spiral blades rotate relative to the hollow shaft, the reaction liquid enters the hollow shaft through the inlet hole. The spiral blades then transport the reaction liquid upwards. Finally, the reaction liquid passes through the outlet hole into the storage tank, where it is temporarily stored. It then flows back into the reactor through the through-hole, thus transferring the reaction liquid from the bottom layer to the top layer, enhancing the mixing effect.

[0020] 2. The pH detection and sampling device for polishing slurry processing drives the turntable to rotate during the rotation of the bevel gear. The V-shaped boss squeezes the rubber hose and sweeps across the rubber hose, creating a negative pressure inside the vertical tube. This causes the reaction liquid inside the storage cylinder to pass through the vertical tube, the rubber hose, and the drip head. Part of the reaction liquid discharged from the bottom of the drip head enters the storage cylinder, which can then be sampled by drawing the reaction liquid inside the storage cylinder through a pipette, thus facilitating sampling. Attached Figure Description

[0021] Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a three-dimensional structural diagram of the temperature regulation component of the present invention; Figure 3 This is a schematic diagram of the three-dimensional cross-sectional structure of the present invention after the temperature regulation component has been removed; Figure 4 This is a three-dimensional structural diagram of the stirring assembly of the present invention; Figure 5 This is a schematic diagram of the main cross-sectional structure of the stirring assembly of the present invention; Figure 6 This is a three-dimensional structural diagram of the droplet assembly of the present invention; Figure 7 This is a three-dimensional structural diagram of the circulating pipetting assembly of the present invention; Figure 8 This is a schematic diagram of the main cross-sectional structure of the storage cylinder of the present invention; Figure 9 This is a three-dimensional structural diagram of the air blowing tube in the circulating pipetting assembly of the present invention.

[0022] In the diagram: 100, Reactor; 200, Temperature Control Component; 300, Storage Tank; 400, Stirring Component; 500, Dropping Component; 600, Circulating Transfer Component; 101, Feed Port; 102, Sealing Cap; 103, Discharge Port; 104, Switch Valve; 105, Through Hole; 201, Coating Cylinder; 202, Water Inlet Pipe; 203, Water Outlet Pipe; 204, Spacer Ring; 205, Guide Hole; 206, Heater; 401, Motor Base; 402, Drive Motor; 403, Drive Shaft; 404, U-Shaped Rod; 405, Stirring Blade; 4031, Inner Core Rod; 4032, Hollow Shaft; 4033, Bevel Gear; 4034, Bevel Gear Wheel 2; 4035, Bevel Gear 3; 4036, Spiral Blade; 4037, Liquid Inlet; 4038, Liquid Outlet; 501, Support Cover; 502, Vertical Pipe; 503, Rubber Hose; 504, Drip Head; 505, Turntable; 506, V-shaped Boss; 601, Arch Frame; 602, Rotating Ring; 603, Storage Cylinder; 604, Clearance Groove; 605, Inner Support Ring; 606, Outer Support Ring; 607, Support Ring; 608, Recessed Part; 609, Return Groove; 610, Embedded Ring; 611, Hollow Plate; 612, Sliding Pillar; 613, Insert Block; 614, Annular Flange; 615, Spring; 616, Mounting Plate; 617, Air Blowing Pipe. Detailed Implementation

[0023] In the description of this application, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0024] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] Please see Figures 1-3 A pH detection and sampling device for polishing slurry processing includes a reaction vessel 100, a temperature regulating component 200 on the surface of the reaction vessel 100, a liquid storage cylinder 300 welded to the center of the top of the reaction vessel 100, a through hole 105 through the top of the reaction vessel 100, the reaction vessel 100 communicating with the liquid storage cylinder 300 through the through hole 105, a feeding port 101 fixedly installed on the top of the reaction vessel 100, a sealing cover 102 provided on the top of the feeding port 101, a discharge port 103 provided at the bottom of the reaction vessel 100, and a switch valve 104 provided on the discharge port 103.

[0026] Please see Figures 1-3 A stirring assembly 400 is provided at the axis of the reaction vessel 100 and the storage tank 300. The stirring assembly 400 stirs the reaction liquid inside the reaction vessel 100 and simultaneously transports the reaction liquid inside the reaction vessel 100 to the storage tank 300. Then, the reaction liquid inside the storage tank 300 flows back to the reaction vessel 100 through the through hole 105.

[0027] Please see Figures 1-3 A dripping assembly 500 is installed through the top of the liquid storage cylinder 300, and a circulating pipetting assembly 600 is installed at the top of the liquid storage cylinder 300. The dripping assembly 500 draws liquid from inside the liquid storage cylinder 300 and drips it onto the circulating pipetting assembly 600. The reaction solution on the circulating pipetting assembly 600 can then be drawn up using a pipette to complete the sampling. Afterwards, the reaction solution is dripped onto pH test paper using a pipette to complete a pH test.

[0028] In this embodiment, the silicon wafer polishing slurry comprises the following components by weight percentage: 75% silica sol, 1.2% sodium hydroxide, 1.8% piperazine, 1.5% sodium tetraborate, 2% sodium bicarbonate, 1.5% sodium lauryl ether sulfate, 0.5% polyether defoamer from Sigang Chemical, and the balance being deionized water.

[0029] The preparation method of silica sol is as follows:

[0030] A composite surfactant consisting of 1g Tween-80 and 1g Span-20 was added to the inside of reactor 100 and mixed with 500ml of deionized water inside reactor 100. Then, 170g of silicon tetrachloride was slowly added dropwise. The temperature during the addition of silicon tetrachloride was controlled at 0-5℃ and the pH of the reaction solution was monitored at any time. Ammonia water was used to maintain the pH of the reaction solution at 3-4 as needed. After the addition was completed, the reactor was sealed. Then, the reaction solution was transferred to the hydrothermal reactor through the discharge port 103 by opening the switch valve 104. The reactor was heated to 125℃ and hydrothermally reacted for 10 hours. Then, the reaction solution was concentrated under reduced pressure until the solid content of the reaction solution reached 50%.

[0031] The production process of the above silicon wafer polishing slurry:

[0032] Add piperazine to the silica sol and mix well. Then add sodium tetraborate and sodium bicarbonate and continue stirring for 30 minutes to obtain a premix. Add sodium hydroxide, sodium lauryl polyoxyethylene ether sulfate, and polyether defoamer to water and mix well. Then add the mixture dropwise to the premix. After the addition is complete, stir for 30 minutes.

[0033] Please see Figure 2 The temperature control component 200 includes a covering cylinder 201 fixedly installed on the outside of the reactor 100. The bottom of the covering cylinder 201 is connected to a water inlet pipe 202, and the top of the covering cylinder 201 is connected to a water outlet pipe 203. Spacer rings 204 are arranged in a vertical array between the inner wall of the covering cylinder 201 and the outer wall of the reactor 100. Each spacer ring 204 has a through-hole 205.

[0034] Please see Figure 2 The guide holes 205 on adjacent spacer rings 204 are staggered. When the room temperature is high, coolant is transported to the inside of the coating cylinder 201 through the water inlet pipe 202. The separation effect of multiple spacer rings 204, combined with the connecting effect of the guide holes 205, prolongs the flow time of the coolant inside the coating cylinder 201, thus cooling the reaction liquid inside the reactor 100 and maintaining the reaction liquid temperature at 0-5℃. A heater 206 is installed through the bottom side of the reactor 100. When the room temperature is low, the heater 206 heats the reaction liquid inside the reactor 100, maintaining the reaction liquid temperature at 0-5℃.

[0035] Please see Figures 3-5The stirring assembly 400 includes a motor base 401 welded to the top of the reactor 100. A drive motor 402 is fixedly mounted on the top of the motor base 401, and a drive shaft 403 is fixedly mounted on the bottom output end of the drive motor 402. The drive shaft 403 is arranged along the axis of the reactor 100 and the storage tank 300. U-shaped rods 404 are fixedly arranged in an array on the surface of the drive shaft 403 inside the reactor 100, and stirring blades 405 are fixedly arranged in an array on the U-shaped rods 404. The drive shaft 403 is driven to rotate by the drive motor 402, thereby stirring the reaction liquid inside the reactor 100 by the U-shaped rods 404 and the stirring blades 405.

[0036] Please see Figures 3-5 The drive shaft 403 includes an inner core rod 4031 fixedly mounted on the bottom output end of the drive motor 402. A hollow shaft 4032 is sleeved on the outer side of the inner core rod 4031. Both ends of the hollow shaft 4032 are sealed, and the inner core rod 4031 is rotatably connected to the center of the top end of the hollow shaft 4032. A bevel gear 4033 is fixedly mounted on the surface of the inner core rod 4031, and a bevel gear 4034 is fixedly mounted on the top of the hollow shaft 4032. A bevel gear 4035 meshes between the bevel gear 4033 and the bevel gear 4034. Through the transmission action of the bevel gear 4035, the bevel gears 4033 and 4034 rotate in opposite directions. This, in turn, causes the inner core rod 4031 and the hollow shaft 4032 to rotate in opposite directions.

[0037] Please see Figures 3-5 A spiral blade 4036 is fixedly mounted on the surface of the inner core rod 4031 inside the hollow shaft 4032. An array of liquid inlet holes 4037 are arranged through the bottom side of the hollow shaft 4032, connecting it to the reactor 100. An array of liquid outlet holes 4038 are arranged through the top side of the hollow shaft 4032, connecting it to the storage tank 300. As the inner core rod 4031 and spiral blade 4036 rotate relative to the hollow shaft 4032, the reaction liquid enters the hollow shaft 4032 through the liquid inlet hole 4037. The spiral blade 4036 then transports the reaction liquid upwards. Finally, the reaction liquid passes through the liquid outlet hole 4038 and enters the storage tank 300. The reaction liquid is temporarily stored inside the storage tank 300 and flows back to the reactor 100 through the through hole 105, thereby transferring the reaction liquid from the bottom layer to the top layer and enhancing the mixing effect.

[0038] Please see Figure 6The dripping assembly 500 includes a support cover 501 fixedly installed on the top of the liquid storage cylinder 300. The upper half of the support cover 501 is semi-circular. A vertical pipe 502 is fixedly installed through the liquid storage cylinder 300. A gap is reserved between the bottom end of the vertical pipe 502 and the top of the reaction vessel 100, allowing the reaction liquid inside the liquid storage cylinder 300 to enter the interior of the vertical pipe 502 through the gap. A rubber hose 503 is connected to the top end of the vertical pipe 502. The rubber hose 503 is fixedly installed on the inner wall of the upper half of the support cover 501. Specifically, the rubber hose 503 can be fixed to the support cover 501 by adhesive bonding.

[0039] Please see Figure 6 The other end of the rubber hose 503 is connected to a drip head 504. A turntable 505 is rotatably connected to the center of the upper half of the support cover 501. V-shaped protrusions 506 are arrayed on the circumferential surface of the turntable 505. The turntable 505 is coaxially fixed with the bevel gear 4035. When the bevel gear 4035 rotates, it drives the turntable 505 to rotate synchronously. The V-shaped protrusions 506 squeeze the rubber hose 503 and sweep across it, creating a negative pressure inside the vertical tube 502. This causes the reaction liquid inside the storage cylinder 300 to pass through the vertical tube 502, the rubber hose 503, and the drip head 504, and drip onto the circulating transfer assembly 600.

[0040] Please see Figure 7 The circulating pipetting assembly 600 includes an arched frame 601 fixedly mounted on the output end of a drive motor 402. A rotating ring 602 is fixedly mounted on the bottom end of the arched frame 601. When the drive motor 402 drives the inner core rod 4031 to rotate, the arched frame 601 rotates synchronously, thereby driving the rotating ring 602 to rotate. Storage cylinders 603 are fixedly arranged in an array through the rotating ring 602. The storage cylinders 603 are located directly below the bottom end of the dropper head 504. Each storage cylinder 603 has a sealing valve at its bottom end. Circulating grooves 604 are arranged in an array through the rotating ring 602. The storage cylinders 603 and the circulating grooves 604 are spaced apart. During the rotation of the rotating ring 602, the reaction liquid dripping from the bottom end of the dropper head 504 enters the storage cylinders 603 and the circulating grooves 604, temporarily storing the reaction liquid in the storage cylinders 603 for easy sampling via pipette.

[0041] Please see Figure 7An inner support ring 605 and an outer support ring 606 are fixedly installed on the top of the storage cylinder 300. A support ring 607 is fixedly installed between the inner support ring 605 and the outer support ring 606. A recessed portion 608 is provided on the right side of the support ring 607. The middle of the recessed portion 608 is horizontal, and the two ends are inclined. When the rotating ring 602 rotates, the sealing valve of the storage cylinder 603 sweeps across the support ring 607. When the sealing valve slides against the top of the support ring 607, the sealing valve maintains a sealing state on the storage cylinder 603, so that the reaction liquid is stably stored inside the storage cylinder 603. When the sealing valve moves to the recessed portion 608, the sealing valve is in the open state, and the reaction liquid inside the storage cylinder 603 drips onto the top of the recessed portion 608. In addition, the dripping head 504 drips the reaction liquid in the relief groove 604, drips onto the support ring 607, and finally the reaction liquid collects in the recessed portion 608.

[0042] Please see Figure 7 A reflux groove 609 is formed through the middle of the recessed portion 608 and the top of the storage cylinder 300, with the storage cylinder 603 located directly above the reflux groove 609. The tops of the inner support ring 605 and the outer support ring 606 are both higher than the top of the support ring 607, and the middle of the recessed portion 608 is fixedly installed on the top of the storage cylinder 300. The reaction liquid at the top of the recessed portion 608 then enters the interior of the storage cylinder 300 through the reflux groove 609.

[0043] Please see Figure 8 The sealing valve includes an embedded ring 610 and a hollow plate 611 fixedly installed on the inner wall of the storage cylinder 603. The embedded ring 610 is located above the hollow plate 611. Multiple water leakage holes are opened through the hollow plate 611 and the bottom of the storage cylinder 603. A sliding column 612 is slidably connected through the center of the hollow plate 611. The sliding column 612 is slidably connected through the bottom of the storage cylinder 603. An insert 613 is fixedly installed on the top of the sliding column 612. The insert 613 is inserted into the embedded ring 610 and seals the embedded ring 610.

[0044] Please see Figure 8 An annular flange 614 is fixedly mounted on the surface of the sliding column 612, located between the perforated plate 611 and the bottom wall of the storage cylinder 603. A spring 615 is sleeved on the outside of the sliding column 612, with its two ends fixedly mounted on the bottom of the perforated plate 611 and the top of the annular flange 614, respectively. The elasticity of the spring 615 causes the sliding column 612 and the insert 613 to tend to move downwards, thus separating the insert 613 from the sliding column 612. When the storage cylinder 603 moves on top of the support ring 607, the support ring 607 presses the sliding column 612 upwards, causing the insert 613 to embed into the support ring 610, allowing the reaction liquid to be stored inside the storage cylinder 603.

[0045] Please see Figure 9A mounting plate 616 is fixedly installed on the top of the liquid storage cylinder 300. The mounting plate 616 has an inverted L-shaped cross-section. The horizontal part of the mounting plate 616 is attached to the top of the storage cylinder 603. An air blowing pipe 617 is connected to the top of the mounting plate 616 and passes through the top and right side of the liquid storage cylinder 300. The other end of the air blowing pipe 617 is connected to a blower, which blows air into the storage cylinder 603 through the support ring 607, blowing the residual reaction liquid in the storage cylinder 603 into the recessed part 608.

[0046] In operation, the inner core rod 4031 is driven to rotate by the drive motor 402. Through the transmission action of the third bevel gear 4035, the first bevel gear 4033 and the second bevel gear 4034 rotate in opposite directions, thus causing the inner core rod 4031 and the hollow shaft 4032 to rotate in opposite directions. The hollow shaft 4032 drives the U-shaped rod 404 and the stirring blade 405 to rotate, stirring the reaction liquid inside the reactor 100.

[0047] As the inner core rod 4031 and the spiral blade 4036 rotate relative to the hollow shaft 4032, the reaction liquid enters the interior of the hollow shaft 4032 through the inlet hole 4037. The spiral blade 4036 then transports the reaction liquid upward. Finally, the reaction liquid passes through the outlet hole 4038 and enters the interior of the storage cylinder 300. The reaction liquid is temporarily stored inside the storage cylinder 300 and flows back to the interior of the reaction vessel 100 through the through hole 105, thereby transferring the reaction liquid at the bottom to the top and enhancing the mixing effect of the reaction liquid.

[0048] During the rotation of bevel gear 3 4035, the turntable 505 is driven to rotate. The V-shaped boss 506 squeezes the rubber hose 503 and sweeps across the rubber hose 503, creating a negative pressure inside the vertical tube 502. This causes the reaction liquid inside the storage cylinder 300 to pass through the vertical tube 502, the rubber hose 503, and the drip head 504. Part of the reaction liquid discharged from the bottom of the drip head 504 enters the storage cylinder 603, while another part of the reaction liquid passes through the relief groove 604 and drips onto the top of the support ring 607. Afterward, the reaction liquid gathers at the concave part 608, and then passes through the return groove 609 and enters the storage cylinder 300.

[0049] During the rotation of the inner core rod 4031, the rotating ring 602 is driven to rotate by the arched frame 601, so that the storage cylinder 603 sweeps over the top of the support ring 607; when the storage cylinder 603 moves above the recessed part 608, under the elastic action of the spring 615, the sliding column 612 and the insert 613 move downward, the insert 613 separates from the insert ring 610, and the reaction liquid inside the storage cylinder 603 can pass through the insert ring 610, the hollow plate 611 and the bottom of the storage cylinder 603, and then drip onto the recessed part 608;

[0050] At the same time, the remaining reaction liquid in the storage cylinder 603 is blown out by a blower in conjunction with the air blowing pipe 617.

[0051] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A pH detection and sampling device for polishing slurry processing, comprising a reaction vessel (100), wherein a liquid storage cylinder (300) is welded to the center of the top of the reaction vessel (100), and a through hole (105) is provided through the top of the reaction vessel (100), wherein the reaction vessel (100) is connected to the liquid storage cylinder (300) through the through hole (105), characterized in that: A temperature regulating component (200) is provided on the surface of the reactor (100), a stirring component (400) is provided at the axis of the reactor (100) and the storage tank (300), a dripping component (500) is provided through the top of the storage tank (300), and a circulating liquid transfer component (600) is provided at the top of the storage tank (300). The stirring assembly (400) includes a motor base (401) welded to the top of the reactor (100), a drive motor (402) fixedly mounted on the top of the motor base (401), and a drive shaft (403) fixedly mounted on the bottom output end of the drive motor (402). The drive shaft (403) includes an inner core rod (4031) fixedly installed on the bottom output end of the drive motor (402). A hollow shaft (4032) is sleeved on the outside of the inner core rod (4031). The two ends of the hollow shaft (4032) are sealed. The inner core rod (4031) is rotatably connected through the center of the top end of the hollow shaft (4032). A bevel gear one (4033) is fixedly installed on the surface of the inner core rod (4031), a bevel gear two (4034) is fixedly installed on the top of the hollow shaft (4032), and a bevel gear three (4035) meshes between the bevel gear one (4033) and the bevel gear two (4034). The inner core rod (4031) has a spiral blade (4036) fixedly installed on the surface inside the hollow shaft (4032). The bottom side of the hollow shaft (4032) has an array of through-holes (4037), and the hollow shaft (4032) is connected to the reactor (100) through the through-holes (4037). The top side of the hollow shaft (4032) has an array of through-holes (4038), and the hollow shaft (4032) is connected to the storage cylinder (300) through the through-holes (4038). The dripping assembly (500) includes a support cover (501) fixedly installed on the top of the liquid storage cylinder (300). The upper half of the support cover (501) is semi-circular. A vertical tube (502) is fixedly installed through the liquid storage cylinder (300). A rubber hose (503) is connected to the top of the vertical tube (502). The rubber hose (503) is fixedly installed on the inner wall of the upper half of the support cover (501). The other end of the rubber hose (503) is connected to a dripping head (504). A turntable (505) is rotatably connected to the center of the upper half of the support cover (501). V-shaped bosses (506) are arranged in an array on the circumferential surface of the turntable (505). The turntable (505) is coaxially fixed with the bevel gear three (4035). The circulating pipetting assembly (600) includes an arched frame (601) fixedly mounted on the output end of a drive motor (402). A rotating ring (602) is fixedly mounted at the bottom of the arched frame (601). Storage cylinders (603) are fixedly arranged in an array through the rotating ring (602). The storage cylinders (603) are located directly below the bottom of the dropper head (504). Each storage cylinder (603) is provided with a sealing valve at its bottom. Circumvention grooves (604) are arranged in an array through the rotating ring (602). The storage cylinders (603) and the circulation grooves (604) are spaced apart. An inner support ring (605) and an outer support ring (606) are fixedly installed on the top of the liquid storage cylinder (300). A support ring (607) is fixedly installed between the inner support ring (605) and the outer support ring (606). A recessed part (608) is provided on the right side of the support ring (607). The middle part of the recessed part (608) is horizontal and the two ends are inclined. A reflux groove (609) is provided through the middle of the recess (608) and the top of the liquid storage cylinder (300), and the storage cylinder (603) is located directly above the reflux groove (609).

2. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: The reactor (100) is fixedly equipped with a feed port (101) at the top, and a sealing cover (102) is provided at the top of the feed port (101). The reactor (100) is equipped with a discharge port (103) at the bottom, and a switch valve (104) is provided on the discharge port (103).

3. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: The drive shaft (403) is arranged along the axis of the reactor (100) and the storage tank (300). U-shaped rods (404) are fixed in an array on the surface of the drive shaft (403) inside the reactor (100). Stirring blades (405) are fixed in an array on the U-shaped rods (404).

4. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: The tops of the inner support ring (605) and the outer support ring (606) are both higher than the top of the support ring (607), and the middle part of the recess (608) is fixedly installed on the top of the liquid storage cylinder (300).

5. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: The sealing valve includes an embedded ring (610) and a perforated plate (611) fixedly installed on the inner wall of the storage cylinder (603). The embedded ring (610) is located above the perforated plate (611). Multiple water leakage holes are opened through the perforated plate (611) and the bottom of the storage cylinder (603). A sliding column (612) is slidably connected through the center of the perforated plate (611). The sliding column (612) is slidably connected through the bottom of the storage cylinder (603). An insert (613) is fixedly installed on the top of the sliding column (612). The insert (613) is inserted into the embedded ring (610) and seals the embedded ring (610). An annular flange (614) is fixedly installed on the surface of the sliding column (612). The annular flange (614) is located between the hollow plate (611) and the bottom wall of the storage cylinder (603). A spring (615) is sleeved on the outside of the sliding column (612). The two ends of the spring (615) are fixedly installed at the bottom of the hollow plate (611) and the top of the annular flange (614), respectively.

6. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: An mounting plate (616) is fixedly installed on the top of the liquid storage cylinder (300). The mounting plate (616) has an inverted L-shaped cross section. The horizontal part of the mounting plate (616) is attached to the top of the storage cylinder (603). An air blowing pipe (617) is connected to the top of the mounting plate (616). The air blowing pipe (617) passes through the top of the liquid storage cylinder (300) and the right side of the liquid storage cylinder (300).

7. The pH detection and sampling device for polishing slurry processing according to claim 1, characterized in that: The temperature control assembly (200) includes a covering cylinder (201) fixedly installed on the outside of the reactor (100). The bottom of the covering cylinder (201) is connected to a water inlet pipe (202), and the top of the covering cylinder (201) is connected to a water outlet pipe (203). Spacer rings (204) are arranged in a vertical array between the inner wall of the covering cylinder (201) and the outer wall of the reactor (100). Each spacer ring (204) is provided with a flow guide hole (205). The flow guide holes (205) on two adjacent spacer rings (204) are staggered. A heater (206) is provided through the bottom side of the reactor (100).

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