Composition for forming silicon-containing resist underlayer film having carbon-carbon double bond
CN120641830APending Publication Date: 2025-09-12NISSAN CHEM CORP
Patent Information
- Application Number
- CN202480013041.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-02-28
- Filing Date
- 2024-02-27
- Publication Date
- 2025-09-12
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Figure CN120641830A_ABST
Abstract
A composition for forming a silicon-containing resist underlayer film, which contains component [A]: a polysiloxane that contains a structural unit derived from a hydrolyzable silane (A) represented by formula (A-1), and component [C]: a solvent. # imgabs0 # (In formula (A-1), a and b each independently represent an integer of 1 to 3. And c represents an integer of 0-2. And b + c represents an integer of 1-3. And R1 represents a group represented by formula (A-1-1). R2 represents a (a + 1)-valent group that does not have a ring structure, or a (a + 1)-valent group that has an aromatic hydrocarbon ring. And R3 represents a specific group. X represents, for example, an alkoxy group. ) # imgabs1 # (In formula (A-1-1), R11 represents a hydrogen atom or a hydrocarbon group having 1-6 carbon atoms. And R12 represents a hydrogen atom, a hydrocarbon group having 1-4 carbon atoms, or a halogen atom. And # imgabs2 # represents a binding bond. )
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Citation Information
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