Waste gas treatment device
CN120644023APending Publication Date: 2025-09-16SEVENSTAR SEMICONDUCTOR TECHNOLOGIES CO LTD
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Patent Information
- Application Number
- CN202510811656.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-17
- Publication Date
- 2025-09-16
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Figure CN120644023A_ABST
Abstract
The waste gas treatment device comprises a shell, a filter part and a spraying mechanism, the filter part is located in the shell, and an opening is formed in the position, corresponding to the filter part, of the upper side of the shell; wherein the spraying mechanism comprises a liquid storage pool which is arranged outside the shell and located at the opening, a plurality of spraying holes are formed in the pool bottom face, facing the opening, of the liquid storage pool, and each spraying hole communicates with the inner space of the liquid storage pool and the inner space of the shell and is used for spraying filtering liquid in the liquid storage pool to the filtering part; and the plurality of spraying holes are uniformly distributed in the preset direction, so that filtrate with different flows can be provided on the premise that the spraying mechanism does not need to be replaced.
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