Waste gas treatment device

CN120644023APending Publication Date: 2025-09-16SEVENSTAR SEMICONDUCTOR TECHNOLOGIES CO LTD
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Patent Information

Application Number
CN202510811656.X
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-06-17
Publication Date
2025-09-16

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Abstract

The waste gas treatment device comprises a shell, a filter part and a spraying mechanism, the filter part is located in the shell, and an opening is formed in the position, corresponding to the filter part, of the upper side of the shell; wherein the spraying mechanism comprises a liquid storage pool which is arranged outside the shell and located at the opening, a plurality of spraying holes are formed in the pool bottom face, facing the opening, of the liquid storage pool, and each spraying hole communicates with the inner space of the liquid storage pool and the inner space of the shell and is used for spraying filtering liquid in the liquid storage pool to the filtering part; and the plurality of spraying holes are uniformly distributed in the preset direction, so that filtrate with different flows can be provided on the premise that the spraying mechanism does not need to be replaced.
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