一种半导体前驱体精馏用集液回流组件及精馏装置

By designing the overflow buffer chamber and temperature control component of the liquid collection and reflux assembly for semiconductor precursor distillation, the problem of liquid film rupture caused by condensate flow fluctuations was solved, achieving stable liquid film existence and improved gas-liquid phase balance, thereby increasing distillation separation efficiency.

CN120661957BActive Publication Date: 2026-07-17JIANGSU RONGDAO SEMICON TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
JIANGSU RONGDAO SEMICON TECH CO LTD
Filing Date
2025-06-24
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In existing distillation units, the liquid film is easily disrupted when the condensate flow rate fluctuates, affecting the gas-liquid phase balance and resulting in poor distillation separation.

Method used

Design a liquid collection and reflux assembly for semiconductor precursor distillation, including an overflow buffer chamber and a temperature control assembly. The buffer chamber slows down the liquid descent speed, and an inner overflow pipe and distribution plate are provided to ensure stable liquid reflux and form a continuous liquid film, thereby enhancing the gas-liquid contact area.

Benefits of technology

It effectively prevents high-speed droplet impact, ensures stable liquid film existence, improves gas-liquid phase balance, and enhances the separation efficiency and stability of the distillation system.

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Abstract

本发明公开了一种半导体前驱体精馏用集液回流组件及精馏装置,集液回流组件包括采出器,前驱体溢流管和气体流通管,其中采出器的底部设有基板,基板设置有溢流管安装孔和气管安装孔;前驱体溢流管通过溢流管安装孔贯穿安装在基板上,前驱体溢流管上部伸入采出器内,并与采出器的侧壁面形成集液腔,前驱体溢流管顶部和底部分别设置有第一溢流口和回流口,回流口与填料管对应设置,且回流口的直径与填料管相同;气体流通管通过气管安装孔安装在基板上;前驱体溢流管内还设置有内溢流管,内溢流管顶部设置有第二溢流口,第二溢流口低于第一溢流口设置,内溢流管与前驱体溢流管形成溢流缓冲腔。
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